Method, device, apparatus and storage medium for starting up a remote plasma source

Abstract

The present application relates to the technical field of semiconductor, and especially relates to a glow-up method and device of a remote plasma source, equipment and a storage medium, the method comprises the following steps: obtaining a real-time pressure value fed back by a vacuum gauge, when a preset vacuum condition is met, controlling the remote plasma source to start working, and controlling a butterfly valve to open at a preset initial opening; obtaining a real-time scanning parameter fed back by a mass spectrometer, confirming a real-time ionization rate based on the real-time scanning parameter; adjusting the opening of the butterfly valve according to the real-time ionization rate, so as to adjust the gas flow entering a process system, until the glow-up is successful; the glow-up method disclosed in the present application can adjust the opening of the butterfly valve in real time according to the real-time ionization rate, so as to adjust the gas inlet amount of the gas source in real time, to create an ideal environment for the generation of plasma, and to ensure the accurate control of the gas flow, thereby improving the success rate and efficiency of the glow-up, the whole process does not need manual intervention, greatly reduces the operation complexity, and improves the stability and reliability of the process.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor, in particular to a glow-up method and device of remote plasma source, equipment and storage medium. BACKGROUND

[0002] Plasma technology plays a vital role in the manufacturing process of semiconductor devices; in the plasma etching and deposition system, the radio frequency power supply provides energy for the plasma cavity, so as to excite the generation of plasma, which is rich in electrons, ions, excited atoms, molecules and free radicals, which can be used for thin film and coating deposition process cavity circulation cleaning or etching.

[0003] The operation of remote plasma source (RPS) depends on accurate power control, when the remote plasma source works, the magnetic field coil and the iron core must continuously convert the injected gas into plasma state, which requires stable and huge energy input; different types of gas and different injection amount have different requirements for ionization conditions, so as to cause the instability of plasma conversion process.

[0004] In the process of semiconductor and chip manufacturing, the time of plasma processing is actually an intangible production cost; therefore, in the development of RPS, how to quickly introduce source gas to produce ionized gas that can be introduced into the chamber becomes a key consideration factor; if the introduction speed of source gas is too slow, it will lead to the reduction of plasma processing speed, and thus increase the overall production cost; however, if the introduction speed of source gas is too fast, too large gas flow may cause the plasma in RPS to extinguish; therefore, how to find the best balance point between efficiency and cost is a problem to be solved.

[0005] It can be seen that the prior art still needs to be improved and improved. SUMMARY

[0006] In order to overcome the shortcomings of the prior art, the purpose of the present application is to provide a glow-up method of remote plasma source, which can realize real-time and accurate control of gas flow, thereby improving the success rate and efficiency of glow-up.

[0007] The first aspect of the present application provides a glow-up method of remote plasma source, comprising: acquiring real-time pressure value fed back by vacuum gauge, when the preset vacuum condition is met, controlling the remote plasma source to start working, and controlling the butterfly valve to open at a preset initial opening degree; acquiring real-time scanning parameters fed back by mass spectrometer, confirming real-time ionization rate based on the real-time scanning parameters; adjusting the opening degree of the butterfly valve according to the real-time ionization rate, so as to adjust the gas flow entering the process system, until the glow-up is successful.

[0008] Optionally, in the first implementation manner of the first aspect, the method further includes: obtaining the real-time pressure value fed back by the vacuum gauge; when the real-time pressure value is less than 760 torr, it is determined that the preset vacuum condition is met; obtaining gas information input into the process system, the gas information including a gas type and a gas proportion; based on the obtained gas information, using a regular expression to match the initial opening degree corresponding to the gas information from a pre-constructed gas opening degree corresponding table; and controlling the remote plasma source to start working and controlling the butterfly valve to open at the matched initial opening degree.

[0009] Optionally, in the second implementation manner of the first aspect, the method further includes: obtaining the real-time scanning parameter fed back by the mass spectrometer; filtering the real-time scanning parameter using a band-pass filter to obtain a filtered parameter; smoothing the filtered parameter using an exponential smoothing method to obtain a smoothed parameter; performing baseline correction processing on the smoothed parameter using a pre-constructed fitting baseline model to obtain a corrected parameter; and inputting the corrected parameter into a pre-constructed Hopwood overall model to obtain the real-time ionization rate.

[0010] Optionally, in the third implementation manner of the first aspect, the method further includes: obtaining a preset target ionization rate and calculating a difference value between the real-time ionization rate and the preset target ionization rate; inputting the difference value and the real-time pressure value into a fuzzy logic controller to obtain a gas flow adjustment amount; obtaining a characteristic curve of the butterfly valve and confirming an opening and closing angle adjustment value based on the obtained characteristic curve and the gas flow adjustment amount; and adjusting the opening degree of the butterfly valve according to the opening and closing angle adjustment value to adjust the gas flow input into the process system.

[0011] Optionally, in the fourth implementation manner of the first aspect, the method further includes: obtaining a characteristic curve of the butterfly valve; based on the gas flow adjustment amount, using a linear interpolation method to find a new flow coefficient in the characteristic curve; obtaining an opening and closing angle confirmation model pre-constructed based on the Bernoulli equation and the butterfly valve flow coefficient; and inputting the new flow coefficient into the opening and closing angle confirmation model to obtain the opening and closing angle adjustment value.

[0012] Optionally, in a fifth implementation form of the first aspect of the present application, the remote plasma source further comprises a radio frequency power supply and a matching device, the matching device comprising an adjustable capacitor, and the starting-up method further comprises: obtaining an impedance of the load and a real-time impedance of the radio frequency power supply; comparing the real-time impedance with the impedance of the load, and inputting a comparison result into a PID controller to obtain a capacitor adjustment value; and adjusting a capacitance value of the adjustable capacitor in the matching device based on the capacitor adjustment value.

[0013] Optionally, in a sixth implementation form of the first aspect of the present application, the remote plasma source further comprises a detector and a display device, and the starting-up method further comprises: obtaining real-time operation parameters of the radio frequency power supply, the real-time operation parameters comprising a real-time signal power, a real-time current and a real-time voltage; feeding back the real-time signal power, the real-time current and the real-time voltage to the display device for parameter display through the detector; outputting an abnormal operation warning information when the real-time signal power exceeds a preset normal power range, and adjusting a gain of a signal amplifier comprised in the radio frequency power supply according to the preset normal power range to finely adjust the real-time signal power.

[0014] The second aspect of the present application provides a starting-up device of a remote plasma source, comprising: an initialization module configured to obtain a real-time pressure value fed back by a vacuum gauge, control the remote plasma source to start working when a preset vacuum condition is met, and control a butterfly valve to open at a preset initial opening degree; a calculation module configured to obtain real-time scanning parameters fed back by a mass spectrometer, and confirm a real-time ionization rate based on the real-time scanning parameters; and an adjustment module configured to adjust the opening degree of the butterfly valve according to the real-time ionization rate to adjust a gas flow entering a process system until starting-up is successful.

[0015] The third aspect of the present application provides a starting-up device of a remote plasma source, comprising: a memory and at least one processor, the memory storing instructions; and the at least one processor invoking the instructions in the memory to enable the starting-up device of the remote plasma source to perform each step of the starting-up method of the remote plasma source according to any one of the preceding aspects.

[0016] The fourth aspect of the present application provides a computer readable storage medium, the computer readable storage medium storing instructions, the instructions being executed by a processor to implement each step of the starting-up method of the remote plasma source according to any one of the preceding aspects.

[0017] The technical scheme of the present application can adjust the opening degree of the butterfly valve according to the real-time ionization rate, so as to adjust the gas inlet amount of the gas source in real time, create an ideal environment for the generation of plasma, and ensure the accurate control of the gas flow, thereby improving the success rate and efficiency of the glow, and the whole process does not need manual intervention, greatly reduces the operation complexity, and improves the stability and reliability of the process. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 A logic flowchart of a glow method provided for an embodiment of the present application is provided.

[0019] Figure 2 A structural schematic diagram of a glow device provided for an embodiment of the present application is provided.

[0020] Figure 3 A structural schematic diagram of a glow device provided for an embodiment of the present application is provided. DETAILED DESCRIPTION

[0021] The present application provides a glow method, device, equipment and storage medium of a remote plasma source. In the present application, the terms "first", "second", "third", "fourth" and the like (if any) in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and do not necessarily describe a specific order or sequence. It should be understood that the data thus used can be interchanged under appropriate circumstances, so that the embodiments described herein can be implemented in an order other than that illustrated or described herein. In addition, the term "includes" or "has" and any variation thereof is intended to cover non-exclusive inclusion, for example, a process, method, system, product or device including a series of steps or units does not necessarily limit to those steps or units clearly listed, but can include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0022] For the sake of understanding, the specific flow of the embodiments of the present application is described below. The remote plasma source includes a mass spectrometer, and the process system includes a vacuum gauge and a butterfly valve.

[0023] Please refer to Figure 1 An embodiment of the glow method of the remote plasma source in the embodiments of the present application includes:

[0024] 101, obtain the real-time pressure value fed back by the vacuum gauge, when the preset vacuum condition is met, control the remote plasma source to start working, and control the butterfly valve to open at a preset initial opening degree;

[0025] 102, obtain the real-time scanning parameter fed back by the mass spectrometer, and confirm the real-time ionization rate based on the real-time scanning parameter;

[0026] 103. Adjusting the opening degree of the butterfly valve according to the real-time ionization rate to adjust the gas flow into the process system until the ignition is successful.

[0027] The application discloses a method for igniting a remote plasma source, which can adjust the opening degree of a butterfly valve according to a real-time ionization rate to adjust the gas flow into the source in real time, create an ideal environment for the generation of plasma, and ensure the accurate control of the gas flow, thereby improving the success rate and efficiency of ignition, and greatly reducing the operation complexity and improving the stability and reliability of the process.

[0028] The second embodiment of the method for igniting the remote plasma source in the embodiment of the application comprises:

[0029] 201. Acquire the real-time pressure value fed back by the vacuum gauge; when the real-time pressure value is less than 760 torr, it indicates that the preset vacuum condition is met;

[0030] In the embodiment, in order to ensure that the remote plasma source can work efficiently and stably, it is necessary to first create an environment close to vacuum; specifically, when the value displayed by the vacuum gauge is reduced to below 760 torr, it means that the required vacuum condition for the experiment has been reached; only under this condition, the remote plasma source can be started, because only in a low-pressure environment, plasma can be formed and maintain its unique physical state.

[0031] 202. Acquire the gas information flowing into the process system, wherein the gas information comprises the type of gas and the proportion of gas;

[0032] 203. Based on the acquired gas information, use a regular expression to match the initial opening degree corresponding to the gas information from a pre-constructed gas opening degree corresponding table;

[0033] 204. Control the remote plasma source to start working, and control the butterfly valve to open at the matched initial opening degree.

[0034] In the embodiment, according to the type of gas output by the gas source and the proportion of gas, the initial opening degree of the butterfly valve is matched and controlled to open at the matched initial opening degree, which not only improves the output efficiency of the gas source, ensures that the gas is delivered to the required position in the best state, but also ensures the stability and repeatability of the process, thereby improving the performance and reliability of the entire process system.

[0035] The third embodiment of the method for igniting the remote plasma source in the embodiment of the application comprises:

[0036] 301. Acquire the real-time scanning parameter fed back by the mass spectrometer, and use a band-pass filter to filter and process the real-time scanning parameter to obtain a filtered parameter;

[0037] 302. The filter parameters are smoothed using the exponential smoothing method to obtain the smoothed parameters;

[0038] 303. The smoothing parameters are corrected by using a pre-built fitting baseline model;

[0039] 304. Input the correction parameters into the pre-built Hopwood global model to obtain the real-time ionization rate.

[0040] In this embodiment, a bandpass filter is first used to finely filter the real-time scanning parameters, effectively eliminating unnecessary high-frequency noise and low-frequency interference, thereby ensuring the purity and accuracy of the data. Then, exponential smoothing is used to smooth the filtered parameters, which can reduce random fluctuations in the data and make the results more stable and reliable. Furthermore, a pre-built fitting baseline model is used to accurately correct the smoothed parameters to eliminate background signal interference, thereby improving the accuracy of the data. Finally, the corrected parameters are input into the pre-built Hopwood global model, which can comprehensively consider various factors and calculate the accurate real-time ionization rate, providing solid data support for experimental analysis.

[0041] The fourth embodiment of the ignition method for a remote plasma source in this invention includes:

[0042] 401. Obtain the preset target ionization rate and calculate the difference between the real-time ionization rate and the preset target ionization rate;

[0043] In this embodiment, by calculating the difference between the real-time ionization rate and the preset target ionization rate, reliable data support is provided for subsequent adjustments.

[0044] In this embodiment, the target ionization rate is any value between 90% and 98%, which can be preset by the staff according to production needs.

[0045] 402. Input the difference and the real-time pressure value into the fuzzy logic controller to obtain the gas flow adjustment amount;

[0046] The fuzzy logic controller can process fuzzy and uncertain information which traditional binary logic cannot deal with; the core of the controller is to simulate the decision-making process of human beings, and process complex control problems through fuzzy sets and fuzzy rules; the fuzzy logic controller can better adapt to environmental changes and fluctuations in system parameters, and has stronger robustness; and because it can process fuzzy information, it can still make reasonable decisions when facing inaccurate or incomplete data, and has the advantages of high flexibility and high adaptability; in the embodiment, the fuzzy logic controller processes the input difference value and pressure value according to the preset fuzzy rules and fuzzy sets, and calculates a gas flow adjustment amount; the adjustment amount is obtained by the controller through fuzzy reasoning according to the difference between the current system state and the preset target; the fuzzy logic controller ensures that the process system can maintain in the best operating state under various complex and uncertain conditions, and improves the efficiency and stability of the whole system.

[0047] 403、acquire the characteristic curve of the butterfly valve, and confirm the opening and closing angle adjustment value based on the acquired characteristic curve and the gas flow adjustment amount;

[0048] In the embodiment, the characteristic curve of the butterfly valve is a curve describing the relationship between the opening degree of the butterfly valve and the through gas flow; based on the characteristic curve and the calculated gas flow adjustment amount, the controller can determine an adjustment value of the opening and closing angle of the butterfly valve.

[0049] 404、adjust the opening degree of the butterfly valve according to the opening and closing angle adjustment value to adjust the gas flow entering the process system.

[0050] In the embodiment, through the accurate adjustment of the gas flow by steps 401-404, the process system can maintain in the best working state, thereby improving the production efficiency and product quality; the whole process not only ensures the stability of the process, but also reduces the need for manual intervention, reduces the operation cost, and improves the overall economic benefit.

[0051] The fifth embodiment of the start-up method of the remote plasma source in the embodiment of the application comprises:

[0052] 501、acquire the characteristic curve of the butterfly valve, and confirm the opening and closing angle adjustment value based on the acquired characteristic curve and the gas flow adjustment amount;

[0053] In the embodiment, since specific gas flow adjustment amount is often encountered in actual operation, and does not completely correspond to the data point on the characteristic curve, it is necessary to introduce a linear interpolation method, which allows smooth transition between two known data points, so as to estimate the intermediate value; in the flow coefficient lookup process of the butterfly valve, this method can effectively fill the blank between the data points, and provide a continuous flow coefficient estimation value; not only improve the efficiency of the lookup process, but also ensure the accuracy of the result.

[0054] 502、acquire an opening and closing angle confirmation model pre-constructed based on Bernoulli equation and flow coefficient of the butterfly valve, input the new flow coefficient into the opening and closing angle confirmation model, and obtain an opening and closing angle adjustment value;

[0055] In the embodiment, a opening and closing angle confirmation model is pre-constructed by using Bernoulli equation, a classical principle in fluid mechanics, in combination with the flow coefficient of the butterfly valve; the model is established based on deep understanding of the working principle of the butterfly valve, and is obtained through scientific calculation and experimental verification; when the new flow coefficient is input into the model, an accurate opening and closing angle adjustment value can be quickly obtained; this process not only simplifies the operation process, but also improves the accuracy of adjustment, ensures the best performance of the butterfly valve under various working conditions, and can respond to flow changes in real time, automatically adjust the opening and closing angle of the butterfly valve, so as to achieve the purpose of optimizing control and improving efficiency.

[0056] The sixth embodiment of the ignition method of the remote plasma source in the embodiment of the application comprises:

[0057] The remote plasma source further comprises an RF power supply and a matcher, and the matcher comprises an adjustable capacitor;

[0058] 601、acquire the impedance of the load, and acquire the real-time impedance of the RF power supply;

[0059] 602、compare the real-time impedance and the impedance of the load, input the comparison result into a PID controller, and obtain a capacitor adjustment value;

[0060] 603、adjust the capacitance value of the adjustable capacitor in the matcher based on the capacitor adjustment value.

[0061] In the embodiment, the PID controller can calculate accurate capacitance adjustment values according to the comparison result of the real-time impedance and the load impedance, thereby not only ensuring high precision of impedance matching, but also effectively avoiding energy waste and equipment loss caused by impedance mismatching, and significantly improving the performance of the plasma source; further, due to the optimization of impedance matching, the operation efficiency of the plasma source is significantly improved; in the energy transmission process, the accuracy of impedance matching reduces the reflection and loss of energy, so that more energy can be effectively utilized, which not only reduces the operation cost, but also prolongs the service life of the equipment.

[0062] The seventh embodiment of the start-up method of the remote plasma source in the embodiment of the application comprises the following steps:

[0063] The remote plasma source further comprises a detector, a display device and a controller, wherein the controller is electrically connected with the detector and the display device;

[0064] 701, acquiring real-time operation parameters of the radio frequency power supply, wherein the real-time operation parameters comprise real-time signal power, real-time current and real-time voltage;

[0065] 702, feeding back the real-time signal power, the real-time current and the real-time voltage to the display device through the detector for parameter display;

[0066] In the embodiment, the detector accurately captures and rapidly feeds back the key data such as the real-time signal power, the real-time current and the real-time voltage to the display device, thereby providing intuitive parameter display for the operator, and making the monitoring of the real-time working state of the radio frequency power supply simple and intuitive.

[0067] 703, when the real-time signal power exceeds the preset normal power range, outputting an abnormal working alarm information, and adjusting the gain of the signal amplifier included in the radio frequency power supply according to the preset normal power range, so as to finely adjust the real-time signal power.

[0068] In the embodiment, when it is detected that the real-time signal power exceeds the preset normal power range, the controller included in the remote plasma source immediately outputs the abnormal working alarm information, thereby providing a powerful guarantee for timely finding and processing potential problems; further, the controller also has an automatic adjustment function, which can automatically adjust the gain of the signal amplifier in the radio frequency power supply according to the preset normal power range, thereby ensuring that the real-time signal power is always in the best working state, and improving the overall performance and efficiency of the radio frequency power supply; by the controller automatically finely adjusting the real-time power signal, not only the need for manual intervention is reduced, but also the stability and reliability of the radio frequency power supply during operation are significantly improved, and the radio frequency power supply can stably and continuously work before manual maintenance, thereby ensuring the continuity of the operation of the remote plasma source.

[0069] The above describes the ignition method of the remote plasma source in the embodiments of the present invention. The following describes the ignition device of the remote plasma source in the embodiments of the present invention. Please refer to [link to relevant documentation]. Figure 2 One embodiment of the ignition device for a remote plasma source in this invention includes:

[0070] The initialization module 801 is used to obtain the real-time pressure value fed back by the vacuum gauge. When the preset vacuum conditions are met, it controls the remote plasma source to start working and controls the butterfly valve to open at the preset initial opening degree.

[0071] The calculation module 802 is used to acquire the real-time scanning parameters fed back by the mass spectrometer and to confirm the real-time ionization rate based on the real-time scanning parameters;

[0072] The adjustment module 803 is used to adjust the opening of the butterfly valve according to the real-time ionization rate, so as to adjust the gas flow rate entering the process system until ignition is successful.

[0073] Based on the same ideas as the methods in the above embodiments, the apparatus provided in this application can implement the methods in the above embodiments.

[0074] above Figure 2 The ignition device of the remote plasma source in the embodiments of the present invention will be described in detail from the perspective of modular functional entities. The ignition device of the remote plasma source in the embodiments of the present invention will be described in detail from the perspective of hardware processing.

[0075] Figure 3 This is a schematic diagram of the structure of a remote plasma source ignition device 900 provided in an embodiment of the present invention. The remote plasma source ignition device 900 can vary significantly due to different configurations or performance characteristics. It may include one or more central processing units (CPUs) 910 (e.g., one or more processors) and a memory 920, and one or more storage media 930 (e.g., one or more mass storage devices) storing application programs 933 or data 932. The memory 920 and storage media 930 can be temporary or persistent storage. The program stored in the storage media 930 may include one or more modules (not shown in the diagram), each module including a series of instruction operations on the remote plasma source ignition device 900. Furthermore, the processor 910 may be configured to communicate with the storage media 930 and execute the series of instruction operations in the storage media 930 on the remote plasma source ignition device 900 to implement the steps of the remote plasma source ignition method provided in the above-described method embodiments.

[0076] The start-up apparatus 900 of the remote plasma source can also include one or more power supplies 940, one or more wired or wireless network interfaces 950, one or more input / output interfaces 960, and / or one or more operating systems 931, such as Windows Server, Mac OS X, Unix, Linux, FreeBSD, etc. Those skilled in the art will appreciate that, Figure 3 The illustrated start-up apparatus structure of the remote plasma source is not intended to limit the start-up apparatus of the remote plasma source, and can include more or fewer components than illustrated, or combine certain components, or different component arrangements.

[0077] The present application also provides a computer readable storage medium, which can be a non-volatile computer readable storage medium, or a volatile computer readable storage medium, and the computer readable storage medium stores instructions, which, when executed on a computer, cause the computer to perform the steps of the start-up method of the remote plasma source.

[0078] Those skilled in the art can clearly understand that, for the convenience and brevity of description, the specific working process of the above-described system or device, unit can refer to the corresponding process in the foregoing method embodiments, which will not be described here.

[0079] The integrated unit, if implemented in the form of a software function unit and sold or used as an independent product, can be stored in a computer readable storage medium. Based on such understanding, the technical solutions of the present application essentially or the part that contributes to the prior art, or the whole or part of the technical solutions can be embodied in the form of a software product. The computer software product is stored in a storage medium, and includes a number of instructions for causing a computer device (which can be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of the present application. The foregoing storage medium includes: a U disk, a mobile hard disk, a read-only memory (ROM), a random access memory (RAM), a magnetic disk or an optical disk, and various media that can store program codes.

[0080] Finally, it should be noted that: the above only describes the preferred examples of the present application, and is not intended to limit the present application, although the present application has been described in detail with reference to the foregoing embodiments, and those skilled in the art can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacements for some technical features. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A method for igniting a remote plasma source, characterized in that, The remote plasma source includes a mass spectrometer, and the process system includes a vacuum gauge and a butterfly valve; the ignition method includes: The system obtains the real-time pressure value fed back by the vacuum gauge. When the preset vacuum conditions are met, it controls the remote plasma source to start working and controls the butterfly valve to open at the preset initial opening degree. Obtain the real-time scanning parameters fed back by the mass spectrometer, and confirm the real-time ionization rate based on the real-time scanning parameters; Adjust the opening of the butterfly valve according to the real-time ionization rate to adjust the gas flow rate into the process system until ignition is successful. The method of adjusting the opening of the butterfly valve according to the real-time ionization rate to adjust the gas flow rate entering the process system includes: Obtain the preset target ionization rate and calculate the difference between the real-time ionization rate and the preset target ionization rate; The difference and the real-time pressure value are input into the fuzzy logic controller to obtain the gas flow adjustment amount; Obtain the characteristic curve of the butterfly valve, and determine the opening and closing angle adjustment value based on the obtained characteristic curve and the gas flow rate adjustment amount; The opening degree of the butterfly valve is adjusted according to the opening and closing angle adjustment value to adjust the gas flow rate entering the process system; The process of acquiring the characteristic curve of the butterfly valve and determining the opening / closing angle adjustment value based on the acquired characteristic curve and the gas flow rate adjustment includes: Obtain the characteristic curve of the butterfly valve, and based on the gas flow rate adjustment, use linear interpolation to find a new flow coefficient in the characteristic curve; Obtain a pre-constructed opening and closing angle confirmation model based on Bernoulli's equation and the butterfly valve flow coefficient, and input the new flow coefficient into the opening and closing angle confirmation model to obtain the opening and closing angle adjustment value.

2. The method for igniting a remote plasma source according to claim 1, characterized in that, The process of acquiring the real-time pressure value fed back by the vacuum gauge, and controlling the remote plasma source to start working when the preset vacuum conditions are met, and controlling the butterfly valve to open at a preset initial opening degree, includes: Obtain the real-time pressure value fed back by the vacuum gauge. When the real-time pressure value is less than 760 torr, it indicates that the preset vacuum conditions are met. Acquire gas information introduced into the process system, the gas information including gas type and gas ratio; Based on the acquired gas information, regular expressions are used to match the initial opening degree corresponding to the gas information from a pre-built gas opening degree correspondence table; Control the remote plasma source to start working and control the butterfly valve to open to a matching initial opening degree.

3. The method for igniting a remote plasma source according to claim 1, characterized in that, The process of acquiring real-time scanning parameters fed back by the mass spectrometer and confirming the real-time ionization rate based on these parameters includes: The real-time scanning parameters fed back by the mass spectrometer are obtained, and the real-time scanning parameters are filtered by a bandpass filter to obtain the filtered parameters. The filter parameters are smoothed using the exponential smoothing method to obtain smoothed parameters; The smoothing parameters are corrected by using a pre-built fitting baseline model; The correction parameters are input into the pre-built Hopwood global model to obtain the real-time ionization rate.

4. The method for igniting a remote plasma source according to claim 1, characterized in that, The remote plasma source further includes a radio frequency power supply and a matching unit, the matching unit including an adjustable capacitor, and the ignition method further includes: Obtain the impedance of the load and the real-time impedance of the RF power supply; The real-time impedance is compared with the load impedance, and the comparison result is input to the PID controller to obtain the capacitor adjustment value; Adjust the capacitance value of the adjustable capacitor in the matching unit based on the capacitance adjustment value.

5. The method for igniting a remote plasma source according to claim 4, characterized in that, The remote plasma source further includes a detector and a display device, and the ignition method further includes: The real-time operating parameters of the radio frequency power supply are obtained, including real-time signal power, real-time current and real-time voltage. The detector feeds back the real-time signal power, the real-time current, and the real-time voltage to the display device for parameter display. When the real-time signal power exceeds the preset normal power range, an abnormal operation alarm message is output, and the gain of the signal amplifier included in the RF power supply is adjusted according to the preset normal power range to fine-tune the real-time signal power.

6. A ignition device for a remote plasma source, characterized in that, include: The initialization module is used to obtain the real-time pressure value fed back by the vacuum gauge. When the preset vacuum conditions are met, it controls the remote plasma source to start working and controls the butterfly valve to open at the preset initial opening degree. The calculation module is used to obtain the real-time scanning parameters fed back by the mass spectrometer and to confirm the real-time ionization rate based on the real-time scanning parameters; The adjustment module is used to adjust the opening of the butterfly valve according to the real-time ionization rate to adjust the gas flow rate entering the process system until ignition is successful; it obtains the preset target ionization rate and calculates the difference between the real-time ionization rate and the preset target ionization rate. The difference and the real-time pressure value are input into the fuzzy logic controller to obtain the gas flow adjustment amount; the characteristic curve of the butterfly valve is obtained, and the opening and closing angle adjustment value is confirmed based on the obtained characteristic curve and the gas flow adjustment amount; the opening degree of the butterfly valve is adjusted according to the opening and closing angle adjustment value to adjust the gas flow rate entering the process system; the characteristic curve of the butterfly valve is obtained, and a new flow coefficient is found in the characteristic curve using linear interpolation based on the gas flow adjustment amount; an opening and closing angle confirmation model pre-constructed based on Bernoulli's equation and the butterfly valve flow coefficient is obtained, and the new flow coefficient is input into the opening and closing angle confirmation model to obtain the opening and closing angle adjustment value.

7. A ignition device for a remote plasma source, characterized in that, The ignition device of the remote plasma source includes: a memory and at least one processor, wherein the memory stores instructions; At least one of the processors invokes the instructions in the memory to cause the ignition device of the remote plasma source to perform the steps of the ignition method of the remote plasma source as claimed in any one of claims 1-5.

8. A computer-readable storage medium storing instructions thereon, characterized in that, When the instructions are executed by the processor, they implement the steps of the ignition method of the remote plasma source as described in any one of claims 1-5.

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