Preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on surface of silicon dioxide in self-adsorption mode and application of preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on surface of silicon dioxide in self-adsorption mode

By self -adsorption of tungsten nano -nanoparticles on the surface of the silicon dioxide surface, the nuclear shell structure is prepared, and the lack of energy regulation and cost -effectiveness of the existing technologies in the existing technologies, realizing efficient energy modulation And low -cost preparation.

CN119371112APending Publication Date: 2025-01-28TIANJIN UNIV
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Patent Information

Application Number
CN202310914840.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2023-07-25
Publication Date
2025-01-28

AI Technical Summary

Technical Problem

The existing smart windows and radiation refrigeration devices prepared based on vanadium dioxide materials have shortcomings in energy regulation and cost-effectiveness, especially thin films prepared by pure tungsten-doped vanadium dioxide particles have low visible light transmittance and radiation refrigeration. The modulation effect is the opposite of practical application.

Method used

The self -adsorption method is used to cover the tungsten nano -nanoparticles on the surface of the silicon dioxide, and the silicon dioxide surface is prepared by steps such as pre -processing, grinding, stirring, centrifugal, and rotary coating. The core shell structure.

Benefits of technology

Improving the Mi's scattering ability in the far -infrared band in the far -infrared band, which enhances its radiation preparation capabilities in the atmospheric window, and improves the modulation capacity of solar band through the resonance of local plasma. Adaptive temperature modulation thermal radiation capacity and near -infrared regulation ability.

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Abstract

The invention relates to a preparation process and method for coating tungsten-doped vanadium dioxide nano-particles on the surface of silicon dioxide in a self-adsorption mode and application of the tungsten-doped vanadium dioxide nano-particles. The process sequentially comprises the steps of pretreatment of silicon dioxide and tungsten-doped vanadium dioxide particles and preparation of a core-shell structure formed by self-adsorption of the silicon dioxide and the tungsten-doped vanadium dioxide particles. The method comprises the basic operation procedures of grinding silicon dioxide microspheres, treating tungsten-doped vanadium dioxide particles with deionized water, setting stirring parameters and centrifugal parameters and the like. The invention also relates to application of the tungsten-doped vanadium dioxide and silicon dioxide core-shell structure prepared by using the self-adsorption method in adjustable transmittance and adjustable radiation capability in the fields of intelligent window energy-saving glass and radiation refrigeration. The problems that a traditional vanadium dioxide nanoparticle film is low in visible light transmittance, poor in near-infrared modulation capacity, adjustable in infrared radiance and the like are solved.
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Description

Technical Field

[0001] The present invention relates to the field of microelectronic device preparation, and in particular to a technology for preparing a core-shell structure by a self-adsorption method; specifically, a preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by a self-adsorption method and its application are creatively proposed. Technical Background

[0002] Building energy consumption accounts for more than one-third of the total social energy consumption, and the energy consumed by windows accounts for about 65% of building energy consumption. Therefore, reducing the energy consumption of windows can significantly reduce building energy consumption. Thermochromic smart windows are a technology that can adapt to temperature conditions and change the solar energy transmittance of the device to manage window energy consumption; radiative cooling is a thermal management technology that radiates the energy of the building to the cold outer space to cool the building. Therefore, combining the two technologies can achieve adaptive management of solar energy input and heat output, which has also become a hot research issue in reducing energy consumption. The phase change of tungsten-doped vanadium dioxide nanoparticles affects the transmittance and modulation efficiency of the solar energy band and the radiation band, but the thin film prepared by pure tungsten-doped vanadium dioxide particles has a low transmittance of visible light before and after the phase change, and its modulation effect of radiative cooling is opposite to the actual application.

[0003] Tungsten-doped vanadium dioxide (VO 2 ) Nanoparticles will undergo a metal-semiconductor phase transition at a phase transition temperature of 50°C, accompanied by a sudden change in electrical, mechanical, magnetic and optical properties; Silica nanoparticles have good visible light transmittance and a large specific surface area. Therefore, coating tungsten-doped vanadium dioxide nanoparticles on the surface of silica nanoparticles can not only ensure the transmittance of visible light but also achieve the regulation of near-infrared and far-infrared bands. With the development of microelectronic devices towards miniaturization, the formation of a core-shell structure by coating tungsten-doped vanadium dioxide nanoparticles on silica nanoparticles has become a research hotspot in the field of improving the performance of microelectronic devices.

[0004] Traditional nano core-shell structure preparation methods mainly include one-time preparation schemes such as gas phase method, solution method and deposition method. Due to the high requirements for process conditions during the preparation process, it has hindered its development towards the goal of industrialization, low cost and miniaturization. Therefore, optimizing the traditional preparation process and developing a multi-band adjustable, high-quality, low-cost, high-performance adjustable tungsten-doped vanadium dioxide and silicon dioxide core-shell structure preparation process has become an urgent problem to be solved. Summary of the invention 1. Technical issues to be resolved In view of the many deficiencies of the devices prepared based on vanadium dioxide materials currently used in microelectronic fields such as smart windows and radiation cooling, the present invention provides a preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by self-adsorption, and its application, including pretreatment of tungsten-doped vanadium dioxide nanoparticles, grinding of silicon dioxide balls, and setting of stirring parameters and centrifugal parameters, and thereby preparing a core-shell structure formed by the silicon dioxide surface and tungsten-doped vanadium dioxide nanoparticles, utilizing Mie scattering of the core-shell structure in the far-infrared band after phase change to improve the radiation modulation ability of the core-shell structure in the atmospheric window, and utilizing the localized plasma resonance between the nanoparticles of the core-shell structure to improve the modulation ability in the solar energy band, thereby promoting the development of microelectronic devices. (II) Technical solution In order to achieve the above object, the present invention provides a preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by self-adsorption, and its application, characterized in that it comprises the following steps: Step 1: First, use acetone solution, anhydrous ethanol and deionized water to clean the beaker, medicine spoon, glass substrate, mortar and magnet, etc., ultrasonically clean for 15 minutes each, and finally put them in an oven to dry for 10 minutes; Step 2: Weigh 100 mg of silica particles using a high-precision electronic scale, add them into a mortar, and grind them clockwise for 1 hour; Step 3: Weigh 10 mg of tungsten-doped vanadium dioxide particles using a high-precision electronic scale, add them to deionized water, and stir them magnetically for 12 hours; Step 4, placing the water-treated tungsten-doped vanadium dioxide particles into a centrifuge for centrifugation, and drying the precipitate for 10 minutes; Step 5, putting the dried tungsten-doped vanadium dioxide particles and the ground silica balls into a beaker and stirring at a low speed for 3 hours; Step 6, the sample of step 5 is centrifuged at 2000r / min and 1000r / min respectively; Step 7: Place the precipitate from step 6 into a mixed solution of ethanol and PVP, and continue stirring for 12 hours; Step 8: Spin-coat the solution of step 7 onto a glass substrate. The spin-coating parameters are selected as low speed 500 r / min and high speed 2500 r / min. After spin-coating, dry at 60° C. for 10 min. The advantage of the present invention is that a core-shell structure of tungsten-doped vanadium dioxide nanoparticles coated on a silicon dioxide surface is successfully prepared, and its modulation ability in near-infrared and far-infrared is enhanced. In addition to maintaining its visible light transmittance, the core-shell structure of the present invention also enhances its adaptive temperature modulation thermal radiation ability and near-infrared regulation ability, further promoting the development of smart windows and radiation cooling fields. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 The present invention is a flowchart of a process and method for preparing tungsten-doped vanadium dioxide nanoparticles by self-adsorption on the surface of silicon dioxide according to an embodiment of the present invention. Figure 2 It is a visible infrared spectrum line diagram of the tungsten-doped vanadium dioxide and silicon dioxide core-shell structure prepared in the present invention. Figure 3 This is a schematic diagram of the core-shell structure of tungsten-doped vanadium dioxide and silicon dioxide prepared in the present invention. Figure 4 This is a scanning electron microscope image of the tungsten-doped vanadium dioxide and silicon dioxide core-shell structure prepared in the present invention. Figure 5 This is an EDS spectrum detection diagram of the tungsten-doped vanadium dioxide and silicon dioxide core-shell structure prepared by the present invention.

Explanation of symbols

Claims

1. A preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by self-adsorption, wherein the tungsten-doped vanadium dioxide and silicon dioxide core-shell structure film comprises a substrate (ordinary glass slide, silicon, etc.), silicon dioxide nanoparticles, tungsten-doped vanadium dioxide particles, a core-shell structure and a PVP film, characterized in that The core-shell structure of tungsten-doped vanadium dioxide nanoparticles coated on the surface of silicon dioxide was prepared by self-adsorption method, and creatively applied to smart windows and radiation cooling technology. The specific operation is as follows: Step 1: First, use acetone solution, anhydrous ethanol and deionized water to clean the beaker, medicine spoon, glass substrate, mortar and magnet, etc., ultrasonically clean for 15 minutes each, and finally put them in an oven to dry for 10 minutes; Step 2: Weigh 100 mg of silica particles using a high-precision electronic scale, add them into a mortar, and grind them clockwise for 1 hour; Step 3: Weigh 10 mg of tungsten-doped vanadium dioxide particles using a high-precision electronic scale, add them to deionized water, and stir them magnetically for 12 hours; Step 4, placing the water-treated tungsten-doped vanadium dioxide particles into a centrifuge for centrifugation, and drying the precipitate for 10 minutes; Step 5, placing the dried tungsten-doped vanadium dioxide particles and the ground silica balls into a beaker containing ethanol and stirring at a low speed for 3 hours; Step 6: The samples in step 5 were centrifuged at 2000 r / min for purification. After the first centrifugation, the precipitate was taken, 1 ml of ethanol solution was added, and stirring was continued for 2 h, and then centrifuged at 1000 r / min for purification; Step 7: Place the precipitate from step 6 into a mixed solution of 1 ml of ethanol and 40 mg of PVP, and continue stirring for 12 h; Step 8: Spin-coat the solution of step 7 onto a glass substrate. The spin-coating parameters are selected as low speed 500 r / min and high speed 2500 r / min. After spin-coating, dry at 60° C. for 10 min.

2. A preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by self-adsorption as described in claim 1 and its application, characterized in that: The core-shell structure of vanadium dioxide and silicon dioxide was prepared by self-adsorption.

3. A preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by self-adsorption as described in claim 1 and its application, characterized in that: The vanadium dioxide nanoparticles are tungsten-doped M-phase vanadium dioxide.

4. A preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on a silicon dioxide surface by self-adsorption according to any one of claims 2-4, and its application, which is applied to the preparation of light-transmitting structures with adjustable transmittance from visible to near-infrared and mid-infrared and adjustable emissivity devices, and related structures are applied to smart windows, radiation cooling and laser protection.

5. A preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by self-adsorption as described in claim 1 and its application, characterized in that: The nanoparticle size of vanadium dioxide is 30-50 nm, the size of silicon dioxide is 3.5 um, and the mass ratio of vanadium dioxide to silicon dioxide is 1:10, specifically, 10 mg of vanadium dioxide and 100 mg of silicon dioxide.

6. A preparation process and method for coating tungsten-doped vanadium dioxide nanoparticles on the surface of silicon dioxide by self-adsorption as described in claim 1 and its application, characterized in that: In the preparation process, the single-clock grinding direction and 1h time as well as the process and parameters of water treatment and purification of vanadium dioxide.

Citation Information

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