Three-dimensional galvanometer calibration method and laser processing equipment

Abstract

This application provides a three-dimensional galvanometer calibration method and laser processing equipment. The method includes: controlling a motion platform to move to a reference plane of a galvanometer assembly; determining a circular contour line on the medium of the motion platform with a preset radius, centered on the center point of the galvanometer assembly; marking multiple first marking grids along a preset direction on the contour line using a laser, each first marking grid corresponding to a deflection angle, and each first marking pattern corresponding to the position of a zoom lens; detecting each first marking grid based on a vision component to determine a first target position corresponding to the laser's focal point from the zoom lens positions corresponding to the multiple first marking patterns of each first marking grid; fitting the radius of the contour line and the first target positions corresponding to the multiple first marking grids to obtain a first curve; and compensating for the position of the zoom lens based on the first curve. Using the above method, a three-dimensional galvanometer can be accurately calibrated.

Description

Technical Field

[0001] This application relates to the field of calibration technology, and in particular to a three-dimensional galvanometer calibration method and laser processing equipment. Background Technology

[0002] Laser processing technology, with its advantages of high efficiency, high precision, high stability, and low loss, is widely used in industrial fields such as cutting, welding, marking, deburring, and drilling. For example, in the manufacturing of precision electronic products such as mobile phones, laser welding, marking, cutting, and etching processes have stringent requirements for processing precision. To ensure processing quality, precise calibration of laser processing equipment is necessary.

[0003] In related technologies, due to the limitations of correction methods and the constraints of systematic errors in laser processing equipment (e.g., levelness deviation), it is often difficult to achieve comprehensive and accurate correction of laser processing equipment, which in turn affects the final accuracy of laser processing. Summary of the Invention

[0004] In view of the above, it is necessary to provide a three-dimensional galvanometer calibration method and laser processing equipment, which can solve the technical problem of difficulty in achieving all-round accurate calibration of laser processing equipment.

[0005] On one hand, this application provides a three-dimensional galvanometer calibration method applied to a laser processing equipment. The laser processing equipment includes a galvanometer assembly, a vision assembly, a motion platform, and a laser emitter. The galvanometer assembly includes multiple zoom lenses and galvanometer plates. The laser emitted by the laser emitter is incident on the motion platform through the galvanometer assembly. The focal position of the laser is controlled by the relative positional relationship between the multiple zoom lenses. The relative positional relationship is controlled by adjusting the position of at least one zoom lens. The marked position of the laser in a preset direction is controlled by adjusting the deflection angle of the galvanometer plates. The method includes: determining the reference plane of the galvanometer assembly and controlling the motion platform to move to the reference plane; and determining the center point of the motion platform as the center of a circle. On a first medium, at the position of a circular contour line with a preset radius, a laser marks multiple first marking grids along the preset direction on the contour line. Each first marking grid includes multiple first marking patterns. Each first marking grid corresponds to a deflection angle, and each first marking pattern in each first marking grid corresponds to the position of a zoom lens. Based on the vision component, each first marking grid is detected to determine the first target position corresponding to the laser focus from the zoom lens positions corresponding to the multiple first marking patterns in each first marking grid. The radius of the contour line and the first target positions corresponding to the multiple first marking grids are fitted to obtain a first curve. The position of the zoom lens is compensated based on the first curve.

[0006] In some embodiments of this application, the step of detecting each first marking grid based on the vision component to determine a first target position from the positions of zoom lenses corresponding to multiple first marking patterns in each first marking grid includes: controlling the vision component to detect the line width of each first marking pattern in a preset direction; fitting a second curve corresponding to each first marking grid based on the positions of zoom lenses corresponding to multiple first marking patterns in each marking grid and the line width corresponding to each first marking pattern; the second curve being used to describe the relationship between the position of zoom lenses corresponding to each first marking pattern and the line width; and determining the first target position corresponding to each first marking grid from the positions of zoom lenses corresponding to multiple first marking patterns in each first marking grid based on the second curve corresponding to each first marking grid.

[0007] In some embodiments of this application, the preset direction includes a horizontal direction and a vertical direction. Controlling the vision component to detect the line width of each first marking pattern includes: controlling the vision component to capture images of each first marking grid to obtain a marking image corresponding to each first marking grid; using a template matching algorithm to locate each first marking pattern in the marking image to obtain the graphic position of each first marking pattern in the field of view of the vision component; based on the graphic position, using an edge detection algorithm to detect the marking image to obtain edge pixels of the region formed by each first marking pattern; fitting the edge pixels to obtain the left edge line, right edge line, upper edge line, and lower edge line of the region formed by each first marking pattern; determining the horizontal line width of each first marking pattern in the horizontal direction based on the left and right edge lines of the region formed by each first marking pattern; and determining the vertical line width of each first marking pattern in the vertical direction based on the upper and lower edge lines of the region formed by each first marking pattern.

[0008] In some embodiments of this application, the second curve corresponding to each first marking grid includes a second curve corresponding to the horizontal line width and a second curve corresponding to the vertical line width. Determining the first target position corresponding to each first marking grid from the position of the zoom lens corresponding to the plurality of first marking patterns in each first marking grid according to the second curve corresponding to each first marking grid includes: determining the minimum horizontal line width according to the second curve corresponding to the horizontal line width, determining the minimum vertical line width according to the second curve corresponding to the vertical line width, and if the positions of the zoom lenses corresponding to the minimum horizontal line width and the minimum vertical line width match, the positions of the zoom lenses corresponding to the minimum horizontal line width and the minimum vertical line width are taken as the first target position.

[0009] In some embodiments of this application, the method further includes: determining the highest first target position, the lowest first target position, and other first target positions besides the highest and lowest first target positions among the first target positions corresponding to the first marked grid in the preset direction; determining the height difference between the highest and lowest first target positions; marking the first marked grid corresponding to the highest and lowest first target positions using a first marker corresponding to a first height deviation range in which the height difference is located; if the height difference is greater than or equal to a preset threshold, marking the first marked grid corresponding to the highest first target position using a second marker; determining the second height deviation range in which the other first target positions are located; and marking the first marked grid corresponding to the other first target positions using a third marker corresponding to the second height deviation range.

[0010] In some embodiments of this application, the determination of the reference plane includes: determining a height range centered on the initial position height in the vertical direction; dividing the height range to obtain multiple first sub-layers; when the motion platform moves to each first sub-layer, marking a second marking pattern on a second medium on the motion platform using the laser; the second marking patterns corresponding to the multiple first sub-layers constitute a second marking grid; and determining the reference plane from the multiple first sub-layers based on the detection of the second marking grid by the vision component.

[0011] In some embodiments of this application, after determining the reference plane, the method further includes: determining a height range centered on the reference plane in the vertical direction, and dividing the height range to obtain multiple second sub-layers; when the motion platform moves to each second sub-layer, marking a third marking grid on a third medium of the motion platform with a laser, wherein the third marking grid includes multiple third marking patterns, each third marking pattern corresponding to the position of a zoom lens; controlling the vision component to detect the third marking grid; determining the second target position corresponding to the focal point of the laser from the positions of the zoom lenses corresponding to the multiple third marking patterns; fitting the position height of each second sub-layer with the corresponding second target position to obtain a third curve; the third curve is used to describe the change relationship between the position height of each second sub-layer and the corresponding second target position; and compensating the position of the zoom lens according to the third curve.

[0012] In some embodiments of this application, the method further includes: when the motion platform moves to each of the second sub-layers, marking a fourth marking grid on the fourth medium of the motion platform using the laser, wherein each of the second sub-layers corresponds to a fourth marking grid, each fourth marking grid corresponds to the position of a zoom lens and a maximum deflection angle, controlling the vision component to detect each of the fourth marking grids, obtaining the pixel coordinates of the center of each of the fourth marking grids, converting the pixel coordinates into mechanical coordinates, and controlling the motion platform to move according to the mechanical coordinates, so that the center of each of the fourth marking grids coincides with the visual center of the vision component.

[0013] In some embodiments of this application, the maximum deflection angle includes the maximum deflection angle in the horizontal direction and the maximum deflection angle in the vertical direction. The method further includes: establishing a mechanical coordinate system with the mechanical coordinates of the center of each fourth marking grid as the origin; calculating the lengths of multiple straight lines constituting each fourth marking grid in the mechanical coordinate system; calculating the first target line length of each fourth marking grid based on the lengths of all straight lines in the horizontal direction in the mechanical coordinate system; calculating the second target line length of each fourth marking grid based on the lengths of all straight lines in the vertical direction in the mechanical coordinate system; scaling the maximum deflection angle in the horizontal direction based on the first target line length; scaling the maximum deflection angle in the vertical direction based on the second target line length; calculating the length difference between the length of each straight line and a preset length; determining the length deviation range in which the length difference of each straight line is located; and marking each straight line using a fourth mark corresponding to the length deviation range.

[0014] On the other hand, this application provides a laser processing device, the laser processing device comprising: a memory for storing at least one instruction; and a processor for executing the at least one instruction to implement the three-dimensional galvanometer correction method.

[0015] In the three-dimensional galvanometer calibration method provided in this application embodiment, a reference plane for the galvanometer assembly is determined, and the motion platform is controlled to move to this reference plane, serving as a reference for subsequent calibration work. Using the center point of the galvanometer assembly as the center, a circular contour line with a preset radius is determined on the first medium of the motion platform, providing a clear path for laser marking / marking. Multiple first marking grids are marked on the contour line along a preset direction using a laser. Each first marking grid corresponds to a deflection angle of the galvanometer lens, and each first marking pattern in the first marking grid corresponds to the position of a zoom lens. This marking / marking method not only considers the influence of the galvanometer lens deflection angle on the laser direction but also fully considers the influence of the zoom lens position on the laser focal point. By detecting each first marking grid using a vision component, the first target position corresponding to the laser focal point can be accurately determined from the positions of the zoom lenses corresponding to the multiple first marking patterns. By fitting the radius of the contour lines and the first target positions corresponding to multiple first-marked grids, a first curve is obtained. Since the first curve reflects the relationship between the radius of the contour lines and the corresponding first target positions, compensation between the zoom lens and the reference plane based on the first curve can achieve precise calibration of the three-dimensional galvanometer. Precise calibration of the three-dimensional galvanometer avoids problems such as distortion, field curvature, and uneven lighting caused by the vision system of the laser processing equipment in the vertical direction (Z-axis direction) of the reference plane, which can lead to inconsistent grasping and abnormal calibration. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of a laser processing device provided in one embodiment of this application.

[0017] Figure 2 This is a flowchart of a three-dimensional galvanometer correction method provided in an embodiment of this application.

[0018] Figure 3 This is a schematic diagram of the first marking grid provided in an embodiment of this application.

[0019] Figure 4 This is a schematic diagram of the first marked grid on the contour line provided in an embodiment of this application.

[0020] Figure 5 This is a schematic diagram of the first curve provided in an embodiment of this application.

[0021] Figure 6 This is a flowchart of a method for determining the reference plane of a galvanometer assembly according to an embodiment of this application.

[0022] Figure 7 This is a flowchart of a method for determining a first target location provided in an embodiment of this application.

[0023] Figure 8This is a schematic diagram of the edge line provided in one embodiment of this application.

[0024] Figure 9 This is a schematic diagram of the second curve corresponding to the horizontal line width provided in an embodiment of this application.

[0025] Figure 10 This is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0026] Figure 11 This is a schematic diagram of a marked grid diagram provided in one embodiment of this application.

[0027] Figure 12 This is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0028] Figure 13 This is a schematic diagram of the height range provided in one embodiment of this application.

[0029] Figure 14 This is a schematic diagram of the third curve provided in one embodiment of this application.

[0030] Figure 15 This is a schematic diagram of the third curve provided in another embodiment of this application.

[0031] Figure 16 This is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0032] Figure 17 This is a schematic diagram of the fourth marking grid provided in one embodiment of this application.

[0033] Figure 18 This is a schematic diagram of the first intermediate line and the second intermediate line provided in an embodiment of this application.

[0034] Figure 19 This is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0035] Figure 20 This is a schematic diagram of a mechanical coordinate system provided in an embodiment of this application.

[0036] Figure 21 This is a schematic diagram of the frame of a laser processing device provided in one embodiment of this application. Detailed Implementation

[0037] To make the objectives, technical solutions, and advantages of this application clearer, the application will be described in detail below with reference to the accompanying drawings and specific embodiments.

[0038] It should be noted that in this application, "at least one" means one or more, and "more than one" means two or more. "And / or" describes the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A alone, A and B simultaneously, or B alone, where A and B can be singular or plural. The terms "first," "second," "third," "fourth," etc. (if present) in the specification, claims, and drawings of this application are used to distinguish similar objects, not to describe a specific order or sequence.

[0039] In the embodiments of this application, the terms "exemplary" or "for example" are used to indicate that something is an example, illustration, or description. Any embodiment or design that is described as "exemplary" or "for example" in the embodiments of this application should not be construed as being more preferred or advantageous than other embodiments or design. Specifically, the use of the terms "exemplary" or "for example" is intended to present the relevant concepts in a specific manner.

[0040] This application provides a three-dimensional galvanometer calibration method that can accurately calibrate a three-dimensional galvanometer.

[0041] The three-dimensional galvanometer correction method provided in this application can be applied to one or more laser processing devices. For example... Figure 1 The diagram shown is a structural schematic of a laser processing device provided in an embodiment of this application.

[0042] like Figure 1 As shown, laser processing equipment may include a galvanometer assembly, a vision assembly, and a motion platform. Figure 1 (Not shown) and a laser emitter. The galvanometer assembly includes multiple zoom lenses and a galvanometer plate. The laser emitted by the laser emitter is incident on the motion platform through the galvanometer assembly. The focal point of the laser is controlled by the relative positional relationship between the multiple zoom lenses, which is controlled by adjusting the position of at least one zoom lens. The marked position of the laser in a preset direction is controlled by adjusting the deflection angle of the galvanometer plate. The vision component can be a camera, the galvanometer plate can be a reflective lens, and the preset direction can include the X-axis and Y-axis directions. The X-axis can represent the horizontal direction, the Y-axis can represent the vertical direction, and the Z-axis can represent the vertical direction. The relative positional relationship between the multiple zoom lenses can be the relative distance between them.

[0043] like Figure 2 The diagram shown is a flowchart of a three-dimensional galvanometer calibration method according to an embodiment of this application. The order of steps in the flowchart can be adjusted according to different needs, and some steps can be omitted. The three-dimensional galvanometer calibration method is applied to laser processing equipment, such as… Figure 1The laser processing equipment 10 shown.

[0044] S11, determine the reference plane of the galvanometer assembly, and control the motion platform to move to the reference plane.

[0045] In some embodiments of this application, the reference plane can be a reference plane used in laser processing equipment to calibrate the galvanometer assembly and position the focal point of the laser. Because the high precision required in laser processing demands that the galvanometer assembly accurately control the focusing of the laser, it is necessary to determine the reference plane of the galvanometer assembly in order to accurately calibrate the three-dimensional galvanometer. The method for determining the reference plane will be described in detail below.

[0046] S12, using the center point of the galvanometer assembly as the center, determine the position of the contour line of a circle with a preset radius on the first medium of the motion platform.

[0047] This application does not limit the type of the first medium. For example, the first medium may be adhesive tape.

[0048] In some embodiments of this application, there may be multiple preset values, and these preset values ​​can be customized; this application does not impose any restrictions on this. If there are multiple preset values, concentric circles with the center point as the center can be determined on the first medium, and each circle in the concentric circles is a contour line, thereby enabling the determination of the positions of multiple contour lines.

[0049] S13, multiple first marking grids are marked on contour lines along a preset direction using a laser. Each first marking grid includes multiple first marking patterns. Each first marking grid corresponds to a deflection angle. Each first marking pattern in each first marking grid corresponds to the position of a zoom lens.

[0050] In some embodiments of this application, the preset direction includes both a vertical direction and a horizontal direction. Since the zoom lens extends along the vertical direction, the laser processing equipment can adjust the position of at least one zoom lens in the vertical direction, thereby enabling the adjustment of the relative positional relationship of multiple zoom lenses.

[0051] The adjustment range of the zoom lens position can be determined based on the initial position of the at least one zoom lens in the vertical direction. This application does not limit the method for determining the adjustment range.

[0052] For example, the laser processing equipment can determine the upper and lower limits of the adjustment range based on a preset ratio of the initial position, thereby obtaining the adjustment range. For instance, if the initial position is 50 and the preset ratio is 10%, the upper limit of the adjustment range could be 55 = 50 + 50 * 10%, and the lower limit could be 45 = 50 - 50 * 10%, thus determining the adjustment range as [45, 55]. The above example of determining the adjustment range is merely illustrative and is not limited to practical applications.

[0053] The adjustment range may include multiple positions of the zoom lens. The laser processing equipment can divide the adjustment range evenly according to a first preset interval to obtain the multiple positions. The first preset interval can be customized, and this application does not limit it.

[0054] For example, following the above embodiment, if the first preset interval is 1, the laser processing equipment can uniformly divide the adjustment range [45,55] so that the interval / difference between any two positions obtained by the division is 1, and a total of 11 zoom lens positions of 45, 46, 47...54, 55 can be obtained.

[0055] When adjusting the at least one zoom lens to each position within the adjustment range, the adjustment can be performed according to a descending or ascending order. For example, continuing with the above embodiment, among the 11 positions (45, 46, 47...54, 55), the at least one zoom lens can be first adjusted to position 55. After the laser completes one marking, the at least one zoom lens can be adjusted from position 55 to position 54, and so on, to move the at least one zoom lens to each position. Alternatively, the at least one zoom lens can be adjusted to position 45. After the laser completes one marking, the at least one zoom lens can be adjusted from position 45 to position 46, and so on, to move the at least one zoom lens to each position.

[0056] In some embodiments of this application, the preset direction includes the horizontal direction and the vertical direction. Since the marking position of the laser in the horizontal and vertical directions can be controlled by adjusting the deflection angle of the galvanometer, after marking a first marking grid at a marking position, the next marking position on the contour line can be determined by adjusting the deflection angle of the galvanometer. The first marking grid is marked at the determined marking position, and so on, so that the first marking grid in the horizontal and vertical directions of each contour line can be obtained.

[0057] Among them, the adjustment range of the zoom lens position corresponding to the first marked grid on the same contour line is the same, but the deflection angle corresponding to the first marked grid on the same contour line is different.

[0058] In some embodiments of this application, the first marking pattern can be a cross pattern formed by the trajectory of the laser in the horizontal and vertical directions, and the first marking grid formed by multiple cross patterns can be a cross matrix.

[0059] For example, following the above embodiment, if the adjustment range [45, 55] is evenly divided, 11 crosses can be obtained, and the 11 crosses corresponding to the first sub-divisions can form a cross matrix. Figure 3 The image shown is a schematic diagram of a first marking grid provided in an embodiment of this application. Figure 3 In the first marking grid, there is a cross matrix consisting of 11 cross shapes. Each cross in the cross matrix has a corresponding number, and straight lines with the same number in the horizontal and vertical directions belong to the same cross shape.

[0060] like Figure 4 The diagram shown is a schematic diagram of the first marked grid on the contour line provided in an embodiment of this application. Figure 4 Each "+" in the diagram represents the first grid mark, not the first grid mark. Figure 4 In the middle, each contour line has two first marking grids in both the horizontal and vertical directions.

[0061] S14, based on the vision component, each first marking grid is detected to determine the first target position corresponding to the laser focus from the positions of the zoom lens corresponding to the multiple first marking patterns of each first marking grid.

[0062] In some embodiments of this application, each first marking pattern corresponds to the position of a zoom lens, and multiple first marking patterns correspond to the positions of multiple zoom lenses.

[0063] In some embodiments of this application, the laser processing equipment can control the vision component to detect each of the first marking grids, thereby determining the line width of each first marking pattern in each first marking grid. The laser processing equipment can determine the position of the zoom lens corresponding to the first marking pattern with the smallest line width as the first target position.

[0064] The line width of each first marking pattern may include the horizontal line width in the horizontal direction and / or the vertical line width in the vertical direction.

[0065] S15, fit the radius of the contour line and the first target position corresponding to the plurality of first marking grids to obtain the first curve.

[0066] In some embodiments of this application, the first curve is used to describe the relationship between the radius of the contour line and the corresponding first target position. When there are multiple contour lines, the laser processing equipment can generate the first curve based on the radius of each contour line and the first target position corresponding to the first horizontal marking grid on each contour line.

[0067] like Figure 5 The image shown is a schematic diagram of a first curve provided in an embodiment of this application. Figure 5 In the diagram, the horizontal axis represents the radius of the circular contour line, and the vertical axis represents the position of the first target.

[0068] In other embodiments of this application, since the relative positional relationship between multiple zoom lenses is determined by the position of at least one zoom lens, the position of one zoom lens corresponds to a relative distance between multiple zoom lenses. The laser processing equipment can generate a first curve based on the radius of each contour line and the relative distance corresponding to the first horizontal marking grid on each contour line.

[0069] S16, compensate for the position of the zoom lens according to the first curve.

[0070] In some embodiments of this application, the laser processing equipment can determine the slope of the linear function formed by adjacent points based on the radius corresponding to adjacent points in the first curve and the first target position, and determine the linear function based on the determined slope.

[0071] In this process, a linear function can be determined based on the radius corresponding to each pair of adjacent points on the first curve and the first target position. Since the first curve includes multiple pairs of adjacent points, multiple linear functions can be obtained. Each linear function has a corresponding radius range. Based on each linear function, the first target position corresponding to each radius within the corresponding radius range can be calculated. Thus, the position of the zoom lens can be compensated based on the calculated first target position. The radius range corresponding to each linear function can be determined by the radius corresponding to the adjacent points of that linear function.

[0072] In the three-dimensional galvanometer calibration method provided in this application embodiment, a reference plane for the galvanometer assembly is determined, and the motion platform is controlled to move to this reference plane, serving as a reference for subsequent calibration work. Using the center point of the galvanometer assembly as the center, a circular contour line with a preset radius is determined on the first medium of the motion platform, providing a clear path for laser marking / marking. Multiple first marking grids are marked on the contour line along a preset direction using a laser. Each first marking grid corresponds to a deflection angle of the galvanometer lens, and each first marking pattern in the first marking grid corresponds to the position of a zoom lens. This marking / marking method not only considers the influence of the galvanometer lens deflection angle on the laser direction but also fully considers the influence of the zoom lens position on the laser focal point. By detecting each first marking grid using a vision component, the first target position corresponding to the laser focal point can be accurately determined from the positions of the zoom lenses corresponding to the multiple first marking patterns. By fitting the radius of the contour lines and the first target positions corresponding to multiple first-marked grids, a first curve is obtained. Since the first curve reflects the relationship between the radius of the contour lines and the corresponding first target positions, compensation between the zoom lens and the reference plane based on the first curve can achieve precise calibration of the three-dimensional galvanometer. Precise calibration of the three-dimensional galvanometer avoids problems such as distortion, field curvature, and uneven lighting caused by the vision system of the laser processing equipment in the vertical direction (Z-axis direction) of the reference plane, which can lead to inconsistent grasping and abnormal calibration.

[0073] like Figure 6 The diagram shown is a flowchart of the method for determining the reference plane of the galvanometer assembly in step S11 provided in an embodiment of this application.

[0074] S111, determine the height interval in the vertical direction centered on the initial position height, divide the height interval, and obtain multiple first sub-layers.

[0075] In some embodiments of this application, the vertical direction can be referenced. Figure 1 The Z-axis direction. The initial position height can be preset, or it can be obtained by detecting the height corresponding to the initial position of the motion platform.

[0076] The height range centered on the initial position height can be determined based on the initial position height, and this application does not limit the method for determining the height range. For example, the method for determining the height range can refer to the method for determining the adjustment range in step S13.

[0077] The laser processing equipment can uniformly divide the height range according to the second preset interval to obtain multiple position heights. The XY plane corresponding to each position height is determined as the first sub-layer, thereby obtaining multiple first sub-layers. The second preset interval can be customized, and this application does not limit it.

[0078] S112, when the motion platform moves to each first sub-layer, a second marking pattern is marked on the second medium on the motion platform by laser, and the second marking patterns corresponding to the multiple first sub-layers constitute a second marking grid.

[0079] In some embodiments of this application, the laser processing equipment can control the motion platform to move to each first sub-layer and control the laser emitter to emit laser light, so that the laser marks a second marking pattern on the second medium of the motion platform, and each first sub-layer has a corresponding second marking pattern.

[0080] The type of the second medium can be the same as that of the first medium, and the shape of the second marking pattern is the same as that of the first marking pattern. For an explanation of the second medium, please refer to the description of the first medium. For an explanation of the generation of the second marking pattern, please refer to the description of the first marking pattern.

[0081] S113, Based on the detection of the second marked grid by the vision component, a reference plane is determined from the plurality of first sub-layers.

[0082] In some embodiments of this application, the method for determining the reference surface from multiple first sub-layers based on the detection of the second marked grid by the vision component can refer to the method for determining the first target position, and will not be repeated in this application.

[0083] In this embodiment, determining the reference plane provides a basis for accurate calibration of the three-dimensional galvanometer.

[0084] like Figure 7 The diagram shown is a flowchart of a method for determining a first target location provided in an embodiment of this application.

[0085] S141, control the vision component to detect the line width of each first mark pattern in a preset direction.

[0086] In some embodiments of this application, the preset direction includes a horizontal direction and a vertical direction. The laser processing equipment controls the vision component to detect the line width of each first marking pattern, which includes: controlling the vision component to take a picture of each first marking grid to obtain a marking image corresponding to each first marking grid; using a template matching algorithm to locate each first marking pattern in the marking image to obtain the graphic position of each first marking pattern in the field of view of the vision component; based on the graphic position, using an edge detection algorithm to detect the marking image to obtain the edge pixels of the region formed by each first marking pattern; fitting the edge pixels to obtain the left edge line, right edge line, upper edge line, and lower edge line of the region formed by each first marking pattern; determining the horizontal line width of each first marking pattern in the horizontal direction based on the left edge line and right edge line of the region formed by each first marking pattern; and determining the vertical line width of each first marking pattern in the vertical direction based on the upper edge line and lower edge line of the region formed by each first marking pattern.

[0087] The laser processing equipment can calculate the similarity between the standard marking pattern of the template image and the first marking pattern of the marking image. Based on the calculated similarity, it determines the standard marking pattern that matches the first marking pattern of the marking image. Each standard marking pattern in the template image has a corresponding standard position in the field of view of the visual component. The standard position corresponding to the standard marking pattern that matches each first marking pattern is determined as the graphic position of the first marking pattern in the field of view of the visual component. The edge detection algorithm can be the Canny algorithm, the Sobel operator, etc., and this application does not limit the type of edge detection algorithm.

[0088] The vertical line width of each first marking pattern in the vertical direction can be the distance between the upper edge line and the lower edge line of each first marking pattern, and the horizontal line width of each first marking pattern in the horizontal direction can be the distance between the left edge line and the right edge line of each first marking pattern.

[0089] like Figure 8 The image shown is a schematic diagram of an edge line provided in an embodiment of this application. Figure 8 In the middle, the distance between the left and right edge lines is the horizontal line width, and the distance between the top and bottom edge lines is the vertical line width.

[0090] S142, based on the position of the zoom lens corresponding to the multiple first marking patterns in each marking grid and the line width corresponding to each first marking pattern, fit the second curve corresponding to each first marking grid.

[0091] In some embodiments of this application, the second curve is used to describe the relationship between the position of the zoom lens corresponding to each first marking pattern and the corresponding line width.

[0092] The second curve corresponding to each first marked grid includes a second curve corresponding to the horizontal line width and a second curve corresponding to the vertical line width. Please refer to... Figure 3 The line widths of multiple first-marked patterns in the first-marked grid show a trend of being larger at both ends and smaller in the middle in both the horizontal and vertical directions. Therefore, the trends of the second curves corresponding to the horizontal line widths and the second curves corresponding to the vertical line widths are basically the same.

[0093] like Figure 9 The image shown is a schematic diagram of the second curve corresponding to the horizontal line width provided in an embodiment of this application. Figure 9 In the diagram, the horizontal axis represents the position of the zoom lens, the vertical axis represents the horizontal position of the left and right edge lines corresponding to the position of the zoom lens, and the vertical distance between two points corresponding to each position of the zoom lens represents the width of the horizontal line corresponding to each position. Figure 9 The horizontal line width shown is for illustrative purposes only.

[0094] S143, based on the second curve corresponding to each first marking grid, determine the first target position corresponding to each first marking grid from the position of the zoom lens corresponding to the multiple first marking patterns in each first marking grid.

[0095] In some embodiments of this application, the laser processing equipment determines the first target position corresponding to each first marking grid from the position of the zoom lens corresponding to the plurality of first marking patterns in each first marking grid according to the second curve corresponding to each first marking grid, including: determining the minimum horizontal line width according to the second curve corresponding to the horizontal line width, determining the minimum vertical line width according to the second curve corresponding to the vertical line width, and if the positions of the zoom lenses corresponding to the minimum horizontal line width and the minimum vertical line width match, the positions of the zoom lenses corresponding to the minimum horizontal line width and the minimum vertical line width are taken as the first target position.

[0096] Among them, the position matching of the zoom lens corresponding to the minimum horizontal line width and the minimum vertical line width can be that the positions of the zoom lens corresponding to the minimum horizontal line width and the minimum vertical line width are the same.

[0097] In other embodiments of this application, the laser processing equipment can directly determine the position of the zoom lens corresponding to the smallest horizontal line width or the position of the zoom lens corresponding to the smallest vertical line width as the first target position.

[0098] After marking the first grid, as Figure 10The diagram shown is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0099] S21, determine the highest first target position, the lowest first target position, and other first target positions besides the highest and lowest first target positions among the first target positions corresponding to the first marking grid in the preset direction.

[0100] In some embodiments of this application, the preset direction includes the horizontal direction and the vertical direction.

[0101] S22, determine the height difference between the highest and lowest first target positions, and mark the first marking grid corresponding to the highest and lowest first target positions using the first mark corresponding to the first height deviation range of the height difference.

[0102] In some embodiments of this application, the laser processing equipment may include a plurality of predefined first height deviation ranges, each height deviation range having a corresponding first mark. After determining the height difference between the highest first target position and the lowest first target position, the first height deviation range in which the height difference is located can be determined from the plurality of first height deviation ranges, and the corresponding first mark is used to mark the first height deviation range.

[0103] The type of the first marker can be customized. For example, the first marker can be a color, including but not limited to: purple, yellow.

[0104] S23, if the height difference is greater than or equal to a preset threshold, the first marking grid corresponding to the highest first target position is marked using the second mark.

[0105] In some embodiments of this application, the preset threshold can be customized, and this application does not impose any restrictions on it.

[0106] This application does not limit the type of the second mark. For example, the second mark can be a graphic mark, including but not limited to: triangle, circle.

[0107] S24, determine the second height deviation range of the other first target positions, and mark the first marking grid corresponding to the other first target positions using the third mark corresponding to the second height deviation range.

[0108] In some embodiments of this application, the laser processing equipment may include a plurality of predefined second height deviation ranges, each height deviation range having a corresponding third mark. The third mark can be any type of mark; this application specifies the third mark. For example, the third mark can be a color different from the color corresponding to the first mark.

[0109] In some embodiments of this application, the laser processing equipment can generate a grid map based on the distance between each first marking grid and the center point of the galvanometer assembly. Each square in the grid map corresponds to a first marking grid, and the distance between the square corresponding to each first marking grid and the center point of the grid map represents the distance between the first marking grid and the center point of the galvanometer assembly. If the first marker is a lighter color, the second marker is a triangle, and the third marker is a darker color, such as... Figure 11 The image shown is a schematic diagram of a marked grid diagram provided in one embodiment of this application. Figure 11 In the middle, the lighter-colored square with a triangle mark in the lower left corner corresponds to the first marking grid corresponding to the highest first target position, the lighter-colored square in the upper right corner corresponds to the first marking grid corresponding to the lowest first target position, and the darker-colored square corresponds to the first marking grid corresponding to the other first target positions.

[0110] In this embodiment, by using the first mark, the second mark, and the third mark to mark the corresponding first marking grid or the squares of the first marking grid, the deviation or error can be visualized, thereby making it easier for users to understand the deviation of the first marking grid.

[0111] After determining the reference plane, such as Figure 12 The diagram shown is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0112] S31, determine the vertical height range centered on the reference plane, and divide the height range to obtain multiple second sub-levels.

[0113] In some embodiments of this application, the height range includes an upper limit and a lower limit of the position height. The multiple second sub-layers include the second sub-layer corresponding to the upper limit of the position height and the second sub-layer corresponding to the lower limit of the position height. The method for determining the height range can refer to the description of the method for determining the height interval. The height range is greater than the height interval. The method for dividing the second sub-layer can refer to the method for dividing the first sub-layer. This application will not repeat the description.

[0114] S32, when the motion platform moves to each second sub-layer, a third marking grid is marked on the third medium of the motion platform by laser, wherein the third marking grid includes multiple third marking patterns, and each third marking pattern corresponds to the position of a zoom lens.

[0115] In some embodiments of this application, the shape of the third marking pattern is the same as the shape of the first marking pattern, and each second sub-layer has a corresponding third marking grid. The type of the third medium can be the same as the type of the first medium.

[0116] The marking method for the third marking grid can refer to the marking method for each first marking grid, and will not be repeated in this application.

[0117] In some embodiments of this application, when marking the third marking grid, the adjustment range of the position of the at least one zoom lens can be referred to the description of the adjustment range in step S13, which will not be repeated in this application.

[0118] In some embodiments of this application, with the parameters of the galvanometer assembly fixed, a larger relative positional relationship between multiple zoom lenses results in a longer focal length and a lower focal point height for the laser; conversely, a smaller relative positional relationship between zoom lenses results in a shorter focal length and a higher focal point height for the laser. Moving at least one zoom lens to the position of the zoom lens with the largest adjustment range will result in a smaller relative positional relationship between the multiple zoom lenses, while moving at least one zoom lens to the position with the smallest adjustment range will result in a larger relative positional relationship between the multiple zoom lenses. Therefore, when at least one zoom lens is moved to the position with the largest adjustment range, the motion platform can move to the second sub-level with the highest position height; when at least one zoom lens is moved to the position with the smallest adjustment range, the motion platform can move to the second sub-level with the lowest position height. Figure 13 The diagram shown is a schematic representation of the height range provided in one embodiment of this application. Figure 13 In the diagram, H represents the height range, Z0 represents the reference plane, level 1 represents the second sub-level corresponding to the upper limit of the position height within the height range, and level 2 represents the second sub-level corresponding to the lower limit of the position height within the height range.

[0119] S33, control the vision component to detect the third marking grid, and determine the second target position corresponding to the laser focus from the positions of the zoom lenses corresponding to the plurality of third marking patterns.

[0120] In some embodiments of this application, the method for determining the second target location can refer to the method for determining the first target location, and will not be described again in this application.

[0121] S34, Fit the position height of each second sub-layer with the corresponding second target position to obtain the third curve.

[0122] In some embodiments of this application, the third curve is used to describe the relationship between the positional height of each second sub-layer and the corresponding second target position.

[0123] Laser processing equipment can employ various focusing methods, such as pre-focusing and post-focusing. Pre-focusing involves the laser being focused before it reaches the motion platform, with the focal point determined by the laser beam. Post-focusing, on the other hand, focuses the laser beam on the motion platform or workpiece, with the focal point located on either the platform or the workpiece. The corresponding third curve (or laser beam profile) may differ depending on the focusing method.

[0124] like Figure 14 The image shown is a schematic diagram of the third curve provided in an embodiment of this application. Figure 15 The figure shown is a schematic diagram of the third curve provided in another embodiment of this application.

[0125] Figure 14 It is based on the third curve corresponding to a laser with a front-focusing mode. Figure 15 The third curve corresponds to the laser after it is focused. Figure 14 and Figure 15 The horizontal axis represents the position height, and the vertical axis represents the position of the second target.

[0126] S35 compensates for the position of the zoom lens based on the third curve.

[0127] In some embodiments of this application, the method for compensating the position of the zoom lens according to the third curve can be referred to the description of the position of the zoom lens according to the first curve in step S16, and will not be repeated in this application.

[0128] In this embodiment, the position of the zoom lens is compensated according to the third curve, which can avoid the problem that the laser focus cannot fall on the processing surface due to the excessive distance between the galvanometer assembly and the motion platform.

[0129] After compensating for the position of the zoom lens using the third curve, the laser processing equipment can correct distortions, field curvature, and uneven lighting in the horizontal (X-axis) and vertical (Y-axis) directions of the reference plane generated by the vision system of the laser processing equipment. After the correction is completed, such as Figure 16 The diagram shown is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0130] S41, as the motion platform moves to each of the second sub-layers, a fourth marking grid is marked on the fourth medium of the motion platform by laser.

[0131] In some embodiments of the present application, each second hierarchical plane corresponds to a fourth marking grid, and each fourth marking grid corresponds to the position of a zoom lens and a maximum deflection angle. The maximum deflection angle includes the maximum deflection angle in the horizontal direction and the maximum deflection angle in the vertical direction.

[0132] Among them, the type of the fourth medium may be the same as the type of the first medium, and the present application will not repeat the description.

[0133] As Figure 17 shown, it is a schematic diagram of the fourth marking grid provided by an embodiment of the present application. In Figure 17 it, the fourth marking grid is a "field" - shaped grid composed of 6 straight lines.

[0134] S42. Control the vision component to detect each fourth marking grid, and obtain the pixel coordinates of the center of each fourth marking grid.

[0135] In some embodiments of the present application, the laser processing equipment can determine the left edge line, right edge line, upper edge line, and lower edge line of the area corresponding to each fourth marking grid by referring to the determination method of the left edge line, right edge line, upper edge line, and lower edge line of the area formed by each first marking pattern in step S141, determine the first intermediate straight line between the left edge line and the right edge line corresponding to each fourth marking grid, and determine the second intermediate straight line between the upper edge line and the lower edge line corresponding to each fourth marking grid, take the intersection point between the first intermediate straight line and the second intermediate straight line as the center of each fourth marking grid, and determine the pixel coordinates of the center of each fourth marking grid according to the pixel coordinate system corresponding to the vision component.

[0136] As Figure 18 shown, it is a schematic diagram of the first intermediate straight line and the second intermediate straight line provided by an embodiment of the present application.

[0137] S43. Convert the pixel coordinates into mechanical coordinates.

[0138] In some embodiments of the present application, after obtaining the pixel coordinates of the center points of each fourth marking pattern, the pixel equivalent corresponding to the center of each fourth marking pattern can be combined, so as to convert the pixel coordinates of the center of each fourth marking pattern into the corresponding mechanical coordinates.

[0139] S44. Control the movement platform to move according to the mechanical coordinates, so that the center of each fourth marking grid coincides with the vision center of the vision component.

[0140] In this embodiment, by controlling the movement platform to move so that the center of each fourth marking grid coincides with the vision center of the vision component, visual interference can be reduced, which is convenient for establishing an accurate mechanical coordinate system in the following text.

[0141] After the motion platform is moved according to the mechanical coordinates so that the center of each fourth marking grid coincides with the visual center of the vision component, as... Figure 19 The diagram shown is a flowchart of a three-dimensional galvanometer correction method provided in another embodiment of this application.

[0142] S51, establish a mechanical coordinate system with the mechanical coordinates of the center of each fourth marking grid as the origin, and calculate the lengths of the multiple straight lines constituting each fourth marking grid in the mechanical coordinate system.

[0143] like Figure 20 The diagram shown is a schematic of a mechanical coordinate system provided in an embodiment of this application.

[0144] S52, calculate the first target line length of each fourth marking grid based on the lengths of all straight lines in the horizontal direction in the machine coordinate system, and calculate the second target line length of each fourth marking grid based on the lengths of all straight lines in the vertical direction in the machine coordinate system.

[0145] In some embodiments of this application, the laser processing equipment can calculate the first target line length and the second target line length using various methods. This application does not limit the calculation methods for the first target line length and the second target line length. For example, the first target line length can be the average or weighted average of the lengths of all straight lines in the horizontal direction. The second target line length can be the average or weighted average of the lengths of all straight lines in the vertical direction.

[0146] S53, scaling the maximum deflection angle in the horizontal direction based on the length of the first target line, and scaling the maximum deflection angle in the vertical direction based on the length of the second target line.

[0147] In this embodiment, by scaling the maximum deflection angle in the horizontal direction based on the first target line length and the maximum deflection angle in the vertical direction based on the second target line length, the galvanometer assembly can be automatically corrected in three dimensions, thereby improving the correction accuracy of the three-dimensional galvanometer and ensuring that the laser processing equipment achieves high-precision processing in practical applications.

[0148] S54, calculate the length difference between the length of each straight line and the preset length.

[0149] In some embodiments of this application, the preset length can be customized, and this application does not impose any restrictions on it.

[0150] S55, determine the length deviation range of the length difference of each straight line, and mark each straight line using the fourth mark corresponding to the length deviation range.

[0151] In some embodiments of this application, the laser processing equipment may include a plurality of predefined length deviation ranges, each length deviation range having a corresponding fourth mark. This application does not limit the type of the fourth mark. For example, the fourth mark may be a color, including but not limited to: purple and green.

[0152] In this embodiment, the corresponding straight lines are marked using a fourth marker such as color, which can visualize the deviation and error, so that users can intuitively understand the deviation.

[0153] like Figure 21 The diagram shown is a schematic frame diagram of a laser processing apparatus provided in one embodiment of this application. Figure 21 The laser processing equipment 10 may include a communication module 101, a memory 102, a processor 103, an input / output (I / O) interface 104, and a bus 105. The processor 103 is coupled to the communication module 101, the memory 102, and the input / output interface 104 via the bus 105.

[0154] Communication module 101 may include a wired communication module and / or a wireless communication module. The wired communication module may provide one or more wired communication solutions such as Universal Serial Bus (USB) and Controller Area Network (CAN). The wireless communication module may provide one or more wireless communication solutions such as Wireless Fidelity (Wi-Fi), Bluetooth (BT), mobile communication networks, Frequency Modulation (FM), Near Field Communication (NFC), and Infrared (IR).

[0155] Memory 102 may include one or more random access memory (RAM) and one or more non-volatile memory (NVM). The RAM can be directly read and written by the processor 103, and can be used to store executable programs (e.g., machine instructions) of other running programs, as well as user and application data. The RAM may include static random-access memory (SRAM), dynamic random access memory (DRAM), synchronous dynamic random access memory (SDRAM), double data rate synchronous dynamic random access memory (DDR SDRAM), etc.

[0156] Non-volatile memory can also store executable programs and user and application data, and can be pre-loaded into random access memory for direct reading and writing by the processor 103. Non-volatile memory can include disk storage devices and flash memory.

[0157] The memory 102 is used to store one or more computer programs. The one or more computer programs are configured to be executed by the processor 103. The one or more computer programs include multiple instructions that, when executed by the processor 103, enable a three-dimensional galvanometer correction method to be performed on the laser processing equipment 10.

[0158] In other embodiments, such as Figure 21 The laser processing equipment 10 shown also includes an external memory interface for connecting to an external memory to expand the storage capacity of the laser processing equipment 10.

[0159] Processor 103 may include one or more processing units, such as application processors (APs), modem processors, graphics processing units (GPUs), image signal processors (ISPs), controllers, video codecs, digital signal processors (DSPs), and / or neural network processing units (NPUs). These different processing units may be independent devices or integrated into one or more processors.

[0160] The processor 103 provides computing and control capabilities. For example, the processor 103 is used to execute computer programs stored in the memory 102 to implement the three-dimensional galvanometer correction method described above.

[0161] The input / output interface 104 is used to provide a channel for user input or output. For example, the input / output interface 104 can be used to connect various input / output devices, such as a mouse, keyboard, touch device, display screen, etc., so that users can enter information or visualize information.

[0162] Bus 105 is used at least to provide a channel for communication between the communication module 101, memory 102, processor 103, and input / output interface 104 in the laser processing equipment 10.

[0163] It is understood that the structures illustrated in the embodiments of this application do not constitute a specific limitation on the laser processing equipment 10. In other embodiments of this application, the laser processing equipment 10 may include more or fewer components than illustrated, or combine some components, or split some components, or have different component arrangements. The illustrated components may be implemented in hardware, software, or a combination of software and hardware.

[0164] This application also provides a computer-readable storage medium storing a computer program, which includes program instructions. When the program instructions are executed, the method implemented can refer to the methods in the above embodiments of this application.

[0165] The computer-readable storage medium can be the internal memory of the laser processing equipment described in the above embodiments, such as the hard disk or memory of the laser processing equipment. Alternatively, the computer-readable storage medium can be an external storage device of the laser processing equipment, such as a plug-in hard disk, smart media card (SMC), secure digital (SD) card, flash card, etc., equipped on the laser processing equipment.

[0166] In some embodiments, a computer-readable storage medium may include a program storage area and a data storage area, wherein the program storage area may store an operating system, an application program required for at least one function, etc.; and the data storage area may store data created based on the use of the laser processing equipment, etc.

[0167] In the several embodiments provided in this application, it should be understood that the disclosed systems, apparatuses, and methods can be implemented in other ways. For example, the apparatus embodiments described above are merely illustrative; for instance, the division of modules is only a logical functional division, and other division methods may be used in actual implementation.

[0168] The modules described as separate components may or may not be physically separate. The components shown as modules may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the modules can be selected to achieve the purpose of this embodiment according to actual needs.

[0169] Furthermore, the functional modules in the various embodiments of this application can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or in the form of hardware plus software functional modules.

[0170] Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of this application is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be embraced within this application. No appended diagram markings in the claims should be construed as limiting the scope of the claims.

[0171] Furthermore, it is clear that the word "comprising" does not exclude other units or steps, and the singular does not exclude the plural. Multiple units or devices described in this application may also be implemented by a single unit or device through software or hardware. The terms "first," "second," etc., are used to indicate names and do not indicate any specific order.

[0172] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application and are not intended to limit the present application. Although the present application has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present application may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present application.

Claims

1. A three-dimensional galvanometer calibration method, applied to laser processing equipment, characterized in that, The laser processing equipment includes a galvanometer assembly, a vision assembly, a motion platform, and a laser emitter. The galvanometer assembly includes multiple zoom lenses and galvanometer plates. The laser emitted by the laser emitter is incident on the motion platform through the galvanometer assembly. The focal position of the laser is controlled by the relative positional relationship between the multiple zoom lenses. The relative positional relationship is controlled by adjusting the position of at least one of the zoom lenses. The marked position of the laser in a preset direction is controlled by adjusting the deflection angle of the galvanometer plates. The method includes: Determine the reference plane of the galvanometer assembly and control the motion platform to move to the reference plane; Using the center point of the galvanometer assembly as the center, determine the position of the contour line of a circle with a preset radius on the first medium of the motion platform; The laser marks multiple first marking grids along the preset direction on the contour line, wherein each first marking grid includes multiple first marking patterns, each first marking grid corresponds to a deflection angle, and each first marking pattern in each first marking grid corresponds to the position of a zoom lens; Based on the vision component, each first marking grid is detected to determine the first target position corresponding to the focal point of the laser from the positions of the zoom lens corresponding to the multiple first marking patterns of each first marking grid; A first curve is obtained by fitting the radius of the contour lines and the first target positions corresponding to the plurality of first marked grids; The position of the zoom lens is compensated based on the first curve.

2. The three-dimensional galvanometer calibration method as described in claim 1, characterized in that, The step of detecting each first marked grid based on the vision component to determine the first target position from the positions of zoom lenses corresponding to multiple first marked patterns of each first marked grid includes: The vision component is controlled to detect the line width of each first marking pattern in the preset direction; Based on the position of the zoom lens corresponding to the multiple first marking patterns in each marking grid and the line width corresponding to each first marking pattern, a second curve corresponding to each first marking grid is fitted. The second curve is used to describe the relationship between the position of the zoom lens corresponding to each first marking pattern and the line width. Based on the second curve corresponding to each first marking grid, the first target position corresponding to each first marking grid is determined from the position of the zoom lens corresponding to the multiple first marking patterns in each first marking grid.

3. The three-dimensional galvanometer calibration method as described in claim 2, characterized in that, The preset direction includes a horizontal direction and a vertical direction, and controlling the vision component to detect the line width of each first mark pattern includes: The vision component is controlled to capture images of each of the first marking grids to obtain marking images corresponding to each of the first marking grids; The template matching algorithm is used to locate each first marking pattern in the marked image to obtain the graphic position of each first marking pattern in the field of view of the visual component; Based on the position of the graphic, the marked image is detected using an edge detection algorithm to obtain the edge pixels of the region formed by each first marked graphic; By fitting the edge pixels, the left edge line, right edge line, upper edge line and lower edge line of the region formed by each first marking pattern are obtained; The horizontal line width of each first marking pattern in the horizontal direction is determined based on the left and right edge lines of the area formed by each first marking pattern, and the vertical line width of each first marking pattern in the vertical direction is determined based on the upper and lower edge lines of the area formed by each first marking pattern.

4. The three-dimensional galvanometer calibration method as described in claim 3, characterized in that, The second curve corresponding to each first marking grid includes the second curve corresponding to the horizontal line width and the second curve corresponding to the vertical line width. Determining the first target position corresponding to each first marking grid from the position of the zoom lens corresponding to the plurality of first marking patterns in each first marking grid based on the second curve corresponding to each first marking grid includes: The minimum horizontal line width is determined based on the second curve corresponding to the horizontal line width, and the minimum vertical line width is determined based on the second curve corresponding to the vertical line width. If the positions of the zoom lenses corresponding to the minimum horizontal line width and the minimum vertical line width match, then the positions of the zoom lenses corresponding to the minimum horizontal line width and the minimum vertical line width are taken as the first target positions.

5. The three-dimensional galvanometer calibration method as described in claim 1, characterized in that, The method further includes: The highest first target position, the lowest first target position, and other first target positions besides the highest and lowest first target positions are determined among the first target positions corresponding to the first marking grid in the preset direction; Determine the height difference between the highest first target position and the lowest first target position, and use the first mark corresponding to the first height deviation range in which the height difference is located to mark the first marking grid corresponding to the highest first target position and the first marking grid corresponding to the lowest first target position. If the height difference is greater than or equal to a preset threshold, the first marking grid corresponding to the highest first target position is marked using the second mark; Determine the second height deviation range of the other first target locations, and use the third mark corresponding to the second height deviation range to mark the first marking grid corresponding to the other first target locations.

6. The three-dimensional galvanometer calibration method as described in claim 1, characterized in that, The determination of the reference plane includes: Determine the vertical height range centered on the initial position height, and divide the height range to obtain multiple first sub-layers; As the motion platform moves to each first sub-layer, a second marking pattern is marked on the second medium on the motion platform by the laser, and the second marking patterns corresponding to the plurality of first sub-layers constitute a second marking grid. Based on the detection of the second marked grid by the vision component, the reference plane is determined from the plurality of first sub-layers.

7. The three-dimensional galvanometer calibration method as described in claim 1, characterized in that, After determining the reference plane, the method further includes: Determine the vertical height range centered on the reference plane, and divide the height range to obtain multiple second sub-layers; As the motion platform moves to each second sub-layer, a third marking grid is marked on the third medium of the motion platform by the laser. The third marking grid includes a plurality of third marking patterns, and each third marking pattern corresponds to the position of a zoom lens. The vision component is controlled to detect the third marking grid, and the position of the second target corresponding to the focal point of the laser is determined from the positions of the zoom lenses corresponding to the plurality of third marking patterns; The position height of each second sub-layer is fitted with the corresponding second target position to obtain a third curve, which is used to describe the change relationship between the position height of each second sub-layer and the corresponding second target position. The position of the zoom lens is compensated based on the third curve.

8. The three-dimensional galvanometer calibration method as described in claim 7, characterized in that, The method further includes: When the motion platform moves to each of the second sub-layers, a fourth marking grid is marked on the fourth medium of the motion platform by the laser, wherein each second sub-layer corresponds to a fourth marking grid, and each fourth marking grid corresponds to the position of a zoom lens and a maximum deflection angle; The vision component is controlled to detect each of the fourth marking grids to obtain the pixel coordinates of the center of each of the fourth marking grids; Convert the pixel coordinates into machine coordinates; The motion platform is moved according to the mechanical coordinates, so that the center of each fourth marking grid coincides with the visual center of the vision component.

9. The three-dimensional galvanometer calibration method as described in claim 8, characterized in that, The maximum deflection angle includes the maximum deflection angle in the horizontal direction and the maximum deflection angle in the vertical direction. The method further includes: A mechanical coordinate system is established with the mechanical coordinates of the center of each fourth marking grid as the origin, and the lengths of the multiple straight lines constituting each fourth marking grid in the mechanical coordinate system are calculated. Calculate the first target line length of each fourth marking grid based on the lengths of all straight lines in the horizontal direction of the machine coordinate system, and calculate the second target line length of each fourth marking grid based on the lengths of all straight lines in the vertical direction of the machine coordinate system. The maximum deflection angle in the horizontal direction is scaled according to the first target line length, and the maximum deflection angle in the vertical direction is scaled according to the second target line length; Calculate the length difference between the length of each straight line and the preset length; Determine the length deviation range of each straight line's length difference, and mark each straight line using the fourth mark corresponding to the length deviation range.

10. A laser processing device, characterized in that, The laser processing equipment includes: Memory, storing at least one instruction; and The processor executes the at least one instruction to implement the three-dimensional galvanometer correction method as described in any one of claims 1 to 9.

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