Beam parameter monitoring device and beam control device of electron accelerator

Abstract

The embodiment of the invention particularly relates to a beam parameter monitoring device and a beam control device of an electron accelerator. In the monitoring device, a beam output by an electron accelerator sequentially passes through a first annular channel and a second annular channel, and a processor is connected with a first cylindrical electrode, a second cylindrical electrode, a third cylindrical electrode, a fourth cylindrical electrode, a fifth cylindrical electrode, a sixth cylindrical electrode, a seventh cylindrical electrode and an eighth cylindrical electrode. Induced currents respectively corresponding to a first cylindrical electrode, a second cylindrical electrode, a third cylindrical electrode, a fourth cylindrical electrode, a fifth cylindrical electrode, a sixth cylindrical electrode, a seventh cylindrical electrode and an eighth cylindrical electrode when a beam output by an electron accelerator continuously passes through a first annular channel and a second annular channel in sequence are monitored; and obtaining output dose information and radiation field dose distribution information corresponding to the output beam of the electron accelerator. And output dose information and radiation field dose distribution information corresponding to the output beam of the electron accelerator can be accurately monitored.

Description

Technical Field

[0001] Multiple embodiments of the present specification relate to the field of beam monitoring technology, and specifically to a beam parameter monitoring device and a beam control device for an electron accelerator. Background Art

[0002] The dose rate of conventional radiotherapy is 1 to 10 Gy / min (the pulse dose rate is 10 3 ~10 4 Gy / min). Currently, ionization chambers are commonly used as detectors for monitoring. However, in the case of ultra-high dose rates (such as flash radiotherapy), the dose rate is 40Gy / s (pulse dose rate>10 4 Gy / s), for the ionization chamber, due to the high density of positive and negative ions in its sensitive area, the serious recombination of positive and negative ions, and the electron mobility is 1000 times greater than that of positive ions, the electrons have drifted to the anode, and the positive ions have not drifted to the cathode. The electric field generated by these positive charges that have not reached the cathode will weaken the drift field of the ionization chamber, and the shielding effect of the positive charges is serious, causing the ionization chamber to fail to work normally. Therefore, in Flash radiotherapy, a new dose detector needs to be developed.

[0003] In flash radiotherapy, since the dose of a single pulse is large, a very short irradiation time can achieve the required treatment dose, so the irradiation dose needs to be strictly monitored. In addition, since the irradiation position of the beam needs to be strictly controlled during the treatment process, the detector also needs to be able to monitor the position deviation of the electron accelerator output beam. Summary of the invention

[0004] The embodiments of this specification provide a beam parameter monitoring device and a beam control device for an electron accelerator, which can accurately monitor the output dose information and field dose distribution information corresponding to the output beam of the electron accelerator, and are non-contact and will not interfere with the treatment beam provided by the electron accelerator.

[0005] The technical solution is as follows:

[0006] In a first aspect, an embodiment of the present specification provides a beam parameter monitoring device for an electron accelerator, comprising a first annular detection layer, a second annular detection layer, and a processor that are overlapped and spaced apart;

[0007] The first detection layer comprises a first isolation ring and four cylindrical electrodes of the same shape arranged on the inner surface of the first isolation ring, namely a first cylindrical electrode, a second cylindrical electrode, a third cylindrical electrode, and a fourth cylindrical electrode; a first isolation structure for insulating and isolating two adjacent cylindrical electrodes is arranged on the inner surface of the first isolation ring between each two adjacent cylindrical electrodes, and a first annular channel with an opening only at the first isolation structure is formed in the first isolation ring through the inner cylindrical surfaces of the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode;

[0008] The second detection layer comprises a second isolation ring and four cylindrical electrodes of the same shape arranged on the inner surface of the second isolation ring, namely a fifth cylindrical electrode, a sixth cylindrical electrode, a seventh cylindrical electrode, and an eighth cylindrical electrode; a second isolation structure for insulating and isolating two adjacent cylindrical electrodes is arranged on the inner surface of the second isolation ring between each two adjacent cylindrical electrodes, and a second annular channel is formed in the second isolation ring through the inner cylindrical surfaces of the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, with an opening only at the second isolation structure;

[0009] The beam output by the electron accelerator passes through the first annular channel and the second annular channel in sequence, and the processor is connected to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode respectively, and acquires the output dose information and the field dose distribution information corresponding to the output beam of the electron accelerator by monitoring the induced currents corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode respectively when the beam output by the electron accelerator continuously passes through the first annular channel and the second annular channel in sequence.

[0010] As a preferred solution, the processor includes a first signal processing module, a second signal processing module, and a data processing module;

[0011] The first signal processing module is connected to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode, respectively, to respectively monitor the induced currents corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode when the beam output by the electron accelerator continuously passes through the first annular channel, and then obtain the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode;

[0012] The second signal processing module is connected to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, respectively, to respectively monitor the induced currents corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode when the beam output by the electron accelerator continuously passes through the second annular channel, and then obtain the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode;

[0013] The data processing module is connected to the first signal processing module and the second signal processing module respectively, so as to obtain the output dose information and field dose distribution information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode.

[0014] As a preferred solution, the data processing module obtains output dose information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, including:

[0015] Obtaining a first beam continuous pulse signal based on continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode;

[0016] Obtaining a second beam continuous pulse signal based on continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode;

[0017] Based on the first beam continuous pulse signal and the second beam continuous pulse signal, output dose information corresponding to the output beam of the electron accelerator is obtained.

[0018] As a preferred solution, the method of obtaining output dose information corresponding to the output beam of the electron accelerator based on the first beam continuous pulse signal and the second beam continuous pulse signal includes:

[0019] Based on the first beam continuous pulse signal, first dosage information corresponding to the output beam of the electron accelerator is obtained;

[0020] Based on the second beam continuous pulse signal, second dosage information corresponding to the output beam of the electron accelerator is obtained;

[0021] Based on the first dose information and the second dose information corresponding to the output beam of the electron accelerator, the output dose information corresponding to the output beam of the electron accelerator is obtained.

[0022] As a preferred solution, the data processing module obtains the radiation field dose distribution information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, including:

[0023] Obtaining first plane position offset information based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode;

[0024] Obtaining second plane position offset information based on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode;

[0025] Based on the first plane position offset information and the second plane position offset information, the radiation field dose distribution information corresponding to the output beam of the electron accelerator is obtained.

[0026] As a preferred solution, the data processing module further obtains incident angle offset information corresponding to the output beam of the electron accelerator based on the first plane position offset information and the second plane position offset information, and the obtaining of incident angle offset information corresponding to the output beam of the electron accelerator based on the first plane position offset information and the second plane position offset information includes:

[0027] Acquire the first spatial position coordinates of the intersection of the electron accelerator output beam and the first annular detection layer based on the first plane position offset information;

[0028] Acquire the second spatial position coordinates of the intersection of the electron accelerator output beam and the second annular detection layer based on the second plane position offset information;

[0029] Based on the first spatial position coordinate and the second spatial position coordinate, the incident angle offset information corresponding to the output beam of the electron accelerator is obtained.

[0030] As a preferred solution, the method of obtaining the first beam continuous pulse signal based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode, respectively, includes:

[0031] Based on the principle of time correspondence, the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode are added to obtain a first beam continuous pulse signal;

[0032] The method of obtaining the second beam continuous pulse signal based on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, comprises:

[0033] Based on the principle of time correspondence, the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode are added to obtain a second beam continuous pulse signal.

[0034] As a preferred solution, based on the principle of time correspondence, before performing an addition operation on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode to obtain the first beam continuous pulse signal, the method further includes:

[0035] Respectively performing signal amplification and analog-to-digital conversion operations on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode;

[0036] Based on the principle of time correspondence, before performing an addition operation on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode to obtain the second beam continuous pulse signal, the method further includes:

[0037] The continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode are respectively amplified and analog-to-digital converted.

[0038] As a preferred solution, the method of obtaining first dose information corresponding to the output beam of the electron accelerator based on the first beam continuous pulse signal includes:

[0039] Acquire the number of first pulses of the first beam continuous pulse signal within a preset time and the first pulse amplitude corresponding to each first pulse;

[0040] Based on the first pulse number of the first beam continuous pulse signal within a preset time and the first pulse amplitude corresponding to each first pulse, first dose information corresponding to the output beam of the electron accelerator is obtained;

[0041] The method of obtaining second dosage information corresponding to the output beam of the electron accelerator based on the second beam continuous pulse signal includes:

[0042] Acquire the number of second pulses of the second beam continuous pulse signal within a preset time and the second pulse amplitudes corresponding to the second pulses;

[0043] Based on the number of second pulses of the second beam continuous pulse signal within a preset time and the second pulse amplitudes corresponding to the second pulses, second dosage information corresponding to the output beam of the electron accelerator is obtained.

[0044] In a second aspect, an embodiment of the present specification provides a beam control device, including an electron accelerator that outputs a beam, a beam parameter monitoring device for an electron accelerator as described in the first aspect of the above embodiment, and a parameter adjustment module that adjusts the operating parameters of the electron accelerator based on the output dose information and field dose distribution information obtained by the beam parameter monitoring device.

[0045] The beneficial effects brought by the technical solutions provided by some embodiments of this specification include at least:

[0046] It can accurately monitor the output dose information and field dose distribution information corresponding to the output beam of the electron accelerator, and it is non-contact and will not interfere with the treatment beam provided by the electron accelerator.

[0047] The output dose information and field dose distribution information corresponding to the output beam of the electron accelerator are obtained by overlapping and spaced-apart first and second annular detection layers, thereby improving the monitoring accuracy and safety of the output dose information and field dose distribution information (by setting two detection layers, even if one fails, normal radiotherapy can be ensured).

[0048] The monitoring device also monitors the incident angle deviation information corresponding to the output beam of the electron accelerator, thereby increasing the monitoring data range of the monitoring device.

[0049] By amplifying the electrode induced current signal and performing analog-to-digital conversion operations, the beam parameter monitoring device has stronger anti-interference ability and improves the signal-to-noise ratio.

[0050] It is applicable to a wide range of dose rates, that is, it can be used not only in conventional radiotherapy mode but also in ultra-high dose rate radiotherapy mode (Flash radiotherapy). BRIEF DESCRIPTION OF THE DRAWINGS

[0051] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0052] Figure 1 It is a structural schematic diagram of a beam parameter monitoring device for an electron accelerator provided in an embodiment of this specification.

[0053] Figure 2 It is a structural schematic diagram of a beam control device provided in an embodiment of this specification.

[0054] Figure 3 It is a flow chart of a beam parameter monitoring method of an electron accelerator provided in an embodiment of this specification.

[0055] Figure 4 It is a structural schematic diagram of an electronic device provided in an embodiment of this specification.

[0056] In the figure: 1. first isolation ring; 2. first cylindrical electrode; 3. second cylindrical electrode; 4. third cylindrical electrode; 5. fourth cylindrical electrode; 6. first isolation structure; 7. first annular channel. DETAILED DESCRIPTION

[0057] The technical solutions in the embodiments of this specification will be described clearly and completely below in conjunction with the drawings in the embodiments of this specification.

[0058] The terms "first", "second", "third", etc. in the description and claims of this specification and the above-mentioned drawings are used to distinguish different objects, rather than to describe a specific order. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but optionally includes steps or units that are not listed, or optionally includes other steps or units inherent to these processes, methods, products or devices.

[0059] The following description provides examples and does not limit the scope, applicability or examples set forth in the claims. Changes may be made to the functions and arrangements of the elements described without departing from the scope of the present specification. Various processes or components may be appropriately omitted, substituted or added to each example. For example, the described method may be performed in an order different from the order described, and various steps may be added, omitted or combined. In addition, features described with respect to some examples may be combined in other examples.

[0060] Reference Figure 1 , which is a schematic diagram of the structure of a beam parameter monitoring device for an electron accelerator provided in one or more embodiments of this specification.

[0061] The beam parameter monitoring device may include at least a first annular detection layer, a second annular detection layer and a processor which are overlapped and spaced apart;

[0062] The first detection layer comprises a first isolation ring 1 and four cylindrical electrodes (made of metal) of the same shape arranged on the inner surface of the first isolation ring 1, namely a first cylindrical electrode 2, a second cylindrical electrode 3, a third cylindrical electrode 4, and a fourth cylindrical electrode 5; a first isolation structure 6 for insulating and isolating two adjacent cylindrical electrodes is arranged on the inner surface of the first isolation ring 1 between each two adjacent cylindrical electrodes, and a first annular channel 7 with an opening only at the first isolation structure 6 is formed in the first isolation ring 1 through the inner cylindrical surfaces of the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5;

[0063] The second detection layer includes a second isolation ring and four cylindrical electrodes (made of metal) of the same shape arranged on the inner surface of the second isolation ring, which are the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode; a second isolation structure for insulating and isolating two adjacent cylindrical electrodes is arranged on the inner surface of the second isolation ring between each two adjacent cylindrical electrodes, and a second annular channel with an opening only at the second isolation structure is formed in the second isolation ring through the inner cylindrical surfaces of the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode;

[0064] The beam output by the electron accelerator passes through the first annular channel 7 and the second annular channel in sequence, and the processor is connected to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, the fourth cylindrical electrode 5, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode respectively, and by monitoring the induced currents corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, the fourth cylindrical electrode 5, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode when the beam output by the electron accelerator continuously passes through the first annular channel 7 and the second annular channel in sequence, the output dose information and the field dose distribution information corresponding to the output beam of the electron accelerator are obtained.

[0065] It should be noted that the structure of the second annular detection layer is consistent with that of the first annular detection layer. Figure 1 The second annular detection layer is not shown. Figure 1 It is regarded as a top view of a beam parameter monitoring device of an electron accelerator, and at this time, the second annular detection layer is completely blocked by the first annular detection layer.

[0066] The beam parameter monitoring device provided in the embodiments of this specification is:

[0067] It can accurately monitor the output dose information and field dose distribution information corresponding to the output beam of the electron accelerator, and it is non-contact and will not interfere with the treatment beam provided by the electron accelerator.

[0068] The output dose information and field dose distribution information corresponding to the output beam of the electron accelerator are obtained by overlapping and spaced first and second annular detection layers, thereby improving the monitoring accuracy of the output dose information and field dose distribution information.

[0069] It should be noted that because the structures of the first detection layer and the second detection layer are consistent, only the structural principle of the first detection layer will be explained and analyzed later. The structural principle of the second detection layer can refer to the structural analysis of the first detection layer, and the two are consistent.

[0070] In one embodiment of the present specification, the processor includes a first signal processing module, a second signal processing module, and a data processing module;

[0071] The first signal processing module is connected to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5, respectively, to respectively monitor the induced currents corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5 when the beam output by the electron accelerator continuously passes through the first annular channel, and then obtain the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5;

[0072] The second signal processing module is connected to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, respectively, to respectively monitor the induced currents corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode when the beam output by the electron accelerator continuously passes through the second annular channel, and then obtain the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode (Note: when the electron beam passes through the annular channel, it induces charges on the surface of the metal electrode. When the amount of induced charges on the metal electrode changes, an induced current signal will be generated in the external circuit, and a voltage signal pulse can be output through a charge sensitive amplifier);

[0073] The data processing module is connected to the first signal processing module and the second signal processing module respectively, so as to obtain the output dose information and field dose distribution information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, the fourth cylindrical electrode 5, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode.

[0074] Further, the data processing module obtains output dose information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, the fourth cylindrical electrode 5, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, including:

[0075] A first beam continuous pulse signal is obtained based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5;

[0076] Obtaining a second beam continuous pulse signal based on continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode;

[0077] Based on the first beam continuous pulse signal and the second beam continuous pulse signal, output dose information corresponding to the output beam of the electron accelerator is obtained.

[0078] It should be noted that, refer to Figure 1 As shown, because the inner cylindrical surfaces of the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5 form a first annular channel 7 in the first isolation ring 1 with an opening only at the first isolation structure 6, the four electrodes (each electrode has an opening angle of approximately 90 degrees) add up to almost a complete circle. Therefore, the voltage pulse signal obtained by summing up the voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5 is proportional to the pulse beam signal corresponding to the electron beam and has nothing to do with the beam incident position.

[0079] Therefore, in this embodiment, the first beam continuous pulse signal can be obtained based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2 , the second cylindrical electrode 3 , the third cylindrical electrode 4 , and the fourth cylindrical electrode 5 .

[0080] That is, the first beam continuous pulse signal is obtained based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5, including:

[0081] Based on the principle of time correspondence, the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5 are added to obtain a first beam continuous pulse signal;

[0082] The method of obtaining the second beam continuous pulse signal based on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, comprises:

[0083] Based on the principle of time correspondence, the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode are added to obtain a second beam continuous pulse signal.

[0084] It should be noted that the time correspondence means that the voltage pulse signal values ​​at the same time need to be accumulated respectively.

[0085] Furthermore, the step of obtaining output dose information corresponding to the output beam of the electron accelerator based on the first beam continuous pulse signal and the second beam continuous pulse signal includes:

[0086] Based on the first beam continuous pulse signal, first dosage information corresponding to the output beam of the electron accelerator is obtained;

[0087] Based on the second beam continuous pulse signal, second dosage information corresponding to the output beam of the electron accelerator is obtained;

[0088] Based on the first dose information and the second dose information corresponding to the output beam of the electron accelerator, the output dose information corresponding to the output beam of the electron accelerator is obtained.

[0089] The principle of obtaining the first dose information is as follows:

[0090] The pulse amplitude Vp, pulse width τ, and pulse repetition frequency f of the first beam continuous pulse signal V are analyzed and obtained, and the pulse current intensity is measured with a Faraday cup, the amplitude of the signal is calibrated, and the amplitude Vp of the first beam continuous pulse signal V is converted into the pulse current Ip of the electron beam, and the average current i=τ*f*Ip. One signal pulse in the first beam continuous pulse signal corresponds to one electron beam pulse, and the number of pulses of the first beam continuous pulse signal V within a preset time is recorded regularly, so that the number of beam pulses within a specific time can be obtained, and the amplitude is obtained, and then the pulse dose rate and average dose rate corresponding to the first beam continuous pulse signal, that is, the first dose information, can be obtained.

[0091] The pulse dose rate and average dose rate corresponding to the second beam continuous pulse signal are obtained in the same way as above and will not be elaborated here.

[0092] Therefore, the method of obtaining first dose information corresponding to the output beam of the electron accelerator based on the first beam continuous pulse signal includes:

[0093] Acquire the number of first pulses of the first beam continuous pulse signal within a preset time and the first pulse amplitude corresponding to each first pulse;

[0094] Based on the first pulse number of the first beam continuous pulse signal within a preset time and the first pulse amplitude corresponding to each first pulse, first dose information corresponding to the output beam of the electron accelerator is obtained;

[0095] The method of obtaining second dosage information corresponding to the output beam of the electron accelerator based on the second beam continuous pulse signal includes:

[0096] Acquire the number of second pulses of the second beam continuous pulse signal within a preset time and the second pulse amplitudes corresponding to the second pulses;

[0097] Based on the number of second pulses of the second beam continuous pulse signal within a preset time and the second pulse amplitudes corresponding to the second pulses, second dosage information corresponding to the output beam of the electron accelerator is obtained.

[0098] It can also be understood that in order to ensure the accuracy of the output dose information finally obtained, the output dose information corresponding to the output beam of the electron accelerator is obtained based on the first dose information and the second dose information corresponding to the output beam of the electron accelerator. For example, the first dose information and the second dose information are averaged to obtain the output dose information corresponding to the output beam of the electron accelerator.

[0099] In one embodiment of the present specification, based on the principle of time correspondence, before the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5 are added to obtain the first beam continuous pulse signal, the method further includes:

[0100] Respectively perform signal amplification and analog-to-digital conversion operations on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5;

[0101] Based on the principle of time correspondence, before performing an addition operation on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode to obtain the second beam continuous pulse signal, the method further includes:

[0102] The continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode are respectively amplified and analog-to-digital converted.

[0103] That is, through signal amplification and analog-to-digital conversion, the obtained digital signal is filtered to improve the anti-interference ability of the monitoring device and improve the signal-to-noise ratio.

[0104] In one embodiment of the present specification, the data processing module obtains the radiation field dose distribution information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, the fourth cylindrical electrode 5, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, including:

[0105] The first plane position offset information is obtained based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5;

[0106] obtaining second plane position offset information based on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode;

[0107] Based on the first plane position offset information and the second plane position offset information, the radiation field dose distribution information corresponding to the output beam of the electron accelerator is obtained.

[0108] Further, the data processing module also obtains incident angle offset information corresponding to the electron accelerator output beam based on the first plane position offset information and the second plane position offset information, and the obtaining of incident angle offset information corresponding to the electron accelerator output beam based on the first plane position offset information and the second plane position offset information includes:

[0109] Acquire the first spatial position coordinates of the intersection of the electron accelerator output beam and the first annular detection layer based on the first plane position offset information;

[0110] Acquire the second spatial position coordinates of the intersection of the electron accelerator output beam and the second annular detection layer based on the second plane position offset information;

[0111] Based on the first spatial position coordinate and the second spatial position coordinate, the incident angle offset information corresponding to the output beam of the electron accelerator is obtained.

[0112] That is, the monitoring device also monitors the incident angle deviation information corresponding to the output beam of the electron accelerator, thereby increasing the monitoring data range of the monitoring device.

[0113] It should be noted that if the beam passes through the center of the first annular channel 7 , the amplitudes of the continuous voltage pulse signals corresponding to the first cylindrical electrode 2 , the second cylindrical electrode 3 , the third cylindrical electrode 4 , and the fourth cylindrical electrode 5 are equal.

[0114] Therefore, the calculation method of the first plane offset information of the beam is as follows:

[0115] definition:

[0116] Among them, V A represents the amplitude of the continuous voltage pulse signal corresponding to the first cylindrical electrode 2, V B represents the amplitude of the continuous voltage pulse signal corresponding to the second cylindrical electrode 3, V C represents the amplitude of the continuous voltage pulse signal corresponding to the third cylindrical electrode 4, V D V represents the amplitude of the continuous voltage pulse signal corresponding to the fourth cylindrical electrode 5. x Indicates x-axis offset voltage information, V y Indicates the y-axis offset voltage information.

[0117] When the beam passes through the central axis of the first annular channel 7, V A +V B =V C +V D 、V B +V C =V A +V D At this time, the distance that the beam deviates from the central axis in the x-axis direction is 0, the distance that the beam deviates from the central axis in the y-axis direction is 0, and the amplitudes of the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5 are equal.

[0118] If the beam deviates from the central axis of the first annular channel, the distance the beam deviates from the central axis in the x-axis direction can be calculated based on V x The distance that the beam deviates from the central axis in the y-axis direction can be obtained according to V y get.

[0119] Therefore, based on the continuous voltage pulse signals corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, and the fourth cylindrical electrode 5, the first plane position offset information is obtained, that is, the plane offset information of the beam at the first annular detection layer, including the distance from the center axis in the x-axis direction and the distance from the center axis in the y-axis direction.

[0120] The second plane position offset information obtained based on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode is the same as above and will not be elaborated herein.

[0121] Furthermore, it can be finally determined whether the beam is offset from the central axis and the specific offset situation can be obtained based on the first plane position offset information and the second plane position offset information.

[0122] If the intersection of the central axis and the annular channel is regarded as the origin, the first spatial position coordinate and the second spatial position coordinate can be further obtained according to the first plane position offset information and the second plane position offset information. Since two points form a straight line, a spatial vector can be further obtained based on the first spatial position coordinate and the second spatial position coordinate, and finally the incident angle offset information corresponding to the output beam of the electron accelerator can be obtained based on the spatial vector.

[0123] See next Figure 2 , Figure 2 A schematic structural diagram of a beam control device 200 provided in an embodiment of this specification is shown.

[0124] The beam control device 200 may include at least an electron accelerator 202 for outputting a beam, a beam parameter monitoring device 201 as described in the above embodiment, and a parameter adjustment module 203 for adjusting operating parameters of the electron accelerator 202 based on output dose information and field dose distribution information obtained by the beam parameter monitoring device 201 .

[0125] Each embodiment in this specification is described in a progressive manner, and the same or similar parts between the embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the beam control device embodiment, since it is basically similar to the beam parameter monitoring device embodiment, the description is relatively simple, and the relevant parts can be referred to the partial description of the beam parameter monitoring device embodiment.

[0126] See next Figure 3 , Figure 3 A schematic flow chart of a beam parameter monitoring method for an electron accelerator provided in an embodiment of this specification is shown.

[0127] The beam parameter monitoring method may at least include:

[0128] Step 302, the beam output by the electron accelerator 202 passes through the first annular channel 7 and the second annular channel in sequence;

[0129] Step 304, the processor obtains output dose information and field dose distribution information corresponding to the output beam of the electron accelerator 202 by monitoring the induced currents corresponding to the first cylindrical electrode 2, the second cylindrical electrode 3, the third cylindrical electrode 4, the fourth cylindrical electrode 5, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode when the beam output by the electron accelerator 202 continuously passes through the first annular channel 7 and the second annular channel in sequence.

[0130] Each embodiment in this specification is described in a progressive manner, and the same or similar parts between the embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the beam parameter monitoring method embodiment, since it is basically similar to the beam parameter monitoring device embodiment, the description is relatively simple, and the relevant parts can be referred to the partial description of the beam parameter monitoring device embodiment.

[0131] See also Figure 4 A schematic diagram of the structure of an electronic device provided in an embodiment of this specification is shown.

[0132] like Figure 4 As shown, the electronic device 400 may include: at least one processor 401 , at least one network interface 404 , a user interface 403 , a memory 405 , and at least one communication bus 402 .

[0133] The communication bus 402 may be used to realize the connection and communication among the above-mentioned components.

[0134] The user interface 403 may include buttons, and the optional user interface may also include a standard wired interface or a wireless interface.

[0135] The network interface 404 may include, but is not limited to, a Bluetooth module, an NFC module, a Wi-Fi module, etc.

[0136] Among them, the processor 401 may include one or more processing cores. The processor 401 uses various interfaces and lines to connect the various parts of the entire electronic device 400, and executes various functions and processes data of the electronic device 400 by running or executing instructions, programs, code sets or instruction sets stored in the memory 405, and calling data stored in the memory 405. Optionally, the processor 401 can be implemented in at least one hardware form of DSP, FPGA, and PLC. The processor 401 can integrate one or a combination of CPU, GPU, modem, etc. Among them, the CPU mainly processes the operating system, user interface, and application programs; the GPU is responsible for rendering and drawing the content to be displayed on the display screen; the modem is used to process wireless communications. It can be understood that the above-mentioned modem may not be integrated into the processor 401, and it can be implemented separately through a chip.

[0137] The memory 405 may include RAM or ROM. Optionally, the memory 405 includes a non-transitory computer-readable medium. The memory 405 may be used to store instructions, programs, codes, code sets or instruction sets. The memory 405 may include a program storage area and a data storage area, wherein the program storage area may store instructions for implementing an operating system, instructions for at least one function (such as a touch function, a sound playback function, an image playback function, etc.), instructions for implementing the above-mentioned various method embodiments, etc.; the data storage area may store data involved in the above-mentioned various method embodiments, etc. The memory 405 may also be at least one storage device located away from the aforementioned processor 401. The memory 405 as a computer storage medium may include an operating system, a network communication module, a user interface module and a beam parameter monitoring application. The processor 401 may be used to call the beam parameter monitoring program stored in the memory 405 and execute the steps of the beam parameter monitoring method mentioned in the above-mentioned embodiment.

[0138] The embodiments of this specification also provide a computer-readable storage medium, which stores instructions, and when the instructions are executed on a computer or a processor, the computer or the processor executes one or more steps in the above-mentioned beam parameter monitoring method embodiment. If the component modules of the above-mentioned electronic device are implemented in the form of software functional units and sold or used as independent products, they can be stored in the computer-readable storage medium.

[0139] In the above embodiments, it can be implemented in whole or in part by software, hardware, firmware or any combination thereof. When implemented using software, it can be implemented in whole or in part in the form of a computer program product. The computer program product includes one or more computer instructions. When the computer program instructions are loaded and executed on a computer, the process or function described in the embodiment of this specification is generated in whole or in part. The computer can be a general-purpose computer, a special-purpose computer, a computer network, or other programmable device. The computer instructions can be stored in a computer-readable storage medium or transmitted through the computer-readable storage medium. The computer instructions can be transmitted from a website site, computer, server or data center to another website site, computer, server or data center by wired (e.g., coaxial cable, optical fiber, digital subscriber line (Digital Subscriber Line, DSL)) or wireless (e.g., infrared, wireless, microwave, etc.) mode. The computer-readable storage medium can be any available medium that a computer can access or a data storage device such as a server, data center, etc. that contains one or more available media integrated. The available medium may be a magnetic medium (eg, a floppy disk, a hard disk, a magnetic tape), an optical medium (eg, a digital versatile disc (DVD)), or a semiconductor medium (eg, a solid state disk (SSD)).

[0140] Those skilled in the art can understand that all or part of the processes in the above-mentioned embodiments can be implemented by instructing the relevant hardware through a computer program, and the program can be stored in a computer-readable storage medium. When the program is executed, it can include the processes of the embodiments of the above-mentioned methods. The aforementioned storage medium includes: ROM, RAM, magnetic disk or optical disk and other media that can store program codes. In the absence of conflict, the technical features in this embodiment and the implementation scheme can be combined arbitrarily.

[0141] The embodiments described above are merely preferred embodiments of this specification and are not intended to limit the scope of this specification. Without departing from the design spirit of this specification, various modifications and improvements made to the technical solutions of this specification by ordinary technicians in this field should fall within the scope of protection determined by the claims of this specification.

Claims

1. A beam parameter monitoring device for an electron accelerator, characterized in that: It includes a first annular detection layer, a second annular detection layer and a processor which are overlapped and spaced apart; The first detection layer includes a first isolation ring and four cylindrical electrodes of the same shape arranged on the inner surface of the first isolation ring, namely a first cylindrical electrode, a second cylindrical electrode, a third cylindrical electrode, and a fourth cylindrical electrode; A first isolation structure for insulating and isolating two adjacent cylindrical electrodes is provided on the inner surface of the first isolation ring between each two adjacent cylindrical electrodes, and a first annular channel having an opening only at the first isolation structure is formed in the first isolation ring through the inner cylindrical surfaces of the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode; The second detection layer includes a second isolation ring and four cylindrical electrodes of the same shape arranged on the inner surface of the second isolation ring, namely a fifth cylindrical electrode, a sixth cylindrical electrode, a seventh cylindrical electrode, and an eighth cylindrical electrode; A second isolation structure for insulating and isolating two adjacent cylindrical electrodes is provided on the inner surface of the second isolation ring between each two adjacent cylindrical electrodes, and a second annular channel having an opening only at the second isolation structure is formed in the second isolation ring through the inner cylindrical surfaces of the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode; The beam output by the electron accelerator passes through the first annular channel and the second annular channel in sequence, and the processor is connected to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode respectively, and acquires the output dose information and the field dose distribution information corresponding to the output beam of the electron accelerator by monitoring the induced currents corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode respectively when the beam output by the electron accelerator continuously passes through the first annular channel and the second annular channel in sequence.

2. The beam parameter monitoring device of an electron accelerator according to claim 1, characterized in that: The processor includes a first signal processing module, a second signal processing module, and a data processing module; The first signal processing module is connected to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode, respectively, to respectively monitor the induced currents corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode when the beam output by the electron accelerator continuously passes through the first annular channel, and then obtain the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode; The second signal processing module is connected to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, respectively, to respectively monitor the induced currents corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode when the beam output by the electron accelerator continuously passes through the second annular channel, and then obtain the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode; The data processing module is connected to the first signal processing module and the second signal processing module respectively, so as to obtain the output dose information and field dose distribution information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode.

3. The beam parameter monitoring device of an electron accelerator according to claim 2, characterized in that: The data processing module obtains output dose information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, including: Obtaining a first beam continuous pulse signal based on continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode; Obtaining a second beam continuous pulse signal based on continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode; Based on the first beam continuous pulse signal and the second beam continuous pulse signal, output dose information corresponding to the output beam of the electron accelerator is obtained.

4. The beam parameter monitoring device of an electron accelerator according to claim 3, characterized in that: The method of obtaining output dose information corresponding to the output beam of the electron accelerator based on the first beam continuous pulse signal and the second beam continuous pulse signal includes: Based on the first beam continuous pulse signal, first dosage information corresponding to the output beam of the electron accelerator is obtained; Based on the second beam continuous pulse signal, second dosage information corresponding to the output beam of the electron accelerator is obtained; Based on the first dose information and the second dose information corresponding to the output beam of the electron accelerator, the output dose information corresponding to the output beam of the electron accelerator is obtained.

5. The beam parameter monitoring device of an electron accelerator according to claim 2, characterized in that: The data processing module obtains the radiation field dose distribution information corresponding to the output beam of the electron accelerator based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, the fourth cylindrical electrode, the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, including: Obtaining first plane position offset information based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode; Obtaining second plane position offset information based on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode; Based on the first plane position offset information and the second plane position offset information, the radiation field dose distribution information corresponding to the output beam of the electron accelerator is obtained.

6. The electron accelerator beam parameter monitoring device according to claim 5, characterized in that: The data processing module also obtains incident angle offset information corresponding to the output beam of the electron accelerator based on the first plane position offset information and the second plane position offset information, and the information of obtaining the incident angle offset information corresponding to the output beam of the electron accelerator based on the first plane position offset information and the second plane position offset information includes: Acquire the first spatial position coordinates of the intersection of the electron accelerator output beam and the first annular detection layer based on the first plane position offset information; Acquire the second spatial position coordinates of the intersection of the electron accelerator output beam and the second annular detection layer based on the second plane position offset information; Based on the first spatial position coordinate and the second spatial position coordinate, the incident angle offset information corresponding to the output beam of the electron accelerator is obtained.

7. The beam parameter monitoring device of an electron accelerator according to claim 3, characterized in that: The method of obtaining the first beam continuous pulse signal based on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode, comprises: Based on the principle of time correspondence, the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode are added to obtain a first beam continuous pulse signal; The method of obtaining the second beam continuous pulse signal based on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode, comprises: Based on the principle of time correspondence, the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode are added to obtain a second beam continuous pulse signal.

8. The beam parameter monitoring device of an electron accelerator according to claim 7, characterized in that: Based on the principle of time correspondence, before performing an addition operation on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode to obtain the first beam continuous pulse signal, the method further includes: Respectively performing signal amplification and analog-to-digital conversion operations on the continuous voltage pulse signals corresponding to the first cylindrical electrode, the second cylindrical electrode, the third cylindrical electrode, and the fourth cylindrical electrode; Based on the principle of time correspondence, before performing an addition operation on the continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode, and the eighth cylindrical electrode to obtain the second beam continuous pulse signal, the method further includes: The continuous voltage pulse signals corresponding to the fifth cylindrical electrode, the sixth cylindrical electrode, the seventh cylindrical electrode and the eighth cylindrical electrode are respectively amplified and analog-to-digital converted.

9. The beam parameter monitoring device of an electron accelerator according to claim 4, characterized in that: The method of obtaining first dosage information corresponding to the output beam of the electron accelerator based on the first beam continuous pulse signal includes: Acquire the number of first pulses of the first beam continuous pulse signal within a preset time and the first pulse amplitude corresponding to each first pulse; Based on the first pulse number of the first beam continuous pulse signal within a preset time and the first pulse amplitude corresponding to each first pulse, first dose information corresponding to the output beam of the electron accelerator is obtained; The method of obtaining second dosage information corresponding to the output beam of the electron accelerator based on the second beam continuous pulse signal includes: Acquire the number of second pulses of the second beam continuous pulse signal within a preset time and the second pulse amplitudes corresponding to the second pulses; Based on the number of second pulses of the second beam continuous pulse signal within a preset time and the second pulse amplitudes corresponding to the second pulses, second dosage information corresponding to the output beam of the electron accelerator is obtained.

10. A beam control device, characterized in that: The invention comprises an electron accelerator for outputting a beam, a beam parameter monitoring device for the electron accelerator as claimed in any one of claims 1 to 9, and a parameter adjustment module for adjusting the operating parameters of the electron accelerator based on the output dose information and field dose distribution information obtained by the beam parameter monitoring device.

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