A ceramic valve plate polishing machine

Abstract

The present invention discloses a ceramic valve plate polishing machine, which is used to polish the upper end surface and step surface of a ceramic valve plate, and includes a bracket, a fixture and a rotary driver, and also includes a polishing mechanism arranged directly above the fixture, the polishing mechanism includes a lower pressure frame body and a side pressure assembly arranged on the lower pressure frame body for contacting the step surface, and a pressure assembly arranged on the lower pressure frame body for contacting the upper end surface, the side pressure assembly has a polishing block that can slide horizontally on the lower pressure frame body, the pressure assembly has a polishing disc that can slide vertically on the lower pressure frame body, and a linkage is provided between the polishing block and the polishing disc. The present invention drives the ceramic valve plate to rotate by the fixture, and combines the alternating actions of the polishing disc and the polishing block to ensure that the actions of the polishing disc and the polishing block do not affect each other, so that the upper end surface and the step surface of the ceramic valve plate can be fully polished.

Description

Technical Field

[0001] The invention relates to the technical field of ceramic valve plate processing equipment, in particular to a ceramic valve plate polishing machine. Background Art

[0002] Most existing ceramic valve discs are disc structures and are usually designed with step surfaces to closely match other components such as valve cores and sealing rings to ensure good sealing performance. The ceramic valve disc is also designed with several holes for installation, positioning, fixing or as part of the fluid channel to ensure that the fluid can pass smoothly and achieve precise control.

[0003] Ceramic valve discs are mainly used in valves to control the flow of liquid media. In order to reduce the surface roughness of ceramic valve discs to improve the sealing of the end face fitting and prevent the leakage of liquid media, the ceramic valve discs need to be polished. However, the polishing of the end face and step surface of the ceramic valve disc currently requires multiple polishing processes to complete. This increases the production cycle and operation complexity. The process of transferring from one device to another is not only time-consuming, but also prone to human errors, affecting the quality of the final product.

[0004] In the prior art, for example, a Chinese utility model patent (authorization announcement number CN220312880U) discloses a ceramic valve plate fixing and grinding device and a ceramic valve plate polishing machine, whose structure includes a pushing and positioning component, a supporting and grinding component and a pressing and fixing component. The grinding end of the supporting and grinding component is rotatably arranged and used to support the material from the bottom and grind the lower end surface of the material. The fixed end of the pressing and fixing component is movably arranged vertically and used to press and cover the material from the top to fix the material. The pushing and positioning component is arranged horizontally and used to push the material to the grinding end of the supporting and grinding component and clamp and press the material so that the material is arranged corresponding to the fixed end of the pressing and fixing component.

[0005] According to the above-mentioned prior art, the polishing machine pushes the ceramic valve disc to the grinding end of the supporting grinding assembly by pushing the positioning assembly, then clamps and presses the material, and presses the fixed end of the fixing assembly from the top of the material to cover the ceramic valve disc, so that the lower end surface of the ceramic valve disc fits with the grinding end of the supporting grinding assembly, and the grinding end of the supporting grinding assembly is rotated to achieve grinding and polishing of the lower end surface of the material. However, the polishing machine partially grinds along the surface of the ceramic valve disc through the grinding end of the supporting grinding assembly, so that the contact area between the grinding end and the ceramic valve disc is small, the pressure and impact force per unit area are large, and it is easy to produce large vibrations, which affects the uniformity and consistency of the polishing effect.

[0006] Therefore, there is a need for a polishing machine that can comprehensively and stably polish the end surface and step surface of a ceramic valve plate. Summary of the invention

[0007] In view of the problems existing in the prior art, a ceramic valve plate polishing machine is provided, which drives the ceramic valve plate to rotate through a clamp, and combines the alternating actions of the polishing disk and the polishing block to ensure that the actions of the polishing disk and the polishing block do not affect each other, so that the upper end surface and step surface of the ceramic valve plate can be fully polished.

[0008] In order to solve the problems of the prior art, the present invention provides a ceramic valve plate polishing machine for polishing the upper end surface and the step surface of the ceramic valve plate, comprising a bracket, a clamp rotatably arranged on the bracket for clamping the ceramic valve plate and a rotating driver arranged on the bracket for driving the clamp to rotate, and also comprising a polishing mechanism arranged directly above the clamp, the polishing mechanism comprising a lower pressure frame body and a side pressure component arranged on the lower pressure frame body for contacting the step surface and a pressing component arranged on the lower pressure frame body for contacting the upper end surface, the bracket is provided with a lower pressure driver for driving the lower pressure frame body to move in a direction perpendicular to the upper end surface, and the side pressure component is arranged on the lower pressure frame body to contact the upper end surface. The component has a polishing block that can slide horizontally on the lower pressure frame, the lower pressure frame is provided with a slide rail for the polishing block to slide, the pressing component has a polishing disc that can slide vertically on the lower pressure frame, the lower pressure frame is provided with a linear driver for driving the polishing disc to slide, and a linkage is provided between the polishing block and the polishing disc. When the polishing disc moves upward and gradually away from the upper end surface of the ceramic valve disc, the polishing disc drives the polishing block to move inward synchronously through the linkage and gradually approaches the step surface of the ceramic valve disc; when the polishing disc moves downward and gradually approaches the upper end surface of the ceramic valve disc, the polishing disc drives the polishing block to move outward synchronously through the linkage and gradually away from the step surface of the ceramic valve disc.

[0009] Preferably, a column extending downward for pressing the upper end surface is fixedly provided at the center of the lower pressure frame, the column is coaxial with the clamp, the lower end surface of the column is a plane, and a flexible cloth is fixedly provided on the polishing disc, which is in contact with the lower end surface of the column and can cover the upper end surface, and a first polishing layer is provided on the flexible cloth. When the first polishing layer is squeezed onto the upper end surface by the polishing disc, the first polishing layer and the upper end surface are in a flat state in full contact.

[0010] Preferably, a plurality of the polishing blocks are evenly arranged on the lower pressure frame body around the circumferential direction of the cylinder, a linkage part is provided between each polishing block and the polishing disk, the inner side of each polishing block has an arc surface that can adapt to the step surface, and the arc surface is provided with a second polishing layer. When the polishing disk moves upward, all the polishing blocks are in a state of synchronously moving inward, so that all the second polishing layers are in synchronous and close contact with the step surface.

[0011] Preferably, a pressure rod is provided on the downward pressure frame, which is coaxial with the column and fixedly connected to the driving end of the downward pressure driver, and a buffer spring is connected between the pressure rod and the column.

[0012] Preferably, the column has a chamber with an open upper end, a sealing ring mounted on a pressure rod is fixedly provided at the open end of the column, the column has an air hole connected to the chamber and inclined downward from the inside to the outside, the pressure rod has an air passage that can pass the air source into the chamber, when the polishing disc gradually moves downward, the air flow is ejected from the air hole at the same time, and the air flow acts on the flexible cloth to make the flexible cloth flat.

[0013] Preferably, a plurality of the air holes are provided on the cylinder around its circumference, and a pressure relief hole is provided on the polishing disc to prevent airflow from accumulating between the polishing disc and the flexible cloth and causing bulging of the flexible cloth. When the airflow acts on the flexible cloth through the air holes, the airflow is discharged from the pressure relief hole, so that the flexible cloth is in a flat state when squeezed by the polishing disc.

[0014] Preferably, the polishing disc comprises a ring sleeve which is sleeved on the cylinder, and a plurality of balls which are in rolling contact with the cylinder are arranged on the ring sleeve around its circumference.

[0015] Preferably, a reset spring is provided between the ring sleeve and the lower pressure frame, and the linear drive has a fixed electromagnet arranged on the lower pressure frame and a movable electromagnet arranged on the polishing disk. The movable electromagnet can move relative to the fixed electromagnet. When the movable electromagnet moves away from the fixed electromagnet, the polishing disk gradually moves downward relative to the lower pressure frame, and the reset spring is in a stretched state.

[0016] Preferably, the linkage member is specifically a connecting rod, one end of the connecting rod is hinged to the polishing disc, and the other end is hinged to the polishing block, and the polishing disc and the polishing block both have a hinged portion hinged to the connecting rod.

[0017] Preferably, each of the slide rails is provided with a stopper for limiting the outward movement distance of the polishing block. When the polishing block contacts the stopper, the lower end surface of the polishing disc is flush with the lower end surface of the cylinder, so that the first polishing layer on the flexible cloth is flatly squeezed onto the upper end surface.

[0018] Compared with the prior art, the present invention has the following beneficial effects:

[0019] 1. The present invention drives the rotation of the ceramic valve plate by a fixture, and cooperates with the alternating actions of the polishing block and the polishing disk to achieve comprehensive polishing of the upper end surface and the step surface of the ceramic valve plate.

[0020] When the polishing disc moves upward away from the upper end surface of the ceramic valve disc, the linkage drives the polishing block to move inward synchronously, gradually approaching and contacting the step surface. Conversely, when the polishing disc moves downward close to the upper end surface, the polishing block moves outward synchronously. The mutually linked polishing disc and polishing block are not affected by each other, ensuring that the upper end surface and the step surface of the ceramic valve disc can be fully polished, thereby improving the polishing quality.

[0021] 2. The present invention provides a stable pressure for the ceramic valve plate through the column, so that the ceramic valve plate remains stable during the rotation process, ensuring that the flexible cloth and the first polishing layer always maintain appropriate tension during the entire polishing process, preventing the first polishing layer from shifting and failing to fully cover the ceramic valve plate.

[0022] Since the first polishing layer has the characteristics of an expansion joint, sufficient contact between the first polishing layer and the upper end surface of the ceramic valve plate is ensured, avoiding wrinkles or bulges in the first polishing layer during the process of adapting to the upper end surface of the ceramic valve plate, thereby improving the polishing quality.

[0023] 3. The present invention enables the linkage to drive the polishing blocks to move synchronously through the movement of the polishing disc, so that the second polishing layers on all polishing blocks can be in close contact with the step surface of the ceramic valve disc. Not only does it ensure the synchronous movement of the polishing blocks, but it can also adjust the feed amount of the polishing blocks according to the size of the ceramic valve disc, thereby achieving full contact between the second polishing layer and the step surface.

[0024] At the same time, the area covered by the first polishing layer changes when the polishing disc moves upward, thereby effectively avoiding the contact between the second polishing layer and the step surface. The first polishing layer and the second polishing layer do not interfere with each other, ensuring the coordination and efficiency of the polishing process. This achieves comprehensive and fine polishing of the ceramic valve plate step surface and improves the polishing quality.

[0025] 4. The present invention keeps the flexible cloth flat by airflow acting on the flexible cloth, thereby keeping the first polishing layer flat. When the polishing disc presses the first polishing layer against the upper end surface of the ceramic valve disc, the first polishing layer can fully contact the upper end surface of the ceramic valve disc, thereby improving the polishing effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a three-dimensional structural schematic diagram of a ceramic valve plate polishing machine of the present invention.

[0027] Figure 2 It is a partial three-dimensional structural sectional view of a ceramic valve plate polishing machine of the present invention.

[0028] Figure 3 It is a three-dimensional structural schematic diagram of a ceramic valve disc of a ceramic valve disc polishing machine of the present invention.

[0029] Figure 4 It is a three-dimensional structural schematic diagram of a polishing mechanism of a ceramic valve plate polishing machine of the present invention.

[0030] Figure 5 It is a planar cross-sectional view of the contact between the second polishing layer of a ceramic valve plate polishing machine of the present invention and the step surface of the ceramic valve plate.

[0031] Figure 6It is a partial three-dimensional structural cross-sectional view of the contact between the second polishing layer of a ceramic valve plate polishing machine of the present invention and the step surface of the ceramic valve plate.

[0032] Figure 7 yes Figure 5 An enlarged schematic diagram of point A.

[0033] Figure 8 It is a planar cross-sectional view of the contact between the first polishing layer of a ceramic valve plate polishing machine of the present invention and the upper end surface of the ceramic valve plate.

[0034] Fig. 9 It is a partial three-dimensional structural cross-sectional view of the first polishing layer of a ceramic valve plate polishing machine of the present invention in contact with the upper end surface of the ceramic valve plate.

[0035] Fig.10 yes Figure 8 An enlarged schematic diagram of point B.

[0036] Fig.11 It is a three-dimensional structural schematic diagram of a ceramic valve plate polishing machine of the present invention, in which the first polishing layer is in a flat state.

[0037] Fig.12 It is a three-dimensional structural schematic diagram of a first polishing layer of a ceramic valve plate polishing machine of the present invention in a deformed state.

[0038] The numbers in the figure are: 1, ceramic valve plate; 11, upper end surface; 12, step surface; 2, bracket; 3, clamp; 4, polishing mechanism; 5, lower pressure frame; 51, column; 511, chamber; 5111, air hole; 512, sealing ring; 52, pressure rod; 521, airway; 53, buffer spring; 6, side pressure assembly; 61, polishing block; 611, second polishing layer; 62, slide rail; 63, stopper; 7, pressing assembly; 71, polishing disk; 711, flexible cloth; 712, first polishing layer; 713, pressure relief hole; 72, linear drive; 721, ring sleeve; 7211, ball; 7212, reset spring; 722, fixed electromagnet; 723, movable electromagnet; 8, linkage. DETAILED DESCRIPTION

[0039] In order to further understand the features, technical means, specific objectives and functions of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0040] See also Figures 1 to 10As shown, a ceramic valve plate polishing machine is used to polish the upper end surface 11 and the step surface 12, including a bracket 2, a clamp 3 rotatably arranged on the bracket 2 for clamping the ceramic valve plate 1, and a rotating driver arranged on the bracket 2 for driving the clamp 3 to rotate, and also includes a polishing mechanism 4 arranged directly above the clamp 3, the polishing mechanism 4 includes a lower pressure frame 5 and a side pressure component 6 arranged on the lower pressure frame 5 for contacting the step surface 12 and a pressing component 7 arranged on the lower pressure frame 5 for contacting the upper end surface 11, the bracket 2 is provided with a lower pressure driver for driving the lower pressure frame 5 to move in a direction perpendicular to the upper end surface 11, and the side pressure component 6 has a function of being able to move on the lower pressure frame The polishing block 61 slides horizontally on the body 5, and the lower pressure frame body 5 is provided with a slide rail 62 for the polishing block 61 to slide. The pressing assembly 7 has a polishing disc 71 that can slide vertically on the lower pressure frame body 5. The lower pressure frame body 5 is provided with a linear driver 72 for driving the polishing disc 71 to slide. A linkage 8 is provided between the polishing block 61 and the polishing disc 71. When the polishing disc 71 moves upward and gradually away from the upper end surface 11, the polishing disc 71 drives the polishing block 61 to move inward synchronously through the linkage 8 and gradually approaches the step surface 12. When the polishing disc 71 moves downward and gradually approaches the upper end surface 11, the polishing disc 71 drives the polishing block 61 to move outward synchronously through the linkage 8 and gradually moves away from the step surface 12.

[0041] After the ceramic valve disc 1 is placed on the fixture 3, the ceramic valve disc 1 is clamped by the fixture 3. The fixture 3 is driven by a rotary driver to rotate at high speed, thereby driving the ceramic valve disc 1 to rotate together. The technical solution of the present invention does not involve how to drive, and the rotary driver used to drive the fixture 3 to rotate is an obvious prior art, which will not be described here.

[0042] After the ceramic valve disc 1 is fixed by the clamp 3, the pressing driver is started, driving the pressing frame 5 to gradually approach the ceramic valve disc 1, until the polishing disc 71 on the pressing assembly 7 contacts the upper end surface 11. As the ceramic valve disc 1 rotates at a high speed, the upper end surface 11 is polished until the polishing of the upper end surface 11 of the ceramic valve disc 1 is completed.

[0043] When the upper end surface 11 is polished, the linear drive 72 starts to work, so that the polishing disc 71 moves upward relative to the lower pressure frame 5. The polishing disc 71 gradually moves away from the upper end surface 11. At the same time, the linkage 8 drives the polishing block 61 to move synchronously inward and gradually approach the step surface 12. The polishing disc 71 is used as a power source, and the power is transmitted to the polishing block 61 through the linkage 8, ensuring that the polishing block 61 can fit the step surface 12 tightly when the polishing disc 71 leaves the upper end surface 11 of the ceramic valve plate 1.

[0044] On the contrary, when the polishing disc 71 gradually approaches the upper end surface 11, the polishing block 61 moves outward synchronously and gradually moves away from the step surface 12. This not only ensures that the polishing disc 71 and the polishing block 61 can fully contact the upper end surface 11 and the step surface 12 respectively, but also avoids interference between the polishing disc 71 and the polishing block 61.

[0045] When the polishing time reaches the preset value or meets the quality requirements, the pressing driver works in reverse to lift the pressing frame 5 and separate it from the ceramic valve plate 1. At this time, the fixture 3 stops rotating, and the ceramic valve plate 1 is taken out of the fixture 3, completing a complete polishing process.

[0046] See also Figures 4 to 10 As shown, a column 51 extending downward for pressing the upper end surface 11 is fixedly provided at the center of the lower pressure frame 5, the column 51 is coaxial with the clamp 3, the lower end surface of the column 51 is a plane, and a flexible cloth 711 is fixedly provided on the polishing disc 71, which is in contact with the lower end surface of the column 51 and can cover the upper end surface 11, and a first polishing layer 712 is provided on the flexible cloth 711. When the first polishing layer 712 is squeezed onto the upper end surface 11 by the polishing disc 71, the first polishing layer 712 is in a flat state of full contact with the upper end surface 11.

[0047] The first polishing layer 712 has an expansion joint that can follow the deformation of the flexible cloth 711, thereby avoiding wrinkles during the deformation process. This ensures that the first polishing layer 712 can be in flat contact with the upper end surface 11, thereby improving the polishing quality. When the polishing disc 71 moves upward and drives the first polishing layer 712 to deform, the first polishing layer 712 gradually reduces the area covered by the ceramic valve plate 1. At this time, the polishing block 61 contacts the step surface 12, ensuring that the polishing block 61 is not affected by the first polishing layer 712 and is in full contact with the step surface 12.

[0048] As the column 51 moves downward following the lower pressing frame 5, the first polishing layer 712 on the flexible cloth 711 gradually adheres to the upper end surface 11. Since the lower end surface of the column 51 is a plane, the flexible cloth 711 located at the lower end surface of the column 51 can be pressed flatly against the upper end surface 11, thereby ensuring that the first polishing layer 712 of the lower end surface of the column 51 is in flat contact with the upper end surface 11.

[0049] When the ceramic valve disc 1 is fixed by the fixture 3 and starts to rotate, no matter how the polishing plate 71 moves, the column 51 always applies a stable pressing force to the ceramic valve disc 1, thereby ensuring the stability of the ceramic valve disc 1 during the polishing process.

[0050] When the polishing plate 71 moves upward relative to the lower pressure frame 5, the first polishing layer 712 can be deformed without wrinkling due to the characteristics of the expansion joint on the first polishing layer 712. At this time, the polishing block 61 contacts the step surface 12, and the change of the first polishing layer 712 does not hinder the polishing of the step surface 12.

[0051] When the polishing disc 71 moves downward relative to the lower pressing frame 5 , the first polishing layer 712 gradually spreads out and fits with the upper end surface 11 , thereby covering the entire upper end surface 11 , so that the upper end surface 11 is fully polished.

[0052] See also Figures 4 to 10 As shown, a plurality of polishing blocks 61 are evenly arranged on the lower pressure frame body 5 in the circumferential direction around the column 51, and a linkage part 8 is provided between each polishing block 61 and the polishing disk 71. The inner side of each polishing block 61 has an arc surface that can adapt to the step surface 12, and the arc surface is provided with a second polishing layer 611. When the polishing disk 71 moves upward, all the polishing blocks 61 are in a state of synchronously moving inward, so that all the second polishing layers 611 are in synchronous and tight contact with the step surface 12.

[0053] When the polishing disc 71 moves upward, the linkage 8 drives the polishing blocks 61 to move inward synchronously, so that the second polishing layers 611 on all the polishing blocks 61 can be in close contact with the step surface 12. This not only ensures the synchronous movement of the polishing blocks 61, but also adjusts the feed amount of the polishing blocks 61 according to the size (specifically the diameter size) of the ceramic valve plate 1, so that the second polishing layer 611 is in full contact with the step surface 12.

[0054] The step surface 12 is an annular surface surrounding the ceramic valve disc 1, and the annular surface has a vertical portion and a horizontal portion. During the rotation of the ceramic valve disc 1, the second polishing layer 611 can be in full contact with the step surface 12, so as to achieve the effect of fully polishing the step surface 12. Since the step surface 12 is adjacent to the upper end surface 11, when the second polishing layer 611 contacts the step surface 12, the change of the first polishing layer 712 further forms an avoidance for the second polishing layer 611. And the second polishing layer 611 and the step surface 12 are in surface-to-surface contact, so that the step surface 12 can be fully and evenly polished.

[0055] See also Figure 1 , Figure 2 and Figures 4 to 9 As shown, a pressure rod 52 is provided on the pressing frame 5 and is coaxial with the column 51 and fixedly connected to the driving end of the pressing driver. A buffer spring 53 is connected between the pressure rod 52 and the column 51.

[0056] When the downward drive is started, the driving end pushes the pressing rod 52 to move downward until the column 51 presses the first polishing layer 712 against the ceramic valve disc 1. As the pressing rod 52 continues to be pressed downward, the buffer spring 53 between the pressing rod 52 and the column 51 is gradually compressed, which not only reduces the impact on the ceramic valve disc 1, but also ensures the stability of the ceramic valve disc 1 in the fixture 3.

[0057] See also Figures 4 to 12 As shown, the column 51 has a chamber 511 with an open upper end, and a sealing ring 512 mounted on the pressure rod 52 is fixedly provided at the open end of the column 51. The column 51 is provided with an air hole 5111 which is connected to the chamber 511 and tilted downward from the inside to the outside. The pressure rod 52 has an air channel 521 that can pass the air source into the chamber 511. When the polishing disc 71 gradually moves downward, the air flow is ejected from the air hole 5111 at the same time. At this time, the air flow acts on the flexible cloth 711 so that the flexible cloth 711 is in a flat state.

[0058] When the polishing plate 71 starts to gradually move downward relative to the lower pressing frame 5 under the drive of the linear drive 72, the air channel 521 in the pressing rod 52 simultaneously passes the air source into the chamber 511 of the column 51, and the air source is transmitted by an external air pump. The gas in the chamber 511 is ejected downward from the inside to the outside through the air holes 5111 opened on the column 51, so that the air flow can effectively act on the flexible cloth 711.

[0059] As the polishing disc 71 continues to move downward, airflow is continuously ejected from the air holes 5111 and directly acts on the flexible cloth 711. The pressure of the airflow and the ejection direction make the flexible cloth 711 gradually flattened to avoid wrinkles and local bulges.

[0060] As the polishing disc 71 continues to move downward, the airflow continues to act synchronously. After the polishing disc 71 moves downward to the right position, the flexible cloth 711 is completely flattened, and the air channel 521 stops supplying air. Since the first polishing layer 712 is fixed on the flexible cloth 711, the flexible cloth 711 will drive the first polishing layer 712 attached thereto to become flat as well.

[0061] The first polishing layer 712 gradually changes from a deformed state to a flat state and is pressed against the upper end surface 11 by the polishing disk 71, ensuring full contact between the first polishing layer 712 and the upper end surface 11. A uniform distribution of pressure is achieved on the entire contact surface, avoiding excessive or insufficient local pressure, and ensuring the consistency of the polishing degree of the upper end surface 11.

[0062] See also Figures 5 to 9As shown, the cylinder 51 is provided with a plurality of air holes 5111 around its circumferential direction, and the polishing disc 71 is provided with a pressure relief hole 713 which can prevent the airflow from accumulating between the polishing disc 71 and the flexible cloth 711 and causing the flexible cloth 711 to bulge. When the airflow acts on the flexible cloth 711 through the air holes 5111, the airflow is discharged from the pressure relief hole 713, so that the flexible cloth 711 is in a flat state when being squeezed by the polishing disc 71.

[0063] The multiple air holes 5111 ensure that the airflow can be evenly distributed in various parts of the flexible cloth 711. Each air hole 5111 can provide a certain airflow pressure, so that the flexible cloth 711 is evenly blown during the downward movement of the polishing plate 71. No matter where the flexible cloth 711 is wrinkled or uneven, it can be quickly flattened by the airflow to ensure its overall flatness.

[0064] When the airflow acts on the flexible cloth 711 through the air holes 5111 on the column 51 , the pressure relief holes 713 allow the airflow to be discharged in time, preventing the flexible cloth 711 from bulging due to air pressure and affecting the pressure of the polishing disc 71 on the first polishing layer 712 .

[0065] See also Figures 5 to 9 As shown, the polishing disc 71 has a ring sleeve 721 sleeved on the column 51 , and a plurality of balls 7211 are arranged on the ring sleeve 721 around its circumference and in rolling contact with the column 51 .

[0066] When the polishing disc 71 starts to move downward, the ring sleeve 721 moves downward with the polishing disc 71. Due to the existence of the ball 7211, the relative movement between the ring sleeve 721 and the column 51 is transformed from sliding friction to rolling friction, which reduces the friction resistance, making the polishing disc 71 move downward more smoothly and improving the position accuracy of the polishing disc 71 during the downward movement.

[0067] See also Figures 5 to 9 As shown, a return spring 7212 is provided between the ring sleeve 721 and the lower pressure frame body 5, and the linear drive 72 has a fixed electromagnet 722 arranged on the lower pressure frame body 5 and a movable electromagnet 723 arranged on the polishing disk 71. The movable electromagnet 723 can move relative to the fixed electromagnet 722. When the movable electromagnet 723 moves away from the fixed electromagnet 722, the polishing disk 71 gradually moves downward relative to the lower pressure frame body 5, and the return spring 7212 is in a stretched state.

[0068] Since both the fixed electromagnet 722 and the movable electromagnet 723 are electromagnets, when the linear drive 72 is started, the fixed electromagnet 722 and the movable electromagnet 723 are energized at the same time, so that a mutual repulsive force is generated between the two. Due to the magnetic force, the polishing disc 71 begins to gradually move downward relative to the lower pressing frame 5.

[0069] As the polishing disc 71 moves downward, the ring sleeve 721 also moves downward. The reset spring 7212 is gradually stretched. By changing the direction of the current so that the fixed electromagnet 722 and the movable electromagnet 723 generate mutual attraction, the reset spring 7212 gradually returns to its original state, so that the polishing disc 71 moves upward, and the contact position between the polishing block 61 and the step surface 12 of the ceramic valve plate 1 is adjusted. The reset spring 7212 plays an auxiliary support and reset effect.

[0070] See also Figures 4 to 12 As shown, the linkage member 8 is specifically a connecting rod, one end of which is hinged to the polishing disc 71, and the other end of which is hinged to the polishing block 61. Both the polishing disc 71 and the polishing block 61 have a hinged portion hinged to the connecting rod.

[0071] When the polishing disc 71 moves upward or downward, the connecting rod drives the polishing block 61 to move together. The hinge structure enables the polishing block 61 to follow the movement trajectory of the polishing disc 71 to adjust, ensuring that the relative positions between the two are always coordinated. Therefore, the polishing block 61 and the polishing disc 71 are not affected by each other, ensuring the high-quality polishing effect of the upper end surface 11 and the step surface 12.

[0072] See also Figure 5 , Figure 6 , Figure 8 and Fig. 9 As shown, each of the slide rails 62 is provided with a stopper 63 for limiting the outward movement distance of the polishing block 61. When the polishing block 61 contacts the stopper 63, the lower end surface of the polishing disc 71 is flush with the lower end surface of the cylinder 51, so that the first polishing layer 712 on the flexible cloth 711 is flatly squeezed onto the upper end surface 11.

[0073] The stopper 63 limits the outward movement distance of the polishing block 61, ensuring that when the polishing block 61 contacts the stopper 63, the polishing disc 71 and the lower end surface of the column 51 can be precisely aligned, thereby achieving flat extrusion of the flexible cloth 711. Thus, the first polishing layer 712 applies uniform pressure to the upper end surface 11, avoiding the defect of poor polishing effect caused by uneven pressure.

[0074] The present invention drives the ceramic valve disc 1 to rotate by the fixture 3, and combines the alternating actions of the polishing disc 71 and the polishing block 61 to achieve comprehensive and fine polishing of the upper end surface 11 and the step surface 12. During the polishing process, the column 51 provides a stable pressure for the ceramic valve disc 1 to ensure that it remains stable during rotation. The first polishing layer 712 is always in a properly tensioned state to prevent displacement or wrinkles, thereby ensuring that the first polishing layer 712 is fully in contact with the upper end surface 11 and avoiding uneven polishing.

[0075] When the polishing disc 71 moves upward away from the upper end surface 11, the linkage 8 drives the polishing block 61 to move inward synchronously, gradually approaching and contacting the step surface 12. On the contrary, when the polishing disc 71 moves downward close to the upper end surface 11, the polishing block 61 moves outward synchronously. This ensures that the movements of the polishing disc 71 and the polishing block 61 do not affect each other, so that the upper end surface 11 and the step surface 12 can be fully polished.

[0076] The above embodiments only express one or several implementation modes of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the protection scope of the present invention. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the attached claims.

Claims

1. A ceramic valve plate polishing machine, used for polishing an upper end surface (11) and a step surface (12) of a ceramic valve plate (1), comprising a bracket (2), a clamp (3) rotatably arranged on the bracket (2) for clamping the ceramic valve plate (1), and a rotary driver arranged on the bracket (2) for driving the clamp (3) to rotate; It is characterized in that It also includes a polishing mechanism (4) arranged directly above the clamp (3), and the polishing mechanism (4) includes: Pressing down the frame (5); a side pressure component (6) disposed on the lower pressure frame (5) for contacting the step surface (12); and a pressing component (7) disposed on the lower pressure frame (5) for contacting the upper end surface (11); The bracket (2) is provided with a downward pressing driver for driving the downward pressing frame (5) to move in a direction perpendicular to the upper end surface (11); The side pressure assembly (6) comprises a polishing block (61) capable of sliding horizontally on the lower pressure frame (5), and the lower pressure frame (5) is provided with a slide rail (62) for the polishing block (61) to slide; The pressing assembly (7) has a polishing disc (71) capable of vertically sliding on the lower pressing frame (5), and the lower pressing frame (5) is provided with a linear drive (72) for driving the polishing disc (71) to slide; A linkage member (8) is provided between the polishing block (61) and the polishing disc (71); when the polishing disc (71) moves upward and gradually moves away from the upper end surface (11), the polishing disc (71) drives the polishing block (61) to move inward synchronously through the linkage member (8) and gradually approaches the step surface (12); and when the polishing disc (71) moves downward and gradually approaches the upper end surface (11), the polishing disc (71) drives the polishing block (61) to move outward synchronously through the linkage member (8) and gradually moves away from the step surface (12); A column (51) extending downward for pressing the upper end surface (11) is fixedly provided at the center of the lower pressing frame (5), the column (51) being coaxial with the clamp (3), the lower end surface of the column (51) being a plane, a flexible cloth (711) fitting with the lower end surface of the column (51) and capable of covering the upper end surface (11) is fixedly provided on the polishing disc (71), a first polishing layer (712) is provided on the flexible cloth (711), and when the first polishing layer (712) is pressed onto the upper end surface (11) by the polishing disc (71), the first polishing layer (712) and the upper end surface (11) are in a flat state of full contact; A plurality of polishing blocks (61) are evenly arranged on the lower pressure frame body (5) in a circumferential direction around the column (51), a linkage member (8) is arranged between each polishing block (61) and the polishing disc (71), the inner side of each polishing block (61) has an arc surface that can adapt to the step surface (12), and the arc surface is provided with a second polishing layer (611), and when the polishing disc (71) moves upward, all the polishing blocks (61) are in a state of synchronously moving inward, so that all the second polishing layers (611) are synchronously and tightly contacted with the step surface (12); The column (51) has a chamber (511) with an open top, a sealing ring (512) sleeved on a pressure rod (52) is fixedly provided at the open top of the column (51), the column (51) has an air hole (5111) communicating with the chamber (511) and tilted downward from the inside to the outside, the pressure rod (52) has an air passage (521) capable of passing an air source into the chamber (511), when the polishing disc (71) gradually moves downward, air flow is ejected from the air hole (5111), and the air flow acts on the flexible cloth (711) so that the flexible cloth (711) is in a flat state; The linkage member (8) is specifically a connecting rod, one end of which is hinged to the polishing disc (71) and the other end of which is hinged to the polishing block (61), and both the polishing disc (71) and the polishing block (61) have a hinged portion hinged to the connecting rod.

2. A ceramic valve plate polishing machine according to claim 1, characterized in that: A pressure rod (52) is provided on the down-pressing frame (5) and is coaxial with the column (51) and fixedly connected to the driving end of the down-pressing driver. A buffer spring (53) is connected between the pressure rod (52) and the column (51).

3. A ceramic valve plate polishing machine according to claim 2, characterized in that: The column (51) is provided with a plurality of air holes (5111) around its circumference, and the polishing disc (71) is provided with a pressure relief hole (713) capable of preventing airflow from accumulating between the polishing disc (71) and the flexible cloth (711) and causing the flexible cloth (711) to bulge; when the airflow acts on the flexible cloth (711) through the air holes (5111), the airflow is discharged from the pressure relief hole (713), so that the flexible cloth (711) is in a flat state when being squeezed by the polishing disc (71).

4. A ceramic valve plate polishing machine according to claim 3, characterized in that: The polishing disc (71) comprises a ring sleeve (721) sleeved on the column (51), wherein a plurality of balls (7211) are arranged on the ring sleeve (721) around its circumference and in rolling contact with the column (51).

5. A ceramic valve plate polishing machine according to claim 4, characterized in that: A return spring (7212) is provided between the annular sleeve (721) and the lower pressure frame (5). The linear drive (72) comprises a fixed electromagnet (722) arranged on the lower pressure frame (5) and a movable electromagnet (723) arranged on the polishing disc (71). The movable electromagnet (723) is movable relative to the fixed electromagnet (722). When the movable electromagnet (723) moves away from the fixed electromagnet (722), the polishing disc (71) gradually moves downward relative to the lower pressure frame (5). At this time, the return spring (7212) is in a stretched state.

6. A ceramic valve plate polishing machine according to claim 5, characterized in that: Each of the slide rails (62) is provided with a stopper (63) for limiting the outward movement distance of the polishing block (61); when the polishing block (61) contacts the stopper (63), the lower end surface of the polishing plate (71) is flush with the lower end surface of the column (51), so that the first polishing layer (712) on the flexible cloth (711) is flatly pressed onto the upper end surface (11).

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