Cleaning device, cleaning method and computer readable storage medium
By introducing a buffer box and a pressure adjustment mechanism into the cleaning device, an efficient liquid discharge system is formed, which solves the problem of low working efficiency of the existing cleaning device, and achieves a faster cleaning process and a higher cleaning effect.
Patent Information
- Application Number
- CN202310998005.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-08-08
- Publication Date
- 2025-02-18
AI Technical Summary
The existing cleaning devices have low working efficiency and have a long cleaning process, which has the problem of low working efficiency.
A cleaning device is designed, including a cleaning tank, a buffer box, a cleaning tank drain pipe and a gas pressure adjustment mechanism. The air pressure in the buffer box is adjusted through the air pressure adjustment mechanism to make it at a low level, forming a large pressure difference, and promoting the rapid discharge of the cleaning liquid in the cleaning tank to the buffer box, thereby reducing the discharge time of the cleaning tank.
By improving the liquid discharge efficiency of the cleaning tank, the liquid discharge time of the cleaning tank is reduced, the working efficiency of the cleaning device is improved, and the air pressure adjustment of the buffer box assists boiling, improving the cleaning force and effect.
Smart Images

Figure CN119456547A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of cleaning equipment, and in particular to a cleaning device, a cleaning method and a computer-readable storage medium. Background Art
[0002] In industrial, medical and laboratory applications, cleaning devices are required to clean medical instruments, electronic parts or mechanical parts. In these application areas, cleaning is an important safety and hygiene link. Cleaning devices can effectively remove dirt, bacteria and other harmful substances, thereby reducing the risk of contamination and cross infection.
[0003] The current cleaning devices are mainly of the following types: solution cleaning: using chemical solutions to clean surface dirt and impurities, such as acid cleaning, alkali cleaning, solvent cleaning, etc.; water flushing: using the impact force and flow force of water to wash away surface dirt and impurities; ultrasonic cleaning: using the mechanical action of high-frequency ultrasonic vibrations and the effect of bubble bursting to clean surface dirt and impurities.
[0004] In addition, Patent Document 1 discloses a cleaning device that causes boiling to achieve effective cleaning of the object to be cleaned. The cleaning device comprises: a cleaning tank in which a cleaning liquid is stored and the object to be cleaned is immersed in the cleaning liquid; and a decompression mechanism that sucks and discharges the gas in the cleaning tank to the outside to decompress the cleaning tank. While the object to be cleaned is immersed in the cleaning liquid in the cleaning tank, the cleaning tank is decompressed to make the cleaning liquid boil, and the cleaning of the object to be cleaned can be achieved by the shaking of the cleaning liquid caused thereby. Specifically, the vacuum generating device is operated to suck and discharge the gas in the cleaning tank to the outside, and the cleaning liquid in the cleaning tank is made to boil by decompression. In order to make the cleaning liquid in the cleaning tank boilable, it is basically necessary to make the pressure in the cleaning tank below the vapor pressure of the cleaning liquid in the cleaning tank. After the cleaning is performed by decompression and boiling, the pressure in the cleaning tank is restored to atmospheric pressure, and the cleaning liquid in the cleaning tank is discharged.
[0005] However, in the cleaning device of the prior art, since the cleaning process includes multiple steps and the cleaning tank can only start the next stage of cleaning operation after the cleaning liquid is emptied, the cleaning process takes a long time and has a problem of low work efficiency.
[0006] Therefore, how to provide a cleaning device and a cleaning method thereof to improve the working efficiency of the cleaning device has become a problem that needs to be solved.
[0007] Prior art literature
[0008] Patent document 1: CN102413952A Summary of the invention
[0009] In view of the problem of low working efficiency of the cleaning devices in the prior art, the present invention provides a cleaning device, comprising: a cleaning tank, provided with a cleaning tank drain port; a buffer box, provided with a buffer box inlet, receiving the cleaning liquid from the cleaning tank; a cleaning tank drain pipe, connecting the cleaning tank drain port and the buffer box inlet; a drain valve, controlling the on-off of the cleaning tank drain pipe; and an air pressure regulating mechanism, which is connected to the buffer box and can regulate the air pressure in the buffer box.
[0010] After careful research, the inventors of this application have noticed that in order to improve the cleaning efficiency, it is possible to consider improving the drainage efficiency in the drainage process. According to the above technical solution, the drainage pipe of the cleaning tank connects the cleaning tank and the buffer tank, and when the drainage valve is opened, the cleaning liquid in the cleaning tank can be discharged into the buffer tank. Since the air pressure regulating mechanism can adjust the air pressure in the buffer tank, the air pressure in the buffer tank is at a lower level than the air pressure in the cleaning tank, that is, a state of higher vacuum. As a result, a large pressure difference is formed in the cleaning tank and the buffer tank, so that the cleaning liquid in the cleaning tank can be discharged to the buffer tank faster, thereby reducing the drainage time of the cleaning tank. After the cleaning tank discharges the cleaning liquid to the buffer tank, the cleaning tank can proceed to the next operation in time, effectively improving the working efficiency of the cleaning device.
[0011] Preferably, the cleaning device also includes: a first air circuit interface, which is arranged in the cleaning tank; a second air circuit interface, which is arranged in the buffer box; a ventilation pipe, which connects the first air circuit interface and the second air circuit interface; and a ventilation valve, which is arranged in the ventilation pipe to control the opening and closing of the ventilation pipe.
[0012] According to the above technical solution, since the cleaning tank and the buffer tank are connected through a vent pipe in addition to the drainage pipe, the buffer tank can also assist boiling in addition to the function of assisting in accelerating the drainage. Specifically, when the buffer tank is in a state of low air pressure, the air pressure of the cleaning tank connected thereto can be reduced quickly after the vent valve is opened. After the air pressure of the cleaning tank is reduced quickly, the liquid in the cleaning tank boils more quickly, thereby increasing the cleaning strength and facilitating the cleaning effect of the cleaning device.
[0013] Preferably, the buffer tank is provided with a buffer tank drain port, and the gas pressure in the buffer tank is different when the cleaning liquid is received and when the cleaning liquid is discharged from the buffer tank drain port.
[0014] According to the above technical solution, when the buffer box receives the cleaning liquid, a large pressure difference needs to be formed to allow the cleaning tank to discharge the cleaning liquid to the buffer box more quickly, so the air pressure in the buffer box is at a low level. During the discharge process of the buffer box discharge port, it is preferred to increase the air pressure of the buffer box to form a larger pressure difference, so that the cleaning liquid accumulated in the buffer box can be discharged more quickly.
[0015] Preferably, the cleaning tank is further provided with a cleaning liquid supply unit for supplying a predetermined amount of cleaning liquid to the cleaning tank when the cleaning device is in a non-cleaning state.
[0016] According to the above technical solution, it is possible to prevent the cleaning liquid from solidifying in the cleaning liquid supply part when the cleaning tank is not used for a long time, which is beneficial to prolonging the service life of the cleaning device.
[0017] Preferably, the cleaning liquid supply unit has a heater for heating the cleaning liquid to be introduced into the cleaning tank.
[0018] According to the above technical solution, the cleaning liquid supply unit has a heater, which can preheat the cleaning liquid and supply the heated cleaning liquid to the cleaning tank, thereby saving the time of heating the cleaning liquid in the cleaning tank and further improving the cleaning efficiency.
[0019] Preferably, the air pressure regulating mechanism includes a first vacuum pump and a second vacuum pump, the first vacuum pump can regulate the air pressure in the cleaning tank, and the second vacuum pump can regulate the air pressure in the buffer box.
[0020] According to the above technical solution, the air pressure of the cleaning tank and the buffer tank can be precisely adjusted, so that the cleaning process of the cleaning device can be more accurately controlled. In particular, by setting up two vacuum pumps, namely the first vacuum pump and the second vacuum pump, pressure comparison feedback control of the cleaning tank and the buffer tank can be achieved.
[0021] The present invention also provides a cleaning method for a cleaning device, the cleaning device comprising a cleaning tank, a buffer box, a cleaning tank drain pipe and an air pressure regulating mechanism, the cleaning tank drain pipe is respectively connected to the cleaning tank and the buffer box, the air pressure regulating mechanism is connected to the buffer box, the cleaning method comprises: a pressure regulating step, regulating the gas pressure of the buffer box by the air pressure regulating mechanism; a cleaning tank draining step, the cleaning liquid in the cleaning tank is discharged to the buffer box through the cleaning tank drain pipe; a buffer box draining step, the buffer box discharges the cleaning liquid from the cleaning tank.
[0022] Preferably, the cleaning device further comprises a ventilation pipe connecting the cleaning tank and the buffer tank and a ventilation valve arranged on the ventilation pipe, and the cleaning method of the cleaning device further comprises: a ventilation step, and the ventilation valve is opened when the cleaning device is in a cleaning state.
[0023] The present invention also provides a computer-readable storage medium storing processor-readable instructions, and one or more processors execute the cleaning method of the cleaning device of any of the above technical solutions by running the processor-readable instructions. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] Figure 1 is a schematic diagram of a module of a cleaning device according to a first embodiment of the present invention;
[0025] Figure 2 is a schematic diagram of a module of a cleaning device according to a second embodiment of the present invention;
[0026] Figure 3 is a schematic diagram of a module of a cleaning device according to a third embodiment of the present invention;
[0027] Figure 4 This is a flow chart of a cleaning method of a cleaning device according to a fourth embodiment of the present invention.
[0028] Figure numerals: 1 cleaning tank; 2 buffer box; 3 cleaning tank drain pipe; 4 drain valve; 5 air pressure regulating mechanism; 6 cleaning tank drain port; 7 buffer box inlet; 8 first air path interface; 9 second air path interface; 10 ventilation pipe; 11 ventilation valve; 12 buffer box drain port; 13 cleaning liquid supply part; 14 heater; 15 first vacuum pump; 16 second vacuum pump; 17 vacuum pump; 18 air pressure sensor; 19 air pressure return valve. DETAILED DESCRIPTION
[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0030] First embodiment
[0031] Figure 1 Schematic diagram of a cleaning device according to the first embodiment of the present invention. Figure 1 As shown, the cleaning device provided in this embodiment includes a cleaning tank 1, which is used to accommodate the object to be cleaned and clean the object to be cleaned, and its shape is not particularly limited. A cleaning tank drain port 6 is provided at the bottom of the cleaning tank 1, and after the cleaning process is completed, the cleaning liquid is discharged from the cleaning tank drain port 6 to the outside of the cleaning tank 1. It should be noted that the position of the cleaning tank drain port 6 is not limited to the bottom of the cleaning tank 1, as long as the cleaning liquid can be discharged from the cleaning tank 1 to the outside. In addition, further, the cleaning device also includes a buffer box 2. A buffer box inlet 7 is provided in the buffer box 2, and the buffer box inlet 7 and the cleaning tank drain port 6 are interconnected via the cleaning tank drain pipe 3. A drain valve 4 is provided in the cleaning tank drain pipe 3, and the specific position of the drain valve 4 is not limited, as long as the on and off of the cleaning tank drain pipe 3 can be controlled. After the drain valve 4 is opened (connected), the buffer box 2 can receive the cleaning liquid discharged from the cleaning tank 1 via the cleaning tank drain pipe 3.
[0032] Furthermore, the cleaning device is also provided with an air pressure regulating mechanism 5. The air pressure regulating mechanism 5 is connected to the buffer tank 2 and can regulate the air pressure in the buffer tank 2. When the drain valve 4 is opened, the cleaning liquid in the cleaning tank 1 can be discharged to the buffer tank 2 via the cleaning tank drain pipe 3. In actual operation, when the cleaning liquid in the cleaning tank 1 is cleaned and needs to be discharged, the air pressure in the cleaning tank 1 is re-pressurized from the low air pressure during boiling cleaning to atmospheric pressure or a pressure substantially at atmospheric pressure, thereby discharging the cleaning liquid. When the drain valve 4 is opened, the air pressure regulating mechanism 5 is controlled by a control mechanism not shown in the figure so as to work synchronously or slightly later, thereby regulating the air pressure in the buffer tank 2. More specifically, the air pressure regulating mechanism 5 is used to reduce the air pressure of the buffer tank 2, thereby forming a greater pressure difference between the cleaning tank 1 and the buffer tank 2, so that the cleaning liquid in the cleaning tank 1 can be discharged to the buffer tank 2 more quickly. After the cleaning tank 1 quickly discharges the cleaning liquid to the buffer tank 2, the cleaning tank 1 can start the next operation, such as cleaning, rinsing or drying. As a result, the draining time of the cleaning tank 1 is greatly reduced, thereby improving the working efficiency of the cleaning device.
[0033] Specifically, according to the Orifice flow calculation formula:
[0034]
[0035] Q: flow rate, m 3 / s; C: flow coefficient;
[0036] Cross-sectional area, m 2 ; ρ: fluid density, kg / m3; ΔP: upstream and downstream pressure difference, Pa.
[0037] From the above formula, we can know that the water flow rate out of the drain valve 4 is the square root of the pressure difference (assuming that the cleaning tank 1 is at normal atmospheric pressure and the buffer tank 2 is at 0.05 times atmospheric pressure, the pressure difference can be calculated). When the pressure difference is 20 times, there will be Therefore, the drainage time after setting the buffer tank 2 can be reduced to about 1 / 5 of the original time, which significantly improves the drainage speed and greatly reduces the drainage time.
[0038] In this embodiment, the air pressure of the buffer tank 2 is adjusted by the air pressure regulating mechanism 5 to maintain it at a relatively low level, but the air pressure of the buffer tank 2 is not simply reduced. Specifically, the air pressure of the buffer tank 2 is adjusted to be slightly higher than the pressure in the cleaning tank 1 in the exhaust procedure, that is, slightly higher than the pressure that causes the liquid in the cleaning tank 1 to boil suddenly, so as to avoid excessive vacuum in the buffer tank 2 causing sudden boiling of the cleaning liquid during drainage, thereby ensuring the normal and stable drainage process.
[0039] If the cleaning liquid boils suddenly, the load of the air pressure regulating mechanism 5 will increase, which will cause waste and reduce the working efficiency of the air pressure regulating mechanism 5, resulting in a longer time required to reach a high vacuum. However, a high vacuum can still be achieved. Therefore, even if the air pressure regulating mechanism 5 does not maintain the buffer tank 2 at a pressure close to the saturated vapor pressure of the cleaning liquid, the cleaning device in this embodiment can still drain the cleaning tank 1 into the buffer tank 2.
[0040] The buffer tank 2 is kept in a high vacuum state when no cleaning liquid is stored. For example, after the power of the cleaning device is turned on (the power is turned on but not started), the buffer tank 2 is automatically controlled to be in a high vacuum state through the air pressure regulating mechanism 5. In addition, when the power is turned off at night, the high vacuum state of the buffer tank 2 is still maintained.
[0041] During the operation of the cleaning device, the buffer tank 2 is maintained at a high vacuum in a liquid-free state through the air pressure regulating mechanism 5. For example, after the cleaning liquid is supplied to the cleaning tank 1, the cleaning liquid in the cleaning tank 1 needs to be heated, and during the heating period (about 5 minutes), the liquid is drained in the buffer tank 2. The air pressure of the buffer tank 2 is high during the drainage to facilitate the drainage, and after the drainage of the buffer tank 2 is completed, it returns to a high vacuum state.
[0042] The cleaning liquid in this embodiment can be a mixture of alkaline detergent and water, or a neutral detergent, rust inhibitor or enzyme detergent, etc. The cleaning liquid can also be soft water, pure water, solvent and other liquid water that can be used for cleaning, which is not specifically limited here. It should be noted that in this embodiment, the cleaning liquid used in different stages is not necessarily the same. For example, during rinsing, the cleaning liquid is hot water or pure water. In addition, the cleaning liquid in this embodiment is a broad concept and does not necessarily mean that it must be in liquid state. For example, it can also be a gas-liquid mixture state, etc.
[0043] In this embodiment, the air pressure regulating mechanism 5 includes a vacuum pump 17 , which is connected to the cleaning tank 1 and the buffer tank 2 , respectively, so that the vacuum degree of the cleaning tank 1 or the buffer tank 2 can be adjusted as needed.
[0044] The air pressure regulating mechanism 5 also includes an air pressure sensor 18 arranged in the cleaning tank 1 and the buffer box 2. The air pressure sensor 18 can detect the air pressure in the cleaning tank 1 and the buffer box 2, thereby helping the air pressure regulating mechanism 5 to more accurately regulate the air pressure in the cleaning tank 1 and the buffer box 2.
[0045] Furthermore, the air pressure regulating mechanism 5 also includes an air pressure return valve 19, and both the cleaning tank 1 and the buffer tank 2 are provided with an air pressure return valve 19. When the air pressure return valve 19 is opened, the cleaning tank 1 or the buffer tank 2 can be connected to the outside atmospheric pressure, so that the air pressure in the cleaning tank 1 or the buffer tank 2 can be returned to the atmospheric pressure when necessary.
[0046] like Figure 1 As shown, by additionally providing a buffer box 2 and adjusting the air pressure in the buffer box 2 through the air pressure regulating mechanism 5, even a cleaning tank drain pipe 3 with a smaller diameter can quickly discharge the cleaning liquid in the cleaning tank 1, without using a cleaning tank drain pipe 3 with a larger diameter, which is beneficial to reducing production and manufacturing costs. For example, in this embodiment, the cleaning tank drain pipe 3 can achieve a faster drainage speed by using a pipe with a diameter of 32A to 40A, without using a thicker pipe, which is beneficial to reducing pipe costs. In addition, the valve cost that matches the pipe with a diameter of 32A to 40A is relatively low, further reducing production and manufacturing costs.
[0047] Second embodiment
[0048] Figure 2 Schematic diagram of a cleaning device according to a second embodiment of the present invention. Figure 2 As shown, in this embodiment, the air pressure regulating mechanism 5 includes a first vacuum pump 15 for regulating the air pressure of the cleaning tank 1, and a second vacuum pump 16 for regulating the air pressure of the buffer tank 2. This enables accurate regulation of the air pressure of the cleaning tank 1 and the buffer tank 2, thereby enabling more accurate control of the cleaning process of the cleaning device. In particular, by using a dual-pump arrangement of two vacuum pumps, namely the first vacuum pump 15 and the second vacuum pump 16, pressure comparison control of the cleaning tank 1 and the buffer tank 2 is achieved.
[0049] Third embodiment
[0050] Figure 3 Schematic diagram of a cleaning device according to a third embodiment of the present invention. Figure 3 As shown, this embodiment provides a cleaning device. Further, the cleaning tank 1 is provided with a first gas circuit interface 8, and the buffer box 2 is provided with a second gas circuit interface 9, and the first gas circuit interface 8 and the second gas circuit interface 9 are connected through a vent pipe 10. The vent pipe 10 is provided with a vent valve 11 for controlling the opening and closing of the vent pipe 10.
[0051] In the decompression boiling cleaning process, compared with the previous method of only vacuuming and decompressing the cleaning tank 1, in this embodiment, since the cleaning tank 1 is connected to the buffer box 2 through the vent pipe 10, the gas volume of the cleaning tank 1 is substantially expanded by using the buffer box 2. When the buffer box 2 is in a state of low air pressure, after the vent valve 11 is opened, the number of air molecules in the cleaning tank 1 decreases significantly due to the flow of air molecules from the cleaning tank 1 to the buffer box 2. Since the air pressure is generated by the collision of air molecules, when the number of air molecules decreases, the frequency of collision will also decrease, so that the air pressure of the cleaning tank 1 decreases rapidly. After the air pressure of the cleaning tank 1 is reduced rapidly, the liquid in the cleaning tank 1 boils more quickly, and the sudden boiling phenomenon is greatly enhanced by instantly reducing the vacuum degree, thereby improving the cleaning strength, which is conducive to improving the cleaning effect of the cleaning device. During decompression boiling, the tiny bubbles generated can disturb the surface of the object to be cleaned, and release a large amount of energy as the bubbles burst, thereby removing dirt and pollutants on the surface of the object to be cleaned.
[0052] Furthermore, the buffer box 2 is provided with a buffer box drain port 12. After the cleaning of the cleaning tank 1 is completed, all the cleaning liquid in the cleaning tank 1 is discharged to the buffer box 2. Thereafter, the buffer box 2 discharges the cleaning liquid received from the cleaning tank 1 through the buffer box drain port 12. The gas pressure in the buffer box 2 is different when the cleaning liquid is received and when the cleaning liquid is discharged from the buffer box drain port 12. When the buffer box 2 discharges the cleaning liquid, the air pressure regulating mechanism 5 introduces air into the buffer box 2 to increase the air pressure of the buffer box 2 to increase the pressure difference and promote the drainage of the buffer box 2.
[0053] Furthermore, the cleaning tank 1 is also provided with a cleaning liquid supply unit 13, which supplies a predetermined amount of cleaning liquid to the cleaning tank 1 when the cleaning device is not in a cleaning state. This can prevent the cleaning liquid from solidifying in the cleaning liquid supply unit 13 when the cleaning tank 1 is not used for a long time, which is beneficial to prolonging the service life of the cleaning device.
[0054] Furthermore, the cleaning liquid supply unit 13 has a heater 14, and the heater 14 is used to heat the cleaning liquid to be introduced into the cleaning tank 1. The cleaning liquid supply unit 13 has a heater 14, which can heat and generate hot water while supplying hot water to the cleaning tank 1. This can reduce the time required to supply hot water and improve the efficiency of hot water supply.
[0055] In some other embodiments of the present invention, an electric heater or a steam heater may be provided in the cleaning tank 1 to heat the cleaning liquid injected into the cleaning tank 1. In addition, the cleaning liquid supply unit 13 may have a heater 14, and an electric heater or a steam heater may also be provided in the cleaning tank 1.
[0056] In some other embodiments of the present invention, the method of achieving rapid liquid drainage by providing a buffer box 2 and an air pressure regulating mechanism 5 is not limited to application in the reduced pressure boiling cleaning listed in this embodiment, but can also be applied to other types of cleaning devices, such as ultrasonic cleaning devices, water flushing devices, etc.
[0057] Fourth embodiment
[0058] Figure 4 FIG. 4 is a flow chart of a cleaning method for a cleaning device according to a fourth embodiment of the present invention. Figure 4 As shown, this embodiment further provides a cleaning method for a cleaning device, which can be applied to the cleaning device provided by the first embodiment or the second embodiment.
[0059] First, in the preparation step S1, the vent valve 11 and the drain valve 4 are both in a closed state, and the buffer tank 2 is in a high vacuum state. The vent valve 11 is opened, and the cleaning liquid supply unit 13 supplies cleaning liquid to the cleaning tank 1. After the vent valve 11 is opened, the air pressure in the cleaning tank 1 is rapidly reduced, so that the cleaning liquid enters the cleaning tank 1 faster, thereby reducing the time required to supply the cleaning liquid. After the cleaning liquid is supplied to the cleaning tank 1, the vent valve 11 is closed, and the electric heater or steam heater set in the cleaning tank 1 heats the cleaning liquid, and the buffer tank 2 returns to a high vacuum state.
[0060] After the preparation step S1 is completed, the cleaning step S2 is entered. In the cleaning step S2, the cleaning tank 1 cleans the object to be cleaned, and the cleaning device is in a cleaning state. It should be noted that the cleaning mentioned here is cleaning in a broad sense, including not only cleaning with detergent, but also rinsing, etc.
[0061] Next, the ventilation step S3 is entered, the ventilation valve 11 is opened, and the cleaning tank 1 is connected to the buffer tank 2 with a higher vacuum degree, so that the vacuum degree of the cleaning tank 1 is quickly increased. In this way, reduced pressure boiling is achieved more quickly, thereby increasing the cleaning force and thus improving the cleaning effect. After the vacuum degree of the cleaning tank 1 is quickly increased, the ventilation valve 11 is closed, and the air pressure regulating mechanism 5 returns the buffer tank 2 to a high vacuum degree.
[0062] In the cleaning step, it is necessary to repeatedly reduce and re-pressurize the cleaning tank 1. When the cleaning tank 1 is re-pressurized, the bubbles generated by low-pressure boiling condense instantly. The liquid is stirred by the pressure difference generated during condensation, thereby improving the cleaning effect on the object to be cleaned.
[0063] The cleaning method further includes a pressure regulating step S4, in which the gas pressure of the buffer box 2 is regulated by the gas pressure regulating mechanism 5. It should be noted that, in this embodiment, the pressure regulating step S4 includes the gas pressure regulating actions of the buffer box 2 in different steps, which are not described one by one in the pressure regulating step S4, but are described in other steps.
[0064] After the cleaning of the cleaning tank 1 is completed, the cleaning tank draining step S5 is entered. In the cleaning tank draining step S5, the vent valve 11 is in a closed state, the drain valve 4 is opened, and the cleaning liquid in the cleaning tank 1 is discharged to the buffer tank 2 through the cleaning tank drain pipe 3. Since the air pressure of the buffer tank 2 is already in a low state at this time, the cleaning liquid in the cleaning tank 1 can be quickly discharged into the buffer tank 2. After the cleaning liquid in the cleaning tank 1 is completely discharged into the buffer tank 2, the draining stops, and the drain valve 4 is closed.
[0065] Furthermore, after the cleaning tank draining step S5 is completed, the buffer tank draining step S6 is entered, that is, the buffer tank 2 drains the cleaning liquid from the cleaning tank 1. Before the buffer tank 2 starts draining, the air pressure regulating mechanism 5 introduces air into the buffer tank 2 to pressurize the air pressure in the buffer tank 2, thereby facilitating the buffer tank 2 to discharge the cleaning liquid.
[0066] It should be noted that, in this embodiment, S1, S2, S3, etc. in this embodiment do not mean that the order of occurrence of the steps is strictly in the order of 1, 2, 3...
[0067] In addition to the cleaning operation with detergent, the cleaning device can also perform a rinsing operation. The rinsing operation uses clean water or pure water to rinse the object being cleaned again to remove the detergent or other impurities remaining during the cleaning process. Rinsing needs to be performed multiple times until there is no residue on the surface of the object. In the rinsing operation, water is used to remove the dirt that has fallen off the object being cleaned. The operation is similar to the cleaning operation, and compared with the cleaning operation, there is no injection of detergents such as alkaline detergents.
[0068] In addition, a hot water disinfection step can be set up, the purpose of which is to immerse the objects to be cleaned in hot water for sterilization, and the basic operation remains unchanged. Hot water disinfection is to disinfect the objects to be cleaned by using high-temperature hot water. High-temperature hot water can destroy the cell structure and metabolic function of microorganisms, thereby completely killing pathogens and harmful microorganisms to ensure the hygiene and safety of the objects. In addition, high-temperature hot water can dissolve and remove stains and odors on the surface of objects, making the objects cleaner and tidier.
[0069] Before the cleaning process, a pre-washing step without the use of detergent can also be set. Pre-washing means that before cleaning, the surface of the object to be cleaned is rinsed or soaked with hot water or other suitable media to remove the coarse dirt or chemicals attached to the surface of the object to be cleaned, so as to prepare for the subsequent cleaning steps. This step allows the cleaning liquid to better contact the surface of the object to be cleaned in the subsequent cleaning operation, thereby improving the cleaning efficiency. At the same time, it can also reduce the amount of cleaning liquid used and the amount of wastewater after treatment, which is conducive to reducing cleaning costs and environmental pollution.
[0070] Depending on the object being cleaned, the cleaning device generally needs to be filled and drained 4 to 5 times during the entire operation. If each filling and draining can be shortened by about 3 minutes, the total operation time will be shortened by about 10 to 20 minutes, effectively improving the operating efficiency of the cleaning device and helping to save costs.
[0071] The following are application scenarios of the cleaning method of the cleaning device:
[0072] The scalpel is placed in the cleaning tank 1 and waits for cleaning. At this time, the drain valve 4 and the vent valve 11 are closed. The cleaning liquid supply unit 13 supplies cleaning liquid to the cleaning tank 1, and the vent valve 11 is opened. The vacuum degree in the cleaning tank 1 is rapidly increased, thereby speeding up the supply of the cleaning liquid. After the cleaning liquid is supplied, the vent valve 11 is closed, and the cleaning liquid is heated to about 60°C in the cleaning tank 1. The cleaning liquid at 60°C has a better cleaning effect on the one hand, and can achieve low-pressure boiling faster on the other hand. While the cleaning liquid is heated in the cleaning tank 1, the buffer tank 2 returns to a high vacuum state.
[0073] Next, the scalpel is cleaned. First, the vent valve 11 is opened to connect the cleaning tank 1 with the buffer tank 2 with a higher vacuum degree. The air pressure in the cleaning tank 1 is reduced quickly, and the boiling point of the cleaning liquid is reduced to about 50°C, thereby achieving low-pressure boiling. Then the air pressure regulating mechanism 5 re-pressurizes the cleaning tank 1 to make it condense quickly. Then it is heated to 60°C and then decompressed to 50°C. During the cleaning process, the decompression and re-pressurization of the cleaning tank 1 are repeated to improve the cleaning effect.
[0074] After cleaning is completed, the vent valve 11 is closed and the drain valve 4 is opened. The air pressure regulating mechanism 5 restores the cleaning tank 1 to atmospheric pressure and decompresses the buffer tank 2. In the process of draining liquid from the cleaning tank 1 to the buffer tank 2, the air pressure regulating mechanism 5 can not only speed up the speed of draining liquid from the cleaning tank 1 to the buffer tank 2 which is maintained at a high vacuum in advance, but also prevent the vacuum of the buffer tank 2 from being too high, which causes the cleaning liquid to boil suddenly during the drainage, which is conducive to maintaining the normal stability of the drainage process.
[0075] After all the cleaning liquid in the cleaning tank 1 is drained into the buffer tank 2, the drain valve 4 is closed, and the cleaning liquid supply unit 13 injects hot water into the cleaning tank 1 to prepare for rinsing.
[0076] During the process of refilling the cleaning tank 1 with hot water, the buffer tank 2 discharges the cleaning liquid from the cleaning tank 1, so that this period of time can be fully utilized. The vent valve 11 and the drain valve 4 are closed, and the air pressure regulating mechanism 5 introduces pressurized air or atmospheric air into the buffer tank 2 to promote the drainage of the buffer tank 2. After the drainage of the buffer tank 2 is completed, the air pressure regulating mechanism 5 adjusts the air pressure of the buffer tank 2 to a lower level.
[0077] Then the rinsing process begins. The rinsing process is similar to the previous cleaning process and will not be described in detail here. A total of 3 rinse cycles are performed to fully clean the scalpel and remove residual detergent.
[0078] During the entire operation of the cleaning device, a total of 4 cleaning or rinsing processes are performed, which saves 3 minutes each time, and a total of 12 minutes of working time, effectively reducing the drainage time, thereby improving the operating efficiency of the cleaning device.
[0079] This embodiment also provides a computer-readable storage medium (not shown) storing processor (not shown) readable instructions, and one or more processors execute the cleaning method of the above-mentioned cleaning device by running the processor readable instructions.
[0080] It will be appreciated by those skilled in the art that the specific technical features in each embodiment may be adaptively split or combined. Such splitting or combining of specific technical features will not cause the technical solution to deviate from the principle of the present invention, and therefore, the technical solutions after splitting or combining will fall within the protection scope of the present invention. In the description of this application, the meaning of "multiple" is two or more, unless otherwise clearly and specifically limited.
[0081] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. A cleaning device, characterized in that: include: A cleaning tank, provided with a cleaning tank drain port; A buffer tank is provided with a buffer tank liquid inlet for receiving the cleaning liquid from the cleaning tank; A cleaning tank drain pipe, connecting the cleaning tank drain port and the buffer tank inlet port; A drain valve, controlling the on-off of the drain pipe of the cleaning tank; The air pressure regulating mechanism is connected to the buffer box and can regulate the air pressure in the buffer box.
2. The cleaning device according to claim 1, characterized in that: Also includes: A first gas path interface is provided in the cleaning tank; A second gas path interface is provided on the buffer box; A vent pipe, connecting the first gas path interface with the second gas path interface; The ventilation valve is arranged on the ventilation pipe to control the opening and closing of the ventilation pipe.
3. The cleaning device according to claim 1 or 2, characterized in that: The buffer tank is provided with a buffer tank drain port, and the gas pressure in the buffer tank is different when the cleaning liquid is received and when the cleaning liquid is discharged from the buffer tank drain port.
4. The cleaning device according to claim 1 or 2, characterized in that: The cleaning tank is further provided with a cleaning liquid supply unit for supplying a predetermined amount of cleaning liquid to the cleaning tank when the cleaning device is in a non-cleaning state.
5. The cleaning device according to claim 4, characterized in that: The cleaning liquid supply unit includes a heater for heating the cleaning liquid to be introduced into the cleaning tank.
6. The cleaning device according to claim 1 or 2, characterized in that: The air pressure regulating mechanism includes a first vacuum pump and a second vacuum pump. The first vacuum pump can regulate the air pressure of the cleaning tank, and the second vacuum pump can regulate the air pressure of the buffer tank.
7. A cleaning method for a cleaning device, characterized in that: The cleaning device comprises a cleaning tank, a buffer box, a cleaning tank drain pipe and an air pressure regulating mechanism, wherein the cleaning tank drain pipe is respectively connected to the cleaning tank and the buffer box, and the air pressure regulating mechanism is connected to the buffer box. The cleaning method of the cleaning device comprises: a pressure regulating step, regulating the gas pressure of the buffer tank by means of the gas pressure regulating mechanism; a cleaning tank draining step, wherein the cleaning liquid in the cleaning tank is discharged to the buffer tank through the cleaning tank drain pipe; A buffer tank draining step is performed in which the buffer tank drains the cleaning liquid from the cleaning tank.
8. The cleaning method for a cleaning device according to claim 7, characterized in that: The cleaning device further includes a vent pipe connecting the cleaning tank and the buffer tank and a vent valve arranged on the vent pipe. The cleaning method of the cleaning device also includes: A ventilation step, when the cleaning device is in a cleaning state, the ventilation valve is opened.
9. A computer-readable storage medium, characterized in that: Processor-readable instructions are stored, and one or more processors execute the cleaning method as claimed in claim 7 or 8 by running the processor-readable instructions.
Citation Information
Patent Citations
Cleaning equipment and cleaning method
CN102333600A
Cleaning device and cleaning method
CN102413952A
Cleaning device
CN110614250A
Cleaning device
CN220560026U
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