Device for cleaning transport containers of tank-shaped hollow body, in particular
By setting up the supply device and moving components on the support wall of FOUP, using the flushing fluid to form a seal or fluid separation on the edge surface, solve the problem of the pollution of the outer surface particles into the cleaning solution. Clean fluid consumption.
Patent Information
- Application Number
- CN202380043770.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2022-06-29
- Filing Date
- 2023-06-15
- Publication Date
- 2025-01-24
AI Technical Summary
In the prior art, when cleaning the FOUP of a semiconductor wafer or a photolithography mask transportation container, it is difficult to effectively prevent the external surface particles from entering the cleaning liquid, resulting in poor cleaning effect and a large consumption of cleaning fluid.
By arranging a supply device on the support wall, the movable element and the flushing fluid are used to form a seal or fluid separation on the edge surface, ensuring that the cleaning liquid only obtains particles from the surface of the hollow body and preventing particle contamination of the outer surface.
Realize the reliable seal or fluid separation on the edge surface, ensure the improvement of the cleaning effect, reduce the consumption of cleaning fluids, and prevent pollution of the outer surface particles.
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Figure CN119365967A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to a device for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or photolithography masks. Background Art
[0002] Today, the manufacture of highly integrated electronic circuits and other sensitive semiconductor components takes place in factories where so-called semiconductor wafers undergo a large number of processing steps. A large part of these processing steps takes place in clean rooms, which require great efforts to remain free of contaminants, especially particles. This complex handling is necessary because particles that come into contact with the semiconductor material of the semiconductor wafers can affect, among other things, their material properties, with the result that entire production batches become defective and unusable and have to be scrapped.
[0003] Since the efforts to maintain cleanliness increase exponentially with the increase in the integration density of semiconductor circuits and the size of clean rooms, it becomes increasingly important to maintain cleanliness, semiconductor wafers are not transported from one processing station to the next in an "open" state. Instead, special transport containers (so-called FOUPs, front-opening unpacking boxes) are used. They are understood to be box-shaped transport containers, into which a large number of semiconductor wafers are inserted and are usually made of injection-molded plastic. The FOUP is usually closed by a removable cover. Without the cover, the FOUP has a can-shaped basic shape with a rectangular bottom surface, as well as an inner surface and an outer surface separated by an edge surface. When the FOUP is closed by its cover, the inserted semiconductor wafers can be transported from one clean room to another clean room protected from environmental influences. When the FOUPs arrive at the processing stations, they are opened, the semiconductor wafers are removed and processed accordingly. After the processing is completed, the semiconductor wafers are transported back to the FOUP and then conveyed to the next processing station.
[0004] Due to the high production losses caused by semiconductor wafer contamination, it is necessary to clean the FOUP from time to time. The FOUP is particularly contaminated by semiconductor wafer wear debris when it is introduced into and removed from the FOUP.
[0005] The same applies to transport containers for lithography masks, in particular EUV lithography masks ("extreme ultraviolet radiation"). Lithography masks are used to manufacture very small integrated circuits. Like semiconductors, lithography masks also have to be transported and similar situations arise. When FOUPs are mentioned below, this also applies to transport containers for lithography masks, in particular EUV lithography masks.
[0006] Devices for cleaning FOUPs are known, for example, from US 2002 / 0046760 A1, US 2003 / 0102015 A1, US 8,591.664 B2, JP 2005 109523 A, WO 2005 / 001888 A2 and EP 1 899 084 B1.
[0007] Using this cleaning device, the inner and outer surfaces of the FOUP can be cleaned. The contamination of the outer surface of the FOUP is usually more serious than that of the inner surface. Therefore, during the cleaning process, the cleaning fluid accumulates particles from the outer surface and particles from the inner surface. Therefore, particles can be transferred from the outer surface to the inner surface. However, satisfactory cleaning results can only be achieved when the number of particles drops below a certain value. Due to the particles from the outer surface, the cleaning procedure must be carried out for a correspondingly long time before a sufficient portion of the particles can be removed. This is disadvantageous because, on the one hand, the amount of cleaning fluid required is relatively high, and on the other hand, the FOUP cannot be used to transport semiconductor wafers during the cleaning process. The production of semiconductor wafers has therefore become more expensive. In addition, outer surface cleaning can only reduce the number of defective semiconductor wafers to a limited extent.
[0008] WO 2022 / 096657 A1 discloses a device for cleaning wafers, in which a cleaning fluid for cleaning the inner surface of a FOUP can be strictly separated from the cleaning fluid for cleaning the outer surface of the FOUP in the device. The fluid separation takes place at the edge surface of the FOUP. However, in the case of cleaning only the inner surface, we also want to prevent particles from penetrating from the outer surface into the cleaning fluid when cleaning the inner surface, and the cleaning fluid from flowing out of the edge surface in an uncontrolled manner.
[0009] As mentioned above, front opening pods (FOUPs) are usually manufactured using an injection molding process. Based on this principle, FOUPs can only be produced within a relatively large tolerance range. Therefore, it is difficult to perform fluid separation or sealing on the edge surface. Summary of the invention
[0010] The object of one embodiment of the present invention is to provide a device for cleaning can-shaped hollow bodies, in particular semiconductor wafer or photolithography mask transport containers, by which the above-mentioned disadvantages can be overcome in a technically simple and cost-effective manner, in particular by making it possible to reliably achieve a seal or fluid separation at the edge surface independently of the tolerances of the FOUP to be cleaned.
[0011] This object is achieved by the features specified in claim 1. Advantageous embodiments are the subject matter of the dependent claims.
[0012] An embodiment of the invention relates to a device for cleaning a pot-shaped hollow body, in particular a transport container for semiconductor wafers or photolithography masks, wherein the hollow body comprises:
[0013] - a bottom wall and one or more side walls forming the inner surface of the hollow body; and
[0014] - an opening arranged opposite to the bottom wall and surrounded by the edge surface of the side wall, wherein the device has:
[0015] - a supporting wall on which the edge surface of the hollow body can rest;
[0016] - a cleaning device, by means of which a first cleaning fluid for cleaning the inner surface of the hollow body can be dispensed when the hollow body is connected to the supporting wall; and
[0017] - a supply device which is arranged in the supporting wall or fastened to the supporting wall and by which a flushing fluid can be guided to the edge surface, wherein the supply device comprises a movable element which can be moved by the flushing fluid towards the edge surface.
[0018] In the following embodiments, it is assumed that the hollow body is connected to the supporting wall.
[0019] In particular, nitrogen or compressed air, particularly preferably extremely clean dry air, also referred to as XCDA, is used as a flushing fluid. During cleaning of the inner surface of the hollow body, the flushing fluid is guided to a supply device at a sufficiently high pressure, where the flushing fluid moves the movable element toward the edge surface. The movable element has a certain elasticity, so that it can adapt to the size of the edge surface and can at least approximately contact the edge surface without interruption. The elasticity here is greater than the elasticity of the edge surface. In addition, expansion spaces can be provided, into which the movable element can expand when it moves toward the edge surface and deforms accordingly. Therefore, a reliable seal can be provided regardless of the tolerance of the affected edge surface. The seal can prevent particles from moving from the outer surface of the hollow body to the first cleaning fluid during cleaning of the inner surface of the hollow body. It is ensured that the particles removed with the first cleaning fluid only come from the inner surface of the hollow body. The number of particles removed can be calculated. If this value drops below a certain value, the cleaning can be terminated, because it can be ensured that the inner surface of the hollow body has been fully cleaned. The seal also has the effect of preventing the inner surface of the hollow body from being contaminated by particles from the inner surface of the hollow body or the environment.
[0020] According to another embodiment, a recess may be provided in the support wall for movably supporting the movable element. The use of a recess provides a structurally simple possibility for guiding the movable element so that it moves to the edge surface when pressurized with irrigation fluid.
[0021] In a further improved embodiment, the movable element may have a sealing surface facing the edge surface, as well as a distributor channel and a plurality of distribution channels starting from the distributor channel and leading to the sealing surface. The movable element can be used as a pure sealing element, and the movable element is contacted with the edge surface by pressing it sealingly against the edge surface through a flushing fluid. However, the flushing fluid can also be used as a barrier medium, so that no contact is required between the edge surface and the movable element. In this case, a fluid seal is provided. The flushing fluid is guided to the sealing surface through the distribution channel. In this case, the sealing surface does not need to contact the edge surface, but forms a sealing gap. The continuous flow of the flushing fluid makes it impossible for the first cleaning fluid to be discharged through the sealing gap. However, in this case, it is also necessary to guide the movable element to the edge surface as much as possible, because the effect of the flushing fluid as a barrier medium can only reliably establish a certain distance between the sealing surface and the edge surface. The distance difference between the sealing surface and the edge surface caused by production errors can be bridged within a certain range, thereby forming a reliable seal.
[0022] In a further improved embodiment, the movable element may have a plurality of guide channels extending in the sealing surface to guide the flushing fluid along the sealing surface. Depending on the design of the device, it may be reasonable or even necessary to direct the flushing fluid in a certain direction. For example, the flushing fluid may be directed toward the first cleaning fluid so that it is carried away by the first cleaning fluid. From the opposite perspective, it may also be desirable to direct the flushing fluid out of the first cleaning fluid. The flushing fluid may be directed as needed through the range of the guide channels along the edge surface while forming a sealing gap.
[0023] In another embodiment, the movable element can be fully or partially elastic, the shape of the movable element can be changed by the flushing fluid so that the movable element can move towards the edge surface. In this embodiment, the movable element can be formed in the form of a hose, which expands due to the pressurization of the flushing fluid and moves towards the edge surface due to the change in shape. Within the framework of the present application, the term "elasticity" should be understood accordingly. The required elasticity can be provided in particular by choosing a suitable material, such as a rubber-like material. The elasticity of the movable element is greater than the elasticity of the edge surface.
[0024] Due to the elastic design, the movable element can easily adapt to the extent of the edge surface, thereby providing a substantially uninterrupted contact with the edge surface or a uniform design of the sealing gap. In this regard, within the framework of the present application, the term "movable element" is understood to mean that: on the one hand, the entire element moves towards the edge surface; on the other hand, due to the shape change, at least a part of the movable element moves towards the edge area.
[0025] A further improved embodiment is characterized in that the device comprises:
[0026] - at least one passage opening formed by a supporting wall; and
[0027] A first discharge channel having a first end, wherein the first end of the first discharge channel is in fluid communication only with the channel opening and through which the first cleaning fluid dispensed by the cleaning device can be discharged.
[0028] The channel opening is particularly used for discharging the first cleaning fluid from the hollow body. The channel opening is arranged so that only the first cleaning fluid is discharged through the channel opening, but particles originating from the inner surface of the hollow body, for example, are not discharged. Therefore, it is ensured that only particles originating from the inner surface of the hollow body are contained in the first discharge channel. The number of particles in the first cleaning fluid flowing through the discharge channel can be determined. Once the value drops below a certain specific value, the cleaning of the inner surface of the hollow body can be terminated. At the same time, the consumption of the first cleaning fluid can be limited to a desired range. The duration of cleaning can also be shortened to a desired degree accordingly.
[0029] According to another embodiment, the device may comprise a locking device by which the edge surface of the hollow body can be releasably connected to the supporting wall. The hollow body can be positioned relative to the supporting wall by the locking device. Sliding of the hollow body during cleaning, in particular during pressurization of the movable element with flushing fluid, can be prevented.
[0030] In another embodiment, it may be suitable that the passage opening is radially arranged in a locking device on the supporting wall. In this embodiment, the locking device is arranged on the supporting wall and is therefore located near the edge surface. Alternatively, the locking device can, for example, be engaged at the bottom wall of the hollow body. However, the bottom wall and the side walls will therefore be subjected to corresponding loads. In contrast, in this embodiment, even if the edge surface is pressed against the supporting wall by the locking device with a relatively high force, the load on the bottom wall and the side walls can also be kept small. The hollow body can also be prevented from sliding accordingly under the high pressure of the flushing fluid.
[0031] In another embodiment in which the bottom wall and the side walls together form the outer surface of the hollow body, the following may apply:
[0032] the cleaning device has a second cleaning head, through which a second cleaning fluid for cleaning the outer surface of the hollow body can be dispensed; and
[0033] The device has a second discharge channel through which the second cleaning fluid dispensed from the second cleaning head can be discharged.
[0034] In this respect, the device has a second discharge channel through which the second cleaning fluid distributed from the second cleaning head can be discharged. As mentioned initially, it is not absolutely necessary to clean the outer surface of the hollow body. However, for example, one may wish to keep the particle concentration in the clean room low. In this embodiment, the outer surface of the hollow body can be cleaned, wherein the second cleaning fluid is discharged separately from the first cleaning fluid. The mixing of the first cleaning fluid and the second cleaning fluid, and the increase in particle concentration in the first cleaning fluid caused by the particles originating from the outer surface of the hollow body caused thereby are prevented. Therefore, in the case of cleaning the inner surface of the hollow body and the inner surface of the hollow body, the particles originating from the inner surface of the hollow body are also prevented from moving to the inner surface of the hollow body. Therefore, the cleaning process of the inner surface of the hollow body will not be negatively affected by the particles from the inner surface of the hollow body. The measurement of the number of particles in the first cleaning fluid already mentioned can also be carried out when using the second cleaning fluid without misjudging the number of particles from the outer surface of the hollow body. Accordingly, the number of particles in the second cleaning fluid can be determined, and the same purpose is to end the cleaning of the outer surface of the hollow body when the number is lower than a specific value. BRIEF DESCRIPTION OF THE DRAWINGS
[0035] The exemplary embodiments of the present invention will be described in more detail below in conjunction with the accompanying drawings. As shown in the accompanying drawings:
[0036] Figure 1A : A schematic cross-sectional view of an embodiment of a device for cleaning a can-shaped hollow body, in particular a transport container for semiconductor wafers or photolithography masks;
[0037] Figure 1B : Figure 1A an enlarged view, not drawn to scale, of detail A defined in FIG. 1 with a movable element according to a first embodiment;
[0038] Figure 1C : Figure 1B an enlarged view, not drawn to scale, of the movable element shown; and
[0039] Figure 2 : Figure 1A An enlarged view of detail A defined in FIG. 1 , not drawn to scale, with a movable element according to a second embodiment. DETAILED DESCRIPTION
[0040] Figure 1AThe basic sectional view in shows an embodiment of a device 10 for cleaning a can-shaped hollow body 12 according to the present proposal. The device 10 has a housing 14 forming a housing opening 16, which is closed by a cover 18 that can be removed from the housing 14. In addition, a support wall 20 is arranged in the housing 14, so that a closed processing space 22 is provided in the housing 14. The processing space 22 is delimited by the support wall 20, the housing 14 itself and the cover 18. The support wall 20 forms a passage opening 24, and a locking device 26 is arranged radially outside the passage opening 24. In the embodiment shown, two passage holes 28 are provided in the support wall 20 radially outside the locking device 26.
[0041] With the cover 18 removed, the hollow body 12, in particular a transport container 30 for semiconductor wafers, also called a FOUP, or a transport container for lithium masks, can be introduced into the processing space 22. The hollow body 12 has a bottom wall 32 and, in this case, four side walls 34, so that the can-shaped hollow body 12 is essentially parallelepiped-shaped. However, cans shaped hollow bodies 12 with different geometries, such as cylindrical geometries, can be provided by all means. The bottom wall 32 and the four side walls 34 form a hollow body inner surface 33 and a hollow body outer surface 35.
[0042] The hollow body 12 has an opening 36 which is arranged opposite the bottom wall 32 and is surrounded by an edge surface 38 formed by the side walls. In the embodiment shown, the hollow body 12 is designed in the manner of a flange in the region of the edge surface 38. The edge surface 38 of the hollow body 12 can rest on the support wall 20. In the embodiment shown, the passage opening 24 of the support wall 20 and the opening 36 of the hollow body 12 are at least approximately identical in size and geometry.
[0043] The locking device 26 is also configured such that the passage opening 24 is substantially flush with at least a portion of the hollow body inner surface 33 adjacent to the passage opening 24 .
[0044] Figure 1A The area marked in A is Figure 1B The figures are not shown to scale nor to exact correspondence. For illustration reasons, the locking device 26 is not shown. Figure 1BAs can be seen in FIG, the support wall 20 comprises a recess 31, in which a supply device 37 is arranged, by means of which a flushing fluid, for example air or nitrogen, can be guided to the edge surface 38. The supply device comprises a movable element 39 according to the first embodiment, which is movably supported in the recess 31. The movable element 39 is provided with a sealing surface 41 facing the edge surface 38. The movable element 39 further has a distributor channel 43 and a plurality of distribution channels 45, which start from the distributor channel 43 and extend towards the sealing surface 41. In addition, a supply channel 47 is arranged in the support wall 20, by means of which a flushing fluid can be conveyed into the distributor channel 43.
[0045] Figure 1C The Figure 1B The movable element 39 shown in FIG. Figure 1A and 1B It can be seen that a plurality of guide channels 49 extend on the sealing surface 41 .
[0046] refer to Figure 1A The device 10 is equipped with a cleaning device 40 having a first cleaning head 42 which protrudes from the passage opening 24 and is therefore arranged in the processing space 22. When the hollow body 12 is connected to the supporting wall 20, the first cleaning head 42 is surrounded by the hollow body 12.
[0047] The housing 14 further comprises a wall portion 44 in which a cleaning opening 46 is arranged. The wall portion 44 is located on a side of the side wall 20 remote from the locking device 26. The cleaning opening 46 is at least partially closed by a closing body 48, which is rotatably fastened to the wall portion 44 around a first rotation axis D1 by a drive unit (not shown). The closing body 48 can be moved between an open position, in which the closing body 48 releases the cleaning opening 46, and a closed position, in which the closing body 48 at least partially closes the cleaning opening 46. Figure 1A , the closure body 48 is in the closed position.
[0048] The closure body 48 has a receiving unit 50, by means of which a cover 52 can be releasably fastened to the closure body 48, by means of which the hollow body 12 is closable. The cover 52 forms a cover inner surface 54 and a cover outer surface 56. The cover inner surface 54 is that side of the cover 52 which directly adjoins the hollow body inner surface 33 when the hollow body 12 has been closed by the cover 52. In other words, in this case, the cover inner surface 54 faces the bottom wall 32 of the hollow body 12.
[0049] In the embodiment shown, the receiving unit 50 is designed such that it interacts with the cover 52 only via the cover outer surface 56 .
[0050] The cleaning device 40 is additionally equipped with a further first cleaning head 58 which is arranged near the closing body 48 when the closing body 48 is in the closed position.
[0051] The cleaning device 40 further comprises a second cleaning head 64 which is substantially formed in a U-shape and is at least partially arranged in the processing space 22. However, unlike the first cleaning head 42, when the hollow body 12 is Figure 1A When connected to the supporting wall 20, the second cleaning head 64 is arranged outside the hollow body 12. The second cleaning head 64 can rotate around the second rotation axis D2, and the drive device for this purpose is not shown. In addition, the embodiment in which the second cleaning head 64 is not only rotatable but also translatable or only translatable is not shown. In the embodiment shown, the first cleaning head 42 is immovable; however, it can also be designed to be rotatable and / or translatable.
[0052] The device 10 is further provided with a fluid conducting unit 66, through which the first cleaning fluid can be conducted to the first cleaning head 42 and the further first cleaning head 58, and the second cleaning fluid can be conducted to the second cleaning head 64. The fluid conducting unit 66 has a first supply channel 68, through which the first cleaning fluid can be conducted to the first cleaning head 42.
[0053] For illustrative reasons, a detailed representation of the second supply channel for supplying the second cleaning fluid to the second cleaning head 64 has been omitted, but its design should be easily inferred for those skilled in the art.
[0054] The fluid conducting unit 66 further comprises a first discharge channel 70, through which the first cleaning fluid distributed by the first cleaning head 42 and the further first cleaning head 58 can be discharged again from the processing space 22. The first discharge channel 70 has a first end 72 in fluid communication with the channel opening 24. Figure 1A As shown, the first discharge channel 70 expands in a funnel shape toward a first end 72 and is connected to the support wall 20 , so that the first end 72 of the discharge channel is flush with the channel opening 24 .
[0055] A first particle measuring device 741 is arranged in the first discharge channel 70, by means of which particles in the first cleaning fluid originating from the hollow body inner surface 33 can be determined and in particular counted. A second particle measuring device 742 is additionally arranged in the second discharge channel 742, by means of which particles in the first cleaning fluid originating from the cover inner surface 54 can be determined and in particular counted.
[0056] Furthermore, the fluid conducting unit 66 is provided with a second discharge channel 76, which is designed substantially the same as the first discharge channel 70, but is in fluid communication with the two channel openings 28. In this respect, the first discharge channel 70 forms the radial inner wall of the second discharge channel 76, so that the fluid conducting unit 66 can have a very compact design. The embodiment in which a further particle measuring device 74 is arranged in the second discharge channel 76 is not shown in the figure. It should be pointed out here that the fluid conducting unit 66 is only Figure 1A Given the large number of channels nested and arranged at different levels, Figure 1A The fluid conducting unit 66 shown does not imply accuracy. However, those skilled in the art will be able to at least Figure 1A The functional design of the fluid conducting unit 66 can be easily inferred from FIG.
[0057] Figure 2 4 shows again a supply device 37 having a movable element 39 according to a second embodiment. In the second embodiment, the movable element 39 is elastic so that when flushing fluid is introduced into the distributor channel 43 with sufficient pressure, the movable element 39 expands. Figure 2 As shown, the movable element 39 is in the form of a hose, and the recess 31 is formed in its bottom area to complement the hose-like movable element 39. In terms of cross section, the bottom of the recess 31 is formed in a semicircular shape. When the flushing fluid is introduced into the distributor channel 43, due to the design of the recess 31, the movable element 39 can only expand toward the edge surface 38 and thus move there.
[0058] The device 10 operates in the following manner: in the activated state (not shown here), the cover 18 is opened and the second cleaning head 64 is relative to Figure 1A Rotate 90° so that the U-shaped portion of the second cleaning head 64 is perpendicular to the Figure 1A The closure body 48 is in an open position, in which the closure body 48 is relative to the Figure 1A Roughly aligned horizontally.
[0059] The cover 52 is separated from the hollow body 12 by a manipulation device (not shown), for example, by a gripping robot, and is placed on the receiving unit 50. Figure 1A As shown, the open hollow body 12 is introduced into the processing space 22 so that the edge surface 38 of the hollow body 12 lies on the supporting wall. The hollow body 12 is then locked by the locking unit 26, so that it is connected to the supporting wall 20 and is thus fixed in the processing space 22. In this regard, the locking device 26 is equipped with a sealant (not shown here) so that the hollow body 12 is sealed relative to the supporting wall 20. The cover 18 is now closed. In addition, the receiving unit 50 of the closing body 48 is activated so that the cover 52 is fixed to the closing body 48. Figure 1AAs shown, the closure body 48 is rotated 90° into the closed position. The cover 52 here seals the cleaning opening 46 .
[0060] The first cleaning fluid is now guided through the first supply channel 68 to the first cleaning head 42 and distributed through the first cleaning nozzle 78, so that the hollow body inner surface 33 is cleaned by the first cleaning fluid. Another first cleaning head 58 has another first cleaning nozzle 80, through which the first cleaning fluid is applied to the cover inner surface 54, thereby cleaning the cover inner surface 54.
[0061] At the same time, a second cleaning fluid corresponding to the first cleaning fluid can be guided through a second supply channel (not shown here) to the second cleaning head 64, where the second cleaning fluid is distributed through the second cleaning nozzle 82 to clean the outer surface of the hollow body 35. In this regard, the second cleaning head 64 can rotate around the second rotation axis D2.
[0062] The first cleaning nozzle 78, another first cleaning nozzle 80 and the second cleaning nozzle 82 can be configured so that the spray angle α of dispensing the first cleaning fluid and the second cleaning fluid is settable. To this end, the first cleaning nozzle 78, another first cleaning nozzle 80 and the second cleaning nozzle 82 can be designed in a spherical head shape.
[0063] At the same time, when using the supply device 37, the flushing fluid is directed toward the edge surface 38. In this regard, the flushing fluid is pumped in a manner not shown in detail (see Figure 1B ) is delivered to the supply channel 47, where the flushing fluid is under a sufficiently high pressure. The flushing fluid moves from the supply channel 47 into the distributor channel 43 and from there into the distribution channel. When leaving the distribution channel 45, most of the flushing fluid hits the edge surface 38. A part of the flushing fluid flows toward the channel opening 24 through the guide channel 49. This causes the entire flushing fluid to flow toward the channel opening 24. As a result, the flushing fluid flows into the first cleaning fluid, while forming a sealing gap between the sealing surface 41 and the edge surface 38.
[0064] Due to the formed back pressure, according to the first embodiment, the movable element 39 is lifted and moved toward the edge surface 38. In the second embodiment, the movable element 39 expands and thus moves toward the edge surface 38. In both cases, a uniform sealing gap is formed even when the edge surface 38 has irregularities due to tolerances.
[0065] The expansion space 83 is provided to enable the movable element 39 to move and / or deform or expand. Figure 1BIn the first embodiment, the expansion space 83 is formed by the annular gap between the movable element 39 and the recess 31. The size of the annular gap is designed to enable the movement of the movable element 39 toward the edge surface 38 on the one hand; on the other hand, it plays a certain guiding role to prevent the movable element 39 from tilting in the recess 31.
[0066] As described above, the base of the recess 31 in the second embodiment is semicircular, while the movable member 39 is circular. The expansion space 82 is formed between the movable member 39 and the edge surface 38.
[0067] The flushing fluid ensures that neither the first cleaning fluid nor the second cleaning fluid can pass over the edge surface 38. Thus, the flushing fluid achieves a fluid seal between the first cleaning fluid and the second cleaning fluid. Thus, it is ensured that the first cleaning fluid and the second cleaning fluid cannot mix. The first cleaning fluid is prevented from being contaminated by the second cleaning fluid and vice versa.
[0068] The first cleaning fluid distributed by the first cleaning head 42 and applied to the inner surface 33 of the hollow body is discharged through the first discharge channel 70. The same applies to the first cleaning fluid distributed by another first cleaning head 58 and applied to the inner surface 54 of the cover. The flushing fluid is also discharged through the first discharge channel together with the first cleaning fluid. The first discharge channel 70 has a secondary channel 84, which leads to the first discharge channel 70 to discharge the first cleaning fluid for cleaning the inner surface 54 of the cover.
[0069] The particles located on the inner surface 33 of the hollow body and the inner surface 54 of the lid are removed by the first cleaning fluid. The particles originating from the inner surface 33 of the hollow body are detected by the first particle measuring device 741, and the particles originating from the inner surface 54 of the lid are detected by the second particle measuring device. In this regard, the first particle measuring device 741 and the second particle measuring device 742 are configured to determine the number of particles passing through the particle measuring device 74 within a given time. It can thereby be determined whether the inner surface 33 of the hollow body and the inner surface 54 of the lid have been cleaned to the desired extent. For example, if the inner surface 33 of the hollow body is clean enough, the cleaning process of the hollow body 12 can be terminated, while the cleaning process of the inner surface 54 of the lid continues. At the same time, the hollow body 12 can be removed from the device by a robot fixture, thereby saving time.
[0070] As mentioned above, a further particle measuring device 74 can be provided in the second discharge channel 76. Particles originating from the hollow body outer surface 35 can be detected by this further particle measuring device. This information can also be integrated into the decision whether the cleaning process of the hollow body 12 can be aborted. If the first cleaning fluid is not loaded with particles originating from the hollow body inner surface 33 beyond a certain value, it can also be used to clean the hollow body outer surface 35.
[0071] Not shown here is an embodiment in which the particle measuring device 74 is arranged downstream of the opening of the secondary channel 84 into the first discharge channel 70. In this case, it is not possible to distinguish whether the particles originate from the inner surface 54 of the cover or from the inner surface 33 of the hollow body. However, the cleaning process can be terminated when the particle count falls below a certain level.
[0072] The second cleaning fluid dispensed by the second cleaning head 64 and applied to the inner surface 35 of the hollow body is discharged through the second discharge channel 76. Therefore, the first cleaning fluid and the second cleaning fluid are discharged separately from each other, whereby particles originating from the inner surface 35 of the hollow body cannot enter the first cleaning fluid and thus cannot reach the inner surface 33 of the hollow body or the inner surface 54 of the cover.
[0073] The cleaning of the inner surface 33 of the hollow body and the inner surface 54 of the cover is usually more important than the cleaning of the outer surface 35 of the hollow body. If it is found that the inner surface 33 of the hollow body and the inner surface 54 of the cover have been cleaned to the desired degree, the cleaning process can be terminated regardless of the cleanliness of the outer surface 35 of the hollow body.
[0074] The first and second drying gases, for example air or nitrogen, can now be directed to the first cleaning head 42, the further first cleaning head 58 and the second cleaning head 64 through the first supply channel 68 or through the second supply channel in substantially the same manner as the first and second cleaning fluids. The first cleaning head 42 has a first drying nozzle 86, the further first cleaning head 58 has a further first drying nozzle 88 and the second cleaning head has a second drying nozzle 90, through which the first drying gas or the second drying gas can be distributed and applied to the inner surface 33 of the hollow body, the inner surface 54 of the cover and the inner surface 35 of the hollow body. The first and second drying gases displace the first and second cleaning fluids from the device 10. In addition, residues of the first and second cleaning fluids can be blown away.
[0075] The first cleaning head 42 , the further first cleaning head 58 and the second cleaning head further have infrared diodes 92 , by means of which residues of the first and second cleaning fluids can be heated and evaporated, whereby they can be removed from the device 10 by means of the first and second drying gases.
[0076] After the drying process is finished, the cover 18 is opened and the closing body 48 is moved into the open position. The cleaned hollow body 12 is removed from the processing space. The receiving unit 50 is deactivated, as a result of which the cover 52 can be removed from the closing body 48 and fed onto the hollow body 12 for closing the hollow body 12.
[0077] Now, a further hollow body 12 to be cleaned can be processed in the device 10 in the manner described.
[0078] Reference numerals list
[0079] 10. Installation
[0080] 12 Hollow body
[0081] 14 Housing
[0082] 16 Shell opening
[0083] 18 Cover
[0084] 20 Support wall
[0085] 22 Processing Space
[0086] 24 Channel opening
[0087] 26 Locking device
[0088] 28 channel holes
[0089] 30 Transport Container
[0090] 31 recess
[0091] 32 bottom wall
[0092] 33 Inner surface of hollow body
[0093] 34 Sidewall
[0094] 35 Hollow body outer surface
[0095] 36 Opening
[0096] 37 Supply device
[0097] 38 Edge Surface
[0098] 39 Movable elements
[0099] 40 Cleaning device
[0100] 41 Sealing surface
[0101] 42 First cleaning head
[0102] 43 distributor channels
[0103] 44 Wall section
[0104] 45 Allocation Channels
[0105] 46 Cleaning opening
[0106] 47 Supply Channel
[0107] 48 closed body
[0108] 49 Guide Channel
[0109] 50 receiving units
[0110] 52 Lid
[0111] 54 Inner surface of lid
[0112] 56 Cover outer surface
[0113] 58 Another first cleaning head
[0114] 64 Second cleaning head
[0115] 66 Fluid conduction unit
[0116] 68 First supply channel
[0117] 70 First discharge channel
[0118] 72 First End
[0119] 74 Particle Measuring Device
[0120] 76 Second discharge channel
[0121] 78 First cleaning nozzle
[0122] 80 Another first cleaning nozzle
[0123] 82 Second cleaning nozzle
[0124] 83 Expansion Space
[0125] 84 Secondary Channel
[0126] 86 First drying nozzle
[0127] 88 Another first drying nozzle
[0128] 90 Second drying nozzle
[0129] 92 infrared diode
[0130] D1 First axis of rotation
[0131] D2 Second axis of rotation
Claims
1. A device (10) for cleaning a can-shaped hollow body (12), in particular a transport container (30) for semiconductor wafers or photolithography masks, wherein the hollow body (12) comprises: - a bottom wall (32), and one or more side walls (34), which form the inner surface (33) of the hollow body; as well as an opening (36) arranged opposite the bottom wall (32) and surrounded by an edge surface (38) of the side wall (34); as well as Wherein, the device (10) comprises: - a supporting wall (20) on which the edge surface (38) of the hollow body (12) can rest; a cleaning device (40) by means of which a first cleaning fluid for cleaning the inner surface (33) of the hollow body (12) can be dispensed when the hollow body (12) is connected to the supporting wall (20); and a supply device (37) which is arranged in the support wall (20) or fastened to the support wall (20) and by means of which the flushing fluid can be directed to the edge surface (38), wherein the supply device (37) comprises a movable element (39) which can be moved towards the edge surface (38) by the flushing fluid.
2. The device (10) according to claim 1, characterized in that A recess (31) is provided in the support wall (20), and the movable element (39) is movably supported in the recess.
3. The device (10) according to any one of the preceding claims, characterized in that The movable element (39) has: - a sealing surface (41) facing the edge surface (38); and A distributor channel (43) and a plurality of distributor channels (45) which start from the distributor channel (43) and open to the sealing surface (41).
4. The device (10) according to claim 3, characterized in that The movable element (39) has a plurality of guide channels (49) extending in the sealing surface (41) to guide the flushing fluid along the sealing surface (41).
5. The device (10) according to any one of the preceding claims, characterized in that The movable element (39) has full or partial elasticity, and the shape of the movable element (39) is changed by the flushing fluid so that the movable element (39) can move toward the edge surface (38).
6. The device (10) according to any one of the preceding claims, characterized in that The device comprises: - at least one passage opening (24) formed by the supporting wall (20); and a first discharge channel (70) having a first end (72), wherein the first end (72) of the first discharge channel (70) is in fluid communication only with the channel opening (24) and through which the first cleaning fluid dispensed by the cleaning device (40) can be discharged.
7. The device (10) according to any one of the preceding claims, characterized in that The device comprises locking means (26) by means of which an edge surface (38) of the hollow body (12) can be releasably connected to a supporting wall (20).
8. The device (10) according to claim 7, characterized in that The passage opening (24) is arranged radially within the locking device (26) on the supporting wall (20).
9. The device (10) according to any one of the preceding claims, wherein: The bottom wall (32) and the side wall (34) form an outer surface (35) of a hollow body, characterized in that: the cleaning device (40) has a second cleaning head unit (64) through which a second cleaning fluid for cleaning the outer surface (35) of the hollow body can be dispensed; and The device (10) has a second discharge channel (76) through which a second cleaning fluid dispensed by the second cleaning head (64) can be discharged.
Citation Information
Patent Citations
Wafer container washing apparatus
US20020046760A1
Apparatus for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for EUV lithography masks
WO2022096657A1