Crystalline silicon photovoltaic cell with novel tunneling passivation layer and production equipment thereof

Abstract

The invention discloses a crystalline silicon photovoltaic cell with a novel tunneling passivation layer and production equipment of the crystalline silicon photovoltaic cell, and relates to the technical field of crystalline silicon photovoltaic cells. The gel film is prepared by adopting a sol-gel method, the carbon-doped silicon oxide film is prepared by adopting a gel film thermal oxidation method, and the carbon-doped silicon oxide film is clamped between the crystalline silicon substrate and the doped polycrystalline silicon film to serve as a junction region tunneling passivation layer, so that the performance of the crystalline silicon photovoltaic cell is improved. Through a unique stirring structure and a scraping cleaning function, the mixing effect of sol and the cleanliness of equipment are improved, and effective technical support is provided for production of crystalline silicon photovoltaic cells. The stirring equipment comprises a stirring kettle, a power structure is installed at the top of the stirring kettle, power is provided through a power part, a reciprocating part and a rotating part are matched to drive a stirring part in the stirring structure to slide up and down and rotate and stir in the stirring kettle, and mixing and stirring of various kinds of sol are achieved. A stirring rod capable of adjusting the stirring range is arranged in the stirring structure, and the stirring rod is subjected to abutting adjustment through a bottom rod in the upper adjusting part, so that the inner side wall of the stirring kettle is scraped and cleaned.

Description

Technical Field

[0001] The invention relates to crystalline silicon photovoltaic cell technology, in particular to a crystalline silicon photovoltaic cell with a novel tunnel passivation layer and production equipment thereof. Background Art

[0002] It is well known that for the gate dielectric of field effect transistors, in order to solve the gate leakage problem, it is advisable to increase the dielectric constant (k value), and the k value of nitrogen-doped silicon oxide is higher than that of silicon oxide. For the tunneling passivation layer of crystalline silicon photovoltaic cells and the insulating isolation layer between metal wires in the chip, in order to reduce capacitance and interference with external electric fields, it is advisable to reduce the k value. The k value of carbon-doped silicon oxide is lower than that of silicon oxide, and is called low-k material. Although the k value of nitrogen-doped silicon oxide is relatively high, it is easy to prepare and has a strong ability to block the diffusion of boron atoms, so the industry is studying its feasibility as a positive tunneling passivation layer for crystalline silicon photovoltaic cells. Compared with nitrogen-doped silicon oxide, carbon-doped silicon oxide is more conducive to improving performance as a tunneling passivation layer for crystalline silicon photovoltaic cells.

[0003] At present, the tunnel passivation layer of mass-produced crystalline silicon photovoltaic cells mostly uses silicon oxide, but the density of silicon oxide is only 2.2g / cm 3 The low density leads to insufficient density in blocking the doped atoms, which also makes it impossible to completely eliminate the surface dangling bonds of the crystalline silicon substrate, and also leads to a high content of hydrogen atoms inside, resulting in photothermal attenuation problems.

[0004] Thermal oxidation is a traditional method for preparing SiO x Although this method is simple and can produce SiO x The film has excellent electrical properties, and can meet the needs of semiconductor device production in terms of both insulation and masking properties. However, this method is required to be used in a relatively high temperature environment (1050℃~1100℃) for the surface oxidation of single-crystal silicon wafers. x The film process is to prepare sol A and sol B first, mix the two sols together and stir them thoroughly, reflux at 80℃ for about 3-5h, and store them at room temperature for coating. Then, SiO2 is prepared by immersion method in a clean, dry and constant temperature (20℃~25℃) environment. x The pulling speed of the gel film was controlled at 10-20 cm / min, and then the SiO x The gel film is calcined at low temperature.

[0005] When this patent uses the gel film thermal oxidation method to prepare carbon-doped silicon oxide, it is necessary to use a stirring kettle to mix and stir multiple sols. However, the current stirring kettle generally sets an adjustable stirring shaft in the stirring kettle for stirring the sol. Since the sol itself has a certain degree of adhesion, it is easy to adhere to the inner wall of the stirring kettle. The sol adhered to the inner wall of the stirring kettle cannot fully participate in the stirring and mixing, which affects the stirring and mixing effect of the sol. Summary of the invention

[0006] The object of the present invention is to provide a crystalline silicon photovoltaic cell with a novel tunnel passivation layer and a production device thereof, so as to solve the above-mentioned deficiencies in the prior art.

[0007] In order to achieve the above object, the present invention provides the following technical solution: comprising sandwiching a carbon-doped silicon oxide film between a crystalline silicon substrate and a doped polycrystalline silicon film as a junction tunneling passivation layer to improve the performance of crystalline silicon photovoltaic cells.

[0008] The carbon-doped silicon oxide film, as a tunnel passivation layer, plays a vital role in the crystalline silicon photovoltaic cell of this patent. It can not only effectively block the diffusion of doped atoms between the crystalline silicon substrate and the doped polysilicon film, improving the stability of the cell, but also promote the transmission of photogenerated carriers through its unique tunneling effect, thereby improving the photoelectric conversion efficiency of the cell. In addition, the introduction of carbon doping also reduces the dielectric constant of the silicon oxide film, reduces the capacitance effect, and further improves the performance of the cell.

[0009] The tunnel passivation layer has many names in the field of photovoltaic cells, all of which reflect its important position in the cell structure as a key layer of tunneling effect and passivation. Whether it is a tunnel oxide layer, a tunnel passivation layer or a tunnel oxide layer, it emphasizes the role of this layer in promoting carrier tunneling and reducing interface defects.

[0010] As a further description of the above technical solution: doping the polysilicon film includes but is not limited to: n-type doping using phosphorus as the doping atom, and p-type doping using boron and gallium as the doping atom.

[0011] As an important component of crystalline silicon photovoltaic cells, the doping type (n-type or p-type) of doped polysilicon thin film determines the conductivity type and performance of the junction area. N-type doping is achieved by introducing phosphorus atoms, while p-type doping is achieved by introducing boron or gallium atoms. These doping atoms replace the position of silicon atoms in the silicon lattice, thereby changing the conductivity of the material.

[0012] As a further description of the above technical solution: the relative dielectric constant of carbon-doped silicon oxide is between 1 and 4, and the thickness of the carbon-doped silicon oxide film is 0 to 3 nanometers.

[0013] As a material with excellent performance, carbon-doped silicon oxide has broad application prospects in the field of photovoltaic cells. Its various names reflect the different understandings and application requirements of its performance characteristics in different fields. As one of the important physical parameters of the material, the relative dielectric constant has an important influence on the performance of the battery. By adjusting the carbon doping dosage and porosity structure, the relative dielectric constant of carbon-doped silicon oxide can be precisely controlled to meet the needs of different application scenarios.

[0014] As a further description of the above technical solution: the preparation method of carbon-doped silicon oxide includes but is not limited to chemical vapor deposition, plasma enhancement, and thermal oxidation.

[0015] Thermal oxidation is a traditional method for preparing SiO x Although this method is simple and can produce SiO x The film has excellent electrical properties, and can meet the needs of semiconductor device production in terms of both insulation and masking properties. However, this method is required to be used in a relatively high temperature environment (1050℃~1100℃) for the surface oxidation of single-crystal silicon wafers. x The film process is to prepare sol A and sol B first, mix the two sols together and stir them thoroughly, reflux at 80℃ for about 3-5h, and store them at room temperature for coating. Then, SiO2 is prepared by immersion method in a clean, dry and constant temperature (20℃~25℃) environment. x The pulling speed of the gel film was controlled at 10-20 cm / min, and then the SiO x The gel film was calcined at low temperature. x The film has the advantages of controllable structure, adjustable refractive index, high porosity, small dielectric constant, low thermal conductivity, and high laser damage threshold. It can be used on the surfaces of cathode ray tubes, large-screen displays, solar collectors, etc. as anti-glare and anti-reflection coatings. It can also be used in high-power laser systems as high laser damage anti-reflection films. It can also be used in microelectronic circuits and as high-performance transparent thermal insulation coatings, and therefore has very broad application prospects.

[0016] As a further description of the above technical solution: a production device for crystalline silicon photovoltaic cells with a new tunnel passivation layer, using a sol-gel method to prepare a gel film, and using a gel film thermal oxidation method to prepare a carbon-doped silicon oxide film. It includes a stirring kettle for mixing and stirring multiple sols during the production process, a power structure is installed on the top of the stirring kettle, and a power part for providing power is arranged in the power structure, and the power part drives the stirring part in the stirring structure to slide up and down in the stirring kettle through its own reciprocating motion and cooperates with the rotating part to stir the sol;

[0017] The stirring structure is provided with a stirring member for mixing and stirring the various sols added to the stirring kettle. The stirring rod slides up and down in the movable rod along with the movable rod in the power structure, and cooperates with the bottom rod with a size gradually increasing from top to bottom provided in the upper adjustment member to resist one end of the stirring rod, so as to intermittently adjust the position of the stirring rod in the stirring kettle, and after fully expanding, the other end of the stirring rod is attached to the inner wall of the stirring kettle for scraping;

[0018] A scraper is retractably mounted on the bottom end of the bottom rod through a lower adjusting member, and the scraper is retracted and retracted on the scraper bar through the interference of the lower adjusting member, thereby adjusting the unfolded width of the scraper bar, and when fully unfolded, the scraper scrapes the inner side wall of the bottom end of the stirring kettle;

[0019] The power part cooperates with the reciprocating part to drive the stirring rod to slide up and down in the stirring kettle, and at the same time, the rotating part drives the stirring rod to slide up and down in the stirring kettle while performing rotational stirring, and cooperates with the upper adjusting part and the lower adjusting part to resist the stirring rod inserted in one end of the movable rod, thereby squeezing and expanding the stirring rod and the scraper bar, thereby realizing the expansion of the stirring rod, the scraper bar and the side plate in the stirring kettle, realizing the stirring of the sol in the stirring kettle and scraping and cleaning the sol adhered to the inner wall of the reactor.

[0020] The bottom end of the movable rod is provided with a rotation groove around it, and the bottom end of the stirring rod is inserted in the rotation groove through the rotation rod. The stirring rod is inserted in the movable rod and is rotatably connected to a sliding column at one end. The sliding column is slidably connected to the bottom rod and the surface of the cone rod. The bottom end of the bottom rod is rotatably installed at the center of the bottom of the stirring kettle through the inner and outer ring bearings arranged inside. The bottom rod is stacked in the form of multiple cylinders and cones, and the outer diameter gradually increases from top to bottom. The surface of the cylinder connected to the bottom of each cone is concave and has grooves around it to match the position and size of the sliding column. An elastic plate with elastic deformation properties is arranged in the groove. The sliding column is inserted into the groove to limit the sliding column, so that the limit between the bottom end of the stirring rod and the bottom rod is achieved through the rotation of the movable rod. The bottom rod is driven to rotate by the rotation of the movable rod, so that the scraping strips and side plates installed on both sides of the bottom end of the bottom rod are rotated. Therefore, when the stirring rod is stirring, the scraping strips and side plates arranged at the bottom of the stirring kettle can also realize the stirring function. At the same time, the scraping strips can scrape the bottom of the stirring kettle. The cone and cylinder arranged at the bottom end of the bottom rod are provided with a scraping strip slidably inserted, and one end of the scraping strip is inserted in the bottom rod and is rotatably connected to the bottom end of the column through a rotating shaft. The terminal end of the column is rotatably connected to the inner side wall of the bottom in the groove through a rotating shaft, and the top end of the column is rotatably connected to one end of the extrusion rod through the rotating shaft, and the other end of the extrusion rod is fixedly connected to the elastic plate arranged in the groove opened on the surface of the cylinder arranged at the bottom end of the bottom rod. After one end of the sliding column installed on the stirring rod slides to the surface of the largest cylinder at the bottom end of the bottom rod, the outer side of the stirring rod is squeezed against the inner wall of the stirring kettle. At this time, the squeezing of the stirring rod will squeeze the elastic plate with the squeezing force, and the elastic plate is squeezed inward in the groove, and the lever is moved away by driving the vertical column through the squeezing rod and the rotating column, and the scraper is pushed outward from the bottom rod, so that the side plate arranged at one end of the scraper bar close to the inner wall of the stirring kettle is expanded outward to fit the inner wall of the stirring kettle, and the bottom of the stirring kettle is scraped by the scraper bar, and the position at the bottom of the stirring kettle that the stirring rod cannot scrape is scraped by the side plate, so as to prevent the sol adhered to the inner wall of the stirring kettle from being unable to be stirred and affecting the stirring of various sols. In order to achieve a stirring effect between the two, during the downward sliding of the movable rod, after the tapered rod at the top of the bottom rod is inserted into the movable rod, the stirring rod rotatably installed at the bottom end of the movable rod can follow the interference between the tapered rod on the surface of the bottom rod and the guide rod in the bottom rod for connecting multiple cones and cylinders, so that the stirring range of the multiple stirring rods is gradually expanded during the descent of the movable rod, until the stirring rods are attached to the inner wall of the stirring kettle, and while the movable rod is lifted upward and stirred in the reverse direction, the multiple stirring rods are retracted inward again, and the stirring range of the stirring rods in the stirring kettle is expanded as the movable rod descends and reduced as the movable rod rises, thereby realizing a change in the stirring range and providing scraping and cleaning of the inner wall of the stirring kettle at the same time.

[0021] As a further description of the above technical solution: the stirring member provides power through the power member to cooperate with the reciprocating member to change the position of the stirring rod by sliding up and down in the stirring kettle, and at the same time drives the stirring rod to slide up and down in the stirring kettle through the rotating member while rotating and stirring.

[0022] A power part is installed on the top of the mixing kettle, and the power part includes a unique motor installed on one side of the top of the mixing kettle for providing a power source. The power output end of the motor is fixedly connected to the driving gear, and the driving gear is installed on the top of the mixing kettle through a fixed frame, and a driven gear is meshed and connected above the driving gear. A descending gear is fixedly installed on one side of the driving gear, and an ascending gear is installed on one side of the driven gear. The driving gear and the descending gear have the same size, and the ascending gear and the descending gear are smaller than the driving gear and the driven gear. Only half of the surface of the ascending gear and the descending gear is provided with a rack, and the other half is smooth and oppositely positioned. One side of the ascending gear and the descending gear is meshed with a rack at intervals, and the rack surface will only independently mesh with the ascending gear or the descending gear, and the bottom of the rack is through a double disk The bearing is rotatably connected to a movable rod, and the movable rod is movably inserted in a sleeve fixedly installed on the top of the mixing kettle. A spiral groove is opened on the inner wall of the sleeve, and rollers are slidably connected in the spiral groove. The rollers can rotate independently but are fixedly installed on both sides of the outer surface of the movable rod. When the rack drives the movable rod to slide up and down in the sleeve, the sliding of the roller in the spiral groove drives the movable rod to rotate while sliding up and down. The movable rod slides up and down and rotates in the mixing kettle, so that the stirring rod installed at the bottom of the movable rod is driven to stir at different upper and lower positions in the mixing kettle. At the same time, through the interference between the upper adjusting part and the stirring part in the stirring structure, the stirring rod can stir different ranges while stirring at different positions, and the scraping of the inner wall of the mixing kettle is achieved.

[0023] As a further description of the above technical solution: the bottom rod arranged in the upper adjusting member is in the form of a plurality of stacked cylinders and cones, and the outer diameter gradually increases from top to bottom. The surface of the bottom rod slides against one end of the stirring rod inserted in the movable rod, thereby adjusting the stirring range of the stirring rod in the stirring kettle, and finally achieving the scraping of the inner wall of the stirring kettle by the stirring rod, so that the stirring rod not only provides stirring, but also realizes the function of scraping and cleaning the inner wall of the stirring kettle.

[0024] As a further description of the above technical solution: the lower adjusting member is arranged in the cone at the bottom end of the bottom rod, and the scraper bar and the side plate installed at the bottom end of the stirring kettle are driven to expand and contract at the bottom of the stirring kettle through the transverse U-shaped connecting rod structure arranged inside, so as to cooperate in stirring during the expansion and contraction process, and at the same time, after full expansion, the position of the bottom end of the inner side wall of the stirring kettle that cannot be scraped by the stirring rod is scraped, and the bottom surface of the stirring kettle is scraped.

[0025] As a further description of the above technical solution: the scraper strips arranged in the scraper can be telescopically installed on both sides of the bottom end of the bottom rod, and the bottom end of the bottom rod is installed on the bottom of the stirring kettle through inner and outer ring bearings, and the inner and outer ring bearings are arranged inside the bottom rod, so that the bottom end of the bottom rod is fitted with the bottom surface of the stirring kettle to prevent a large amount of sol from penetrating into the bottom rod.

[0026] In the above technical scheme, the present invention provides a crystalline silicon photovoltaic cell with a new tunneling passivation layer and its production equipment, wherein the top of the cylinder arranged at the top of the bottom rod is provided with a sharp cone for easy insertion into the movable rod, and an elastic scraper with deformation ability and a size adapted to the inner diameter of the movable rod is provided at the position where the cone and the cylinder are connected.

[0027] When the movable rod slides downward and the bottom rod is inserted into the movable rod, the size of the elastic scraper is matched with the size of the inner wall of the movable rod and will fit the inner wall of the movable rod, so there is a downward friction force, thereby rotating the outer ring of the elastic scraper downward, so that the sol in the cavity opened at the bottom end of the movable rod for supplying the stirring rod to rotate can be squeezed outward by the bottom rod in cooperation with the extrusion of the bottom rod, and the outer ring of the elastic scraper is guided downward, so as not to affect the extrusion of the sol, and when the movable rod slides upward, the outer ring of the elastic scraper with the outer ring downward fits the inner wall of the bottom end of the movable rod to scrape the sol on the inner wall of the cavity at the bottom end of the movable rod downward.

[0028] The beneficial effects of the present invention are:

[0029] 1. Carbon doping of the silicon oxide tunnel passivation layer can increase its density, improve its compactness and defect passivation effect. At the same time, carbon doping also reduces the k value of the silicon oxide tunnel passivation layer, reduces its interference with the external electric field, and ensures the external electric field's role in accelerating photogenerated carriers and enabling carrier tunneling;

[0030] 2. Through the unique stirring structure, it realizes the full mixing and stirring of various sols, solves the problem that the sol adheres to the inner wall of the stirring kettle and cannot fully participate in the stirring and mixing, and improves the mixing uniformity of the sol; the design of the stirring rod and the scraper not only realizes the stirring of the sol, but also has the function of scraping and cleaning the inner wall and bottom of the stirring kettle, effectively preventing the residue and accumulation of the sol; the bottom rod design in the upper adjustment part makes the stirring range of the stirring rod adjustable during the stirring process, which can adapt to different stirring needs and improve the flexibility and applicability of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can also be obtained based on these drawings.

[0032] Figure 1 A schematic diagram of the structure of a stirring kettle required for the production of carbon-doped silicon oxide using a gel film thermal oxidation method provided in an embodiment of the present invention;

[0033] Figure 2 A schematic diagram of the structure of a bottom rod provided by an embodiment of the present invention;

[0034] Figure 3 A schematic diagram of the structure of the elastic plate provided in the groove in the normal bounce state (left) and the squeezed depressed state (right) provided in the embodiment of the present invention;

[0035] Figure 4 A schematic diagram of the structure of a roller on the surface of a movable rod provided by an embodiment of the present invention;

[0036] Figure 5 A schematic diagram of the structure of a rack provided by an embodiment of the present invention;

[0037] Figure 6 A schematic diagram of the structure of a movable rod and a sleeve provided in an embodiment of the present invention;

[0038] Figure 7 A schematic diagram of a structure in which a stirring rod provided by an embodiment of the present invention is inserted into a movable rod;

[0039] Figure 8 A schematic structural diagram of a stirring rod installed at the bottom end of a movable rod provided by an embodiment of the present invention in an expanded scraping state (left) and a contracted stirring state (right);

[0040] Fig. 9 A schematic diagram of a multi-link structure in which a scraper strip provided in an embodiment of the present invention is connected between a bottom bar and an elastic plate;

[0041] Fig.10 A schematic diagram of the structure of the connection between the scraper strip, the column, the extrusion rod and the elastic plate provided in an embodiment of the present invention.

[0042] Description of reference numerals:

[0043] 7- stirring kettle; 29- elastic scraper

[0044] Power structure

[0045] Power parts: 1-motor; 2-driven gear; 3-fixed frame; 18-driving gear

[0046] Reciprocating parts: 4- rack; 17- lifting gear; 19- lowering gear

[0047] Rotating parts: 5-sleeve; 6-movable rod; 20-roller; 22-double disc bearing; 23-spiral groove

[0048] Mixing structure

[0049] Stirring parts: 8-stirring rod; 21-rotating groove

[0050] Upper adjustment part: 9-bottom rod; 12-groove; 13-elastic plate; 14-cone rod; 15-guide rod; 24-sliding column; 25-rotating rod

[0051] Lower adjustment part: 26-extrusion rod; 27-rotating shaft; 28-column

[0052] Scraper: 10-scraper strip; 11-inner and outer ring bearings; 16-side plate DETAILED DESCRIPTION

[0053] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings.

[0054] See also Figure 1-Figure 10 The embodiment of the present invention provides a crystalline silicon photovoltaic cell with a new tunneling passivation layer and a technical solution for its production equipment: comprising preparing a gel film by a sol-gel method, preparing a carbon-doped silicon oxide film by a gel film thermal oxidation method, and sandwiching the carbon-doped silicon oxide film between a crystalline silicon substrate and a doped polycrystalline silicon film as a junction tunneling passivation layer to improve the performance of the crystalline silicon photovoltaic cell.

[0055] As a tunneling passivation layer, carbon-doped silicon oxide film plays a vital role in crystalline silicon photovoltaic cells. It can not only effectively block the diffusion of doped atoms between the crystalline silicon substrate and the doped polysilicon film, improving the stability of the cell, but also promote the transmission of photogenerated carriers through its unique tunneling effect, thereby improving the photoelectric conversion efficiency of the cell. In addition, the introduction of carbon doping also reduces the dielectric constant of the silicon oxide film, reduces the capacitance effect, and further improves the performance of the cell.

[0056] The tunnel passivation layer has many names in the field of photovoltaic cells, all of which reflect its important position in the cell structure as a key layer of tunneling effect and passivation. Whether it is a tunnel oxide layer, a tunnel passivation layer or a tunnel oxide layer, it emphasizes the role of this layer in promoting carrier tunneling and reducing interface defects.

[0057] In another embodiment provided by the present invention, preferably, the doped polysilicon film includes but is not limited to: n-type doping using phosphorus as the doping atom, and p-type doping using boron and gallium as the doping atom.

[0058] As an important component of crystalline silicon photovoltaic cells, the doping type (n-type or p-type) of doped polysilicon thin film determines the conductivity type and performance of the junction area. N-type doping is achieved by introducing phosphorus atoms, while p-type doping is achieved by introducing boron or gallium atoms. These doping atoms replace the position of silicon atoms in the silicon lattice, thereby changing the conductivity of the material.

[0059] In another embodiment provided by the present invention, the relative dielectric constant of the carbon-doped silicon oxide is between 1 and 4, and the thickness of the carbon-doped silicon oxide film is between 0 and 3 nanometers.

[0060] As a material with excellent performance, carbon-doped silicon oxide has broad application prospects in the field of photovoltaic cells. Its various names reflect the different understandings and application requirements of its performance characteristics in different fields. As one of the important physical parameters of the material, the relative dielectric constant has an important influence on the performance of the battery. By adjusting the carbon doping dosage and porosity structure, the relative dielectric constant of carbon-doped silicon oxide can be precisely controlled to meet the needs of different application scenarios.

[0061] In another embodiment provided by the present invention, the method for preparing carbon-doped silicon oxide includes but is not limited to chemical vapor deposition, plasma enhancement, and thermal oxidation.

[0062] Thermal oxidation is a traditional method for preparing SiO x Although this method is simple and can produce SiO x The film has excellent electrical properties, and can meet the needs of semiconductor device production in terms of both insulation and masking properties. However, this method is required to be used in a relatively high temperature environment (1050℃~1100℃) for the surface oxidation of single-crystal silicon wafers. x The film process is to prepare sol A and sol B first, mix the two sols together and stir them thoroughly, reflux at 80℃ for about 3-5h, and store them at room temperature for coating. Then, SiO2 is prepared by immersion method in a clean, dry and constant temperature (20℃~25℃) environment. x The pulling speed of the gel film was controlled at 10-20 cm / min, and then the SiO x The gel film was calcined at low temperature. x The film has the advantages of controllable structure, adjustable refractive index, high porosity, small dielectric constant, low thermal conductivity, and high laser damage threshold. It can be used on the surfaces of cathode ray tubes, large-screen displays, solar collectors, etc. as anti-glare and anti-reflection coatings. It can also be used in high-power laser systems as high laser damage anti-reflection films. It can also be used in microelectronic circuits and as high-performance transparent thermal insulation coatings, and therefore has very broad application prospects.

[0063] In another embodiment provided by the present invention, a crystalline silicon photovoltaic cell with a new tunnel passivation layer and its production equipment, the stirring member provides power through a power member to cooperate with a reciprocating member to change the position of a stirring rod 8 sliding up and down in a stirring kettle 7, and at the same time, the stirring rod 8 is driven by a rotating member to slide up and down in the stirring kettle 7 while rotating and stirring.

[0064] A power part is installed on the top of the stirring tank 7, and the power part includes a unique motor 1 for providing a power source installed on one side of the top of the stirring tank 7. The power output end of the motor 1 is fixedly connected to a driving gear 18, and the driving gear 18 is installed on the top of the stirring tank 7 through a fixing frame 3, and a driven gear 2 is meshed and connected above the driving gear 18, a descending gear 19 is fixedly installed on one side of the driving gear 18, and an ascending gear is installed on one side of the driven gear 2. The driving gear 18 and the descending gear 19 have the same size, and the ascending gear and the descending gear 19 are smaller than the driving gear 18 and the driven gear 2. Only half of the surface of the ascending gear and the descending gear 19 is provided with a rack 4, and the other half of the area is smooth and oppositely positioned. One side of the ascending gear and the descending gear 19 is meshed with the rack 4 at intervals, and the surface of the rack 4 will only independently mesh with the ascending gear or the descending gear 19, and the bottom end of the rack 4 is through A movable rod 6 is rotatably connected through a double-disc bearing 22. The movable rod 6 is movably inserted into a sleeve 5 fixedly installed on the top of the stirring kettle 7. A spiral groove 23 is provided on the inner wall of the sleeve 5. A roller 20 is slidably connected in the spiral groove 23. The rollers 20 can rotate independently but are fixedly installed on both sides of the outer surface of the movable rod 6. When the rack 4 drives the movable rod 6 to slide up and down in the sleeve 5, the sliding of the roller 20 in the spiral groove 23 drives the movable rod 6 to rotate while sliding up and down. The movable rod 6 slides up and down and rotates in the stirring kettle 7, so that the stirring rod 8 installed at the bottom end of the movable rod 6 is driven to stir at different upper and lower positions in the stirring kettle 7. At the same time, through the interference between the upper adjusting member and the stirring member in the stirring structure, the stirring rod 8 can stir different ranges while stirring at different positions, and the scraping of the inner wall of the stirring kettle 7 is achieved.

[0065] In another embodiment provided by the present invention, a stirring kettle 7 is provided for mixing and stirring a plurality of sols in the process of preparing a carbon-doped silicon oxide film by a gel film thermal oxidation method. A power structure is installed on the top of the stirring kettle 7. A power member for providing power is provided in the power structure. The power member drives the stirring member in the stirring structure to slide up and down in the stirring kettle 7 through its own reciprocating motion in cooperation with the rotating member to stir the sol.

[0066] The stirring structure is provided with a stirring member for mixing and stirring the various sols added to the stirring kettle 7. The stirring rod 8 slides up and down in the movable rod 6 as the movable rod 6 moves in the power structure. At the same time, the bottom rod 9, which is provided in the upper adjusting member and has a gradually increasing size from top to bottom, resists one end of the stirring rod 8, thereby intermittently adjusting the position of the stirring rod 8 in the stirring kettle 7. After fully expanding, the other end of the stirring rod 8 is attached to the inner wall of the stirring kettle 7 for scraping.

[0067] A scraper is telescopically mounted on the bottom end of the bottom rod 9 through a lower adjusting member, and the scraper can extend and retract the scraper bar 10 through the interference of the lower adjusting member, thereby adjusting the unfolded width of the scraper bar 10, and when fully unfolded, the scraper scrapes the inner side wall of the bottom end of the stirring tank 7;

[0068] The power part cooperates with the reciprocating part to drive the stirring rod 8 to slide up and down in the stirring kettle 7. At the same time, the rotating part drives the stirring rod 8 to slide up and down in the stirring kettle 7 while rotating and stirring, and cooperates with the upper adjusting part and the lower adjusting part to resist the stirring rod 8 inserted in one end of the movable rod 6, thereby squeezing and expanding the stirring rod 8 and the scraper 10, thereby realizing the expansion of the stirring rod 8, the scraper 10 and the side plate 16 in the stirring kettle 7, realizing the stirring of the sol in the stirring kettle 7 and scraping and cleaning the sol adhered to the inner wall of the reactor.

[0069] A rotation groove 21 is provided around the bottom end of the movable rod 6, and the bottom end of the stirring rod 8 is rotatably inserted in the rotation groove 21 through a rotation rod 25. The stirring rod 8 is inserted in the movable rod 6 and one end is rotatably connected to a sliding column 24. The sliding column 24 is connected to the bottom rod 9 and the surface of the cone rod 14 in a sliding manner. The bottom end of the bottom rod 9 is rotatably installed at the bottom center position of the stirring kettle 7 through the inner and outer ring bearings 11 arranged inside. The bottom rod 9 is stacked in the form of multiple cylinders and cones, and the outer diameter gradually increases from top to bottom. The surface of the cylinder connected to the bottom of each cone is concave and has a groove 12 around it to match the position and size of the sliding column 24. An elastic plate 13 with elastic deformation properties is arranged in the groove 12. The sliding column 24 is inserted into the groove 12 to limit the sliding column 24, so as to achieve the movement of the movable rod. 6 is restricted between the bottom end of the stirring rod 8 and the bottom rod 9, so that the bottom rod 9 is driven to rotate by the rotation of the movable rod 6, so that the scraping strips 10 and the side plates 16 installed on both sides of the bottom end of the bottom rod 9 are rotated, so that when the stirring rod 8 is stirring, the scraping strips 10 and the side plates 16 set at the bottom of the stirring kettle 7 can also achieve the stirring function, and the scraping strips 10 can scrape the bottom of the stirring kettle 7, and the scraping strips 10 are slidably inserted in the cone and cylinder set at the bottom of the bottom rod 9, and the scraping strips 10 are inserted in the bottom rod 9 at one end and are rotatably connected to the bottom end of the column 28 through the rotating shaft 27, and the terminal of the column 28 is rotatably connected to the inner side wall of the bottom of the groove 12 through the rotating shaft 27, and the top of the column 28 is rotatably connected to the extrusion rod through the rotating shaft 27. The end of the extrusion rod 26 is fixedly connected to the elastic plate 13 set in the groove 12 opened on the cylindrical surface set at the bottom end of the bottom rod 9. After one end of the sliding column 24 installed on the stirring rod 8 slides to the cylindrical surface with the largest size at the bottom end of the bottom rod 9, the outer side of the stirring rod 8 is squeezed on the inner wall of the stirring tank 7. At this time, the squeezing of the stirring rod 8 will squeeze the elastic plate 13 with the squeezing force. By squeezing the elastic plate 13 inwardly in the groove 12, the lever is moved away by the extrusion rod 26 and the rotating column to push the scraper 10 outward from the bottom rod 9, so that the side plate 16 set at one end of the scraper 10 close to the inner wall of the stirring tank 7 is expanded outward to fit the inner wall of the stirring tank 7, and the scraper 10 fits the bottom of the stirring tank 7. The movable rod 6 is scraped and the position that the stirring rod 8 at the bottom of the stirring kettle 7 cannot be scraped is scraped through the side plate 16 to prevent the sol adhered to the inner wall of the stirring kettle 7 from being unable to be stirred and affecting the stirring effect between the multiple sols. In the process of the movable rod 6 sliding downward, the cone rod 14 at the top of the bottom rod 9 is inserted into the movable rod 6, and the stirring rod 8 rotatably installed at the bottom end of the movable rod 6 can follow the contact between the cone rod 14 on the surface of the bottom rod 9 and the guide rod 15 in the bottom rod 9 for connecting multiple cones and cylinders, so that the stirring range of the multiple stirring rods 8 is gradually expanded during the descent of the movable rod 6, and is expanded until the stirring rod 8 is attached to the inner wall of the stirring kettle 7. When the movable rod 6 is lifted upward and stirred in the reverse direction, the multiple stirring rods 8 are retracted inward again.The stirring range of the stirring rod 8 in the stirring tank 7 is expanded as the movable rod 6 descends, and is reduced as the movable rod 6 rises, thereby changing the stirring range and providing scraping and cleaning of the inner wall of the stirring tank 7.

[0070] In another embodiment provided by the present invention, the bottom rod 9 arranged in the upper adjusting member is in the form of a plurality of stacked cylinders and cones, and the outer diameter gradually increases from top to bottom. The surface of the bottom rod 9 slides against the stirring rod 8 inserted into one end of the movable rod 6, thereby adjusting the stirring range of the stirring rod 8 in the stirring kettle 7, and finally achieving the scraping of the inner wall of the stirring kettle 7 by the stirring rod 8. The stirring rod 8 not only provides stirring, but also realizes the function of scraping and cleaning the inner wall of the stirring kettle 7.

[0071] In another embodiment provided by the present invention, the lower adjusting member is arranged in a cone at the inner bottom end of the bottom rod 9, and the scraper bar 10 and the side plate 16 installed at the bottom end of the stirring kettle 7 are driven to expand and contract at the bottom of the stirring kettle 7 through the transverse U-shaped connecting rod structure arranged inside, so as to cooperate in stirring during the expansion and contraction process, and at the same time, after full expansion, the position of the bottom end of the inner side wall of the stirring kettle 7 that cannot be scraped by the stirring rod 8 is scraped, and the inner bottom surface of the stirring kettle 7 is scraped.

[0072] In another embodiment provided by the present invention, the scraper strip 10 arranged in the scraper can be telescopically installed on both sides of the bottom end of the bottom rod 9, and the bottom end of the bottom rod 9 is installed on the bottom of the stirring kettle 7 through the inner and outer ring bearings 11, and the inner and outer ring bearings 11 are arranged inside the bottom rod 9, so that the bottom end of the bottom rod 9 is fitted with the bottom surface of the stirring kettle 7 to prevent a large amount of sol from penetrating into the bottom rod 9.

[0073] In another embodiment provided by the present invention, preferably, the top of the cylinder arranged at the top of the bottom rod 9 is provided with a sharp cone for easy insertion into the movable rod 6, and an elastic scraper 29 with deformation ability and a size adapted to the inner diameter of the movable rod 6 is provided at the position where the cone and the cylinder are connected.

[0074] When the movable rod 6 slides downward and the bottom rod 9 is inserted into the movable rod 6, the size of the elastic scraper 29 is adapted to the size of the inner wall of the movable rod 6 and will fit the inner wall of the movable rod 6, so there is a downward friction force, thereby rotating the outer ring of the elastic scraper 29 downward, so that the sol in the cavity opened at the bottom end of the movable rod 6 for supplying the stirring rod 8 to rotate can be squeezed outward by the bottom rod 9, and the outer ring of the elastic scraper 29 is guided downward, so as not to affect the extrusion of the sol, and when the movable rod 6 slides upward, the outer ring of the elastic scraper 29 with the outer ring downward fits the inner wall of the bottom end of the movable rod 6 to scrape the sol on the inner wall of the cavity at the bottom end of the movable rod 6 downward.

[0075] In the process of preparing carbon-doped silicon oxide by using the gel film thermal oxidation method, it is necessary to put the prepared various sol raw materials into the stirring tank 7 for stirring and then perform reflux and other operations.

[0076] Start the motor 1, the motor 1 drives the driving gear 18 and the descending gear 19 to rotate clockwise, the driving gear 18 drives the meshing driven gear 2 above to rotate counterclockwise, and the driven gear 2 drives the ascending gear fixed on one side to rotate counterclockwise, when the descending gear 19 rotates clockwise, the rack 4 arranged on the outer half circle of the descending gear 19 is meshed and connected to the rack 4, so that the rack 4 is inserted into the reactor, so that the movable rod 6 connected to the bottom end of the rack 4 through the double-disc bearing 22 is inserted into the sleeve 5 arranged at the top of the reactor, and when the movable rod 6 slides downward, the rollers 2 arranged on both sides of the movable rod 6 0 will rotate and slide in the spiral groove 23 opened on the inner side of the sleeve 5, thereby driving the movable rod 6 to slide downward in the stirring kettle 7 and rotate at the same time, driving the multiple groups of stirring rods 8 installed at the bottom of the movable rod 6 to rotate and stir in the stirring kettle 7. After the descending gear 19 and the rack 4 are misaligned, the rack 4 drives the movable rod 6 and the stirring shaft to descend to the limit position. At this time, the ascending gear and the rack 4 are meshed, driving the rack 4 to slide upward, thereby sliding the movable rod 6 upward in the stirring kettle 7 and rotating in the opposite direction, thereby rotating the stirring rod 8 in the opposite direction in the stirring kettle 7 and stirring while lifting the height position upward;

[0077] After the movable rod 6 slides downward to a certain position, the tapered rod 14 arranged at the top of the bottom rod 9 is inserted into the bottom end of the movable rod 6, and the tapered rod 14 and the surface of the bottom rod 9 are plugged into the bottom end of the movable rod 6. Through the change of the size of the bottom rod 9 itself, the sliding column 24 installed at one end of the stirring rod 8 plugged into the bottom end of the movable rod 6 is squeezed, thereby squeezing the stirring rod 8 and under the rotation of the rotating rod 25, the stirring rod 8 is installed in the stirring kettle 7. One end is rotated outward to expand, thereby increasing the stirring range of the stirring rod 8 in the stirring kettle 7, and while the sliding column 24 is inserted into the groove 12 opened on the surface of the bottom rod 9 and squeezes the elastic plate 13 inward, the sliding column 24 is restricted by the groove 12, so that the movable rod 6 drives the bottom rod 9 to rotate, so that the scraping strips 10 and the side plates 16 installed on both sides of the bottom end of the bottom rod 9 are also rotated and stirred at the bottom of the stirring kettle 7, and at the same time The scraper bar 10 scrapes the bottom of the stirring kettle 7. After the movable rod 6 is inserted into the guide rod 15 and the cylindrical surface at the bottom end of the bottom rod 9, the sliding column 24 rotates with the rotation of the movable rod 6 until it is inserted into the groove 12 and then squeezes the elastic plate 13 inward. The elastic plate 13 pushes the scraper bar 10 outward from the bottom rod 9 by a certain distance through the lever formed by the squeezing rod 26, the rotating shaft 27 and the column 28, so that the side plate 16 is attached to the inner wall of the stirring kettle 7, so that the bottom rod 9 is driven by the movable rod 6 to rotate under the cooperation of the inner and outer ring bearings 11. At this time, the stirring rod 8 also reaches the maximum expansion range. At this time, the stirring rod 8 is attached to the upper part of the inner wall of the stirring kettle 7, and the side plate 16 is attached to the lower part of the inner wall of the stirring kettle 7, so as to scrape the inner wall of the stirring kettle 7 and scrape the sol adhering to the inner wall of the stirring kettle 7 for stirring and mixing.

[0078] When the movable rod 6 meshes with the lifting gear 17 and slides upward, the bottom rod 9 and the stirring rod 8 are driven to rotate in the opposite direction. While sliding upward, the sliding column 24 will be kept in contact with the surface of the bottom rod 9 under the rotation of the rotating rod 25. At the same time, the elastic plate 13 at the bottom end of the bottom rod 9 rebounds, shrinking the scraper bar 10 into the bottom rod 9, and separating the side plate 16 from the inner wall of the stirring tank 7, and rotating the scraper bar 10 and the side plate 16 in the opposite direction. The stirring rod 8 will also separate from the inner wall of the stirring tank 7 and shrink as the size of the squeezing of the sliding column 24 by the bottom rod 9 changes, and rotate in the opposite direction for stirring at the same time, shrinking the stirring range of the stirring rod 8 and rotating in the opposite direction for stirring;

[0079] The movable rod 6 makes reciprocating motion in sequence. During the downward movement of the movable rod 6 in the stirring kettle 7, the stirring rod 8 and the scraper 10 are stirred counterclockwise, and the stirring range of the stirring rod 8, the scraper 10 and the side plate 16 is expanded until they are in contact with the inner wall of the stirring kettle 7 for scraping. During the upward movement of the movable rod 6, the stirring rod 8, the scraper 10 and the side plate 16 are stirred clockwise, and the stirring range of the stirring rod 8, the scraper 10 and the side plate 16 is contracted. This can realize intermittent reciprocating adjustment of the stirring range and intermittent scraping of the inner wall of the stirring kettle 7 to prevent the sol attached to the inner wall of the stirring kettle 7 from being unable to fully participate in the stirring and unable to be repeatedly mixed, thereby affecting the mixing effect of multiple sols.

[0080] The above description is only by way of illustration of certain exemplary embodiments of the present invention. It is undoubted that those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. A crystalline silicon photovoltaic cell with a novel tunnel passivation layer, characterized in that: The method includes sandwiching a carbon-doped silicon oxide film between a crystalline silicon substrate and a doped polycrystalline silicon film as a junction region tunnel passivation layer to improve the performance of a crystalline silicon photovoltaic cell.

2. A crystalline silicon photovoltaic cell with a novel tunnel passivation layer according to claim 1, characterized in that: Doping the polysilicon film includes, but is not limited to, n-type doping using phosphorus as a doping atom and p-type doping using boron or gallium as a doping atom.

3. A crystalline silicon photovoltaic cell with a novel tunnel passivation layer according to claim 1, characterized in that: The relative dielectric constant of carbon-doped silicon oxide is between 1 and 4, and the thickness of the carbon-doped silicon oxide film is between 0 and 3 nanometers.

4. A crystalline silicon photovoltaic cell with a novel tunnel passivation layer according to claim 1, characterized in that: Methods for preparing carbon-doped silicon oxide include but are not limited to chemical vapor deposition, plasma enhancement, and thermal oxidation.

5. A production device for a crystalline silicon photovoltaic cell with a novel tunneling passivation layer, applied to a crystalline silicon photovoltaic cell with a novel tunneling passivation layer as claimed in any one of claims 1 to 4, wherein a gel film is prepared by a sol-gel method, and a carbon-doped silicon oxide film is prepared by a gel film thermal oxidation method, and the device comprises a stirring kettle (7) for mixing and stirring a plurality of sols during the production process, wherein a power structure is installed on the top of the stirring kettle (7), wherein a power member for providing power is arranged in the power structure, wherein the power member drives a stirring member in the stirring structure to slide up and down in the stirring kettle (7) through its own reciprocating motion in cooperation with a rotating member, and stirs the sol at the same time, wherein: The stirring structure is provided with a stirring member for mixing and stirring the various sols added to the stirring kettle (7); the stirring rod (8) slides up and down in the movable rod (6) in the power structure, and cooperates with the bottom rod (9) provided in the upper adjustment member, the size of which gradually increases from top to bottom, to resist one end of the stirring rod (8), so as to intermittently adjust the position of the stirring rod (8) in the stirring kettle (7); and after being fully expanded, the other end of the stirring rod (8) is attached to the inner wall of the stirring kettle (7) for scraping; A scraper is retractably mounted on the bottom end of the bottom rod (9) via a lower adjusting member, and the scraper is retracted and retracted on the scraper bar (10) by the interference of the lower adjusting member, thereby adjusting the unfolded width of the scraper bar (10), and when fully unfolded, the scraper scrapes the inner side wall of the bottom end of the stirring kettle (7); The power member cooperates with the reciprocating member to drive the stirring rod (8) to slide up and down in the stirring kettle (7), and at the same time, the rotating member drives the stirring rod (8) to slide up and down in the stirring kettle (7) while rotating and stirring, and cooperates with the upper adjusting member and the lower adjusting member to resist the end of the stirring rod (8) inserted in the movable rod (6), thereby squeezing and expanding the stirring rod (8) and the scraper (10), thereby realizing the expansion of the stirring rod (8), the scraper (10) and the side plate (16) in the stirring kettle (7), realizing the stirring of the sol in the stirring kettle (7) and scraping and cleaning the sol adhered to the inner wall of the reaction kettle.

6. The production equipment of a crystalline silicon photovoltaic cell with a novel tunnel passivation layer according to claim 5, characterized in that: The stirring member provides power through the power member and cooperates with the reciprocating member to change the position of the stirring rod (8) by sliding up and down in the stirring kettle (7). At the same time, the stirring rod (8) is driven by the rotating member to slide up and down in the stirring kettle (7) while rotating and stirring.

7. The production equipment of crystalline silicon photovoltaic cells with a novel tunnel passivation layer according to claim 5, characterized in that: The bottom rod (9) arranged in the upper adjustment member is in the form of a plurality of stacked cylinders and cones, and the outer diameter gradually increases from top to bottom. The surface of the bottom rod (9) is in sliding contact with one end of the stirring rod (8) inserted in the movable rod (6), so that the stirring range of the stirring rod (8) in the stirring kettle (7) is adjusted, and finally the stirring rod (8) scrapes the inner wall of the stirring kettle (7), so that the stirring rod (8) not only provides stirring, but also realizes the function of scraping the inner wall of the stirring kettle (7).

8. The production equipment of crystalline silicon photovoltaic cells with a novel tunnel passivation layer according to claim 5, characterized in that: The lower adjusting member is arranged in a cone at the bottom end of the bottom rod (9), and drives the scraper bar (10) and the side plate (16) installed at the bottom end of the stirring kettle (7) to expand and contract at the bottom of the stirring kettle (7) through a U-shaped connecting rod structure arranged in a transverse manner inside, so as to coordinate stirring during the expansion and contraction process. At the same time, after full expansion, the position of the bottom end stirring rod (8) on the inner side wall of the stirring kettle (7) that cannot be scraped is scraped, and the bottom surface of the stirring kettle (7) is scraped.

9. The production equipment of crystalline silicon photovoltaic cells with a novel tunnel passivation layer according to claim 5, characterized in that: The scraper strips (10) arranged in the scraper can be telescopically installed on both sides of the bottom end of the bottom rod (9), and the bottom end of the bottom rod (9) is installed on the bottom of the stirring kettle (7) through the inner and outer ring bearings (11), and the inner and outer ring bearings (11) are arranged inside the bottom rod (9), so that the bottom end of the bottom rod (9) is fitted with the bottom surface of the stirring kettle (7) to prevent a large amount of sol from penetrating into the bottom rod (9).

10. The production equipment of crystalline silicon photovoltaic cells with a novel tunnel passivation layer according to claim 5, characterized in that: The top of the cylinder arranged at the top of the bottom rod (9) is provided with a sharp cone for easy insertion into the movable rod (6), and a deformable elastic scraper (29) with a size matching the inner diameter of the movable rod (6) is provided at the position where the cone and the cylinder are connected.

Images