Transparent substrate with anti-glare layer, method for manufacturing transparent substrate with anti-glare layer, and image display device

Abstract

The present invention provides a transparent substrate with an anti-glare layer, which is provided with a transparent substrate having two main surfaces, and an anti-glare layer and an anti-reflection layer that are provided in this order on at least one main surface of the transparent substrate, the haze value of the transparent substrate with the anti-glare layer being 30% or more, and the skewness Ssk of the surface having the anti-glare layer being 0.4 or less. The anti-glare layer contains fine particles, and the difference between the thickness of the anti-glare layer and the average particle diameter of the fine particles is 4 [mu] m or less.

Description

Technical Field

[0001] The present invention relates to a transparent substrate with an anti-glare layer, a method for producing the transparent substrate with an anti-glare layer, and an image display device. Background Art

[0002] In recent years, from the viewpoint of aesthetics, a method of providing a transparent substrate such as a cover glass in front of an image display device such as a liquid crystal display (LCD) has been used. However, reflection of external light in the transparent substrate has become one of the problems.

[0003] In the past, in order to prevent the reflection of external light, a transparent substrate with an anti-glare layer (hereinafter, also referred to as a transparent substrate with an anti-glare layer) is known (for example, Patent Documents 1 and 2). The anti-glare layer diffuses the specular reflected light by having a concavo-convex shape on its single side, thereby increasing the haze value and imparting anti-glare properties.

[0004] As a transparent substrate provided with an anti-glare layer, Patent Document 1 discloses a front plate for a display device having an anti-glare layer composed of particles having an average diameter of 1 μm to 10 μm dispersed in a resin matrix.

[0005] Patent Document 2 discloses an antiglare film having a skewness Rsk of less than 0 and a surface shape in which the average length RSm of roughness curve elements is 1 to 50 μm.

[0006] Conventional transparent substrates with antiglare layers have low haze values ​​(eg, less than 30%), and the surface of such transparent substrates with antiglare layers does not become cloudy even when wiped with a cloth to remove dirt such as fingerprints attached to the surface.

[0007] Prior art literature

[0008] Patent Literature

[0009] Patent Document 1: International Publication No. 2019 / 017072

[0010] Patent Document 2: Japanese Patent No. 6824939 Summary of the invention

[0011] In recent years, image display devices have been increasingly becoming larger. In large-sized image display devices, the problem of reflection is more significant than in small and medium-sized image display devices, and thus a transparent substrate with an anti-glare layer having a higher haze value is required.

[0012] The present inventors have found a new problem that, in a transparent substrate with an antiglare layer having such a high haze value (for example, 30% or more), the surface becomes cloudy when it is wiped with a cloth or the like in order to remove dirt attached to the surface.

[0013] The present inventors have also found that the cloudiness of the surface of a transparent substrate with an antiglare layer having a high haze value is caused by the fibers of the cloth being caught on the uneven shape of the antiglare layer when wiping with a cloth or the like.

[0014] On the other hand, Patent Documents 1 and 2 do not pay attention to the new problem of cloudiness in a transparent substrate with an antiglare layer having a high haze.

[0015] Therefore, in view of the newly discovered above-mentioned problems, the object of the present invention is to provide a transparent substrate with an anti-glare layer, which has excellent anti-glare properties and does not produce white turbidity on the surface when the surface of the transparent substrate with the anti-glare layer is wiped with a cloth. In addition, the object of the present invention is also to provide a method for manufacturing a transparent substrate with an anti-glare layer and an image display device having the transparent substrate with the anti-glare layer.

[0016] As a result of intensive studies, the present inventors have found that the above-mentioned problems can be solved by adjusting the concavo-convex shape in the anti-glare layer, thereby completing the present invention.

[0017] That is, the present invention has the following configurations.

[0018] [1] A transparent substrate with an anti-glare layer, comprising:

[0019] a transparent substrate having two major surfaces, and

[0020] An anti-glare layer and an anti-reflection layer are sequentially provided on at least one main surface of the transparent substrate.

[0021] The haze value of the transparent substrate with the antiglare layer is 30% or more, and the skewness Ssk of the surface on the side with the antiglare layer is 0.4 or less.

[0022] The anti-glare layer contains fine particles, and the difference between the thickness of the anti-glare layer and the average particle size of the fine particles is 4 μm or less.

[0023] [2] The transparent substrate with an antiglare layer according to [1], wherein the coefficient of dynamic friction of the surface having the antiglare layer is 0.3 or less.

[0024] [3] The transparent substrate with an antiglare layer according to [1] or [2], wherein the fine particles are spherical.

[0025] [4] The transparent substrate with an antiglare layer according to any one of [1] to [3], wherein the fine particles include resin particles.

[0026] [5] The transparent substrate with an antiglare layer according to any one of [1] to [3], wherein the fine particles include silica particles.

[0027] [6] The transparent substrate with an anti-glare layer according to any one of [1] to [5], wherein the anti-reflection layer has a laminated structure of at least two dielectric layers having different refractive indices.

[0028] [7] A transparent substrate with an anti-glare layer according to [6], wherein at least one of the dielectric layers is mainly composed of an oxide of at least one element selected from Si, Nb, Ti, Zr, Ta, Al, Sn and In, or a nitride of at least one element selected from Si and Al.

[0029] [8] The transparent substrate with an antiglare layer according to [6], wherein at least one of the dielectric layers is mainly composed of an oxide of Si, and at least one other layer of the layers in the stacked structure is mainly composed of a mixed oxide of an oxide of at least one element selected from Group A and an oxide of at least one element selected from Group B,

[0030] The A group consists of Mo and W, and the B group consists of Si, Nb, Ti, Zr, Ta, Al, Sn and In.

[0031] The content of the B group element contained in the mixed oxide relative to the total of the A group element contained in the mixed oxide and the B group element contained in the mixed oxide is 65 mass % or less.

[0032] [9] The transparent substrate with an antiglare layer according to any one of [1] to [8], further comprising an antifouling film on the antireflection layer.

[0033]

[10] The transparent substrate with an antiglare layer according to any one of [1] to [9], wherein the transparent substrate comprises glass.

[0034]

[11] The transparent substrate with an antiglare layer according to any one of [1] to [9], wherein the transparent substrate contains a resin.

[0035]

[12] A method for producing a transparent substrate with an antiglare layer, which is the method for producing a transparent substrate with an antiglare layer described in any one of [1] to

[11] ,

[0036] An antiglare layer is formed on at least one surface of a transparent substrate, and an antireflection layer is formed on the surface of the antiglare layer by a dry method.

[0037]

[13] A method for producing a transparent substrate with an antiglare layer, which is the method for producing a transparent substrate with an antiglare layer described in any one of [1] to

[11] ,

[0038] An antiglare layer is formed on at least one surface of a transparent substrate, and an antireflection layer is formed on the surface of the antiglare layer by a wet method.

[0039]

[14] An image display device comprising the transparent substrate with an antiglare layer according to any one of [1] to

[11] .

[0040] In the present invention, a transparent substrate with an anti-glare layer can be provided, which has excellent anti-glare properties, and when the surface of the transparent substrate with the anti-glare layer is wiped with a cloth, the surface turbidity is suppressed. Due to the above characteristics, the transparent substrate with an anti-glare layer of one embodiment of the present invention is suitable as a cover glass of an image display device.

[0041] Furthermore, according to the method for producing a transparent substrate with an antiglare layer of the present invention, a transparent substrate with an antiglare layer having the above-mentioned characteristics can be produced.

[0042] Moreover, according to one embodiment of the present invention, there can be provided an image display device including the transparent substrate with the antiglare layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] Figure 1 This is a cross-sectional view schematically showing a configuration example of a transparent substrate with an antiglare layer according to one embodiment of the present invention.

[0044] Figure 2 is a cross-sectional view of the anti-glare layer and is a schematic diagram showing the thickness of the anti-glare layer.

[0045] Figure 3 (A) to (F) are laser microscope photographs of the surface shapes of the transparent substrates with antiglare layers of Examples 1 to 6.

[0046] Figure 4 (A) and (B) are laser microscope photographs of the surface shapes of the transparent substrates with anti-glare layers in Examples 7 and 8.

[0047] Figure 5 (A) to (E) are laser microscope photographs of the surface shapes of the transparent substrates with antiglare layers of Examples 9 to 13.

[0048] Figure 6 (A) to (E) are laser microscope photographs of the surface shapes of the transparent substrates with antiglare layers of Examples 14 to 18.

[0049] Figure 7 (A) to (H) are scanning electron micrographs of cross sections of the transparent substrates with antiglare layers of Examples 1 to 8. DETAILED DESCRIPTION

[0050] Hereinafter, embodiments of the present invention will be described in detail.

[0051] It should be noted that in this specification, the presence of another layer, film, etc. on the main surface of a substrate such as a transparent substrate, on a layer such as an anti-glare layer, on a layer such as an anti-reflection layer, etc., does not limit the manner in which the other layer, film, etc. is provided in contact with the above-mentioned main surface, layer or film, as long as the layer, film, etc. is provided in the upper direction thereof. For example, the presence of an anti-glare layer on the main surface of a transparent substrate means that the anti-glare layer can be provided in contact with the main surface of the transparent substrate, and any other layer, film, etc. can be provided between the transparent substrate and the anti-glare layer.

[0052] Figure 1 This is a cross-sectional view schematically showing a configuration example of a transparent substrate with an antiglare layer according to one embodiment of the present invention. Figure 1 In the transparent substrate 100 with an anti-glare layer shown, an anti-glare layer 130 is formed on a transparent substrate 110 , and an anti-reflection layer 120 is formed on the anti-glare layer 130 .

[0053] <<Transparent substrate with anti-glare layer>>

[0054] The transparent substrate with an anti-glare layer involved in this embodiment is characterized in that it comprises: a transparent substrate having two main surfaces and an anti-glare layer and an anti-reflection layer sequentially provided on at least one main surface of the transparent substrate, the haze value of the transparent substrate with the anti-glare layer is greater than 30%, and the skewness Ssk of the surface on the side having the anti-reflection layer is less than 0.4, the anti-glare layer contains microparticles, and the difference between the thickness of the anti-glare layer and the average particle size of the microparticles is less than 4μm.

[0055] <Transparent substrate>

[0056] The transparent substrate in this embodiment has two main surfaces. It should be noted that "transparent" in the transparent substrate means that the visible light transmittance is 50% or more. The visible light transmittance is measured in accordance with JIS Z 8709:1999.

[0057] In the present embodiment, the refractive index of the transparent substrate is preferably 1.4 to 1.7.

[0058] If the refractive index of the transparent substrate is within the above range, reflection of the bonding surface can be sufficiently suppressed when optically bonding a display, a touch panel, etc. The refractive index is more preferably 1.45 or more, and further preferably 1.47 or more, and more preferably 1.65 or less, and further preferably 1.6 or less.

[0059] In the present embodiment, the transparent substrate is not particularly limited as long as it is a “transparent” member. Examples of the transparent substrate include glass and resin.

[0060] When the transparent substrate includes glass, the type of glass is not particularly limited, and glasses having various compositions can be used. Among them, the glass preferably includes sodium, and preferably has a composition that can be molded and strengthened by chemical strengthening treatment. Specifically, for example, aluminosilicate glass, soda-lime glass, borosilicate glass, lead glass, alkaline barium glass, aluminoborosilicate glass, etc. can be cited.

[0061] It should be noted that, in this specification, when a transparent substrate includes glass, the transparent substrate is also referred to as a glass substrate.

[0062] The thickness of the glass substrate is not particularly limited, but in order to effectively perform chemical strengthening when the glass is subjected to chemical strengthening treatment, it is preferably 5 mm or less, more preferably 3 mm or less, and further preferably 1.5 mm or less. In addition, it is usually 0.2 mm or more.

[0063] The glass substrate is preferably a chemically strengthened glass that has been chemically strengthened. This improves the strength of the transparent substrate with an anti-glare layer. It should be noted that when the glass substrate is chemically strengthened, it is performed after the anti-glare layer described below is provided and before the anti-reflection layer is formed.

[0064] When the transparent substrate includes a resin, the type of resin is not particularly limited, and resins with various compositions can be used. Among them, the above-mentioned resin is preferably a thermoplastic resin or a thermosetting resin, for example, polyvinyl chloride resin, polyethylene resin, polypropylene resin, polystyrene resin, polyvinyl acetate resin, polyester resin, polyurethane resin, cellulose resin, acrylic resin, AS (acrylonitrile-styrene) resin, ABS (acrylonitrile-butadiene-styrene) resin, fluorine resin, thermoplastic elastomer, polyamide resin, polyimide resin, polyacetal resin, polycarbonate resin, modified polyphenylene ether resin, polyethylene terephthalate resin, polybutylene terephthalate resin, polylactic acid resin, cyclic polyolefin resin, polyphenylene sulfide resin, silicone resin, etc. Among these, cellulose resin (for example, triacetyl cellulose resin), polycarbonate resin, polyethylene terephthalate resin, etc. are preferred. These resins can be used alone or in combination of two or more.

[0065] The resin particularly preferably includes at least one resin selected from the group consisting of polyethylene terephthalate resin, polycarbonate resin, acrylic resin, silicone resin, and triacetyl cellulose resin.

[0066] In addition, in this specification, when a transparent substrate contains a resin, the transparent substrate is also referred to as a resin substrate.

[0067] The shape of the resin substrate is not particularly limited, and may be a film or a plate. From the viewpoint of preventing scattering, a film is preferred.

[0068] When the shape of the resin substrate is a thin film, that is, a resin film, the thickness thereof is not particularly limited, but is preferably 20 to 250 μm, and more preferably 40 to 188 μm.

[0069] When the resin substrate is in the form of a plate, that is, a resin plate, its thickness is not particularly limited, but is usually preferably 5 mm or less, more preferably 3 mm or less, and further preferably 1.5 mm or less. In addition, it is usually 0.2 mm or more.

[0070] When the transparent substrate includes both glass and resin, for example, the resin substrate may be provided on the glass substrate.

[0071] <Anti-glare layer>

[0072] The anti-glare layer (hereinafter also referred to as AG layer) in this embodiment is disposed on at least one main surface of the transparent substrate. Since the anti-glare layer has a concave-convex shape or internal scattering on one side, it has the function of diffusing specular reflected light, increasing the haze value, reducing glare and reflection.

[0073] like Figure 1 As shown, the anti-glare layer 130 is composed of a matrix 132 and microparticles 134 dispersed in the matrix. However, the anti-glare layer may also contain other components in addition to the matrix and the microparticles dispersed in the matrix. Examples of the other components include leveling agents, silane coupling agents, antistatic agents, ultraviolet absorbers, antioxidants, light and heat stabilizers, defoamers, and the like.

[0074] The matrix is ​​preferably composed of a resin, and examples of the resin include polymer resins such as polyester resins, acrylic resins, acrylic urethane resins, polyester acrylate resins, urethane acrylate resins, epoxy acrylate resins, and polyurethane resins.

[0075] The shapes of the microparticles include spherical, cubic, plate-like, flaky, and needle-like. Among them, from the viewpoint of suppressing the white turbidity of the surface of the transparent substrate with the anti-glare layer caused by wiping with a cloth, the microparticles are preferably spherical. It should be noted that in this specification, the sphere does not necessarily have to be a true sphere, but refers to a sphere with high sphericity, more specifically, a sphere with an aspect ratio of 0.7 to 1. Here, the aspect ratio refers to the value obtained by dividing the maximum major diameter of the microparticle by the perpendicular diameter of the maximum major diameter.

[0076] In addition, the microparticles preferably include resin particles. By making the microparticles include resin particles, the turbidity caused by wiping with a cloth is further suppressed. As resin particles, organic microparticles of styrene resins, polyurethane resins, benzoguanamine resins, silicone resins, acrylic resins, etc. can be mentioned. However, the microparticles are not limited to these, and may also contain inorganic particles. As inorganic particles, silica particles, zirconium oxide, glass, etc. can be mentioned. Among them, the microparticles preferably include silica particles. In addition, as microparticles, organic-inorganic composite particles formed by compounding organic components and inorganic components can also be used.

[0077] It should be noted that the anti-glare layer in this embodiment may include fine particles of two or more different materials.

[0078] The proportion of microparticles contained in the matrix can be selected according to the optical properties required for the transparent matrix with anti-glare layer. When the haze value of the transparent matrix with anti-glare layer is desired to be suppressed to a lower level, the content of microparticles is selected to be lower, and when the haze value of the transparent matrix with anti-glare layer is desired to be increased, the content of microparticles is selected to be higher. Therefore, the weight ratio of microparticles to matrix (microparticles: matrix) can be arbitrarily changed.

[0079] The present inventors have found that by setting the difference between the average particle size of the fine particles and the thickness of the antiglare layer (average particle size of the fine particles - thickness of the antiglare layer) to 4 μm or less, the surface of the transparent substrate with the antiglare layer can be prevented from becoming cloudy due to rubbing with a cloth.

[0080] When the difference between the average particle size of the fine particles and the thickness of the antiglare layer is 4 μm or less, even when the surface of the transparent substrate with the antiglare layer is rubbed with cloth, the fibers of the cloth will not be caught on the fine irregularities on the surface, thereby suppressing clouding.

[0081] On the other hand, if the difference between the average particle size of the microparticles and the thickness of the anti-glare layer is greater than 4 μm, the uneven shape of the surface of the transparent substrate with the anti-glare layer becomes larger. When the surface is wiped with a cloth, the fibers of the cloth are hooked on the fine uneven shapes, and the surface of the transparent substrate with the anti-glare layer becomes turbid.

[0082] The difference between the average particle size of the microparticles and the thickness of the antiglare layer is preferably 3 μm or less. In addition, from the viewpoint of hardness, the difference between the average particle size of the microparticles and the thickness of the antiglare layer is preferably -2 μm or more, more preferably 0 μm or more, and further preferably 1 μm or more. The difference between the average particle size of the microparticles and the thickness of the antiglare layer is, for example, preferably -2 μm to 4 μm.

[0083] In addition, in the present embodiment, the difference between the average particle size of the particles of the anti-glare layer and the thickness of the anti-glare layer is 4 μm or less, and the ratio of the difference between the average particle size of the particles and the thickness of the anti-glare layer to the thickness of the anti-glare layer is preferably 0% to 230%. By making this ratio within the above range, the white turbidity of the surface of the transparent substrate with the anti-glare layer caused by wiping with a cloth can be further suppressed. The ratio is more preferably 10% or more, and more preferably 25% or more. In addition, the ratio is more preferably 200% or less, and more preferably 150% or less.

[0084] In this embodiment, from the viewpoint of scattering, the average particle size of the microparticles is preferably 0.1 μm or more, more preferably 1 μm or more, and further preferably 2 μm or more. In addition, from the viewpoint of image clarity, the average particle size of the microparticles is preferably 15 μm or less, more preferably 10 μm or less, and further preferably 5 μm or less. The average particle size of the microparticles is, for example, preferably 0.1 μm to 15 μm. It should be noted that in this embodiment, the microparticles may also use two or more microparticles having different average particle sizes.

[0085] The average particle size of the fine particles in the transparent substrate with an antiglare layer is measured based on the surface image of the transparent substrate with an antiglare layer finally obtained.

[0086] More specifically, the surface of the transparent substrate with the anti-glare layer is photographed with an optical microscope. Based on the surface image of any 120 μm×100 μm area obtained, the maximum diameter of 12 particles selected at random is measured and averaged to obtain the average particle diameter. In the case where the shape of the particles is asymmetric, such as elliptical or flaky (scaly), the average particle diameter is calculated using the maximum major diameter as the particle diameter.

[0087] In the present embodiment, from the viewpoint of hardness, the thickness of the anti-glare layer is preferably 0.5 μm or more, more preferably 1 μm or more, and further preferably 2 μm or more. In addition, from the viewpoint of warping, it is preferably 10 μm or less, more preferably 7 μm or less, and further preferably 6 μm or less. The thickness of the anti-glare layer is, for example, preferably 0.5 μm to 10 μm.

[0088] The thickness of the anti-glare layer is obtained by taking a cross-sectional photograph of a transparent substrate with an anti-glare layer using a scanning electron microscope. Specifically, the thickness of the anti-glare layer is obtained by taking a cross-sectional photograph of the transparent substrate with an anti-glare layer using a scanning electron microscope. Figure 2 The cross-sectional image shown. When the distance from the bottom surface (b) on the transparent substrate side to the highest position in the anti-glare layer is set as the maximum height (a1), and the distance to the lowest position is set as the minimum height (a2), the thickness of the anti-glare layer can be obtained by calculating the intermediate value (a3 = (a1 + a2) / 2) between the maximum height (a1) and the minimum height (a2).

[0089] More specifically, a scanning electron microscope is used to take cross-sectional photographs of 15 μm×20 μm at any five positions of the transparent substrate with an anti-glare layer. Next, in each cross-sectional photograph obtained, the minimum height and the maximum height are respectively calculated, and the thickness of the anti-glare layer of each cross section is calculated based on their intermediate values. The thickness of the anti-glare layer of the transparent substrate with an anti-glare layer of the present embodiment can be obtained by calculating the average value of the thickness of the anti-glare layer of the cross section at five positions.

[0090] <Anti-reflection layer>

[0091] The anti-reflection layer in this embodiment has the effect of reducing reflectivity, and in addition to reducing glare caused by reflection of light, when used in an image display device, it is a layer that can increase the transmittance of light from the image display device and improve the visibility of the image display device.

[0092] The antireflection layer in the present embodiment has a laminated structure in which at least two dielectric layers having mutually different refractive indices are laminated, and preferably has a function of suppressing reflection of light.

[0093] Therefore, in Figure 1 In the transparent substrate 100 with an anti-glare layer shown, the anti-reflection layer 120 is shown as a single layer, but in reality, it is preferably a laminated structure formed by laminating two layers of a first dielectric layer and a second dielectric layer having different refractive indices. By laminating the first dielectric layer and the second dielectric layer having different refractive indices, the reflection of light is suppressed. The first dielectric layer is a high refractive index layer, and the second dielectric layer is a low refractive index layer.

[0094] The antireflection layer in this embodiment may or may not have light absorbing capability.

[0095] Here, the antireflection layer "having light absorption capability" means that the light transmittance of the antireflection layer is 90% or less. The light transmittance can be measured according to the provisions of JIS Z 8709 (1999).

[0096] When the antireflection layer has no light absorption capability, the first dielectric layer and the second dielectric layer are preferably mainly composed of an oxide of at least one element selected from Si, Nb, Ti, Zr, Ta, Al, Sn and In, or a nitride of at least one element selected from Si and Al. Among these, it is preferred that the first dielectric layer be composed of Nb2O5 or TiO2, and the second dielectric layer be composed of SiO2.

[0097] Here, "mainly" means the component with the largest content (based on mass) in the first dielectric layer and the second dielectric layer, for example, containing 70 mass % or more of the corresponding component.

[0098] The constituent materials of the first dielectric layer and the second dielectric layer are appropriately selected from the above-mentioned oxides or nitrides so as to respectively become desired refractive index layers (high refractive index layer and low refractive index layer).

[0099] In addition, the first dielectric layer and the second dielectric layer may be composed of only one of the above-mentioned oxides or nitrides, or may be composed of two or more thereof.

[0100] In the antireflection layer having the above-described structure, the extinction coefficient of the first dielectric layer is preferably 0.01 or less.

[0101] In addition, when the antireflection layer has light absorption capability, the first dielectric layer (high refractive index layer) is preferably mainly composed of a mixed oxide of an oxide of at least one element selected from Group A and an oxide of at least one element selected from Group B, wherein Group A is composed of Mo and W, and Group B is composed of Si, Nb, Ti, Zr, Ta, Al, Sn, and In. Among these, Group A is preferably Mo, and Group B is preferably Nb.

[0102] Among them, in the mixed oxide, the content of the group B elements contained in the mixed oxide relative to the total of the group A elements contained in the mixed oxide and the group B elements contained in the mixed oxide (hereinafter referred to as the group B content) is preferably 65 mass % or less.

[0103] If the content of group B in the first dielectric layer (A-B-O) composed of a mixed oxide of an oxide of at least one element selected from group A and an oxide of at least one element selected from group B is less than 65 mass%, the yellow color of the transmitted light can be suppressed, wherein group A is composed of Mo and W, and group B is composed of Si, Nb, Ti, Zr, Ta, Al, Sn and In.

[0104] When the antireflection layer has light absorption capability, the second dielectric layer is preferably mainly composed of Si oxide (SiO x Here, x<2.

[0105] Generally, an oxygen-deficient silicon oxide layer has a yellow tint under visible light. However, when a first dielectric layer composed of a mixed oxide of an oxide of Mo as group A and an oxide of Nb as group B and a second dielectric layer as an oxygen-deficient silicon oxide layer are used together, the silicon oxide layer does not have a yellow tint even if oxygen is deficient, and is therefore preferred.

[0106] In this embodiment, when the anti-reflection layer has a light absorbing capability, it is disposed closer to the external light entry surface in the image display device, and thus can effectively absorb light reflected by the anti-reflection layer and the transparent substrate. Thus, the display has a good contrast and excellent visibility.

[0107] It should be noted that as a light-transmitting film having light absorption capability and insulating properties, a half-tone mask used in the semiconductor manufacturing field is known. As a half-tone mask, Mo—SiO containing a small amount of Mo can be used. x In addition, as a light-transmitting film having light absorption capability and insulating properties, a narrow bandgap film used in the field of semiconductor manufacturing is known.

[0108] However, since these light-transmitting films have a high absorption capacity for short-wavelength light in visible light, the transmitted light has a yellow tint, and therefore, they are not suitable for use in image display devices.

[0109] In this embodiment, the first dielectric layer having Mo and W contents increased and the SiO x When the second dielectric layer has a structure of the above, a transparent substrate with an anti-glare layer having light absorbing ability, insulation, adhesion and strength can be obtained.

[0110] In the case of the above-mentioned structure having light absorption capability, the extinction coefficient of the first dielectric layer is preferably 0.005 to 3, and more preferably 0.04 to 0.38. If the extinction coefficient is 0.005 or more, the desired absorptivity can be achieved with an appropriate number of layers. In addition, if the extinction coefficient is 3 or less, it is relatively easy to achieve a balance between reflection tone and transmittance.

[0111] In the present embodiment, from the viewpoint of transmittance with the transparent substrate, the refractive index of the first dielectric layer at a wavelength of 550 nm is preferably 1.8 to 2.3.

[0112] The structure of the antireflection layer may be a stacked structure of two layers in total, in which a first dielectric layer and a second dielectric layer are stacked, or may be a stacked structure in which three or more dielectric layers having different refractive indices are stacked.

[0113] In this case, the refractive index of all dielectric layers is not required to be different.For example, in the case of 3 layers of laminated structures, it can be 3 layers of laminated structures of low refractive index layer, high refractive index layer, low refractive index layer or 3 layers of laminated structures of high refractive index layer, low refractive index layer, high refractive index layer.In the case of the former, 2 layers of low refractive index layers that exist can be identical refractive index, and in the case of the latter, it can also be identical refractive index to exist 2 layers of high refractive index layers.In the case of 4 layers of laminated structures, it can be 4 layers of laminated structures of low refractive index layer, high refractive index layer, low refractive index layer, high refractive index layer or 4 layers of laminated structures of high refractive index layer, low refractive index layer, high refractive index layer, low refractive index layer.In this case, 2 layers of low refractive index layers and the high refractive index layer that exist respectively can also be identical refractive index.

[0114] In the case of a laminated structure formed by stacking more than 3 layers of layers with different refractive indexes, dielectric layers other than the first dielectric layer and the second dielectric layer can also be contained. In this case, the first dielectric layer and the second dielectric layer are contained, and each layer is selected in the form of a 3-layer laminated structure of low refractive index layer, high refractive index layer, low refractive index layer or a 3-layer laminated structure of high refractive index layer, low refractive index layer, high refractive index layer, or a 4-layer laminated structure of low refractive index layer, high refractive index layer, low refractive index layer, high refractive index layer or a 4-layer laminated structure of high refractive index layer, low refractive index layer, high refractive index layer, low refractive index layer.

[0115] Among them, the outermost layer is preferably the second dielectric layer. In order to obtain low reflectivity, if the outermost layer is the second dielectric layer, it is relatively easy to make. In addition, when the antifouling film described later is formed on the anti-reflection film 120, from the viewpoint of bonding related to the durability of the antifouling film, the antifouling film is preferably formed on the second dielectric layer.

[0116] The first dielectric layer is preferably amorphous. If it is amorphous, it can be produced at a relatively low temperature, and can be suitably applied when the transparent substrate is made of resin, for example, without damaging the resin by heat.

[0117] The thickness of the antireflection layer is, for example, preferably in the range of 100 nm to 500 nm, and more preferably in the range of 200 nm to 300 nm.

[0118] <Antifouling film>

[0119] From the viewpoint of protecting the outermost surface of the anti-reflection layer, the transparent substrate with an anti-glare layer involved in the present embodiment may further have an anti-fouling film (also referred to as "Anti Finger Print (AFP)" film) on the above-mentioned anti-reflection layer. The anti-fouling film can be formed, for example, by a fluorinated organosilicon compound. As a fluorinated organosilicon compound, as long as it can impart anti-fouling properties, water repellency, and oil repellency, it can be used without particular limitation. For example, a fluorinated organosilicon compound having one or more groups selected from a polyfluoropolyether group, a polyfluoroalkylene group, and a polyfluoroalkylene group can be cited. It should be noted that a polyfluoropolyether group refers to a divalent group having a structure formed by alternating bonding of a polyfluoroalkylene group and an etheric oxygen atom.

[0120] In addition, as commercially available fluorine-containing silicone compounds having one or more groups selected from a polyfluoropolyether group, a polyfluoroalkylene group and a polyfluoroalkyl group, KP-801 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY178 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY-130 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY-185 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), OPTOOL (registered trademark) DSX and OPTOOLAES (both trade names, manufactured by DAIKIN Co., Ltd.) can be preferably used.

[0121] In the case where the transparent substrate with an anti-glare layer of this embodiment has an anti-fouling film, the anti-fouling film is disposed on the anti-reflection film. In the case where the anti-reflection layers are disposed on both sides of the two main surfaces of the transparent substrate, the anti-fouling film may be formed on the two anti-reflection layers, but it may also be a configuration in which the anti-fouling film is laminated only on one main surface side. This is because the anti-fouling film can be disposed at a position that may be touched by a hand or the like, and can be selected according to its use, etc.

[0122] <Features>

[0123] (Haze value)

[0124] The haze value of the transparent substrate with an anti-glare layer involved in this embodiment is 30% or more. By making the haze value 30% or more, the reflection of external light can be more effectively suppressed. The haze value is more preferably 35% or more, more preferably 40% or more, and particularly preferably 45% or more. In addition, from the viewpoint of image clarity, the haze value is preferably 90% or less, more preferably 80% or less, more preferably 70% or less, and particularly preferably 65% ​​or less. The haze value is, for example, preferably 30% to 90%.

[0125] The haze value is measured in accordance with JIS K 7136:2000 using a haze meter (manufactured by Murakami Color Laboratory Co., Ltd., HR-100 model) or the like.

[0126] (Skewness Ssk)

[0127] In the transparent substrate with an antiglare layer according to the present embodiment, the skewness Ssk of the surface on the side having the antiglare layer is 0.4 or less.

[0128] The "skewness Ssk" indicates the symmetry of the height distribution specified in ISO25178.

[0129] If the value of Ssk is a positive value, the concavo-convex shape is distributed in a high direction, and the convex portion becomes sharp. On the other hand, if the value of Ssk is a negative value, it means that the concavo-convex shape is distributed in a low direction, and the convex portion has a tendency to become blunt. In the transparent substrate with anti-glare layer involved in the present embodiment, the Ssk of the surface with the anti-glare layer side is made to be less than 0.4, so that when wiping the surface of the transparent substrate with anti-glare layer with cloth, the fiber of the cloth will not be hooked on the fine concavo-convex shape on the surface, and white turbidity is suppressed. Ssk is preferably less than 0.3, more preferably less than 0.2, and further preferably less than 0.1. In addition, from the viewpoint of antifouling property, Ssk is preferably more than 0. Here, "antifouling property" refers to that the dirt of the concavo-convex shape entering the surface of the transparent substrate with anti-glare layer is difficult to remove from the concave portion.

[0130] (dynamic friction coefficient)

[0131] For the transparent substrate with anti-glare layer involved in the present embodiment, the dynamic friction coefficient obtained by the following method is preferably 0.3 or less. By making the dynamic friction coefficient 0.3 or less, the white turbidity of the surface caused by wiping with a cloth can be suppressed. This is because when the surface of the transparent substrate with an anti-glare layer is wiped with a cloth, the cloth will not hook on the concave and convex shape formed on the surface. The dynamic friction coefficient is preferably 0.28 or less, more preferably 0.25 or less, further preferably 0.22 or less, and particularly preferably 0.2 or less. The dynamic friction coefficient is generally 0.05 or more, preferably 0.1 or more. The dynamic friction coefficient is, for example, preferably 0.05 to 0.3.

[0132] Method: On the surface of the anti-glare layer side of the transparent substrate with the anti-glare layer, use a cloth (for example, TECHNO WIPER LT100, a clean room wipe made by Technos) with a load of 500 g, a contact area of ​​1 cm×1 cm, and a speed of 500 mm / min moving in one direction for measurement.

[0133] (Static friction coefficient)

[0134] For the transparent substrate with anti-glare layer involved in this embodiment, the static friction coefficient obtained by the following method is preferably 0.21 or less. By making the static friction coefficient 0.21 or less, the white turbidity caused by wiping with a cloth can be suppressed. The static friction coefficient is more preferably 0.20 or less. The static friction coefficient is usually 0.05 or more, preferably 0.1 or more. The static friction coefficient is preferably 0.05 to 0.21, for example.

[0135] Method: On the surface with the anti-glare layer, a cloth (e.g., clean room wiping cloth TECHNOWIPER LT100, manufactured by Technos) is moved in one direction at a speed of 500 mm / min with a load of 500 g and a contact area of ​​1 cm×1 cm, and the initial value at the beginning of the movement is measured.

[0136] The reason why the dynamic friction coefficient of the transparent substrate with an antiglare layer according to the present embodiment is higher than the static friction coefficient is considered to be that the cloth is broken during friction and its fragments remain on the surface, so the coefficient becomes higher.

[0137] In addition, for the transparent substrate with anti-glare layer involved in this embodiment, the difference between the above-mentioned dynamic friction coefficient and the above-mentioned static friction coefficient (dynamic friction coefficient-static friction coefficient) is preferably 0.05 or less. By making the difference between the dynamic friction coefficient and the static friction coefficient 0.05 or less, the white turbidity of the surface caused by wiping with a cloth can be suppressed. The difference between the dynamic friction coefficient and the static friction coefficient is more preferably 0.05 or less, and further preferably less than 0, that is, a negative value.

[0138] (Cloudiness caused by cloth)

[0139] For the transparent substrate with anti-glare layer involved in the present embodiment, even if the surface is wiped with a cloth, no white turbidity is observed on the surface of the transparent substrate with anti-glare layer. "No white turbidity" specifically means that even after the transparent substrate with anti-glare layer is treated as follows, no white spots are observed on its surface.

[0140] (Treatment) The surface provided with the anti-glare layer was subjected to a temperature of 100 g / cm 2 The surface is wiped 10 times with a cloth (e.g., TECHNO WIPER LT100, manufactured by Technos) under a load of . During observation, a black tape (e.g., black vinyl tape manufactured by 3M) is attached to the surface of the transparent substrate with the anti-glare layer on the opposite side of the side provided with the anti-glare layer.

[0141] <Manufacturing method>

[0142] The method for producing a transparent substrate with an antiglare layer of the present invention comprises the following steps.

[0143] (1) Step of forming an anti-glare layer on at least one surface of a transparent substrate

[0144] (2) A step of forming an antireflection layer on the surface of the antiglare layer

[0145] Hereinafter, each step will be described.

[0146] (1) Step of forming an anti-glare layer on at least one surface of a transparent substrate

[0147] The anti-glare layer is formed on at least one main surface of the transparent substrate. As mentioned above, the transparent substrate is made of a transparent member such as glass, resin or plastic, and the anti-glare layer is made of a resin matrix and fine particles dispersed in the resin matrix.

[0148] The method for forming the anti-glare layer is not particularly limited. The anti-glare layer can be formed, for example, by a wet method. As a wet method, for example, a method of preparing a slurry containing a matrix resin and microparticles, applying the slurry to the surface of at least one main surface of a transparent substrate, and a method of applying the slurry manually or using a coating machine, etc. can be cited. In addition, when the matrix resin is an ultraviolet curable resin or a thermosetting resin, the provided slurry can be cured by ultraviolet irradiation or heating to form an anti-glare layer.

[0149] In addition, the viscosity of the slurry can be adjusted by adding a solvent. Preferred solvents include lower alcohols such as methanol, ethanol, and isopropanol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, polyethylene glycol methyl ether, polyethylene glycol methyl ether acetate, dimethylformamide, N,N′-dimethylacetamide, N-methyl-2-pyrrolidone, tetrahydrofuran, dimethicone, and the like. Alkane, toluene, etc.

[0150] In order to improve the adhesion between the anti-glare layer and the anti-reflection layer, the anti-glare layer may be subjected to a surface treatment, for example, a corona treatment, a UV / ozone treatment, an ion beam treatment, etc.

[0151] (2) A step of forming an antireflection layer on the surface of the antiglare layer

[0152] Next, an anti-reflection layer is formed on the surface of the anti-glare layer. The formation method of the anti-reflection layer is not particularly limited, and can be formed by a dry method or a wet method. As the dry method, for example, an evaporation method, a sputtering method, a physical vapor deposition method (PVD) method or a chemical vapor deposition method (CVD) method can be mentioned. In addition, as the wet method, a gravure method and a mold method can be mentioned. Wherein, from the viewpoint of surface hardness, a dry method is preferred.

[0153] Examples of the sputtering method include magnetron sputtering, pulse sputtering, AC sputtering, and digital sputtering.

[0154] For example, magnetron sputtering is a method in which a magnet is placed on the back side of a dielectric material serving as a matrix to generate a magnetic field, causing gas ion atoms to collide with the surface of the dielectric material, escape, and sputter to form a film with a thickness of several nanometers. This method can form a continuous film of a dielectric oxide or nitride serving as the dielectric material.

[0155] In addition, for example, the digital sputtering method is different from the usual magnetron sputtering method. It is a method of first forming an extremely thin film of metal by sputtering, and then oxidizing by irradiating oxygen plasma, or oxygen ions, or oxygen free radicals, and repeating such a process in the same chamber to form a thin film of metal oxide. In this case, the film-forming molecules are metal when attached to the substrate, so they have ductility compared to the case of film-forming by metal oxide attachment. Therefore, it is believed that even the same energy is likely to cause the reconfiguration of the film-forming molecules, resulting in a dense and smooth film.

[0156] Furthermore, an antifouling film may be formed on the antireflection layer. The antifouling film may be formed, for example, by vapor deposition.

[0157] <Application>

[0158] The transparent substrate with an anti-glare layer according to the present embodiment is suitable as a cover glass for an image display device, particularly a cover glass for an image display device mounted on a vehicle, etc., such as an image display device of a navigation system mounted on a vehicle, etc. It should be noted that the image display device of the navigation system mounted on a vehicle, etc. adopts a liquid crystal display (LCD) with strong heat resistance and durability.

[0159] (Image display device)

[0160] An image display device according to one embodiment of the present invention comprises the transparent substrate with the antiglare layer. As an image display device, there can be mentioned a mode in which the transparent substrate with the antiglare layer is provided on a liquid crystal display (LCD).

[0161] Example

[0162] The present invention is specifically described below with reference to examples, but the present invention is not limited thereto.

[0163] Hereinafter, Examples 1 to 6, 17, and 18 are examples, and Examples 7 to 16 are comparative examples.

[0164] (Example 1)

[0165] An antiglare layer and an antireflection layer were sequentially formed on one main surface of a transparent substrate using the following method to prepare a transparent substrate with an antiglare layer.

[0166] A PET film (cosmoshine A4360, manufactured by Toyobo Co., Ltd.) having a thickness of 100 μm was used as the transparent substrate. The visible light transmittance of the transparent substrate was 92%.

[0167] An antiglare layer was formed on one surface of the transparent substrate (referred to as the first surface) by the following method.

[0168] First, spherical acrylic (PMMA) resin particles with an average particle size of 5 μm were used as fine particles, and the fine particles were mixed with an acrylic resin (hereinafter referred to as a "matting agent") at a weight ratio of 80:100 to prepare a mixed solution. Further, propylene glycol monomethyl ether was added to the mixed solution to dilute the solid content concentration to 40%.

[0169] Next, the obtained coating liquid was applied to the first surface of the transparent substrate using a bar coater. Next, the transparent substrate was placed in a hot air drying oven at 80° C. and kept for 20 minutes to dry the coating liquid.

[0170] Then, the coating liquid was cured using an ultraviolet exposure device, thereby forming an anti-glare layer on one main surface of the transparent substrate.

[0171] Next, an antireflection layer was formed on the surface of the antiglare layer by the following method.

[0172] The antireflection layer is formed by using a metal mode sputtering method.

[0173] The sputtering device includes a rotating cylindrical drum-shaped support and an oxidation source arranged around the support. The oxidation source can form microwave plasma by electron cyclotron resonance (ECR). When forming the anti-reflection layer, a substrate is placed on the support, and a metal target is arranged around the support.

[0174] When forming the anti-reflection layer, argon gas is supplied to the metal target to which voltage is applied, and oxygen gas is supplied to the oxidation source to which voltage is applied, while the holder is rotating at high speed under reduced pressure. The metal atoms are released from the metal target by the argon gas, and they are deposited on the substrate. The substrate is rotated by the holder, so when the metal atoms forming the film face the oxidation source, they are instantly oxidized by the oxygen plasma supplied from the oxidation source.

[0175] By repeating such an operation in the sputtering device used, a thin film of the oxide of the target metal can be formed on the substrate.

[0176] In Example 1, the anti-reflection layer has a four-layer structure of the 1st to 4th layers, which are titanium oxide (TiO2: 1st layer), silicon oxide (SiO2: 2nd layer), titanium oxide (TiO2: 3rd layer) and silicon oxide (SiO2: 4th layer) from the substrate side.

[0177] First, the first layer is formed according to the following conditions:

[0178] Target: Titanium

[0179] Argon gas quantity supplied to target: 3000sccm

[0180] Power supplied to target: 10kW

[0181] Oxygen supply to the oxidation source: 400 sccm

[0182] Power supplied to oxidation source: 1050kW.

[0183] Next, the second layer was formed under the following conditions:

[0184] Target: Metal Silicon

[0185] Argon gas quantity supplied to target: 3000sccm

[0186] Power supplied to target: 10kW

[0187] Oxygen supply to the oxidation source: 750 sccm

[0188] Power supplied to oxidation source: 1050kW.

[0189] Next, the third layer was formed. The film forming conditions were the same as those for the first layer.

[0190] Next, the fourth layer was formed. The film forming conditions were the same as those for the second layer.

[0191] Thus, a low reflection layer including a first layer having a thickness of 12 nm, a second layer having a thickness of 33 nm, a third layer having a thickness of 111 nm, and a fourth layer having a thickness of 92 nm was formed.

[0192] The transparent substrate with an anti-glare layer was prepared by the above method. A laser microscope VK-X3000 photograph of the surface shape of the transparent substrate with an anti-glare layer obtained as described above is shown in FIG. Figure 3 In addition, the cross section of the transparent substrate with the anti-glare layer was observed using a scanning electron microscope (SEM). The SEM image of the cross section of the anti-glare layer is shown in Figure 7 (A).

[0193] (Examples 2, 3)

[0194] A transparent substrate with an antiglare layer was prepared in the same manner as in Example 1 except that the thickness of the antiglare layer was changed to the value shown in Table 1. Laser microscope photographs of the surface shapes of the obtained transparent substrates with an antiglare layer are shown in Figure 3 (B) and (C) show the cross-sectional SEM images of the anti-glare layer. Figure 7 (B), (C).

[0195] (Example 4)

[0196] In the formation of the anti-glare layer, the microparticles were spherical polystyrene (PS) resin particles with an average particle diameter of 3 μm, the microparticles were mixed with a matting agent at a weight ratio of 70:100, and the thickness of the anti-glare layer was changed to the value shown in Table 1. A transparent substrate with an anti-glare layer was prepared in the same manner as in Example 1. A laser microscope photograph of the surface shape of the obtained transparent substrate with an anti-glare layer is shown in Figure 3 (D) shows a cross-sectional SEM image of the anti-glare layer. Figure 7 (D).

[0197] (Examples 5, 6)

[0198] A transparent substrate with an antiglare layer was prepared in the same manner as in Example 4 except that the thickness of the antiglare layer was changed to the value shown in Table 1. Laser microscope photographs of the surface shapes of the obtained transparent substrates with an antiglare layer are shown in Figure 3 (E) and (F) show the cross-sectional SEM images of the anti-glare layer. Figure 7 (E), (F).

[0199] (Example 7)

[0200] In the formation of the anti-glare layer, the fine particles were non-spherical silica particles with an average particle size of 2 μm, the fine particles were mixed with a matting agent at a weight ratio of 70:100, and the thickness of the anti-glare layer was changed to the value shown in Table 1. A transparent substrate with an anti-glare layer was prepared in the same manner as in Example 1. A laser microscope photograph of the surface shape of the obtained transparent substrate with an anti-glare layer is shown in Figure 4 (A) shows a cross-sectional SEM image of the anti-glare layer. Figure 7 (G).

[0201] (Example 8)

[0202] In the formation of the anti-glare layer, the fine particles were non-spherical silica particles with an average particle size of 10 μm, the fine particles were mixed with a matting agent at a weight ratio of 40:100, and the thickness of the anti-glare layer was changed to the value shown in Table 1. A transparent substrate with an anti-glare layer was prepared in the same manner as in Example 1. A laser microscope photograph of the surface shape of the obtained transparent substrate with an anti-glare layer is shown in Figure 4 (B) shows a cross-sectional SEM image of the anti-glare layer. Figure 7 (H).

[0203] (Example 9)

[0204] In the formation of the anti-glare layer, the microparticles were non-spherical silica particles with an average particle size of 4 μm, which were mixed with a matting agent at a weight ratio of 80:100, and the thickness of the anti-glare layer was changed to the value shown in Table 1. A transparent substrate with an anti-glare layer was prepared in the same manner as in Example 1. A laser microscope photograph of the surface shape of the obtained transparent substrate with an anti-glare layer is shown in Figure 5 (A).

[0205] (Examples 10~13)

[0206] A transparent substrate with an antiglare layer was prepared in the same manner as in Example 9 except that the thickness of the antiglare layer was changed to the value shown in Table 1. Laser microscope photographs of the surface shapes of the obtained transparent substrates with an antiglare layer are shown in Figure 5 (B)~(E).

[0207] (Example 14)

[0208] In the formation of the anti-glare layer, the microparticles were spherical acrylic (PMMA) resin particles with an average particle diameter of 10 μm, the microparticles were mixed with a matting agent at a weight ratio of 40:100, and the thickness of the anti-glare layer was changed to the value shown in Table 1. A transparent substrate with an anti-glare layer was prepared in the same manner as in Example 1. A laser microscope photograph of the surface shape of the obtained transparent substrate with an anti-glare layer is shown in Figure 6 (A).

[0209] (Examples 15~18)

[0210] A transparent substrate with an antiglare layer was prepared in the same manner as in Example 14 except that the thickness of the antiglare layer was changed to the value shown in Table 1. Laser microscope photographs of the surface shapes of the obtained transparent substrates with an antiglare layer are shown in Figure 6 (B)~(E).

[0211] The transparent substrates with antiglare layers obtained above were evaluated as follows. The results are shown in Table 1. In Table 1, "-" means not measured.

[0212] (Average particle size of microparticles)

[0213] The surface image of the transparent substrate with the anti-glare layer was taken using an optical microscope (Nikon, ECLIPSE L300N). Based on the obtained surface image of any 120 μm × 100 μm area, the maximum diameter of 12 randomly selected particles was measured and averaged to obtain the average particle size. In the case of non-spherical particles, the average particle size was calculated using the maximum major diameter as the particle size.

[0214] The average particle size of the microparticles before mixing with the matrix is ​​substantially the same as the average particle size obtained in the above measurement. Substantially the same means that the ratio of the average particle size obtained in the above measurement to the average particle size of the microparticles before mixing with the matrix is ​​0.9 to 1.1.

[0215] In addition, the "maximum value" and "minimum value" in the tables of Examples 1 to 13 refer to the value at which the maximum diameter is the largest and the value at which the maximum diameter is the smallest in the above-mentioned measurement.

[0216] (Thickness of anti-glare layer)

[0217] Use scanning electron microscope (made by Hitachi High-Tech, Regulus 8220) to take cross-sectional photos of 15 μm×20 μm of the transparent substrate with anti-glare layer at any 5 positions. Next, in each cross-sectional photo obtained, the maximum height and the minimum height are respectively calculated, and the thickness of the anti-glare layer of each cross section is calculated based on their intermediate values. The average value of the thickness of the anti-glare layer in the cross section of the 5 positions is calculated, and the obtained value is set as the thickness of the anti-glare layer of the transparent substrate with anti-glare layer.

[0218] (Haze value)

[0219] The measurement was conducted using a haze meter (manufactured by Murakami Color Laboratory Co., Ltd., HR-100 model) in accordance with JIS K 7136:2000.

[0220] (Skewness Ssk)

[0221] The measurement was performed using a laser microscope (VK-X3000, manufactured by KEYENCE) in accordance with ISO25178.

[0222] (white turbidity)

[0223] For each of the transparent substrates with anti-glare layers obtained above, at 100 g / cm 2The surface on the side provided with the anti-glare layer was wiped 10 times with a cloth (TECHNO WIPERLT100 for clean room, manufactured by Technos) under the conditions of , and the surface was visually evaluated according to the following evaluation criteria. It should be noted that during the observation, a black tape (3M black vinyl tape) was attached to the surface of the transparent substrate with the anti-glare layer on the opposite side of the side provided with the anti-glare layer.

[0224] ○: No white spots were observed on the entire surface.

[0225] ×: Locations where white spots were observed on the entire surface or a part thereof.

[0226] (dynamic friction coefficient)

[0227] On the surface of one side of the anti-glare layer of each transparent substrate with an anti-glare layer obtained above, a cloth (TECHNO WIPER LT100 for clean room wiping, manufactured by Technos) was moved in one direction with a load of 500 g, a contact area of ​​1 cm×1 cm, and a speed of 500 mm / min, and the measurement was carried out using a linear sliding tester (HEIDON Tribogear 38, manufactured by Shinto Chemical Co., Ltd.).

[0228] (Static friction coefficient)

[0229] On the surface of one side of the anti-glare layer of each transparent substrate with an anti-glare layer obtained above, a cloth (TECHNO WIPER LT100 wiping cloth for clean room, manufactured by Technos) is moved in one direction with a load of 500 g, a contact area of ​​1 cm×1 cm, and a speed of 500 mm / min. The initial value of the start of movement is measured using a linear sliding tester (HEIDON Tribogear 38, manufactured by Shinto Chemical Co., Ltd.).

[0230] [Table 1]

[0231]

[0232] As shown in Table 1, the transparent substrates with antiglare layers of Examples 1 to 6, 17 and 18 had a haze value of 30% or more, and no white turbidity was observed on the surface of the transparent substrate with antiglare layer due to rubbing with a cloth.

[0233] On the other hand, in the transparent substrates with antiglare layers of Examples 7 to 16 as Comparative Examples, white turbidity was observed on the surface due to rubbing with a cloth.

[0234] Above, various embodiments have been described, but the present invention is certainly not limited to these examples. Obviously, those skilled in the art can think of various variations or modifications within the scope of the claimed scope, which certainly also belong to the technical scope of the present invention. In addition, within the scope of not departing from the gist of the invention, the various constituent elements in the above-mentioned embodiments may also be arbitrarily combined.

[0235] It should be noted that the present application is based on Japanese patent application (Japanese Patent Application No. 2022-089066) filed on May 31, 2022, and the contents thereof are incorporated herein by reference.

[0236] Explanation of symbols

[0237] 100 Transparent substrate with anti-glare layer

[0238] 110 Transparent substrate

[0239] 120 Anti-reflection layer

[0240] 130 Anti-glare layer

[0241] 132 Matrix

[0242] 134 particles

Claims

1. A transparent substrate with an anti-glare layer, comprising: a transparent substrate having two major surfaces, and An anti-glare layer and an anti-reflection layer are sequentially provided on at least one main surface of the transparent substrate. The transparent substrate with the anti-glare layer has a haze value of 30% or more, and a skewness Ssk of the surface on the side with the anti-glare layer is 0.4 or less, The anti-glare layer includes fine particles, and a difference between a thickness of the anti-glare layer and an average particle size of the fine particles is 4 μm or less.

2. The transparent substrate with an anti-glare layer according to claim 1, wherein: The dynamic friction coefficient of the surface having the antiglare layer is 0.3 or less.

3. The transparent substrate with an anti-glare layer according to claim 1, wherein: The microparticles are spherical.

4. The transparent substrate with an anti-glare layer according to claim 1, wherein: The microparticles include resin particles.

5. The transparent substrate with an anti-glare layer according to claim 1, wherein: The microparticles include silicon dioxide particles.

6. The transparent substrate with an anti-glare layer according to claim 1, wherein: The antireflection layer has a laminated structure in which at least two dielectric layers having mutually different refractive indices are laminated.

7. The transparent substrate with an anti-glare layer according to claim 6, wherein: At least one of the dielectric layers is mainly composed of an oxide of at least one element selected from Si, Nb, Ti, Zr, Ta, Al, Sn and In, or a nitride of at least one element selected from Si and Al.

8. The transparent substrate with an anti-glare layer according to claim 6, wherein: At least one of the dielectric layers is mainly composed of Si oxide, and at least one other layer of the layers of the stacked structure is mainly composed of a mixed oxide of an oxide of at least one element selected from Group A and an oxide of at least one element selected from Group B, The A group consists of Mo and W, and the B group consists of Si, Nb, Ti, Zr, Ta, Al, Sn and In, The content of the B group element contained in the mixed oxide relative to the total of the A group element contained in the mixed oxide and the B group element contained in the mixed oxide is 65 mass % or less.

9. The transparent substrate with an anti-glare layer according to claim 1, wherein: The anti-reflection layer further has an anti-fouling film thereon.

10. The transparent substrate with an anti-glare layer according to claim 1, wherein: The transparent substrate includes glass.

11. The transparent substrate with an anti-glare layer according to claim 1, wherein: The transparent substrate includes resin.

12. A method for producing a transparent substrate with an antiglare layer, which is the method for producing a transparent substrate with an antiglare layer according to any one of claims 1 to 11, An antiglare layer is formed on at least one surface of a transparent substrate, and an antireflection layer is formed on the surface of the antiglare layer by a dry method.

13. A method for producing a transparent substrate with an antiglare layer, which is the method for producing a transparent substrate with an antiglare layer according to any one of claims 1 to 11, An antiglare layer is formed on at least one surface of a transparent substrate, and an antireflection layer is formed on the surface of the antiglare layer by a wet method. 14 . An image display device comprising the transparent substrate with an antiglare layer according to claim 1 .

Images