MOF nano flame retardant with porous hollow structure and preparation method of MOF nano flame retardant

By preparing porous hollow structure MOF nano-flame retardant, using in-situ HCl etching and hole structure, and combining the size mismatch between 0D phosphorus nitrogen flame retardant and 3D ZIF-67 material, the problem of existing flame retardants in epoxy resin has been solved. It solves the problems of low flame retardant efficiency and reduced mechanical properties, and achieves the effects of efficient smoke suppression and improved mechanical properties.

CN119306965AActive Publication Date: 2025-01-14BEIJING INST OF TECH

Patent Information

Application Number
CN202411440000.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-10-15
Publication Date
2025-01-14
Estimated Expiration
2044-10-15

AI Technical Summary

Technical Problem

The existing flame retardant agents have low flame retardant efficiency and poor smoke suppression effects in epoxy resins, and are prone to agglomeration, resulting in a decrease in the mechanical properties of the matrix.

Method used

Design and prepare a porous hollow structure MOF nano-flame retardant. The hollow structure is formed by in-situ HCl etching, and holes are drilled on the surface. It combines the size mismatch structure of the 0D phosphorus nitrogen flame retardant and the 3D ZIF-67 material to improve dispersion. properties and mass transfer effects.

Benefits of technology

It achieves efficient smoke suppression and mass transfer effects, improves the dispersion of flame-retardant fillers in the polymer matrix, ensures the mechanical properties of the material, and significantly improves the bending and tensile strength of epoxy resin.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention relates to an MOF nano flame retardant with a porous hollow structure and a preparation method of the MOF nano flame retardant, and belongs to the crossing field of a nanotechnology and a flame retardant technology. The MOF nano flame retardant with the porous hollow structure, provided by the invention, is different from an existing flame retardant etching preparation method, and the MOF nano flame retardant with the porous hollow structure is prepared by adopting a mode of generating hydrochloric acid in situ and slowly blowing out redundant acid gas by nitrogen to ensure that excessive etching does not occur, and performing acid etching and chambering in situ. The MOF nano flame retardant with the porous hollow structure, provided by the invention, is different from an existing MOF structure, the mass transfer effect is improved by chambering, the mass transfer and heat conduction effects are good, and the decomposition temperature is high.
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Citation Information

Patent Citations

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