Sanitary washing device and toilet device

Abstract

The invention provides a sanitary cleaning device and a toilet device capable of sufficiently removing dirt on a cleaning nozzle and the like. A sanitary washing device, which is provided in a functional part disposed in a toilet and has a human body washing function, is provided with: a washing head (51) that is configured so as to be capable of advancing and retreating between a storage position and a forward-out position; a showerhead cleaning unit (53) that discharges cleaning water and cleans the cleaning showerhead (51); the flow rate of the washing water discharged from the head washing unit (53) is greater than the flow rate of the washing water discharged from the washing head (51).

Description

Technical Field

[0001] The present disclosure relates to a sanitary cleaning device and a toilet device. Background Art

[0002] A technique for forming a water film on a cleaning nozzle for cleaning a local area in a toilet device is disclosed (for example, refer to Patent Document 1).

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: (Japan) Patent Publication No. 2019-173288 Summary of the invention

[0006] Technical problem to be solved by the invention

[0007] In the conventional water film, there is a possibility that dirt on a cleaning nozzle or the like cannot be removed. The present disclosure aims to provide a sanitary cleaning device and a toilet device that can sufficiently remove dirt on a cleaning nozzle or the like.

[0008] Technical solutions for solving technical problems

[0009] The present disclosure relates to a sanitary cleaning device, which is arranged in a functional part configured in a toilet and has a human body cleaning function, and comprises: a cleaning nozzle, which is capable of moving forward and backward between a storage position and a forward position; a nozzle cleaning part, which releases cleaning water to clean the cleaning nozzle; the flow rate of the cleaning water released from the nozzle cleaning part is greater than the flow rate of the cleaning water released from the cleaning nozzle. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] FIG. 1 is a perspective view of a toilet apparatus according to one embodiment.

[0011] FIG. 2 is a front view of the functional part with the outer shell member removed.

[0012] FIG. 3 is a front view of the functional part with the case member and the baffle part removed.

[0013] FIG. 4 is a perspective view of the baffle cleaning portion as viewed from obliquely above.

[0014] FIG. 5 is a perspective view showing the front portion of the functional portion as viewed from obliquely below.

[0015] FIG. 6 is a perspective view showing the front portion of the functional portion from which the baffle portion is removed, as seen from obliquely below.

[0016] FIG. 7 is a cross-sectional view showing the unitized cleaning nozzle head and the support frame as viewed from the side.

[0017] FIG. 8 is a perspective view of the lower cleaning portion of the nozzle as viewed from obliquely above.

[0018] FIG. 9 is a plan view showing the functional part from which the casing member is removed, as seen from above.

[0019] FIG. 10 is a diagram showing a wash water circuit.

[0020] FIG. 11 is a diagram showing the timing of the cleaning operation of the cleaning head, the head cleaning unit, and the baffle cleaning unit performed by the cleaning control unit.

[0021] 12 is a diagram showing the timing of cleaning operations of the nozzle cleaning head, the nozzle cleaning unit, and the shutter cleaning unit performed by the cleaning control unit according to another embodiment. DETAILED DESCRIPTION

[0022] An embodiment of the toilet device 1 will be described with reference to the accompanying drawings. In the following description, the front-to-back direction when viewed from a user sitting on a toilet seat (not shown) is referred to as the front-to-back direction. The left-right direction when viewed from a user sitting on the toilet seat is referred to as the left-right direction X. The up-and-down direction along the vertical direction relative to the floor on which the toilet 2 is installed is referred to as the up-and-down direction Z.

[0023] As shown in FIG. 1 , a toilet device 1 of the present embodiment includes a toilet 2, a toilet seat (not shown), a toilet cover 3, and a functional portion 4. The toilet 2 is formed to open upward. The toilet 2 is made of, for example, pottery or resin. The toilet seat (not shown) and the toilet cover 3 are rotatably mounted above the toilet 2 relative to the toilet 2.

[0024] As shown in Fig. 1 and Fig. 2, the toilet 2 has a toilet bowl 21, an upper surface 22, a toilet recess 23, and an outer peripheral wall 24. The toilet bowl 21 is arranged at the front side of the toilet 2. The toilet bowl 21 has an opening 211 at the upper part. The outer peripheral wall 24 surrounds the outer surface of the toilet bowl 21 and the outside of the piping and the like.

[0025] The toilet recess 23 is arranged along the peripheral edge of the rear side of the opening 211 of the toilet bowl 21, and is recessed from the upper surface of the upper surface 22. As shown in FIG2, the toilet recess 23 has a bottom surface 231, a pair of side walls 232, and a rear wall 233 (see FIG8, FIG9, and FIG11). In this embodiment, the upper surface of the upper surface 22 of the toilet 2 and the bottom surface 231 of the toilet recess 23 of the toilet 2 are both the upper surface of the toilet 2.

[0026] As shown in FIG. 1 , the functional portion 4 is arranged at the rear of the toilet 2. In the toilet 2, the functional portion 4 is arranged at the rear of the upper portion 22 of the toilet 2, and a portion of the front is arranged above the upper portion of the toilet recess 23 and the rear side of the toilet bowl 21. The functional portion 4 has a functional portion convex portion 42. The functional portion convex portion 42 is formed to protrude downward from the front of the functional portion 4. When the functional portion 4 is provided on the upper portion 22 other than the toilet recess 23 in the toilet 2, the functional portion convex portion 42 is arranged in the toilet recess 23 of the toilet 2.

[0027] The functional part 4 is composed of at least a sanitary cleaning device 5 for cleaning the user's local area. As shown in Figures 1 and 2, the functional part 4 includes a functional component that is configured to include the sanitary cleaning device 5, a base plate 41 (base component), and a shell component 411 that covers the outer shape of the functional part. At least a part of the functional component of the functional part 4 is arranged on the base plate 41.

[0028] The functional components are provided on the base plate 41 or other installation positions in consideration of various functions and positional relationships with other components. The functional components include, for example, a heat preservation device for a toilet seat (not shown), a toilet cleaning device with a cleaning box, a sanitary cleaning device 5 for cleaning the user's local area (see FIG. 3 ), a hose, a power supply unit, a control circuit substrate, an electric opening and closing unit for electrically opening and closing the toilet seat and toilet cover 3, a valve unit, various piping, and the like.

[0029] As shown in FIG. 3 and other figures, the sanitary cleaning device 5 has a human body cleaning function, and includes a pair of cleaning nozzles 51 that can move forward and backward, a baffle portion 52 (see FIG. 2 ) that opens and closes the front opening of the cleaning nozzle 51, a nozzle cleaning portion 53 (see FIG. 7 ), a baffle cleaning portion 6 (see FIG. 2 and other figures), a warm air drying device 54, and a cleaning control portion 55 (see FIG. 10 ). The baffle portion 52 is omitted in FIG. 3 .

[0030] The pair of cleaning nozzles 51 are arranged at the center of the left-right direction X on the front side of the functional part 4, and are separated in the left-right direction X. The pair of cleaning nozzles 51 are used for anal cleaning and bidet cleaning for cleaning the parts of the human body, respectively. The cleaning nozzle 51 releases cleaning water to the human body through a nozzle water outlet 51a (see FIG. 7 ) provided at the upper part of the front end side.

[0031] The pair of cleaning nozzles 51 can be moved forward and backward between the storage position and the forward position shown in Figures 3 and 7, respectively. The forward position is a position that protrudes further than the baffle portion 52 in the front of the front-rear direction Y from the storage position. The storage position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is stored inside the baffle portion 52. The forward position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is forwarded to the front side for cleaning the user's local area. A rack of a nozzle driving mechanism (not shown) is provided on the back side of the cleaning nozzle 51.

[0032] The nozzle drive mechanism (not shown) includes a strip-shaped rack, a pinion, and a motor. The pinion meshes with the rack and is driven by the motor to rotate. The cleaning nozzle 51 is forwardly extended obliquely downward relative to the support frame 501 of the cleaning nozzle unit assembled with the cleaning nozzle 51 by the nozzle drive mechanism (not shown), so that its front end pushes the back side (inner surface) of the baffle portion 52 from the inner side to the outer side of FIG. 2.

[0033] As shown in FIG7 , on the lower side of the cleaning nozzle 51 , the nozzle lower cleaning part 536 as the cleaning part below the nozzle is assembled with the cleaning nozzle 51 . As shown in FIG8 , the nozzle lower cleaning part 536 is provided with a pair of cylindrical shapes having a space inside for the cleaning water to flow. An enlarged water outlet 5361 is formed on the end surface of the front end of the nozzle lower cleaning part 536 , and the enlarged water outlet 5361 constitutes a water outlet hole that expands from the base side of the nozzle lower cleaning part 536 toward the end surface to the left and right. Thus, the cleaning water is discharged in a manner that spreads to the left and right directions from the enlarged water outlet 5361, and the corresponding width of the cleaning nozzle 51 can be cleaned relative to the back side (lower side) of the cleaning nozzle 51. As a result, the nozzle lower cleaning part 536 can be made into a smaller shape, and a larger water sprinkling effect relative to the back side of the cleaning nozzle 51 can be obtained.

[0034] As shown in FIG. 7 , on the upper side of the cleaning nozzle 51 , the upper cleaning section 535 of the nozzle as the cleaning section on the top of the nozzle is assembled with the cleaning nozzle 51 . A discharge port 5351 as a through hole constituting a water outlet is formed on the upper cleaning section 535 of the nozzle. The discharge port 5351 is not enlarged like the enlarged water outlet 5361 , so one discharge port 5351 discharges cleaning water to the top of the cleaning nozzle 51 in a narrower range than the enlarged water outlet 5361 . Such discharge ports 5351 are formed in multiples. Thus, the corresponding width of the cleaning nozzle 51 can be cleaned relative to the surface side (upper side) of the cleaning nozzle 51 . Therefore, the upper cleaning section 535 of the nozzle discharges cleaning water at a faster flow rate and a larger flow rate (flow rate per unit time, i.e., instantaneous flow rate) than the lower cleaning section 536 of the nozzle. Thus, the upper cleaning section 535 of the nozzle can be made into a smaller shape, and the flow rate effect of making the cleaning water discharge faster can be obtained on the top of the cleaning nozzle 51 .

[0035] On the upper side of the cleaning nozzle 51 and on the side close to the base relative to the front end of the cleaning nozzle 51, a silver ion supply unit 537 constituting a sterilizing water supply unit is provided as a component with the cleaning nozzle 51. The silver ion supply unit 537 supplies silver ions to the cleaning water to make the cleaning water sterilizing water, and can discharge water from the discharge port 5351 of the cleaning unit 535 on the upper side of the nozzle relative to the cleaning nozzle 51. In this way, the cleaning nozzle 51 can be sterilized.

[0036] The baffle portion 52 is arranged in the center of the left-right direction X on the front side of the functional portion protrusion 42. The baffle portion 52 is formed in a plate shape extending in the left-right direction X (lateral direction) of the toilet 2. When the baffle portion 52 is in the closed position, it is formed in a downwardly inclined plane shape that descends from the front side to the rear side (see FIG. 7, etc.).

[0037] The baffle portion 52 pushes the cleaning nozzle 51 from the back side as the cleaning nozzle 51 advances and retreats, thereby opening and closing the opening 432 of the functional portion front frame 43 formed in front of the cleaning nozzle 51. The functional portion front frame 43 is fixed to the base plate 41. An opening 432 (front opening) constituting the front opening of the cleaning nozzle 51 is formed in the functional portion front frame 43. The opening 432 is an open portion formed on the front side of the functional portion 4. When the baffle portion 52 is in the closed position, it is arranged at the opening 432 of the functional portion front frame 43.

[0038] As shown in Fig. 2 and Fig. 3, the warm air drying device 54 is arranged on the outside of one side in the left-right direction X behind the baffle portion 52 in the closed position. The warm air drying device 54 has a warm air outlet 541. The warm air outlet 541 is formed to open upward behind the opening portion 432 of the functional portion front frame 43. For example, the warm air drying device 54 can blow warm air from the warm air outlet 541 to the human body at a predetermined time after the cleaning operation of the sanitary cleaning device 5 when the baffle portion 52 is opened, or blow warm air to the back of the baffle portion 52 after cleaning to blow away water droplets when the baffle portion 52 is closed.

[0039] As shown in FIG10 , the sanitary cleaning device 5 has a cleaning water circuit 56, in which cleaning water for cleaning the front and back sides of the cleaning nozzle 51 and the baffle portion 52 flows. The cleaning water circuit 56 supplies cleaning water to the nozzle cleaning portion 53 and the baffle cleaning portion 6 as the device cleaning portion. In the present embodiment, cleaning includes cleaning using sterilized water (silver ion water, hypochlorous acid), high temperature water, foam cleaning, and the like.

[0040] As shown in FIG. 10 , the washing water circuit 56 includes a washing water supply flow path L1 for supplying washing water to the sanitary washing device 5, a baffle washing left flow path L2, a baffle washing right flow path L3, and a nozzle washing flow path L4. The nozzle washing flow path L4 is divided into a nozzle upper side flow path L41 and a nozzle lower side flow path L42 in the middle. The flow rate of washing water in the washing water supply flow path L1 is greater than the flow rate of washing water in the washing nozzle water circuit formed by the hose that allows the washing water discharged from the nozzle water outlet 51a of the washing nozzle 51 to the human body to flow to the washing nozzle 51. Thus, the washing nozzle 51 and the baffle part 52 can be washed with a sufficient flow of washing water. Moreover, the flow rate of washing water discharged from the nozzle washing part 53 and the baffle washing part 6 is greater than the flow rate of washing water discharged from the washing nozzle 51. Thus, the washing nozzle 51 can be washed with a sufficient water outlet flow rate. The above-mentioned "flow rate" refers to the instantaneous flow rate (flow rate per unit time).

[0041] The cleaning water circuit 56 includes the nozzle cleaning unit 53 , the baffle cleaning unit 6 , the solenoid valve 571 , the pressure reducing valve 572 , the vacuum breaker 573 , and the disc valve 564 , and performs each cleaning operation of the sanitary cleaning device 5 .

[0042] The left side flow path L2 for baffle cleaning, the right side flow path L3 for baffle cleaning, the nozzle cleaning flow path L4, the nozzle upper side flow path L41, and the nozzle lower side flow path L42 are, for example, formed by a rubber hose, and they constitute a device washing part water circuit as a water circuit different from the washing nozzle water circuit constituted by the hose that allows the washing water discharged from the nozzle outlet 51a of the washing nozzle 51 to the human body to flow to the washing nozzle 51. Here, "different water circuits" do not mean opening and closing in a common water supply valve, but that each water circuit has a water supply valve that is opened and closed independently. That is, the washing water circuit 56 is configured to include the electromagnetic valve 571, but another water supply valve (water supply valve for washing nozzle) that can be opened and closed independently of the electromagnetic valve 571 is provided in the washing nozzle water circuit not shown. The right side flow path L3 for baffle cleaning constitutes a dedicated water circuit that allows washing water to flow only to the baffle cleaning part 6. The nozzle cleaning flow path L4 (the nozzle upper side flow path L41, the nozzle lower side flow path L42) constitutes a dedicated water circuit that allows cleaning water to flow only to the nozzle cleaning part 53. As a result, the nozzle cleaning part 53 can be used to clean the nozzle 51 at the same time as the cleaning operation, and the flow rate of each can be kept constant. In addition, the nozzle cleaning can be performed first and then the baffle cleaning can be performed, thereby allowing the dirt generated during the nozzle cleaning to be washed to the outside of the main body of the functional part (the base plate 41, the housing component 411) through the baffle cleaning.

[0043] The electromagnetic valve 571, the pressure reducing valve 572, the vacuum breaker 573 and the disc valve 564 are sequentially arranged and connected in the cleaning water supply flow path L1. The switching operation of the electromagnetic valve 571 and the disc valve 564 is controlled by the cleaning control unit 55. The cleaning control unit 55 controls the switching operation of the electromagnetic valve 571 and the disc valve 564 to release the cleaning water from the nozzle cleaning unit 53 and the baffle cleaning unit 6.

[0044] The end of the upstream side of the left flow path L2 for baffle cleaning is connected to the disc valve 564, and the end of the downstream side of the left flow path L2 for baffle cleaning is connected to the inlet 615 at the left end of the baffle cleaning part 6. The end of the upstream side of the right flow path L3 for baffle cleaning is connected to the disc valve 564, and the end of the downstream side of the right flow path L3 for baffle cleaning is connected to the inlet 616 at the left end of the baffle cleaning part 6. The cleaning water flowing into the inlet 615 and 616 flows through the flow path inside the baffle cleaning part 6, and the water is discharged from the front water outlet 611 and the back water outlet 621 of the baffle cleaning part 6.

[0045] The upstream end of the nozzle cleaning flow path L4 is connected to the disc valve 564, the downstream end of the nozzle upper side flow path L41 after the nozzle cleaning flow path L4 is branched is connected to the nozzle upper cleaning part 535 of the nozzle cleaning part 53, and the downstream end of the nozzle lower side flow path L42 is connected to the nozzle lower cleaning part 536 of the nozzle cleaning part 53. The cleaning water flowing to the nozzle upper cleaning part 535 is discharged from the discharge port 5351 of the nozzle upper cleaning part 535 relative to the upper side of the cleaning nozzle 51. The cleaning water flowing to the nozzle lower side cleaning part 536 is discharged from the discharge port 5361 of the nozzle lower side cleaning part 536 relative to the lower side of the cleaning nozzle 51.

[0046] The baffle cleaning unit 6 cleans the front surface 52a and the back surface 52b (see FIG. 7 ) of the cleaning baffle unit 52 when the baffle unit 52 closes the opening 432. The baffle cleaning unit 6 is disposed above the upper end of the baffle unit 52. When the baffle unit 52 is in the closed position closing the opening 432, the baffle cleaning unit 6 discharges the cleaning water downward relative to the baffle unit 5.

[0047] In the present embodiment, "the state in which the baffle portion 52 closes the opening portion 432" and "the state in which the baffle portion 52 is located at the closed position to close the opening portion 432" mean that the baffle portion 52 may not completely close the opening portion 432. "The state in which the baffle portion 52 closes the opening portion 432" and "the state in which the baffle portion 52 is located at the closed position to close the opening portion 432" also include, for example, a state in which the baffle portion 52 substantially blocks the opening portion 432 when the baffle portion 52 is pushed by the cleaning nozzle 51 and slightly opened.

[0048] As shown in FIGS. 5 , 6 and 7 , the baffle cleaning section 6 includes a front cleaning water outlet 61 (front cleaning section), a rear cleaning water outlet 62 (back cleaning section), a support section 64 and a cleaning section fixed section 66 .

[0049] As shown in Fig. 5 and Fig. 6, the front washing water outlet 61 has a plurality of front water outlets 611. The plurality of front water outlets 611 discharge washing water toward the front 52a of the baffle 52. The back washing water outlet 62 has a plurality of back water outlets 621. The plurality of back water outlets 621 discharge washing water toward the back 52b of the baffle 52. A hydrophilic treatment or embossing process for diffusing washing water is applied to the front 52a and the back 52b of the baffle 52. Such a hydrophilic treatment may be applied only to at least one of the front 52a and the back 52b, and the hydrophilic treatment is not limited to the embossing process.

[0050] The front washing water outlet 61 and the back washing water outlet 62 discharge the washing water temporarily flowing through the washing water circulation part 63. As shown in Figs. 2 and 3, the washing water circulation part 63 is arranged inside the housing member 411 at the upper part of the front part of the functional part 4. The washing water circulation part 63 is formed in a hollow shape extending in the left-right direction X. The lower surface 632 of the washing water circulation part 63 is formed in a flat surface having a width in the front-back direction Y and extending in the left-right direction X.

[0051] A plurality of front water outlets 611 of the front water outlet 61 and a plurality of back water outlets 621 of the back water outlet 62 are formed on the lower surface 632 of the washing water circulation part 63. As shown in FIG4 , the two ends of the washing water circulation part 63 in the left-right direction X respectively have an inlet 615 and an inlet 616 connected to the end of the downstream side of the left flow path L2 of the baffle cleaning and the end of the downstream side of the right flow path L3 of the baffle cleaning. The inlet 615 and the inlet 616 are welded to the baffle cleaning part 6 as a whole. The washing water is introduced and circulated in the washing water circulation part 63 via the left flow path L2 of the baffle cleaning and the right flow path L3 of the baffle cleaning. The washing water temporarily circulated in the washing water circulation part 63 is discharged to the baffle part 52 through the plurality of front water outlets 611 of the front water outlet 61 and the plurality of back water outlets 621 of the back water outlet 62.

[0052] As shown in Fig. 5 and Fig. 6, the plurality of front water outlets 611 and the plurality of back water outlets 621 are arranged in two rows in front and back on the lower surface 632 of the washing water circulation portion 63. The plurality of front water outlets 611 are arranged on the front side of the lower surface 632 of the washing water circulation portion 63 in the front-to-back direction Y, and the plurality of back water outlets 621 are arranged on the rear side in the front-to-back direction Y. The plurality of front water outlets 611 and the plurality of back water outlets 621 are staggered from each other in the region in the left-right direction X where the baffle portion 52 is provided so that the positions in the left-right direction X do not overlap, and are arranged in a straight line in the left-right direction X.

[0053] As shown in FIG7 , the plurality of front water outlets 611 are formed by through holes that penetrate the lower surface 632 of the washing water circulation portion 63 obliquely in the up-down direction Z at the front side of the lower surface 632 of the washing water circulation portion 63 in the front-back direction Y. As shown in FIG5 , the plurality of front water outlets 611 open downwardly in a manner that allows washing water to flow along the front surface 52a of the baffle portion 52 when the baffle portion 52 is in the closed position.

[0054] The plurality of front water outlets 611 open downward in the direction of the upper end curved portion 521 of the baffle portion 52. Thus, the washing water discharged from the plurality of front water outlets 611 is discharged along the upper end curved portion 521 of the baffle portion 52 and flows along the front face 52a of the baffle portion 52, thereby washing the front face 52a of the baffle portion 52. Furthermore, since the water discharge direction from the water outlets 611 is parallel to the front face 52a of the baffle portion 52, it is less likely to be affected by the deviation of the baffle portion 52. In addition, even when washing water is discharged from the front water outlets 611 and the back water outlets 621 in a state where the baffle portion 52 is removed, it is possible to prevent the washing water from the plurality of front water outlets 611 and the back water outlets 621 from splashing on the human body.

[0055] As shown in FIG7 , the plurality of rear water outlets 621 are formed by through holes that penetrate the lower surface 632 of the washing water circulation portion 63 obliquely in the up-down direction Z at the rear side of the plurality of front water outlets 611 of the lower surface 632 of the washing water circulation portion 63 in the rearward and backward direction Y. As shown in FIG5 , the plurality of rear water outlets 621 open downward in a manner that allows washing water to flow along the rear surface 52 b (see FIG7 ) of the washing water circulation portion 52 when the baffle portion 52 is in the closed position.

[0056] The plurality of back water outlets 621 open in a direction along the back side 52b of the baffle portion 52, that is, downward. Thus, the cleaning water released from the plurality of back water outlets 621 is released in a manner along the back side 52b of the baffle portion 52, and by flowing along the back side 52b of the baffle portion 52, the back side 52b of the baffle portion 52 can be cleaned. In addition, the direction of the opening is the direction in which the baffle cleaning portion 6 releases the cleaning water in a direction in which the electronic components not shown and housed inside the functional portion 4 are not configured. Here, the "direction in which the electronic components are not configured" includes not only a direction in which the electronic components are not configured on the extension line of the water outlet direction of the cleaning water released from the baffle cleaning portion 6, but also a direction in which the cleaning water released from the baffle cleaning portion 6 does not splash on the electronic components. Therefore, it is possible to avoid water splashing on the electronic components.

[0057] In addition, a plurality of front water outlets 611 and rear water outlets 621 are formed at the lower part 632. Since the number of the nozzle water outlets 51a of the cleaning nozzle 51 is small and the total opening area is small, the flow rate of the cleaning water released from the nozzle cleaning part 53 is faster than the flow rate of the cleaning water released from the baffle cleaning part 6. Thus, a strong cleaning effect can be obtained with respect to the cleaning nozzle 51. In addition, the flow rate of the cleaning water released from the baffle cleaning part 6 is greater than the flow rate of the cleaning water released from the nozzle cleaning part 53. Thus, the surface and the back of the baffle part 52 having a larger surface area than the cleaning nozzle 51 can be fully cleaned.

[0058] 4, a pair of support parts 64 are provided at a predetermined interval in the central portion of the baffle cleaning part 6 in the longitudinal direction of the baffle cleaning part 6. The support parts 64 are formed of a plate-like member fixed integrally to the baffle cleaning part 6 and having a positional relationship orthogonal to the longitudinal direction of the baffle cleaning part 6.

[0059] A rotation axis engaging portion 643 is formed at the upper front portion of the support portion 64. The rotation axis 583 of the baffle portion 52 is detachably engaged with the rotation axis engaging portion 643. The baffle portion 52 is rotatably supported by the baffle cleaning portion 6 by engaging the rotation axis 583 of the baffle portion 52 with the rotation axis engaging portion 643. Thus, the baffle portion 52 and the baffle cleaning portion 6 can be made into an integral component, and the deviation of the baffle portion 52, which is the object to be discharged, can be minimized.

[0060] The rear end portion 642 of the support portion 64 abuts against the support frame 501 that supports the cleaning nozzle 51. Thus, the baffle cleaning portion 6 is supported on the base plate 41 at a position separated from the inlet 615 and the inlet 616 welded to the baffle cleaning portion 6. Therefore, when the baffle portion 52 is mounted on the baffle arm 58 that is engaged by pressing the rotating shaft 583 into the rotating shaft engaging portion 643, it is possible to prevent the support portion 64 abutting against the support frame 501 from overcoming the pressing force and causing the baffle cleaning portion 6 to bend.

[0061] 7 , the rear end portion 642 of the support portion 64 abuts against the support frame 501 assembled with the cleaning nozzle 51. Thus, the shutter cleaning portion 6 is positioned relative to the cleaning nozzle 51. Thus, the positional deviation of the shutter cleaning portion 6 relative to the cleaning nozzle 51 can be suppressed.

[0062] The cleaning section fixing portion 66 is provided integrally with the baffle cleaning section 6 at a central position in the length direction of the baffle cleaning section 6 closer to the inlet 615 and the inlet 616 of the baffle cleaning section 6. The cleaning section fixing portion 66 is fixed to the base plate 41 by screws, thereby fixing the baffle cleaning section 6 to the base plate 41.

[0063] A baffle arm 58 supporting the baffle portion 52 is fixed to the back surface 52b of the baffle portion 52. The baffle arm 58 includes a supported portion 581 extending in the longitudinal direction of the baffle portion 52 and a pair of plate-shaped baffle fixing portions 582 extending downward from both ends of the supported portion 581. The baffle portion 52 is fixed to the lower portion of the baffle fixing portion 582, thereby supporting the baffle portion 52 by the baffle arm 58. A rotating shaft 583 penetrates the supported portion 581. The rotating shaft 583 is engaged with the rotating shaft engaging portion 643. Thus, the baffle portion 52 and the baffle arm 58 are supported rotatably relative to the supporting portion 64.

[0064] Next, the timing at which the cleaning control unit 55 causes the cleaning head 51 , the head cleaning unit 53 , and the shutter cleaning unit 6 to perform the cleaning operation will be described.

[0065] 11 , washing control unit 55 controls each washing operation of sanitary washing device 5. Washing control unit 55 controls washing water circuit 56 to perform control related to washing of sanitary washing device 5.

[0066] First, when the cleaning nozzle 51 is located at the storage position (“Storage” in FIG. 11 ), the cleaning control unit 55 controls the front cleaning by releasing cleaning water from the cleaning nozzle 51 and the nozzle cleaning unit 53. Next, the cleaning control unit 55 controls the local cleaning action (“Buttocks Cleaning” in FIG. 11 ) by moving the cleaning nozzle 51 forward to a position protruding from the baffle portion 52, i.e., the forward position (“Cleaning Position” in FIG. 11 ) and releasing cleaning water from the cleaning nozzle 51 to clean the user's local area.

[0067] Next, the cleaning control unit 55 controls the cleaning nozzle 51 to retreat and return the cleaning nozzle 51 to the storage position ("storage" in FIG. 11). At the same time, the cleaning control unit 55 controls the release of cleaning water from the nozzle upper cleaning unit 535 and the nozzle lower cleaning unit 536 of the nozzle cleaning unit 53, and controls the cleaning nozzle 51 in the middle of retreating to the storage position and the cleaning nozzle 51 in the state of retreating to the storage position. Then, the cleaning control unit 55 stops the release of cleaning water from the nozzle upper cleaning unit 535 and the nozzle lower cleaning unit 536 of the nozzle cleaning unit 53.

[0068] Next, the cleaning control unit 55 starts to control the discharge of cleaning water from the front water outlet 611 and the back water outlet 621 of the baffle cleaning unit 6 to the closed baffle unit 52. Thus, the cleaning water can flow along the front 52a and the back 52b of the baffle unit 52, and the cleaning water can be prevented from strongly contacting the baffle unit 52 and scattering.

[0069] Then, after a predetermined time has passed, the cleaning control unit 55 performs control to stop the discharge of the cleaning water from the front water outlet 611 and the back water outlet 621 of the baffle cleaning unit 6. That is, after the cleaning of the cleaning nozzle 51 by the nozzle cleaning unit 53 starts, the cleaning of the baffle unit 52 by the baffle cleaning unit 6 starts, and after the cleaning of the cleaning nozzle 51 by the nozzle cleaning unit 53 ends, the cleaning of the baffle unit 52 by the baffle cleaning unit 6 ends. Thus, in the case where dirt scattered by the cleaning of the cleaning nozzle 51 adheres to the baffle unit 52, the dirt can be removed by cleaning the baffle unit 52.

[0070] After that, after the user leaves the toilet seat, the cleaning control unit 55 controls the cleaning nozzle 51 to move forward to the forward exit position (the "cleaning position" in FIG. 11). Next, the cleaning control unit 55 controls the cleaning nozzle 51 to move backward and return the cleaning nozzle 51 to the storage position (the "storage" in FIG. 11). At the same time, the cleaning control unit 55 controls post-cleaning by releasing cleaning from the nozzle cleaning unit 53.

[0071] In the post-cleaning, the amount, flow rate (instantaneous flow rate), and flow velocity of the washing water discharged from the nozzle cleaning unit 53 are greater than those in the pre-cleaning. Thus, more washing water can be used for the pre-cleaning on the washing nozzle 51 which is almost free of dirt than for the post-cleaning on the washing nozzle 51 which is covered with dirt.

[0072] Next, the cleaning control unit 55 controls the silver ion supply unit 537 to supply silver ions to the cleaning water after the post-cleaning, so that the cleaning water becomes sterile water and is discharged from the discharge port 5351 of the upper cleaning unit 535 of the nozzle to the cleaning nozzle 51. That is, the silver ion supply unit 537 and the upper cleaning unit 535 of the nozzle as the sterile water supply unit discharge the sterile water to the cleaning nozzle 51 after the user leaves the toilet seat, that is, after the post-cleaning. Thus, the cleaning nozzle 51 can be sterilized by the sterile water in a state where dirt is reliably removed by the post-cleaning and when the user is not sitting. Therefore, although the sterilization requires a specified time, the specified time can be ensured after the sterile water is discharged.

[0073] Although preferred embodiments of the present disclosure have been described, the present disclosure is not limited to the above-described embodiments and can be appropriately modified.

[0074] For example, as shown in FIG. 12 , as another embodiment, after the cleaning water is released from the cleaning nozzle 51 and the local cleaning action of cleaning the user's local parts ("hip cleaning" in FIG. 12 ) is completed, and the cleaning water is released from the nozzle upper cleaning part 535 and the nozzle lower cleaning part 536 of the nozzle cleaning part 53, after the cleaning of the cleaning nozzle 51 is started, before the cleaning nozzle 51 moves to the storage position ("storage" in FIG. 12 ), the post-cleaning of releasing the sterilizing water relative to the cleaning nozzle 51 is started. Then, after the cleaning of the cleaning nozzle 51 is completed by releasing the cleaning water from the nozzle upper cleaning part 535 and the nozzle lower cleaning part 536 of the nozzle cleaning part 53, the post-cleaning can be completed. In this case, the application of the sterilizing water to the cleaning nozzle 51 can be completed after the cleaning of the cleaning nozzle 51 is completed.

[0075] For example, the housing cleaning unit may have a structure that discharges cleaning water and cleans the housing member 411 as the housing of the main body, and has a dedicated water circuit that allows the cleaning water to flow only to the housing cleaning unit. In this case, the housing cleaning unit can clean the main body housing after cleaning the baffle plate by the baffle plate cleaning unit.

[0076] In addition, for example, the base cleaning unit may have a structure that releases cleaning water and cleans the base component, and has a dedicated water circuit that allows the cleaning water to flow only to the base cleaning unit. In this case, the base cleaning unit can clean the base component after cleaning the baffle plate unit through the baffle plate cleaning unit.

[0077] Description of Reference Numerals

[0078] 1 toilet device, 2 toilet, 4 functional part, 5 sanitary cleaning device, 6 baffle cleaning part (device cleaning part), 41 base plate (base part), 51 cleaning nozzle, 52 baffle part, 53 nozzle cleaning part (device cleaning part), 61 front cleaning water outlet part (front side cleaning part), 62 back cleaning water outlet part (back side cleaning part), 64 supporting part, 535 nozzle upper cleaning part (sterilizing water supply part), 536 nozzle lower cleaning part, 537 silver ion supply part (sterilizing water supply part), L2 baffle cleaning left side flow path (device cleaning part water circuit), L3 baffle cleaning right side flow path (device cleaning part water circuit), L4 nozzle cleaning flow path (device cleaning part water circuit).

Claims

1. A sanitary cleaning device, which is arranged in a functional part of a toilet and has a human body cleaning function, characterized in that: have: A cleaning nozzle, which is configured to be able to move forward and backward between a storage position and a forward position; A nozzle cleaning unit that releases cleaning water to clean the cleaning nozzle; The flow rate of the washing water discharged from the nozzle cleaning portion is greater than the flow rate of the washing water discharged from the washing nozzle.

2. The sanitary cleaning device according to claim 1, characterized in that: The nozzle cleaning unit includes a nozzle upper cleaning unit for releasing cleaning water to clean the upper surface of the cleaning nozzle and a nozzle lower cleaning unit for releasing cleaning water to clean the lower surface of the cleaning nozzle. The nozzle upper surface cleaning portion discharges cleaning water at a flow rate faster than that of the nozzle lower surface cleaning portion.

3. The sanitary cleaning device according to claim 2, characterized in that: The nozzle upper surface cleaning portion discharges cleaning water at a greater flow rate than the nozzle lower surface cleaning portion.

4. The sanitary cleaning device according to claim 2 or 3, characterized in that: The water outlet hole of the cleaning portion below the nozzle has a water outlet for discharging cleaning water in a diffused manner from the cleaning portion below the nozzle.

5. The sanitary cleaning device according to any one of claims 2 to 4, characterized in that: The water outlet hole of the upper cleaning portion of the nozzle has a water outlet that discharges the cleaning water in a narrower range than the cleaning water discharged from the water outlet hole of the lower cleaning portion of the nozzle.

6. A toilet device, characterized in that: have: toilet; A functional part arranged at the rear of the toilet; The sanitary cleaning device according to any one of claims 1 to 5.

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