A tail gas treatment device for producing chlorotrifluorotoluene

By designing exhaust gas treatment equipment for chlorotrifluorotoluene production, using sodium hydroxide solution to neutralize hydrogen chloride and hydrogen fluoride gas, and accelerating the reaction through vortex and power regulation, the problem of harmful gas treatment in the production process of chlorotrifluorotoluene is solved, achieving efficient and safe exhaust purification.

CN119455639BActive Publication Date: 2025-05-06JIANGSU FENGHUA CHEM IND
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Patent Information

Application Number
CN202510065305.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-01-16
Publication Date
2025-05-06
Estimated Expiration
2045-01-16

AI Technical Summary

Technical Problem

The large number of harmful gases produced in the production of chlorotrifluorotoluene, such as hydrogen fluoride, hydrogen chloride and chlorine, need to be efficiently treated to avoid environmental pollution and human harm.

Method used

A exhaust gas treatment equipment is designed, including a first reaction cell, a second reaction cell and a third reaction cell. The hydrogen chloride and hydrogen fluoride gas in the exhaust gas are neutralized by sodium hydroxide solution, and the neutralization reaction is accelerated through a vortex mechanism and a power regulation mechanism to improve the treatment efficiency.

Benefits of technology

Effectively neutralize and remove hydrogen chloride and hydrogen fluoride gas from the exhaust gas, improve the efficiency and safety of exhaust gas treatment, and ensure environmental protection and human health.

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Abstract

The invention discloses a tail gas treatment device for producing chlorotrifluorotoluene, relates to the technical field of tail gas treatment, comprises a first reaction pool, a second reaction pool and a third reaction pool, wherein sodium hydroxide solution is arranged in the first reaction pool and the second reaction pool, and clean water is arranged in the third reaction pool; a power regulating mechanism is arranged at the upper end of the second reaction pool, wherein a movable plug is arranged in the power regulating mechanism, a sliding plate is connected to the plug, and the sliding plate can change the resistance value of a rheostat; a vortex mechanism is arranged inside the second reaction pool, wherein the vortex mechanism is used for stirring the sodium hydroxide solution, and an air outlet pipe of a first communicating pipe is arranged inside the vortex mechanism; a motor for controlling the rotation of the vortex mechanism is connected in series with the rheostat; the invention has the beneficial effects of utilizing the first reaction pool, the second reaction pool and the third reaction pool to treat hydrogen fluoride gas, hydrogen chloride gas and chlorine gas in tail gas, optimizing the treatment method of hydrogen fluoride gas, and ensuring that hydrogen fluoride gas can be completely eliminated.
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Description

Technical Field

[0001] The invention relates to the technical field of tail gas treatment, in particular to a tail gas treatment device for producing chlorotrifluorotoluene. Background Art

[0002] p-Chlorotrifluorobenzoyl is also known as p-chlorotrifluoromethylbenzene, 4-chlorobenzoyl trifluorobenzoyl, p-chlorobenzyl trifluorobenzoyl, p-chlorobenzyl trifluorobenzoyl. It is a colorless transparent liquid, insoluble in water, soluble in organic solvents such as alcohol, ether, and benzene. p-Chlorotrifluorobenzoyl is a flammable and toxic chemical that irritates the skin and eyes. It can burn and emit toxic gases when exposed to open flames, high heat, or contact with oxidants. It is mainly used as an intermediate in the production of pharmaceuticals, pesticides, and dyes.

[0003] In the production process of parachlorotrifluorotoluene, a large amount of waste gas such as hydrogen fluoride gas, hydrogen chloride gas and chlorine gas is generated. Hydrogen chloride gas is colorless and has a suffocating odor. It is highly irritating to the upper respiratory tract and corrosive to the eyes, skin and mucous membranes. Hydrogen fluoride gas is colorless and has a pungent odor. Hydrogen fluoride aqueous solution can penetrate the skin and be absorbed by the mucous membrane, respiratory tract and gastrointestinal tract, which can easily cause bone and tooth deformities. Chlorine gas is a highly toxic gas with a strong pungent odor. Therefore, such harmful gases generated and discharged during the production process need to be absorbed and removed before being discharged to avoid polluting the environment and causing harm to the human body. Summary of the invention

[0004] Some simplifications or omissions may be made in this section and the abstract and title of the present application to avoid obscuring the purpose of this section, the abstract and the title of the invention, and such simplifications or omissions shall not be used to limit the scope of the present invention.

[0005] In view of the above problems or problems existing in the prior art, the present invention is proposed.

[0006] Therefore, the object of the present invention is to provide a tail gas treatment device for producing chlorobenzotrifluoride, which can solve the problem of large amounts of hydrogen fluoride gas, hydrogen chloride gas and chlorine gas generated in the production process of para-chlorobenzotrifluoride.

[0007] To solve the above technical problems, the present invention provides the following technical solutions: an exhaust gas treatment device for producing chlorotrifluorotoluene, comprising a first reaction tank, a second reaction tank and a third reaction tank, wherein a sodium hydroxide solution is arranged in the first reaction tank and the second reaction tank, and clean water is arranged in the third reaction tank; the first reaction tank and the second reaction tank are connected through a first connecting pipe; the second reaction tank and the third reaction tank are connected through a second connecting pipe;

[0008] A power regulating mechanism is provided at the upper end of the second reaction pool, a movable plug is provided in the regulating cavity of the power regulating mechanism, a sliding piece is connected to the plug, and the resistance value of the rheostat changes with the movement of the sliding piece;

[0009] A vortex mechanism is provided inside the second reaction tank, the vortex mechanism is used to stir the sodium hydroxide solution, and an air outlet pipe of the first communicating pipe is provided inside the vortex mechanism;

[0010] The motor for rotating the scroll mechanism is connected in series with the variable resistor.

[0011] As a preferred embodiment of the tail gas treatment equipment for producing chlorotrifluorotoluene described in the present invention, the first connecting pipe includes a second air inlet pipe, one end of the second air inlet pipe is connected to the first reaction pool, and the other end is movably connected to one end of the pipe wall through a movable joint, the other end of the pipe wall is connected to one end of the tapered pipe mouth through a rotating gear ring, the other end of the tapered pipe mouth is connected to the air outlet pipe, and the pipe wall is movably connected to the rotating gear ring;

[0012] The outer side of one end of the tube wall is provided with a liquid injection port, and the outer side of the other end is provided with a liquid outlet, the liquid injection port is placed above the liquid outlet, the inner side of the tube wall is provided with an inner core, the inner side of the inner core is provided with a limit strip, the two ends of the limit strip are respectively fixed to the movable joint and the rotating gear ring, and the liquid outlet is connected to the first reaction tank through a downpipe;

[0013] The rotating gear ring is meshed with a driving gear, the driving gear is connected to an output end of a rotating motor, and the rotating motor is fixed to an upper end of the second reaction tank.

[0014] As a preferred embodiment of the tail gas treatment equipment for producing chlorotrifluorotoluene described in the present invention, the outlet pipe runs through the power regulating mechanism, the output end of the outlet pipe is placed on the bottom surface of the second reaction tank, and a hole is provided on the side of the outlet pipe;

[0015] The air outlet pipe also passes through the plug, and the edge of the plug fits the inner wall of the power regulating mechanism; the upper end of the plug is connected to the slide through a vertical rod, and the slide is slidably arranged on the resistance wire of the rheostat.

[0016] As a preferred solution of the tail gas treatment equipment for producing chlorotrifluorotoluene described in the present invention, wherein: the outlet pipe is fixed to the rotating shaft inside the second reaction tank, the lower end of the rotating shaft is connected to one end of the vortex mechanism through a fixing block, the vortex mechanism is made of a rigid material, the rotating shaft is connected to the output end of the motor, and during the rotation of the vortex mechanism, the rotation trajectory of the fixing block does not interfere with the outlet pipe;

[0017] The vortex mechanism surrounds the rotating shaft and the air outlet pipe.

[0018] As a preferred solution of the tail gas treatment equipment for producing chlorotrifluorotoluene described in the present invention, a first air inlet pipe is provided at the upper end of the first reaction pool, and a turbine is provided inside for stirring.

[0019] As a preferred embodiment of the tail gas treatment equipment for producing chlorotrifluorotoluene described in the present invention, one end of the second connecting pipe is connected to the second reaction tank, and the other end is placed on the bottom surface of the third reaction tank. A valve is also provided on the second connecting pipe.

[0020] As a preferred solution of the tail gas treatment equipment for producing chlorotrifluorotoluene described in the present invention, an expansion port is provided at the upper end of the second reaction tank, and the expansion port is connected to the inside of the power regulating mechanism.

[0021] As a preferred solution of the tail gas treatment equipment for producing chlorotrifluorotoluene described in the present invention, an exhaust port is provided at the upper end of the third reaction tank.

[0022] The beneficial effects of the present invention are as follows: in the present invention, sodium hydroxide is used to neutralize hydrogen chloride and hydrogen fluoride in the tail gas, but since hydrogen fluoride is a weak acid, the time of hydrogen fluoride neutralization reaction is longer than that of hydrogen chloride gas, so in the second reaction tank, the device can promote and accelerate the time of hydrogen fluoride neutralization reaction; in the device, a large amount of saturated sodium chloride solution is adsorbed by the inner core, and part of chlorine is absorbed and dissolved by the characteristics of the saturated sodium chloride solution, so as to increase the concentration of hydrogen fluoride gas entering the second reaction tank and improve the efficiency of the neutralization reaction; at the same time, in the process of the vortex mechanism rotating and stirring the sodium hydroxide solution, the sodium hydroxide solution forms a vortex, and the output port at the lower end of the gas outlet pipe inputs a mixed gas of hydrogen fluoride and chlorine into the sodium hydroxide solution, and the side also outputs the mixed gas, at this time, the hydrogen fluoride gas can contact the surface of the sodium hydroxide solution, thereby increasing the contact area between the hydrogen fluoride gas and the sodium hydroxide solution;

[0023] At the same time, the valve is in a closed state, and the mixed gas of hydrogen fluoride and chlorine is retained in the second reaction pool. As the neutralization reaction proceeds, the temperature inside the second reaction pool increases, and the internal gas pressure increases. At the same time, the amount of alkaline solution in the second reaction pool decreases, and the neutralization reaction rate decreases. In order to compensate for this defect, the plug is raised by air pressure, and then the resistance of the rheostat is changed by the sliding plate, the output power of the shaft drive motor is increased, the stirring speed is accelerated, and the neutralization speed of hydrogen fluoride and sodium hydroxide solution is increased;

[0024] As the pressure in the second reaction tank further increases, the holes on the side of the outlet pipe can also effectively prevent the solution in the second reaction tank from flowing back along the outlet pipe. Finally, the valve is opened to treat the chlorine in the exhaust gas, thereby ultimately purifying the exhaust gas. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. Among them:

[0026] Figure 1 It is an overall schematic diagram of a tail gas treatment device for producing chlorotrifluorotoluene;

[0027] Figure 2 The figure is a schematic diagram of the internal structure of the tail gas treatment equipment used for producing chlorotrifluorotoluene;

[0028] Figure 3 It is a schematic diagram of the structure of the second reaction tank of the tail gas treatment equipment used for producing chlorotrifluorotoluene;

[0029] Figure 4 A schematic diagram of the first connecting pipeline structure of the tail gas treatment equipment for producing chlorotrifluorotoluene;

[0030] Figure 5 For tail gas treatment equipment used in the production of chlorotrifluorotoluene Figure 4 The enlarged schematic diagram at A in the middle;

[0031] Figure 6 This is a schematic diagram of the principle of the tail gas treatment equipment used to produce chlorotrifluorotoluene.

[0032] Markings in the figure: 100, first reaction pool; 200, second reaction pool; 300, third reaction pool; 400, first connecting pipe; 500, vortex mechanism; 600, power regulating mechanism; 700, second connecting pipe; 101, first air inlet pipe; 102, turbine; 201, expansion port; 301, exhaust port; 401, second air inlet pipe; 402, pipe wall; 403, movable joint; 404, inner core; 405, liquid injection port; 406, rotating gear ring; 407, tapered pipe mouth; 408, driving gear; 409, rotating motor; 410, liquid outlet; 411, sewer pipe; 412, limit strip; 413, air outlet pipe; 501, rotating shaft; 502, fixing block; 601, regulating chamber; 602, plug; 603, vertical rod; 604, sliding vane; 605, rheostat; 701, valve. DETAILED DESCRIPTION

[0033] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below in conjunction with the accompanying drawings.

[0034] In the following description, many specific details are set forth to facilitate a full understanding of the present invention, but the present invention may also be implemented in other ways different from those described herein, and those skilled in the art may make similar generalizations without violating the connotation of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0035] Secondly, the term "one embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The term "in one embodiment" that appears in different places in this specification does not necessarily refer to the same embodiment, nor is it a separate or selective embodiment that is mutually exclusive with other embodiments.

[0036] Example: Refer to Figure 1 to Figure 6 , is the first embodiment of the present invention, which provides an exhaust gas treatment device for producing chlorotrifluorotoluene, comprising a first reaction tank 100, a second reaction tank 200 and a third reaction tank 300, wherein a sodium hydroxide solution is provided in the first reaction tank 100 and the second reaction tank 200, and clean water is provided in the third reaction tank 300; the first reaction tank 100 and the second reaction tank 200 are connected through a first connecting pipe 400; the second reaction tank 200 and the third reaction tank 300 are connected through a second connecting pipe 700;

[0037] A power regulating mechanism 600 is provided at the upper end of the second reaction pool 200. A movable plug 602 is provided in a regulating cavity 601 of the power regulating mechanism 600. A sliding piece 604 is connected to the plug 602. The resistance value of the variable resistor 605 changes with the movement of the sliding piece 604.

[0038] A vortex mechanism 500 is provided inside the second reaction tank 200, and the vortex mechanism 500 is used to stir the sodium hydroxide solution. An outlet pipe 413 of the first connecting pipe 400 is provided inside the vortex mechanism 500;

[0039] The motor for rotating the scroll mechanism 500 and the rheostat 605 are connected in series.

[0040] The first connecting pipe 400 includes a second air inlet pipe 401, one end of which is connected to the first reaction pool 100, and the other end of which is movably connected to one end of a pipe wall 402 through a movable joint 403, and the other end of the pipe wall 402 is connected to one end of a tapered pipe mouth 407 through a rotating gear ring 406, and the other end of the tapered pipe mouth 407 is connected to an air outlet pipe 413, and the pipe wall 402 is movably connected to the rotating gear ring 406;

[0041] An injection port 405 is provided on the outer side of one end of the tube wall 402, and an outlet port 410 is provided on the outer side of the other end. The injection port 405 is placed above the outlet port 410. An inner core 404 is provided on the inner side of the tube wall 402. A limit strip 412 is provided on the inner side of the inner core 404. Both ends of the limit strip 412 are respectively fixed to the movable joint 403 and the rotating gear ring 406. The outlet port 410 is connected to the first reaction tank 100 through a down pipe 411.

[0042] The rotating gear ring 406 is meshed with a driving gear 408 . The driving gear 408 is connected to an output end of a rotating motor 409 . The rotating motor 409 is fixed at the upper end of the second reaction tank 200 .

[0043] The gas outlet pipe 413 passes through the power regulating mechanism 600, the output end of the gas outlet pipe 413 is placed on the bottom surface of the second reaction tank 200, and a hole is provided on the side of the gas outlet pipe 413;

[0044] The air outlet pipe 413 also passes through the plug 602 , and the edge of the plug 602 is in contact with the inner wall of the power regulating mechanism 600 ; the upper end of the plug 602 is connected to the slide 604 through the vertical rod 603 , and the slide 604 is slidably arranged on the resistance wire of the rheostat 605 .

[0045] Preferably, the inner diameter of the inner core 404 is larger than the inner diameter of the outlet pipe 413 , and the inner core 404 is used to absorb the chlorine in the hydrogen fluoride and chlorine mixture to a large extent. At the same time, the outlet pipe 413 is used to increase the concentration of the hydrogen fluoride gas in the second reaction tank 200 .

[0046] Preferably, the tube wall 402 is made of absorbent sponge, and a saturated sodium chloride solution is injected into the interior through the injection port 405. Due to the effect of gravity, the sodium chloride solution stays below the inner core 404, and the inner core 404 is driven to rotate by the rotating gear ring 406, so that the sodium chloride solution is fully adsorbed in the inner core 404. As the sodium chloride solution is continuously input, the sodium chloride solution after absorbing chlorine enters the first reaction tank 100 along the downcomer 411.

[0047] Preferably, two ends of the limiting strip 412 are respectively fixed to the movable joint 403 and the rotating gear ring 406 , and at the same time, the limiting strip 412 carries the inner core 404 and rotates along with the rotating gear ring 406 .

[0048] The gas outlet pipe 413 is fixed to the rotating shaft 501 inside the second reaction tank 200. The lower end of the rotating shaft 501 is connected to one end of the vortex mechanism 500 through the fixing block 502. The vortex mechanism 500 is made of a rigid material. The rotating shaft 501 is connected to the output end of the motor. During the rotation of the vortex mechanism 500, the rotation track of the fixing block 502 does not interfere with the gas outlet pipe 413.

[0049] The scroll mechanism 500 surrounds the rotating shaft 501 and the air outlet duct 413 .

[0050] A first air inlet pipe 101 is disposed at the upper end of the first reaction tank 100 , and a turbine 102 is disposed inside for stirring.

[0051] One end of the second connecting pipe 700 is connected to the second reaction tank 200 , and the other end is placed on the bottom surface of the third reaction tank 300 . A valve 701 is also provided on the second connecting pipe 700 .

[0052] An expansion port 201 is provided at the upper end of the second reaction tank 200 , and the expansion port 201 is connected to the inside of the power regulating mechanism 600 .

[0053] Preferably, the aperture of the expansion port 201 is smaller than the inner diameter of the power regulating mechanism 600 , so that the plug 602 will not fall off from the power regulating mechanism 600 when it is not squeezed by gas.

[0054] An exhaust port 301 is provided at the upper end of the third reaction tank 300 .

[0055] Preferably, the sodium hydroxide solution in the second reaction tank 200 reacts with hydrogen fluoride to neutralize, and the temperature inside the second reaction tank 200 rises to 70 to 100 degrees Celsius. At this time, the water inside the second reaction tank 200 evaporates and the pressure inside the second reaction tank 200 increases.

[0056] like Figure 6 As shown, the mixed gas inside the outlet pipe 413 is discharged from the through holes at the bottom and the side, the sodium hydroxide solution inside the second reaction tank 200 is stirred to form a vortex, the mixed gas discharged from the bottom of the outlet pipe 413 enters the sodium hydroxide solution, and the mixed gas discharged from the side contacts the surface of the vortex. In the mixed gas, the hydrogen fluoride gas reacts with the sodium hydroxide solution inside on the one hand, and contacts the liquid surface of the sodium hydroxide solution on the other hand to react with the hydrogen fluoride gas.

[0057] When in use, the tail gas is introduced from the first air inlet pipe 101, the valve 701 is closed, and the tail gas enters the first reaction tank 100, and the hydrogen chloride gas and hydrogen fluoride gas in the tail gas are neutralized with the sodium hydroxide in the first reaction tank 100. Since the hydrogen chloride gas is a strong acid gas and the hydrogen fluoride gas is a weak acid gas, the hydrogen chloride gas will be quickly consumed in the first reaction tank 100, but the hydrogen fluoride gas will be partially consumed, but some of the gas will not have time to react and enter the first connecting pipe 400. In the first connecting pipe 400, part of the chlorine gas will be dissolved in the saturated sodium chloride solution. At this time, the hydrogen fluoride gas and the chlorine gas enter the second Inside the reaction pool 200, as the neutralization reaction inside the second reaction pool 200 proceeds, the amount of alkaline solution inside the second reaction pool 200 decreases, and the neutralization reaction rate decreases, but the temperature inside the second reaction pool 200 increases, and the water vapor rises to squeeze and lift the plug 602, and the plug 602 drives the slide 604 to adjust and reduce the resistance value of the rheostat 605. At this time, the speed of the rotating shaft 501 increases, the stirring rate of the vortex mechanism 500 increases, and the neutralization rate of hydrogen fluoride increases; it should be supplemented that the speed increase range of the rotating shaft 501 is within a reasonable range, that is, within this range, the rates of the neutralization reaction of hydrogen fluoride gas and sodium hydroxide are positively correlated;

[0058] When the slider 604 adjusts the resistance of the rheostat 605 to the lowest, the valve 701 is opened, air is introduced into the first air inlet pipe 101, and the chlorine enters the third reaction tank 300, and is removed by dissolving the chlorine in water.

[0059] In summary, the device uses sodium hydroxide to neutralize the hydrogen chloride and hydrogen fluoride gases in the tail gas, but because hydrogen fluoride is a weak acid, the time of the hydrogen fluoride neutralization reaction is longer than the neutralization reaction time of the hydrogen chloride gas. Therefore, in the second reaction tank 200, the device will promote and accelerate the time of the hydrogen fluoride neutralization reaction; in the device, the inner core 404 is used to adsorb a large amount of saturated sodium chloride solution, and the characteristics of the saturated sodium chloride solution are used to absorb and dissolve part of the chlorine gas, thereby increasing the concentration of the hydrogen fluoride gas entering the second reaction tank 200 and improving the efficiency of the neutralization reaction. At the same time, during the process of the vortex mechanism 500 rotating and stirring the sodium hydroxide solution, the sodium hydroxide solution forms a vortex, and the output port at the lower end of the gas outlet pipe 413 will input a mixed gas of hydrogen fluoride and chlorine into the sodium hydroxide solution, and the side will also output the mixed gas. At this time, the hydrogen fluoride gas can contact the surface of the sodium hydroxide solution, increasing the contact area between the hydrogen fluoride gas and the sodium hydroxide solution;

[0060] At the same time, the valve 701 is in a closed state, and the mixed gas of hydrogen fluoride and chlorine is retained in the second reaction tank 200. As the neutralization reaction proceeds, the internal temperature of the second reaction tank 200 increases, and the internal gas pressure increases. At the same time, the amount of alkaline solution in the second reaction tank 200 decreases, and the neutralization reaction rate decreases. In order to compensate for this defect, the plug 602 is raised by air pressure, and then the resistance of the rheostat 605 is changed by the slide 604, the output power of the driving motor of the rotating shaft 501 is increased, the stirring speed is accelerated, and the neutralization speed of hydrogen fluoride and sodium hydroxide solution is increased;

[0061] As the pressure in the second reaction tank 200 further increases, the holes on the side of the outlet pipe 413 can also effectively prevent the solution in the second reaction tank 200 from flowing back along the outlet pipe 413. Finally, the valve 701 is opened to treat the chlorine in the exhaust gas, thereby finally purifying the exhaust gas.

[0062] It is important to note that the construction and arrangement of the present application shown in a number of different exemplary embodiments are only exemplary. Although only a few embodiments are described in detail in this disclosure, it should be readily understood by those who refer to this disclosure that many modifications are possible (e.g., the size, scale, structure, shape and proportion of various elements, as well as parameter values ​​(e.g., temperature, pressure, etc.), mounting arrangements, use of materials, color, changes in orientation, etc.) without substantially departing from the novel teachings and advantages of the subject matter described in this application. For example, an element shown as integrally formed may be composed of multiple parts or elements, the position of the element may be inverted or otherwise changed, and the nature or number or position of the discrete element may be changed or changed. Therefore, all such modifications are intended to be included within the scope of the present invention. The order or sequence of any process or method steps may be changed or reordered according to an alternative embodiment. In the claims, any "device plus function" clause is intended to cover the structure described herein that performs the function, and is not only structurally equivalent but also equivalent structure. Other substitutions, modifications, changes and omissions may be made in the design, operating conditions and arrangement of the exemplary embodiments without departing from the scope of the present invention. Therefore, the invention is not limited to a specific embodiment, but extends to numerous modifications still falling within the scope of the appended claims.

[0063] Additionally, in order to provide a concise description of exemplary embodiments, all features of an actual embodiment may not be described (ie, those features that are not relevant to the best mode presently contemplated for carrying out the invention or those features that are not relevant to implementing the invention).

[0064] It will be appreciated that in the development of any actual implementation, as in any engineering or design project, numerous implementation-specific decisions may be made. Such a development effort may be complex and time-consuming, but will be a routine task of design, fabrication, and production for those of ordinary skill having the benefit of this disclosure without undue experimentation.

[0065] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention rather than to limit it. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present invention may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention, which should all be included in the scope of the claims of the present invention.

Claims

1. An exhaust gas treatment device for producing chlorotrifluorotoluene, comprising a first reaction tank (100), a second reaction tank (200) and a third reaction tank (300), wherein a sodium hydroxide solution is provided in the first reaction tank (100) and the second reaction tank (200), and clean water is provided in the third reaction tank (300); characterized in that: The first reaction pool (100) and the second reaction pool (200) are connected via a first connecting pipe (400), and the second reaction pool (200) and the third reaction pool (300) are connected via a second connecting pipe (700); A power regulating mechanism (600) is provided at the upper end of the second reaction pool (200), a movable plug (602) is provided in a regulating cavity (601) of the power regulating mechanism (600), a sliding piece (604) is connected to the plug (602), and the resistance value of the variable resistor (605) changes with the movement of the sliding piece (604); A vortex mechanism (500) is provided inside the second reaction pool (200), and the vortex mechanism (500) is used to stir the sodium hydroxide solution. An outlet pipe (413) of the first connecting pipe (400) is provided inside the vortex mechanism (500); The motor rotating the vortex mechanism (500) is connected in series with the rheostat (605); The first connecting pipe (400) comprises a second air inlet pipe (401), one end of the second air inlet pipe (401) is connected to the first reaction pool (100), and the other end is movably connected to one end of a pipe wall (402) via a movable joint (403), the other end of the pipe wall (402) is connected to one end of a conical pipe mouth (407) via a rotating gear ring (406), the other end of the conical pipe mouth (407) is connected to an air outlet pipe (413), and the pipe wall (402) is movably connected to the rotating gear ring (406); A liquid injection port (405) is provided on the outer side of one end of the tube wall (402), and a liquid outlet (410) is provided on the outer side of the other end, the liquid injection port (405) is placed above the liquid outlet (410), an inner core (404) is provided on the inner side of the tube wall (402), a limit strip (412) is provided on the inner side of the inner core (404), two ends of the limit strip (412) are respectively fixed to the movable joint (403) and the rotating gear ring (406), and the liquid outlet (410) is connected to the first reaction tank (100) through a down pipe (411); The rotating gear ring (406) is meshed with a driving gear (408), and the driving gear (408) is connected to the output end of a rotating motor (409), and the rotating motor (409) is fixed to the upper end of the second reaction tank (200).

2. The tail gas treatment equipment for producing chlorotrifluorotoluene as claimed in claim 1, characterized in that: The gas outlet pipe (413) passes through the power regulating mechanism (600), the output end of the gas outlet pipe (413) is placed on the bottom surface of the second reaction pool (200), and a hole is provided on the side of the gas outlet pipe (413); The air outlet pipe (413) also passes through the plug (602), the edge of the plug (602) is in contact with the inner wall of the power regulating mechanism (600), the upper end of the plug (602) is connected to the slide (604) via a vertical rod (603), and the slide (604) is slidably arranged on the resistance wire of the rheostat (605).

3. The tail gas treatment equipment for producing chlorotrifluorotoluene as claimed in claim 1, characterized in that: The gas outlet pipe (413) is fixed to the rotating shaft (501) inside the second reaction pool (200); the lower end of the rotating shaft (501) is connected to one end of the vortex mechanism (500) via a fixing block (502); the vortex mechanism (500) is made of a rigid material; the rotating shaft (501) is connected to the output end of the motor; and during the rotation of the vortex mechanism (500), the rotation trajectory of the fixing block (502) does not interfere with the gas outlet pipe (413); The vortex mechanism (500) surrounds the rotating shaft (501) and the air outlet pipe (413).

4. The tail gas treatment equipment for producing chlorotrifluorotoluene as claimed in claim 1, characterized in that: A first air inlet pipe (101) is provided at the upper end of the first reaction tank (100), and a turbine (102) is provided inside for stirring.

5. The tail gas treatment equipment for producing chlorotrifluorotoluene as claimed in claim 4, characterized in that: One end of the second connecting pipe (700) is connected to the second reaction tank (200), and the other end is placed on the bottom surface of the third reaction tank (300). The second connecting pipe (700) is also provided with a valve (701).

6. The tail gas treatment equipment for producing chlorotrifluorotoluene as claimed in claim 5, characterized in that: An expansion port (201) is provided at the upper end of the second reaction tank (200), and the expansion port (201) is connected to the interior of the power adjustment mechanism (600).

7. The tail gas treatment equipment for producing chlorotrifluorotoluene as claimed in claim 6, characterized in that: An exhaust port (301) is provided at the upper end of the third reaction tank (300).

Citation Information

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