Water vapor leakage detection system and method

Abstract

The invention provides a water vapor leakage detection system and method, and relates to the technical field of vacuum, the system is used for detecting the water vapor leakage rate of a connector in a vacuum cavity, the connector is physically connected with a plurality of water pipes, and the system comprises a femtosecond laser used for emitting first laser to a first area, the first area comprises the position where the connector is located and the position where the distance between the first area and the connector is smaller than a preset threshold value, and the frequency of the first laser is terahertz; the receiver is used for receiving second laser, and the second laser is the laser after the first laser passes through the first area; the detector is used for determining the water vapor leakage rate of the connector according to the second laser and a feature library, and the feature library comprises mapping between terahertz laser spectral line features and the water vapor leakage rate. The system can detect the leakage of extremely low water vapor under high vacuum, timely discover the leakage, prevent the vacuum degree from being damaged, and guarantee the safety of a vacuum system.

Description

Technical Field

[0001] The present application relates to the field of vacuum technology, and more specifically, to a water vapor leak detection system and method. Background Art

[0002] Various components can be arranged in the vacuum chamber of the vacuum equipment to realize various functions of the vacuum equipment. Some components will fail at high temperatures and need to be kept at a lower temperature, so a cooling system needs to be set up in the vacuum chamber. Water cooling is an important cooling method. A water pipe is arranged on the component that needs to be cooled (also called the object to be cooled). Water can flow through the water pipe, and the water in the water pipe can cool the object to be cooled. Usually, the water pipe includes multiple pipes of different materials, and these pipes are physically connected by connectors.

[0003] As a mechanical object, the connector may leak water vapor. Once the water vapor leaks, the vacuum degree of the vacuum chamber will be seriously damaged, causing the vacuum pump to malfunction and making the vacuum equipment unable to work normally.

[0004] The helium tracer method can be used to detect the water vapor leakage rate of the connector. However, the helium tracer method is an offline detection method. In order to detect the leakage of the connector, the vacuum equipment needs to be shut down, the water needs to be drained, and helium needs to be filled in, making the vacuum equipment unable to work. In addition, replacing water with helium will destroy the water environment. After the test, when the vacuum equipment is restarted, more time is needed to establish the circulation of cooling water.

[0005] Therefore, how to sensitively detect water vapor leakage from the connector in the vacuum chamber online is a technical problem that needs to be solved urgently. Summary of the invention

[0006] The present application provides a water vapor leak detection system and method, which can detect extremely low amounts of water vapor leaks under high vacuum, discover leaks in a timely manner, avoid the destruction of the vacuum degree, and ensure the safety of the vacuum system.

[0007] In a first aspect, a water vapor leakage detection system is provided, the system is used to detect the water vapor leakage rate of a connector in a vacuum chamber, the connector is physically connected to a plurality of water pipes, the system comprises: a femtosecond laser, used to emit a first laser to a first area, wherein the first area includes a position where the connector is located and a position whose distance from the connector is less than a preset threshold, and the frequency of the first laser is terahertz; a receiver, used to receive a second laser, wherein the second laser is the laser after the first laser passes through the first area; a detector, used to determine the water vapor leakage rate of the connector according to the second laser and a feature library, wherein the feature library comprises a mapping between terahertz laser spectral line features and water vapor leakage rates.

[0008] In the embodiment of the present application, the water vapor leakage rate of the connector is detected online through terahertz laser and feature library. Compared with helium detection, the water vapor leakage detection system provided by the embodiment of the present application does not need to stop the operation of the vacuum equipment. In addition, the terahertz laser is highly sensitive to water vapor. After the terahertz laser passes through extremely low content of water vapor, the signal will also change significantly. Therefore, the water vapor leakage detection provided by the embodiment of the present application has a high sensitivity. In particular, the above scheme is applied to semiconductor equipment with high vacuum degree, and can detect water vapor leakage in the vacuum chamber in real time to ensure the normal operation of the semiconductor equipment.

[0009] In combination with the first aspect, in certain implementations of the first aspect, the femtosecond laser is disposed outside the vacuum chamber, wherein the system further includes: a probe, disposed inside the vacuum chamber and optically connected to the femtosecond laser; wherein the femtosecond laser is specifically used to emit the first laser through the probe.

[0010] In the embodiment of the present application, a femtosecond laser can be arranged outside the vacuum chamber, and the femtosecond laser emits terahertz laser through a probe. Vacuum equipment has high requirements for components arranged in the vacuum chamber, such as requiring an extremely low outgassing rate, which results in high costs. Placing the femtosecond laser outside the vacuum chamber can reduce the cost of the femtosecond laser and improve the applicability of the water vapor leak detection system provided in the embodiment of the present application.

[0011] In combination with the first aspect, in certain implementations of the first aspect, the femtosecond laser and the receiver are arranged on both sides of the connector; wherein the femtosecond receiver is specifically used to emit the first laser to the second area, wherein the second area is an area outside the connector and within the first area; and the receiver is specifically used to receive the second laser, which is the laser after the first laser passes through the second area.

[0012] Based on the above solution, the femtosecond laser and the receiver are arranged on both sides of the connector, which can increase the optical path length and flight time of the terahertz laser, so that the terahertz laser has more opportunities to be affected by the leaked water vapor, resulting in a greater signal change. Therefore, the above solution can improve the sensitivity of water vapor leak detection.

[0013] In combination with the first aspect, in certain implementations of the first aspect, the femtosecond laser and the receiver are arranged on one side of the connector; wherein the femtosecond receiver is specifically used to emit the first laser to the connector; and the receiver is specifically used to receive the second laser, which is the laser after the first laser is reflected by the connector.

[0014] In the embodiment of the present application, a femtosecond laser and a receiver are arranged on one side of the connector, and the signal of the second laser is obtained through reflection of the connector. This solution is easy to install and debug, thereby improving the applicability of water vapor leak detection.

[0015] In combination with the first aspect, in certain implementations of the first aspect, the vacuum degree of the vacuum chamber is less than 10 -5 Pa.

[0016] A vacuum chamber with a high vacuum degree has a higher requirement for the water vapor leakage rate, and the water vapor leakage detection system provided in the embodiment of the present application has high sensitivity and can perform online real-time detection, so it can be applied to a vacuum chamber with a high vacuum degree.

[0017] In combination with the first aspect, in some implementations of the first aspect, the receiver is disposed inside the vacuum chamber.

[0018] The receiver is arranged inside the vacuum chamber, so that the received second laser is only affected by the inside of the vacuum chamber, while avoiding detection errors caused by substances outside the vacuum chamber, thereby improving the accuracy of water vapor leakage detection.

[0019] In combination with the first aspect, in certain implementations of the first aspect, the detector is specifically used to: determine an absorption spectrum based on the second laser; determine a spectrum feature of the second laser based on the absorption spectrum; and match the spectrum feature of the second laser in the feature library to determine a water vapor leakage rate of the connector.

[0020] In combination with the first aspect, in certain implementations of the first aspect, the femtosecond laser is further used to emit a third laser to the first area, wherein the frequency of the third laser is terahertz; the receiver is further used to receive a fourth laser, wherein the fourth laser is the laser after the third laser passes through the first area; the detector is further used to obtain the helium-calibrated water vapor leakage rate of the connector, determine the spectral line characteristics of the fourth laser based on the absorption spectrum of the fourth laser, and add the mapping relationship between the helium-calibrated water vapor leakage rate and the spectral line characteristics of the fourth laser to the feature library.

[0021] The above scheme uses helium detection to determine the water vapor leakage rate of the connector in the feature library. Then, by emitting a terahertz laser to the first area where the connector calibrated by helium is located, the spectral line characteristics after the change of the terahertz laser can be obtained, and a mapping relationship between the spectral line characteristics and the water vapor leakage rate calibrated by helium is established and the mapping relationship is added to the feature library. Helium detection of water vapor leakage rate has high accuracy, therefore, the mapping relationship in the feature library of the present application includes an accurate water vapor leakage rate, so that the water vapor leakage detection system provided in the embodiment of the present application can accurately detect water vapor leakage.

[0022] In combination with the first aspect, in some implementations of the first aspect, the preset threshold is 1 mm.

[0023] The preset threshold of 1 mm can be understood as the femtosecond laser emitting terahertz laser to the connector and the position within 1 mm near the connector. Since the vacuum degree of the vacuum chamber is relatively high, water vapor will quickly diffuse to various positions in the vacuum chamber after a leak occurs. Among them, the water vapor content near the connector is relatively high. Therefore, setting the preset threshold to 1 mm can make the terahertz laser change more, thereby improving the sensitivity of water vapor leak detection.

[0024] In a second aspect, an embodiment of the present application provides a water vapor leakage detection method, which is used to detect the water vapor leakage rate of a connector in a vacuum chamber, wherein the connector is physically connected to multiple water pipes, and the method is applied to a water vapor leakage detection system, which includes a femtosecond laser and a receiver, wherein the method includes: controlling the femtosecond laser to emit a first laser to a first area, wherein the first area includes a position where the connector is located and a position where the distance from the connector is less than a preset threshold, and the frequency of the first laser is terahertz; receiving a second laser through the receiver, wherein the second laser is the laser after the first laser passes through the first area; determining the water vapor leakage rate of the connector based on the second laser and a feature library, wherein the feature library includes a mapping between terahertz laser spectral line characteristics and water vapor leakage rate.

[0025] In combination with the second aspect, in certain implementations of the second aspect, the femtosecond laser is disposed outside the vacuum chamber, wherein the system further includes: a probe, disposed inside the vacuum chamber and optically connected to the femtosecond laser; wherein controlling the femtosecond laser to emit a first laser to the first area includes: controlling the femtosecond laser to emit the first laser through the probe.

[0026] In combination with the second aspect, in certain implementations of the second aspect, the femtosecond laser and the receiver are arranged on both sides of the connector; wherein, controlling the femtosecond laser to emit a first laser to the first area includes: controlling the femtosecond laser to emit the first laser to the second area, wherein the second area is an area outside the connector and within the first area; wherein receiving the second laser through the receiver includes: receiving the second laser through the receiver, and the second laser is the laser after the first laser passes through the second area.

[0027] In combination with the second aspect, in certain implementations of the second aspect, the femtosecond laser and the receiver are arranged on one side of the connector; wherein, controlling the femtosecond laser to emit a first laser to the first area includes: controlling the femtosecond laser to emit the first laser to the connector; wherein receiving a second laser through the receiver includes: receiving the second laser through the receiver, the second laser being the laser after the first laser is reflected by the connector.

[0028] In conjunction with the second aspect, in certain implementations of the second aspect, the vacuum degree of the vacuum chamber is less than 10 -5 Pa.

[0029] In combination with the second aspect, in some implementations of the second aspect, the receiver is disposed inside the vacuum chamber.

[0030] In combination with the second aspect, in certain implementations of the second aspect, the water vapor leakage rate of the connector is determined based on the second laser and a feature library, including: determining an absorption spectrum based on the second laser; determining a spectrum feature of the second laser based on the absorption spectrum; and matching the spectrum feature of the second laser in the feature library to determine the water vapor leakage rate of the connector.

[0031] In combination with the second aspect, in certain implementations of the second aspect, before controlling the femtosecond laser to emit a first laser to the first area, the method also includes: controlling the femtosecond laser to emit a third laser to the first area, wherein the frequency of the third laser is terahertz; receiving a fourth laser through the receiver, wherein the fourth laser is the laser after the third laser passes through the first area; obtaining the helium-calibrated water vapor leakage rate of the connector; determining the spectral line characteristics of the fourth laser based on the absorption spectrum of the fourth laser; and adding the mapping relationship between the helium-calibrated water vapor leakage rate and the spectral line characteristics of the fourth laser to the feature library.

[0032] In combination with the second aspect, in some implementations of the second aspect, the preset threshold is 1 mm.

[0033] In a third aspect, a computing device is provided, including a processor and a memory, wherein the processor is used to execute instructions stored in the memory so that the computing device executes the water vapor leakage detection method of the second aspect or any possible implementation of the second aspect.

[0034] In a fourth aspect, a computer program product comprising instructions is provided. When the instructions are executed by a computing device, the computing device executes the water vapor leakage detection method of the second aspect or any possible implementation of the second aspect.

[0035] In a fifth aspect, a computer-readable storage medium is provided, comprising computer program instructions. When the computer program instructions are executed by a computing device, the computing device executes the water vapor leakage detection method of the second aspect or any possible implementation of the second aspect. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 It is a schematic diagram of a vacuum device.

[0037] Figure 2 It is a schematic diagram of a water vapor leak detection system provided in an embodiment of the present application.

[0038] Figure 3 It is a schematic diagram of the absorption spectrum of the terahertz laser before and after passing through water vapor provided in an embodiment of the present application.

[0039] Figure 4 It is a schematic diagram of another water vapor leak detection system provided in an embodiment of the present application.

[0040] Figure 5 It is a schematic diagram of another water vapor leak detection system provided in an embodiment of the present application.

[0041] Figure 6 It is a schematic diagram of a transmission type water vapor monitoring system provided in an embodiment of the present application.

[0042] Figure 7 It is a schematic diagram of a reflective water vapor monitoring system provided in an embodiment of the present application.

[0043] Figure 8 It is a schematic flow chart of a water vapor leak detection method provided in an embodiment of the present application.

[0044] Fig. 9 It is a schematic block diagram of a water vapor leak detection device provided in an embodiment of the present application.

[0045] Fig.10 It is a schematic block diagram of a computing device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0046] The technical solution in this application will be described below in conjunction with the accompanying drawings.

[0047] The present application will present various aspects, embodiments or features around a system that may include multiple devices, components, modules, etc. It should be understood and appreciated that each system may include additional devices, components, modules, etc., and / or may not include all of the devices, components, modules, etc. discussed in conjunction with the figures. In addition, combinations of these schemes may also be used.

[0048] In addition, in the embodiments of the present application, words such as "exemplary" and "for example" are used to indicate examples, illustrations or descriptions. Any embodiment or design described as "exemplary" in the present application should not be interpreted as being more preferred or more advantageous than other embodiments or designs. Specifically, the use of the word "exemplary" is intended to present concepts in a concrete way.

[0049] The business scenarios described in the embodiments of the present application are intended to more clearly illustrate the technical solutions of the embodiments of the present application, and do not constitute a limitation on the technical solutions provided in the embodiments of the present application. Ordinary technicians in this field can know that with the emergence of new business scenarios, the technical solutions provided in the embodiments of the present application are also applicable to similar technical problems.

[0050] References to "one embodiment" or "some embodiments" etc. described in this specification mean that a particular feature, structure or characteristic described in conjunction with the embodiment is included in one or more embodiments of the present application. Thus, the phrases "in one embodiment", "in some embodiments", "in some other embodiments", "in some other embodiments", etc. appearing in different places in this specification do not necessarily refer to the same embodiment, but mean "one or more but not all embodiments", unless otherwise specifically emphasized in other ways. The terms "including", "comprising", "having" and their variations all mean "including but not limited to", unless otherwise specifically emphasized in other ways.

[0051] Figure 1 is a schematic diagram of a vacuum device 100. Figure 1 The vacuum device 100 includes a vacuum pump 110 and a vacuum chamber 120 . The vacuum pump 110 and the vacuum chamber 120 are connected. The vacuum pump 110 is used to extract the pressure in the vacuum chamber 120 to maintain the vacuum degree in the vacuum chamber 120 .

[0052] Various components may be arranged in the vacuum chamber 120 to realize various functions of the vacuum device 100. Some components may fail at high temperatures and need to be kept at a lower temperature, so a cooling system is also required in the vacuum chamber 120. Water cooling is an important cooling method, see Figure 1 The cooled object 130 is a component that needs to be cooled. A water pipe 140 is provided on the cooled object 130. Water can flow through the water pipe 140. The water in the water pipe 140 can cool the cooled object 130. Usually, the water pipe 140 includes a plurality of pipes made of different materials, and these pipes are physically connected by a connector 141. For example, the water pipe 140 may include a plastic pipe and a steel pipe (such as a liquid cooling plate). The plastic pipe is provided outside the vacuum chamber 120 to facilitate connection with a water source, and the steel pipe is provided inside the vacuum chamber 120 to improve the cooling effect. For the sake of distinction, the water pipe 140 mentioned below refers to a section of a plurality of pipes. For example, Figure 1It can be considered that three water pipes 140 are connected by two connectors 141 .

[0053] As a mechanical object, the connector will inevitably have some defects during the processing process. These defects may allow gas or liquid to penetrate from the inside of the connector to the outside, that is, water vapor leakage. Once the water vapor leaks, it will seriously damage the vacuum degree of the vacuum chamber 120, causing the vacuum pump 110 to malfunction, making the vacuum device 100 unable to work normally. For example, the vacuum device 100 can be a semiconductor device. In semiconductor devices, the electron beam requires an extremely high vacuum degree (usually <10 -5 Pa), and circulating water is used to cool each component. In order to maintain a high vacuum degree, the connector set in the vacuum chamber needs to have an extremely low leakage rate, for example, the leakage rate should be controlled within 10 -8 Pa*L / s or less, when the leakage rate is greater than 10 -7 Pa*L / s, the vacuum degree will be destroyed, causing the semiconductor device to not work properly. -7 The leakage rate of Pa*L / s reaches the gas sealing level, based on the leakage of 1cm 3 The volume of bubbles converted into leakage time is more than 30 years. It is difficult to detect a leakage rate of this magnitude by conventional means.

[0054] The helium tracing method can accurately detect the water vapor leakage rate of the connector. For example, the object to be cooled 130 and the water pipe 140 (including the connector 141) are first placed in the vacuum chamber 120, and the vacuum degree of the vacuum chamber 120 is maintained by the vacuum pump 110. The water in the water pipe 140 is emptied, and helium is introduced into the water pipe 140. A residual gas analyzer (RGA) is connected to the vacuum chamber 120, and the helium content ratio is analyzed by RGA to determine the water vapor leakage rate of the connector. In this way, when the water vapor leakage rate exceeds 10 -7 In the case of Pa*L / s, it can be determined that the connector does not meet the requirements of the semiconductor device.

[0055] However, the connector may be further damaged during use, causing an increase in the water vapor leakage rate. In other words, a connector that originally met the requirements may no longer meet the requirements. The helium tracer method is an offline detection method. In order to detect the leakage of the connector, the vacuum equipment 100 needs to be shut down, the water needs to be drained, and helium needs to be filled in, so that the vacuum equipment 100 cannot work. In addition, replacing water with helium will damage the water environment. After the test is completed, when the vacuum equipment 100 is restarted, more time is required to establish the circulation of cooling water. In addition, as a mass spectrometer, RGA emits electrons, causing the electron source to discharge, which may damage the components in the vacuum equipment 100.

[0056] Therefore, how to sensitively detect water vapor leakage from the connector in the vacuum chamber online is a technical problem that needs to be solved urgently.

[0057] Figure 2 2 is a schematic diagram of a water vapor leakage detection system 200 provided in an embodiment of the present application. The system 200 can sensitively detect water vapor leakage of a connector in a vacuum chamber online.

[0058] The system 200 is used to detect the water vapor leakage rate of a connector 141 in a vacuum chamber 120, where the connector 141 is physically connected to a plurality of water pipes 140. The system 200 includes: a femtosecond laser 210, used to emit a first laser to a first area, wherein the first area includes a position where the connector is located and a position where the distance from the connector is less than a preset threshold, and the frequency of the first laser is terahertz; a receiver 220, used to receive a second laser, wherein the second laser is the laser after the first laser passes through the first area; a detector 230, used to determine the water vapor leakage rate of the connector 141 based on the second laser and a feature library, wherein the feature library includes a mapping between terahertz laser spectral line features and water vapor leakage rates.

[0059] It should be noted that Figure 2 The vacuum chamber 120 is not shown in the figure. The connector 141 is located inside the vacuum chamber 120. In addition, other devices can be arranged inside the vacuum chamber 120, outside the vacuum chamber 120, or partially inside or outside the vacuum chamber 120. For example, the femtosecond laser 210 can be arranged inside the vacuum chamber 120, or outside the vacuum chamber 120. For another example, the receiver 220 can be arranged inside the vacuum chamber 120, or outside the vacuum chamber 120. The water pipe 140 can be completely located inside the vacuum chamber 120, or partially inside the vacuum chamber 120.

[0060] in addition, Figure 2 The contents of the object to be cooled 130 and the vacuum pump 110 are omitted. Figure 1 , which will not be elaborated here.

[0061] Figure 2 The connector 141 is shown to be connected to two water pipes 140, but the present application is not limited thereto, and the connector 141 can also be connected to more water pipes 140. For example, the connector 141 can also be connected to three water pipes 140, in which case the connector 141 can also be called a "three-way connector".

[0062] See also Figure 2, the dotted box may represent the first area, and the first area includes the location of the connector 141 and the location where the distance from the connector 141 is less than the preset threshold. The first area may also be understood as the connector 141 and the vicinity of the connector 141. The embodiment of the present application does not limit the specific value of the above-mentioned "preset threshold", for example, it may be 0.5 mm to 1.5 mm.

[0063] The frequency of the first laser emitted by the femtosecond laser 210 is terahertz (THz), and the first laser can also be called a terahertz (THz) laser. Terahertz can also be called terahertz or terahertz, which is used to indicate the frequency of electromagnetic waves. When a terahertz laser passes through water vapor, the absorption spectrum of the laser (also called an absorption spectrum line, or a laser signal) will change. In order to distinguish the absorption spectrum before and after the change, the laser before the change is called the first laser, and the laser after the change is called the second laser. The first laser can also be called the initial laser, the emission laser, or the detection laser, and the second laser can also be called the change laser, the receiving laser, or the response laser.

[0064] The receiver 220 can receive the second laser, that is, the laser after the first laser passes through the first area, which can also be understood as the laser that changes due to passing through water vapor.

[0065] Figure 3 It is a schematic diagram of the absorption spectrum of the terahertz laser before and after passing through water vapor provided in an embodiment of the present application. Figure 3 (a) is an example of the absorption spectrum of the first laser, where the horizontal axis (or X-axis) is the frequency in THz, and the vertical axis (or Y-axis) is the normalized intensity (dimensionless) of the absorption spectrum. It can be seen that the first laser has fewer characteristic peaks in the frequency range of 0.5 THz to 2.5 THz. Figure 3 (b) is an example of the absorption spectrum of the second laser, and it can be seen that the second laser has many characteristic peaks in the frequency band of 0.5THz to 2.5THz. For example, a characteristic peak with a normalized intensity of -15.3702 appeared at 0.55769THz, a characteristic peak with a normalized intensity of -19.7106 appeared at 0.75425THz, a characteristic peak with a normalized intensity of -28.8756 appeared at 0.98739THz, a characteristic peak with a normalized intensity of -48.9533 appeared at 1.0971THz, and a characteristic peak with a normalized intensity of -48.03 appeared at 1.1611THz.

[0066] It should be noted that the present application does not limit the specific structures of the femtosecond laser 210 and the receiver 220. As long as they can emit and receive terahertz lasers, they fall within the scope of the present application.

[0067] The detector 230 can be any component with a computing function, which is not limited in this application. The detector 230 can be connected to the receiver 220 for communication, and the feature library includes a mapping between the terahertz laser spectral line characteristics and the water vapor leakage rate. In this way, based on the signal of the second laser received by the receiver 220 and the feature library, the detector 230 can determine the water vapor leakage rate of the connector 141. The embodiment of establishing the feature library is described later, which will not be repeated here.

[0068] In the embodiment of the present application, the water vapor leakage rate of the connector 141 is detected online through the terahertz laser and the feature library. Compared with the helium detection, the water vapor leakage detection system provided by the embodiment of the present application does not need to stop the operation of the vacuum equipment 100. In addition, the terahertz laser is highly sensitive to water vapor. After the terahertz laser passes through extremely low content of water vapor, the signal will also change greatly. Therefore, the water vapor leakage detection provided by the embodiment of the present application has a high sensitivity. In particular, the above scheme is applied to semiconductor equipment with high vacuum degree, and can detect water vapor leakage in the vacuum chamber in real time to ensure the normal operation of the semiconductor equipment.

[0069] In some embodiments, the preset threshold is 1 mm. However, it should be noted that the preset threshold is 1 mm, which can also be understood as the preset threshold is around 1 mm.

[0070] The preset threshold of 1 mm can be understood as the femtosecond laser 210 emitting terahertz laser light to the connector 141 and the position within 1 mm near the connector 141. Since the vacuum degree of the vacuum chamber 120 is relatively high, water vapor will quickly diffuse to various positions of the vacuum chamber 120 after a leak occurs. Among them, the water vapor content near the connector 141 is relatively high. Therefore, setting the preset threshold to 1 mm can make the terahertz laser change more significantly, thereby improving the sensitivity of water vapor leak detection.

[0071] See also Figure 2 In some embodiments, the femtosecond laser 210 and the receiver 220 are arranged on both sides of the connector 141; wherein the femtosecond receiver 210 is specifically used to emit the first laser to the second area, wherein the second area is an area outside the connector 141 and within the first area; the receiver 220 is specifically used to receive the second laser, which is the laser after the first laser passes through the second area.

[0072] The above solution may also be referred to as a transmission detection method. The second area may also be understood as the vicinity of the connector 141 , but does not include the connector 141 itself. Figure 2 In the figure, the dotted arrow indicates the optical path of the terahertz laser.

[0073] In the embodiment of the present application, the femtosecond laser 210 and the receiver 220 are arranged on both sides of the connector 141, which can increase the optical path length and flight time of the terahertz laser, so that the terahertz laser has more opportunities to be affected by the leaked water vapor, thereby causing a greater signal change. Therefore, the above solution can improve the sensitivity of water vapor leakage detection.

[0074] Figure 4 Schematic diagram of another water vapor leak detection system 200 provided in an embodiment of the present application.

[0075] See also Figure 4 In other embodiments, the femtosecond laser 210 and the receiver 220 are arranged on one side of the connector 141; wherein the femtosecond receiver 210 is specifically used to emit the first laser to the connector 141; the receiver 220 is specifically used to receive the second laser, which is the laser after the first laser is reflected by the connector 141.

[0076] The above scheme can also be called a reflection detection method. The femtosecond laser 210 and the receiver 220 are located on the same side of the connector 141. The system 200 can also include a first adjustment lens group and a second adjustment lens group ( Figure 4 (not shown in the figure), the first adjustment mirror group can adjust the parameters such as the angle of the laser emitted by the femtosecond laser 210. In this way, the terahertz laser can be focused on the connector 141 through the first adjustment mirror group, and the terahertz laser is reflected by the connector 141 and received by the receiver 220 through the second adjustment mirror group. After obtaining the signal of the terahertz laser, the detector 230 can determine the water vapor leakage rate of the connector 141 according to the feature library. Figure 4 In the figure, the dotted arrow indicates the optical path of the terahertz laser.

[0077] In the embodiment of the present application, the femtosecond laser 210 and the receiver 220 are arranged on one side of the connector 141, and the signal of the second laser is obtained through the reflection of the connector 141. This solution is easy to install and debug, thereby improving the applicability of water vapor leak detection.

[0078] Figure 5 It is a schematic diagram of another water vapor leak detection system 200 provided in an embodiment of the present application. Figure 5 This is merely an illustration and does not constitute a limitation of the present application. Figure 5 Some figure marks are omitted in the figure. The omitted parts can be found in the previous text and will not be repeated here.

[0079] See also Figure 5In some embodiments, the femtosecond laser 210 is disposed outside the vacuum chamber 120, wherein the system 200 further includes: a probe 520, disposed inside the vacuum chamber 120, optically connected to the femtosecond laser 210; wherein the femtosecond laser 210 is specifically used to emit the first laser through the probe 520.

[0080] It should be noted that Figure 5 A reflective detection method is shown, but it is obvious that the above scheme is also applicable to a transmissive detection method.

[0081] See also Figure 5 , the dotted arrow indicates the optical path of the terahertz laser. The femtosecond laser 210 is disposed outside the vacuum chamber 120 and optically connected to the probe 520. The terahertz laser is emitted from the femtosecond laser 210, passes through the through-cavity flange 510 to reach the probe 520, and then reaches the connector 141. After being reflected by the connector 141, the terahertz laser reaches the receiver 220. In some embodiments, the femtosecond laser 210 can be connected to the probe 520 via a polarization-maintaining optical fiber.

[0082] The solid arrow indicates the transmission path of the signal. After the terahertz laser reaches the receiver 220 , the receiver 220 can transmit the signal of the terahertz laser to the detector 230 through the signal line. The detector 230 compares the received signal with the feature library to determine the water vapor leakage rate of the connector 141 .

[0083] In the embodiment of the present application, the femtosecond laser 210 can be arranged outside the vacuum chamber 120, and the femtosecond laser 210 emits terahertz laser through the probe 520. The vacuum equipment 100 has high requirements for the components arranged in the vacuum chamber 120, such as requiring an extremely low outgassing rate, so the cost is relatively high. Arranging the femtosecond laser 210 outside the vacuum chamber 120 can reduce the cost of the femtosecond laser 210, and improve the applicability of the water vapor leak detection system provided by the embodiment of the present application.

[0084] See also Figure 5 In some embodiments, the receiver 220 is disposed inside the vacuum chamber 120 .

[0085] The receiver 220 is disposed inside the vacuum chamber 120 , so that the received second laser is only affected by the inside of the vacuum chamber 120 , while avoiding detection errors caused by substances outside the vacuum chamber 120 , thereby improving the accuracy of water vapor leakage detection.

[0086] In some embodiments, the vacuum degree of the vacuum chamber 120 is less than 10 -5 Pa.

[0087] The vacuum chamber 120 with a high vacuum degree has a higher requirement for the water vapor leakage rate, and the water vapor leakage detection system provided in the embodiment of the present application has high sensitivity and can perform online real-time detection, so it can be applied to the vacuum chamber 120 with a high vacuum degree.

[0088] In some embodiments, the detector 230 is specifically used to: determine the absorption spectrum according to the second laser; determine the spectrum characteristics of the second laser according to the absorption spectrum; match the spectrum characteristics of the second laser in the feature library to determine the water vapor leakage rate of the connector 141.

[0089] Exemplarily, the second laser can be analyzed by a terahertz spectrometer to determine the absorption spectrum of the second laser. According to the absorption spectrum, the spectrum characteristics of the second laser can be obtained, such as the amplitude of the absorption spectrum (e.g., normalized spectral intensity), position points (e.g., frequency shift, time shift) and other characteristic quantities. Among them, frequency shift means that the frequency of some characteristic peaks of the second laser has shifted relative to the first laser. Time shift means that after the absorption spectrum of the second laser is changed to the time domain, the time of some characteristic peaks of the second laser has shifted relative to the first laser.

[0090] Exemplarily, the spectral line characteristics of the second laser can be determined by an existing feature extraction algorithm.

[0091] In some other embodiments, the detector 230 is specifically used to: input the spectral line characteristics of the second laser into a neural network model, and predict the water vapor leakage rate of the connector 141 according to the neural network model.

[0092] The present application does not limit the specific form of the neural network model. For example, an extreme gradient boosting (XGbosst) model, a support vector machine (SVM), etc. may be used.

[0093] In some other embodiments, the detector 230 is specifically used to predict the water vapor leakage rate of the connector 141 corresponding to the spectral line feature of the second laser according to a pattern recognition algorithm and a feature library.

[0094] The present application does not limit the specific form of the pattern recognition algorithm, and an existing pattern recognition algorithm may be used. The pattern recognition algorithm may predict the water vapor leakage rate based on an existing feature library. For example, the spectral line feature of the second laser may not be matched in the feature library. In this case, the pattern recognition algorithm may be used to predict the water vapor leakage rate of the connector 141 based on the mapping relationship between the spectral line feature and the existing feature library.

[0095] Figure 6It is a schematic diagram of a transmission type water vapor monitoring system provided in an embodiment of the present application.

[0096] See also Figure 6 The terahertz spectrometer is connected to the light source (corresponding to the aforementioned femtosecond laser 210 or probe 520) through a flange through four subminiature version A (sma) wires. The light source emits the first laser through lens group 1 (corresponding to the aforementioned first adjustment lens group), and the detector (corresponding to the aforementioned receiver 220) receives the second laser through lens group 2 (corresponding to the aforementioned second adjustment lens group), and transmits the signal of the second laser to the terahertz spectrometer (corresponding to the aforementioned detector 230) through the flange for analysis. The connector is connected to the liquid cooling plate, and water vapor leakage may occur at the connector. In this way, Figure 6 The illustrated transmissive water vapor monitoring system (corresponding to the aforementioned transmissive water vapor leak detection system 200 ) is capable of monitoring water vapor leaks.

[0097] Figure 7 It is a schematic diagram of a reflective water vapor monitoring system provided in an embodiment of the present application.

[0098] See also Figure 7 The terahertz spectrometer is connected to the light source (corresponding to the aforementioned femtosecond laser 210 or probe 520) through a flange through four SMA wires. The light source emits a first laser to the connector through lens group 1 (corresponding to the aforementioned first adjustment lens group). The detector (corresponding to the aforementioned receiver 220) receives the reflected second laser through lens group 2 (corresponding to the aforementioned second adjustment lens group), and transmits the signal of the second laser to the terahertz spectrometer (corresponding to the aforementioned detector 230) through the flange for analysis. The connector is connected to the liquid cooling plate, and water vapor leakage may occur at the connector. In this way, Figure 7 The illustrated reflective water vapor monitoring system (corresponding to the aforementioned reflective water vapor leak detection system 200 ) is capable of monitoring water vapor leaks.

[0099] It should be noted that Figure 6 and Figure 7 This is only an illustration and does not constitute a limitation of the present application. The process of establishing a feature library is described below.

[0100] In some embodiments, the femtosecond laser 210 is also used to emit a third laser to the first area, wherein the frequency of the third laser is terahertz; the receiver 220 is also used to receive a fourth laser, wherein the fourth laser is the laser after the third laser passes through the first area; the detector 230 is also used to obtain the helium-calibrated water vapor leakage rate of the connector 141, determine the spectral line characteristics of the fourth laser according to the absorption spectrum of the fourth laser, and add the mapping relationship between the helium-calibrated water vapor leakage rate and the spectral line characteristics of the fourth laser to the feature library.

[0101] The third laser is similar to the first laser, and the description of the first laser can be referred to above. The fourth laser is similar to the second laser, and the description of the second laser can be referred to above. Through helium detection, the water vapor leakage rate of the connector 141 can be determined, and the water vapor leakage rate can be referred to as the helium-calibrated water vapor leakage rate. Accordingly, in the process of establishing the feature library, the connector 141 can also be referred to as the helium-calibrated connector 141.

[0102] The above scheme uses helium detection to determine the water vapor leakage rate of the connector 141 in the feature library. Then, by emitting a terahertz laser to the first area where the connector 141 calibrated with helium is located, the spectral line characteristics after the change of the terahertz laser can be obtained, and a mapping relationship between the spectral line characteristics and the water vapor leakage rate calibrated with helium is established and the mapping relationship is added to the feature library. The helium detection of water vapor leakage rate has a high accuracy. Therefore, the mapping relationship in the feature library of the present application includes an accurate water vapor leakage rate, so that the water vapor leakage detection system provided in the embodiment of the present application can accurately detect water vapor leakage.

[0103] As an example, the mapping relationship between a low water vapor leakage rate and a spectral line feature is first determined, and then the water vapor leakage rate is gradually increased, thereby determining the mapping relationship between different water vapor leakage rates and spectral line features.

[0104] For example, the air tightness of the connector 141 is first determined by helium detection, the water vapor leakage rate is calibrated as L0, and then the water cooling equipment is laid, the water pipe 140 and the connector 141 are connected, the vacuum chamber 120 is evacuated, and water is passed through the water pipe 140. The signal of the fourth laser is collected by the water vapor leakage detection system, and a mapping relationship between the L0 water vapor leakage rate and the spectral line characteristics of the fourth laser (such as the amplitude and position point of the absorption rate) is established, and the mapping relationship is added to the feature library.

[0105] Further, the water vapor leakage rate of the connector 141 is increased (for example, the leak-proof gasket of the connector 141 is destroyed by external force), the water vapor leakage rate is calibrated as L1 through helium detection, and then a water cooling device is laid, the water pipe 140 and the connector 141 are connected, the vacuum chamber 120 is evacuated, and water is passed through the water pipe 140. The signal of the fourth laser is collected by the water vapor leakage detection system, and a mapping relationship between the L1 water vapor leakage rate and the spectral line characteristics of the fourth laser (for example, the amplitude and position point of the absorption rate) is established, and the mapping relationship is added to the feature library.

[0106] Figure 8 800 is a schematic flow chart of a water vapor leak detection method 800 provided in an embodiment of the present application. The method can be executed by any device with computing capability, for example, can be executed by the detector 230.

[0107] The method 800 is used to detect the water vapor leakage rate of the connector 141 in the vacuum chamber 120, and the connector 141 is physically connected to a plurality of water pipes 140. The method 800 is applied to a water vapor leakage detection system 200, which includes a femtosecond laser 210 and a receiver 220. Figure 8 Each action in the embodiment of the method 800 is introduced. For the parts not introduced below, reference can be made to the embodiment of the system 200, and no further description is given.

[0108] S810, controlling the femtosecond laser 210 to emit a first laser to a first area, wherein the first area includes a position where the connector 141 is located and a position whose distance from the connector 141 is less than a preset threshold, and a frequency of the first laser is terahertz.

[0109] In some embodiments, the femtosecond laser 210 is disposed outside the vacuum chamber 120, wherein the system 200 further includes: a probe 520, disposed inside the vacuum chamber 120, optically connected to the femtosecond laser 210; wherein S810 includes: controlling the femtosecond laser 210 to emit the first laser through the probe 520.

[0110] S820, receiving a second laser through the receiver 220, wherein the second laser is the laser after the first laser passes through the first area.

[0111] In some embodiments, the femtosecond laser 210 and the receiver 220 are arranged on both sides of the connector 141; wherein S810 includes: controlling the femtosecond laser 210 to emit the first laser to the second area, wherein the second area is an area outside the connector 141 and within the first area; wherein S820 includes: receiving the second laser through the receiver 220, and the second laser is the laser after the first laser passes through the second area.

[0112] In some embodiments, the femtosecond laser 210 and the receiver 220 are arranged on one side of the connector 141; wherein S810 includes: controlling the femtosecond laser 210 to emit the first laser to the connector 141; wherein S820 includes: receiving the second laser through the receiver 220, and the second laser is the laser after the first laser is reflected by the connector.

[0113] S830, determining the water vapor leakage rate of the connector 141 according to the second laser and a feature library, wherein the feature library includes a mapping between terahertz laser spectral line features and water vapor leakage rates.

[0114] In some embodiments, S830 includes: determining an absorption spectrum according to the second laser; determining a spectrum feature of the second laser according to the absorption spectrum; and matching the spectrum feature of the second laser in the feature library to determine a water vapor leakage rate of the connector 141 .

[0115] In some embodiments, before S810, the method 800 also includes: controlling the femtosecond laser 210 to emit a third laser to the first area, wherein the frequency of the third laser is terahertz; receiving a fourth laser through the receiver 220, wherein the fourth laser is the laser after the third laser passes through the first area; obtaining the helium-calibrated water vapor leakage rate of the connector 141; determining the spectral line characteristics of the fourth laser according to the absorption spectrum of the fourth laser; and adding the mapping relationship between the helium-calibrated water vapor leakage rate and the spectral line characteristics of the fourth laser to the feature library.

[0116] The method embodiments of the present application are described in detail above. The device embodiments of the present application are described below. The device embodiments correspond to the method embodiments, so the parts not described in detail can refer to the previous method embodiments or the aforementioned system embodiments. The device can implement any possible implementation method of the above method.

[0117] Fig. 9 1 is a schematic block diagram of a water vapor leakage detection device 900 provided in an embodiment of the present application. The device 900 can be applied to the water vapor leakage detection system 200.

[0118] Fig. 9 As shown, the water vapor leakage detection device 900 includes: a control module 910, used to control the femtosecond laser 210 to emit a first laser to the first area, and to receive a second laser through the receiver 220; a matching module 920, used to determine the water vapor leakage rate of the connector 141 according to the second laser and the feature library.

[0119] The control module 910 and the matching module 920 can be implemented by software or hardware. For example, the control module 910 is taken as an example to introduce the implementation of the control module 910. Similarly, the implementation of the matching module 920 can refer to the implementation of the control module 910.

[0120] As an example of a software functional unit, the control module 910 may include code running on a computing instance. The computing instance may include at least one of a physical host (computing device), a virtual machine, and a container. Furthermore, the computing instance may be one or more.

[0121] As an example of a hardware functional unit, the control module 910 may include at least one computing device, such as a server, etc. Alternatively, the control module 910 may also be a device implemented using an application-specific integrated circuit (ASIC) or a programmable logic device (PLD). The PLD may be a complex programmable logical device (CPLD), a field-programmable gate array (FPGA), a generic array logic (GAL) or any combination thereof.

[0122] Fig.10 It is a schematic block diagram of a computing device 1000 provided in an embodiment of the present application.

[0123] The present application also provides a computing device 1000. Fig.10 As shown, computing device 1000 includes: bus 1002, processor 1004, memory 1006 and communication interface 1008. Processor 1004, memory 1006 and communication interface 1008 communicate through bus 1002. Computing device 1000 can be a server or a terminal device. It should be understood that the present application does not limit the number of processors and memories in computing device 1000.

[0124] The bus 1002 may be a peripheral component interconnect (PCI) bus or an extended industry standard architecture (EISA) bus. The bus may be divided into an address bus, a data bus, a control bus, etc. For ease of representation, Fig.10 The bus 1002 may include a path for transmitting information between various components of the computing device 1000 (eg, the memory 1006, the processor 1004, and the communication interface 1008).

[0125] The processor 1004 may include any one or more of a central processing unit (CPU), a graphics processing unit (GPU), a microprocessor (MP), or a digital signal processor (DSP).

[0126] The memory 1006 may include a volatile memory, such as a random access memory (RAM). The memory 1006 may also include a non-volatile memory, such as a read-only memory (ROM), a flash memory, a hard disk drive (HDD), or a solid state drive (SSD).

[0127] The memory 1006 stores executable program codes, and the processor 1004 executes the executable program codes to respectively implement the functions of the control module 910 and the matching module 920, thereby implementing the water vapor leakage detection method. That is, the memory 1006 stores instructions for executing the water vapor leakage detection method.

[0128] The communication interface 1008 uses a transceiver module such as, but not limited to, a network interface card or a transceiver to implement communication between the computing device 1000 and other devices or a communication network.

[0129] The embodiment of the present application also provides a computer program product including instructions. The computer program product may be software or a program product including instructions that can be run on a computing device or stored in any available medium. When the computer program product is run on at least one computing device, the at least one computing device executes the above-mentioned water vapor leak detection method.

[0130] The embodiment of the present application also provides a computer-readable storage medium. The computer-readable storage medium can be any available medium that can be stored by a computing device or a data storage device such as a data center containing one or more available media. The available medium can be a magnetic medium (e.g., a floppy disk, a hard disk, a tape), an optical medium (e.g., a DVD), or a semiconductor medium (e.g., a solid-state hard disk). The computer-readable storage medium includes instructions that instruct the computing device to execute the above-mentioned water vapor leak detection method.

[0131] Those of ordinary skill in the art will appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, or a combination of computer software and electronic hardware. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Professional and technical personnel can use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of this application.

[0132] In the several embodiments provided in the present application, it should be understood that the disclosed systems, devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of the units is only a logical function division. There may be other division methods in actual implementation, such as multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or units, which can be electrical, mechanical or other forms.

[0133] The units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0134] In addition, each functional unit in each embodiment of the present application may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit.

[0135] If the functions are implemented in the form of software functional units and sold or used as independent products, they can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present application can be essentially or partly embodied in the form of a software product that contributes to the prior art. The computer software product is stored in a storage medium and includes several instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) to perform all or part of the steps of the methods described in the various embodiments of the present application. The aforementioned storage media include: various media that can store program codes, such as USB flash drives, mobile hard disks, read-only memories (ROM), random access memories (RAM), magnetic disks or optical disks.

[0136] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A water vapor leak detection system, characterized in that: The system is used to detect the water vapor leakage rate of a connector in a vacuum chamber, wherein the connector is physically connected to a plurality of water pipes, and the system comprises: A femtosecond laser, configured to emit a first laser to a first area, wherein the first area includes a position where the connector is located and a position whose distance from the connector is less than a preset threshold, and a frequency of the first laser is terahertz; A receiver, configured to receive a second laser, wherein the second laser is the laser after the first laser passes through the first area; A detector is used to determine the water vapor leakage rate of the connector according to the second laser and a feature library, wherein the feature library includes a mapping between terahertz laser spectral line features and water vapor leakage rates.

2. The system according to claim 1, characterized in that The femtosecond laser is disposed outside the vacuum chamber, wherein the system further comprises: A probe is arranged inside the vacuum chamber and optically connected to the femtosecond laser; wherein, The femtosecond laser is specifically used to emit the first laser through the probe.

3. The system according to claim 1 or 2, characterized in that: The femtosecond laser and the receiver are arranged on both sides of the connector; wherein, The femtosecond receiver is specifically used to emit the first laser to a second area, wherein the second area is an area outside the connector and within the first area; The receiver is specifically used to receive the second laser, where the second laser is the laser after the first laser passes through the second area.

4. The system according to claim 1 or 2, characterized in that: The femtosecond laser and the receiver are arranged on one side of the connector; wherein, The femtosecond receiver is specifically used to emit the first laser to the connector; The receiver is specifically used to receive the second laser, where the second laser is the laser after the first laser is reflected by the connector.

5. The system according to any one of claims 1 to 4, characterized in that: The vacuum degree of the vacuum chamber is less than 10 -5 PaPa.

6. The system according to any one of claims 1 to 5, characterized in that: The receiver is arranged inside the vacuum chamber.

7. The system according to any one of claims 1 to 6, characterized in that: The detector is specifically used for: determining an absorption spectrum line according to the second laser; Determining the spectral line characteristics of the second laser according to the absorption spectral line; The spectral line feature of the second laser is matched in the feature library to determine the water vapor leakage rate of the connector.

8. The system according to any one of claims 1 to 7, characterized in that: The femtosecond laser is further used to emit a third laser to the first area, wherein the frequency of the third laser is terahertz; The receiver is further used to receive a fourth laser, wherein the fourth laser is the laser after the third laser passes through the first area; The detector is also used to obtain the helium-calibrated water vapor leakage rate of the connector, determine the spectral line characteristics of the fourth laser according to the absorption spectrum of the fourth laser, and add the mapping relationship between the helium-calibrated water vapor leakage rate and the spectral line characteristics of the fourth laser to the feature library.

9. The system according to any one of claims 1 to 8, characterized in that: The preset threshold is 1 mm.

10. A method for detecting water vapor leakage, characterized in that: The method is used to detect the water vapor leakage rate of a connector in a vacuum chamber, the connector is physically connected to a plurality of water pipes, and the method is applied to a water vapor leakage detection system, the system comprising a femtosecond laser and a receiver, wherein the method comprises: Controlling the femtosecond laser to emit a first laser to a first area, wherein the first area includes a position where the connector is located and a position whose distance from the connector is less than a preset threshold, and a frequency of the first laser is terahertz; receiving a second laser by the receiver, wherein the second laser is the laser after the first laser passes through the first area; The water vapor leakage rate of the connector is determined according to the second laser and a feature library, wherein the feature library includes a mapping between terahertz laser spectral line features and water vapor leakage rates.

11. The method according to claim 10, characterized in that The femtosecond laser is disposed outside the vacuum chamber, wherein the system further comprises: a probe disposed inside the vacuum chamber and optically connected to the femtosecond laser; wherein controlling the femtosecond laser to emit a first laser to a first region comprises: The femtosecond laser is controlled to emit the first laser through the probe.

12. The method according to claim 10 or 11, characterized in that: The femtosecond laser and the receiver are arranged on both sides of the connector; wherein, controlling the femtosecond laser to emit a first laser to the first area comprises: Controlling the femtosecond laser to emit the first laser to a second area, wherein the second area is an area outside the connector and within the first area; wherein receiving the second laser by a receiver comprises: The second laser light is received by the receiver, where the second laser light is the laser light after the first laser light passes through the second area.

13. The method according to claim 10 or 11, characterized in that: The femtosecond laser and the receiver are arranged on one side of the connector; wherein, The controlling the femtosecond laser to emit a first laser to the first area comprises: Controlling the femtosecond laser to emit the first laser to the connector; wherein receiving the second laser through the receiver comprises: The second laser is received by the receiver, where the second laser is the laser after the first laser is reflected by the connector.

14. The method according to any one of claims 10 to 13, characterized in that The vacuum degree of the vacuum chamber is less than 10 -5 PaPa.

15. The method according to any one of claims 10 to 14, characterized in that The receiver is arranged inside the vacuum chamber.

16. The method according to any one of claims 10 to 15, characterized in that The step of determining the water vapor leakage rate of the connector according to the second laser and the feature library comprises: determining an absorption spectrum line according to the second laser; Determining the spectral line characteristics of the second laser according to the absorption spectral line; The spectral line feature of the second laser is matched in the feature library to determine the water vapor leakage rate of the connector.

17. The method according to any one of claims 10 to 16, characterized in that Before controlling the femtosecond laser to emit the first laser to the first area, the method further includes: Controlling the femtosecond laser to emit a third laser to the first area, wherein the frequency of the third laser is terahertz; receiving a fourth laser through the receiver, wherein the fourth laser is the laser after the third laser passes through the first area; Obtaining a helium-calibrated water vapor leakage rate of the connector; determining a spectral line feature of the fourth laser according to an absorption spectral line of the fourth laser; The mapping relationship between the water vapor leakage rate calibrated by helium and the spectral line characteristics of the fourth laser is added to the characteristic library.

18. The method according to any one of claims 10 to 17, characterized in that The preset threshold is 1 mm.

19. A computing device, characterized in that The method comprises a processor and a memory, wherein the processor is configured to execute instructions stored in the memory so that the computing device executes the method according to any one of claims 10 to 18.

20. A computer program product comprising instructions, characterized in that When the instructions are executed by a computing device, the computing device is caused to perform the method according to any one of claims 10 to 18.

21. A computer-readable storage medium, characterized in that: The method comprises computer program instructions, which, when executed by a computing device, causes the computing device to perform the method as claimed in any one of claims 10 to 18.

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