Thin film and preparation method thereof, display device and protection equipment

Abstract

The embodiment of the invention provides a thin film and a preparation method thereof, a display device and protection equipment. The thin film comprises a main film layer, the main film layer comprises a metal oxide and a second metal, the metal element contained in the metal oxide is a first metal, the first metal and the second metal are both transition elements, the molar ratio of the first metal to the second metal is 1: (0.05-0.1), and the first metal is a metal oxide. The atomic numbers of the first metal and the second metal are different, and the metal oxide is in a crystalline state. The thin film provided by the embodiment of the invention has relatively high absorptivity for blue light with specific wavelength, prevents blue light damage, and can ensure the high transmittance requirement of other visible light residual wave band light at the same time.

Description

Technical Field

[0001] The present disclosure relates to the field of thin film technology, and in particular to a thin film and a preparation method thereof, a display device, and protective equipment. Background Art

[0002] With the development of display and lighting technology, people are facing more and more artificial light sources such as electronic screens. Most of the white light used in the industry uses blue light chips and yellow phosphors to produce white light. Blue light (wavelength range is 400-500nm) is one of the three primary colors and is indispensable in full-color display and regulating human biorhythms.

[0003] However, blue light has many hazards. It can cause photoaging and hyperpigmentation of the skin, damage the retina and other eye structures, leading to a series of diseases such as refractive error and macular degeneration, and disrupt the human circadian rhythm. In view of the hazards of blue light, it is necessary to prevent blue light damage in daily life. Summary of the invention

[0004] The embodiments of the present disclosure provide a film and a preparation method thereof, a display device, and a protective device to solve or alleviate one or more technical problems in the prior art.

[0005] As a first aspect of an embodiment of the present disclosure, an embodiment of the present disclosure provides a thin film, including a main film layer, the main film layer including a metal oxide and a second metal, the metal element contained in the metal oxide is a first metal, the first metal and the second metal are both transition elements, the molar ratio of the first metal to the second metal is 1:(0.05~0.1), the atomic numbers of the first metal and the second metal are different, and the metal oxide is in a crystalline state.

[0006] In some embodiments, the atomic number of the first metal is greater than the atomic number of the second metal, the first metal includes at least one of zinc, titanium, and copper, and the second metal includes at least one of silver, gold, and platinum group metals.

[0007] In some embodiments, the average surface roughness of the main film layer is between Ra0.1 μm and Ra0.3 μm.

[0008] In some embodiments, the film has the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 50% to 56%; the main film layer has an average transmittance of 90% to 96% for light in the wavelength range of 500nm to 800nm.

[0009] In some embodiments, the film further includes an anti-reflection film stacked with the main film layer, and a material of the anti-reflection film includes silicon oxide.

[0010] As a second aspect of an embodiment of the present disclosure, an embodiment of the present disclosure provides a method for preparing a thin film described in any embodiment of the present disclosure, wherein the thin film includes a main film layer, the main film layer includes a metal oxide and a second metal, the metal element included in the metal oxide is a first metal, and the method for preparing the main film layer includes:

[0011] preparing a precursor solution of the metal oxide;

[0012] Adding the second metal to the precursor liquid of the metal oxide to obtain a mixed solution, wherein the molar ratio of the first metal to the second metal in the mixed solution is 1:(0.05-0.1);

[0013] coating the mixed solution on a substrate;

[0014] After the mixed solution on the substrate is dried and annealed, the main film layer is obtained.

[0015] In some embodiments, when the mixed solution on the substrate is annealed, the annealing temperature is 400° C. to 600° C.

[0016] In some embodiments, the pH value of the mixed solution is 2-4.

[0017] In some embodiments, preparing the metal oxide precursor solution comprises:

[0018] The precursor liquid of the metal oxide is prepared by mixing the first metal ester, diethanolamine, concentrated nitric acid and anhydrous ethanol, wherein the volume ratio of the first metal ester, diethanolamine and anhydrous ethanol is (1-8):1:(8-16).

[0019] As a third aspect of the embodiments of the present disclosure, the embodiments of the present disclosure provide a display device, including a display panel and the film described in any embodiment of the present disclosure, wherein the film is located on the light emitting side of the display panel.

[0020] As a fourth aspect of the embodiments of the present disclosure, the embodiments of the present disclosure provide a protective device, including a sheet-like light-transmitting body and the film described in any embodiment of the present disclosure, wherein the film is arranged on one side surface of the light-transmitting body.

[0021] The technical solution of the disclosed embodiment can reduce the bandgap width of the metal oxide and broaden the spectral response range by doping the second metal in the crystalline metal oxide corresponding to the first metal. After doping with the second metal, the appearance of the intermediate energy level is equivalent to providing a springboard for the photoelectron to transition, so that photons with lower energy can also excite electrons and generate energy transfer, which is manifested as a red shift of the light cutoff wavelength in the spectrum, thereby ensuring the absorption rate of blue light in a specific wavelength range (for example, 415nm to 455nm), playing a blue light protection effect, and ensuring the high transmittance requirements of other remaining visible light bands.

[0022] The above summary is for illustrative purposes only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments and features described above, further aspects, embodiments and features of the present disclosure will be readily apparent by reference to the accompanying drawings and the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In the accompanying drawings, unless otherwise specified, the same reference numerals throughout the multiple drawings represent the same or similar parts or elements. These drawings are not necessarily drawn to scale. It should be understood that these drawings only depict some embodiments according to the present disclosure and should not be regarded as limiting the scope of the present disclosure.

[0024] Figure 1 is a schematic diagram of a film in one embodiment of the present disclosure;

[0025] Figure 2 is a schematic diagram of a film in another embodiment of the present disclosure;

[0026] Figure 3 Schematic diagram of the preparation process of the main film layer;

[0027] Figure 4 The UV-visible transmission spectra of the main film layers ATO1, ATO2 and ATO3;

[0028] Figure 5 UV-visible transmission spectra of the main film layers ATO2 and ATO4;

[0029] Figure 6 UV-visible light transmission spectra of the main film layers ATO2 and ATO5. DETAILED DESCRIPTION

[0030] In the following, only certain exemplary embodiments are briefly described. As will be appreciated by those skilled in the art, the described embodiments may be modified in various ways without departing from the spirit or scope of the present disclosure, and different embodiments may be combined arbitrarily without conflict. Therefore, the drawings and descriptions are considered to be exemplary and non-restrictive in nature. The numerical ranges defined by "about" in the present disclosure refer to the ranges of ±20%, ±10%, ±5% of a given specific numerical value.

[0031] Figure 1 Schematic diagram of a film in an embodiment of the present disclosure. In order to reduce the harm of blue light to humans, the present disclosure provides a film such as Figure 1 As shown, the film 2 can be arranged on the substrate 1. The film can be used in a display device or in glass. When the film is used in a display device, the film 2 can be arranged on the light-emitting side of the display panel to absorb at least part of the blue light emitted by the display panel to reduce the damage of the blue light to the human eye. When the film is used in glass, the film 2 can be arranged on one side of the glass body to reduce the damage of the blue light to the human body.

[0032] The film 2 may include a main film layer 21, the main film layer 21 includes a metal oxide and a second metal, the metal element contained in the metal oxide is a first metal. The first metal and the second metal are both transition elements, and the atomic numbers of the first metal and the second metal are different. The content of the first metal in the film is greater than the content of the second metal in the film. The metal oxide is crystalline.

[0033] Among them, the content of the first metal in the film and the content of the second metal in the film can refer to mass fraction, or atomic percentage or molar ratio. Transition elements are chemical elements from Group IB to Group VIII in the periodic table. The above-mentioned "atomic number" refers to the sequence number of the element in the periodic table, which is numerically equal to the nuclear charge number (i.e., the number of protons) of the atomic nucleus or the number of electrons outside the nucleus of a neutral atom. The "metal oxide in a crystalline state" described in the present disclosure may refer to the metal oxide being in a microcrystalline state, a partially crystalline state, a completely crystalline state, and a combination of multiple different crystalline states.

[0034] In some embodiments, the metal oxide and the second metal in the main film layer are mixed with each other, and the molar ratio of the first metal to the second metal in the main film layer is 1:(0.05-0.1). For example, the molar ratio of the first metal to the second metal in the main film layer can be 1:0.05, 1:0.06 or 1:0.1.

[0035] In the disclosed embodiment, by doping the second metal (and both the first metal and the second metal are transition elements) in the crystalline metal oxide corresponding to the first metal, the bandgap width of the metal oxide can be reduced and the spectral response range can be widened. After doping with the second metal, the appearance of the intermediate energy level is equivalent to providing a springboard for the photoelectron to transition, so that photons with lower energy can also excite electrons and generate energy transfer, which is manifested as a red shift of the light cutoff wavelength in the spectrum, thereby ensuring the absorption rate of blue light in a specific wavelength range (for example, 415nm~455nm), playing an anti-blue light effect, and ensuring the high transmittance requirements of other remaining visible light bands. By setting the molar ratio of the first metal to the second metal in the main film layer to 1: (0.05~0.1), the flatness of the film can be further improved, and the absorption rate of blue light in a specific wavelength range can be guaranteed, and it is conducive to preparing the main film layer 21 by the sol-gel method to simplify the preparation process and reduce production costs.

[0036] In one embodiment, the atomic number of the first metal is greater than the atomic number of the second metal, the first metal includes at least one of zinc (Zn), titanium (Ti), and copper (Cu), and the second metal includes at least one of silver (Ag), gold (Au), and platinum group metals.

[0037] For example, the first metal may include titanium, the metal oxide may include titanium dioxide, and the second metal may include silver. The main film layer 21 is a titanium dioxide (TiO2) film layer doped with nanosilver. When titanium dioxide crystallizes in the anatase phase, it can intercept ultraviolet rays. After the introduction of nanosilver particles, there are free-moving electrons around the nanometal particles, and these electrons are in a state of irregular motion under normal conditions. When light enters the main film layer 21, these electrons will be offset by the action of the electric field, and the electrons themselves are affected by the Coulomb force. These two opposite forces together make the electrons reciprocate. Resonance occurs when the frequencies of light and electrons are equal, and at this time the particles absorb the incident light to generate energy transfer. This light absorption method is selective, and if the vibration frequencies of the two are not equal, no resonant absorption will occur. Studies have shown that nanosilver particles have strong absorption in the blue light band. In the present disclosure, the molar ratio of the first metal to the second metal is set to 1: (0.05-0.1), which can enhance the anti-blue light effect of the main film layer 21 and improve the transmittance of the film in bands other than blue light.

[0038] In some embodiments, the average surface roughness of the main film layer is between Ra0.1 μm and Ra0.3 μm. For example, a roughness detection device such as a white light interferometer can be used to detect the surface roughness of the main film layer to obtain an average surface roughness of the main film layer between Ra0.1 μm and Ra0.3 μm.

[0039] Among them, the surface average roughness refers to the surface and cross-sectional morphology of the film observed at a microscopic scale using equipment such as a scanning electron microscope (SEM), a transmission electron microscope (TEM), an atomic force microscope (AFM), a white light interferometer, etc., and the absolute value of the height difference between the highest point on the surface and the lowest point on the surface obtained within the field of view.

[0040] The average surface roughness of the main film layer in the film of the embodiment of the present disclosure is between Ra0.1μm and Ra0.3μm, which can ensure the flatness of subsequent film layer preparation, and when the film is applied to a display device, the roughness in this range will not affect the display effect of the display device.

[0041] In some embodiments, the main film layer 21 includes multiple sub-film layers stacked in sequence, and the material of at least one sub-film layer includes the above-mentioned metal oxide and the above-mentioned second metal. Each sub-film layer can be formed by spin coating and annealing process, so that the thickness and thickness uniformity of the main film layer can be better controlled.

[0042] In some embodiments, the film of the disclosed embodiment has the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 50% to 56%; the film has an average transmittance of 90% to 96% for light in the wavelength range of 500nm to 800nm. The film has the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 50% to 56%, so the film can absorb most of the blue light and reduce blue light damage; the film has an average transmittance of 90% to 96% for light in the wavelength range of 500nm to 800nm, so the film will not affect the passage of 500nm to 800nm ​​light while preventing blue light damage, and will not affect the display effect of the display device or the light transmittance of the glass.

[0043] Figure 2 FIG. 2 is a schematic diagram of a film in another embodiment of the present disclosure. Figure 2 As shown, in one embodiment, the film may further include an anti-reflection film 22 stacked with the main film layer 21. For example, the anti-reflection film 22 may be disposed on a side of the main film layer 21 away from the substrate 1. By providing the anti-reflection film, the transmittance of the film to other visible light may be increased.

[0044] In some embodiments, the material of the anti-reflection film includes silicon oxide SiOx. For example, silicon dioxide (SiO2). The silicon dioxide film layer has the advantages of a strong film layer, high hardness, high light transmittance, and strong corrosion resistance. Using silicon dioxide as the material of the anti-reflection film can make the film as a whole have a higher transmittance and improve the service life.

[0045] The thickness of the antireflection film is between 50nm and 1000nm, so that the thickness of the entire film is small while ensuring the antireflection effect. In one example, for example, the antireflection film is 50nm or 100nm or 200nm or 400nm or 500nm or 700nm or 1000nm.

[0046] The embodiment of the present disclosure also provides a method for preparing the thin film as described above, wherein the thin film includes a main film layer, the main film layer includes a metal oxide and a second metal, the metal element included in the metal oxide is a first metal, and the method for preparing the main film layer includes steps S10 to S40.

[0047] In step S10, a precursor solution of the metal oxide is prepared.

[0048] In step S20, the second metal is added to the precursor liquid of the metal oxide to obtain a mixed solution, wherein the molar ratio of the first metal to the second metal in the mixed solution is 1:(0.05-0.1).

[0049] In step S30, the mixed solution is coated on a substrate.

[0050] In step S40, the mixed solution on the substrate is dried and annealed to obtain a main film layer.

[0051] In one embodiment, when the mixed solution on the substrate is annealed, the annealing temperature is 400° C. to 600° C. For example, the annealing temperature is about 400° C., 500° C. or 600° C.

[0052] In one embodiment, the pH value of the mixed solution is 2 to 4. For example, the pH value of the mixed solution is about 2, 3 or 4.

[0053] In one embodiment, preparing the precursor liquid of the metal oxide includes: mixing the first metal ester, diethanolamine, concentrated nitric acid, and anhydrous ethanol to prepare the precursor liquid of the metal oxide, wherein the volume ratio of the first metal ester, diethanolamine, and anhydrous ethanol is (1-8):1:(8-16). For example, the volume ratio of the first metal ester, diethanolamine, and anhydrous ethanol is 4:1:16.

[0054] The preparation method of the film disclosed in the present invention is introduced below with reference to specific examples. Figure 3 Schematic diagram of the preparation process of the main membrane layer. Figure 3 As shown, in some embodiments, the method for preparing the thin film may further include the following steps S01-S02.

[0055] S01, cleaning the substrate. The substrate may be made of ultra-white glass, that is, ultra-transparent low-iron glass.

[0056] By cleaning the substrate, the uniformity of the distribution of the subsequently formed thin film can be improved, and the adhesion of the thin film can be improved.

[0057] In some embodiments, step S01 may include S01a-S01c:

[0058] S01a, placing the substrate in deionized water containing a cleaning agent, and continuously performing ultrasonic cleaning. For example, the cleaning time is about 40 minutes, and the cleaning agent is a glass cleaning agent.

[0059] S01b, placing the substrate cleaned by the cleaning agent in an acetone solution, and continuously performing ultrasonic cleaning to clean off the organic solvent on the substrate. For example, the mass fraction of the acetone solution is about 99.9%, and the ultrasonic cleaning time is about 20 minutes.

[0060] S01c, placing the substrate cleaned with acetone in anhydrous ethanol and continuously performing ultrasonic cleaning to clean off the acetone solution remaining on the substrate. For example, the ultrasonic cleaning time is about 20 minutes.

[0061] In some embodiments, after step S01, the following further includes: S02, pre-treating the substrate. For example, ozone may be used to pre-treat the substrate.

[0062] In some embodiments, step S02 includes: blowing the substrate clean with helium, and then placing the substrate in an ozone environment for about 10 minutes, so as to disinfect bacteria on the substrate.

[0063] In step S10, a precursor solution of the metal oxide is prepared.

[0064] In some embodiments, the first metal is titanium, the second metal is silver, and the metal oxide is titanium dioxide. Step S10 may include: mixing isopropyl titanate, diethanolamine, concentrated nitric acid, and anhydrous ethanol to obtain a titanium dioxide precursor liquid. Among them, the volume ratio of isopropyl titanate, diethanolamine, and anhydrous ethanol can be (1-8):1:(8-16). For example, the volume ratio of isopropyl titanate, diethanolamine, and anhydrous ethanol can be 4:1:16. Concentrated nitric acid can be determined according to the pH value. A titanium dioxide precursor liquid is obtained and left to stand for a period of time, for example, for 24 hours.

[0065] When preparing the titanium dioxide precursor liquid, an appropriate amount of glacial acetic acid can be added to prevent the titanium dioxide precursor liquid from hydrolyzing.

[0066] In this embodiment, the titanium dioxide precursor liquid can be prepared by a one-step method, which simplifies the process and improves the efficiency.

[0067] In step S20, a silver nitrate solution is added to the titanium dioxide precursor solution obtained in S10 to obtain a mixed solution, wherein the molar ratio of titanium to silver in the mixed solution is between 1:(0.05 and 0.1). After the mixed solution is obtained, it is allowed to stand for 24 hours. In one example, the concentration of the silver nitrate solution is 1.5 mol / L.

[0068] In one example, the pH value of the mixed solution is 2-4, for example, the pH value of the mixed solution is 2, 3 or 4. Experiments have shown that when the pH value of the mixed solution is about 3, the obtained main film layer has the best cutoff efficiency for blue light.

[0069] In step S30, the mixed solution is coated on the substrate.

[0070] In some embodiments, the mixed solution is coated on the substrate by a spin coating process. In some embodiments, the spin coating speed in the spin coating process is between 500 and 3000 r / min. By using a high speed spin coating, the uniformity of the coating can be ensured.

[0071] In some embodiments, the time for each spin coating may be between 30 s and 2 min.

[0072] In a specific example, step S30 may include: fixing the substrate on a spin coater, dropping 200 μL of a titanium dioxide / silver mixed solution, increasing the acceleration from 100 r / s to 500 r / min and maintaining for 5 s, and then increasing the acceleration from 100 r / s to 2000 r / min and maintaining for 60 s.

[0073] By adjusting the spin coating speed of the mixed solution, the coating uniformity can be improved and the film thickness can be adjusted.

[0074] In step S40, the mixed solution on the substrate is dried and annealed to form a main film layer of the thin film.

[0075] In some embodiments, step S40 may include:

[0076] S41, drying the substrate coated with the mixed solution at a temperature of 80°C to 120°C for 5 to 10 minutes.

[0077] S42, annealing the dried substrate.

[0078] In some embodiments, the annealing temperature in step S42 is 400°C to 800°C. Exemplarily, the annealing temperature is 400°C to 600°C, for example, the annealing temperature may be approximately 400°C, 500°C or 600°C. Setting the annealing temperature to 400°C to 600°C is beneficial to improving the anti-blue light effect of the main film layer and reducing the roughness of the main film layer. In one embodiment, the annealing temperature is approximately 500°C, which can ensure the crystallization state of the metal oxide and further improve the anti-blue light effect of the main film layer.

[0079] In some embodiments, the annealing time is between 1.5 and 2 hours.

[0080] It should be noted that in the embodiment of the present disclosure, the number of times step S30 and step S40 are performed is not limited. For example, step S30 and step S40 can be performed once. Alternatively, step S30 and step S40 are performed N times, where N is an integer greater than 1. In this case, each time step S30 and step S40 are performed, a sub-film layer is formed, so that a main film layer with a larger thickness and uniform film thickness can be formed. In one example, the main film layer includes three stacked sub-film layers.

[0081] In some embodiments, the preparation method further includes: S50, forming an anti-reflection film stacked with the main film layer on a side of the main film layer facing away from the substrate.

[0082] In some embodiments, a deposition process such as a magnetron sputtering process may be used to form the anti-reflection film, wherein the anti-reflection film is made of silicon dioxide and has a thickness of about 200 nm.

[0083] Figure 4 The UV-visible transmission spectra of the main film layers ATO1, ATO2 and ATO3; Figure 5 UV-visible transmission spectra of the main film layers ATO2 and ATO4; Figure 6 The UV-visible light transmission spectrum of the main film layers ATO2 and ATO5.

[0084] ATO1: annealing temperature is 400 °C, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 3;

[0085] ATO2: annealing temperature is 500°C, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 3;

[0086] ATO3: annealing temperature is 600°C, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 3;

[0087] ATO4: annealing temperature is 500°C, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 2;

[0088] ATO5: The annealing temperature is 500°C, the molar ratio of Ti to Ag in the mixed solution is 1:0.06, and the pH value of the mixed solution is 3.

[0089] from Figure 4 It can be seen that ATO2 and ATO3 produce obvious troughs in the short-wave blue light region. Compared with ATO1, after the annealing temperature of ATO2 and ATO3 is increased, the TiO 2 The crystallinity of the crystal is improved, and the nanosilver particles are precipitated at high temperature and TiO 2 After the plasma resonance is formed, the short-wave blue light is cut off. Experiments have shown that when the annealing temperature is too high, such as 600°C, it will cause brittle cracks on the surface of the main film layer. Therefore, the annealing temperature can be selected to be about 450°C to 500°C, for example, the annealing temperature can be selected to be about 500°C.

[0090] from Figure 5 It can be seen that compared with ATO4, ATO2 produces an obvious trough in the short-wave blue light region. It can be seen that increasing the pH of the mixed solution can improve the cutoff rate of the main film layer to short-wave blue light.

[0091] from Figure 6 It can be seen that compared with ATO5, ATO2 produces obvious troughs in the short-wave blue light region. It can be seen that appropriately reducing the molar ratio of Ti and Ag in the mixed solution can increase the cutoff rate of the main film layer to short-wave blue light. By adjusting the molar ratio of Ti and Ag, the blue light protection effect of the film can be improved, and the transmittance of the film in the light band other than blue light can be improved.

[0092] Table 1 shows the blue light protection performance data of the five main film layers ATO1-ATO5

[0093]

[0094] from Figure 4-Figure 6 Combined with Table 1, it can be seen that the annealing temperature can be selected to be about 500°C, the molar ratio of Ti and Ag in the mixed solution is 1:0.05, the pH value of the mixed solution is about 3, and the prepared ATO2 has the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, and the average cutoff rate reaches 53.86%; the average transmittance of ATO2 for light in the wavelength range of 500nm to 800nm ​​reaches 93.92%.

[0095] An embodiment of the present disclosure further provides a display device, comprising a display panel and the film in any embodiment of the present disclosure, wherein the film can be arranged on the light emitting side of the display panel.

[0096] By disposing the film in the embodiment of the present disclosure on the light-emitting side of the display panel, the damage to human eyes caused by harmful blue light in the wavelength range of 415nm to 455nm in the display panel is improved or avoided, while ensuring the high transmittance requirements of other remaining visible light bands.

[0097] The display device may be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a monitor, a laptop computer, a digital photo frame, a navigator, or the like.

[0098] The embodiments of the present disclosure also provide a protective device, including a sheet-like light-transmitting body and a film in any embodiment of the present disclosure. The film can be arranged on one side surface of the light-transmitting body. It should be noted that the light-transmitting body should be understood in a broad sense, and the light-transmitting body here refers to a sheet-like body that can transmit light. The material of the light-transmitting body can include inorganic substances (such as silicon dioxide) or organic substances (such as acrylic), as long as the light-transmitting body is a sheet-like light-transmitting body.

[0099] The protective device provided by the embodiment of the present disclosure can be glass for car windows or door windows, and can also be protective glasses, especially the lenses in protective glasses. The protective device is used to improve or avoid the damage to the human body or human eyes caused by harmful blue light with a wavelength range of 415nm to 455nm in the external environment, while ensuring the high transmittance requirements of other remaining visible light bands.

[0100] In the description of this specification, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present disclosure.

[0101] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present disclosure, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0102] In the present disclosure, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances.

[0103] In the present disclosure, unless otherwise clearly specified and limited, a first feature being “above” or “below” a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being “above”, “above”, and “above” a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being “below”, “below”, and “below” a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0104] The disclosure above provides many different embodiments or examples to implement different structures of the present disclosure. In order to simplify the present disclosure, the components and settings of specific examples are described above. Of course, they are only examples, and the purpose is not to limit the present disclosure. In addition, the present disclosure can repeat reference numbers and / or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, which itself does not indicate the relationship between the various embodiments and / or settings discussed.

[0105] The above are only specific embodiments of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any technician familiar with the technical field can easily think of various changes or substitutions within the technical scope disclosed in the present disclosure, which should be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

1. A film, characterized in that: It includes a main film layer, which includes a metal oxide and a second metal. The metal element contained in the metal oxide is a first metal. The first metal and the second metal are both transition elements. The molar ratio of the first metal to the second metal is 1:(0.05-0.1). The atomic numbers of the first metal and the second metal are different. The metal oxide is in a crystalline state.

2. The film according to claim 1, characterized in that The atomic number of the first metal is greater than that of the second metal, the first metal includes at least one of zinc, titanium, and copper, and the second metal includes at least one of silver, gold, and platinum group metals.

3. The film according to claim 1, characterized in that The average surface roughness of the main film layer is between Ra0.1 μm and Ra0.3 μm.

4. The film according to claim 1, characterized in that The film has the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 50% to 56%; the main film layer has an average transmittance of 90% to 96% for light in the wavelength range of 500nm to 800nm.

5. The film according to any one of claims 1 to 4, characterized in that The film further includes an anti-reflection film stacked with the main film layer, and the material of the anti-reflection film includes silicon oxide.

6. A method for preparing a film as claimed in any one of claims 1 to 5, characterized in that: The film comprises a main film layer, the main film layer comprises a metal oxide and a second metal, the metal element contained in the metal oxide is a first metal, and the preparation method of the main film layer comprises: preparing a precursor solution of the metal oxide; Adding the second metal to the precursor liquid of the metal oxide to obtain a mixed solution, wherein the molar ratio of the first metal to the second metal in the mixed solution is 1:(0.05-0.1); coating the mixed solution on a substrate; After the mixed solution on the substrate is dried and annealed, the main film layer is obtained.

7. The method according to claim 6, characterized in that When the mixed solution on the substrate is annealed, the annealing temperature is 400° C. to 600° C.

8. The method according to claim 6, characterized in that The pH value of the mixed solution is 2-4.

9. The method according to claim 6, characterized in that The precursor liquid of the metal oxide is prepared, comprising: The precursor liquid of the metal oxide is prepared by mixing the first metal ester, diethanolamine, concentrated nitric acid and anhydrous ethanol, wherein the volume ratio of the first metal ester, diethanolamine and anhydrous ethanol is (1-8):1:(8-16).

10. A display device, characterized in that: The invention comprises a display panel and the film according to any one of claims 1 to 5, wherein the film is located on the light emitting side of the display panel.

11. A protective device, characterized in that: The invention comprises a sheet-like light-transmitting body and the film according to any one of claims 1 to 5, wherein the film is arranged on one side surface of the light-transmitting body.

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