Exhaust gas treatment apparatus, exhaust gas treatment method, and exhaust gas treatment system

Abstract

The application provides a tail gas treatment device, method and system, which is used for treating tail gas generated by a boron diffusion device. The tail gas contains first particles and second particles. The device comprises a catalytic assembly for receiving the tail gas, under the influence of a catalyst and a first preset condition, the first particles are converted into third particles which are easy to ionize; an ionization assembly for receiving the tail gas after the catalytic assembly, under a second preset condition, the ionization assembly is used for converting the second particles and the third particles into ionized particles; and an ion capture assembly for receiving the tail gas after the ionization assembly, the ion capture assembly comprises a reaction box, and a capturing agent is arranged in the reaction box and used for capturing the ionized particles. The harmful particles in the tail gas are converted, separated and captured from the molecular level. The size of the particles in the tail gas does not affect the filtering effect, the situation that only particles with a specific size range can be filtered is relieved, and the overall filtering effect of the tail gas is relatively ideal.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of photovoltaic cells, and particularly relates to a tail gas treatment device, a tail gas treatment method and a tail gas treatment system. BACKGROUND

[0002] In the production of solar cells, a diffusion process will be involved, which will produce tail gas. In order to safely discharge the tail gas, the tail gas needs to be filtered before being discharged.

[0003] The existing tail gas filtering mode is usually filter core filtering. However, filter core filtering can only filter relatively large tail gas particles in the tail gas, and the overall filtering effect is not ideal. SUMMARY

[0004] Embodiments of the application provide a tail gas treatment device, a tail gas treatment method and a tail gas treatment system to solve or alleviate one or more technical problems in the prior art.

[0005] As one aspect of the embodiments of the application, the embodiments of the application provide a tail gas treatment device for treating tail gas generated by a boron diffusion device, the composition of the tail gas including first particles and second particles, the device comprising:

[0006] a catalytic assembly for receiving the tail gas, the catalytic assembly being provided with a catalyst; under the influence of the catalyst and a first preset condition, the first particles are converted into third particles that are easy to ionize;

[0007] an ionization assembly for receiving the tail gas after the catalytic assembly; under a second preset condition, the ionization assembly is used to convert the second particles and the third particles into ionic state particles, the ionic state particles including positive ions and negative ions;

[0008] an ion capture assembly for receiving the tail gas after the ionization assembly, the ion capture assembly including a reaction box, the reaction box being provided with a capture agent, the capture agent being used to capture the positive ions and the negative ions.

[0009] Optionally, the catalyst includes any one of a platinum metal catalyst, a rhodium metal catalyst, a vanadium oxide catalyst, and a tungsten oxide catalyst.

[0010] Optionally, the first preset condition includes:

[0011] There is a reaction gas in the catalytic assembly.

[0012] Optionally, the ionization assembly includes an ionization cavity, the ionization cavity being used to receive the tail gas after the catalytic assembly, and the second preset condition includes:

[0013] A preset electric field intensity is applied in the ionization cavity.

[0014] Optionally, the ionization assembly further comprises a high-curvature needle arranged in the ionization cavity for applying the preset electric field intensity in the ionization cavity.

[0015] Optionally, the ion capture assembly further comprises an electric field assembly arranged in the reaction cartridge, the reaction cartridge being provided with a first gas inlet and a first gas outlet at opposite ends thereof, and the electric field assembly comprising:

[0016] a positive plate arranged on a first inner wall of the reaction cartridge;

[0017] a negative plate arranged on a second inner wall of the reaction cartridge and spaced apart from the positive plate;

[0018] wherein the first inner wall and the second inner wall are arranged oppositely between the first gas inlet and the first gas outlet;

[0019] an offset electric field formed between the positive plate and the negative plate, the offset electric field guiding the negative ions to approach the positive plate and guiding the positive ions to approach the negative plate.

[0020] Optionally, the electric field assembly further comprises:

[0021] a direct current power supply, a positive electrode of which is electrically connected to the positive plate and a negative electrode of which is electrically connected to the negative plate;

[0022] a capacitor connected in parallel to the direct current power supply.

[0023] Optionally, the reaction capture agent comprises:

[0024] a positive ion capture agent arranged between the positive plate and the negative plate and close to the negative plate;

[0025] a negative ion capture agent arranged between the positive plate and the negative plate and close to the positive plate.

[0026] Optionally, the device further comprises a membrane filtration assembly in communication with the ion capture assembly, the membrane filtration assembly comprising:

[0027] a filtration cartridge provided with a second gas inlet and a second gas outlet at opposite ends thereof, the second gas inlet being configured to receive tail gas after passing through the ion capture assembly;

[0028] a filtration membrane intercepted between the second gas inlet and the second gas outlet, configured to filter residual first particles and second particles in the tail gas.

[0029] As another aspect of the embodiments of the present application, the embodiments of the present application further provide a tail gas treatment method for treating tail gas by using the tail gas treatment device described in any of the above, the method comprising the following steps:

[0030] passing the tail gas into the catalytic assembly, and converting the first particles into third particles which are easy to be ionized under the first preset condition;

[0031] passing the tail gas after passing through the catalytic assembly into the ionization assembly, and ionizing the first particles and the third particles in the tail gas into ionized particles under the second preset condition;

[0032] passing the tail gas after passing through the ionization assembly into the ion capture assembly, and the ion capture assembly is used for capturing the ionized particles.

[0033] As still another aspect of the embodiments of the present application, the embodiments of the present application further provide a diffusion system comprising the tail gas treatment device described in any of the above.

[0034] The embodiments of the present application convert the first particles in the tail gas into third particles which are easy to be ionized, then pass the tail gas into the ionization assembly to convert the second particles and the third particles in the tail gas into ionized particles, and then pass the tail gas into the ion capture assembly to capture the ionized particles in the tail gas, so as to realize the filtration of the tail gas. The embodiments of the present application convert, separate and capture the harmful particles in the tail gas from the molecular level, and the size of the particles in the tail gas does not affect the filtration effect, which relieves the situation that only particles in a specific size range can be filtered, and the overall filtration effect of the tail gas is relatively ideal.

[0035] The above summary is merely intended to illustrate the present application and is not intended to limit the present application in any way. In addition to the illustrative aspects, embodiments and features described above, further aspects, embodiments and features of the present application will be readily apparent to those skilled in the art by reference to the drawings and the following detailed description. BRIEF DESCRIPTION OF DRAWINGS

[0036] In the drawings, like numerals refer to like elements throughout the various drawings. The drawings are not necessarily to scale, the emphasis instead being placed on the relations between various parts and on the characteristics of the application. It should be understood that these drawings are only intended to depict some embodiments of the application and should not be considered limiting of the scope of the application.

[0037] Figure 1 a structural schematic diagram of a tail gas treatment device according to an embodiment of the present application;

[0038] Figure 2 a structural schematic diagram of an ion capture assembly of a tail gas treatment device according to an embodiment of the present application;

[0039] Figure 3FIG. 2 is another structural schematic diagram of the tail gas treatment device according to an embodiment of the present application.

[0040] Figure 4 FIG. 3 is a flow chart of a tail gas treatment method according to an embodiment of the present application.

[0041] Legend of reference numerals:

[0042] Condensing assembly 10; catalytic assembly 20; ionization assembly 30; ion capture assembly 40; membrane filtration assembly 50; diaphragm pump 60; tail gas discharge pipeline 70; reaction gas input assembly 21; positive electrode plate 401; positive ion capture agent 402; negative electrode plate 404; negative ion capture agent 405; direct current power supply 408; capacitor 409; filtration membrane 501; one-way valve 505. DETAILED DESCRIPTION

[0043] Embodiments of the present application are described in detail below with reference to the accompanying drawings. In the drawings, the size and relative sizes of layers, regions, elements, and the like can be exaggerated for clarity. Like reference numerals refer to like elements throughout the specification. The embodiments described below are examples of the present application and are not intended to limit the present application.

[0044] It will be understood that when an element or layer is referred to as being "on" or "adjacent" another element or layer, it can be directly on or adjacent the other element or layer or intervening elements or layers can be present. In contrast, when an element is referred to as being "directly on" or "directly adjacent" another element or layer, there are no intervening elements or layers present. It will be understood that, although the terms first, second, third, etc. can be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the present application. Similarly, a second element, component, region, layer or section discussed below could be termed a first element, component, region, layer or section without departing from the teachings of the present application.

[0045] In this application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integrated; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through intermediate medium, or internal communication of two elements or interaction relationship between two elements, unless otherwise explicitly limited. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.

[0046] It should be noted that the terms "first", "second", and the like in the description and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and do not necessarily describe a specific order or sequence. It should be understood that the terms thus used can be interchanged under appropriate circumstances, so that the embodiments of the application described herein can be implemented in an order other than that illustrated or described herein. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion, for example, a process, method, system, product or device including a series of steps or units does not necessarily limit to those steps or units clearly listed, but can include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0047] In this application, when referring to a numerical interval (i.e. a numerical range), unless otherwise specified, the distribution of the selected values in the numerical interval is considered to be continuous and includes both numerical endpoints (i.e. the minimum and maximum values) of the numerical interval and every value between the two numerical endpoints. Unless otherwise specified, when a numerical interval refers only to integers within the numerical interval, including both endpoint integers of the numerical range and every integer between the two endpoints, it is equivalent to directly listing each integer. When multiple numerical ranges are provided to describe a feature or characteristic, the numerical ranges can be combined. In other words, unless otherwise indicated, the numerical ranges disclosed in this application should be understood to include any and all sub-ranges encompassed therein. The "numerical" in the numerical interval can be any quantitative value, such as a number, a percentage, a ratio, etc. The "numerical interval" is intended to broadly include quantitative intervals such as percentage intervals, ratio intervals, and value intervals.

[0048] The embodiment of the present application provides a tail gas treatment device, a tail gas treatment method and a tail gas treatment system technical scheme. Based on this, the effect of tail gas filtration is improved. See the following.

[0049] In the following, exemplary embodiments according to the present application will be described in more detail with reference to the accompanying drawings. It should be noted that these exemplary embodiments can be implemented in various different forms and should not be interpreted as being limited to the embodiments set forth herein.

[0050] Referring to Figure 1 and Figure 2 , the embodiments of the present application provide a tail gas treatment device for treating tail gas generated by a boron diffusion device. Based on a solar cell diffusion process, the tail gas composition can include first particles and second particles, and can also include other harmless particles, which are not described herein. The tail gas treatment device includes a catalytic component 20, an ionization component 30, and an ion capture component 40, which are described in detail below:

[0051] The catalytic component 20 is configured to receive the tail gas, and the catalytic component 20 is provided with a catalyst. Under the influence of the first preset condition and the catalyst, the first particles are converted into third particles that are easy to ionize. The catalyst is not consumed in the reaction process, but provides a reaction path to catalyze and accelerate the conversion of the first particles. In the embodiments, the catalyst in the catalytic component 20 can include any one of a platinum metal catalyst, a rhodium metal catalyst, a vanadium oxide catalyst, and a tungsten oxide catalyst. Specifically, the first preset condition can be that the catalytic component 20 has a reaction gas, and the reaction gas can provide a reducing atmosphere in the catalytic component 20 to convert the first particles into third particles that are easy to ionize. The reaction gas can be stored in a reaction gas input component 21, and then input into the catalytic component 20 when needed.

[0052] The ionization component 30 is configured to receive the tail gas after the catalytic component 20. Under the second preset condition, the ionization component 30 is configured to convert the second particles and the third particles into ionic particles, which include positive ions (positively charged ions) and negative ions (negatively charged ions). Specifically, the second preset condition can include that a preset electric field intensity is also applied in the ionization component 30, and / or a preset temperature is applied, and / or a preset power laser is applied, so as to break the particle bonds to become ionic particles.

[0053] The ion capture component 40 is configured to receive the tail gas after the ionization component 30. The ion capture component 40 includes a reaction box (not labeled in the figure), and the reaction box is provided with a capture agent for capturing positive ions and negative ions. The ionization component 30 converts the second particles and the third particles into ionic particles. The ionic particles are more active than neutral particles, so that chemical reactions in subsequent processes are more likely to occur. That is, the ionic particles can more easily react with the capture agent in the ion capture component 40. The capture agent can capture the ionic particles in various ways, including but not limited to adsorption, neutralization, and capture.

[0054] In the embodiment, the first particles in the tail gas are converted into the third particles which are easy to be ionized, and then the tail gas is introduced into the ionization assembly 30 to convert the second particles and the third particles in the tail gas into ionized particles, and then the ionized particles in the tail gas are introduced into the ion capture assembly 40 to be captured, so as to realize the filtration of the tail gas. That is, the harmful particles in the tail gas are converted, separated and captured from the molecular level, and the size of the particles in the tail gas does not affect the filtration effect, which relieves the situation that only particles in a specific size range can be filtered, and improves the overall filtration effect of the tail gas.

[0055] For example, the first particles in the tail gas generated by the boron diffusion device are B2O3, and the second particles are BCl3. The catalyst is selected as a platinum metal catalyst, and H2 is introduced as a reaction gas to convert the first particles (B2O3) into the third particles (B2O2). The specific reaction process includes:

[0056]

[0057] After passing through the catalytic assembly 20, the second particles and the third particles enter the ionization assembly 30, in which a preset electric field strength is applied. Specifically, a high-curvature needle (not shown in the figure) can be arranged in the ionization cavity to apply a preset electric field strength in the ionization cavity. Specifically, the high-curvature needle can generate a predetermined voltage in the ionization cavity to generate a preset electric field strength in the ionization cavity.

[0058] In this example, the preset electric field strength is not less than 50KV / mm. In other embodiments, the preset electric field strength can also be in other ranges, or a high temperature is applied in the ionization cavity at the same time.

[0059] The second particles and the third particles are ionized into ionized particles with positive / negative charges, wherein the positive ions include B 3+ , the negative ions include Cl - , O 2- and / or O2 - .

[0060] The ionized particles in the tail gas continue to enter the ion capture assembly 40, and the tail gas contacts the capturing agent therein, so that the positive ions and the negative ions in the tail gas react with the corresponding capturing agent respectively to remove B 3+ , Cl - in the tail gas, so as to realize the filtration of the tail gas (O is a harmless particle which can not be removed), and then the filtered tail gas is discharged out of the tail gas treatment device.

[0061] It should be noted that the tail gas generated by the boron diffusion device can also contain other particles, and the type of catalyst or the reaction gas can be adjusted according to the specific composition of the particles in the tail gas, so that the particles in the tail gas entering the ionization assembly 30 are easy to be ionized.

[0062] In one embodiment, the exhaust gas treatment device may further include a condenser assembly 10, which receives the exhaust gas before the catalytic assembly 20. The exhaust gas is then treated by the condenser assembly 10 before being introduced into the catalytic assembly 20. The condenser assembly 10 is used to cool the exhaust gas, and can perform primary filtration of some harmful substances (such as B2O3, BCl3) and condensable substances (such as water vapor) in the exhaust gas. The cooled exhaust gas has a lower temperature, which can protect the subsequent treatment components and prevent the high-temperature exhaust gas from damaging or reducing the efficiency of the subsequent components.

[0063] In one embodiment, the ion capture assembly 40 further includes an electric field assembly disposed within the reaction box. The reaction box has a first air inlet (not shown) and a first air outlet (not shown) at opposite ends. The exhaust gas in the ionization assembly 30 enters the reaction box through the first air inlet, and after being processed in the ion capture assembly 40, the exhaust gas is discharged through the first air outlet of the reaction box.

[0064] like Figure 2 As shown, the electric field assembly includes a positive electrode plate 401 and a negative electrode plate 404. The positive electrode plate 401 is disposed on the first inner wall of the reaction chamber (not shown in the figure). The negative electrode plate 404 is disposed at a distance from the positive electrode plate 401 and is disposed on the second inner wall of the reaction chamber (not shown in the figure). The first inner wall and the second inner wall are located between the first air inlet and the first air outlet and are disposed opposite to each other.

[0065] The scavenging agents within the reaction chamber include a positive ion scavenger 402 and a negative ion scavenger 405. The positive ion scavenger 402 is located between the positive electrode plate 401 and the negative electrode plate 404, and is positioned close to the negative electrode plate 404. The negative ion scavenger 405 is located between the positive electrode plate 401 and the negative electrode plate 404, and is positioned close to the positive electrode plate 401. Separating the positive ion scavenger 402 and the negative ion scavenger 405 also prevents reactions between them.

[0066] In this embodiment, the positive ion trap 402 / negative ion trap 405 is used to capture or neutralize positive / negative ions in the exhaust gas. Taking the positive ion trap 402 as an example, the positive ion trap can capture positive ions through electrostatic attraction, that is, the positive ion trap carries a negative charge or a partially negative charge to bind with positive ions through electrostatic attraction. Alternatively, the positive ion trap has multiple coordination sites, which can form multiple bonds with positive ions, thereby firmly capturing positive ions. Alternatively, the positive ion trap includes some with a large specific surface area and specific surface functional groups, so that the positive ion trap can capture positive ions through surface adsorption, which can be either chemisorption or physisorption.

[0067] The offset electric field is formed between the positive plate 401 and the negative plate 404 in the reaction box. Due to the effect of the offset electric field, positive ions and negative ions are respectively guided to different directions, reducing the recombination between positive ions and negative ions, and improving the contact and reaction effect of positive ions and negative ions with the capture agent.

[0068] Specifically, the electric field assembly further includes a direct current power supply 408 and a capacitor 409. The positive and negative poles of the direct current power supply 408 are respectively electrically connected with the positive plate 401 and the negative plate 404, so that the positive plate 401 carries a positive charge and the negative plate 404 carries a negative charge, and then an offset electric field is formed between the positive plate 401 and the negative plate 404. The capacitor 409 is connected in parallel with the direct current power supply 408, and is mainly used for smoothing voltage changes and ensuring the stability of the offset electric field.

[0069] In this example, the voltage of the direct current power supply 408 is not less than 1KV, so as to form a high-strength offset electric field between the positive plate 401 and the negative plate 404, thereby more effectively driving and separating positive ions and negative ions.

[0070] The power supply end portion can also be connected in series with a current-limiting resistor, so as to limit the current and prevent excessive current to protect the direct current power supply 408 and other elements.

[0071] Under the influence of the offset electric field, positive ions are close to the negative plate 404. The positive ions can include B 3+ The positive ion capture agent 402 can include any one of a hydroxyl borate resin, phthalic acid, citric acid, and aluminum hydroxide.

[0072] Under the influence of the offset electric field, negative ions are close to the positive plate 401. The negative ions can include Cl - The negative ion capture agent 405 can include any one of aluminum hydroxide, calcium hydroxide, and magnesium hydroxide.

[0073] Taking the positive ion capture agent 402 as a hydroxyl borate resin as an example, B 3+ The ions and the hydroxyl borate groups on the resin undergo coordination reactions; if there are other exchangeable positive ions on the resin, these positive ions can undergo ion exchange reactions with B 3+ , so as to capture B 3+ .

[0074] Taking the positive ion capture agent 402 as phthalic acid as an example, the reaction equation can include:

[0075]

[0076] Taking the negative ion capture agent 405 as magnesium hydroxide as an example, the reaction equation can include:

[0077]

[0078] In other embodiments, the negative ion capturing agent 405 can also be a silver loaded material, such as silver nanoparticles, silver loaded activated carbon, silver loaded zeolite, etc. Silver ions (Ag + ) are released from the surface of the solid material and combine with chloride ions (Cl - ) to form silver chloride (AgCl).

[0079] The negative ion capturing agent 405 can also be an ion exchange resin, which captures chloride ions by an ion exchange process, exchanging them from the tail gas onto the resin.

[0080] Referring to Figure 3 In an embodiment, the tail gas treatment device can further comprise a membrane filtration assembly 50, which is in communication with the ion capturing assembly 40. A one-way valve 505 can be provided between the ion capturing assembly 40 and the membrane filtration assembly 50, so that the tail gas can only flow from the ion capturing assembly 40 to the membrane filtration assembly 50, avoiding backflow of the tail gas. The membrane filtration assembly 50 can comprise a filtration box and a filtration membrane 501.

[0081] Preferably, there are two one-way valves 505, both of which are in communication between the ion capturing assembly 40 and the membrane filtration assembly 50. One one-way valve 505 is provided corresponding to the end of the positive electrode plate 401, and the other one-way valve 505 is provided corresponding to the end of the negative electrode plate 404, so that the positive and negative ions are transported in different pipelines, reducing the recombination of residual ions in the tail gas.

[0082] The filtration box has a second gas inlet (not labeled in the figure) and a second gas outlet (not labeled in the figure) at its two ends, respectively. The second gas inlet is used to receive the tail gas after passing through the ion capturing assembly 40. Specifically, the second gas inlet can be in communication with the first gas outlet of the reaction box.

[0083] The filtration membrane 501 is intercepted between the second gas inlet and the second gas outlet, and is used to filter the residual first particles and second particles in the tail gas.

[0084] The filtration membrane 501 can be a semi-permeable membrane, which can effectively intercept and capture the residual first particles, second particles, third particles and other fine particulate matters in the tail gas, further ensuring the filtering effect of the tail gas.

[0085] The filtration membrane 501 can be multiple, and the pore sizes of the multiple filtration membranes 501 are different. The multiple filtration membranes 501 are arranged in cascade to remove particles of different sizes.

[0086] The filtration membrane 501 can also be an affinity membrane to specifically adsorb specific particles (such as the first particles, the second particles and the third particles).

[0087] In some embodiments, the surface of the filtration membrane 501 can also be modified with electric charge to enhance the adsorption and filtering effect of ions with opposite electric charge.

[0088] Specifically, the material of the filter membrane 501 can include one of polyether ester, polyamide, and polypropylene.

[0089] The above-mentioned materials have suitable toughness and thermal stability, and can remain stable under high gas flow rate and high temperature environment.

[0090] In an embodiment, the tail gas discharge device can further include a diaphragm pump 60 and a tail gas discharge pipeline 70 connected in sequence. The diaphragm pump 60 can be connected with the second gas outlet, and can be used to control the air pressure of the pipeline in the tail gas treatment device to guide the flow direction of the tail gas. After being filtered by the plurality of components in the tail gas treatment device, the tail gas with a harmful particle concentration in a safe and reasonable range can enter the diaphragm pump 60, and then enter the tail gas discharge pipeline 70 and be discharged to the outside.

[0091] Please refer to Figure 4 The embodiment of the present application also provides a tail gas treatment method for treating tail gas by using the tail gas treatment device, and the method includes the following steps:

[0092] In step S100, the tail gas is introduced into a catalytic component, and the first particles are converted into the third particles easy to be ionized under the first preset condition.

[0093] The catalytic component is provided with a catalyst for converting the first particles into the third particles easy to be ionized under the first preset condition.

[0094] In step S102, the tail gas after passing through the catalytic component is introduced into an ionization component, and the first particles and the third particles in the tail gas are ionized into ionized particles under the second preset condition.

[0095] In step S104, the tail gas after passing through the ionization component is introduced into an ion capture component, and the ion capture component is used to capture the ionized particles.

[0096] The embodiment of the present application also provides a diffusion system, which can include a diffusion furnace for performing a diffusion process on a solar cell piece. The diffusion furnace can generate corresponding tail gas during the diffusion process, and the tail gas can be treated by using the tail gas treatment device and then discharged.

[0097] The diffusion system can further include various devices or components for performing a boron diffusion process on the cell piece, such as:

[0098] A gas supply device for providing a boron source gas (BBr3, boron tribromide), a carrier gas (oxygen, nitrogen), and controlling the flow rate and mixing ratio of the gas to the furnace body.

[0099] A boat body for loading the battery piece and placing in the furnace body for processing. The boat body can be made of quartz material to avoid reaction with the battery piece or gas in the furnace body.

[0100] A temperature control assembly for adjusting the temperature in the furnace body according to the diffusion process requirements of the battery piece, such as controlling the temperature in the furnace body at 800-1100℃.

[0101] In other embodiments, the diffusion system can also increase other devices, assemblies or systems according to requirements.

[0102] It should be noted that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. The orientation words "inner, outer" refer to the inner and outer relative to the contour of each component itself. For example, if the device in the drawing is inverted, the device described as "above" or "above" other devices or structures will be positioned "below" or "below" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below" orientations. The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein are interpreted accordingly.

[0103] It should also be noted that "one embodiment", "another embodiment", "embodiment" and the like in the present application refer to specific features, structures or characteristics described in conjunction with the embodiment, which are included in at least one embodiment described generally in the present application. The same expression appears in several places in the specification does not necessarily refer to the same embodiment. Further, when a specific feature, structure or characteristic is described in conjunction with any embodiment, it is claimed that the implementation of such feature, structure or characteristic in conjunction with other embodiments also falls within the scope of the present application.

[0104] In the above embodiments, the description of each embodiment has its own focus, and the parts not described in detail in a certain embodiment can be referred to the relevant description of other embodiments.

[0105] It also needs to be explained that the above is only the preferred embodiment of the application, and does not limit the patent protection scope of the application, and any equivalent structure or equivalent process transformation using the content of the application specification and drawings, or direct or indirect application in other related technical fields, are also included in the patent protection scope of the application.

Claims

1. An exhaust gas treatment apparatus, characterized by, The application relates to a device for treating tail gas generated by a boron diffusion device, wherein the tail gas contains first particles and second particles, and the device comprises: a catalytic assembly for receiving the tail gas, wherein a catalyst is arranged in the catalytic assembly; under the influence of the catalyst and first preset conditions, the first particles are converted into third particles which are easy to ionize; an ionization assembly for receiving the tail gas after the catalytic assembly; under second preset conditions, the ionization assembly is used for converting the second particles and the third particles into ionized particles, wherein the ionized particles comprise positive ions and negative ions; an ion capture assembly for receiving the tail gas after the ionization assembly, wherein the ion capture assembly comprises a reaction box, and a capture agent is arranged in the reaction box, and the capture agent is used for capturing the positive ions and the negative ions.

2. The exhaust treatment apparatus of claim 1, wherein, The catalyst comprises any one of a platinum metal catalyst, a rhodium metal catalyst, a vanadium oxide catalyst and a tungsten oxide catalyst.

3. The exhaust treatment apparatus of claim 1, wherein, The first preset conditions comprise: a reaction gas is arranged in the catalytic assembly.

4. The exhaust treatment apparatus of claim 1, wherein, The ionization assembly comprises an ionization cavity for receiving the tail gas after the catalytic assembly, and the second preset conditions comprise: a preset electric field intensity is applied in the ionization cavity.

5. The exhaust treatment device of claim 4, wherein, The ionization assembly further comprises a high-curvature needle arranged in the ionization cavity and used for applying the preset electric field intensity in the ionization cavity.

6. The exhaust treatment apparatus of claim 1, wherein, The ion capture assembly further comprises an electric field assembly arranged in the reaction box, and opposite ends of the reaction box are respectively provided with a first gas inlet and a first gas outlet; the electric field assembly comprises: a positive plate arranged on a first inner wall of the reaction box; a negative plate arranged on a second inner wall of the reaction box and spaced apart from the positive plate; wherein the first inner wall and the second inner wall are arranged oppositely between the first gas inlet and the first gas outlet; an offset electric field is formed between the positive plate and the negative plate, and the offset electric field guides the negative ions to be close to the positive plate and guides the positive ions to be close to the negative plate.

7. The exhaust treatment device of claim 6, wherein, The electric field assembly further comprises: a direct-current power supply, wherein a positive electrode is electrically connected to the positive plate, and a negative electrode is electrically connected to the negative plate; a capacitor connected in parallel to the direct-current power supply.

8. The exhaust treatment device of claim 6, wherein, The capture agent comprises: a positive ion capture agent arranged between the positive plate and the negative plate and close to the negative plate; a negative ion capture agent arranged between the positive plate and the negative plate and close to the positive plate.

9. The off-gas treatment apparatus according to any one of claims 1 to 8, characterized by The device further comprises a membrane filtration assembly in communication with the ion capture assembly, and the membrane filtration assembly comprises: a filtration box provided with a second gas inlet and a second gas outlet at two ends, wherein the second gas inlet is used for receiving the tail gas after the ion capture assembly; a filtration membrane intercepted between the second gas inlet and the second gas outlet and used for filtering residual first particles and second particles in the tail gas.

10. A method of tail gas treatment, characterized by, A method for treating tail gas by using the tail gas treatment device according to any one of claims 1 to 9, and the method comprises the following steps: passing the tail gas into the catalytic assembly, and converting the first particles into third particles which are easy to ionize under first preset conditions; The tail gas after passing through the catalytic assembly is introduced into an ionization assembly, and under a second preset condition, the first particles and the third particles in the tail gas are ionized into ionic particles; The tail gas after passing through the ionization assembly is introduced into an ion capture assembly, and the ion capture assembly is used for capturing the ionic particles.

11. A diffusion system characterized by, The tail gas treatment equipment comprises the tail gas treatment equipment according to any one of claims 1-9.

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