TCO glass coating device and coating process

Abstract

The invention discloses a TCO glass coating device and coating process, the coating device comprises a tin bath and an annealing kiln, in the process direction of the coating device, the annealing kiln is located at the downstream of the tin bath, and the coating device further comprises a first coating reactor arranged in the tin bath and a second coating reactor arranged in the annealing kiln. In the coating process, the temperature of the tin bath and the temperature of the annealing kiln are fully utilized, so that the whole coating process can be completed under a high-temperature condition, atoms in a coating solution and a glass substrate are combined more firmly through a high-temperature chemical reaction, the performance of the TCO glass plate is further improved, and the service life of the TCO glass plate can be prolonged; and the existing heat source is fully utilized, so that the production process is simplified, and the energy loss in the creation process is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of glass processing, and in particular to a TCO glass coating device and a coating process. Background Art

[0002] With the rapid development of the new generation of photovoltaic cell technology, the upstream and downstream of the industry chain have ushered in new opportunities. Among them, TCO conductive film glass has attracted much attention. In the latest third-generation perovskite battery components, photovoltaic glass will change from a supporting role to an absolute protagonist, and TCO conductive film glass has become the core component of the third-generation perovskite battery technology. TCO glass, the full name of which is transparent conductive oxide coated glass, uses advanced physical or chemical coating technology to coat one or more layers of uniform and transparent conductive oxide films on the surface of flat glass.

[0003] However, during the coating process of existing TCO glass panels, either the temperature conditions are not sufficient, resulting in poor bonding between the coating and the glass substrate, or a special heating device is required to provide a heat source to ensure the temperature requirements during the coating process, which requires an additional energy supply system.

[0004] In view of the above-mentioned shortcomings, it is necessary to design a coating device and coating process for TCO glass. Summary of the invention

[0005] Therefore, the technical problem to be solved by the present invention is that during the coating process of the existing TCO glass plate,

[0006] Either the temperature is not high enough and the coating is not well bonded to the glass substrate, or a special heating device is needed to provide a heat source to ensure the temperature requirement during the coating process. A coating device and coating process for TCO glass are provided.

[0007] In order to solve the above technical problems, the technical solution of the present invention is as follows:

[0008] A coating device for TCO glass, the coating device comprising a tin bath and an annealing lehr. In the process direction of the coating device, the annealing lehr is located downstream of the tin bath. The coating device also comprises a coating reactor 1 arranged in the tin bath, and a coating reactor 2 arranged in the annealing lehr.

[0009] Furthermore, in the process direction of the coating device, the tin bath includes a first temperature section, a second temperature section and a third temperature section in which the temperature decreases successively and the groove width becomes successively smaller, the coating reactor 1 is arranged in the third temperature section, the annealing kiln includes a connected pre-annealing section and an annealing section, and the coating reactor 2 is located in the pre-annealing section.

[0010] Furthermore, the coating reactor 1 includes an anti-reflection layer coating reactor, a transition layer coating reactor and a barrier layer coating reactor. In the process direction of the coating device, the anti-reflection layer coating reactor, the transition layer coating reactor and the barrier layer coating reactor are arranged in sequence.

[0011] Furthermore, the anti-reflection layer coating reactor comprises a first anti-reflection layer coating reactor and a second anti-reflection layer coating reactor, and in the process direction of the coating device, the first anti-reflection layer coating reactor is located upstream of the second anti-reflection layer coating reactor.

[0012] Furthermore, it also includes two sealing structures arranged in the tin bath at a distance from each other. In the length direction of the tin bath, the two sealing structures are respectively arranged on two opposite sides of the coating reactor, and the outer walls of the two sealing structures are sealed and connected to the inner wall of the tin bath.

[0013] Furthermore, it also includes a glass plate transportation mechanism, which is extended into the tin bath and the annealing furnace.

[0014] The technical solution of the present invention has the following advantages:

[0015] 1. The coating device of TCO glass provided by the present invention comprises a tin bath and an annealing furnace, the annealing furnace comprises a connected pre-annealing section and an annealing section, the coating device further comprises a coating reactor 1 arranged in the tin bath, and a coating reactor 2 arranged in the pre-annealing section. During the coating process, since the temperature of the existing tin bath and the temperature of the pre-annealing section are fully utilized, it can be ensured that the entire coating process is completed under high temperature conditions, so that the atoms in the plating solution and the glass plate are more firmly bonded through high-temperature chemical reactions, thereby improving the performance of the TCO glass plate and extending the service life of the TCO glass plate, and fully utilizing the existing heat source, which not only simplifies the production process, but also reduces the energy loss in the processing process, which is in line with the current energy conservation, emission reduction, and green environmental protection concepts.

[0016] 2. The coating device for TCO glass provided by the present invention also includes two sealing structures arranged in the tin bath at a distance from each other. In the length direction of the tin bath, the two sealing structures are respectively arranged on two opposite sides of the coating reactor 1. The outer walls of the two sealing structures are sealed and connected to the inner wall of the tin bath. The sealing structure is used to confine the exhaust gas released by the coating reactor 1 in the working state between the two sealing structures, and then discharge it through the exhaust pipe connected to the coating reactor 1 and vent it after treatment, thereby effectively preventing the leakage of harmful gases and ensuring the safety and cleanliness of the working environment. At the same time, the sealing structure also reduces the risk of impurities, dust and moisture in the air entering the coating area and falling on the glass substrate, thereby ultimately improving the quality of the coating on the glass substrate.

[0017] A coating process for TCO glass comprises the following steps:

[0018] Coating the upper surface of the glass substrate in a tin bath to form a basic coating layer;

[0019] A functional layer is plated on the basic coating layer entering the pre-annealing section in an annealing furnace.

[0020] Furthermore, in the third temperature zone of the tin bath, the vaporized first plating solution, the second plating solution, the third plating solution, and the fourth plating solution are plated layer by layer on the glass substrate to form a first anti-reflection layer, a second anti-reflection layer, a transition layer, and a barrier layer, respectively; and the vaporized fifth plating solution is plated on the barrier layer to form the functional layer.

[0021] Furthermore, the vaporization temperature of the first plating solution is 650°C to 700°C; the vaporization temperature of the second plating solution is 650°C to 700°C; the vaporization temperature of the third plating solution is 630°C to 700°C; the vaporization temperature of the fourth plating solution is 600°C to 630°C; and the vaporization temperature of the fifth plating solution is 530°C to 580°C.

[0022] Furthermore, the components of the first plating solution are 88-93 parts of silicon source, 4-8 parts of catalyst, and 3-4 parts of stabilizer in parts by weight; the components of the second plating solution are 83-87 parts of silicon source, 9-11 parts of water, 2-3 parts of acid, and 3-5 parts of stabilizer in parts by weight; the components of the third plating solution are 83-93 parts of silicon source, 65-76 parts of tin source, and 5-9 parts of catalyst in parts by weight; the components of the fourth plating solution are 88-92 parts of silicon source, 5-8 parts of oxygen source, and 3-4 parts of stabilizer in parts by weight; the components of the fifth plating solution are 81-87 parts of tin source, 6-10 parts of fluorine source, 7-9 parts of stabilizer, and 8-15 parts of catalyst in parts by weight.

[0023] The technical solution of the present invention has the following advantages:

[0024] 1. The coating process of TCO glass provided by the present invention fully utilizes the temperature of the existing tin bath and the temperature of the pre-annealing section, thereby ensuring that the entire coating process is completed under high temperature conditions, so that the atoms in the plating solution and the glass plate are more firmly bonded through high-temperature chemical reactions, thereby improving the performance of the TCO glass plate and extending the service life of the TCO glass plate. In addition, the existing heat source is fully utilized, which not only simplifies the production process, but also reduces the energy loss in the processing process, which is in line with the current energy conservation, emission reduction, and green environmental protection concepts.

[0025] 2. In the coating process of TCO glass provided by the present invention, the first coating solution, the second coating solution, the third coating solution, the fourth coating solution and the fifth coating solution are collectively referred to as coating solutions. The vaporization temperature and components of the coating solutions are more reasonably designed, which is beneficial to improving the coating quality, reducing the consumption of the coating solution and reducing the cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0027] Figure 1 is a schematic top view of a TCO glass coating device in an embodiment of the present invention;

[0028] Figure 2 It is a side schematic diagram of a TCO glass coating device in an embodiment of the present invention.

[0029] Description of reference numerals:

[0030] 1. Tin bath; 11. First temperature zone; 12. Second temperature zone; 13. Third temperature zone; 2. Annealing lehr; 21. Pre-annealing zone; 22. Annealing zone; 3. Coating reactor one; 31. First anti-reflection layer coating reactor; 32. Second anti-reflection layer coating reactor; 33. Transition layer coating reactor; 34. Barrier layer coating reactor; 4. Coating reactor two; 5. Glass plate transport mechanism; 6. Sealing structure; 7. Glass substrate; A. Cantilever structure. DETAILED DESCRIPTION

[0031] The technical solution of the present invention will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0032] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0033] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0034] In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0035] Example 1

[0036] like Figure 1 to Figure 2 As shown, this embodiment provides a coating device for TCO glass (hereinafter referred to as the coating device), the coating device includes a tin bath 1 and an annealing furnace 2. In the process direction of the coating device, the annealing furnace 2 is located downstream of the tin bath 1. The coating device also includes a coating reactor 1 3 arranged in the tin bath 1, and a coating reactor 2 4 arranged in the annealing furnace 2.

[0037] During the coating process, since the temperature of the existing tin bath 1 and the temperature of the annealing furnace 2 are fully utilized, the entire coating process can be completed under high temperature conditions, so that the atoms in the coating solution and the glass substrate 7 are bonded more firmly through high-temperature chemical reactions, and the bonding between the film layers is stronger, thereby extending the service life of the TCO glass plate.

[0038] Furthermore, the tin bath 1 comprises a first temperature section 11 , a second temperature section 12 and a third temperature section 13 , in which the temperature decreases successively and the bath width decreases successively, and the coating reactor 1 3 is arranged in the third temperature section 13 . Specifically, the working temperature of the first temperature section 11 is between 900°C and 1050°C, so that the glass liquid is in a flowing state. The glass liquid stays on the upper surface of the tin liquid in the first temperature section 11 for about 1 minute, which can eliminate the ripples inside the glass substrate 7. The width of the second temperature section 12 is smaller than the width of the first temperature section 11. In the top view of the tin bath 1, the second temperature section 12 is trapezoidal, which is used to transitionally connect the first temperature section 11 and the third temperature section 13. The temperature of the second temperature section is between 750°C and 900°C. The second temperature section 12 is used to cool and stabilize the glass substrate 7 and prevent oxidation of the tin liquid. The working temperature of the third temperature section 13 is controlled at 600°C to 750°C to reduce the temperature difference of the tin liquid in the third temperature section 13, thereby reducing the thickness difference of the glass substrate 7 and improving the flatness of the surface of the finished glass product. The annealing furnace 2 includes a pre-annealing section 21 and an annealing section 22 connected to each other, and the coating reactor 2 4 is arranged in the pre-annealing section 21.

[0039] Furthermore, the coating device further includes a glass plate transport mechanism 5 extending inside the tin bath 1 and the annealing furnace 2, which is used to drive the glass substrate 7 to move along the process direction of the coating device. The glass plate transport mechanism 5 can also provide a stable and uniform support force for the glass substrate 7 when the glass substrate 7 moves at a high speed or a low speed, so as to prevent the glass substrate 7 from vibrating or deviating and affecting the coating quality. The coating reactor 1 3 and the coating reactor 2 4 are located above the glass plate transport mechanism 5.

[0040] Furthermore, it also includes two sealing structures 6 arranged in the tin bath 1 at a distance. In the length direction of the tin bath 1, the two sealing structures 6 are respectively arranged at two opposite sides of the coating reactor 3, and the outer walls of the two sealing structures 6 are sealed and connected to the inner wall of the tin bath 1. The sealing structure 6 is used to confine the exhaust gas released by the coating reactor 3 during the coating process between the two sealing structures 6, and then discharge it through the exhaust pipe (not shown) connected to the coating reactor 3 and vent it after treatment, thereby effectively preventing the leakage of harmful gases and ensuring the safety and cleanliness of the working environment. At the same time, the sealing structure 6 also reduces the risk of impurities, dust and moisture in the air entering the coating area and falling on the glass substrate 7, and finally improving the quality of the coating on the glass substrate 7.

[0041] Furthermore, the coating reactor 1 3 is a rectangular parallelepiped structure, and the coating reactor 1 3 is suspended in the third temperature section 13 through a cantilever structure A provided at the top thereof, and is located above the glass plate on the glass plate transport mechanism 5, and the coating speed matches the travel speed of the glass substrate 7. The coating reactor 2 4 is also suspended in the pre-annealing section 21 through a cantilever structure A provided at the top thereof, so as to coat the glass substrate 7 again. The coating reactor 1 3 and the coating reactor 2 4 are existing structures and will not be described in detail here.

[0042] Specifically, the glass raw materials are melted into glass liquid at high temperature in the tank kiln, and the glass liquid flows into the tin bath 1 from the glass liquid inlet. Since the density of the glass liquid is smaller than that of the tin liquid, the glass liquid floats on the tin liquid to form a smooth glass substrate 7. When the glass substrate 7 enters the third temperature section 13 from the first temperature section 11, it will shrink, its width will gradually narrow, and its thickness will gradually increase.

[0043] In this embodiment, the coating reactor 1 3 includes a first anti-reflection layer coating reactor 31 for coating a first anti-reflection layer on the upper surface of the glass substrate 7, a second anti-reflection layer coating reactor 32 for coating a second anti-reflection layer on the first anti-reflection layer, a transition layer coating reactor 33 for coating a transition layer on the second anti-reflection layer, and a barrier layer coating reactor 34 for coating a barrier layer on the transition layer, which are sequentially arranged along the process direction of the coating device. The transition layer is mainly used to eliminate color difference, increase adhesion, etc., and the barrier layer helps to improve the optical performance and durability of the coating. The coating reactor 2 4 is used to coat the functional layer, which helps to improve the overall performance and application effect of the glass. Specifically, the functional layer is a transparent conductive oxide thin film layer. The first anti-reflection layer coating reactor 31 and the second anti-reflection layer coating reactor 32 are collectively referred to as the anti-reflection layer coating reactor.

[0044] Specifically, in the process direction of the coating device, the pre-annealing section 21 is arranged upstream of the annealing zone 22. After the glass substrate 7 after coating by the coating reactor 3 enters the pre-annealing section 21, the temperature of the glass substrate 7 can be uniformed in the pre-annealing section 21. After the temperature is uniformed, the functional layer is plated, which can improve the coating quality of the functional layer. The annealing furnace 2 can automatically control to reach the upper limit temperature of annealing. The annealing furnace 2 in the coating device is a prior art and will not be described here. The annealing section 22 is used to cool the glass plate after coating. Its temperature is controlled at 120°C to 600°C to ensure the stable molding of the glass plate.

[0045] The TCO glass coating device provided in this embodiment has the following advantages:

[0046] 1) During the coating process, the existing tin bath 1, especially the high temperature of the third temperature section 13 and the pre-annealing zone 21, can be used to promote the rapid decomposition and deposition of the film material, thereby forming a multi-layer protective film and a functional film on the surface of the glass substrate 7. The film layer and the glass plate are more firmly bonded through a high-temperature chemical reaction, and the bonding between the film layers is more firmly, so that the TCO glass plate has strong weather resistance and a long service life;

[0047] 2) The TCO glass plate obtained after coating has excellent optical properties and strong corrosion resistance, ensuring the long-term durability and adaptability of the product;

[0048] 3) The entire coating process is more efficient and stable, which improves the consistency and qualification rate of products and reduces processing costs;

[0049] 4) The multi-layer coating can not only achieve the anti-reflection effect and the blocking effect, but also increase the physical and chemical properties such as hardness, water resistance, acid resistance and alkali resistance of the film layer on the surface of the glass substrate 7;

[0050] 5) The temperature in the third temperature zone 13 of the existing tin bath 1 and the temperature in the pre-annealing zone 21 are used to provide high temperature conditions for the coating process, which not only simplifies the production process and reduces energy loss in the production process, conforms to the current energy conservation, emission reduction and green environmental protection concepts, but also improves production efficiency.

[0051] Example 2

[0052] This embodiment provides a coating process for a TCO glass plate, using the coating device for the TCO glass in Embodiment 1 (such as Figure 1 and Figure 2 As shown), comprising the following steps:

[0053] Coating the glass substrate 7 in the tin bath 1 to form a basic coating layer, specifically forming the basic coating layer in the third temperature section 13 of the tin bath 1;

[0054] In the annealing furnace 2 , a functional layer is plated on the base coating film entering the pre-annealing section 21 , specifically, the functional layer is plated in the pre-annealing section 21 of the annealing furnace 2 .

[0055] During the coating process, since the temperature of the existing tin bath 1 and the temperature of the annealing furnace 2 are fully utilized, it can be ensured that the entire coating process is completed under high temperature conditions, so that the atoms in the coating solution and the glass substrate are more firmly bonded through high-temperature chemical reactions, and the bonding between the film layers is more firmly, thereby extending the service life of the TCO glass plate.

[0056] Furthermore, in the third temperature section 13, the vaporized first plating solution is deposited on the glass substrate 7 layer by layer to form a first anti-reflection layer, the vaporized second plating solution is deposited on the first anti-reflection layer to form a second anti-reflection layer, the vaporized third plating solution is deposited on the second anti-reflection layer to form a transition layer, the vaporized fourth plating solution is deposited on the transition layer to form a barrier layer, and in the pre-annealing section 21, the vaporized fifth plating solution is deposited on the barrier layer to form a functional layer.

[0057] Further, the vaporization temperature of the first plating solution is 650℃ to 700℃, the vaporization temperature of the second plating solution is 650℃ to 700℃, the vaporization temperature of the third plating solution is 630℃ to 700℃, the vaporization temperature of the fourth plating solution is 600℃ to 630℃, and the vaporization temperature of the fifth plating solution is 530℃ to 580℃.

[0058] Furthermore, the components of the first plating solution, by weight, are 88-93 parts of silicon source, 4-8 parts of catalyst, and 3-4 parts of stabilizer; the components of the second plating solution, by weight, are 83-87 parts of silicon source, 9-11 parts of water, 2-3 parts of acid, and 3-5 parts of stabilizer; the components of the third plating solution, by weight, are 83-93 parts of silicon source, 65-76 parts of tin source, and 5-9 parts of catalyst; the components of the fourth plating solution, by weight, are 88-92 parts of silicon source, 5-8 parts of oxygen source, and 3-4 parts of stabilizer; the components of the fifth plating solution, by weight, are 81-87 parts of tin source, 6-10 parts of fluorine source, 7-9 parts of stabilizer, and 8-15 parts of catalyst.

[0059] Furthermore, the components of the first plating solution are: silane is selected as the silicon source, water vapor is selected as the catalyst, and ethyl acetate is selected as the stabilizer; the components of the second plating solution are: silane is selected as the silicon source, acetic acid is selected as the acid, and ethyl acetate is selected as the stabilizer; the components of the third plating solution are: silane is selected as the silicon source, monobutyltin trichloride is selected as the tin source, and water vapor is selected as the catalyst; the components of the fourth plating solution are: silane is selected as the silicon source, carbon dioxide is selected as the oxygen source, and ethylene is selected as the stabilizer; the components of the fifth plating solution are: monobutyltin trichloride is selected as the tin source, trifluoroacetic acid is selected as the fluorine source, ethyl acetate is selected as the stabilizer, and water vapor is selected as the catalyst.

[0060] The first plating solution, the second plating solution, the third plating solution, the fourth plating solution and the fifth plating solution are collectively referred to as plating solutions. The vaporization temperature and components of the above plating solutions are more reasonably designed, which is beneficial to improving the quality of the coating, reducing the consumption of plating solutions and reducing costs.

[0061] Obviously, the above embodiments are merely examples for the purpose of clear explanation, and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived therefrom are still within the scope of protection of the present invention.

Claims

1. A TCO glass coating device, characterized in that: The coating device comprises a tin bath (1) and an annealing kiln (2). In the process direction of the coating device, the annealing kiln (2) is located downstream of the tin bath (1). The coating device also comprises a coating reactor 1 (3) arranged in the tin bath (1), and a coating reactor 2 (4) arranged in the annealing kiln (2).

2. The TCO glass coating device according to claim 1, characterized in that: In the process direction of the coating device, the tin bath (1) comprises a first temperature section (11), a second temperature section (12) and a third temperature section (13) in which the temperature decreases successively and the bath width decreases successively, and the coating reactor 1 (3) is arranged in the third temperature section (13); The annealing furnace (2) comprises a connected pre-annealing section (21) and an annealing section (22), and the second coating reactor (4) is located in the pre-annealing section (21).

3. The TCO glass coating device according to claim 1, characterized in that: The coating reactor 1 comprises an anti-reflection layer coating reactor, a transition layer coating reactor (33) and a barrier layer coating reactor (34). In the process direction of the coating device, the anti-reflection layer coating reactor, the transition layer coating reactor (33) and the barrier layer coating reactor (34) are arranged in sequence.

4. The TCO glass coating device according to claim 3, characterized in that: The anti-reflection layer coating reactor comprises a first anti-reflection layer coating reactor (31) and a second anti-reflection layer coating reactor (32). In the process direction of the coating device, the first anti-reflection layer coating reactor (31) is located upstream of the second anti-reflection layer coating reactor (32).

5. The TCO glass coating device according to any one of claims 1 to 4, characterized in that: It also includes two sealing structures (6) arranged at a distance within the tin bath (1). In the length direction of the tin bath (1), the two sealing structures (6) are respectively arranged on two opposite sides of the coating reactor (3), and the outer walls of the two sealing structures (6) are sealed and connected to the inner wall of the tin bath (1).

6. The TCO glass coating device according to any one of claims 1 to 4, characterized in that: It comprises a glass plate transport mechanism (5), wherein the glass plate transport mechanism (5) is extended and arranged in the tin bath (1) and the annealing furnace (2).

7. A coating process for TCO glass, characterized in that: The steps include: Plating a film on the upper surface of a glass substrate (7) in a tin bath (1) to form a base coating layer; In the annealing furnace (2), a functional layer is plated on the basic coating layer entering the pre-annealing section (21).

8. The coating process of TCO glass according to claim 7, characterized in that: In the third temperature section (13) of the tin bath (1), the vaporized first plating solution, the second plating solution, the third plating solution and the fourth plating solution are plated layer by layer on the glass substrate (7) to form a first anti-reflection layer, a second anti-reflection layer, a transition layer and a barrier layer respectively; and in the pre-annealing section (21), the vaporized fifth plating solution is plated on the barrier layer to form the functional layer.

9. The coating process of TCO glass according to claim 8, characterized in that: The vaporization temperature of the first plating solution is 650°C to 700°C; the vaporization temperature of the second plating solution is 650°C to 700°C; the vaporization temperature of the third plating solution is 630°C to 700°C; the vaporization temperature of the fourth plating solution is 600°C to 630°C; and the vaporization temperature of the fifth plating solution is 530°C to 580°C.

10. The coating process of TCO glass according to claim 8 or 9, characterized in that: The components of the first plating solution are 88-93 parts of silicon source, 4-8 parts of catalyst, and 3-4 parts of stabilizer by weight; the components of the second plating solution are 83-87 parts of silicon source, 9-11 parts of water, 2-3 parts of acid, and 3-5 parts of stabilizer by weight; the components of the third plating solution are 83-93 parts of silicon source, 65-76 parts of tin source, and 5-9 parts of catalyst by weight; The fourth plating solution comprises, by weight, 88-92 parts of silicon source, 5-8 parts of oxygen source, and 3-4 parts of stabilizer; The fifth plating solution components include 81-87 parts of tin source, 6-10 parts of fluorine source, 7-9 parts of stabilizer and 8-15 parts of catalyst in parts by weight.

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