Correction device, correction method and evaporation equipment

Abstract

The present disclosure provides a correction device, a correction method and an evaporation device, wherein the correction device includes a detection device, an adjustment device and a controller connected to the detection device and the adjustment device; the detection device is used to detect deformation information of a substrate to be evaporated and transmit the deformation information to the controller; the adjustment device includes a plurality of adjustment components, any of the adjustment components includes an adjustment rod, and the adjustment rod is used to extend into an adjustment groove of a mask, wherein the mask has a first surface opposite to the substrate to be evaporated, and a plurality of adjustment grooves corresponding to the adjustment components are provided on the first surface; the controller is used to calculate the adjustment force required for each adjustment groove when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment groove to correct the shape of the mask.

Description

Technical Field

[0001] The present disclosure relates to the field of semiconductor technology, and more specifically, to a correction device, a correction method, and an evaporation device. Background Art

[0002] Organic Light Emitting Diode (OLED) displays have been widely used in various electronic devices including computers, mobile phones and other electronic products due to their advantages such as self-luminescence, light weight, low power consumption, high contrast, high color gamut, and flexible display.

[0003] Among them, in the actual production process of OLED display devices (especially AMOLED display devices), it is usually necessary to use a mask to evaporate the OLED material onto a glass substrate by vacuum evaporation to form the patterns of each functional layer. However, in this production process, the temperature fluctuation of the glass substrate is an important problem. Due to the influence of factors such as the quality of the incoming glass and the production rhythm, the temperature of the glass will fluctuate greatly, causing the glass substrate to deform, and then inconsistent with the shape of the mask. This inconsistency will cause the opening to be evaporated on the mask and the pixel opening on the glass substrate to be unable to be accurately aligned during the evaporation process, ultimately resulting in poor color mixing and seriously affecting product quality. At present, the mask is mainly corrected manually, but this method needs to be carried out off the production line, the repair is poor in real time, and it consumes a lot of manpower and material resources, affecting production efficiency and production costs. Summary of the Invention

[0004] The purpose of the present disclosure is to provide a correction device, a correction method and an evaporation device to solve the problems in the related art of poor real-time performance, time-consuming and labor-intensive, and affecting production efficiency and production costs when manually correcting a mask.

[0005] To achieve the above objectives, the present disclosure adopts the following technical solutions:

[0006] A first aspect of the present disclosure provides a correction device, comprising a detection device, an adjustment device, and a controller connected to the detection device and the adjustment device;

[0007] The detection device is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller;

[0008] The adjustment device includes a plurality of adjustment components, each of which includes an adjustment rod, the adjustment rod being configured to extend into an adjustment slot of a mask, wherein the mask has a first surface opposite to the substrate to be evaporated, and a plurality of adjustment slots corresponding to the adjustment components are provided on the first surface;

[0009] The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

[0010] Optionally, the mask plate includes a first frame, a support bar and a metal mask sheet, the first frame has a hollow area, the support bar is connected to the first frame and spans the hollow area of ​​the first frame to form a support net, the metal mask sheet is fixed on the support net, the surface of the first frame opposite to the substrate to be evaporated is the first surface, the multiple adjustment grooves are evenly distributed on the first surface, the adjustment component is arranged on the side of the mask plate away from the substrate to be evaporated, and when the mask plate is placed on the supporting platform, the adjustment rod of the adjustment component extends into the adjustment groove.

[0011] Optionally, the first frame includes a first frame and a second frame extending in a first direction and arranged in parallel, and a third frame and a fourth frame extending in a second direction and arranged in parallel, at least one first adjustment groove is provided on the first surfaces of the first frame and the second frame, and at least one second adjustment groove is provided on the first surfaces of the third frame and the fourth frame;

[0012] The adjustment device includes a plurality of first adjustment components and a plurality of second adjustment components, wherein the first adjustment components correspond to the positions of the first adjustment slots, and the second adjustment components correspond to the positions of the second adjustment slots.

[0013] Optionally, the detection device includes a plurality of optical sensors uniformly distributed along a first direction and a plurality of optical sensors uniformly distributed along a second direction, each of the optical sensors forming a detection area, and when the substrate to be evaporated is located in the detection area, the orthographic projection of the optical sensor on the substrate to be evaporated is located in the edge area of ​​the substrate to be evaporated.

[0014] Optionally, the number of the optical sensors is the same as the number of the adjustment slots on the mask, and the relative position distribution between the optical sensors is the same as the relative position distribution between the adjustment slots.

[0015] Optionally, the adjustment component also includes a drive motor, the output shaft of the drive motor is connected to the adjustment rod, and the output end of the controller is connected to the drive motor, for controlling the rotation of the drive motor to drive the adjustment rod to apply the adjustment force to the adjustment slot.

[0016] Optionally, the adjustment rod includes an end portion for extending into the adjustment slot, and the end portion abuts against a side wall of the adjustment slot when the adjustment force is applied.

[0017] Optionally, the adjustment groove is a circular groove, a rectangular groove or a regular polygonal groove.

[0018] A second aspect of the present disclosure provides an evaporation device, comprising a transmission chamber, an evaporation chamber, a carrier, a mask, and a correction device, wherein the correction device comprises a detection device, an adjustment device, and a controller connected to the detection device and the adjustment device;

[0019] The detection device is arranged in the transmission cavity, and is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller;

[0020] The supporting platform is provided in the evaporation chamber for placing a mask, wherein the mask has a first surface opposite to the substrate to be evaporated, and a plurality of adjustment grooves are provided on the first surface;

[0021] The adjustment device is disposed in the evaporation chamber, and includes a plurality of adjustment components corresponding to the plurality of adjustment slots. Each of the adjustment components includes an adjustment rod, and when the mask is placed on the carrier, the adjustment rod extends into the corresponding adjustment slot.

[0022] The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

[0023] A third aspect of the present disclosure provides a correction method, comprising the following steps:

[0024] Obtaining deformation information of the substrate to be evaporated;

[0025] Calculating, based on the deformation information, an adjustment force required for each adjustment slot when the adjustment device corrects the mask, the mask having a first surface opposite to the substrate to be evaporated, the first surface being provided with a plurality of adjustment slots, the adjustment device comprising a plurality of adjustment components corresponding one-to-one to the plurality of adjustment slots, each of the adjustment components comprising an adjustment rod, the adjustment rod extending into the corresponding adjustment slot;

[0026] Each adjusting rod is controlled to apply the adjusting force to the corresponding adjusting slot to correct the shape of the mask.

[0027] The beneficial effects of the present disclosure are as follows:

[0028] The correction device of the embodiment of the present disclosure includes a detection device, an adjustment device and a controller. The detection device can detect the deformation information of the substrate to be evaporated in real time and transmit the deformation information to the controller. The controller calculates the adjustment force required for each adjustment groove when correcting the mask based on the received deformation information, and controls each adjustment rod to apply the adjustment force to the adjustment groove at the corresponding position on the mask to correct the shape of the mask. Such a configuration can achieve online and automatic correction of the mask shape without having to remove the mask from the production line for repair. On the one hand, it can save manpower and time and improve production efficiency. On the other hand, it can adjust the shape of the mask in a timely and real-time manner so that the shape of the mask is the same as the shape of the current substrate to be evaporated, and the repair effect is more accurate. In addition, by applying the adjustment force by the adjustment device to change the shape of the mask, the adjustment device can be reused multiple times. The mask can be adjusted to a different shape by simply changing the output adjustment force each time. Compared with the solution of using gaskets for repair, it can avoid waste of repair materials, save resources and reduce costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] The specific embodiments of the present disclosure will be further described in detail below with reference to the accompanying drawings.

[0030] Figure 1 A schematic diagram of a structure of a metal mask provided in an embodiment of the present disclosure;

[0031] Figure 2 A schematic structural diagram of a correction device provided in an embodiment of the present disclosure;

[0032] Figure 3 A schematic structural diagram of the correction device provided in an embodiment of the present disclosure when applied to a vapor deposition device;

[0033] Figure 4 A top view of a carrier platform provided in an embodiment of the present disclosure;

[0034] Figure 5 A top view of the mask provided in an embodiment of the present disclosure when placed on a carrier;

[0035] Figure 6 A front view of a carrier platform, a mask, and a substrate to be evaporated provided in an embodiment of the present disclosure;

[0036] Figure 7 Schematic diagram of the distribution of the orthographic projection of the detection device on the substrate to be evaporated;

[0037] Figure 8 A schematic diagram of correcting a mask using a correction device;

[0038] Figure 9 A schematic structural diagram of an evaporation device provided in an embodiment of the present disclosure;

[0039] Figure 10 A flowchart of a correction method provided in an embodiment of the present disclosure. DETAILED DESCRIPTION

[0040] To make the purpose, technical solutions, and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0041] Unless otherwise defined, the technical or scientific terms used in this disclosure should have the usual meanings understood by people with ordinary skills in the field to which this disclosure belongs. The words "first", "second" and similar words used in this disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, words such as "one", "an" or "the" do not indicate a quantity limitation, but rather indicate the existence of at least one. Words such as "include" or "comprise" mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Words such as "connect" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0042] In order to better understand the technical solutions of the correction device, correction method and evaporation equipment disclosed in the present invention, a brief introduction to the design concept of the present invention is first given.

[0043] In order to solve the color mixing problem caused by the mismatch between the shape of the glass substrate and the mask during the evaporation process, the related technology usually adopts the solution of manually adjusting the shape of the mask to make the shape of the mask consistent with the glass substrate. Figure 1 , Figure 1 FIG. 1 is a schematic structural diagram of an embodiment of a metal mask. Figure 1 As shown, the metal mask 100 includes a metal frame 110 , a plurality of support bars 120 , and a plurality of metal mask sheets 130 .

[0044] The middle part of the metal frame 110 is a hollow area. For example, the metal frame 110 can be a rectangular metal frame, and a rectangular hollow area is provided in the middle of the rectangular frame. The plane structure of the metal frame 110 is a "U" structure, but in actual application, the shape of the metal frame 110 and the shape of the hollow area in the middle of the metal frame 110 can be specifically set according to the shape required for vapor deposition on the substrate to be evaporated, and no limitation is made here.

[0045] The support bars 120 are in the shape of slats, wherein some of the support bars 120 are arranged across the hollow area of ​​the metal frame 110 along a first direction (such as the X direction), and the remaining support bars 120 are arranged across the hollow area of ​​the metal frame 110 along a second direction (such as the Y direction). Multiple support bars 120 arranged along the first direction and multiple support bars 120 arranged along the second direction cross each other to form a support network, and both ends of the support bars 120 are respectively connected to the metal frame 110.

[0046] The metal mask sheet 130 is located above the support bar 120, and the metal mask sheet 130 is fixedly welded to the support net formed by the metal frame 110 and the support bar 120 through a net stretching device. The metal mask sheet 130 is arranged across the hollow area of ​​the metal frame 110. Multiple metal mask sheets 130 are arranged in sequence along the first direction, and each metal mask sheet 130 includes multiple mask pattern areas A arranged in sequence along the second direction. Each mask pattern area A can correspond to a display screen, that is, multiple evaporation openings are formed on each mask pattern area A, and each evaporation opening corresponds one-to-one to each area where the evaporation material is required in the evaporation process of the display screen. For example, each evaporation opening (assuming it is recorded as a slot opening) corresponds one-to-one to multiple pixel openings (such as anode openings).

[0047] The number of the support bars 120 can be set according to actual needs, for example, according to the number of metal mask sheets 130 and the number of mask pattern areas A on each metal mask sheet 130. For example, Figure 1 As shown, along the X direction, 19 metal mask sheets 130 are formed on the metal frame 110, and each metal mask sheet 130 has 5 mask pattern areas A arranged along the Y direction. Then, 18 support bars 120 arranged along the X direction and 4 support bars 120 arranged along the Y direction can be provided. Assuming that each mask pattern area A corresponds to the size of a mobile phone screen, the entire metal mask plate corresponds to 19*4=76 mobile phone screens, that is, the evaporation process for 76 mobile phone screens can be realized at the same time.

[0048] In the related art, the shape of the metal mask 100 is usually adjusted by using spacers or changing the support bars 120. For example, spacers are added in a specific area between the support bars 120 and the metal mask 130. The spacers exert a force in a specific direction on the metal mask 130, causing the metal mask 130 to slightly deform and thus match the shape of the glass substrate.

[0049] However, the above repair solutions all require the metal mask to be removed from the production line before repairing it. It is impossible to adjust the matching between the glass substrate and the metal mask in a timely and real-time manner. On the one hand, the repair effect is poor; on the other hand, it takes a lot of time and affects production efficiency. In addition, it also consumes a lot of manpower and material resources, such as consuming a large number of support bars and gaskets, which increases costs.

[0050] In order to solve the above technical problems, the embodiments of the present disclosure provide a correction device, a correction method and an evaporation device. The specific embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.

[0051] Please refer to Figures 2 to 3 , Figure 2 A schematic diagram of the structure of a correction device provided in an embodiment of the present disclosure. Figure 3 This is a structural schematic diagram of the evaporation equipment provided in an embodiment of the present disclosure. The correction device of the embodiment of the present disclosure is applied to the evaporation equipment to perform online real-time adjustment on the shape of the mask in the evaporation equipment to correct the shape of the mask so that it matches the shape of the substrate to be evaporated.

[0052] like Figure 2 As shown, the correction device 200 includes a detection device 210, an adjustment device 220, and a controller 230 connected to the detection device 210 and the adjustment device 220. The detection device 210 is used to detect deformation information of the substrate 400 to be evaporated and transmit the deformation information to the controller 230; the adjustment device 220 includes a plurality of adjustment components 2210, each of which includes an adjustment rod, the adjustment rod being used to extend into an adjustment slot of a mask 340, wherein the mask 340 has a first surface opposite to the substrate 400 to be evaporated, and a plurality of adjustment slots 3400 corresponding to the adjustment components 2210 are provided on the first surface; the controller 230 is used to calculate the adjustment force required for each adjustment slot when correcting the mask 340 based on the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot 3400 to correct the shape of the mask 340.

[0053] like Figure 3As shown, the evaporation equipment 300 includes a transfer chamber 310, an evaporation chamber 320, a carrier 330, and a mask 340. The transfer chamber 310 is provided with a conveying device for transferring the substrate 400 to be evaporated from the transfer chamber 310 to the evaporation chamber 320. The evaporation chamber 320 is used to realize evaporation on the substrate 400 to be evaporated, such as evaporating organic light-emitting materials and cathode materials onto a glass substrate under a vacuum and high-temperature environment to form a light-emitting layer and a cathode layer of a light-emitting device. The carrier 330 and the mask 340 are arranged in the evaporation chamber 320. The carrier 330 is used to carry the mask 340. That is, during the evaporation process, the mask 340 is placed above the carrier 330, and the substrate to be evaporated is placed above the mask 340. During evaporation, the substrate 400 to be evaporated and the mask 340 are attached to each other.

[0054] When the correction device 200 is applied to the evaporation equipment 300, the detection device 210 is disposed in the transport chamber 310, the adjustment device 220 is disposed in the evaporation chamber 320, and the controller 230 can be a backend server remotely connected to the detection device 210. In a specific implementation, the detection device 210 can be located directly above the transport device to perform real-time deformation detection of the substrate 400 to be deposited while being transported on the transport device.

[0055] In order to achieve online correction of the mask 340, the mask 340 needs to be structurally improved corresponding to the correction device 200. Specifically, when the substrate 400 to be evaporated is not deformed, the mask 340 and the substrate 400 to be evaporated are the same in shape and size. At this time, when the mask 340 and the substrate 400 to be evaporated are bonded, the slot opening pattern on the mask 340 and the anode opening pattern on the substrate 400 to be evaporated can be accurately aligned. When evaporation is performed in the evaporation chamber 320, the mask 340 is set on the carrier 330. Assuming that the surface opposite to the substrate to be evaporated is recorded as the first surface A, and the surface of the mask 340 bonded to the substrate 400 to be evaporated is recorded as the second surface B, it is necessary to set a plurality of adjustment grooves 3400 on the first surface A, and each adjustment groove 3400 corresponds to an adjustment component 2210. Each adjustment assembly 2210 is fixedly mounted on the carrier 330 , and when the mask 340 is correctly placed on the carrier 330 , the adjustment rod of each adjustment assembly 2210 just extends into the corresponding adjustment slot 3400 .

[0056] Compared with the related art, the correction device of the embodiment of the present disclosure includes a detection device, an adjustment device and a controller. The detection device can detect the deformation information of the substrate to be evaporated in real time and transmit the deformation information to the controller. The controller calculates the adjustment force required for each adjustment groove when correcting the mask based on the received deformation information, and controls each adjustment rod to apply the adjustment force to the adjustment groove at the corresponding position on the mask to correct the shape of the mask. Such a setting can realize online and automatic correction of the mask shape without having to remove the mask from the production line for repair. On the one hand, it can save manpower and time and improve production efficiency. On the other hand, it can adjust the shape of the mask in a timely and real-time manner so that the shape of the mask is the same as the shape of the current substrate to be evaporated, and the repair effect is more accurate. In addition, by applying the adjustment force by the adjustment device to change the shape of the mask, the adjustment device can be reused multiple times. The mask can be adjusted to a different shape by simply changing the output adjustment force each time. Compared with the solution of using gaskets for repair, it can avoid waste of repair materials, save resources and reduce costs.

[0057] In one possible implementation, see Figure 4 and Figure 6 , Figure 4 is a top view of the carrier platform. Figure 5 This is a top view of the mask placed on the carrier. Figure 6 This is a front view of the carrier, mask and substrate to be evaporated. Figures 4 to 6 As shown, each adjustment assembly 2210 is fixedly mounted on the carrier 330. For any adjustment assembly 2210, the height of the adjustment rod within the adjustment assembly 2210 is greater than the height of the carrier surface of the carrier 340. When the mask 340 is placed on the carrier 330, the adjustment rod fits neatly into the corresponding adjustment slot 3400. The carrier surface of the carrier 340 is the surface where the carrier 330 contacts the mask 340.

[0058] like Figures 4 to 6As shown, the mask 340 includes a first frame 3410, support bars 3420, and a metal mask sheet 3430. The first frame 3410 has a hollow area. The support bars 3420 are connected to the first frame 3410 and span the hollow area of ​​the first frame 3410 to form a support net. The metal mask sheet 3430 is disposed on the support net. Exemplarily, the metal mask sheet 3430 is laser welded to the first frame 3410 and the support bars 3420. The surface of the first frame 3410 opposite the substrate 400 to be evaporated is the first surface A. The multiple adjustment grooves 3400 are evenly distributed on the first surface A. The adjustment assembly 2210 is disposed on the side of the mask 340 facing away from the substrate 400 to be evaporated. When the mask 340 is placed on the support platform 330, the adjustment rod of the adjustment assembly 2210 extends into the adjustment groove 3400.

[0059] In the disclosed embodiment, the mask 340 is a precision metal mask (FMM), and the first frame 3410 is a metal frame. A plurality of adjustment slots 3400 are provided on the frame of the mask 340 (i.e., the first frame). When the shape of the mask 340 needs to be adjusted, the shape of the mask 340 can be changed by applying adjustment forces of different directions and magnitudes to different points on the frame, thereby achieving fine-tuning of the mask pattern on the metal mask sheet 3430. Specifically, when a force is applied to the first frame 3410, the first frame 3410 causes the metal mask sheet 3430, to which it is fixed, to undergo the same change trend, such as stretching or shrinking, thereby causing the position of the evaporation openings in the metal mask sheet 3430 to shift to a certain extent.

[0060] Optionally, the substrate to be evaporated 400 in the embodiment of the present disclosure is a glass substrate. When a large temperature fluctuation occurs during the production process (such as from a high-temperature process to a normal-temperature process), the edge area of ​​the glass substrate will undergo a slight deformation, such as showing an outward expansion trend or an inward contraction trend. Usually, the deformation is at the micron level that is invisible to the naked eye, but the slight deformation will also cause the pixel units in the corresponding area to shift in the corresponding trend, such as the pixel units shifting outward or inward, and ultimately causing the display device to have a color mixing phenomenon. In order to improve this problem, it is necessary to fine-tune the shape of the mask plate 340 so that it is consistent with the shape of the substrate to be evaporated 400. When the shape of the mask plate 340 is fine-tuned, the mask pattern area of ​​the corresponding area on the mask plate 340 will also be fine-tuned accordingly, thereby making the fine-tuned mask pattern match the position of the pixel unit on the deformed substrate to be evaporated 400, such as the position of each evaporation opening on the corrected mask plate 340 is accurately aligned with the position of each pixel opening on the substrate to be evaporated 400. Since the first frame 3410 is made of metal and has a certain elasticity, the shape of the first frame 3410 can be changed when force is applied to different points on the first frame 3410. Since the adjustment process is a fine-tuning process, it will not cause damage to the mask 340.

[0061] It is understandable that the specific structure of the mask in the embodiment of the present disclosure may also be other mask structures in the related art, and the present disclosure is not limited thereto.

[0062] Optional, such as Figures 4 to 6 As shown, the first frame 3410 includes a first frame 3411 and a second frame 3412 extending in a first direction and arranged in parallel, and a third frame 3413 and a fourth frame 3414 extending in a second direction and arranged in parallel, at least one first adjustment groove 3400a is provided on the first surfaces of the first frame 3411 and the second frame 3412, and at least one second adjustment groove 3400b is provided on the first surfaces of the third frame 3413 and the fourth frame 3414; the adjustment device 220 includes a plurality of first adjustment components 2210a and a plurality of second adjustment components 2210b, the first adjustment component 2210a corresponds to the position of the first adjustment groove 3400a, and the second adjustment component 2210b corresponds to the position of the second adjustment groove 3400b.

[0063] Optionally, the first direction is perpendicular to the second direction. For example, the first direction is the X direction and the second direction is the Y direction. In this case, the first frame 3410 is quadrilateral, such as a rectangle. Accordingly, the mask 340 is rectangular. It is understood that in other embodiments, the mask 340 can be shaped in other ways, not just rectangular, as long as the shape of the mask matches the shape of the substrate 400 to be deposited.

[0064] For example, Figures 4 to 6 As shown, the first frame 3411 and the second frame 3412 are the two long frames of the mask, and the third frame 3413 and the fourth frame 3414 are the two short frames of the mask. Four adjustment slots are provided on each long frame, and one adjustment slot is provided on each short frame, for a total of 12 adjustment slots. To distinguish and represent, in the embodiment of the present disclosure, the adjustment slot 3400 on the first frame 3411 and the second frame 3412 is denoted as the first adjustment slot 3400a, and the adjustment slot 3400 on the third frame 3413 and the fourth frame 3414 is denoted as the second adjustment slot 3400b. Correspondingly, the adjustment component 2210 corresponding to the first adjustment slot 3400a is denoted as the first adjustment component 2210a, and the adjustment component 2210 corresponding to the second adjustment slot 3400b is denoted as the second adjustment component 2210b.

[0065] It is understandable that the number of adjustment slots (including the first adjustment slot and the second adjustment slot) on the mask can be adaptively set according to the size of the mask and the adjustment accuracy of the mask, and the embodiment of the present disclosure does not limit the number of adjustment slots.

[0066] In one possible implementation, the detection device 210 includes a plurality of optical sensors 2110 uniformly distributed along a first direction and a plurality of optical sensors 2110 uniformly distributed along a second direction, each of the optical sensors 2110 forming a detection area, and when the substrate to be evaporated 400 is located in the detection area, the orthographic projection of the optical sensor 2110 on the substrate to be evaporated 400 is located in the edge area of ​​the substrate to be evaporated 400.

[0067] In the embodiment of the present disclosure, the deformation information of the substrate to be evaporated 400 is detected by an optical sensor. Exemplarily, the optical sensor is a high-definition CCD device, and its detection accuracy can reach the micron level, which can realize the detection of tiny deformations on the substrate to be evaporated 400. Optionally, the optical sensor 2110 is used to detect the pixel position accuracy (PPA) of the edge area of ​​the substrate to be evaporated 400. The PPA can characterize the position offset of the pixel opening pattern in the substrate to be evaporated 400, that is, the shape change of the substrate to be evaporated 400. The controller 230 can obtain the shape change information of the substrate to be evaporated 400 based on the PPA data, including information such as the deformation position, deformation direction, and deformation intensity, and then determine the adjustment force required to make the mask 340 undergo the same deformation.

[0068] Optionally, there are multiple optical sensors, and the position distribution of the multiple optical sensors can cover the surrounding edge areas of the substrate to be evaporated 400, that is, the detection area formed by each optical sensor, that is, the detection range can cover the surrounding edge areas of the substrate to be evaporated 400, so that the deformation of the edge areas of the substrate to be evaporated 400 can be detected in real time.

[0069] In a possible implementation, the number of the optical sensors is the same as the number of the adjustment slots on the mask, and the relative position distribution between the optical sensors is the same as the relative position distribution between the adjustment slots.

[0070] Among them, the relative position distribution between each optical sensor includes the relative position of any optical sensor among each optical sensor and other optical sensors, and the relative position includes direction and distance. Similarly, the relative position distribution between each adjustment slot includes the relative position of any adjustment slot among each adjustment slot and other adjustment slot. The relative position distribution of the optical sensor and the adjustment slot is the same, that is, the layout of the optical sensor and the adjustment slot is the same.

[0071] For example, Figures 4 to 6 The distribution structure of the adjustment grooves in the mask shown in FIG. 1 and the distribution of the orthographic projection of the detection device on the substrate to be evaporated 400 are shown in FIG. Figure 7 As shown, Figure 7 As shown, the detection device 210 includes 12 optical sensors 2110, wherein 5 optical sensors 2110 are arranged in the extension direction of each long side along the long side extension direction of the substrate 400 to be evaporated, and 1 optical sensor 2110 is arranged in the extension direction of each short side along the extension direction of the short side of the substrate 400 to be evaporated.

[0072] The detection device 210 is disposed in the transport chamber 310. In a specific implementation, the detection device 210 can be disposed directly above the conveyor in the transport chamber 310, as long as the detection area of ​​the detection device 210 can be directly aligned with the surface of the substrate to be evaporated 400 where the material is to be evaporated, and when the substrate to be evaporated 400 is placed on the conveyor and located in the detection area, the orthographic projections of the optical sensors 2110 on the substrate to be evaporated 400 are evenly distributed along the edge of the substrate to be evaporated 400. For example, if the shape and size of the undeformed substrate to be evaporated 400 are identical to the shape and size of the unmodified initial mask 340, then the distribution of the orthographic projections of the optical sensors 2110 on the undeformed substrate to be evaporated 400 is identical to the distribution of the adjustment slots 3400 on the unmodified initial mask 340.

[0073] In one possible implementation, the adjustment component 2210 is a torque adjustment component.

[0074] Optionally, the adjustment assembly 2210 includes, in addition to the adjustment rod 2211, a drive motor 2212, the output shaft of the drive motor 2212 being connected to the adjustment rod 2211, and the output end of the controller 230 being connected to the drive motor 2212, for controlling the drive motor 2212 to rotate according to the adjustment force to drive the adjustment rod 2211 to apply the adjustment force to the adjustment slot 3400. In a specific implementation, the adjustment rod 2211 can also be connected to the output shaft of the drive motor 2211 via a connecting mechanism (such as a gear, a belt, a chain, etc.) to ensure that the torque output by the drive motor 2212 can be accurately transmitted to the adjustment rod 2211.

[0075] For any adjustment component 2210, its working principle is as follows: the controller 230 calculates the adjustment force required when the mask 340 undergoes the same deformation based on the deformation information of the substrate to be evaporated 400. The adjustment force includes the adjustment force required on each adjustment groove, and each adjustment force includes two information: magnitude and direction; then, the controller 230 adjusts the output frequency, current or magnetic field and other parameters of the corresponding drive motor 2212 according to the calculated adjustment force, thereby changing the magnitude and direction of the adjustment force applied by the adjustment rod to the adjustment groove.

[0076] Optionally, the adjustment rod 2211 includes an end portion for extending into the adjustment slot 3400, and the end portion abuts against the sidewall of the adjustment slot 3400 when the adjustment force is applied. Specifically, the end portion of the adjustment rod 2211 is designed to be suitable for extending into the adjustment slot 3400 and contacting the sidewall of the adjustment slot 3400. For example, the end portion of the adjustment rod may be spherical, conical, cylindrical, or a regular polygonal shape. When the adjustment rod 2211 applies a force to the sidewall of the adjustment slot 3400, the force causes the shape of the mask 340 to change.

[0077] Furthermore, the length and diameter of the adjustment rod 2211 can be designed to match the shape, depth, width, and other parameters of the adjustment slot 3400 to ensure that the end of the adjustment rod 2211 can smoothly extend into the adjustment slot 3400 and apply the adjustment force. Furthermore, the adjustment rod 2211 has sufficient rigidity and strength to maintain a stable shape during the adjustment process and to be able to apply sufficient adjustment force to the corresponding adjustment slot 3400.

[0078] In one possible implementation, the adjustment groove 3400 is a circular groove, a rectangular groove, or a regular polygonal groove, that is, the cross-sectional shape of the adjustment groove is circular, rectangular, or a regular polygon. Correspondingly, the end of the adjustment rod 2211 can be spherical, cylindrical, or other structures.

[0079] When the adjustment groove 3400 is a circular groove, the adjustment groove 3400 has a 360° arc-shaped sidewall within the first plane. When the adjustment rod 2211 abuts the sidewall of the adjustment groove 3400, it can flexibly output an adjustment force in various directions within the first plane, that is, it can apply an adjustment force in various directions to the mask 340, which is more conducive to achieving fine shape adjustment of the mask 340. In addition, when the adjustment groove 3400 is a circular, rectangular, or regular polygonal groove, it is also beneficial for the end of the adjustment rod 2211 to abut against the sidewall of the adjustment groove 3400, and the processing technology of the adjustment groove is simple and easy to implement. It is understandable that in other embodiments, the end of the adjustment rod 2211 can also contact the bottom wall of the adjustment groove 3400, and the adjustment rod 2211 can also apply an adjustment force toward the bottom wall of the adjustment groove.

[0080] For example, please refer to Figure 8 , Figure 8 Schematic diagram of correcting the mask by using the correction device. Figure 8 400 in the middle represents the substrate 400 to be evaporated after deformation, and the dotted box represents the shape of the substrate 400 to be evaporated when no deformation occurs. Figure 8 It can be seen that the substrate to be evaporated 400 has undergone outward deformation in the two long sides and inward deformation in the two short sides. The controller 230 calculates the adjustment force required by each adjustment component 2210 based on the detected deformation information of the substrate to be evaporated 400, which are respectively recorded as F1, F2, F3, F4, F5, F6, F7, F8, F9, F10, F11 and F12, where the length of the arrow represents the magnitude of the adjustment force, and the direction of the arrow represents the direction of action of the adjustment force. Figure 8 It can be seen that the magnitudes of the adjustment forces F1, F2, F3, F4, F5, F6, F7, F8, F9, F10, F11 and F12 are all different, and the direction of the adjustment force is the same as the deformation direction at the corresponding position. After the adjustment components 2210 apply their respective corresponding adjustment forces to the side walls of the adjustment grooves 3400 in their respective adjustment grooves 3400, the mask plate 340 undergoes the same deformation as the substrate to be evaporated 400, and the shape of the corrected mask plate 340 is the same as the shape of the substrate to be evaporated 400.

[0081] Based on the same inventive concept, a second aspect of the present disclosure provides an evaporation device having the correction device as described above.

[0082] For example, Figure 9As shown, the evaporation equipment includes a transmission chamber 310, an evaporation chamber 320, a carrier 330, a mask 340, and a correction device, wherein the correction device includes a detection device 210, an adjustment device 220, and a controller 230 connected to the detection device 210 and the adjustment device 230; the detection device 210 is arranged in the transmission chamber 310, for detecting the deformation information of the substrate 400 to be evaporated and transmitting the deformation information to the controller 230; the carrier 330 is arranged in the evaporation chamber 320, for placing the mask 340, and the mask 340 has a contact with the substrate to be evaporated. The first surface opposite to the evaporation substrate 400 is provided with a plurality of adjustment grooves; the adjustment device 220 is provided in the evaporation chamber 320, and the adjustment device 320 includes a plurality of adjustment components corresponding to the plurality of adjustment grooves, and any of the adjustment components includes an adjustment rod, and the adjustment rod extends into the corresponding adjustment groove when the mask is placed on the supporting platform; the controller 230 is used to calculate the adjustment force required for each adjustment groove when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment groove to correct the shape of the mask.

[0083] like Figure 9 As shown, Figure 9 Passage1 and Passage2 both represent transmission sections, wherein Passage1 represents the input transmission section of the evaporation chamber 320, and Passage2 represents the output transmission section of the evaporation chamber 320, that is, the glass substrate in Passage1 (that is, the substrate to be evaporated 400) is transmitted to the evaporation chamber 320 for the evaporation process, and the glass substrate after evaporation in the evaporation chamber 320 is output to Passage2 to enter the next process. When a new glass substrate in Passage1 needs to be transferred to the evaporation chamber 320 for evaporation, the detection device 210 in Passage1 measures the PPA of the current glass substrate in real time and feeds the data back to the controller 230, and the controller 230 adjusts the shape of the mask 340 in real time; similarly, when the glass substrate in Passage2 needs to be evaporated again for the next process, the detection device 210 in Passage2 is also required to detect the PPA data of the glass substrate therein and feed it back to the controller 230. Among them, the PPA data of the glass substrate detected by the detection device 210 is transmitted to the controller 230. The controller calculates the deformation of the glass substrate based on the PPA data, calculates the adjustment force required to change the shape of the mask based on the deformation of the glass substrate, and outputs the adjustment force information to the adjustment device 220. The adjustment device 220 applies the adjustment force to the mask 340, thereby realizing the correction of the shape of the mask 340.

[0084] Based on the same inventive concept, the third aspect of the present disclosure provides a correction method, which is applicable to the correction device shown above. Figure 10 As shown, the correction method includes the following steps:

[0085] Step S101, obtaining deformation information of a substrate to be evaporated;

[0086] Step S102, calculating, based on the deformation information, an adjustment force required for each adjustment slot when the adjustment device corrects the mask, the mask having a first surface opposite to the substrate to be evaporated, the first surface being provided with a plurality of adjustment slots, the adjustment device including a plurality of adjustment assemblies corresponding one-to-one to the plurality of adjustment slots, each of the adjustment assemblies including an adjustment rod, the adjustment rod extending into the corresponding adjustment slot;

[0087] Step S103 , controlling each adjusting rod to apply the adjusting force to the corresponding adjusting slot to correct the shape of the mask.

[0088] Compared with the related art, the correction method of the embodiment of the present invention can detect the deformation information of the substrate to be evaporated in real time, calculate the adjustment force required for each adjustment groove when correcting the mask according to the received deformation information, and control each adjustment rod to apply the adjustment force to the adjustment groove at the corresponding position on the mask to correct the shape of the mask. With such a setting, the online and automatic correction of the shape of the mask can be achieved without the need to remove the mask from the production line and then repair it. On the one hand, it can save manpower and time and improve production efficiency. On the other hand, it can adjust the shape of the mask in a timely and real-time manner so that the shape of the mask is the same as the shape of the current substrate to be evaporated, and the repair effect is more accurate. In addition, by applying the adjustment force through the adjustment device to change the shape of the mask, the adjustment device can be reused multiple times. The mask can be adjusted to a different shape by only changing the output adjustment force each time. Compared with the solution of using gaskets for repair, it can avoid the waste of repair materials, save resources and reduce costs.

[0089] Based on the same inventive concept, a fourth aspect of the present disclosure provides a computer-readable storage medium having a computer program stored thereon, which implements the steps of the correction method described above when executed by a processor.

[0090] In a specific implementation process, computer storage media may include: Universal Serial Bus Flash Drive (USB), mobile hard disk, Read-Only Memory (ROM), Random Access Memory (RAM), magnetic disk or optical disk, and other storage media that can store program code.

[0091] Based on the same inventive concept, a fifth aspect of the present disclosure provides a computer program product, including a computer program, which, when executed by a processor, implements the steps of the data management method described above. Because the principles underlying the problem solved by the computer program are similar to those of the data management method, the implementation of the computer program can be referenced to the implementation of the data management method, and any repetitions will not be repeated.

[0092] The computer program product can employ any combination of one or more readable media. The readable medium can be a readable signal medium or a readable storage medium. The readable storage medium can be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device or component, or any combination thereof. More specific examples (non-exhaustive list) of readable storage media include: an electrical connection with one or more wires, a portable disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination thereof.

[0093] Obviously, the above embodiments of the present disclosure are merely examples for clearly illustrating the present disclosure, and are not intended to limit the implementation methods of the present disclosure. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is impossible to enumerate all the implementation methods here. Any obvious changes or modifications derived from the technical solution of the present disclosure are still within the scope of protection of the present disclosure.

Claims

1. A correction device, characterized in that: It includes a detection device, an adjustment device, and a controller connected to the detection device and the adjustment device; The detection device is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller; The adjustment device includes a plurality of adjustment components, each of which includes an adjustment rod, the adjustment rod being configured to extend into an adjustment slot of a mask, wherein the mask has a first surface opposite to the substrate to be evaporated, and a plurality of adjustment slots corresponding to the adjustment components are provided on the first surface; The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

2. The correction device according to claim 1, characterized in that The mask plate includes a first frame, a support bar and a metal mask sheet. The first frame has a hollow area. The support bar is connected to the first frame and spans the hollow area of ​​the first frame to form a support net. The metal mask sheet is fixedly set on the support net. The surface of the first frame opposite to the substrate to be evaporated is the first surface. The multiple adjustment grooves are evenly distributed on the first surface. The adjustment component is arranged on the side of the mask plate away from the substrate to be evaporated. When the mask plate is placed on the supporting platform, the adjustment rod of the adjustment component extends into the adjustment groove.

3. The correction device according to claim 2, characterized in that The first frame includes a first frame and a second frame extending in a first direction and arranged in parallel, and a third frame and a fourth frame extending in a second direction and arranged in parallel, at least one first adjustment groove being provided on the first surfaces of the first frame and the second frame, and at least one second adjustment groove being provided on the first surfaces of the third frame and the fourth frame; The adjustment device includes a plurality of first adjustment components and a plurality of second adjustment components, wherein the first adjustment components correspond to the positions of the first adjustment slots, and the second adjustment components correspond to the positions of the second adjustment slots.

4. The correction device according to any one of claims 1 to 3, characterized in that The detection device includes a plurality of optical sensors uniformly distributed along a first direction and a plurality of optical sensors uniformly distributed along a second direction, each of the optical sensors forming a detection area. When the substrate to be evaporated is located in the detection area, the orthographic projection of the optical sensor on the substrate to be evaporated is located in the edge area of ​​the substrate to be evaporated.

5. The correction device according to claim 4, characterized in that The number of the optical sensors is the same as the number of the adjustment slots on the mask, and the relative position distribution between the optical sensors is the same as the relative position distribution between the adjustment slots.

6. The correction device according to claim 1, characterized in that The adjustment assembly also includes a drive motor, the output shaft of the drive motor is connected to the adjustment rod, and the output end of the controller is connected to the drive motor for controlling the rotation of the drive motor to drive the adjustment rod to apply the adjustment force to the adjustment slot.

7. The correction device according to claim 1, characterized in that The adjusting rod includes an end portion for extending into the adjusting slot, and the end portion abuts against a side wall of the adjusting slot when the adjusting force is applied.

8. The correction device according to claim 1, characterized in that The adjusting groove is a circular groove, a rectangular groove or a regular polygonal groove.

9. A vapor deposition device, characterized in that: The device comprises a transmission chamber, an evaporation chamber, a carrier, a mask, and a correction device, wherein the correction device comprises a detection device, an adjustment device, and a controller connected to the detection device and the adjustment device; The detection device is arranged in the transmission cavity, and is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller; The carrying platform is arranged in the evaporation chamber for placing a mask, the mask having a first surface opposite to the substrate to be evaporated, and a plurality of adjustment grooves are arranged on the first surface; The adjustment device is disposed in the evaporation chamber, and includes a plurality of adjustment components corresponding to the plurality of adjustment slots. Each of the adjustment components includes an adjustment rod, and when the mask is placed on the carrier, the adjustment rod extends into the corresponding adjustment slot. The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

10. A correction method, characterized in that: The following steps are involved: Obtaining deformation information of the substrate to be evaporated; Calculating, based on the deformation information, an adjustment force required for each adjustment slot when the adjustment device corrects the mask, the mask having a first surface opposite to the substrate to be evaporated, the first surface being provided with a plurality of adjustment slots, the adjustment device comprising a plurality of adjustment components corresponding one-to-one to the plurality of adjustment slots, each of the adjustment components comprising an adjustment rod, the adjustment rod extending into the corresponding adjustment slot; Each adjusting rod is controlled to apply the adjusting force to the corresponding adjusting slot to correct the shape of the mask.

Images