A chemical solution separation device for semiconductor production

Abstract

The present invention belongs to the field of semiconductor technology, and specifically is a chemical solution separation device for semiconductor production; it comprises a protective box; a protective square plate, which is installed inside the protective box and divides the inside of the protective box into an upper cavity and a lower cavity; and a chamber liquid separation mechanism, which is used to use the chemical solution required for chip production in the upper cavity / lower cavity; the chamber liquid separation mechanism comprises: two telescopic cylinders, which are symmetrically connected to the bottom of the protective box, and each telescopic cylinder comprises an output end, and the output end extends out of the bottom of the protective box; two displacement horizontal plates, which are respectively arranged on the output ends of the two telescopic cylinders; the chamber liquid separation mechanism can avoid mixing of different types of highly corrosive chemical solutions to cause violent chemical reactions, reduce the safety hazards and risks in the production of semiconductor chips, and avoid harm to the health of surrounding workers, thereby improving the production effect of semiconductor chips.

Description

Technical Field

[0001] The invention belongs to the technical field of semiconductors, and in particular relates to a chemical solution separation device for semiconductor production. Background Art

[0002] A semiconductor chip is a micro device that integrates a large number of electronic components and circuits on semiconductor materials. It is usually made of wafers (usually silicon wafers) as the basic material. On the wafers, electronic components such as transistors, resistors, capacitors, etc. are manufactured through complex process steps such as photolithography, etching, doping, etc., and they are connected into circuits. In the production process of semiconductor chips, some highly corrosive chemical solutions are often used for cleaning and etching, but the types of corrosive chemical solutions used in different production and manufacturing links of semiconductor chips are also different. Such solutions will produce violent chemical reactions when mixed with other non-similar solvents, resulting in safety risks in the production of semiconductor chips. At the same time, the presence of these highly corrosive solutions will pollute the surrounding environment, which not only accelerates the corrosion of the production equipment and shortens the service life of the production equipment, but also harms the health of the staff next to the equipment, thereby reducing the effect of semiconductor chip production. Summary of the invention

[0003] In view of the above situation, in order to overcome the defects of the prior art, the present invention provides a chemical solution separation device for semiconductor production, which effectively solves the problems in the above background technology.

[0004] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a chemical solution separation device for semiconductor production, comprising a protective box; a protective square plate, installed inside the protective box and dividing the inside of the protective box into an upper cavity and a lower cavity; and a chamber liquid separation mechanism, used to use the chemical solution required for chip production in the upper cavity / lower cavity; the chamber liquid separation mechanism comprises: two telescopic cylinders, symmetrically connected to the bottom of the protective box, and each telescopic cylinder comprises an output end, and the output end extends out of the bottom of the protective box; two displacement cross plates, respectively arranged on the output ends of the two telescopic cylinders; a rectangular block, located in the center of the bottom of the protective box, and respectively on opposite sides; It is connected with two displacement horizontal plates so that the center point of the rectangular block and the endpoints of the two displacement horizontal plates are on the same straight line, and the straight line is used as the symmetry axis; four positioning horizontal blocks are respectively arranged at the four bending parts of the rectangular block; two arc-shaped solid blocks are relatively arranged on both sides of the symmetry axis, and the two endpoints of each arc-shaped solid block are respectively connected with the two positioning horizontal blocks; a rotating part is located at the bottom of the protective box; the rotating part includes: a rotating disk, which is located in the protective box; a rotating motor, which is arranged on one side of the rectangular block close to the protective box and is used to drive the rotation of the rotating disk; two sets of follow-up monitoring units are relatively arranged on both sides of the rectangular block to monitor the moving state of the rotating motor.

[0005] Preferably, the rotating part also includes: a positioning square groove, one side of which extends to the bottom of the protective box body and the other side extends into the lower cavity; a positioning block, which is fitted in the positioning square groove; a positioning bearing, which is located at the center of the positioning block and has a circular hole at the center, and a groove is provided on the side wall of the circular hole; a positioning shaft, which is connected to the circular hole, and a protrusion is provided on the side wall of the positioning shaft, and the protrusion is slidably connected to the groove; a positioning slot, which is provided at one end of the positioning shaft away from the protective box body and is fitted with the output end of the rotating motor; a rotating disk, which is located in the lower cavity and is provided at one end of the positioning shaft away from the positioning slot; a semiconductor chip is placed on the side of the rotating disk away from the positioning shaft.

[0006] Preferably, it also includes a moving part, which is arranged on the protective square plate; the moving part includes: a circular groove, which is located at the center of the protective square plate; a plurality of guide blocks, which are installed on the inner wall of the circular groove; an annular insulating block, the outer wall of the annular insulating block is in contact with the inner wall of the circular groove, and is used to slide in the circular groove; a guide square groove, which is arranged on the outer wall of the annular insulating block, and the position and number are the same as those of the guide blocks; a guide cylinder, whose two ends are connected to the inner wall of the guide square groove; a guide spring, which is sleeved on the guide cylinder; one end of the guide spring is fixedly connected to the inner wall of the guide square groove, and the other end is fixedly connected to the guide block The guide block is located in the guide square groove and is slidably connected to the guide cylinder; the first spray circular plate is installed on the top of the annular isolation block; the second spray circular plate is installed on the bottom of the annular isolation block; the diameter of the notch on the second spray circular plate is larger than the positioning shaft, so that the positioning shaft passes through the second spray circular plate; the rotating disc is located between the first spray circular plate and the second spray circular plate; the annular rotating block is installed on the side of the rotating disc close to the rotating motor; the annular rotating groove is arranged on the side of the second spray circular plate away from the rotating motor, the annular rotating groove and the annular rotating block are slidably matched and the two are nested and connected; the separation exhaust member is arranged in the annular isolation block.

[0007] Preferably, the separation exhaust component includes: an exhaust hole, which is arranged on the side wall of the annular isolation block; a first drain pipe, which is installed on the top of the protective box, the output end of the first drain pipe is far away from the protective box, and the input end of the first drain pipe is located in the upper cavity; a second drain pipe, which is installed on the bottom of the protective box, the output end of the second drain pipe is far away from the protective box, and the input end of the second drain pipe is located in the lower cavity; a third drain pipe, which is installed on the first spray circular plate, the input end of the third drain pipe is located in the annular isolation block, and the output end of the third drain pipe is located in the upper cavity; a fourth drain pipe, which is installed on the second spray circular plate; the input end of the fourth drain pipe is located in the annular isolation block, and the output end of the fourth drain pipe is located in the lower cavity; a plurality of exhaust ducts are installed respectively on At the upper cavity and the lower cavity; the output end of the exhaust duct is far away from the protective box; the input ends of the exhaust ducts are respectively located in the upper cavity and the lower cavity and are retractable; when the annular isolation block is located in the lower cavity, the exhaust hole is connected with the input end of the exhaust duct in the lower cavity, the third drain pipe is no longer connected with the first drain pipe on the upper cavity, and the fourth drain pipe is connected with the second drain pipe; on the contrary, when the annular isolation block is located in the upper cavity, the fourth drain pipe is disconnected from the second drain pipe, and the exhaust hole is no longer connected with the input end of the exhaust duct in the lower cavity. At this time, the output end of the third drain pipe is connected with the input end of the first drain pipe, and the input end of the exhaust duct in the upper cavity is connected with the exhaust hole; a filter round block is installed on the output end of the exhaust duct.

[0008] Preferably, it also includes a reset member; the reset member is arranged on the positioning cross block, including: positioning cylinders, the number of which is the same as the number of the positioning cross blocks, and the two are slidably matched; the end points of the positioning cylinders are fixed to the bottom of the protective box body; a positioning spring, which is sleeved on the positioning cylinder; one end of the positioning spring is fixedly connected to the bottom of the protective box body, and the other end is fixedly connected to the positioning cross block.

[0009] Preferably, the follow-up monitoring unit includes: an auxiliary square tube, which is arranged on the bottom of the protective box; an auxiliary square column, which is slidably arranged in the auxiliary square tube; an auxiliary spring, which is located in the auxiliary square tube, one end of the auxiliary spring is fixedly connected to the inner bottom surface of the auxiliary square tube, and the other end is fixedly connected to the auxiliary square column located in the end point of the auxiliary square tube; a U-shaped base, which is installed at the end of the auxiliary square column away from the protective box; an auxiliary cylinder, which is installed on the opposite surface of the U-shaped base; an auxiliary square plate, which is slidably arranged on the auxiliary cylinder; an extrusion spring, which is sleeved on the auxiliary cylinder; one end of the extrusion spring is connected to the U-shaped base, and the other end is connected to the auxiliary square plate; an auxiliary block, which is installed on the side of the auxiliary square plate away from the U-shaped base; and a guide member, which is arranged on the auxiliary block.

[0010] Preferably, the guide member includes: a T-shaped cross block, which is arranged on the side of the auxiliary block away from the auxiliary square plate; a guide rail groove, which is arranged on the side of the T-shaped cross block away from the auxiliary block; a guide wheel, which is installed on the side of the rectangular block; the guide wheel and the guide rail groove are slidably arranged; a driving square column, which is slidably arranged on the auxiliary block; a driving limit plate is installed at the end of the driving square column away from the rotating motor; a positioning wheel is installed at the end of the driving square column close to the rotating motor, so that the positioning wheel is fitted with the side wall of the rotating motor; a driving spring, which is sleeved on the driving square column; one end of the driving spring is fixedly connected to the driving limit plate, and the other end is fixedly connected to the auxiliary block.

[0011] Preferably, it also includes a de-duster re-entrainer, which is arranged on the arc-shaped solid block; including: two first substrates, installed on one side of the protective box; a guide roller and a winding roller, which jointly connect the opposite sides of the two first substrates; the winding roller is located higher than the guide roller; a cable, one end of which is connected to the arc-shaped solid block, and the other end is wrapped around the guide roller and connected to the winding roller; two driving shafts, respectively connected to the opposite back sides of the two first substrates; the driving shaft is transmission-connected to the winding roller; two clockwork springs, respectively installed on the two driving shafts, and the end points of the clockwork springs are connected to the first substrates; a driving bevel gear, installed on one of the driving shafts; a re-rotating pressure assembly, arranged on the driving bevel gear; a scraper, arranged on the driving shaft.

[0012] Preferably, the scraper includes: a driven circular plate, installed on one end of the driving shaft away from the first substrate; a driven cylinder, installed on the side of the driven circular plate away from the driving shaft; a driven cross block, slidably arranged on the driven cylinder; two limiting cylinders, symmetrically installed on the top of the driven cross block; a second substrate, slidably connected to the two limiting cylinders; the second substrate is fixed on the protective box body; a bent square rod, one end of which is installed on the limiting cylinder and the other end is equipped with a scraper, so that the blade of the scraper is in contact with the side of the filter block away from the protective box body.

[0013] Preferably, the compound rotation pressure-applying assembly comprises: a rotating bevel gear meshingly connected with the driving bevel gear; a driven shaft, one end of which is mounted on the rotating bevel gear, and the other end of which is mounted with a driving pulley; a T-shaped base fixed on the protective box; and rotatably connected with the driven shaft; a transmission belt, one end of which is transmission-connected to the driving pulley, and the other end of which is connected to the driven pulley; the transmission belt slidingly cooperates with the driving pulley and the driven pulley; the driving shaft, one end of which is connected to a side of the driven pulley close to the protective box, and the other end is connected to the T-shaped base; a telescopic shaft, one end of which is connected to a side of the driven pulley away from the protective box, and the other end is connected to a compound cam; two L-shaped square rods, symmetrically mounted on both sides of the auxiliary square block; a compound long block, connected to one end of the two L-shaped square rods away from the rotating motor; the side of the compound long block away from the rotating motor is located on the rotation path of the compound cam; displacement sensors are respectively arranged on the same plane of the compound long block and the compound cam.

[0014] Compared with the prior art, the present invention has the following beneficial effects:

[0015] (1) Through the chamber liquid separation mechanism, the semiconductor chip is placed in a closed space to use these highly corrosive chemical solutions. The first spray disc or the second spray disc can be operated to spray the required highly corrosive chemical solution onto the surface of the semiconductor chip. At this time, the annular isolation block on the semiconductor chip is used in any cavity of the upper or lower cavity. Since the annular rotating groove on the second spray disc is nested and connected with the annular rotating block on the rotating disc, the annular isolation block is driven to move from the lower cavity to the upper cavity, so that the semiconductor chip is moved to the new cavity, and other different types of highly corrosive chemical solutions can be sprayed on the chip, so that different types of highly corrosive chemical solutions can be used in the production process of semiconductor chips. The corrosive chemical solutions are used in different chambers to avoid mixing of different types of highly corrosive chemical solutions to cause violent chemical reactions, reducing the potential safety hazards and risks in the production of semiconductor chips. At the same time, the chemical solutions are produced in a closed environment to avoid these highly corrosive solutions from polluting the surrounding environment or people and things, reducing the corrosion intensity of the device and the surroundings, and increasing the service life of the device. At the same time, it avoids harm to the health of surrounding workers and improves the production effect of semiconductor chips. At the same time, the chemical solutions required for production can be separated and set so that they can act on the chips in different chambers according to their different properties, reducing the limitations of semiconductor chips in production. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The accompanying drawings are used to provide further understanding of the present invention and constitute a part of the specification. They are used to explain the present invention together with the embodiments of the present invention and do not constitute a limitation of the present invention.

[0017] In the attached picture:

[0018] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0019] Figure 2 It is a cross-sectional view of the protective box of the present invention;

[0020] Figure 3 This is an exploded view of the annular isolation block of the present invention;

[0021] Figure 4 It is a schematic diagram of the structure of the driven column of the present invention;

[0022] Figure 5 It is a cross-sectional view of the first spray circular plate of the present invention;

[0023] Figure 6 It is a schematic diagram of the rectangular block structure of the present invention;

[0024] Figure 7 It is a schematic diagram of the structure of the winding roller of the present invention;

[0025] Figure 8 This is a cross-sectional view of the positioning slot of the present invention;

[0026] Fig. 9 is a cross-sectional view of a second spray circular plate of the present invention;

[0027] Fig.10 This is a schematic diagram of the structure of the arc-shaped solid block of the present invention;

[0028] Fig.11 It is a schematic diagram of the structure of the scraper of the present invention;

[0029] Fig.12 It is a cross-sectional view of the rotating disc of the present invention;

[0030] Fig.13 This is a schematic diagram of the positioning wheel structure of the present invention.

[0031] Fig.14 The schematic diagram of the rotary motor structure of the present invention is

[0032] Fig.15 This is an exploded view of the positioning bearing of the present invention.

[0033] In the figure: 1, protective box; 2, protective square plate; 3, telescopic cylinder; 4, displacement horizontal plate; 5, rectangular block; 6, positioning horizontal block; 7, arc-shaped solid block; 8, rotating motor; 9, positioning block; 10, positioning bearing; 11, positioning shaft; 12, positioning slot; 13, rotating disc; 14, guide block; 15, annular isolation block; 16, guide square slot; 17, guide cylinder; 18, guide spring; 19. First spray circular plate; 20. Second spray circular plate; 21. Auxiliary square cylinder; 22. Auxiliary square column; 23. Auxiliary spring; 24. U-shaped base; 25. Auxiliary cylinder; 26. Auxiliary square plate; 27. Extrusion spring; 28. Auxiliary square block; 29. ​​T-shaped horizontal block; 30. Guide rail groove; 31. Guide wheel; 32. Drive square column; 33. Drive limit plate; 34. Positioning wheel; 35. Drive spring; 36 , annular rotating block; 37, annular rotating groove; 38, first drain pipe; 39, second drain pipe; 40, third drain pipe; 41, fourth drain pipe; 42, exhaust duct; 43, positioning cylinder; 44, positioning spring; 45, filter round block; 46, first substrate; 47, guide roller; 48, winding roller; 49, cable; 50, drive shaft; 51, spring spring; 52, drive bevel gear; 53, from Moving circular plate; 54, driven cylinder; 55, driven horizontal block; 56, limiting cylinder; 57, second base plate; 58, bending square rod; 59, scraper; 60, rotating bevel gear; 61, driven shaft; 62, T-type base; 63, driving pulley; 64, transmission belt; 65, driven pulley; 66, driving shaft; 67, telescopic shaft; 68, compound cam; 69, L-shaped square rod; 70, compound long block. DETAILED DESCRIPTION

[0034] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments; based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0035] Example, by Figures 1 to 15 The present invention comprises a protective box 1; a protective square plate 2, which is installed inside the protective box 1 and divides the interior of the protective box 1 into an upper cavity and a lower cavity. And a chamber liquid separation mechanism, which is used to use the chemical solution required for chip production in the upper cavity / lower cavity;

[0036] In this embodiment, the chamber liquid separation mechanism includes: two telescopic cylinders 3, symmetrically connected to the bottom of the protective box 1, and each telescopic cylinder 3 includes an output end, and the output end extends out of the bottom of the protective box 1; two displacement cross plates 4, respectively arranged on the output ends of the two telescopic cylinders 3; a rectangular block 5, located at the center of the bottom of the protective box 1, and connected to the two displacement cross plates 4 on the opposite sides, so that the center point of the rectangular block 5 and the end points of the two displacement cross plates 4 are on the same straight line, and the straight line is used as the symmetry axis; four positioning cross blocks 6, respectively arranged at the four bending parts of the rectangular block 5; two arc-shaped solid blocks 7, relatively arranged on both sides of the symmetry axis, and the two end points of each arc-shaped solid block 7 are respectively connected to the two positioning horizontal blocks 6; a rotating member, located at the bottom of the protective box body 1; the rotating member includes: a rotating disk 13, located in the protective box body 1; a rotating motor 8, arranged on one side of the rectangular block 5 close to the protective box body 1, and used to drive the rotation of the rotating disk 13; two sets of follow-up monitoring units, relatively arranged on both sides of the rectangular block 5, for monitoring the moving state of the rotating motor 8.

[0037] In this embodiment, the rotating part also includes: a positioning square groove, one side of which extends to the bottom of the protective box 1 and the other side extends into the lower cavity; a positioning block 9, which is fitted in the positioning square groove; a positioning bearing 10, which is located at the center of the positioning block 9, and a circular hole is opened at the center, and a groove is provided on the side wall of the circular hole; a positioning shaft 11, which is connected to the circular hole, and a protrusion is provided on the side wall of the positioning shaft 11, and the protrusion is slidably connected to the groove; a positioning slot 12, which is arranged at the end of the positioning shaft 11 away from the protective box 1, and is fitted and connected with the output end of the rotating motor 8; a rotating disk 13, which is located in the lower cavity and is arranged at the end of the positioning shaft 11 away from the positioning slot 12; a semiconductor chip is placed on the side of the rotating disk 13 away from the positioning shaft 11.

[0038] In the present embodiment, a moving part is also included, and the moving part is arranged on the protective square plate 2; the moving part includes: a circular groove, which is located at the center of the protective square plate 2; a plurality of guide blocks 14, which are installed on the inner wall of the circular groove; an annular isolation block 15, the outer wall of the annular isolation block 15 is in contact with the inner wall of the circular groove, and is used to slide in the circular groove; a guide square groove 16, which is arranged on the outer wall of the annular isolation block 15, and the position and number are the same as those of the guide blocks 14; a guide cylinder 17, whose two ends are connected to the inner wall of the guide square groove 16; a guide spring 18, which is sleeved on the guide cylinder 17; one end of the guide spring 18 is fixedly connected to the inner wall of the guide square groove 16, and the other end is fixedly connected to the guide block 14, and the guide block 14 is located in the guide square groove 16 and is slidably connected to the guide cylinder 17; the first spray circular plate 19 is installed on the top of the annular isolation block 15; the second spray circular plate 20 is installed on the bottom of the annular isolation block 15; the diameter of the notch on the second spray circular plate 20 is larger than the positioning shaft 11, so that the positioning shaft 11 passes through the second spray circular plate 20; the rotating disc 13 is located between the first spray circular plate 19 and the second spray circular plate 20; the annular rotating block 36 is installed on the side of the rotating disc 13 close to the rotating motor 8; the annular rotating groove 37 is arranged on the side of the second spray circular plate 20 away from the rotating motor 8, the annular rotating groove 37 and the annular rotating block 36 are slidably matched and the two are nested and connected; the separation exhaust member is arranged in the annular isolation block 15.

[0039] In this embodiment, the separation exhaust component includes: an exhaust hole, which is arranged on the side wall of the annular isolation block 15; a first drain pipe 38, which is installed on the top of the protective box 1, and the output end of the first drain pipe 38 is far away from the protective box 1, and the input end of the first drain pipe 38 is located in the upper cavity; a second drain pipe 39, which is installed on the bottom of the protective box 1, and the output end of the second drain pipe 39 is far away from the protective box 1, and the input end of the second drain pipe 39 is located in the lower cavity; a third drain pipe 40, which is installed on the first spray circular plate 19, and the input end of the third drain pipe 40 is located in the annular isolation block 15, and the output end of the third drain pipe 40 is located in the upper cavity; a fourth drain pipe 41, which is installed on the second spray circular plate 20; the input end of the fourth drain pipe 41 is located in the annular isolation block 15, and the output end of the fourth drain pipe 41 is located in the lower cavity; a plurality of exhaust ducts 42, which are separated They are respectively installed in the upper cavity and the lower cavity; the output end of the exhaust duct 42 is far away from the protective box 1; the input ends of several exhaust ducts 42 are respectively located in the upper cavity and the lower cavity and are retractable; when the annular isolation block 15 is located in the lower cavity, the exhaust hole is connected with the input end of the exhaust duct 42 in the lower cavity, the third drain pipe 40 is no longer connected with the first drain pipe 38 on the upper cavity, and the fourth drain pipe 41 is connected with the second drain pipe 39; on the contrary, when the annular isolation block 15 is located in the upper cavity, the fourth drain pipe 41 is disconnected from the second drain pipe 39, and the exhaust hole is no longer connected with the input end of the exhaust duct 42 in the lower cavity. At this time, the output end of the third drain pipe 40 is connected with the input end of the first drain pipe 38, and the input end of the exhaust duct 42 in the upper cavity is connected with the exhaust hole; a filter round block 45 is installed on the output end of the exhaust duct 42.

[0040] In this embodiment, a reset member is also included; the reset member is arranged on the positioning cross block 6, including: positioning cylinders 43, the number of which is the same as the number of the positioning cross block 6, and the two are slidably matched; the end points of the positioning cylinders 43 are fixed to the bottom of the protective box body 1; a positioning spring 44 is sleeved on the positioning cylinder 43; one end of the positioning spring 44 is fixedly connected to the bottom of the protective box body 1, and the other end is fixedly connected to the positioning cross block 6.

[0041] The semiconductor chip required for production is fixed on the rotating disc 13, and by starting the rotating motor 8, its output end drives the positioning shaft 11 to rotate through the positioning slot 12, so that the rotating disc 13 on it rotates, and the rotating disc 13 is located in the annular isolation block 15, and the upper and lower sides of the annular isolation block 15 are connected by the first spraying disc 19 and the second spraying disc 20, so that the annular isolation block 15 is closed, so that the inside of the annular isolation block 15 is closed, and the high-corrosion semiconductor chip required for production can be produced by operating the first spraying disc 19 or the second spraying disc 20. The corrosive chemical solution is sprayed onto the surface of the semiconductor chip, so that the semiconductor chip uses these highly corrosive chemical solutions in a confined space. At this time, the annular isolation block 15 on the semiconductor chip is used in any cavity of the upper or lower cavity. By starting the telescopic cylinder 3, its output end drives the rectangular block 5 to move toward the direction of the protective box 1. Since the several protrusions on the side wall of the positioning shaft 11 fit with the grooves on the positioning bearing 10, the positioning bearing 10 is driven to rotate, so that the positioning shaft 11 rotates smoothly, so that the positioning shaft 11 can rotate during the movement, The positioning shaft 11 is driven to move. Since the annular groove 37 on the second spray circular plate 20 is nested and connected with the annular rotating block 36 on the rotating disk 13, the annular isolation block 15 is driven to move, so that it moves from the lower cavity to the upper cavity, so that the semiconductor chip is moved to the new cavity, and other different types of highly corrosive chemical solutions can be sprayed on the chip, so that different types of highly corrosive chemical solutions used in the production process of the semiconductor chip are located in different cavities for use, avoiding the mixing of different types of highly corrosive chemical solutions to cause violent chemical reactions, reducing the safety hazards and risks of semiconductor chips during production, and at the same time, the chemical solutions are produced in a closed environment to avoid these highly corrosive solutions from polluting the surrounding environment or people and things, reducing the corrosion intensity of the device and the surroundings, and improving the service life of the device. At the same time, it is avoided to cause harm to the health of the surrounding staff, and the production effect of the semiconductor chip is improved; at the same time, the chemical solutions required for production can be separated and set, so that they act on the chip in different cavities according to their different properties, reducing the limitations of semiconductor chips during production.

[0042] It is worth mentioning that when the rotating disk 13 drives the semiconductor chip to rotate so as to evenly receive the sprayed chemical solution, the rotating disk 13 is rotated on the annular rotating groove 37 through the annular rotating block 36. The rotation limit setting of the rotating disk 13 avoids the shaking of the rotating disk 13 during rotation, improves the stability of the semiconductor chip during rotation, enables it to stably receive the spraying of the chemical solution, and improves the production effect of the semiconductor chip; at the same time, when the rectangular block 5 drives the chip to move, that is, moves it to different cavities for production and processing, the rectangular block 5 moves on the upper limit of the positioning cylinder 43 through the positioning cross block 6, so that the positioning spring 44 is in a buffering state, and the movement limit setting of the annular isolation block 15 avoids the shaking of the chip on the annular isolation block 15 during movement, improves the stability of the annular isolation block 15 during movement, and avoids the annular The shaking of the isolation block 15 causes the internal chips to be dislocated, etc., which makes it impossible to evenly receive the spray of the chemical solution, thereby improving the production effect of the chips and reducing the limitations of semiconductor chips during production; at the same time, when the annular isolation block 15 moves, the guide cylinders 17 on the guide square grooves 16 all move at the guide square block 14, and the movement limit of the annular isolation block 15 is further set, so that the guide spring 18 is in a buffering state, so that the annular isolation block 15 can move smoothly while ensuring the sealing of the upper and lower cavities. When the annular isolation block 15 needs to be reset and moved, the limit and output of the output end of the telescopic cylinder 3 are released, and the annular isolation block 15 can be reset and moved by resetting the guide spring 18 and the positioning spring 44, avoiding the need to operate the telescopic cylinder 3 to reset the annular isolation block 15, reducing the energy consumption of the device during use, and improving the environmental protection effect of the device during use.

[0043] When the annular isolation block 15 is located in the lower cavity, the exhaust hole is connected to the input end of the exhaust duct 42 in the lower cavity, and the waste gas generated in the production process can be discharged through the exhaust duct 42 and the exhaust hole. At this time, the third drain pipe 40 is no longer connected to the first drain pipe 38 on the upper cavity, and the fourth drain pipe 41 is connected to the second drain pipe 39, so that the waste liquid after the production step of this stage is completed can be discharged through the fourth drain pipe 41 and the second drain pipe 39; on the contrary, when the annular isolation block 15 is located in the upper cavity, the fourth drain pipe 41 is disconnected from the second drain pipe 39, and the exhaust hole is no longer connected to the input end of the exhaust duct 42 in the lower cavity. At this time, the output end of the third drain pipe 40 is connected to the output end of the first drain pipe 38. The inlet end is connected to discharge the waste liquid generated in the production process. The input end of the exhaust duct 42 in the upper cavity is connected to the exhaust hole to discharge the above-mentioned waste gas, and the above-mentioned waste gas can be discharged separately. The semiconductor chip is used in a closed annular isolation block 15, and the annular isolation block 15 is used in different cavities in the protective box 1. Multiple protections can avoid mixing between different types of highly corrosive solutions required for chip manufacturing, thereby improving the production effect and safety of the chip. In addition, by providing a filter block 45 on the exhaust duct 42, the exhaust duct 42 can prevent impurities from entering the protective box 1 regardless of ventilation or air supply in the upper and lower cavities, thereby ensuring the production environment of the chip and improving the use effect of the device.

[0044] In this embodiment, the follow-up monitoring unit includes: an auxiliary square cylinder 21, which is arranged on the bottom of the protective box 1; an auxiliary square column 22, which is slidably arranged in the auxiliary square cylinder 21; an auxiliary spring 23, which is located in the auxiliary square cylinder 21, one end of the auxiliary spring 23 is fixedly connected to the inner bottom surface of the auxiliary square cylinder 21, and the other end is fixedly connected to the auxiliary square column 22 located in the end point of the auxiliary square cylinder 21; a U-shaped base 24, which is installed at the end of the auxiliary square column 22 away from the protective box 1; an auxiliary cylinder 25, which is installed on the opposite surface in the U-shaped base 24; an auxiliary square plate 26, which is slidably arranged on the auxiliary cylinder 25; an extrusion spring 27, which is sleeved on the auxiliary cylinder 25; one end of the extrusion spring 27 is connected to the U-shaped base 24, and the other end is connected to the auxiliary square plate 26; an auxiliary block 28, which is installed on the side of the auxiliary square plate 26 away from the U-shaped base 24; a guide member, which is arranged on the auxiliary block 28.

[0045] In this embodiment, the guide member includes: a T-shaped cross block 29, which is arranged on the side of the auxiliary block 28 away from the auxiliary square plate 26; a guide groove 30, which is arranged on the side of the T-shaped cross block 29 away from the auxiliary block 28; a guide wheel 31, which is installed on the side of the rectangular block 5; the guide wheel 31 and the guide groove 30 are slidably arranged; a driving square column 32, which is slidably arranged on the auxiliary block 28; a driving limit plate 33 is installed at one end of the driving square column 32 away from the rotating motor 8; a positioning wheel 34 is installed at one end of the driving square column 32 close to the rotating motor 8, so that the positioning wheel 34 is in contact with the side wall of the rotating motor 8; a driving spring 35, which is sleeved on the driving square column 32; one end of the driving spring 35 is fixedly connected to the driving limit plate 33, and the other end is fixedly connected to the auxiliary block 28.

[0046] When the annular isolation block 15 is moving, the rotary motor 8 moves synchronously. Since both sides of the annular isolation block 15 are in contact with the positioning wheel 34, the rotary motor 8 is positioned and set to avoid shaking or dislocation of the rotary motor 8 during movement, thereby improving the stability of the rotary motor 8 and the annular isolation block 15 during movement. At the same time, if the annular isolation block 15 shakes during movement, the impact force will be transmitted to the rotary motor 8, causing it to shake due to the above-mentioned impact force. At this time, pressure will be exerted on the positioning wheel 34 under the action of the rotary motor 8, causing the positioning wheel 34 to be displaced on the auxiliary block 28 through the driving square column 32, so that the driving spring 35 is in a buffered state. A sensor (not shown in the figure) can be provided on the driving spring 35. The sensor converts the above-mentioned buffered state into an electrical signal and sends it to the control board to notify the operator so that the operator can know the phenomenon at the first time, thereby avoiding the annular isolation block 15 from shaking during the internal chip production process. The excessive friction caused by the friction between the annular isolation block 15 and the rotating motor 8 during movement can reduce the impact force caused by the shaking of the annular isolation block 15 and the rotating motor 8 during movement, thereby improving the stability of the annular isolation block 15 during movement and improving the use effect of the device. It is worth mentioning that when the rectangular block 5 drives the rotating motor 8 to move, the guide wheel 31 on the rectangular block 5 will also contact the T-shaped cross block 29, thereby exerting pressure on it, so that it can move in the auxiliary square tube 21 through the auxiliary square block 28, the auxiliary square plate 26 and the auxiliary square column 22 on the U-shaped base 24, so that the auxiliary spring 23 is in a buffering state, thereby driving the positioning wheel 34 to move, so that the annular isolation block 15 can keep the positioning wheel 34 on the side of the rotating motor 8 during the movement to monitor the movement state of the annular isolation block 15, further improving the use effect of the device and reducing the limitations of the chip during production.

[0047] In this embodiment, it also includes a de-impurity complexer, which is arranged on the arc-shaped solid block 7; it includes: two first substrates 46, installed on one side of the protective box 1; a guide roller 47 and a winding roller 48, which are jointly connected to the opposite sides of the two first substrates 46; the position of the winding roller 48 is higher than the guide roller 47; a cable 49, one end of which is connected to the arc-shaped solid block 7, and the other end is wound around the guide roller 47 and connected to the winding roller 48; two driving shafts 50, which are respectively connected to the opposite back sides of the two first substrates 46; the driving shaft 50 is in transmission connection with the winding roller 48; two clockwork springs 51, which are respectively installed on the two driving shafts 50, and the end points of the clockwork springs 51 are connected to the first substrates 46; a driving bevel gear 52, which is installed on one of the driving shafts 50; a reversing pressure assembly, which is arranged on the driving bevel gear 52; and a scraper, which is arranged on the driving shaft 50.

[0048] In this embodiment, the scraper includes: a driven circular plate 53, installed on one end of the driving shaft 50 away from the first substrate 46; a driven cylinder 54, installed on the side of the driven circular plate 53 away from the driving shaft 50; a driven cross block 55, slidably set on the driven cylinder 54; two limiting cylinders 56, symmetrically installed on the top of the driven cross block 55; a second substrate 57, slidably connected to the two limiting cylinders 56; the second substrate 57 is fixed on the protective box body 1; a bent square rod 58, one end of which is installed on the limiting cylinder 56, and the other end is equipped with a scraper 59, so that the blade of the scraper 59 is in contact with the side of the filter block 45 away from the protective box body 1.

[0049] When the arc-shaped solid block 7 moves, the wire winding roller 48 is in a state of releasing and rotating through the cable 49 and the guide roller 47, so that the driving shaft 50 on it rotates, and then the spring spring 51 is in a buffer state, so that when the annular isolation block 15 is reset, the spring spring 51 resets and drives the wire winding roller 48 to rotate, so as to facilitate the use of the next cavity change; at the same time, the driven circular plate 53 on the driving shaft 50 rotates, so that the driven cylinder 54 on it continuously reciprocates in the driven horizontal block 55, so that the driven horizontal block 55 reciprocates on the second base plate 57 through the two limit cylinders 56, and drives the scraper 59 under the action of the bent square rod 58. The reciprocating movement causes the scraper 59 to reciprocate on the surface of the filter block 45, thereby cleaning the impurities adhered to the filter block 45. At the same time, the scraper 59 can be set in contact with the exhaust duct 42 and the inside of the filter block 45 (not shown in the figure) to prevent excessive impurities adhered to the filter block 45 from affecting the use effect of the exhaust duct 42. At the same time, the scraper 59 can also be set on the first drain pipe 38 and the second drain pipe 39 (not shown in the figure) to prevent the first drain pipe 38 and the second drain pipe 39 from being blocked during use, resulting in a reduction in discharge efficiency, thereby improving the production effect of the chip and reducing the limitations of the device during use.

[0050] In this embodiment, the compound rotation pressure assembly includes: a rotating bevel gear 60, meshingly connected with the driving bevel gear 52; a driven shaft 61, one end of which is mounted on the rotating bevel gear 60, and the other end of which is mounted with a driving pulley 63; a T-shaped base 62, fixed on the protective box 1; and rotatably connected with the driven shaft 61; a transmission belt 64, one end of which is transmission-connected with the driving pulley 63, and the other end of which is connected with a driven pulley 65; the transmission belt 64 is slidably matched with the driving pulley 63 and the driven pulley 65; a driving shaft 66, one end of which is close to the driven pulley 65 One end of the protective box body 1 is connected, and the other end is connected to the T-shaped base 62; a telescopic rotating shaft 67, one end of which is connected to the side of the driven pulley 65 away from the protective box body 1, and the other end is connected to the compound cam 68; two L-shaped square rods 69 are symmetrically installed on both sides of the auxiliary square block 28; a compound long block 70 is connected to one end of the two L-shaped square rods 69 away from the rotary motor 8; the side of the compound long block 70 away from the rotary motor 8 is located on the rotation path of the compound cam 68; displacement sensors are respectively arranged on the same plane of the compound long block 70 and the compound cam 68.

[0051] When the driving bevel gear 52 rotates, it causes the meshing rotating bevel gear 60 to rotate, so that the telescopic rotating shaft 67 is driven to rotate under the action of the driven rotating shaft 61, the driving pulley 63 and the driven pulley 65, so that the compound cam 68 on it continuously contacts the compound long block 70 when rotating; when the two are in contact, the compound long block 70 is subjected to pressure, so that the auxiliary square block 28 and the auxiliary square plate 26 on it move to the upper limit position of the driving square column 32 and the auxiliary cylinder 25 respectively, so that the driving spring 35 and the extrusion spring 27 are in a buffer state, and when the compound cam 68 no longer contacts the side of the compound long block 70, it no longer exerts pressure on it, and the compound long block 70 is reset and moved by the reset of the driving spring 35 and the extrusion spring 27, and the compound long block 70 is reciprocated by the continuous rotation of the compound cam 68. When the auxiliary square block 28 moves close to the rotating motor 8, then By applying pressure to the side of the rotary motor 8 through the positioning wheel 34, the impact force generated by the shaking of the rotary motor 8 during use is actively eliminated, thereby improving the stability of the annular isolation block 15 during movement, and at the same time strengthening the connection state between the positioning wheel 34 and the rotary motor 8, and the moving state of the compound long block 70 is the same, so as to ensure that the rotary motor 8 can always be used in the center position, avoid the use position of the rotary motor 8 from being offset, resulting in the chip not being evenly sprayed with the solution, thereby improving the production effect of the chip, and displacement sensors are provided on the compound long block 70 and the compound cam 68. Since the telescopic shaft 67 is telescopic, when the compound long block 70 moves, the electrical signal sent by the displacement sensor can be used to control the movement of the compound cam 68 on the telescopic shaft 67, so that the compound long block 70 and the compound cam 68 can always be in the same position.

[0052] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0053] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A chemical solution separation device for semiconductor production, characterized in that: include Protective box (1); A protective square plate (2) is installed inside the protective box (1) and divides the interior of the protective box (1) into an upper cavity and a lower cavity; and a chamber liquid separation mechanism for using chemical solutions required for producing chips in the upper chamber / lower chamber; The chamber liquid separation mechanism comprises: Two telescopic cylinders (3) are symmetrically connected to the bottom of the protective box (1), and each telescopic cylinder (3) comprises an output end, wherein the output end extends out of the bottom of the protective box (1); Two displacement horizontal plates (4) are respectively arranged on the output ends of the two telescopic cylinders (3); A rectangular block (5) is located at the exact center of the bottom of the protective box (1) and is connected to two displacement transverse plates (4) on opposite sides, respectively, so that the center point of the rectangular block (5) and the end points of the two displacement transverse plates (4) are on the same straight line, with the straight line being the axis of symmetry; Four positioning horizontal blocks (6) are respectively arranged at four bends of the rectangular block (5); Two arc-shaped solid blocks (7) are arranged opposite to each other on both sides of the symmetry axis, and two end points of each arc-shaped solid block (7) are respectively connected to two positioning transverse blocks (6); A rotating member is located at the bottom of the protective box (1); the rotating member comprises: a rotating disc (13) located inside the protective box (1); A rotating motor (8) is arranged on a side of the rectangular block (5) close to the protective box (1) and is used to drive the rotating disc (13) to rotate; Two sets of follow-up monitoring units are arranged on two sides of the rectangular block (5) opposite to each other and are used to monitor the movement state of the rotary motor (8).

2. A chemical solution separation device for semiconductor production according to claim 1, characterized in that: The rotating member also includes: A positioning square groove, one side of which extends to the bottom of the protective box (1) and the other side of which extends into the lower cavity; A positioning block (9) is arranged to fit in the positioning groove; The positioning bearing (10) is located at the center of the positioning block (9), and a circular hole is provided at the center, and a groove is provided on the side wall of the circular hole; A positioning shaft (11) is connected to the circular hole, and a protrusion is provided on the side wall of the positioning shaft (11), and the protrusion is slidably connected to the groove; A positioning slot (12) is arranged at an end of the positioning shaft (11) away from the protective box (1) and is fitted and connected to an output end of the rotary motor (8); The rotating disc (13) is located in the lower cavity and is arranged at one end of the positioning shaft (11) away from the positioning slot (12); a semiconductor chip is placed on the side of the rotating disc (13) away from the positioning shaft (11).

3. A chemical solution separation device for semiconductor production according to claim 2, characterized in that: It also includes a moving part, wherein the moving part is arranged on the protective square plate (2); The moving part comprises: A circular groove located at the center of the protective square plate (2); A plurality of guide blocks (14) are mounted on the inner side wall of the circular groove; an annular isolating block (15), the outer side wall of the annular isolating block (15) being in contact with the inner side wall of the circular groove and being used for sliding in the circular groove; The guide square grooves (16) are arranged on the outer side wall of the annular isolation block (15), and the positions and the number of the guide square grooves (16) are the same as those of the guide square blocks (14); A guide cylinder (17), both ends of which are connected to the inner wall of the guide square groove (16); A guide spring (18) is sleeved on the guide cylinder (17); one end of the guide spring (18) is fixedly connected to the inner wall of the guide square groove (16), and the other end is fixedly connected to the guide square block (14); the guide square block (14) is located in the guide square groove (16) and is slidably connected to the guide cylinder (17); A first spray circular plate (19) is mounted on the top of the annular isolation block (15); The second spray circular plate (20) is installed at the bottom of the annular isolation block (15); the diameter of the notch on the second spray circular plate (20) is larger than the positioning shaft (11), so that the positioning shaft (11) passes through the second spray circular plate (20); the rotating disc (13) is located between the first spray circular plate (19) and the second spray circular plate (20); An annular rotating block (36) is mounted on a side of the rotating disc (13) close to the rotating motor (8); An annular rotating groove (37) is arranged on a side of the second spray circular plate (20) away from the rotary motor (8), the annular rotating groove (37) and the annular rotating block (36) are slidably matched and the two are nested and connected; The separation exhaust member is arranged in the annular isolation block (15).

4. A chemical solution separation device for semiconductor production according to claim 3, characterized in that: The separation exhaust member comprises: An exhaust hole is provided through the side wall of the annular isolation block (15); A first liquid discharge pipe (38) is installed on the top of the protective box (1), the output end of the first liquid discharge pipe (38) is away from the protective box (1), and the input end of the first liquid discharge pipe (38) is located in the upper cavity; A second liquid discharge pipe (39) is installed at the bottom of the protective box (1), the output end of the second liquid discharge pipe (39) is away from the protective box (1), and the input end of the second liquid discharge pipe (39) is located in the lower cavity; A third liquid discharge pipe (40) is installed on the first spray circular plate (19), the input end of the third liquid discharge pipe (40) is located in the annular isolation block (15), and the output end of the third liquid discharge pipe (40) is located in the upper cavity; A fourth liquid discharge pipe (41) is installed on the second spray circular plate (20); an input end of the fourth liquid discharge pipe (41) is located in the annular isolation block (15), and an output end of the fourth liquid discharge pipe (41) is located in the lower cavity; A plurality of exhaust ducts (42) are respectively installed in the upper cavity and the lower cavity; the output end of the exhaust duct (42) is away from the protective box (1); the input ends of the plurality of exhaust ducts (42) are respectively located in the upper cavity and the lower cavity and are retractable; when the annular isolation block (15) is located in the lower cavity, the exhaust hole is connected to the input end of the exhaust duct (42) in the lower cavity, the third drain pipe (40) is no longer connected to the first drain pipe (38) on the upper cavity, and the fourth drain pipe (41) is connected to the second drain pipe (39); conversely, when the annular isolation block (15) is located in the upper cavity, the fourth drain pipe (41) is disconnected from the second drain pipe (39), the exhaust hole is no longer connected to the input end of the exhaust duct (42) in the lower cavity, and the output end of the third drain pipe (40) is connected to the input end of the first drain pipe (38), and the input end of the exhaust duct (42) in the upper cavity is connected to the exhaust hole; The filter disc (45) is installed on the output end of the exhaust duct (42).

5. A chemical solution separation device for semiconductor production according to claim 4, characterized in that: It also includes a reset member; the reset member is arranged on the positioning horizontal block (6) and includes: The number of positioning cylinders (43) is the same as the number of positioning horizontal blocks (6), and the two are slidably matched; the end points of the positioning cylinders (43) are fixed to the bottom of the protective box (1); A positioning spring (44) is sleeved on the positioning cylinder (43); one end of the positioning spring (44) is fixedly connected to the bottom of the protection box (1), and the other end is fixedly connected to the positioning horizontal block (6).

6. A chemical solution separation device for semiconductor production according to claim 4, characterized in that: The follow-up monitoring unit comprises: An auxiliary square cylinder (21) is arranged on the bottom of the protective box (1); An auxiliary square column (22) is slidably disposed in the auxiliary square cylinder (21); An auxiliary spring (23) is located in the auxiliary square tube (21), one end of the auxiliary spring (23) is fixedly connected to the inner bottom surface of the auxiliary square tube (21), and the other end is fixedly connected to the auxiliary square column (22) located in the end point of the auxiliary square tube (21); A U-shaped base (24) is mounted on one end of the auxiliary square column (22) away from the protective box (1); An auxiliary cylinder (25) is mounted on the opposite surface of the U-shaped base (24); An auxiliary square plate (26) is slidably disposed on the auxiliary cylinder (25); A compression spring (27) is sleeved on the auxiliary cylinder (25); one end of the compression spring (27) is connected to the U-shaped base (24), and the other end is connected to the auxiliary square plate (26); An auxiliary moving block (28) is mounted on a side of the auxiliary moving square plate (26) away from the U-shaped base (24); The guide member is arranged on the auxiliary moving block (28).

7. A chemical solution separation device for semiconductor production according to claim 6, characterized in that: The guide member comprises: A T-shaped horizontal block (29) is arranged on a side of the auxiliary square block (28) away from the auxiliary square plate (26); A guide groove (30) is provided on a side of the T-shaped cross block (29) away from the auxiliary moving block (28); A guide wheel (31) is mounted on a side surface of the rectangular block (5); the guide wheel (31) is slidably arranged with the guide rail groove (30); A driving square column (32) is slidably disposed on the auxiliary square block (28); a driving limit plate (33) is installed at one end of the driving square column (32) away from the rotating motor (8); a positioning wheel (34) is installed at one end of the driving square column (32) close to the rotating motor (8), so that the positioning wheel (34) is in contact with the side wall of the rotating motor (8); A driving spring (35) is sleeved on the driving square column (32); one end of the driving spring (35) is fixedly connected to the driving limit plate (33), and the other end of the driving spring (35) is fixedly connected to the auxiliary square block (28).

8. The chemical solution separation device for semiconductor production according to claim 1, characterized in that: It also includes a de-impurity complex holder, which is arranged on the arc-shaped solid block (7); and includes: Two first substrates (46) mounted on one side of the protective box (1); A guide roller (47) and a winding roller (48), which are connected together to the opposite sides of the two first substrates (46); the winding roller (48) is located higher than the guide roller (47); A cable (49), one end of which is connected to the arc-shaped solid block (7), and the other end of which is wound around the guide roller (47) and connected to the winding roller (48); Two driving shafts (50) are respectively connected to opposite back surfaces of the two first substrates (46); the driving shafts (50) are drivingly connected to the winding roller (48); Two spring springs (51) are respectively mounted on the two driving shafts (50), and end points of the spring springs (51) are connected to the first substrate (46); A driving bevel gear (52) mounted on one of the driving shafts (50); A reciprocating pressure-applying assembly, disposed on the driving bevel gear (52); The scraping member is arranged on the driving shaft (50).

9. A chemical solution separation device for semiconductor production according to claim 8, characterized in that: The scraping member comprises: A driven circular plate (53) is mounted on an end of the driving shaft (50) away from the first substrate (46); A driven column (54) is mounted on a side of the driven circular plate (53) away from the driving shaft (50); A driven cross block (55) is slidably disposed on the driven column (54); Two limiting cylinders (56) are symmetrically mounted on the top of the driven cross block (55); A second base plate (57) is slidably connected to the two limiting cylinders (56); the second base plate (57) is fixed on the protective box body (1); A bent square rod (58) is mounted at one end on the limiting cylinder (56) and at the other end thereof is mounted a scraper (59) so that the blade of the scraper (59) is in contact with a side of the filter block (45) away from the protective box (1).

10. The chemical solution separation device for semiconductor production according to claim 8, characterized in that: The reciprocating pressure-applying assembly comprises: The rotating bevel gear (60) is meshedly connected with the driving bevel gear (52); A driven rotating shaft (61), one end of which is mounted on the rotating bevel gear (60), and the other end of which is mounted with a driving pulley (63); A T-shaped base (62) is fixed on the protective box (1) and is rotationally connected to the driven shaft (61); A transmission belt (64), one end of which is transmission-connected to the driving pulley (63), and the other end of which is connected to the driven pulley (65); the transmission belt (64) is in sliding cooperation with the driving pulley (63) and the driven pulley (65); A driving shaft (66), one end of which is connected to a side of the driven pulley (65) close to the protective box (1), and the other end of which is connected to the T-shaped base (62); A telescopic rotating shaft (67), one end of which is connected to a side of the driven pulley (65) away from the protective box (1), and the other end of which is connected to a compound cam (68); Two L-shaped square rods (69) are symmetrically mounted on both sides of the auxiliary moving block (28); A reciprocating long block (70) is connected to one end of the two L-shaped square rods (69) away from the rotary motor (8); a side of the reciprocating long block (70) away from the rotary motor (8) is located on the rotation path of the reciprocating cam (68); The displacement sensors are respectively arranged on the same plane of the compound moving long block (70) and the compound moving cam (68).

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