Etching device and etching method for improving roughness of inner surface of quartz crucible

Abstract

The invention relates to the technical field of quartz crucible processing, in particular to an etching device and an etching method for improving the roughness of the inner surface of a quartz crucible, and the etching device for improving the roughness of the inner surface of the quartz crucible is internally provided with a fixing assembly, a height adjusting assembly, a driving assembly and an etching assembly, the top surface of the fixing assembly is used for fixing a quartz crucible, the height adjusting assembly is arranged below the fixing assembly, the fixing end of the driving assembly is fixedly connected with the top end of the height adjusting assembly, the driving end of the driving assembly is in driving connection with the fixing end of the etching assembly, and the etching end of the etching assembly is located above the fixing assembly; thus, the height of the etching assembly is adjusted through the height adjusting assembly, the etching end of the etching assembly can make contact with different areas of the inner surface of the quartz crucible, and therefore the etching end of the etching assembly can rotate in the different areas of the inner surface of the quartz crucible under the action of the driving assembly; and roughness processing is carried out on the whole or a specific area of the inner surface of the quartz crucible according to an actual scene.

Description

Technical Field

[0001] The invention relates to the technical field of quartz crucible processing, and in particular to an etching device and an etching method for improving the inner surface roughness of a quartz crucible. Background Art

[0002] In the field of semiconductor manufacturing, quartz crucible is a common equipment used to hold silicon materials during the smelting and crystal pulling process. Its inner surface is usually coated with a layer of coating to prevent the silicon melt from reacting with the inner surface of the quartz crucible, thereby improving the growth quality of single crystal silicon and the service life of the quartz crucible. In order to improve the adhesion of the coating, the inner surface of the quartz crucible needs to be roughened.

[0003] At present, the roughness treatment process of the inner surface of the quartz crucible is mainly achieved by manual grinding or sandblasting. Among them, manual grinding is that workers use sandpaper to rub the inner surface of the quartz crucible to increase the roughness of the inner surface of the quartz crucible. This method has the following disadvantages: 1. The labor intensity of workers is high; 2. The grinding efficiency of the inner surface is low; 3. The roughness of the inner surface is not uniform enough; Sandblasting is a suction sandblasting machine that uses the negative pressure formed by the high-speed flow of compressed air in the spray gun to generate the induced effect, and the abrasive in the storage box is sucked into the spray gun through the sand pipe, and then sprayed onto the surface of the quartz crucible with compressed air at high speed, so as to increase the roughness of the inner surface of the quartz crucible through sandblasting. This method has the following disadvantages: 1. The nozzle of the sandblasting machine is easy to be blocked, resulting in leakage of the inner surface of the quartz crucible; 2. The air pressure of the nozzle cannot be stable at all times, resulting in uneven roughness of the inner surface of the quartz crucible; 3. The surface of the quartz crucible is hit by gravel at high speed, which causes a lot of dust and serious environmental pollution.

[0004] To solve the above technical problems, the technical solution disclosed in the Chinese invention patent with patent application number CN201910299142.5 is a method for processing the surface roughness of a crucible, including the following methods: Step 1: Evenly mix quartz sand, binder, silica sol and pure water in proportion, and make quartz slurry by ball milling; Step 2: Adjust the pressure in the high-pressure pneumatic stirring tank to reach the set range, so that the quartz slurry is sprayed out in the form of atomized droplets; Step 3: Connect the high-pressure pneumatic stirring tank with the atomizing spray gun, and adjust the pressure and atomization state of the atomizing spray gun nozzle; Step 4: Aim the atomizing spray gun nozzle at the inner surface of the crucible and spray evenly until the entire inner surface of the crucible is sprayed; Step 5: Dry the sprayed crucible. This method has a simple operation process, energy saving and environmental protection, can solve the problem of leakage or uneven roughness of the inner surface of the crucible, can avoid damage to the crucible, and at the same time, can reduce the labor intensity of workers and improve the production efficiency of the crucible.

[0005] However, the above-mentioned prior art has the following technical problems: the above-mentioned crucible surface roughness processing method is realized by spraying quartz slurry onto the inner surface of the quartz crucible through an atomizing spray gun when roughening the inner surface of the quartz crucible. Due to the large spray range of the atomizing spray gun, it is difficult to control the processing range of the processing method, and it can only be used to roughen the entire inner surface of the quartz crucible. In some actual scenarios, the quartz crucible needs to be coated with a coating in a specific area of ​​the inner surface, for example, by brushing different types of coatings on different areas of the inner surface of the quartz crucible to reduce the erosion of the quartz crucible by the silicon liquid, prevent impurities from mixing into the silicon liquid, and improve the crystallization rate of single crystal silicon; for example, only the coating is set at the center of the bottom wall of the inner surface of the quartz crucible to reduce the crystallization rate and increase the output of crystal pulling; and the existing quartz crucible inner surface processing scheme can only roughen the entire inner surface of the quartz crucible, which is difficult to apply to local processing scenarios and has a limited scope of application. Summary of the invention

[0006] In view of this, it is necessary to provide an etching device and an etching method for improving the roughness of the inner surface of a quartz crucible, which can control the range of roughening of the inner surface of the quartz crucible, thereby roughening the entire inner surface of the quartz crucible or a specific area according to actual scenarios.

[0007] In a first aspect, the present invention provides an etching device for improving the roughness of the inner surface of a quartz crucible, comprising a fixing component, a height adjustment component, a driving component and an etching component, wherein the top surface of the fixing component is used to fix the quartz crucible, the height adjustment component is arranged below the fixing component, the fixing end of the driving component is fixedly connected to the top of the height adjustment component, the driving end is drivingly connected to the fixed end of the etching component, the etching end of the etching component is located above the fixing component and is in contact with the inner surface of the quartz crucible; the height adjustment component is used to adjust the height of the etching component, and the driving component is used to rotate the etching end of the etching component so as to perform roughness processing on the inner surface of the quartz crucible through the etching end of the etching component.

[0008] Preferably, the fixing assembly includes a fixing platform and at least four limiting members with the same structure, and each limiting member is evenly arranged on the top surface of the fixing platform with adjustable positions to fix the quartz crucible on the fixing platform.

[0009] Preferably, the driving assembly includes a driving motor and a driving rod, the fixed end of the driving motor is fixedly connected to the top surface of the height adjustment assembly, the driving end is drivingly connected to the bottom end of the driving rod, and the top end of the driving rod is fixedly connected to the etching assembly.

[0010] Preferably, the etching assembly includes an etching liquid storage tank, a delivery pipe, a telescopic tube and a roller. The etching liquid storage tank is fixedly connected to the top of the driving rod and is used to store etching liquid. The delivery pipe is arranged in a vertical direction, one end of which is connected to the top of the etching liquid storage tank, and the other end is connected to the telescopic tube. The telescopic tube is arranged in a horizontal direction, and the other end of which is connected to the roller, and is used to adjust the position of the roller in the horizontal direction by extending and retracting the telescopic tube.

[0011] Preferably, the roller is made of a material with good water absorption and elasticity so as to absorb the etching liquid through capillary action and apply the etching liquid to the inner surface of the quartz crucible.

[0012] Preferably, the etching assembly further comprises a pressure sensor, a fixed end of the pressure sensor is fixedly connected to the roller, and a detection end faces the inner surface of the quartz crucible, for detecting the pressure between the roller and the inner surface of the quartz crucible.

[0013] Preferably, the etching device for improving the inner surface roughness of the quartz crucible further includes a control terminal, the telescopic tube is an electric telescopic tube, the control terminal is electrically connected to the drive motor and the telescopic tube respectively, the control terminal is communicatively connected to the pressure sensor to upload the pressure data between the roller and the inner surface of the quartz crucible detected by the pressure sensor to the control terminal, and the control terminal is used to control the pressure between the roller and the inner surface of the quartz crucible through the telescopic tube according to the received data; the control terminal controls the speed of the drive motor according to a preset speed, thereby controlling the speed of the roller.

[0014] Preferably, each component of the etching device for improving the inner surface roughness of the quartz crucible is made of corrosion-resistant and acid-resistant materials to reduce corrosion of the device by the etching solution.

[0015] In a second aspect, the present invention provides an etching method based on the etching device for improving the inner surface roughness of a quartz crucible according to the first aspect, comprising the following steps: Step 1: Invert the quartz crucible to be subjected to inner surface roughness treatment on a fixed table, and fix the quartz crucible on the fixed table by various stoppers; Step 2: According to the area of ​​the inner surface of the quartz crucible to be roughened, adjust the height of the roller through the height adjustment component; Step 3: Adjust the horizontal position of the roller through the telescopic tube so that the roller contacts the inner surface of the quartz crucible and the pressure between the roller and the inner surface of the quartz crucible reaches a predetermined pressure; Step 4: Start the driving motor to make the roller rotate along the inner surface of the quartz crucible at a predetermined speed for a predetermined time; Step 5: Turn off the drive motor, loosen the limiters, and remove the quartz crucible from the fixed platform; Step 6: Check the roughness processing effect of the inner surface of the quartz crucible. If the processing effect meets the requirements, the inner surface roughness processing of the quartz crucible is completed; if the processing effect does not meet the requirements, repeat the above steps.

[0016] The etching device for improving the roughness of the inner surface of the quartz crucible is provided with a fixing component, a height adjustment component, a driving component and an etching component. The top surface of the fixing component is used to fix the quartz crucible. The height adjustment component is arranged below the fixing component. The fixing end of the driving component is fixedly connected to the top of the height adjustment component. The driving end is drivingly connected to the fixed end of the etching component. The etching end of the etching component is located above the fixing component. The height adjustment component is used to adjust the height of the etching component. The driving component is used to rotate the etching end of the etching component. The etching end of the etching component is used to perform roughness processing on the inner surface of the quartz crucible. In this way, when the inner surface of the quartz crucible is roughened, the height of the etching component is adjusted by the height adjustment component so that the etching end of the etching component can contact different areas of the inner surface of the quartz crucible, so that the etching end of the etching component can rotate in different areas of the inner surface of the quartz crucible under the action of the driving component, and the roughness processing is performed on different areas of the inner surface of the quartz crucible, thereby controlling the range of roughness processing on the inner surface of the quartz crucible, so that the overall or specific area of ​​the inner surface of the quartz crucible can be roughened according to the actual scene, thereby improving the scope of application of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a front view of the etching device for improving the inner surface roughness of a quartz crucible of the present application.

[0018] Figure 2 It is a flow chart of the etching method of the present application.

[0019] In the figure: an etching device 10 for improving the inner surface roughness of a quartz crucible, a fixing assembly 20, a fixing table 21, a limiter 22, a height adjustment assembly 30, a driving assembly 40, a driving motor 41, a driving rod 42, an etching assembly 50, an etching liquid storage tank 51, a delivery pipe 52, a telescopic pipe 53, a roller 54, and a quartz crucible 60. DETAILED DESCRIPTION

[0020] The technical solutions and technical effects of the embodiments of the present invention are further described in detail below in conjunction with the accompanying drawings of the present invention.

[0021] Please refer to Figure 1In a first aspect, the present invention provides an etching device 10 for improving the roughness of the inner surface of a quartz crucible, comprising a fixing assembly 20, a height adjustment assembly 30, a driving assembly 40 and an etching assembly 50. The top surface of the fixing assembly 20 is used to fix the quartz crucible. The height adjustment assembly 30 is arranged below the fixing assembly 20. The fixing end of the driving assembly 40 is fixedly connected to the top of the height adjustment assembly 30. The driving end is drivingly connected to the fixing end of the etching assembly 50. The etching end of the etching assembly 50 is located above the fixing assembly 20 and is in contact with the inner surface of the quartz crucible. The height adjustment assembly 30 is used to adjust the height of the etching assembly 50. The driving assembly 40 is used to rotate the etching end of the etching assembly 50 so as to perform roughness processing on the inner surface of the quartz crucible through the etching end of the etching assembly.

[0022] Furthermore, the fixing assembly 20 includes a fixing table 21 and at least four limiting members 22 of the same structure. Each limiting member 22 is evenly arranged on the top surface of the fixing table 21 with adjustable positions, and is used to fix the quartz crucible on the fixing table 21. By adjusting the position of the limiting member 22, the fixing assembly 20 can fix quartz crucibles of different sizes.

[0023] In this embodiment, a device with a height adjustment function is used as the height adjustment component 30, for example, a telescopic lifting platform.

[0024] In one embodiment, a plurality of adjustment holes are evenly arranged on the top surface of the fixing platform 21, and a fixing hole is opened on the bottom surface of each limiting member 22, so that the position of each limiting member 22 can be adjusted by fixing the fixing hole with different adjustment holes.

[0025] Furthermore, the driving assembly 40 includes a driving motor 41 and a driving rod 42, the fixed end of the driving motor 41 is fixedly connected to the top surface of the height adjustment assembly 30, the driving end is drivingly connected to the bottom end of the driving rod 42, and the top end of the driving rod 42 is fixedly connected to the etching assembly 50.

[0026] Furthermore, the etching assembly 50 includes an etching liquid storage tank 51, a delivery pipe 52, a telescopic pipe 53 and a roller 54. The etching liquid storage tank 51 is fixedly connected to the top of the driving rod 42 and is used to store etching liquid. The delivery pipe 52 is arranged in a vertical direction, one end of which is connected to the top of the etching liquid storage tank 51, and the other end is connected to the telescopic pipe 53. The telescopic pipe 53 is arranged in a horizontal direction, and the other end is connected to the roller 54, which is used to adjust the position of the roller 54 in the horizontal direction by telescoping the telescopic pipe 53 so that the roller 54 contacts the inner surface of the quartz crucible; in this way, When roughening the inner surface of a quartz crucible, the height of the etching assembly is adjusted by the height adjustment assembly so that the etching end of the etching assembly can contact different areas of the inner surface of the quartz crucible, so that the etching end of the etching assembly can rotate in different areas of the inner surface of the quartz crucible under the action of the driving assembly, and roughening is performed on different areas of the inner surface of the quartz crucible, thereby controlling the range of roughening of the inner surface of the quartz crucible, so that the overall or specific area of ​​the inner surface of the quartz crucible can be roughened according to actual scenarios, thereby improving the scope of application of the device.

[0027] Furthermore, the roller 54 is made of a material with good water absorption and elasticity, such as a high-density sponge, so as to absorb the etching liquid through capillary action and spread the etching liquid on the inner surface of the quartz crucible.

[0028] In this embodiment, an acid solution capable of corroding the surface of the quartz crucible is used as the etching solution, for example, a sulfuric acid solution with a concentration of 98% and a hydrofluoric acid solution with a concentration of 5%.

[0029] Furthermore, the etching assembly 50 also includes a pressure sensor, a fixed end of the pressure sensor is fixedly connected to the roller 54, and a detection end faces the inner surface of the quartz crucible, for detecting the pressure between the roller 54 and the inner surface of the quartz crucible.

[0030] In this embodiment, the pressure sensor is a probe type pressure sensor to prevent the detection end of the pressure sensor from interfering with the roller 54 applying the etching liquid to the inner surface of the quartz crucible.

[0031] In one embodiment, the etching device 10 for improving the roughness of the inner surface of the quartz crucible further includes a control terminal, the telescopic tube 53 is an electric telescopic tube 53, the control terminal is electrically connected to the drive motor 41 and the telescopic tube 53 respectively, and the control terminal is communicatively connected to the pressure sensor to transmit the pressure data between the roller 54 and the inner surface of the quartz crucible detected by the pressure sensor to the control terminal, so that the control terminal tool roller 54 and the inner surface of the quartz crucible The pressure data controls the extension or retraction of the telescopic tube 53, adjusts the pressure between the roller 54 and the inner surface of the quartz crucible, and ensures the coating depth of the etching liquid on the inner surface of the quartz crucible; the control terminal controls the rotation speed of the drive motor 41 according to the preset rotation speed, thereby controlling the rotation speed of the roller 54 to ensure the uniformity of the etching liquid on the inner surface of the quartz crucible.

[0032] Furthermore, all components of the etching device 10 for improving the inner surface roughness of the quartz crucible are made of corrosion-resistant and acid-resistant materials, such as polytetrafluoroethylene, to reduce the corrosion of the etching solution to the device.

[0033] In a second aspect, the present invention provides an etching method of the etching device 10 for improving the inner surface roughness of a quartz crucible based on the first aspect, comprising the following steps: Step 1: Place a quartz crucible to be subjected to inner surface roughness treatment upside down on a fixing table 21, and fix the quartz crucible on the fixing table 21 by means of various stoppers 22; Step 2: According to the area of ​​the inner surface of the quartz crucible to be roughened, the height of the roller 54 is adjusted by the height adjustment component; Step 3: adjusting the horizontal position of the roller 54 through the telescopic tube 53 so that the roller 54 contacts the inner surface of the quartz crucible and the pressure between the roller 54 and the inner surface of the quartz crucible reaches a predetermined pressure; Step 4: Start the driving motor 41 to make the roller 54 rotate along the inner surface of the quartz crucible at a predetermined speed for a predetermined time; Step 5: Turn off the driving motor 41, loosen the stoppers 22, and remove the quartz crucible from the fixing table 21; Step 6: Check the processing effect of the inner surface roughness of the quartz crucible. If the processing effect does not meet the requirements, repeat the above steps.

[0034] Among them, the predetermined pressure in step 3 is 0.5-1.0 MPa; the predetermined speed in step 4 is 1000 rpm; and the predetermined time in step 4 is 10 min.

[0035] In this embodiment, the pressure between the roller 54 and the inner surface of the quartz crucible is controlled to ensure the depth of the etching liquid applied by the roller 54 to the inner surface of the quartz crucible; and the rotation speed of the roller 54 is controlled to ensure the uniformity of the etching liquid applied by the roller 54 to the inner surface of the quartz crucible.

[0036] Example 1, Beneficial Effects of Local Roughness Processing on the Inner Surface of a Quartz Crucible In this embodiment, some beneficial effects are achieved by roughening a specific area on the inner surface of the quartz crucible. For example, the roughness of the liquid level line area on the inner surface of the quartz crucible is processed to suppress the jitter of the silicon liquid in the quartz crucible. The principle is as follows: after the liquid level line area of ​​the quartz crucible is roughened, small and uneven micropores are formed in the area. These micropores can absorb or offset part of the energy that causes the fluctuation of the silicon liquid, thereby suppressing the jitter of the silicon liquid; at the same time, these micropores form a porous structure in the liquid level line area on the inner surface of the quartz crucible, and part of the gas generated by the reaction of silicon liquid and silicon dioxide can be discharged through the porous structure, thereby suppressing the jitter of the silicon liquid caused by the discharge of the gas from the surface of the silicon liquid.

[0037] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. An etching device for improving the inner surface roughness of a quartz crucible, characterized in that: It comprises a fixing component, a height adjustment component, a driving component and an etching component, wherein the top surface of the fixing component is used to fix the quartz crucible, the height adjustment component is arranged below the fixing component, the fixing end of the driving component is fixedly connected to the top of the height adjustment component, the driving end is drivingly connected to the fixing end of the etching component, and the etching end of the etching component is located above the fixing component and fits the inner surface of the quartz crucible; The height adjustment component is used to adjust the height of the etching component, and the driving component is used to rotate the etching end of the etching component so as to perform roughness processing on the inner surface of the quartz crucible through the etching end of the etching component.

2. The etching device for improving the inner surface roughness of a quartz crucible according to claim 1, characterized in that: The fixing assembly comprises a fixing platform and at least four limiting members with the same structure. The limiting members are evenly arranged on the top surface of the fixing platform with adjustable positions to fix the quartz crucible on the fixing platform.

3. The etching device for improving the inner surface roughness of a quartz crucible according to claim 1, characterized in that: The driving assembly includes a driving motor and a driving rod. The fixed end of the driving motor is fixedly connected to the top surface of the height adjustment assembly, the driving end is drivingly connected to the bottom end of the driving rod, and the top end of the driving rod is fixedly connected to the etching assembly.

4. The etching device for improving the inner surface roughness of a quartz crucible according to claim 3, characterized in that: The etching assembly includes an etching liquid storage tank, a delivery pipe, a telescopic tube and a roller. The etching liquid storage tank is fixedly connected to the top of the driving rod and is used to store etching liquid. The delivery pipe is arranged in a vertical direction, one end of which is connected to the top of the etching liquid storage tank, and the other end is connected to the telescopic tube. The telescopic tube is arranged in a horizontal direction, and the other end of which is connected to the roller, and is used to adjust the position of the roller in the horizontal direction by telescoping the telescopic tube.

5. The etching device for improving the inner surface roughness of a quartz crucible according to claim 4, characterized in that: The roller is made of a material with good water absorption and elasticity, so as to absorb the etching liquid through capillary action and smear the etching liquid on the inner surface of the quartz crucible.

6. The etching device for improving the inner surface roughness of a quartz crucible according to claim 4, characterized in that: The etching assembly also includes a pressure sensor, a fixed end of the pressure sensor is fixedly connected to the roller, and a detection end faces the inner surface of the quartz crucible, and is used to detect the pressure between the roller and the inner surface of the quartz crucible.

7. The etching device for improving the inner surface roughness of a quartz crucible according to claim 6, characterized in that: The etching device for improving the roughness of the inner surface of the quartz crucible also includes a control terminal. The telescopic tube adopts an electric telescopic tube. The control terminal is electrically connected to the drive motor and the telescopic tube respectively. The control terminal is communicatively connected to the pressure sensor to upload the pressure data between the roller and the inner surface of the quartz crucible detected by the pressure sensor to the control terminal. The control terminal is used to control the pressure between the roller and the inner surface of the quartz crucible through the telescopic tube according to the received data; the control terminal controls the speed of the drive motor according to a preset speed, thereby controlling the speed of the roller.

8. The etching device for improving the inner surface roughness of a quartz crucible according to claim 1, characterized in that: All components of the etching device for improving the inner surface roughness of the quartz crucible are made of corrosion-resistant and acid-resistant materials to reduce the corrosion of the etching solution to the device.

9. An etching method for improving the inner surface roughness of a quartz crucible according to any one of claims 1 to 8, comprising the following steps: Step 1: Invert the quartz crucible to be subjected to inner surface roughness treatment on a fixed table, and fix the quartz crucible on the fixed table by various stoppers; Step 2: According to the area of ​​the inner surface of the quartz crucible to be roughened, adjust the height of the roller through the height adjustment component; Step 3: Adjust the horizontal position of the roller through the telescopic tube so that the roller contacts the inner surface of the quartz crucible and the pressure between the roller and the inner surface of the quartz crucible reaches a predetermined pressure; Step 4: Start the driving motor to make the roller rotate along the inner surface of the quartz crucible at a predetermined speed for a predetermined time; Step 5: Turn off the drive motor, loosen the limiters, and remove the quartz crucible from the fixed table; Step 6: Check the roughness processing effect of the inner surface of the quartz crucible. If the processing effect meets the requirements, the inner surface roughness processing of the quartz crucible is completed; if the processing effect does not meet the requirements, repeat the above steps.

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