A method and device for adjusting a resonant cavity of a plasma source, and a resonant cavity

Abstract

The application provides a kind of plasma source resonant cavity adjusting method, device and resonant cavity, it is related to resonant cavity technical field, its technical solution main point is: obtain the shape information and depth information of adjusting column in plasma source resonant cavity;According to task type, the shape information and depth information of adjusting column are adjusted, to obtain corresponding reflected power data under different shape information and depth information;Obtain the shape information and depth information corresponding to the minimum value or less than target value when reflected power;According to the shape information and depth information corresponding to the minimum value or less than target value when reflected power and task type, generate associated data group;When detecting that new task type exists corresponding associated data group, according to the shape information and depth information in corresponding associated data group, adjusting column in plasma source resonant cavity is adjusted.The application provides a kind of plasma source resonant cavity adjusting method, device and resonant cavity have the advantage of improving use efficiency.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of resonant cavity, in particular to a resonant cavity adjusting method and device for a plasma source and a resonant cavity. BACKGROUND

[0002] A gas state can become a plasma state by receiving enough energy. Plasma is a system composed of charged particles (including ions, electrons, and ion groups) and neutral particles. In common parlance, plasma is a special ionized gas that has plasma characteristics only when it has sufficient ionization.

[0003] A remote plasma source (RPS for short) is an advanced plasma generation device. The basic principle of the remote plasma source is to use radio frequency or microwave electromagnetic waves to generate high-frequency electric fields in a cavity. These high-frequency electric fields ionize gas molecules to form plasma composed of positively charged ions and negatively charged electrons. Because there is a separation barrier between the plasma and the cavity, the plasma can be transported to the target area without directly contacting the processing surface, achieving remote processing.

[0004] In a remote plasma source device, the introduction of a resonant cavity (a closed or semi-closed electromagnetic wave cavity capable of generating resonance) is of great significance. The resonant cavity can solve the problem of energy loss. In a remote plasma source device, energy loss often occurs during the transmission of electromagnetic waves or light waves. The resonant cavity can reduce this loss by multiple reflections and energy accumulation, ensuring that more energy is used for plasma generation, thereby improving the overall efficiency of the device. The resonant cavity can also solve the problem of unstable frequency. External electromagnetic interference may affect the remote plasma source device during use, causing the plasma frequency to be unstable. The selective enhancement and suppression characteristics of the resonant cavity help reduce this interference and maintain the stability of the plasma frequency. The resonant cavity can also solve the problem of inconsistent plasma quality. Different working environments and operating conditions may cause inconsistent plasma quality. By optimizing the parameter settings of the resonant cavity, precise control of the plasma generation process can be achieved, thereby improving the quality and consistency of the plasma.

[0005] In summary, the resonant cavity not only enhances and focuses energy, selectively enhances or suppresses electromagnetic waves of a specific frequency, and improves plasma quality, but also effectively solves problems such as energy loss, frequency instability, and inconsistent plasma quality encountered during device use.

[0006] Therefore, it is crucial to properly select and configure the resonant cavity when designing and manufacturing remote plasma source equipment. The design of a resonant cavity in a remote plasma source equipment is a complex and delicate process that involves multiple considerations, including the shape, size, material selection, and excitation and coupling methods of the resonant cavity. In the actual use of existing remote plasma source related equipment, most resonant cavities are designed as cavities with specific mechanical structures (such as circular, spherical, circular ring, rectangular, etc.). However, these resonant cavities may only have good resonance effects for a certain type of electromagnetic wave, and poor resonance effects for other types of electromagnetic wave. Therefore, when facing different work tasks, different resonant cavities often need to be replaced, and the resonant cavities also need to be re-adjusted, and the adjustment process is highly dependent on human experience, which can make the overall work task efficiency low, and the intelligence and adaptability poor.

[0007] To solve the above problems, a new scheme is provided in the present application. SUMMARY

[0008] The present application aims to provide a plasma source resonant cavity adjustment method and device, and a resonant cavity, which has the advantage of improving the use efficiency.

[0009] In a first aspect, the present application provides a plasma source resonant cavity adjustment method, and the technical solution is as follows:

[0010] Obtain the shape information and depth information of the adjustment column in the plasma source resonant cavity;

[0011] According to the task type, adjust the shape information and depth information of the adjustment column to obtain the corresponding reflected power data under different shape information and depth information;

[0012] Obtain the shape information and depth information corresponding to the minimum reflected power or less than the target value;

[0013] According to the shape information and depth information corresponding to the minimum reflected power or less than the target value and the task type, generate an associated data set;

[0014] When a new task type is detected to have a corresponding associated data set, adjust the adjustment column in the plasma source resonant cavity according to the shape information and depth information in the corresponding associated data set.

[0015] Further, in the present application, the step of obtaining the shape information and depth information of the adjustment column in the plasma source resonant cavity comprises:

[0016] obtaining a basic shape of one or more of the adjusting columns in the plasma source resonant cavity, the basic shape including one or more of an inner-embedded nested triangle, rectangle, and circle;

[0017] obtaining initial adjustment information of each of the adjusting columns;

[0018] obtaining the depth information corresponding to each of the shapes in each of the adjusting columns according to the initial adjustment information;

[0019] obtaining the shape information of each of the adjusting columns according to the depth information corresponding to each of the shapes in each of the adjusting columns.

[0020] Further, in the present application, the step of adjusting the shape information and the depth information of the adjusting columns comprises:

[0021] coarsely adjusting the shape information and the depth information of the adjusting columns to generate plasma in the plasma source resonant cavity;

[0022] after generating plasma in the plasma source resonant cavity, finely adjusting the shape information and the depth information of the adjusting columns.

[0023] Further, in the present application, the step of generating an associated data set according to the shape information and the depth information corresponding to the minimum or smaller than the target value of the reflected power and the task type comprises:

[0024] selecting three groups of minimum data as target data from a plurality of groups of the reflected power in sequence;

[0025] generating the associated data set according to the shape information and the depth information corresponding to the target data and the task type.

[0026] Further, in the present application, the step of adjusting the adjusting columns in the plasma source resonant cavity according to the shape information and the depth information corresponding to the associated data set comprises:

[0027] adjusting the adjusting columns in the plasma source resonant cavity according to the shape information and the depth information corresponding to the first smallest target data in the associated data set;

[0028] judging whether the ionization effect in the plasma source resonant cavity meets the requirements;

[0029] if not, adjusting the adjusting columns in the plasma source resonant cavity according to the shape information and the depth information corresponding to the second smallest target data in the associated data set.

[0030] determining whether the ionization effect in the plasma source resonant cavity meets the requirement;

[0031] if the requirement is not met, adjusting the adjusting column in the plasma source resonant cavity according to the third smallest target data corresponding to the shape information and the depth information in the associated data set;

[0032] determining whether the ionization effect in the plasma source resonant cavity meets the requirement;

[0033] if the requirement is not met, adjusting the adjusting column according to the best ionization effect in the three groups of schemes.

[0034] Further, in the present application, the method further comprises:

[0035] when it is detected that there is no corresponding associated data set for the new task type, generating a new associated data set for the new task type according to the shape information and the depth information corresponding to the minimum reflected power after the adjustment test or less than the target value.

[0036] Further, in the present application, the task type includes work parameter information, and the method further comprises:

[0037] when it is detected that there is no corresponding associated data set for the new task type, finding the associated data set closest to the work parameter in the new task type from the associated data set according to the work parameter in the new task type;

[0038] generating a recommended adjustment parameter for the new task type according to the closest associated data set, the recommended adjustment parameter including parameters for adjusting the shape information and the depth information of the adjusting column.

[0039] In a second aspect, the present application further provides a plasma source resonant cavity adjusting device, comprising:

[0040] a first acquisition module, configured to acquire shape information and depth information of an adjusting column in a plasma source resonant cavity;

[0041] a first adjustment module, configured to adjust the shape information and the depth information of the adjusting column according to a task type, so as to obtain corresponding reflected power data under different shape information and depth information;

[0042] a second acquisition module, configured to acquire the shape information and the depth information corresponding to the minimum reflected power or less than the target value;

[0043] generating a correlation data set according to the shape information and the depth information corresponding to the minimum value or the reflected power less than the target value and the task type;

[0044] a second adjusting module, configured to adjust the adjusting column in the plasma source resonant cavity according to the shape information and the depth information in the correlation data set corresponding to the new task type.

[0045] In a third aspect, the present application further provides a plasma source resonant cavity, comprising a resonant cavity, and further comprising:

[0046] an adjusting device in communication with the resonant cavity, comprising one or more adjusting columns, and a plurality of shape members are embedded in the adjusting columns in a nested manner, and the shape members have shapes of at least one or more of a triangle, a rectangle and a circle;

[0047] a piezoelectric control device connected with the adjusting column, configured to control the extension position of each shape member in the adjusting column in the resonant cavity.

[0048] Further, the present application further comprises:

[0049] a data recording device, configured to record and store the adjusting information of the piezoelectric control device to the adjusting column.

[0050] As can be seen, the present application provides a plasma source resonant cavity adjusting method, device and plasma source resonant cavity, the shape information and the depth information of the adjusting column in the plasma source resonant cavity are acquired, the adjusting column is adjusted according to the task type, the correlation data set is generated, and the adjusting column is adjusted according to the correlation data set, so that the intelligent adjustment of the plasma source resonant cavity is realized, the flexibility and efficiency of the plasma source resonant cavity adjustment are improved, the different work task requirements are met, and the use efficiency is improved. BRIEF DESCRIPTION OF DRAWINGS

[0051] Figure 1 A plasma source resonant cavity adjusting method flow chart is provided in the present application.

[0052] Figure 2 A structure schematic diagram of a plasma source resonant cavity adjusting device is provided in the present application.

[0053] Figure 3 A structure schematic diagram of a plasma source resonant cavity is provided in the present application.

[0054] Figure 4 A structure schematic diagram of one of the shape members is provided in the present application.

[0055] Figure 5A structural schematic diagram of one of the shape members provided in the present application.

[0056] Figure 6 A structural schematic diagram of one of the shape members provided in the present application.

[0057] Figure 7 A structural schematic diagram of one of the shape members provided in the present application.

[0058] Figure 8 A physical diagram of a plasma source resonant cavity provided in the present application.

[0059] In the figure: 210, a first acquisition module; 220, a first adjustment module; 230, a second acquisition module; 240, a generation module; 250, a second adjustment module; 300, a resonant cavity; 400, an adjustment column; 500, a piezoelectric driving device; 600, a power supply; 700, an input power controller and a reflected power receiver; 800, a data recording device; 900, an RPS cavity; 1000, an observation window; 410, a shape member. DETAILED DESCRIPTION

[0060] The technical solutions in the present application will be described clearly and completely below in combination with the drawings in the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. The components of the present application described and shown in the drawings herein can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the claimed present application, but only represents selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0061] It should be noted that: similar reference numerals and letters represent similar items in the following drawings, therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. Meanwhile, in the description of the present application, the terms “first”, “second”, etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0062] Please refer to Figure 1 The present application provides a plasma source resonant cavity adjustment method, and the technical solutions are as follows:

[0063] S110, acquiring shape information and depth information of an adjustment column in a plasma source resonant cavity;

[0064] S120, according to the task type, adjusting the shape information and the depth information of the adjustment column, to obtain corresponding reflected power data under different shape information and depth information;

[0065] S130, acquiring shape information and depth information corresponding to when the reflected power is minimum or less than the target value;

[0066] S140, generating an associated data set according to the shape information and depth information corresponding to when the reflected power is minimum or less than the target value and the task type;

[0067] S150, when a new task type is detected to have a corresponding associated data set, adjusting the adjusting column in the plasma source resonant cavity according to the shape information and depth information in the corresponding associated data set.

[0068] The core innovation of the present application is to propose a plasma source resonant cavity adjustment method based on an associated data set. By establishing a mapping relationship between the task type and the optimal adjustment parameter, the plasma source resonant cavity (hereinafter referred to as the resonant cavity) is quickly and accurately adjusted under different working conditions, and the intelligent level and adaptability of the adjustment are significantly improved.

[0069] Specifically, in the resonant cavity, the adjusting column can adjust its shape information and depth information, thereby producing different effects on the resonant cavity.

[0070] According to different task types, the shape information and depth information of the adjusting column are systematically adjusted. By changing the shape information and depth information, the internal structure of the resonant cavity can be dynamically changed. Under different configurations of shape information and depth information, the corresponding reflected power data is measured and recorded. The purpose is to comprehensively evaluate the performance of the resonant cavity under different structural configurations for different task types. Different task types usually correspond to different working parameters, such as power input power and gas flow parameters. These different working parameters will be affected by the different shape structures in the resonant cavity.

[0071] By selecting the configuration with the minimum reflected power or lower than the preset target value, an associated data set is generated based on these optimal configurations and corresponding task types. Each associated data set contains the best shape information and depth information under a specific task type.

[0072] Therefore, when a new task type is encountered, the system first checks whether there is a matching associated data set. If there is, the shape and depth information recorded in the associated data set can be used to accurately adjust the adjusting column through the driving device, and the optimal configuration of the resonant cavity can be quickly achieved.

[0073] In some embodiments, a database of different sets of correlation data can be obtained by testing different task types in advance. When a new task type is encountered, if a corresponding set of correlation data is found in the database, the shape information and depth information of the corresponding adjustment column in the set of correlation data can be directly called.

[0074] Specifically, the step of obtaining the shape information and depth information of the adjustment column in the plasma source resonant cavity includes:

[0075] Obtaining the basic shape of one or more adjustment columns in the plasma source resonant cavity, the basic shape including at least one or more of an inlaid nested triangle, rectangle, and circle;

[0076] Obtaining initial adjustment information of each adjustment column;

[0077] Obtaining depth information corresponding to each shape inlaid in each adjustment column according to the initial adjustment information;

[0078] Obtaining shape information of each adjustment column according to the depth information corresponding to each shape inlaid in each adjustment column.

[0079] The basic shape of the adjustment column refers to the inlaid nested multiple basic shapes of the adjustment column. Specifically, the adjustment column includes multiple inlaid nested shape members, and different shape members have different shapes, including triangle, rectangle, and circle, etc.

[0080] Specifically, in some embodiments, the overall structure of the adjustment column is a columnar structure, and the inside is a hollow structure. Inside the hollow structure, there are multiple shape members with different shapes that can be extended and retracted. Different shape members can be individually driven to extend and retract, thereby extending different distances in the resonant cavity.

[0081] This design allows the adjustment column to have a more complex and flexible geometric structure. By obtaining the basic shape and initial adjustment information of the adjustment column, the structural characteristics of the adjustment column can be accurately determined. The specific implementation can be carried out in the following way:

[0082] First, obtain the basic shape of the adjustment column. These shapes can be triangles, rectangles, or circles, and are combined in an inlaid nested manner. For example, an adjustment column can contain an inlaid triangular member, outside which is a rectangular member, and outside which is a circular member. The nesting depth and position of each shape member can be accurately controlled through initial adjustment information.

[0083] Second, obtain the initial adjustment information of each adjustment column. These information can include various parameters such as the relative position, nesting depth, and extension degree of the shape members. Through these initial information, the specific depth information of each inlaid shape can be accurately calculated.

[0084] In practical applications, the shape information and depth information of the adjustment column can be adjusted according to different task types. For example, the internal shape structure of the resonant cavity can be adjusted by adjusting the depth of different shape components.

[0085] Through the design of multiple shapes of nested embedding, more flexible and fine adjustment can be achieved, so as to better adapt to different working tasks and conditions.

[0086] Further, in some embodiments, the step of adjusting the shape information and depth information of the adjustment column comprises:

[0087] Coarse adjustment of the shape information and depth information of the adjustment column to generate plasma in the plasma source resonant cavity;

[0088] After generating plasma in the plasma source resonant cavity, fine adjustment of the shape information and depth information of the adjustment column.

[0089] In specific implementation, the coarse adjustment step can be realized by quickly adjusting the basic parameters of the adjustment column. The goal of this step is to quickly establish plasma and lay the foundation for subsequent fine adjustment. For example, the initial position and depth of the triangular, rectangular or circular components embedded in the adjustment column can be selected to generate basic plasma.

[0090] Specifically, coarse adjustment can be achieved by manually adjusting the knob, and fine adjustment can be achieved by a piezoelectric power device, which can specifically include a motor, a piezoelectric drive sensor, etc.

[0091] The fine adjustment step further adjusts the shape information and depth information of the adjustment column on the basis of the coarse adjustment. This step realizes the accurate adjustment of the adjustment column by obtaining the reflected power data, selecting the parameter combination with the minimum reflected power or less than the preset target value, and adjusting the shape information and depth information corresponding to the data step by step.

[0092] Through this step-by-step adjustment method, the complexity problem of adjusting the parameters of the adjustment column in the resonant cavity can be effectively solved. The coarse adjustment step quickly establishes plasma, and the fine adjustment step further optimizes the quality and stability of the plasma. This method not only improves the accuracy of adjustment, but also enhances the flexibility and adaptability of the adjustment process.

[0093] Further, in some embodiments, the step of generating the associated data set according to the shape information and depth information corresponding to the minimum value or less than the target value of the reflected power and the task type comprises:

[0094] Select the three smallest groups of data from the multiple groups of reflected power as target data in sequence;

[0095] Generate associated data groups by associating the shape information and depth information corresponding to the target data with the task type.

[0096] In specific implementations, the technical features of this scheme can be implemented in the following way: First, select the three smallest groups of data from the multiple groups of reflected power data.

[0097] In some other embodiments, this selection process is not simply taking the minimum value, but considering the size and trend of the reflected power. For each group of data, not only the value of the reflected power is concerned, but also the corresponding adjustment column shape information and depth information are analyzed. For example, a scoring mechanism can be established to comprehensively evaluate the reflected power size, data stability, and matching degree with the task type.

[0098] In some other embodiments, the required multiple groups of data can also be selected as needed, not limited to three groups of data.

[0099] In the data association generation process, different task types correspond to different optimal adjustment parameters, i.e., shape information and depth information. By associating the selected three groups of target data with their corresponding shape information, depth information, and task type, a multi-dimensional data group can be constructed. When the system encounters a new task type, it can quickly select the most suitable adjustment parameters from the existing associated data groups.

[0100] In practical applications, this method can significantly improve the adjustment accuracy and efficiency of the plasma source resonant cavity. By selecting the three smallest groups of reflected power data, the system can obtain more comprehensive and reliable adjustment references. When the first group of parameters cannot meet the requirements, it can quickly switch to the adjustment parameters corresponding to the second or third group of data, greatly reducing the debugging time and manual intervention.

[0101] Specifically, the step of adjusting the adjustment column in the plasma source resonant cavity according to the shape information and depth information in the corresponding associated data group includes:

[0102] Selecting the shape information and depth information corresponding to the first smallest target data from the associated data group to adjust the adjustment column in the plasma source resonant cavity;

[0103] Judging whether the ionization effect in the plasma source resonant cavity meets the requirements;

[0104] If not, select the shape information and depth information corresponding to the second smallest target data from the associated data group to adjust the adjustment column in the plasma source resonant cavity;

[0105] determine whether the ionization effect in the plasma source resonant cavity meets the requirements;

[0106] If the requirements are not met, adjust the adjustment column in the plasma source resonant cavity with the shape information and depth information corresponding to the third smallest target data pair selected from the associated data group;

[0107] determine whether the ionization effect in the plasma source resonant cavity meets the requirements;

[0108] If the requirements are not met, adjust the adjustment column with the best ionization effect from the three groups of schemes.

[0109] First, select target data from the associated data group, which contains reflection power data under different shape and depth information, in order to find the optimal adjustment parameters. Second, use a progressive adjustment strategy, first try the adjustment scheme corresponding to the first smallest target data, if the ionization effect does not meet the requirements, try the adjustment scheme corresponding to the second smallest and third smallest target data in turn. Finally, if three adjustments cannot meet the ionization effect requirements, select the best scheme from the three groups of schemes that have been tried.

[0110] This multiple attempt and step-by-step optimization adjustment method has the characteristics of self-adaptation and intelligence, and can accurately adjust the adjustment column in the plasma source resonant cavity under different task types, ensuring that the ionization effect of the plasma can meet the requirements of specific tasks. This method overcomes the limitations of traditional reliance on manual experience, improving the adjustment efficiency and adaptability of the plasma source resonant cavity.

[0111] In the specific implementation process, the technical solution of the present application can have multiple implementation ways. For example, regarding the selection of target data from the associated data group, different data sorting and filtering algorithms can be used, such as sorting based on reflection power size, sorting based on ionization effect, etc. For the progressive adjustment strategy, the number of attempts can be adjusted according to actual needs, such as increasing to four or five attempts. When determining whether the ionization effect meets the requirements, multiple evaluation indicators can be set, such as ionization degree, plasma density, uniformity, etc.

[0112] The technical solution of the present application compared with the prior art mainly embodies the following aspects of innovation: First, by establishing an associated data group, the shape information and depth information of the adjustment column are associated with specific task types, laying the foundation for subsequent intelligent adjustment. Second, using a progressive adjustment strategy not only improves the adjustment efficiency, but also can reduce the number of adjustments as much as possible while ensuring the ionization effect. Finally, by multiple attempts and comparison, the best scheme is selected, which can adapt to different task requirements, improving the adaptability and flexibility of the plasma source resonant cavity.

[0113] In practical applications, the technical solution of the present application can be implemented as follows: assuming that there is a resonant cavity containing an adjustable adjusting column. According to previous experimental data, a correlation data set is established, which contains reflection power data under different shape and depth information. When a new task needs to be performed, the system first selects three groups of data with the smallest reflection power from the correlation data set.

[0114] Firstly, the system adjusts the adjusting column to the shape and depth corresponding to the first small reflection power. Assuming that the parameters are: conical shape, depth of 10 mm. The system starts the plasma and measures the ionization effect. If the ionization effect does not meet the requirements, the system will perform the second adjustment.

[0115] The second adjustment uses the parameters corresponding to the second small reflection power, assuming that: stepped shape, depth of 12 mm. The ionization effect is measured again, and if it still does not meet the requirements, the system will perform the third adjustment.

[0116] The third adjustment uses the parameters corresponding to the third small reflection power, assuming that: conical shape, depth of 11 mm. If the ionization effect still does not meet the requirements after this adjustment, the system will compare the results of the three adjustments and select the best one. Assuming that the second adjustment is the best, the system will finally set the adjusting column to the stepped shape with a depth of 12 mm.

[0117] Through this method, the system can quickly find the best adjustment parameters under different task types, greatly improving the adjustment efficiency and accuracy. At the same time, this method also reduces the dependence on human experience, improves the automation level and intelligent degree of the system.

[0118] In addition, in some preferred embodiments, when a new task type exists corresponding correlation data set, but after adjusting the adjusting column using the shape information and depth information in the corresponding correlation data set, if the adjusted effect does not meet the expectations, at this time, the task type of the correlation data set is marked, that is, the first mark, after adjusting the adjusting column corresponding to other task types corresponding to the first mark, a newly added correlation data set with a second mark is generated, at the same time, record which one of the different correlation data sets corresponding to the task type has the highest applicability, when the subsequent newly added task type is this task type, preferentially use the correlation data set with the highest applicability for adjustment.

[0119] For example, a task type a has a correlation data set A;

[0120] When a new task type appears, if the task type is also a, the associated data set A is used for adjustment. However, if the effect is not as expected after adjustment, the shape information and the depth information need to be re-adjusted, and a new associated data set B is obtained. In this case, A has a first mark, and B has a second mark, that is, the same task type a corresponds to the associated data set A and the associated data set B. In this case, a state of counting the associated data sets with the first mark and the second mark is entered, that is, the applicability of A and B is counted to determine which associated data set has the highest applicability. Specifically, when the newly added task type is a, the associated data set A and the associated data set B are used for adjustment in turn to determine which associated data set can make the effect of the task type a as expected. If it is A, the count of A is increased by one, and if it is B, the count of B is increased by one. For example, when the count of A is 1 and the count of B is 2, if the newly added task type is a again, the associated data set B is used for adjustment in priority.

[0121] In addition, if the effect cannot be achieved by adjustment according to the associated data set A and the associated data set B, the associated data set C is newly added, and the priority adjustment of the associated data set is sequentially used.

[0122] Further, in some embodiments, the method further comprises:

[0123] When it is detected that there is no corresponding associated data set for the new task type, a new associated data set is generated according to the shape information and the depth information corresponding to the minimum value or less than the target value of the reflected power after the adjustment test.

[0124] First, it is detected whether there is a corresponding associated data set for the new task type. If not, the adjustment test is performed to obtain the shape information and the depth information when the minimum value or less than the target value of the reflected power. Then, the information is bound with the new task type to generate a new associated data set.

[0125] In a specific implementation, the adjustment test can be divided into two stages of coarse adjustment and fine adjustment. In the coarse adjustment stage, the plasma is first generated in the plasma source resonant cavity. In the fine adjustment stage, the shape information and the depth information of the adjustment column are finely adjusted. Through multiple tests, three groups of data with the minimum reflected power are selected as target data, and the associated data set is generated according to the target data.

[0126] The method has the advantages of adaptively processing new task types. When a task type without preset data is encountered, the system can quickly generate corresponding adjustment reference data through actual testing. This method not only improves the flexibility of the system, but also reduces the need for manual intervention, making the resonant cavity adjustment process more intelligent.

[0127] Further, in some embodiments, the task type includes work parameter information, and the method further comprises:

[0128] When it is detected that there is no corresponding associated data set for the new task type, the associated data set closest to the work parameters in the new task type is searched from the associated data set according to the work parameters in the new task type;

[0129] The recommended adjustment parameters for the new task type are generated according to the closest associated data set, and the recommended adjustment parameters include parameters for adjusting the shape information and depth information of the adjustment column.

[0130] In searching for the closest associated data set, various parameter matching strategies can be used. For example, the Euclidean distance, cosine similarity or other similarity indicators between work parameters can be calculated. For multi-dimensional work parameters, weighted processing can be performed to give different importance weights to different parameters. In this way, the most similar data set can be found more accurately.

[0131] Based on the closest associated data set, the method of the present application will generate recommended adjustment parameters for the new task type. The recommended adjustment parameters include adjustment suggestions for the shape information and depth information of the adjustment column. Since the recommended adjustment parameters are generated based on the most similar historical data set, the recommended adjustment parameters have high reliability and reference value.

[0132] In practical applications, the method can significantly improve the efficiency of the resonant cavity adjustment of the plasma source. By using existing experience data, the tedious process of adjusting from scratch for each new task type is avoided. At the same time, through intelligent matching and parameter recommendation, a preliminary feasible adjustment scheme can be quickly obtained, greatly shortening the debugging time.

[0133] Compared with the traditional experience-based adjustment method, the method of the present application has stronger intelligence and adaptability. It no longer relies on the personal experience of the operator, but uses historical data in a data-driven manner to systematically recommend and adjust parameters.

[0134] In a second aspect, with reference to Figure 2 The present application also proposes a resonant cavity adjustment device for a plasma source, comprising:

[0135] The first acquisition module 210 is configured to acquire the shape information and depth information of the adjustment column in the resonant cavity of the plasma source.

[0136] The first adjusting module 220 is configured to adjust the shape information and the depth information of the adjusting column according to the task type, so as to obtain corresponding reflection power data under different shape information and depth information.

[0137] The second obtaining module 230 is configured to obtain the shape information and the depth information corresponding to the minimum reflection power or the reflection power less than the target value.

[0138] The generating module 240 is configured to generate an associated data group according to the shape information and the depth information corresponding to the minimum reflection power or the reflection power less than the target value and the task type.

[0139] The second adjusting module 250 is configured to adjust the adjusting column in the plasma source resonant cavity according to the shape information and the depth information in the corresponding associated data group when a new task type is detected to have the corresponding associated data group.

[0140] By obtaining the shape information and the depth information of the adjusting column in the plasma source resonant cavity, adjusting according to the task type, generating an associated data group, and adjusting the adjusting column according to the associated data group, the intelligent adjustment of the plasma source resonant cavity is realized, the flexibility and efficiency of the adjustment of the plasma source resonant cavity are improved, different working task requirements are met, and the use efficiency is improved.

[0141] In addition, in some preferred embodiments, the plasma source resonant cavity adjusting device provided in the application can perform any one step in the above scheme.

[0142] In a third aspect, referring to Figures 3 to 8 The application further provides a plasma source resonant cavity, which comprises a resonant cavity 300 and further comprises:

[0143] The adjusting device is in communication with the resonant cavity 300 and comprises one or more adjusting columns 400, and a plurality of shape members 410 are embedded in the adjusting column 400 in a nested manner, and the shape of the shape member 410 at least comprises one or more of a triangle, a rectangle, and a circle.

[0144] The piezoelectric control device 500 is connected with the adjusting column 400 and is configured to control the extension position of each shape member 410 in the adjusting column 400 in the resonant cavity 300.

[0145] The resonant cavity 300 proposed in this application is adjusted by using an adjustable adjusting column 400 composed of shape members 410 with multiple shapes, achieving flexible adjustment of the structure of the resonant cavity 300. The combination of shape members 410 with different shapes and depths can adapt to different work tasks, significantly improving the adaptability of the resonant cavity 300. The piezoelectric control device 500 can accurately control the position of the shape member 410, so that the resonant cavity 300 can quickly and accurately optimize the structure for different working environments, overcoming the limitations of traditional resonant cavities 300 that require equipment replacement or rely on manual experience for debugging.

[0146] In the plasma source resonant cavity 300 of the present application, the design of the adjusting device is critical. The adjusting device includes one or more adjusting columns 400, each of which uses an embedded nested structure inside and contains multiple shape members 410. These shape members 410 include at least one or more of a triangle, a rectangle, and a circle. For example, an adjusting column 400 may contain a triangular member, two rectangular members, and a circular member, which are nested together in a specific order.

[0147] The diversity of shape members 410 provides more possibilities for the adjustment of the structure of the resonant cavity 300. The triangular member can be used to form a sharp electric field distribution in the resonant cavity 300, the rectangular member can be used to create a uniform electric field area, and the circular member can be used to form a smooth electric field transition. By combining these different shaped members, a complex electromagnetic field distribution can be created inside the resonant cavity 300 to adapt to different plasma generation needs.

[0148] The piezoelectric control device 500 is connected to the adjusting column 400 for precise control of the extension position of each shape member 410 inside the resonant cavity 300. This precise control can be achieved through a stepper motor, a servo motor, or other precision driving mechanisms. By adjusting the extension depth of each shape member 410, the effective volume and shape of the resonant cavity 300 can be changed, thereby affecting the resonance characteristics of electromagnetic waves.

[0149] For example, when high-density plasma is needed, the circular member can be extended into the resonant cavity 300 to create a larger resonant space; when high-energy but low-density plasma is needed, the triangular member can be extended deeper to form a more concentrated electric field distribution. This flexible adjustment capability enables the resonant cavity 300 of the present application to adapt to various different work tasks and environmental conditions.

[0150] The resonant cavity 300 of the present application can be operated in the following way in practical applications: first, according to the specific task requirements, select the appropriate adjusting column 400 for configuration. Then, adjust the extension position of each shape member 410 through the piezoelectric control device 500. During the adjustment process, it may be necessary to monitor the electromagnetic field distribution and plasma parameters in the resonant cavity 300 in real time in order to fine-tune. Finally, when the optimal configuration is reached, record the current adjustment parameters in order to quickly reproduce similar tasks in the future.

[0151] In this way, the plasma source resonant cavity 300 of the present application can quickly adapt to different working requirements without changing the hardware, greatly improving the flexibility and adaptability of the equipment. Compared with the traditional fixed structure resonant cavity 300, the scheme of the present application avoids the trouble of frequently changing equipment and reduces the dependence on human experience. In addition, since the structure of the resonant cavity 300 can be accurately controlled, the scheme of the present application can also achieve more precise plasma parameter regulation, improving the quality and stability of the plasma.

[0152] Further, in some embodiments, further comprising:

[0153] The data recording device 800 is used to record and store the adjustment information of the piezoelectric control device 500 to the adjusting column 400.

[0154] The introduction of the data recording device 800 solves the problem of recording and storing the adjustment information of the resonant cavity 300. By recording and storing the adjustment information of the piezoelectric control device 500 to the adjusting column 400, the adjustment process of the resonant cavity 300 can be tracked and analyzed. This method can help the operator understand the influence of different adjustment parameters on the performance of the plasma, providing data support for future adjustment optimization. At the same time, the stored adjustment information can also be used to quickly reproduce a specific resonant cavity 300 configuration, improving the efficiency and consistency of the adjustment.

[0155] This technical scheme combines the adjustable resonant cavity 300 structure and the data recording function, not only improves the adaptability and controllability of the plasma source, but also provides a basis for intelligent adjustment and optimization of the resonant cavity 300. By analyzing the recorded adjustment data, the relationship between the adjustment parameters and the plasma performance can be found, so that more effective adjustment strategies can be developed to improve the overall performance and stability of the plasma source.

[0156] The data recording device 800 can be implemented in various forms. For example, embedded memory, solid state disk or cloud storage system can be used to store the adjustment information. The recorded information can include shape information, depth information of the adjusting column 400, control parameters of the piezoelectric control device 500 and corresponding plasma performance data.

[0157] The data recording device 800 and the piezoelectric driving device 500 can communicate through wired or wireless communication. For example, real-time data transmission and storage can be achieved using a serial communication interface (such as RS-232, RS-485) or a network interface (such as Ethernet, Wi-Fi).

[0158] To improve data availability and analysis efficiency, the data recording device 800 can be equipped with a data processing module. This module can preprocess, classify and preliminarily analyze the original adjustment data, and generate data reports that are easy to understand and use. These reports can include charts of the correlation between adjustment parameters and plasma performance, optimization suggestions, etc.

[0159] The data recording device 800 can also be integrated with external systems, such as production management systems or equipment monitoring systems. This can enable more extensive data sharing and analysis, helping to optimize the overall production process and improve equipment performance.

[0160] In practical applications, the introduction of the data recording device 800 forms a closed-loop feedback system with the existing resonant cavity 300 adjustment mechanism. The piezoelectric driving device 500 adjusts the adjustment column 400 according to task requirements, and the data recording device 800 records these adjustment information and corresponding plasma performance data. By analyzing these historical data, guidance can be provided for future adjustments, enabling more intelligent and efficient resonant cavity 300 adjustment.

[0161] Specifically, in some preferred embodiments, the plasma source resonant cavity proposed in this application includes a resonant cavity 300 with multiple adjustment columns 400, each adjustment column 400 is strictly nested with multiple different sizes and shapes of shape members 410, and can be telescopic; Each adjustment column 400 has two adjustment modes, coarse adjustment and fine adjustment, where coarse adjustment is a manual adjustment knob, and fine adjustment is achieved by a piezoelectric driving device 500;

[0162] The piezoelectric driving device 500 is composed of motors, piezoelectric driving sensors, etc., and is installed on the periphery of the adjustment column 400, which can realize the adjustment of the adjustment column 400;

[0163] It also includes a power supply 600, which can supply power to the piezoelectric driving device 500;

[0164] It also includes an RPS cavity 900, which is sealed and connected with the resonant cavity 300 device, and an observation window 1000 is provided on the RPS cavity 900, through which the generation state of the plasma can be observed;

[0165] Also included are an input power controller and a reflected power receiver 700, which can control the generation of plasma by setting the output power of the power supply while receiving information related to the reflected power;

[0166] Also included are data recording devices 800, which can dynamically record data information such as the shape information and depth information of the adjustment column 400 in the resonant cavity 300, the reflected power of the power supply 600, and the like in real time;

[0167] Also included are display devices, which are composed of an operator and a display screen, and can display, view, calculate, call, classify, and plot curves of the data recorded by the data recording devices 800.

[0168] In one embodiment, the steps of the method are as follows:

[0169] Step one: connect the resonant cavity 300 with the power supply 600 and the RPS cavity 900, check and determine the sealing of the overall device system.

[0170] Step two: according to the common type of plasma work task type, set the work task (A / B / C / D / ... / X), power input, gas flow, and other parameters through the input power controller and the reflected power receiver 700, and set the maximum threshold M of the reflected power.

[0171] Step three: coarsely adjust the adjustment column 400, and determine that the RPS cavity 900 has generated plasma through the observation window 1000.

[0172] Step four: adjust the adjustment column 400 in the resonant cavity 300 to different shape information and depth information, record the reflected power data in different states, and sort them.

[0173] Step five: subtract the maximum threshold M, take the absolute value, and record it.

[0174] Step six: find the data group with the smallest absolute value, finely adjust the depth of the shape member 410 through the piezoelectric drive control device 500, record the corresponding reflected power, and form the data of "shape information-depth information-reflected power-task type".

[0175] Step seven: under different shapes, plot the curve of "depth information-reflected power" (which should show a "V" or "inverted V" trend), and form a data set.

[0176] Step eight: find the shape information and depth information corresponding to the minimum reflected power, mark it as the best data for this task type as the associated data group (shape information-depth information-reflected power-task type).

[0177] Step nine: all data under different working task types are summarized to form the resonant cavity 300 adjustment database, and saved in the form of "shape information-depth information-reflective power-task type".

[0178] Step ten: the new to-be-done task type is marked and confirmed, the corresponding shape information and depth information are allocated according to the associated data group, the adjustment column 400 is adjusted, and the optimization adjustment of the reflective power is realized.

[0179] Step eleven: return to step two, update the working task, and recycle steps two to ten.

[0180] Step twelve: form the database of "shape information-depth information-reflective power-task type".

[0181] When a new working task is determined, the parameters (shape information and depth information) corresponding to the lowest reflective power are used first, and then the actual ionization of the plasma in the RPS cavity 900 is considered. If the actual ionization effect is not ideal, the depth of the adjustment column 400 can be fine-tuned. If it is still not ideal, switch to the parameters (shape information and depth information) corresponding to the second-lowest reflective power. If it is still not ideal, switch to the parameters (shape information and depth information) corresponding to the third-lowest reflective power. In this way, the resonant cavity 300 shape that matches the actual situation can be quickly found.

[0182] The above only describes the embodiments of the present application and is not used to limit the protection scope of the present application. For those skilled in the art, the present application can have various changes and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A plasma source resonant cavity adjustment method, characterized in that: The steps of the method include: Obtaining shape information and depth information of the adjustment column in the plasma source resonant cavity; Adjusting the shape information and the depth information of the adjustment column according to the task type to obtain corresponding reflection power data under different shape information and depth information; Obtaining the shape information and the depth information corresponding to when the reflected power is at a minimum value or less than a target value; generating an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value, and the task type; When it is detected that a new task type has a corresponding associated data group, adjusting the adjustment column in the plasma source resonance cavity according to the shape information and the depth information in the corresponding associated data group; The step of obtaining shape information and depth information of the adjustment column in the plasma source resonant cavity includes: Obtaining a basic shape of one or more adjustment columns in the plasma source resonant cavity, wherein the basic shape includes one or more of an embedded and nested triangle, a rectangle, and a circle; Obtaining initial adjustment information of each adjustment column; Obtaining the depth information corresponding to each shape of the embedded nesting in each of the adjustment columns according to the initial adjustment information; The shape information of each adjusting column is obtained according to the depth information corresponding to each shape of the embedded nesting in each adjusting column.

2. The plasma source resonant cavity adjustment method according to claim 1, characterized in that: The step of adjusting the shape information and the depth information of the adjustment column includes: performing coarse adjustment on the shape information and the depth information of the adjustment column to generate plasma in the plasma source resonant cavity; After plasma is generated in the plasma source resonant cavity, the shape information and the depth information of the adjustment column are fine-tuned.

3. The plasma source resonant cavity adjustment method according to claim 2, characterized in that: The step of generating an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value and the task type comprises: Selecting the three smallest groups of data from the multiple groups of reflected power in sequence as target data; The associated data group is generated by combining the shape information, the depth information, and the task type corresponding to the target data.

4. The plasma source resonant cavity adjustment method according to claim 3, characterized in that: The step of adjusting the adjustment column in the plasma source resonance cavity according to the shape information and the depth information in the corresponding associated data group includes: Selecting the shape information and the depth information corresponding to the first smallest target data from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirements are not met, selecting the shape information and the depth information corresponding to the second smallest target data from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirements are not met, selecting the shape information and the depth information corresponding to the third smallest target data from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirements are not met, the scheme with the best ionization effect is selected from the three groups of schemes to adjust the adjustment column.

5. The plasma source resonant cavity adjustment method according to claim 1, characterized in that: The method further includes: When it is detected that there is no corresponding associated data group for a new task type, a new associated data group is generated based on the shape information and depth information corresponding to the minimum reflected power after adjustment test or when it is less than the target value and the corresponding new task type.

6. The plasma source resonant cavity adjustment method according to claim 1, characterized in that: The task type includes work parameter information. The method further includes: When it is detected that the new task type does not have a corresponding associated data group, searching for the associated data group that is closest to the working parameters of the new task type from the associated data groups according to the working parameters of the new task type; Recommended adjustment parameters for a new task type are generated based on the closest associated data set, and the recommended adjustment parameters include parameters adjusted for the shape information and depth information of the adjustment column.

7. A plasma source resonant cavity adjustment device, characterized in that: include: A first acquisition module is used to acquire shape information and depth information of the adjustment column in the plasma source resonant cavity; a first adjustment module, configured to adjust the shape information and the depth information of the adjustment column according to a task type, so as to obtain corresponding reflected power data under different shape information and depth information; A second acquisition module is used to obtain the shape information and the depth information corresponding to when the reflected power is at a minimum value or is less than a target value; a generating module, configured to generate an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value, and the task type; a second adjustment module, configured to adjust the adjustment column in the plasma source resonant cavity according to the shape information and the depth information in the corresponding associated data group when detecting that a new task type has a corresponding associated data group; The obtaining of shape information and depth information of the adjustment column in the plasma source resonant cavity includes: Obtaining a basic shape of one or more adjustment columns in the plasma source resonant cavity, wherein the basic shape includes one or more of an embedded and nested triangle, a rectangle, and a circle; Obtaining initial adjustment information of each adjustment column; Obtaining the depth information corresponding to each shape of the embedded nesting in each of the adjustment columns according to the initial adjustment information; The shape information of each adjusting column is obtained according to the depth information corresponding to each shape of the embedded nesting in each adjusting column.

8. A plasma source resonant cavity, comprising a resonant cavity, characterized in that: Also includes: An adjustment device, connected to the resonant cavity, includes one or more adjustment columns, wherein a plurality of shaped components are nested in the adjustment columns, and the shapes of the shaped components include one or more of a triangle, a rectangle, and a circle; A piezoelectric drive control device is connected to the adjustment column and is used to control the extension position of each shape component in the adjustment column within the resonant cavity.

9. The plasma source resonant cavity according to claim 8, characterized in that: Also includes: A data recording device is used to record and store the adjustment information of the adjustment column by the piezoelectric drive control device.

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