Swing valve and thin film deposition equipment

Abstract

The invention discloses a swing valve and thin film deposition equipment, the swing valve comprises a valve body, a sealing ring and a sealing assembly, the valve body, the sealing ring and the sealing assembly are included, the sealing ring is arranged in the valve body in a vertically movable mode, a sealing groove is formed in the side, facing the inner wall of the valve body, of the sealing ring, and the sealing assembly is arranged in the sealing groove; the sealing assembly comprises a first sealing body, and the first sealing body abuts against the inner wall of the valve body to form dynamic sealing. And the first sealing body is in surface contact with the inner wall of the valve body. Compared with line contact between an existing O-shaped sealing ring and the valve body, the first sealing body and the inner wall of the valve body are in surface contact, the contact area is larger, pressure can be distributed more evenly through the larger contact area, overhigh local pressure is reduced, friction is reduced, surface layer falling is reduced, damage of mechanical friction to the performance of the first sealing body is reduced, durability is improved, and the service life of the valve body is prolonged. The service life and the maintenance period are prolonged, and the productivity of a machine is improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a swing valve and a thin film deposition device. Background Art

[0002] The swing-type pressure regulating valve (swing valve for short) is used to adjust the pressure of the reaction chamber and is one of the key components of HDP CVD equipment (High-Density Plasma Chemical Vapor Deposition). As an important factor affecting the film deposition rate and sputtering rate, the pressure in the reaction chamber can usually be quickly and accurately controlled by controlling the valve plate opening and adjusting the flow conductance of the high vacuum pipeline, ultimately achieving rapid and stable regulation of the reaction chamber pressure. At the same time, the swing valve also has an isolation shut-off function. When the reaction chamber is cleaned, the larger chamber pressure will cause the molecular pump to overload. Therefore, it is necessary to seal the internal sealing ring of the swing valve with the valve plate and valve body to isolate the reaction chamber from the molecular pump. The complex internal structure of the swing valve leads to a long equipment maintenance cycle. If the swing valve frequently has problems during use, it will seriously affect the production capacity of the machine. At present, in the thin film deposition process of HDP equipment, long-term high-concentration fluoride ion corrosion and frequent swing valve switching actions cause the surface of the O-ring on the side wall of the sealing ring to easily fall off due to corrosion and friction, and gradually form a crack source at the falling position. Under the repeated switching action of the valve, the dynamic seal will eventually fail and internal leakage will occur. Summary of the invention

[0003] The embodiments of the present invention provide a swing valve and a thin film deposition device, which are intended to solve the problem of frequent switching of the O-ring of the existing swing valve leading to dynamic seal failure.

[0004] In a first aspect, the present invention provides a swing valve, comprising: a valve body, a sealing ring and a sealing assembly, wherein the sealing ring is disposed in the valve body so as to be movable up and down, a sealing groove is provided on a side of the sealing ring facing the inner wall of the valve body, the sealing assembly is disposed in the sealing groove, and the sealing assembly comprises a first sealing body, the first sealing body abuts against the inner wall of the valve body to form a dynamic seal;

[0005] Wherein, the first sealing body is in surface contact with the inner wall of the valve body.

[0006] Furthermore, the valve body is provided with a flange opening which passes through from top to bottom, and the valve body can be horizontally rotatably arranged in the valve body to open and close the flange opening. The valve body is provided with a purge air passage which connects the outside with the inside of the valve body, and the air outlet direction of the purge air passage points to the flange opening.

[0007] Furthermore, the pressure on the side of the valve body away from the flange opening is greater than the pressure on the side of the flange opening.

[0008] Furthermore, the sealing assembly also includes a second sealing body and a fixing ring, the fixing ring is arranged in the sealing groove, the second sealing ring is fixed on the side of the fixing ring facing away from the inner wall of the valve body, and the first sealing ring is fixed on the side of the fixing ring facing the inner wall of the valve body.

[0009] Furthermore, the upper surface of the fixing ring is tightly fitted with the upper groove surface of the sealing groove, and the lower surface of the fixing ring is tightly fitted with the lower groove surface of the sealing groove.

[0010] Furthermore, a fixing groove is formed on one side of the fixing ring facing the inner wall of the valve body, and the second sealing body is fixed in the fixing groove.

[0011] Further, the fixed groove includes an upper horizontal groove surface, a lower horizontal groove surface and a vertical groove surface, the upper horizontal groove surface is parallel to and alternates with the lower horizontal groove surface, and the vertical groove surface vertically connects the upper horizontal groove surface and the lower horizontal groove surface respectively; wherein, the first sealing body is in surface contact with the upper horizontal groove surface, the lower horizontal groove surface and the vertical groove surface respectively.

[0012] Furthermore, the first sealing body is a polygonal sealing ring; and / or the second sealing body is an O-ring.

[0013] Furthermore, the fixing ring is made of polytetrafluoroethylene.

[0014] In the second aspect, the present invention also provides a thin film deposition device, including a reaction chamber, a molecular pump, a swing valve, a pneumatic valve and a needle valve, the swing valve is the above-mentioned swing valve, the reaction chamber is connected to the swing valve, the swing valve is connected to the molecular pump through its flange port, the pneumatic valve, the needle valve and the swing valve are connected in sequence; wherein the purge gas is discharged in sequence through the pneumatic valve, the needle valve, the purge air channel of the swing valve and the molecular pump.

[0015] The present invention provides a swing valve and a thin film deposition device. The swing valve comprises: a valve body, a sealing ring and a sealing assembly. The sealing ring is provided with a sealing groove, and the sealing assembly is arranged in the sealing groove. The sealing assembly comprises a first sealing body, and the first sealing body abuts against the inner wall of the valve body. The sealing ring moves up and down in the valve body, and a dynamic seal is formed between the first sealing body and the valve body. Compared with the line contact between the existing O-ring and the valve body, the first sealing body is in surface contact with the inner wall of the valve body, and the contact area is larger. The larger contact area can distribute the pressure more evenly, reduce the local excessive pressure, thereby reducing the friction, reducing the surface shedding, reducing the damage of the mechanical friction to the performance of the first sealing body, improving the durability, extending the service life and maintenance cycle, and improving the machine production capacity. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying any creative work.

[0017] Figure 1 A schematic diagram showing the assembly of the swing valve and molecular pump is shown;

[0018] Figure 2 A schematic cross-sectional view of an existing O-ring seal is shown;

[0019] Figure 3 A cross-sectional schematic diagram of an existing swing valve is shown;

[0020] Figure 4 A cross-sectional schematic diagram of an existing swing valve in a closed state is shown;

[0021] Figure 5 A cross-sectional schematic diagram of an existing swing valve in a pressure regulating state is shown;

[0022] Figure 6 A cross-sectional schematic diagram showing a sealing assembly of a swing valve according to an embodiment of the present invention;

[0023] Figure 7 A cross-sectional schematic diagram of a purge air passage of a swing valve according to an embodiment of the present invention is shown;

[0024] Figure 8 A schematic top view of a purge air passage of a swing valve according to an embodiment of the present invention is shown;

[0025] Fig. 9 A schematic diagram showing the gas flow direction of a purge gas of a thin film deposition device according to an embodiment of the present invention is shown;

[0026] Reference numerals:

[0027] 1. Valve body; 11. First cavity; 12. Second cavity; 13. Flange mouth; 14. Purge airway; 2. Sealing ring; 21. Sealing groove; 3. Sealing assembly; 31. First sealing body; 32. Second sealing body; 33. Fixing ring; 331. Fixing groove; 331a. Upper horizontal groove surface; 331b. Lower horizontal groove surface; 331c. Vertical groove surface; 4. Valve plate; 10. Swing valve; 20. Reaction chamber; 30. Molecular pump; 40. Pneumatic valve; 50. Needle valve. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] The directional terms mentioned in the present invention, such as "upper", "lower", "front", "back", "left", "right", "inner", "outer", "side", etc., are only referenced to the directions of the attached drawings. Therefore, the directional terms used are used to illustrate and understand the present invention, but are not used to limit the present invention. In addition, in the drawings, structures with similar or identical structures are represented by the same reference numerals.

[0030] The swing valve is a part used in HDP CVD equipment to adjust the pressure of the reaction chamber and isolate the reaction chamber. It can adjust the pressure or isolate according to the process flow of the equipment. During the thin film deposition process of HDP equipment, there is long-term high-concentration fluoride ion corrosion, and when the reaction chamber is cleaned, the swing valve will frequently switch. Therefore, traditional O-rings are not suitable for environments exposed to corrosive gases and frequent dynamic sealing. Corrosive gases and frequent switching actions will accelerate the failure of the dynamic sealing O-ring on the side wall of the sealing ring, affecting the production capacity of the machine.

[0031] To this end, an embodiment of the present invention proposes a swing valve and a thin film deposition device, which solves the problem of dynamic seal failure caused by frequent switching of the O-ring of the existing swing valve. By setting the contact part between the first sealing body and the valve body as a sealing surface, the surface contact increases the contact area, thereby reducing friction and extending the service life.

[0032] The embodiment of the present invention solves the above-mentioned problem of dynamic seal failure, and the specific ideas are as follows:

[0033] The traditional O-ring is in line contact with the inner wall of the valve body, and the contact area of ​​the line contact is relatively small. In dynamic sealing, this small contact area may cause local pressure to increase and friction to increase. In addition, corrosive gases and frequent switching actions cause greater loss of the sealing ring, which accelerates the failure of the sealing ring. The solution is to use a combined sealing structure to replace the traditional O-ring. The combined sealing structure includes an O-ring, a PTFE fixing ring and a polygonal sealing ring. On the one hand, the PTFE fixing ring seals the O-ring in the sealing groove of the sealing ring. Adding PTFE sealing can reduce the damage of corrosive gases and plasma to the O-ring. On the other hand, the polygonal sealing ring is fixed on the PTFE fixing ring, and the polygonal sealing ring contacts the inner wall of the valve body. The polygonal sealing ring and the inner wall of the valve body are in surface contact, which increases the contact area compared with the traditional O-ring. The larger contact area can distribute the pressure more evenly, reduce the local excessive pressure, and thus reduce friction. On the other hand, compared with the sealing ring with a circular cross-section, the polygonal sealing ring can effectively prevent torsion during movement and reduce the damage of mechanical friction to the sealing ring. Therefore, by changing the sealing structure of the sealing ring side wall from the previous single O-ring seal to a combined sealing structure, the reliability and stability are improved and the service life is extended.

[0034] In addition, during the process, the swing valve is frequently switched on and off, and some particles may fall onto the valve plate of the swing valve, and these particles are transferred to the inside of the swing valve through the rotation of the valve plate. When the reaction chamber is purged, due to the internal structure of the swing valve, the purging gas will be directly pumped out by the molecular pump through the flange port, and the inside of the swing valve cannot be effectively purged, which is easy to cause particle pollution problems. After these particles fall onto the surface of the dynamic seal O-ring, it is easy to cause the sealing surface to be damaged and leaked due to frequent dynamic sealing. In order to solve the problem of particle pollution, the embodiment of the present invention has the following specific ideas: by adding appropriate purge airways inside the valve body of the swing valve and linking the pneumatic valve to adapt to the corresponding process flow, the internal purge of the swing valve is synchronously opened during the cavity purging process, which can effectively reduce the accumulation of particles inside the valve body, and remove the particles attached to the valve body and the valve plate in time through the molecular pump, which can reduce the number of particles in the entire reaction chamber. At the same time, it can effectively prevent particles from adhering to the sealing surfaces of the swing valve. Under frequent dynamic friction, particles are very likely to damage the sealing surface and cause leakage problems.

[0035] In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0036] See also Figure 1-Figure 8The embodiment of the present invention shows a swing valve 10, including: a valve body 1, a sealing ring 2 and a sealing assembly 3, wherein the sealing ring 2 is movably arranged in the valve body 1, and a sealing groove 21 is provided on the side of the sealing ring 2 facing the inner wall of the valve body 1, and the sealing assembly 3 is arranged in the sealing groove 21, and the sealing assembly 3 includes a first sealing body 31, and the first sealing body 31 abuts against the inner wall of the valve body 1 to form a dynamic seal; wherein the first sealing body 31 is in surface contact with the inner wall of the valve body 1.

[0037] Reference Figure 1-Figure 6Specifically, the swing valve 10 is installed between the reaction chamber 20 and the molecular pump 30 to adjust the pressure of the reaction chamber 20. The swing valve 10 includes a valve body 1, a valve plate 4, a sealing ring 2 and a sealing assembly 3. The valve body 1 has two cavities, namely a first cavity 11 and a second cavity 12. The first cavity 11 and the second cavity 12 are adjacent to each other and communicate with each other. The first cavity 11 is provided with a flange port 13 that passes through from top to bottom. The swing valve 10 is respectively installed with the molecular pump 30 and the reaction chamber 20 through the flange port 13. The valve plate 4 can be horizontally rotatably arranged in the valve body 1. The valve plate 4 is driven by the motor shaft as the center of the circle to move in a horizontal pendulum motion in the plane. The valve plate 4 can be rotated into the first cavity 11 to cover the flange port 13, or it can be rotated into the second cavity 12 to open the flange port 13. The valve plate 4 changes the flow area of ​​the flange port 13 during the horizontal rotation process to achieve the adjustment of the opening of the valve plate 4. The control system controls the opening of the valve plate 4 according to the algorithm to achieve the purpose of controlling the pressure of the reaction chamber 20. The sealing ring 2 is arranged in the first cavity 11, and a spring is arranged in the first cavity 11. The spring is connected to the upper surface of the sealing ring 2, and the lower surface of the sealing ring 2 is used to contact and fit with the valve plate 4 to achieve sealing. Among them, when the swing valve 10 is in the pressure regulating state, the sealing ring 2 is introduced into the compressed air through the pneumatic valve 40 island to push the entire sealing ring 2 to move up and down. When the compressed air is introduced, the sealing ring 2 moves up to compress the spring, and the sealing ring 2 is separated from the valve plate 4. After the sealing ring 2 completes the upward movement, the control system controls the opening of the valve plate 4 according to the algorithm to achieve the purpose of controlling the pressure of the reaction chamber 20. When the swing valve 10 is in the closed state, no compressed air is introduced, and the sealing ring 2 is in the initial position. Under the action of the elastic force, the lower surface of the sealing ring 2 is tightly fitted with the upper surface of the valve plate 4, and the reaction chamber 20 is completely isolated from the molecular pump 30. A circle of sealing grooves 21 are provided on the outer peripheral side wall of the sealing ring 2, and the notch of the sealing groove 21 faces the inner wall of the valve body 1. The sealing assembly 3 is installed in the sealing groove 21. The sealing assembly 3 includes a first sealing body 31. The first sealing body 31 is a sealing ring structure. The first sealing body 31 is fixed in the sealing groove 21. The outer peripheral side wall of the first sealing body 31 contacts the inner wall of the valve body 1. As the sealing ring 2 moves up and down, the first sealing body 31 also moves up and down with the sealing ring 2, so a dynamic seal is formed between the first sealing body 31 and the valve body 1. The portion where the first sealing body 31 contacts the inner wall of the valve body 1 is in surface contact, that is, the outer peripheral side wall of the first sealing body 31 is a planar structure with a large contact area. A larger contact area can distribute pressure more evenly, reduce excessive local pressure, thereby reducing local friction and extending service life.

[0038] Through this embodiment, the existing O-ring is in line contact with the valve body 1. Due to its circular cross-section, the contact with the sealing groove 21 is a line or a narrow area, and the contact area is relatively small. In dynamic sealing, this small area of ​​contact may cause local pressure to increase, easily forming a local high friction area, and increasing friction. This embodiment changes the sealing structure of the side wall of the sealing ring 2 to change the line contact to surface contact, that is, the first sealing body 31 and the inner wall of the valve body 1 are in surface contact, which increases the contact area. A larger contact area can distribute the pressure more evenly, reduce local excessive pressure, thereby reducing local friction, reducing wear, extending the service life, avoiding frequent replacement of the sealing body, extending the maintenance cycle, and improving the machine production capacity.

[0039] Reference Figure 7 and Figure 8In one embodiment, the valve body 1 is provided with a flange opening 13 which is through from top to bottom, and the valve body 1 can be horizontally rotatably arranged in the valve body 1 to open and close the flange opening 13. The valve body 1 is provided with a purge air passage 14 which connects the outside with the inside of the valve body 1, and the gas outlet direction of the purge air passage 14 points to the flange opening 13. Specifically, the special pressure control method of the swing valve 10 will cause the particles generated in the process to fall onto the valve plate 4 of the swing valve 10, and these particles will be transferred to the inside of the swing valve 10 through the rotation of the valve plate 4. The inside of the swing valve 10 belongs to the gas purge blind area, that is, inside the second cavity 12 of the valve body 1, and the gas in the cavity cannot effectively purge it. In order to solve the problem of particulate pollution, in this embodiment, a purge air channel 14 is opened on the valve body 1, and the purge air channel 14 connects the outside of the valve body 1 with the inside of the valve body 1, so that the external purge gas can be blown into the inside of the valve body 1 through the purge air channel 14. Since the outlet direction of the purge air channel 14 points to the flange port 13, the purge gas is discharged through the molecular pump 30 on the flange port 13, thereby realizing the purge of the blind spot inside the swing valve 10, and the particulate matter inside the swing valve 10 is discharged through the flange port 13 using the exhaust principle of the molecular pump 30. Among them, the structure of the purge gas channel 14 can be in various forms, such as an outlet opened on the first cavity 11 and the second cavity 12, the outlet can be opened on the upper surface, lower surface and side wall of the second cavity 12, and opened on the side wall of the first cavity 11, the outlet points to the flange port 13, the purge gas can enter the first cavity 11 and the second cavity 12 through these outlets, the molecular pump 30 is connected to the flange port 13, under the action of the molecular pump 30, the purge gas flows in a ring shape in the valve body 1, flows to the flange port 13, and the purge gas is discharged through the molecular pump 30, thereby discharging the particles in the purge blind area, that is, the second cavity 12, reducing the number of particles in the entire reaction chamber 20 and improving the quality of thin film deposition. Of course, it can be understood that the purge gas channel 14 can also be other structures, which are not limited here. By increasing the purge function of the valve body 1 of the swing valve 10, the accumulation of particles inside the valve body 1 can be effectively reduced. The particles attached to the valve body 1 and the valve plate 4 can be removed in time through the molecular pump 30, which can reduce the number of particles in the entire reaction chamber 20. At the same time, it can effectively prevent particles from adhering to the sealing surfaces of the swing valve 10. Under frequent dynamic friction, particles can easily damage the sealing surfaces and cause leakage rate problems.

[0040] In this embodiment, the pressure on the side of the valve body 1 away from the flange port 13 is greater than the pressure on the side of the flange port 13. Specifically, in order to ensure that the particles are blown smoothly to the flange port 13, it is necessary to ensure that the pressure on the side away from the flange port 13, that is, the pressure on the side of the second cavity 12 is greater than the pressure on the side of the flange port 13, so that the purge gas will be blown to the flange port 13, and avoid the excessive pressure on the side of the flange port 13 blowing the particles to the purge blind area (second cavity 12) inside the valve body 1. There are many structures to make the pressure on the side of the second cavity 12 greater than the pressure on the side of the flange port 13. For example, the number of air outlets on the second cavity 12 can be greater than the number of air outlets on the first cavity 11 (flange port 13 side). For another example, the diameter of the air outlet on the second cavity 12 can be greater than the diameter of the air outlet on the first cavity 11 (flange port 13 side). Of course, it can be understood that there can be other structural forms, which are not limited here. By adjusting the pressure on the flange port 13 side to be lower than the pressure in the purging blind zone, it is avoided that excessive pressure on the flange port 13 side causes particles to be blown into the purging blind zone inside the valve body 1, thereby reducing particle contamination and improving the quality of film deposition.

[0041] Reference Figure 6In one embodiment, the sealing assembly 3 further includes a second sealing body 32 and a fixing ring 33, wherein the fixing ring 33 is disposed in the sealing groove 21, the second sealing ring 2 is fixedly disposed on the side of the fixing ring 33 facing away from the inner wall of the valve body 1, and the first sealing ring 2 is fixedly disposed on the side of the fixing ring 33 facing the inner wall of the valve body 1. Specifically, the sealing assembly 3 is a combined sealing structure, including a first sealing body 31, a second sealing body 32 and a fixing ring 33, wherein the first sealing body 31 and the second sealing body 32 are both sealing ring structures, wherein the second sealing body 32 is an O-ring, and the fixing ring 33 is used to fix the first sealing body 31 and the second sealing body 32 respectively, wherein the second sealing body 32 is fixed on the inner side of the fixing ring 33, and the first sealing body 31 is fixed on the outer side of the fixing ring 33. Specifically, during installation, the second sealing body 32 is first inserted into the sealing groove 21 of the sealing ring 2, and then the fixing ring 33 is inserted, and finally the first sealing body 31 is inserted into the fixing ring 33, that is, the second sealing body 32 contacts the sealing ring 2 at the innermost side, the fixing ring 33 is in the middle, and the first sealing body 31 contacts the inner wall of the valve body 1 at the outermost side. In the process of dynamic sealing, the fixing ring 33 presses the second sealing body 32 and the sealing ring 2, and presses the first sealing body 31 and the inner wall of the valve body 1. The second sealing body 32 (O-ring) can generate a pre-tightening force inside the sealing groove 21 through its own elastic deformation, ensuring the sealing between the sealing ring 2 and the valve body 1, and effectively preventing gas leakage even in a static state. When the sealing ring 2 moves up and down, the second sealing body 32 can provide a certain dynamic compensation capability, that is, when the fixing ring 33 or the first sealing body 31 cannot be completely sealed due to wear or pressure changes, the second sealing body 32 can fill the gap through its elastic recovery ability to maintain a good sealing effect. The second sealing body 32 can also play the role of auxiliary support, helping the first sealing body 31 to better press the inner wall of the valve body 1 and maintain a tight fit. The first sealing body 31 contacts and rubs against the inner wall of the valve body 1, and the first sealing body 31 and the inner wall of the valve body 1 are in surface contact, which increases the contact area, reduces friction, and has a longer service life compared to the O-ring. Compared with the existing single O-ring, this combined sealing structure is still in contact with the sealing ring 2 in the sealing groove 21 of this embodiment. The O-ring (second sealing body 32) ensures the reliability of the seal, but the first sealing body 31 contacts the inner wall of the valve body 1 outside the sealing groove 21. The first sealing body 31 and the inner wall of the valve body 1 are in surface contact, which reduces friction, improves the defect of the O-ring being easily damaged by local friction, and improves the durability and stability of the seal.

[0042] In this embodiment, the upper surface of the fixing ring 33 is tightly fitted with the upper groove surface of the sealing groove 21, and the lower surface of the fixing ring 33 is tightly fitted with the lower groove surface of the sealing groove 21. Specifically, the long-term high-concentration fluoride ion corrosion of the HDP equipment causes the surface layer of the O-ring to easily fall off due to corrosion, and the seal fails. For this reason, the fixing ring 33 is configured as a sealing structure in this embodiment, and the fixing ring 33 seals the second sealing body 32 on the inner side of the sealing groove 21. Specifically, the second sealing body 32 is first inserted into the sealing groove 21, and then the fixing ring 33 can be embedded in the sealing groove 21, or have an interference fit with the sealing groove 21. The height of the fixing ring 33 matches the height of the sealing groove 21. The upper surface of the fixing ring 33 and the upper groove surface of the sealing groove 21 are closely fitted together and in contact with each other, and there is no gap between the two. Similarly, the lower surface of the fixing ring 33 and the lower groove surface of the sealing groove 21 are closely fitted together and in contact with each other, and there is no gap between the two. In this way, the second sealing body 32 can be sealed, and the corrosive gas cannot enter the inner side of the sealing groove 21 to corrode the second sealing body 32, thereby effectively reducing the corrosion of the corrosive gas to the second sealing body 32 and improving the service life of the second sealing body 32.

[0043] Furthermore, the fixing ring 33 is made of polytetrafluoroethylene, which is a high-performance synthetic fluoropolymer. Polytetrafluoroethylene has the advantages of corrosion resistance and low friction coefficient, and is suitable for sliding scenarios. The PTFE fixing ring 33 can effectively reduce the corrosion of the second sealing body 32 by corrosive gas, thereby improving the service life of the second sealing body 32.

[0044] Continue to refer to Figure 6In this embodiment, the fixing groove 331 includes an upper horizontal groove surface 331a, a lower horizontal groove surface 331b and a vertical groove surface 331c, wherein the upper horizontal groove surface 331a is parallel to and alternates with the lower horizontal groove surface 331b, and the vertical groove surface 331c vertically connects the upper horizontal groove surface 331a and the lower horizontal groove surface 331b respectively; wherein the first sealing body 31 is in surface contact with the upper horizontal groove surface 331a, the lower horizontal groove surface 331b and the vertical groove surface 331c respectively. Specifically, the cross-section of the fixing groove 331 is in a "C" shape, and the fixing groove 331 includes an upper horizontal groove surface 331a, a lower horizontal groove surface 331b and a vertical groove surface 331c, and the upper horizontal groove surface 331a, the lower horizontal groove surface 331b and the vertical groove surface 331c are adjacent in sequence to form a "C"-shaped groove structure. The first sealing body 31 is a polygonal sealing ring, for example, a sealing ring with a quadrilateral cross section. The first sealing body 31 has multiple sealing surfaces, including an upper sealing surface, a lower sealing surface and a side sealing surface. The upper sealing surface is tightly fitted with the upper horizontal groove surface 331a in surface contact, the lower sealing surface is tightly fitted with the lower horizontal groove surface 331b in surface contact, and the side sealing surface is tightly fitted with the vertical groove surface 331c in surface contact. Each sealing surface is in surface contact with the groove surface of the fixed groove 331. In this way, the first sealing body 31 can be firmly fixed in the fixed groove 331. Compared with a sealing ring with a circular cross section, this polygonal sealing ring can effectively prevent the sealing ring from twisting during movement, reducing the damage to the sealing body caused by mechanical friction.

[0045] When the existing O-type sealing ring is subjected to shear force, the shear force is greater than the friction between it and the sealing groove 21 because it is circular, which will cause the O-type sealing ring to twist. To this end, the first sealing body 31 of the present embodiment can be a polygonal sealing ring, which is closely fitted with multiple groove surfaces of the fixed groove 331 in surface contact. The polygonal sealing ring provides more contact points or contact areas due to its non-circular cross-sectional shape (such as a rectangle), which helps to improve the stability of the sealing ring in the fixed groove 331 and reduce its displacement or twisting during movement; and the shape of the polygonal sealing ring can provide a certain guiding effect, especially in reciprocating or rotating motion, this guiding effect can help the sealing ring maintain the correct direction and avoid twisting caused by deflection; in addition, due to the shape characteristics of the polygonal sealing ring, it can distribute stress more evenly when under pressure, reducing the possibility of local stress concentration, thereby reducing the risk of deformation or twisting of the sealing ring due to excessive local force. In addition, the contact area between the polygonal sealing ring and the fixed groove 331 is large, and the friction force will increase synchronously, so it is less likely to twist under the same shear force. Through this embodiment, a surface contact structure in which a "C"-shaped fixing groove 331 cooperates with the polygonal first sealing body 31 is adopted to prevent the first sealing body 31 from rotating during sliding friction, reduce the friction of the sealing ring 2 and the valve body 1 on the first sealing body 31, and reduce the damage of mechanical friction to the performance of the first sealing body 31.

[0046] Reference Fig. 9 The embodiment of the present invention further provides a thin film deposition device, comprising a reaction chamber 20, a molecular pump 30, a swing valve 10, a pneumatic valve 40 and a needle valve 50, wherein the swing valve 10 is the swing valve 10 of the above embodiment, the reaction chamber 20 is connected to the swing valve 10, the swing valve 10 is connected to the molecular pump 30 through its flange port 13, the pneumatic valve 40 and the needle valve 50 are connected to the swing valve 10 in sequence; wherein the purge gas is discharged in sequence through the pneumatic valve 40, the needle valve 50, the purge gas passage 14 of the swing valve 10 and the molecular pump 30. wherein the swing valve 10 has been described in detail in the above embodiment, and for the sake of brevity of the specification, it will not be repeated here.

[0047] Specifically, by adding appropriate purge air channels 14 inside the valve body 1 and linking the pneumatic valve 40 to adapt to the corresponding process flow, the swing valve 10 is opened synchronously for internal purge during the cavity purge process, and the size of the purge air flow can be adjusted by matching the needle valve 50 to avoid backflow and contamination of the cavity. Specifically, the reaction chamber 20 and the molecular pump 30 are both connected to the flange port 13 of the swing valve 10, the molecular pump 30 provides negative pressure, the pneumatic valve 40, the needle valve 50 and the swing valve 10 are connected in sequence, and the purge gas enters the valve body 1 through the purge air channel 14 of the pneumatic valve 40, the needle valve 50, and the swing valve 10 in sequence to purge the purge blind area, and the particles in the purge blind area can be blown to the flange port 13, and the particles are discharged under the action of the molecular pump 30. In actual applications, according to the process flow of the machine, the pneumatic valve 40 is opened synchronously during the chamber purge process, so that N2 (nitrogen) gas enters the valve body 1 for purge. At the same time, the flow rate of N2 is adjusted by adjusting the opening of the needle valve 50 so that the incoming pressure is lower than the pressure of the reaction chamber 20, ensuring that the purge gas of the swing valve 10 is discharged from the molecular pump 30 to avoid backflow and contamination of the reaction chamber 20 caused by excessive pressure.

[0048] Through this embodiment, the swing valve 10 of the above embodiment is adopted. On the one hand, by changing the sealing structure of the side wall of the sealing ring 2, the previous single O-ring is changed to an O-ring + PTFE fixing ring 33 + polygonal sealing ring combined sealing method, which can effectively avoid the sealing ring from twisting during the dynamic sealing process, and increase the contact area between the sealing ring and the inner wall of the valve body 1, reduce local friction, and reduce the damage to the performance of the sealing ring caused by mechanical friction. At the same time, the added PTFE fixing ring 33 can effectively reduce the corrosion of the corrosive gas to the rubber ring, thereby improving the service life of the sealing ring.

[0049] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed by the present invention, and these modifications or replacements should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention shall be based on the protection scope of the claims.

Claims

1. A swing valve, characterized in that: include: A valve body, a sealing ring and a sealing assembly, wherein the sealing ring is movably arranged in the valve body, a sealing groove is provided on the side of the sealing ring facing the inner wall of the valve body, the sealing assembly is arranged in the sealing groove, and the sealing assembly includes a first sealing body, which abuts against the inner wall of the valve body to form a dynamic seal; Wherein, the first sealing body is in surface contact with the inner wall of the valve body.

2. The swing valve according to claim 1, characterized in that: The valve body is provided with a flange opening which passes through from top to bottom. The valve body can be horizontally rotatably arranged in the valve body to open and close the flange opening. The valve body is provided with a purge air passage which connects the outside with the inside of the valve body. The air outlet direction of the purge air passage points to the flange opening.

3. The swing valve according to claim 2, characterized in that: The pressure on the side of the valve body away from the flange opening is greater than the pressure on the side of the flange opening.

4. The swing valve according to any one of claims 1 to 3, characterized in that: The sealing assembly also includes a second sealing body and a fixing ring. The fixing ring is arranged in the sealing groove. The second sealing ring is fixed on the side of the fixing ring facing away from the inner wall of the valve body. The first sealing ring is fixed on the side of the fixing ring facing the inner wall of the valve body.

5. The swing valve according to claim 4, characterized in that: The upper surface of the fixing ring is tightly fitted with the upper groove surface of the sealing groove, and the lower surface of the fixing ring is tightly fitted with the lower groove surface of the sealing groove.

6. The swing valve according to claim 4, characterized in that: A fixing groove is formed on one side of the fixing ring facing the inner wall of the valve body, and the second sealing body is fixed in the fixing groove.

7. The swing valve according to claim 6, characterized in that: The fixed groove includes an upper horizontal groove surface, a lower horizontal groove surface and a vertical groove surface, the upper horizontal groove surface is parallel to the lower horizontal groove surface and the vertical groove surface is vertically connected to the upper horizontal groove surface and the lower horizontal groove surface respectively; wherein the first sealing body is in surface contact with the upper horizontal groove surface, the lower horizontal groove surface and the vertical groove surface respectively.

8. The swing valve according to claim 4, characterized in that: The first sealing body is a polygonal sealing ring; and / or the second sealing body is an O-ring.

9. The swing valve according to claim 4, characterized in that: The fixing ring is made of polytetrafluoroethylene.

10. A thin film deposition device, characterized in that: It comprises a reaction chamber, a molecular pump, a swing valve, a pneumatic valve and a needle valve, wherein the swing valve is the swing valve according to any one of claims 2 to 9, the reaction chamber is connected to the swing valve, the swing valve is connected to the molecular pump through its flange port, the pneumatic valve and the needle valve are connected to the swing valve in sequence; wherein the purge gas is discharged in sequence through the pneumatic valve, the needle valve, the purge air channel of the swing valve and the molecular pump.

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