Gate apparatus, lithographic apparatus, and article manufacturing method

Abstract

The invention provides a gate apparatus, a lithographic apparatus, and an article manufacturing method. A shutter apparatus for passing and blocking light rays includes: a rotation source configured to rotationally drive a rotation shaft; a hub connected to the rotating shaft; and a gate blade fixed to the hub. The hub includes a retaining surface that retains the gate blades, and the retaining surface includes a first region belonging to a predetermined plane and a second region separated from the predetermined plane. The gate blade is in contact with the first region and the second region while being secured to the hub.

Description

Technical Field

[0001] The present invention relates to a shutter device, a photolithography apparatus and an article manufacturing method. Background Art

[0002] In a photolithography method for manufacturing an article such as a semiconductor device, an exposure device can be used to transfer a pattern of an original plate onto a substrate. In the exposure device, a gate device can be used to control the exposure time or exposure amount. The gate device includes a gate blade that blocks the exposure light. The state in which the exposure light is blocked by the gate blade is a non-irradiated state in which the substrate is not irradiated by the exposure light, and the state in which the exposure light is not blocked by the gate blade is an irradiated state in which the substrate is irradiated by the exposure light. The gate device can switch between the non-irradiated state and the irradiated state by rotating the gate blade by a rotating source. In order to increase the throughput of the exposure device, the rotation speed of the gate blade must be increased, and for this purpose, the weight of the gate blade can be reduced. However, if the weight of the gate blade is reduced, the rigidity of the gate blade may be reduced.

[0003] Japanese Patent Publication No. 2008-141016 describes a gate blade device, in which the gate blade is fixed to the rotating shaft of the motor, and the gate blade is clamped by a boss and a pressure plate. The gate blade is fixed by bolts screwed into the boss and the pressure plate. The boss includes a first pressing member, which includes two first pressing parts that press the first surface of the gate blade. The pressure plate includes a second pressing member, which includes a second pressing part that presses the second surface of the gate blade. When the second pressing part is located at a position corresponding to the part between the two first pressing parts, the gate blade is deformed, thereby improving the rigidity of the gate blade.

[0004] In the arrangement described in Japanese Patent Application Laid-Open No. 2008-141016, the first pressing portion and the second pressing portion for deforming the gate blade are arranged at a position separated from the bolt. Therefore, the force that the first pressing portion and the second pressing portion can apply to the gate blade is limited, and the deformation of the gate blade and the increase in rigidity caused by the deformation can be limited. Summary of the invention

[0005] The present invention provides a technology which is beneficial to improving the rigidity of a gate blade.

[0006] A first aspect of the present invention provides a gate device for allowing light to pass and blocking light, the gate device comprising: a rotation source configured to rotationally drive a rotation shaft; a hub connected to the rotation shaft; and a gate blade fixed to the hub, wherein the hub comprises a retaining surface for retaining the gate blade, the retaining surface comprising a first area belonging to a predetermined plane and a second area separated from the predetermined plane, and the gate blade contacts the first area and the second area while being fixed to the hub.

[0007] A second aspect of the present invention provides a lithographic apparatus for transferring a pattern of an original plate to a substrate using light, the lithographic apparatus comprising: a shutter device as defined in the first aspect and arranged to control irradiation of light to the substrate.

[0008] A third aspect of the present invention provides a method for manufacturing an article, the method comprising: transferring a pattern of an original plate onto a substrate using the photolithography apparatus as defined in the second aspect; and processing the transferred substrate to obtain the article.

[0009] Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] Figure 1 is a diagram showing the arrangement of an exposure apparatus (photolithography apparatus) according to the embodiment;

[0011] Figure 2 is a diagram showing the arrangement of a gate device according to an embodiment;

[0012] Figure 3 is a diagram showing the structure of a hub according to an embodiment;

[0013] FIG. 4A to FIG. 4C is a diagram showing the arrangement of a gate device according to an embodiment;

[0014] Figure 5 is an enlarged view showing a state where a gate blade is deformed;

[0015] Figure 6 is a diagram showing a first modification example;

[0016] Figure 7 is a diagram showing a second modification example;

[0017] Figure 8 is a diagram showing a third modification example;

[0018] Fig. 9 is a diagram showing a fourth modification example;

[0019] Fig.10 is a diagram showing a fifth modification example;

[0020] Fig.11 is a diagram showing a sixth modification; and

[0021] Fig.12 It is a diagram showing a seventh modification example. DETAILED DESCRIPTION

[0022] Hereinafter, the embodiments will be described in detail with reference to the accompanying drawings. Please note that the following embodiments are not intended to limit the scope of the claimed invention. A plurality of features are described in the embodiments, but the invention is not limited to all of these features, and a plurality of such features may be appropriately combined. In addition, in the accompanying drawings, the same reference numerals are given to the same or similar configurations, and their repeated descriptions are omitted.

[0023] Figure 1 The arrangement of an exposure apparatus 100 according to the embodiment is shown. The exposure apparatus 100 is an example of a photolithography apparatus that transfers a pattern of a master plate 2 to a substrate 3 using light. In addition to the exposure apparatus, an imprint apparatus is also an example of a photolithography apparatus.

[0024] The exposure device 100 may include a light source 1, a gate device 4, a master stage 5, a projection optical system 6, and a substrate stage 7. The exposure device 100 may include a control unit 13 that controls the operation of the exposure device 100. The exposure device 100 may be formed as a scanner (scanning exposure device) or a stepper. The light source 1 generates exposure light. For example, a mercury lamp, a laser light source, or an EUV light source may be used as the light source 1.

[0025] The original plate stage 5 is positioned relative to the two-dimensional direction parallel to the plane (i.e., XY plane) perpendicular to the optical axis (Z axis) of the projection optical system 6 and the rotation direction (i.e., θZ direction) around the optical axis (Z axis), so that the original plate 2 can be positioned. The original plate stage 5 can be driven by a driving mechanism (not shown). A reflecting mirror 8 can be arranged on the original plate stage 5. A laser interferometer 10 can be arranged at a position facing the reflecting mirror 8. The laser interferometer 10 can measure the position and rotation angle of the original plate stage 5 in the two-dimensional direction in real time, and provide the measurement results to the control unit 13. The control unit 13 can control the driving mechanism of the original plate stage 5 based on the measurement results from the laser interferometer 10, and position the original plate 2 held by the original plate stage 5.

[0026] The projection optical system 6 includes a plurality of optical elements, and projects the pattern of the original plate 2 onto the substrate 3 at a predetermined magnification. A photosensitive agent (resist) is coated on the substrate 3, and when the pattern of the original plate 2 is projected onto the photosensitive agent, a latent image pattern is formed on the photosensitive agent. The substrate stage 7 may include, for example, a Z stage for holding the substrate 3, an XY stage for supporting the Z stage, and a base for supporting the XY stage. The substrate stage 7 may be driven by a driving mechanism such as a linear motor.

[0027] A reflection mirror 9 may be arranged on the substrate stage 7. A laser interferometer 11 may be arranged at a position facing the reflection mirror 9. The laser interferometer 11 may measure the position of the substrate stage 7 in real time and provide the measurement result to the control unit 13. The control unit 13 may control the driving mechanism of the substrate stage 7 based on the measurement result from the laser interferometer 11 and position the substrate 3 held by the substrate stage 7.

[0028] When the exposure device 100 is formed as a stepper, in an exposure process in which the substrate 3 is exposed with the substrate stage 7 in place, the substrate 3 is irradiated with the exposure light generated by the light source 1. On the other hand, in the stepping stage of moving the substrate stage 7, the substrate 3 is not irradiated with the exposure light generated by the light source 1. The gate device 4 is arranged between the light source 1 and the original plate stage 5, and allows the exposure light to pass or blocks the exposure light. The gate device 4 allows the exposure light to pass during the exposure process, and blocks the exposure light in the stepping stage. The gate device 4 is configured to switch the irradiation / non-irradiation of the exposure light to the substrate 3, and the operation of the gate device 4 is controlled by the control unit 13. The arrangement of the gate device 4 will be exemplarily described below.

[0029] Figure 2 is a diagram showing the arrangement of the shutter device 4 according to the embodiment. The shutter device 4 may include: a rotation source 43 (e.g., a motor) that rotationally drives or rotates a rotation shaft 44; a hub 42 that is connected to the rotation shaft 44; and a shutter blade 41 that is fixed to the hub 42. The shutter blade 41 includes: a blocking portion 411 that blocks the exposure light EL from the light source 1; and a passing portion 412 that allows the exposure light EL to pass. Figure 2 In the illustrated example, the gate blade 41 includes three blocking portions 411 and three passing portions 412, but the number of the blocking portions 411 and the number of the passing portions 412 may be arbitrarily determined. When exposure of the substrate 3 is started, the control unit 13 rotates the gate blade 41 to change the blocking state in which the blocking portion 411 blocks the exposure light EL to the non-blocking state in which the passing portion 412 allows the exposure light EL to pass. On the other hand, when exposure of the substrate 3 is finished, the control unit 13 rotates the gate blade 41 again to change the non-blocking state in which the passing portion 412 allows the exposure light EL to pass to the blocking state in which the blocking portion 411 blocks the exposure light EL.

[0030] The structure of the hub 42 holding the gate blades 41 will be exemplarily described below. Figure 3 The structure of the hub 42 according to the embodiment is exemplarily shown. FIG. 4A to FIG. 4C A state in which the gate blade 41 according to the embodiment is attached to the hub 42 is exemplarily shown. Figure 4A The entire gate blade 41 is shown, Figure 4B A portion of the gate blade 41 is shown, and Figure 4C Shown along Figure 4B The section is taken along line AA in . Note that Figure 4C A state is shown in which a gap is provided between the hub 42 and the gate blade 41 but the hub 42 and the gate blade 41 may be partially or entirely in contact with each other.

[0031] The gate blade 41 may include at least one blade, and preferably includes a plurality of blades 41a, 41b, and 41c. Each of the plurality of blades 41a, 41b, and 41c includes a region serving as the above-mentioned blocking portion 411. The hub 42 includes a holding surface HS for holding the gate blade 41. The gate blade 41 is fixed to the hub 42 by a plurality of fasteners 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, and 19c. The gate blade 41 may include a plurality of openings 51a, 52a, 53a, 51b, 52b, 53b, 51c, 52c, and 53c. The plurality of fasteners 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, and 19c may include bolts extending through the openings, respectively. All or part of the plurality of fasteners 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c and 19c may be formed by welding or bonding. In the case of adopting welding or bonding, no opening for the bolt is required. In the case of using a bolt as a fastener, a toothed washer (locking washer) may be arranged between the gate blade 41 and the seat surface of the bolt. By scraping the seat surface with the teeth of the toothed washer, friction can be increased, and thus loosening of the bolt can be suppressed.

[0032] The first aspect of the hub 42 will be described below. The holding surface HS of the hub 42 may include first areas 14a, 14b, and 14c belonging to the same plane (plane P). The holding surface HS may also include second areas 15a, 15b, and 15c that do not belong to the plane P to which the first areas 14a, 14b, and 14c belong. Each of the first areas 14a, 14b, and 14c may be formed, for example, by a flat surface (planar area) belonging to the plane P. The second areas 15a, 15b, and 15c are areas separated from the plane P. Each of the second areas 15a, 15b, and 15c may be formed, for example, by a curved surface.

[0033] The holding surface HS may include a first area 14a and a second area 15a that do not belong to the same plane (plane P). The holding surface HS may include a first area 14b and a second area 15b that do not belong to the same plane (plane P). The holding surface HS may include a first area 14c and a second area 15c that do not belong to the same plane (plane P). Examples of forms in which the first area and the second area do not belong to the same plane (plane P) include: (1) a form in which the first area belongs to plane P and the second area does not belong to plane P; and (2) a form in which the second area belongs to plane P and the first area does not belong to plane P. Examples of forms in which a given area does not belong to plane P include: (1) a form in which the given area belongs to a plane parallel to plane P; (2) a form in which the given area belongs to a plane intersecting plane P; and (3) a form in which the given area is formed by a curved surface. Figure 3 and FIG. 4A to FIG. 4CAn example is shown in which each of the first regions 14 a , 14 b , and 14 c is formed of a flat surface belonging to the plane P, and each of the second regions 15 a , 15 b , and 15 c is formed of a curved surface separated from the plane P.

[0034] The blade 41a of the gate blade 41 is fixed to the hub 42 by the first fastener 17a in the first area 14a, and is fixed to the hub 42 by the second fastener 18a in the second area 15a. The blade 41b of the gate blade 41 is fixed to the hub 42 by the first fastener 17b in the first area 14b, and is fixed to the hub 42 by the second fastener 18b in the second area 15b. The blade 41c of the gate blade 41 is fixed to the hub 42 by the first fastener 17c in the first area 14c, and is fixed to the hub 42 by the second fastener 18c in the second area 15c. The gate blade 41, while being fixed to the hub 42, may include a first contact portion CP1 that contacts the first areas 14a, 14b, 14c, and a second contact portion CP2 that contacts the second areas 15a, 15b, 15c. This arrangement is conducive to improving the rigidity of the gate blade 41 and reducing assembly variations of the gate device 4.

[0035] The gate blade 41 includes a plurality of first openings 51a, 51b, 51c and a plurality of second openings 52a, 52b, and 52c. The first fasteners 17a, 17b, and 17c may include a plurality of first bolts extending through the first openings 51a, 51b, and 51c, respectively, and fastened to the screw holes 61a, 61b, and 61c of the hub 42. The second fasteners 18a, 18b, and 18c may include a plurality of second bolts extending through the second openings 52a, 52b, and 52c, respectively, and fastened to the screw holes 62a, 62b, and 62c of the hub 42.

[0036] As described above, the first regions 14a, 14b, and 14c and the second regions 15a, 15b, and 15c are arranged not to belong to the same plane (plane P). Therefore, when the blade 41a of the gate blade 41 is fastened to the hub 42 by the first fastener 17a and the second fastener 18a, it is deformed by the force (fastening force) from the first fastener 17a, the second fastener 18a, and the hub 42. Similarly, when the blade 41b of the gate blade 41 is fastened to the hub 42 by the first fastener 17b and the second fastener 18b, it is deformed by the force from the first fastener 17b, the second fastener 18b, and the hub 42. Similarly, when the blade 41c of the gate blade 41 is fastened to the hub 42 by the first fastener 17c and the second fastener 18c, it is deformed by the force from the first fastener 17c, the second fastener 18c, and the hub 42. That is, the gate blade 41 is forcibly deformed by being fixed to the hub 42 by the fastener.

[0037] Figure 5 The gate blade 41 is shown in a deformed state. Please note that Figure 5 The deformation of the gate blade 41 is shown in an enlarged manner. When the gate blade 41 is deformed by the forces from the fasteners 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c and 19c and the hub 42, the secondary moment of area increases compared to the case where the gate blade 41 is not deformed. This increases the rigidity of the gate blade 41.

[0038] When manufactured by stamping or 3D printing Figure 5 In the case of the gate blade having a curved shape as exemplified in FIG. 1 , it is difficult to perform mirror finishing on the gate blade. On the other hand, according to the present embodiment, the gate blade 41 having a flat shape is manufactured before being attached to the hub 42, and then attached to the hub 42 to be deformed, so that the rigidity can be improved. Therefore, in the present embodiment, it is easy to perform mirror finishing on the gate blade 41. By performing mirror finishing on the gate blade 41, it is possible to suppress the gate blade 41 from absorbing exposure light. This is conducive to suppressing deformation and melting of the gate blade 41 due to heat.

[0039] It is understood that the hub 42 has a second aspect to be described below. According to the second aspect, the retaining surface HS includes a first area 14a, a second area 15a, and a first area 14b. The second area 15a is arranged between the first area 14a and the first area 14b, the first area 14a and the first area 14b belong to the virtual plane (plane P), and the second area 15a does not belong to the virtual plane (plane P). The gate blade 41 is fixed to the hub 42 by the third fastener 19a in the first area 14b. The second area 15a can be formed by a curved surface. Alternatively, the second area 15a can be formed by a flat surface parallel to the virtual plane (plane P). For example, the second area 15a is recessed relative to the first area 14a and the first area 14b. The gate blade 41 includes a plurality of third openings 53a, 53b, and 53c. The third fasteners 19a, 19b, and 19c may include a plurality of first bolts extending through the plurality of third openings 53a, 53b, and 53c, respectively. The third fasteners 19 a , 19 b , and 19 c may include a plurality of third bolts extending through the third openings 53 a , 53 b , and 53 c , respectively, and fastened to the screw holes 63 a , 63 b , and 63 c of the hub 42 .

[0040] The following describes a modified example of the above embodiment. Matters not mentioned in the following description can be handled in accordance with the above embodiment.

[0041] Figure 6 A first modified example is shown. Figure 6 Corresponding to the Figure 4B The section is taken along line AA in . Figure 6As shown, the first area 14a of the holding surface HS of the hub 42 can be formed by a first flat surface belonging to a virtual plane (plane P), and the second area 15a of the holding surface HS can be formed by a second flat surface that does not belong to the virtual plane to which the first flat surface belongs. The second flat surface may be parallel to the first flat surface or may not be parallel to the first flat surface. On the other hand, the holding surface HS includes a first area 14a, a second area 15a and a first area 14b. The second area 15a is arranged between the first area 14a and the first area 14b, the first area 14a and the first area 14b belong to the virtual plane (plane P), and the second area 15a is formed by a second flat surface that does not belong to the virtual plane (plane P). The second area 15a is recessed relative to the first area 14a and the first area 14b.

[0042] Figure 7 A second modified example is shown. Figure 7 Corresponding to the Figure 4B The section is taken along line AA in . Figure 7 As shown, the first area 14a of the holding surface HS of the hub 42 is formed by a first flat surface belonging to a virtual plane (plane P), and the second area 15a of the holding surface HS is formed by a second flat surface that does not belong to the virtual plane to which the first flat surface belongs. The second flat surface may be parallel to the first flat surface or may not be parallel to the first flat surface. On the other hand, the holding surface HS includes a first area 14a, a second area 15a, and a first area 14b. The second area 15a is arranged between the first area 14a and the first area 14b. The holding surface HS may have a convex shape formed by the first area 14a, the second area 15a, and the first area 14b.

[0043] Figure 8 A third modified example is shown. Figure 8 Corresponding to the Figure 4B The section is taken along line AA in . Figure 8 As shown, the holding surface HS includes a first area 14a, a second area 15a and a first area 14b. The second area 15a is arranged between the first area 14a and the first area 14b. The first area 14a, the second area 15a and the first area 14b may be formed by flat surfaces that are not parallel to each other. The holding surface HS may have a convex shape formed by the first area 14a, the second area 15a and the first area 14b. The first area 14a and the first area 14b may be inclined areas.

[0044] Fig. 9 A fourth modification example is shown. Fig. 9 Corresponding to the Figure 4BThe hub 42 may include a base 421 connected to the rotating shaft 44, and a gasket 30 disposed between the base 421 and the gate blade 41. The surface of the base 421 includes the first area 14a (and the first area 14b), and the surface of the gasket 30 includes the second area 15a. By forming the hub 42 from the base 421 and the gasket 30 in this way, the hub 42 can be easily manufactured.

[0045] Fig.10 A fifth modification example is shown. Fig.10 Corresponding to the Figure 4B The cross section is taken along the line AA in FIG. The retaining surface HS of the gate blade 41 may include: a curved surface 71 connecting the first area 14a and the second area 15a. In addition, the retaining surface HS may include: a curved surface 72 connecting the second area 15a and the first area 14b. This arrangement helps to relieve the stress applied to the gate blade 41 by the boundary portion between the first area 14a and the second area 15a and / or the boundary portion between the second area 15a and the first area 14b. This may help to improve the durability of the gate blade 41 or the gate device 4. At least the portions of the first area 14a, the second area 15a and the first area 14b where the screw holes 61a, 61b and 61c are formed are preferably flat. This arrangement also helps to relieve the stress applied to the gate blade 41.

[0046] Fig.11 A sixth modification example is shown. Fig.11 Corresponding to the Figure 4B The sixth modification is a modification of the fifth modification. The holding surface HS of the gate blade 41 may have an asymmetric shape with respect to a virtual plane VP including the central axis of the rotation shaft 44 and the center of the second fastener 18a. Fig.10 The fifth modification shown can be understood as an example in which the holding surface HS of the gate blade 41 has a shape symmetrical with respect to a virtual plane VP including the central axis of the rotation shaft 44 and the center of the second fastener 18a. Fig.10 In the fifth modification shown, the inclination angle (inclination angle relative to the plane perpendicular to the virtual plane VP and the rotation axis 44) of the portion of the curved surface 72 of the gate blade 41 covering the holding surface HS of the hub 42 is θ1. Fig.11 In the sixth modification shown, the inclination angle (inclination angle relative to the plane perpendicular to the virtual plane VP and the rotation axis 44) of the portion of the curved surface 72 of the gate blade 41 covering the holding surface HS of the hub 42 is θ2, and θ2<θ1 holds. The gate blade 41 of the fifth modification is less affected by air resistance during rotation than the gate blade 41 of the fourth modification, thereby reducing the lift acting during rotation.

[0047] Fig.12The seventh modification is shown. In the seventh modification, the gate blade 41 is formed of a plurality of components, and each component includes one blade 60. That is, the gate blade 41 may include a plurality of blades 60 as follows, and these blades 60 can be divided and separated from each other when the fastening of the bolt 17 is loosened. The hub 42 includes a flat surface 14 and a curved surface 15, and each blade 60 is fastened to the flat surface 14 and the curved surface 15 by the bolt 17 and then deformed. When the gate blade 41 is formed of a plurality of components, the processing cost can be reduced.

[0048] The following will describe an article manufacturing method for manufacturing an article using a lithography apparatus represented by the exposure apparatus 100. The article may be, for example, a semiconductor IC element, a liquid crystal display element, a MEMS, etc. The article manufacturing method may include: a transfer step of transferring the pattern of the original plate to a substrate using a lithography apparatus, and a processing step of obtaining the article by processing the substrate after the transfer step. When the lithography apparatus is an exposure apparatus, the transfer step may include: an exposure step of exposing a substrate (wafer, glass substrate, etc.) coated with a photosensitive agent, and a step of developing the substrate (photosensitive agent) after the exposure step. When the lithography apparatus is an imprinting apparatus, the transfer step may include: a contact step of contacting the original plate with the imprinting material on the substrate, a curing step of curing the imprinting material, and a separation step of separating the original plate from the cured imprinting material. The processing step may include, for example, etching, resist removal, cutting, bonding, and packaging.

[0049] While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.

Claims

1. A gate device for allowing light to pass through and blocking light, comprising: a rotation source configured to rotationally drive the rotation shaft; a hub connected to the rotating shaft; as well as The gate blades, which are fixed to the hub, wherein the hub comprises a holding surface for holding the gate blade, and the holding surface comprises a first area belonging to a predetermined plane and a second area separated from the predetermined plane, and The gate blade contacts the first area and the second area while being fixed to the hub.

2. The gate device according to claim 1, wherein: The gate blade is fastened to the hub by first fasteners in the first region and fastened to the hub by second fasteners in the second region.

3. The gate device according to claim 2, wherein: The gate blade includes a first opening and a second opening, and The first fastener includes a first bolt extending through the first opening, and the second fastener includes a second bolt extending through the second opening.

4. The gate device according to claim 2, wherein: The gate blade is deformed by the force from the first fastener, the second fastener and the hub.

5. The gate device according to claim 1, wherein: The gate blade includes a contact portion that contacts the first region and a contact portion that contacts the second region while being fixed to the hub.

6. The gate device according to claim 1, wherein: The first region of the holding surface is formed by a flat surface, and the second region of the holding surface is formed by a curved surface.

7. The gate device according to claim 1, wherein: The first region is formed by a first flat surface, and the second region is formed by a second flat surface that does not belong to the virtual plane to which the first flat surface belongs.

8. The gate device according to claim 1, wherein: The holding surface further comprises another first region, The second region is arranged between the first region and the further first region, The first area and the further first area belong to a virtual plane, The second region does not belong to the virtual plane, and The gate blade is secured to the hub by a third fastener in the another first region.

9. The gate device according to claim 8, wherein: The second region is formed by a curved surface.

10. The gate device according to claim 8, wherein: The second region is formed by a flat surface parallel to the virtual plane.

11. The gate device according to claim 8, wherein: The second region is recessed relative to the first region and the further first region.

12. The gate device according to claim 11, wherein: The holding surface includes: a curved surface connecting the first area and the second area, and a curved surface connecting the second area and the other first area.

13. The gate device according to claim 12, wherein: The retaining surface has an asymmetrical shape with respect to a virtual plane including a central axis of the rotation shaft and a center of a second fastening member fastening the gate blade to the hub in the second region.

14. The gate device according to claim 8, wherein: The first region, the second region, and the another first region form a convex shape.

15. The gate device according to claim 1, wherein: The holding surface further comprises another first region, The second region is arranged between the first region and the further first region, The first region, the second region and the further first region are formed by flat surfaces that are not parallel to each other, and The gate blade is secured to the hub by a third fastener in the another first region.

16. The gate device according to claim 15, wherein: The holding surface has a convex shape formed by the first area, the second area, and the further first area.

17. The gate device according to claim 1, wherein: The hub includes: a base connected to the rotating shaft, and a gasket arranged between the base and the gate blade, and The surface of the substrate includes a first region, and the surface of the gasket includes a second region.

18. The gate device according to claim 1, wherein: The gate blade is formed from a plurality of components.

19. A photolithography apparatus for transferring a pattern of an original plate to a substrate using light, the photolithography apparatus comprising: A gate device as defined in any one of claims 1 to 17 arranged to control the illumination of light onto a substrate.

20. A method of manufacturing an article, comprising: Using the lithography apparatus defined in claim 19 to transfer the pattern of the original plate onto a substrate; as well as The transferred substrate is processed to obtain an article.

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