Heat treatment system and power control equipment and temperature control method for temperature control of heat treatment system

Abstract

The present disclosure relates to a power control apparatus for temperature control capable of phase angle control compensation according to power fluctuations, a heat treatment system having the same, and a temperature control method of the heat treatment system. The power control apparatus for temperature control includes a power control unit configured to control an amount of power supplied to a heating source by controlling a phase of an AC power source supplied from a power source, and a power measurement unit connected to the power source and configured to measure the AC power source, wherein the power control unit controls the phase of the AC power supply by compensating the phase angle according to a difference between a reference power value and a measurement value measured by the power measurement unit.

Description

Technical Field

[0001] The present disclosure relates to a power control device for temperature control, a heat treatment system having the device, and a temperature control method for the heat treatment system. More specifically, it relates to a power control device for temperature control capable of performing phase control compensation according to power fluctuations, a heat treatment system having the device, and a temperature control method for the heat treatment system. Background Art

[0002] Thermal treatment is a process of annealing a substrate (eg, a wafer) during substrate processing.

[0003] This heat treatment may heat the substrate by turning on multiple lamps and irradiating the substrate with light, and cool the substrate by turning off the lamps. In this case, it is possible to measure the temperature of the substrate and control the amount of power supplied to each lamp according to the temperature of the substrate so that the entire substrate is heated uniformly, and the temperature of the substrate may rise to 1,000°C or more in a few seconds.

[0004] Here, the power supplied to the lamp may be controlled using a thyristor such as a silicon controlled rectifier (SCR), and the power may be controlled by the thyristor by applying a phase angle control (PAC) method. For example, an AC power may be input to the SCR from a power source, and when a gate current flows through the gate of the SCR, power may be output from the SCR and supplied to the lamp. Utilizing this, in the PAC method, by changing the timing of the gate current applied to the SCR, the waveform of the output power (e.g., the output current waveform and the output voltage waveform) may be changed, the output power of the SCR (i.e., the input power of the lamp) may be changed, and therefore, the amount of power supplied to the lamp may be controlled.

[0005] The AC power supplied to the SCR from the power supply may fluctuate due to power supply replacement of the thermal processing system or other unstable factors during use of the thermal processing system. In this case, the amount of power supplied to the lamp may also fluctuate, which causes the output (intensity) of the lamp to be different from the set output, which may cause the substrate to not be heated (or maintained) to a temperature close to (or similar to) the target temperature according to the measured temperature.

[0006] Therefore, even if the AC power supplied from the power supply to the SCR fluctuates, the temperature reproducibility makes it possible to suppress and / or prevent the difference between the output of the lamp and the set output and heat the substrate to a temperature close to the target temperature.

[0007] [Related technical literature]

[0008] [Patent document]

[0009] Korean Patent Publication No. 10-2002-0026006 Summary of the invention

[0010] The present disclosure provides a power control device for temperature control, which can detect power fluctuation and perform phase control compensation according to the power fluctuation, a heat treatment system having the power control device, and a temperature control method for the heat treatment system.

[0011] According to an exemplary embodiment, a power control device for temperature control includes: a power control unit configured to control the amount of power supplied to a heating source by controlling the phase of an AC power supplied from a power source; and a power measuring unit connected to the power source and configured to measure the AC power, wherein the power control unit controls the phase of the AC power by compensating for a phase angle based on a difference between a reference power value and a measurement value measured by the power measuring unit.

[0012] The power control unit may include a phase calculation unit configured to calculate a control phase of the AC power source from a reference power value according to the amount of power applied to the heating source, and a phase angle compensation unit configured to calculate a phase angle from a difference between the reference power value and a measurement value measured by the power measuring unit, and to compensate the phase angle of the control phase calculated by the phase calculation unit.

[0013] The power control unit may further include a power setting unit configured to set the amount of applied power according to the output of the heating source.

[0014] The phase angle compensation unit may be configured to proportionally calculate the phase angle by a difference between the reference power value and the measurement value measured by the power measurement unit.

[0015] The phase angle compensation unit may be configured to add the phase angle to the control phase calculated by the phase calculation unit when the difference between the reference power value and the measurement value measured by the power measurement unit is a positive number, and to subtract the phase angle from the control phase calculated by the phase calculation unit when the difference between the reference power value and the measurement value measured by the power measurement unit is a negative number.

[0016] The power supply may be configured to provide three-phase AC power.

[0017] The power measuring unit may be configured to measure the AC power of each phase, and the power control unit may be configured to control the phase of each phase of the AC power by respectively compensating the phase angle according to the difference between the reference power value and the measurement value measured by the power measuring unit, for each phase of the AC power.

[0018] According to another exemplary embodiment of the present disclosure, a heat treatment system includes a power control device for temperature control according to an embodiment of the present disclosure, a substrate supporting component arranged at a relative position of a heating source and configured to support a substrate, a temperature measuring unit configured to measure the substrate temperature, and a heating intensity calculation unit configured to calculate the output of the heating source according to the substrate temperature.

[0019] The heating source may include multiple lamps.

[0020] The amount of power applied to the heating source may be determined based on the heating source output calculated by the heating intensity calculation unit.

[0021] According to another exemplary embodiment, a temperature control method for a heat treatment system includes: measuring the temperature of a substrate supported on a substrate supporting member; calculating an output of a heating source that heats the substrate based on the measured substrate temperature; setting an amount of power applied to the heating source based on the calculated output of the heating source; and controlling the amount of power supplied to the heating source by controlling a phase of an AC power supplied from a power supply based on the set amount of applied power, wherein controlling the amount of power supplied to the heating source includes a process of measuring the AC power, and a process of controlling the phase of the AC power by compensating for a phase angle based on a difference between a measured value of the AC power and a reference power value.

[0022] The process of controlling the phase of the AC power may include a process of calculating a control phase of the AC power from a reference power value according to a set applied power amount, a process of calculating a phase angle using a difference between the reference power value and a measured value of the AC power, and a process of compensating the calculated control phase with the calculated phase angle.

[0023] In calculating the phase angle, the phase angle may be calculated in proportion to a difference between a measured value of the AC power source and a reference power value.

[0024] The process of compensating the calculated phase angle may include the process of adding the calculated phase angle to the calculated control phase when the value obtained by subtracting the measured value of the AC power supply from the reference power value is a positive number, and the process of subtracting the calculated phase angle from the calculated control phase when the value obtained by subtracting the measured value of the AC power supply from the reference power value is a negative number.

[0025] The power supply may be configured to supply three-phase AC power, and in controlling the phase of the AC power, the phase of each phase of the AC power may be controlled separately by compensating the phase angle according to the difference between the measured value of the AC power measured for each phase and the reference power value.

[0026] Exemplary embodiments may be understood in more detail from the following description in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 is a block diagram illustrating a power control apparatus for temperature control according to an exemplary embodiment.

[0028] Figure 2 is a conceptual diagram for describing phase angle compensation according to an exemplary embodiment.

[0029] Figure 3is a schematic cross-sectional view illustrating a heat treatment system according to another exemplary embodiment.

[0030] Figure 4 is a flowchart illustrating a temperature control method of a heat treatment system according to still another exemplary embodiment.

[0031] Description of Reference Numerals

[0032] 10: Power supply

[0033] 20: Heating source

[0034] 21: Substrate

[0035] 100: Power control equipment

[0036] 110: Power control unit

[0037] 111: Phase calculation unit

[0038] 112: Phase angle compensation unit

[0039] 113: Power setting unit

[0040] 120: Power measurement unit

[0041] 200:Heat treatment system

[0042] 210: substrate support member

[0043] 220: Temperature measurement unit

[0044] 221,222,223: Temperature measurement sensor

[0045] 230: Heating intensity calculation unit

[0046] 240: Chamber

[0047] 250: Gas supply unit

[0048] 260: Exhaust unit

[0049] 270: Rotating support component

[0050] 271:Support ring

[0051] 272: Bottom plate DETAILED DESCRIPTION

[0052] Hereinafter, embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings. However, the present disclosure is not limited to the embodiments disclosed below and will be implemented in various different forms. These embodiments are provided only to ensure the completeness of the present disclosure and to fully convey the scope of the present invention to those skilled in the art. In the description, the same reference numerals are assigned to the same parts, and the drawings may be partially enlarged in size to accurately describe the embodiments of the present disclosure. In the drawings, the same reference numerals represent the same parts.

[0053] Figure 1 is a block diagram illustrating a power control device for temperature control according to an embodiment of the present disclosure.

[0054] Reference Figure 1 According to an embodiment of the present disclosure, a power control device 100 for temperature control may include a power control unit 110 and a power measuring unit 120. The power control unit 110 controls the amount of power supplied to the heating source 20 by controlling the phase of the AC power supplied from the power source 10. The power measuring unit 120 is connected to the power source 10 and measures the AC power.

[0055] The power control unit 110 can control the amount of power supplied to the heating source 20 by controlling the phase of the AC power supplied from the power source 10, and control the amount of power supplied to the heating source 20 by applying a phase angle control (PAC) method using a thyristor such as a silicon controlled rectifier (SCR). For example, the power control unit 110 can control the phase of the AC power by changing the timing of the gate current of the gate of the SCR applied to the input AC power, and adjust the amount of power supplied to the heating source 20 through such phase control. Here, the power P may be the product of the voltage V and the current I, and the AC power may include an AC voltage and an AC current.

[0056] The power measuring unit 120 may be connected to the power supply 10 to measure the AC power, measure the peak value or waveform of the AC power, and measure (the peak value or waveform of) the AC power input to the power control unit 110. For example, the power measuring unit 120 may measure the AC power input to the SCR, and may measure (the peak value or waveform of) the AC voltage and / or the AC current. Through such control, fluctuations in the AC power input to the power control unit 110 (e.g., input to the SCR) may be detected.

[0057] Here, the power control unit 110 may control the phase of the AC power by compensating the phase angle α according to the difference between the reference power value R and the measurement value M measured by the power measuring unit 120. Here, the reference power value R may be the rated power (or rated voltage and / or rated current) of the heating source 20 and / or the rated power of the external power source 10, and may be the power (value) used by the heating source 20 on average (or usually) or the power (value) supplied when connected to the external power source 10. Even if the AC power is supplied from the power source 10 according to the reference power value R due to the replacement of the power source 10 or the occurrence of other unstable factors, the measurement value M measured by the power measuring unit 120 may differ, and the measurement value M measured by the power measuring unit 120 may be different from the reference power value R. In this case, the difference between the reference power (value) and the measurement (value) measured by the power measuring unit 120 may have the same period (or frequency) and different peaks or waveforms, and the voltage V may differ, the current I may differ, or both the voltage V and the current I may differ.

[0058] Typically, in an apparatus that heats a heated object (e.g., a substrate) by applying (or supplying) power to a heating source 20, such as a heat treatment system 200, the AC power supplied from the power source 10 is fixed in an initial setting state and used, and the amount of power supplied to the heating source 20 is adjusted by simply arithmetically (or by a formula) controlling the phase of the AC power to match the output (intensity) of the heating source 20 required to heat the heated object. As a result, when the AC power supplied from the power source 10 to the device for controlling the phase of the AC power (or a power control unit) fluctuates due to other unstable factors occurring during the use of the heat treatment system 200, it becomes impossible to heat the heated object to a target temperature (or according to a set temperature), and the reliability of the heat treatment deteriorates.

[0059] Furthermore, when the power source 10 of the heat treatment system 200 or the like is replaced or a different power source 10 is used depending on the location where the heat treatment system 200 or the like is installed, the AC power supplied from the power source 10 may vary depending on the connected power source 10. For this reason, when the power is controlled in a conventional manner, the heat treatment performance (or heating performance) may vary depending on the connected power source 10. When the intensity of the AC power supplied from the power source 10 can be changed by internally generating power, the intensity of the AC power can be adjusted so that the reference power that conforms to the prescribed formula is supplied from the power source 10, but when an external power source 10 that supplies AC power at a fixed intensity is used, the intensity of the AC power cannot be adjusted, and therefore it is difficult to create a new formula suitable for the connected power source 10.

[0060] However, when the power control unit 110 controls the phase of the AC power by compensating the phase angle α according to the difference between the reference power value R and the measurement value M measured by the power measuring unit 120, even if the AC power fluctuates, the required amount of power can be stably supplied to the heating source 20 according to a control formula according to the demand (or required amount of power) of the heating source 20 without adjusting the intensity of the AC power. That is, there is no need to create individual formulas according to the connection power source 10, and even if the AC power supplied (or input) from the power source 10 to the power control unit 110 fluctuates due to other unstable factors during the use of the heat treatment system 200, etc., the required amount of power can be supplied to the heating source 20 within the allowable range, and the heated object can be heat-treated (or heated) according to the target temperature (or set temperature).

[0061] Therefore, the power control device 100 for temperature control according to the present disclosure measures the AC power supplied from the power supply 10 through the power measuring unit 120, and compensates the phase angle α used for AC power phase control according to the difference between the reference power value R and the measurement value M measured by the power measuring unit 120, so that the required amount of power can be stably supplied to the heating source 20 according to the demand of the heating source 20. That is, no matter how the AC power input to the power control unit 110 fluctuates, the required amount of power can be supplied to the heating source 20 within the allowable range.

[0062] In addition, the power control unit 110 may include a phase calculation unit 111 and a phase angle compensation unit 112. The phase calculation unit 111 calculates a control phase R of the AC power source from a reference power value R according to the amount of power applied to the heating source 20. Pa The phase angle compensation unit 112 calculates the phase angle α from the difference between the reference power value R and the measurement value M measured by the power measurement unit 120, and adjusts the control phase R calculated by the phase calculation unit 111. Pa The phase calculation unit 111 may calculate the control phase R of the AC power source from the reference power value R according to the amount of power applied to the heating source 20. Pa Here, the amount of power applied to the heating source 20 may be the amount of power required by the heating source 20, and the control phase R of the AC power source calculated from the reference power value R Pa It can be the control phase R before the phase angle α compensation Pa , and may be obtained by dividing the cycle of the AC power source in a certain ratio in the waveform of the reference power. For example, the phase calculation unit 111 may calculate the control phase R of the AC power source in proportion to the amount of power applied. Pa When the amount of power applied increases, the control phase R of the AC power supply Pa It may also increase when the amount of power applied decreases, the control phase R of the AC power supply Pa It may also decrease.

[0063] The phase angle compensation unit 112 may calculate the phase angle α from the difference between the reference power value R and the measurement value M measured by the power measurement unit 120, and adjust the control phase R calculated by the phase calculation unit 111. Pa The compensation phase angle α can be calculated by the phase calculation unit 111 to control the phase R Pa The compensation phase angle α is used to generate the compensated control phase M Pa In this way, regardless of how the AC power source fluctuates, the power (amount) that matches the applied power amount can be supplied to the heating source 20 within an error within an allowable range.

[0064] In addition, the power control unit 110 may further include a power setting unit 113 configured to set the amount of applied power according to the output of the heating source 20. The power setting unit 113 may set the amount of applied power according to the required (or necessary) output (e.g., energy emission intensity or radiation intensity) of the heating source 20, calculate and set the amount of applied power by receiving output information of the heating source 20, and set the amount of applied power by receiving information of the amount of applied power calculated according to the output of the heating source 20. For example, when the power control device 100 is used in the heat treatment system 200, the required (set) output of the heating source 20 may be determined according to the temperature of the substrate 21 (to be measured), so that the substrate 21 may be heat treated (or heated) according to the set temperature (or target temperature), and the amount of applied power, which may be the output of the heating source 20, may be set in the power setting unit 113.

[0065] In this case, the phase calculation unit 111 may calculate the control phase R of the AC power source from the reference power value R according to the applied power amount set in the power setting unit 113. Pa .

[0066] In addition, the phase angle compensation unit 112 may calculate the phase angle α in proportion to the difference between the reference power value R and the measured value M measured by the power measurement unit 120. For example, when the difference between the peak value of the reference power and the peak value of the measured power measured by the power measurement unit 120 is large, a larger phase angle α may be used for compensation to compensate for the larger power difference, so that the amount of power obtained by applying the phase angle control PAC to the measured power measured by the power measurement unit 120 is equal to the amount of power obtained by using the control phase R of the AC power source calculated from the reference power value R. Pa In contrast, when the difference between the peak value of the reference power and the peak value of the measured power measured by the power measuring unit 120 is small, a smaller phase angle α may be used to compensate for the smaller power difference, so that the amount of power obtained by applying the phase angle control PAC to the measured power measured by the power measuring unit 120 is equal to the amount of power obtained by applying the control phase R of the AC power source calculated from the reference power value R.Pa Controls the amount of power drawn from the reference power.

[0067] By calculating the phase angle α in this way and controlling the phase angle R of the AC power calculated from the reference power value R Pa (i.e., the control phase calculated by the phase calculation unit) is compensated by the phase angle α, and the compensated control phase M can be obtained. Pa , and by using the compensated control phase M Pa The power amount obtained by the measured power measured by the control power measuring unit 120 may be equal to the control phase R of the AC power source calculated from the reference power value R Pa Controls the amount of power drawn from the reference power.

[0068] Figure 2 is a conceptual diagram describing phase angle compensation according to an embodiment of the present disclosure, Figure 2 (a) shows the addition of phase angles, Figure 2 (b) shows the subtraction of the phase angle.

[0069] refer to Figure 2 When the difference between the reference power value R and the measured value M measured by the power measuring unit 120 is a positive number, the phase angle compensation unit 112 may add the phase angle α to the control phase R calculated by the phase calculation unit 111. Pa When the difference between the reference power value R and the measured value M measured by the power measuring unit 120 is a negative number, the phase angle compensation unit 112 can calculate the control phase R calculated by the phase calculation unit 111. Pa Subtract the phase angle α from .

[0070] When the difference between the reference power value R and the measured value M measured by the power measuring unit 120 is a positive number, the reference power value R is greater than the measured value M measured by the power measuring unit 120. Therefore, when the reference power and the measured power measured by the power measuring unit 120 are calculated by the phase calculation unit 111 in the same manner as above, Pa When performing control, the control phase R calculated by the phase calculation unit 111 is Pa The amount of power obtained by controlling the reference power becomes greater than the control phase R calculated by the phase calculation unit 111. Pa The power amount obtained by controlling the measured power measured by the power measuring unit 120. Therefore, in order to increase the power amount obtained by applying phase angle control (PAC) to the measured power measured by the power measuring unit 120, so that it is equal to the control phase R calculated by the phase calculation unit 111 Pa The power amount obtained by controlling the reference power is the same, and the phase angle α can be added to the control phase R calculated by the phase calculation unit 111 Pa The compensated control phase M PaGreater than the control phase R calculated by the phase calculation unit 111 Pa .

[0071] On the contrary, when the difference between the reference power value R and the measured value M measured by the power measuring unit 120 is a negative number, the reference power value R is smaller than the measured value M measured by the power measuring unit 120. Therefore, when the reference power and the measured power measured by the power measuring unit 120 are calculated by the phase calculation unit 111 in the same manner as above, Pa When performing control, the control phase R calculated by the phase calculation unit 111 is Pa The amount of power obtained by controlling the reference power becomes greater than the control phase R calculated by the phase calculation unit 111. Pa The amount of power obtained by controlling the measured power measured by the power measuring unit 120. Therefore, in order to reduce the amount of power obtained by applying phase angle control (PAC) to the measured power measured by the power measuring unit 120, it is equal to the control phase R calculated by the phase calculation unit 111. Pa The power amount obtained by controlling the reference power is the same, and the control phase R calculated by the phase calculation unit 111 can be obtained. Pa Subtract the phase angle α from the compensation to make the control phase M Pa is smaller than the control phase R calculated by the phase calculation unit 111 Pa .

[0072] Here, the power supply 10 may supply three-phase AC power. The three-phase AC power may have different peak values ​​between each phase, etc. The difference from the reference power value R may vary depending on which phase of AC power is being supplied.

[0073] In the conventional method, when all three-phase AC power is used, since AC power with different peak values ​​is supplied with a phase difference and fluctuation of the AC power occurs in real time (or occurs for each of the three phases), it is impossible to create a new formula even when the heat treatment system 200 is initially set up, etc. In addition, when a single-phase AC power is used by selecting any one of the three-phase AC power, a new formula can be created. However, depending on which phase of the three phases is selected, a problem arises that a new formula must be created each time.

[0074] However, in the present disclosure, the AC power input to the power control unit 110 is measured in real time (or at regular intervals) by the power measuring unit 120, and the phase angle α can be used to compensate for the difference between the measured value M measured by the power measuring unit 120 and the reference power value R, so as to (always) supply the heating source 20 with an amount of power within a tolerance range of the applied power amount, thereby improving the reliability of the heat treatment.

[0075] For example, the power measuring unit 120 can measure the AC power of each phase, and the power control unit 110 can respectively control the phase of the AC power of each phase by respectively compensating the phase angle α of the AC power of each phase according to the difference between the reference power value R and the measurement value M measured by the power measuring unit 120. The power measuring unit 120 can measure the AC power of each phase and can measure the AC power input to the power control unit 110 in real time.

[0076] In addition, the power control unit 110 can control the phase of the AC power of each phase separately by compensating the phase angle α of the AC power of each phase respectively according to the difference between the reference power value R and the measured value M measured by the power measuring unit 120. Since the peak values, etc. between the three-phase AC power sources are different, the difference from the reference power value R may vary depending on which phase of the AC power is supplied. Therefore, the phase of the AC power of each phase can be controlled separately by compensating the phase angle α of the AC power of each phase respectively according to the difference between the reference power value R and the measured value M measured by the power measuring unit 120. Accordingly, even when all three-phase AC power sources are used, by compensating the phase angle α for each AC power of each phase according to the difference between the measured value M measured by the power measuring unit 120 and the reference power value R, the amount of power within the tolerance range of the applied power amount can be (always) supplied to the heating source 20.

[0077] Figure 3 is a schematic cross-sectional view showing a heat treatment system according to another embodiment of the present disclosure.

[0078] Reference Figure 3 , a heat treatment system according to another embodiment of the present disclosure will be described in more detail. Overlapping matters previously described with respect to a power control device for temperature control according to one embodiment of the present disclosure will be omitted.

[0079] A heat treatment system 200 according to another embodiment of the present disclosure may include a power control device 100 for temperature control according to an embodiment of the present disclosure, a substrate supporting component 210 arranged opposite to a heating source 20 and supporting a substrate 21, a temperature measuring unit 220 for measuring the temperature of the substrate 21, and a heating intensity calculation unit 230 for calculating the heating intensity output of the heating source 20 according to the temperature of the substrate 21.

[0080] The power control device 100 for temperature control may be a power control device 100 for temperature control according to an embodiment of the present disclosure. The thermal treatment system 200 including the power control device 100 may stably supply the required amount of power to the heating source 20 according to the required (set) output of the heating source 200 while controlling the output (e.g., energy emission intensity or radiation intensity) of the heating source that heats the substrate according to the substrate temperature. In this way, even if there is a fluctuation in the AC power input to the power control unit, the difference between the (set) output of the heating source 20 required at each time point (or period) and the actual output of the heating source 20 may be maintained within an allowable range, and the substrate 21 may be heated to a temperature close to (or similar to) the target temperature of the substrate 21, thereby improving the reliability of the thermal treatment of the substrate 21.

[0081] The substrate support member 210 may be disposed opposite to the heating source 20 and may support the substrate 21. For example, the substrate support member 210 may be disposed in the inner space of the chamber 240 and may support the substrate 21 in the chamber 240. Here, the substrate support member 210 may include an annular support ring. The support ring may be designed to reduce the contact area with the substrate 21 and may support the lower surface edge of the substrate 21. By reducing the contact area between the support ring and the substrate 21, the heating state near the edge of the substrate 21 may be simplified, so that the edge high / low effect may be reduced, and the particle contaminants in the chamber 240 may be reduced. In this case, the substrate 21 may include a wafer.

[0082] Meanwhile, the support ring has the groove to prevent the temperature of the edge region of the substrate 21 from being relatively low due to the process gas, and also to make the temperature of the edge region of the substrate 21 uniform.

[0083] The temperature measuring unit 220 can measure the temperature of the substrate 21, can measure the temperature from the center to the edge of the substrate 21, and can measure the temperature at regular intervals. For example, the temperature measuring unit 220 may include temperature measuring sensors 221, 222, and 223, such as thermocouples. The temperature measuring sensors 221, 222, and 223 can measure the temperature of the substrate 21 by receiving radiation (or infrared light) emitted from the lower surface of the substrate 21 below the substrate 21 (located on the opposite side of the heating source 20). In this case, the thermocouple can measure the temperature using the black body radiation theory based on the light emitted from the object and detected, and the temperature measurement process is well known, so its detailed description will be omitted.

[0084] The heating intensity calculation unit 230 may calculate the output (e.g., energy emission intensity or radiation intensity) of the heating source 20 according to the temperature of the substrate 21, and may calculate the output (intensity) of the heating source 20, such as energy emission intensity or radiation intensity, which may heat the substrate 21 to a target temperature according to the temperature of the substrate 21 measured by the temperature measurement unit 220. When the substrate 21 is heated using the output of the heating source 20 calculated in this manner, the substrate 21 may be heat-treated (or heated) according to the set temperature (or target temperature). In this case, the (set) output of the heating source 20 calculated by the heating intensity calculation unit 230 is transmitted to the power setting unit 113, and the amount of power applied to the heating source 20 may be set in the power setting unit 113 according to the output of the heating source 20 calculated by the heating intensity calculation unit 230.

[0085] For example, the heating source 20 may include a plurality of lamps disposed above the substrate support part 210, and may provide light energy to the substrate 21 supported on the substrate support part 210. Here, the plurality of lamps may provide radiant energy to the inner space of the chamber 240, and may heat the substrate 21 by transferring the radiant energy to the substrate 21. In this case, the plurality of lamps may include halogen lamps, and may generate radiant heat that flows into the inner space of the chamber 240 through the window of the chamber 240. In addition, the plurality of lamps may be arranged in a plurality of regions classified into several control groups, and the temperature of the substrate 21 may be controlled by controlling the lamps using a temperature control algorithm.

[0086] Meanwhile, the heating source 20 may have a larger area than the substrate 21, and at least a portion of the heating source 20 may be disposed at an upper portion of the groove of the support ring to provide light energy to the groove. With this configuration, the process gas flowing into the groove may be heated, and thus, the temperature of the edge region of the substrate 21 may be prevented from being lowered due to the insufficiently heated process gas. For example, the lamp may be located above the groove of the support ring, and among the plurality of lamps, the lamps located above the groove may be grouped together.

[0087] Here, the amount of power applied to the heating source 20 may be determined according to the (set) output of the heating source 20 calculated by the heating intensity calculation unit 230. The output of the heating source 20 may be controlled according to the amount of power applied (or supplied) to the heating source 20, and the amount of power applied to the heating source 20 may be determined so that the output of the heating source 20 is the output of the heating source 20 calculated by the heating intensity calculation unit 230. Therefore, the amount of power applied to the heating source 20 may be determined according to the output of the heating source 20 calculated by the heating intensity calculation unit 230. The amount of applied power determined in this manner may be set in the power setting unit 113 to heat (or heat-treat) the substrate 21 using the output of the heating source 20 calculated by the heating intensity calculation unit 230.

[0088] At the same time, the heat treatment system 200 of the present invention may also include a chamber 240 having an internal space for performing heat treatment, a gas supply unit 250 arranged on one side of the chamber 240 to supply process gas, and an exhaust unit 260 arranged on the other side of the chamber 240 opposite to the gas supply unit 250 and exhausting residual gas from the chamber 240.

[0089] The chamber 240 may have an inner space for performing heat treatment, may define a processing space, and may form a process atmosphere. For example, a window made of quartz may be formed on an upper surface of the chamber 240, and the heat source 20 may be disposed on the window.

[0090] The gas supply unit 250 may be disposed at one side of the chamber 240 and may supply a process gas. Here, the gas supply unit 250 may supply the process gas at a temperature lower than the temperature of the heat treatment process, and may supply the process gas to the inner space of the chamber 240 (i.e., the space between the chamber window and the substrate) when the heat treatment process is performed. In this case, the process gas may be supplied to the inner space of the chamber 240 to react on the substrate 21, and the residual gas remaining after the reaction may be exhausted (or discharged) through the exhaust unit 260.

[0091] The exhaust unit 260 may be disposed at the other side of the chamber 240 opposite to the gas supply unit 250, and may exhaust the residual gas in the chamber 240. Here, the exhaust hole of the exhaust unit 260 may face the injection port of the gas supply unit 250, and a linear airflow may be formed by the injection port of the gas supply unit 250 and the exhaust hole of the exhaust unit 260 facing each other. For example, the residual gas may be exhausted through the exhaust hole of the exhaust unit 260 in the chamber 240 through the exhaust port connected to a vacuum pump (not shown).

[0092] In addition, the thermal processing system 200 of the present disclosure may further include a rotating support member 270 that rotates the substrate support member 210 .

[0093] The rotating support member 270 may rotate the substrate support member 210, may include a support ring 271 that supports an edge ring, and may rotate the supported edge ring. The support ring 271 may support the edge ring and may have an annular or cylindrical shape, and the edge ring may be supported while surrounding the support ring 271. For example, the support ring 271 may be made of quartz and may be coated with silicon (or silicon) as a shielding material to block radiation from the heating source 20 that may interfere with the temperature measurement of the substrate 21, thereby making the support ring 271 opaque within the frequency range of the temperature measurement sensor (e.g., the frequency range of the thermocouple).

[0094] In addition, the rotating support member 270 can rotate the supported edge ring to rotate the substrate 21, and can also raise (or vertically move) the edge ring and / or the substrate 21. For example, the rotating support member 270 can rotate the substrate 21 when performing a heat treatment process, can rotate the substrate 21 about 90 times per minute, and can rotate the edge ring by rotating the support ring 271 coupled to the driving system (not shown). Here, the rotating support member 270 may further include a bottom plate 272 supporting the support ring 271, and the driving system (not shown) may be disposed on the bottom plate 272.

[0095] Here, the process gas may be supplied in parallel to the upper surface of the substrate 21, and may be supplied in parallel to the upper surface of the substrate 21 in a lateral direction (or side) of the substrate 21, rather than being supplied perpendicularly to the upper surface of the substrate 21. By supplying such process gas, a laminar flow may be formed on the substrate 21. That is, the process gas may flow in parallel to the upper surface of the substrate 21 along a substantially flat upper surface formed by the upper surface of the edge ring and the upper surface of the substrate 21, residual gas may be exhausted through the exhaust unit 260 after the process gas reacts on the substrate 21, and a laminar flow may be formed on the substrate 21 by the flow of these gases.

[0096] Figure 4 is a flow chart of a temperature control method for a heat treatment system according to yet another embodiment of the present disclosure.

[0097] Reference Figure 4 , a temperature control method of a heat treatment system according to another embodiment of the present disclosure will be described in more detail. The overlapping contents previously described with respect to a power control device for temperature control according to one embodiment of the present disclosure and a heat treatment system according to another embodiment of the present disclosure will be omitted.

[0098] According to another embodiment of the present disclosure, a temperature control method of a heat treatment system may include: measuring the temperature of a substrate supported on a substrate supporting member (S100); calculating the output of a heating source for heating the substrate based on the measured substrate temperature (S200); setting the amount of power applied to the heating source based on the calculated heating source output (S300); and controlling the amount of power supplied to the heating source by controlling the phase of an AC power supplied from a power supply based on the set applied power amount (S400).

[0099] First, the temperature of the substrate supported on the substrate support member is measured (S100). The substrate supported on the substrate support member may be heated by a heating source for heat treatment, and the temperature of the substrate may be measured by a temperature measuring unit so as to heat the substrate to a target temperature (or according to a set temperature).

[0100] Next, the output of the heating source that heats the substrate is calculated according to the measured substrate temperature (S200). The output of the heating source that heats the substrate (e.g., energy emission intensity or radiation intensity) may be calculated according to the substrate temperature measured by the heating intensity calculation unit, and the output of the heating source that can heat the substrate to a target temperature (or set temperature) may be calculated according to the substrate temperature measured by the temperature measurement unit. When the substrate is heated with the (set) output of the heating source thus calculated, the substrate may be heat-treated (or heated) according to the set temperature (or target temperature).

[0101] Next, the amount of power applied to the heating source is set according to the calculated heating source output (S300). The amount of power applied to the heating source can be set in the power setting unit according to the calculated heating source output (e.g., energy emission intensity or radiation intensity), and the calculated (set) heating source output is transmitted to the power setting unit so that the amount of power applied to the heating source is set according to the calculated heating source output. The output of the heating source can be controlled according to the power (amount) applied (or supplied) to the heating source, and the amount of power applied to the heating source can be determined so that the output of the heating source is the heating source output calculated by the heating intensity calculation unit. Therefore, the amount of power applied to the heating source can be determined according to the calculated heating source output. The amount of applied power determined in this way is set in the power setting unit, and the substrate can be heated (or heat-treated) at the calculated heating source output.

[0102] In addition, the amount of power supplied to the heating source is controlled by controlling the phase of the AC power supplied from the power supply according to the set applied power amount (S400). The amount of power supplied to the heating source can be controlled by controlling the phase of the AC power supplied from the power supply by the power control unit, and the amount of power supplied to the heating source can be controlled by applying a phase angle control method using a thyristor such as a thyristor rectifier. Here, the power control unit can adjust (or control) the amount of power supplied to the heating source according to the set applied power amount, so that the same power (amount) as the set applied power amount can be supplied to the heating source, and the phase of the AC power supply can be controlled so that the amount of power supplied to the heating source is the set applied power amount. For example, the power control unit can control the phase of the AC power supply by changing the timing of the gate current of the gate of the thyristor rectifier applied to the input AC power supply, and in this way, the amount of power supplied to the heating source can be adjusted. Here, the power P can be the product of the voltage V and the current I, and the AC power supply can include an AC voltage and an AC current.

[0103] Here, controlling the amount of power supplied to the heating source (S400) may include a process of measuring AC power (S410) and a process of controlling the phase of the AC power by compensating for a phase angle according to a difference between the measured value of the AC power and a reference power value (S420).

[0104] The AC power supply may be measured (S410). The AC power supply may be measured by a power measurement unit connected to the power supply, the peak value or waveform of the AC power supply may be measured, and (the peak value or waveform of) the AC power supply input to the power control unit may be measured. For example, the power measurement unit may measure the AC power supply input to the thyristor rectifier, and may measure (the peak value or waveform of) the AC voltage and / or the AC current. Through these measurements, fluctuations of the AC power supply input to the power control unit (e.g., the thyristor rectifier) ​​may be detected.

[0105] In addition, the phase of the AC power supply can be controlled by compensating the phase angle α according to the difference between the measured value of the AC power supply and the reference power value (S420). The power control unit can control the phase of the AC power supply by compensating the phase angle α according to the difference between the measured value M of the AC power supply and the reference power value R. Here, the reference power value R can be the rated power (or rated voltage and / or rated current) of the heating source and / or the rated power of the external power supply, and can be the power (value) used by the heating source on average (or usually) or the power (value) supplied when connected to the external power supply. Even if the AC power is supplied from the power supply according to the reference power value R due to the replacement of the power supply or the occurrence of other unstable factors, the measured value M measured by the power measuring unit may be different, and the measured value M measured by the power measuring unit may be different from the reference power value R. In this case, the difference between the reference power (value) and the measured (value) measured by the power measuring unit may have the same period (or frequency) and different peaks or waveforms, and may have a difference in the voltage V, a difference in the current I, or a difference in both the voltage V and the current I.

[0106] When the phase of the AC power source is controlled by compensating the phase angle α according to the difference between the measured value M and the reference power value, even if the AC power source fluctuates, the required amount of power can be stably supplied to the heating source according to the demand (or required amount of power) of the heating source according to one control formula without adjusting the intensity of the AC power source. That is, there is no need to create each formula according to the connected power source, and even if the AC power supplied (or input) from the power source to the power control unit fluctuates due to the occurrence of other unstable factors during the use of the heat treatment system, etc., the required amount of power for the heating source can be supplied within the allowable range, and the substrate can be heat-treated (or heated) according to the target temperature (or set temperature).

[0107] Therefore, in the temperature control method of the heat treatment system of the present disclosure, the temperature of the substrate supported on the substrate support part is measured to calculate the output (or intensity) of the heating source according to the measured substrate temperature to heat the substrate to the target temperature, and then the amount of power applied to the heating source is set according to the calculated output of the heating source, and the phase of the AC power supplied from the power supply is controlled according to the set applied power amount, so that in the process S400 of controlling the amount of power supplied to the heating source, the phase angle is compensated according to the difference between the measured value M of the AC power obtained by measuring the AC power and the reference power value R to control the phase of the AC power, so that the amount of power supplied to the heating source can be supplied from the applied power amount within an error within an allowable range without being affected by fluctuations in the AC power. In this way, the difference between the (set) output of the heating source calculated at each time point of measuring the substrate temperature and the actual output of the heating source can be kept within the allowable range, and the substrate can be heated to a target temperature close to the substrate to be heat treated.

[0108] The process of controlling the phase of the AC power (S420) may include calculating the control phase R of the AC power from the reference power value R according to the set applied power amount. Pa The process (S421) of calculating the phase angle α using the difference between the reference power value R and the measured value of the AC power source (S422), and compensating the calculated phase angle α to the calculated control phase R Pa process (S423).

[0109] The control phase R of the AC power supply can be calculated from the reference power value R according to the set applied power amount Pa (S421) The control phase R of the AC power source can be calculated from the reference power value R according to the set applied power amount by the phase calculation unit. Pa Here, the set applied power amount may be the power amount required by the heating source. The control phase R of the AC power source calculated from the reference power value R Pa It can be the control phase R before the phase angle α compensation Pa , and can be obtained by dividing the cycle of the AC power supply in a certain ratio in the waveform of the reference power according to the applied power amount. For example, the phase calculation unit can calculate the control phase R of the AC power supply in proportion to the applied power amount. Pa When the amount of applied power increases, the control phase R of the AC power supply Pa It may also increase when the amount of applied power decreases, the control phase R of the AC power supply Pa It may also decrease.

[0110] Next, the phase angle α can be calculated using the difference between the reference power value R and the measured value M of the AC power source (S422). The phase angle compensation unit can calculate the phase angle α from the difference between the reference power value R and the measured value M measured by the power measurement unit 120, and by calculating the phase angle α, the control phase R calculated by the phase calculation unit 111 can be compensated with the phase angle α. Pa .

[0111] In addition, the calculated control phase R Pa The calculated phase angle α can be used for compensation (S423). The controlled phase M after compensation Pa The control phase R can be calculated by the phase calculation unit Pa In this way, no matter how the AC power source fluctuates, the power (amount) that matches the applied power amount can be supplied to the heating source within the error within the allowable range.

[0112] In the process of calculating the phase angle S422, the phase angle may be calculated in proportion to the difference between the measured value of the AC power and the reference power value. The phase angle compensation unit may calculate the phase angle α in proportion to the difference between the reference power value R and the measured value M of the AC power. For example, when the difference between the peak value of the reference power and the peak value of the measured AC power is large, a larger phase angle α may be used for compensation to compensate for the larger power difference, so that the amount of power obtained by applying the phase angle control PAC to the measured AC power is equal to the amount of power obtained by using the calculated control phase R Pa Conversely, when the difference between the peak value of the reference power and the peak value of the measured AC power is small, a smaller angle α can be used to compensate for the smaller power difference, so that the amount of power obtained by applying phase angle control PAC to the measured AC power is equal to the amount of power obtained by using the calculated control phase R Pa Controls the amount of power drawn from the reference power.

[0113] By calculating the phase angle α in this way and applying the calculated control phase R Pa By compensating the phase angle α, the compensated control phase M can be obtained. Pa , and by using the compensated control phase M Pa The amount of power obtained by controlling the measured AC source may be equal to the control phase R calculated by using Pa Controls the amount of power drawn from the reference power.

[0114] The process of compensating the calculated phase angle (S423) may include a process of adding the calculated phase angle to the calculated control phase when the value obtained by subtracting the measured value of the AC power supply from the reference power value is a positive number (S423a), and a process of subtracting the calculated phase angle from the calculated control phase when the value obtained by subtracting the measured value of the AC power supply from the reference power value is a negative number (S423b).

[0115] When the value obtained by subtracting the measured value of the AC power from the reference power value is positive, the calculated phase angle may be added to the calculated control phase (S423a). When the value obtained by subtracting the measured value M of the measured AC power from the reference power value R is positive, the reference power value R is greater than the measured value M measured by the power measuring unit 120, and therefore, when the reference power and the measured power are calculated in the same manner as above, the phase angle may be added to the calculated control phase (S423a). Pa When controlling, the control phase R is calculated by Pa The amount of power obtained by controlling the reference power becomes greater than the control phase R calculated by Pa Therefore, in order to increase the amount of power obtained by applying phase angle control (PAC) to the measured AC power, so that it is equal to that obtained by controlling the phase R calculated by Pa The same amount of power is obtained by controlling the reference power, and the phase angle α may be added to the calculated control phase R Pa , so that the controlled phase M after compensation Pa Greater than the calculated control phase R Pa .

[0116] In addition, when the value obtained by subtracting the measured value of the AC power source from the reference power value is negative, the calculated phase angle may be subtracted from the calculated control phase (S423b). When the value obtained by subtracting the measured value M of the AC power source measured from the reference power value R is negative, the reference power value R is smaller than the measured value M of the AC power source, and therefore, when the reference power and the measured power are subtracted from the calculated control phase R in the same manner as described above, Pa When controlling, the control phase R is calculated by Pa The amount of power obtained by controlling the reference power becomes smaller than the control phase R calculated by Pa Therefore, in order to reduce the amount of power obtained by applying phase angle control (PAC) to the measured power of the AC power source, so that it is consistent with the amount of power obtained by controlling the phase angle R calculated by Pa The same amount of power is obtained by controlling the reference power, and the phase angle α may be obtained from the calculated control phase R Pa Subtracted from the compensation, the control phase M Pa Less than the calculated control phase R Pa .

[0117] The power supply may supply three-phase AC power. In the process S420 of controlling the phase of the AC power, the phase of each phase of the AC power may be controlled separately by compensating the phase angle of each phase according to the difference between the measured value of the AC power measured for each phase of the AC power and the reference power value. The power supply may supply three-phase AC power, and the three-phase AC power may have different peak values ​​between each phase, etc. The difference from the reference power value R may vary depending on which phase of the AC power is being supplied.

[0118] In the conventional method, when all three-phase AC power is used, since AC power with different peak values ​​is supplied with a phase difference and fluctuation of the AC power occurs in real time (or for each of the three phases), it is impossible to create a new formula even when the heat treatment system, etc. is initially set up. In addition, when a single-phase AC power is used by selecting any one of the three-phase AC power, a new formula can be created. However, depending on which phase of the three phases is selected, a problem arises that a new formula must be created each time.

[0119] However, in the present disclosure, the AC power input to the power control unit is measured in real time (or at regular intervals) by a power measuring unit, and compensation may be performed with a phase angle α based on the difference between the measured value M of the AC power and the reference power value R, so as to (always) supply the heating source with an amount of power within a tolerance range of the applied power amount, and the reliability of the heat treatment can be improved.

[0120] For example, in the process S410 of measuring the AC power, the AC power of each phase may be measured by the power measuring unit. In the process S420 of controlling the phase of the AC power, the phase of each phase of the AC power may be controlled by respectively compensating the phase angle α of each phase of the AC power according to the difference between the reference power value R and the measured value M of the AC power measured for each phase of the AC power through the power control unit. The power measuring unit may measure the AC power of each phase, and may measure the AC power input to the power control unit in real time.

[0121] In addition, the power control unit may control the phase of each phase of the AC power supply separately by compensating the phase angle α of each phase according to the difference between the reference power value R and the measured value M of the AC power supply. Since the peak values, etc. between the three-phase AC power supplies are different, the difference from the reference power value R may vary depending on which phase of the AC power supply is supplied, and the phase of each phase of the AC power supply may be controlled by compensating the phase angle α of each phase of the AC power supply according to the difference between the reference power value R and the measured value M of the AC power supply. Accordingly, even when all three-phase AC power supplies are used, by compensating the phase angle α of each AC power supply of each phase according to the difference between the measured value M of the AC power supply and the reference power value R, it is possible to (always) supply the heating source with a power amount within the tolerance range of the applied power amount.

[0122] As described above, in the present disclosure, the AC power supplied from the power supply is measured by a power measuring unit, and the phase angle is compensated according to the difference between the reference power value and the measured value to perform phase control of the AC power supply, so that the required amount of power can be stably supplied to the heating source according to the demand of the heating source, and regardless of the fluctuation of the AC power input to the power control unit, the required amount of power can be supplied to the heating source within the tolerance range. When such a power control device is used in a heat treatment system, the output of the heating source for heating the substrate can be controlled according to the temperature of the substrate, and the required amount of power can be stably provided to the heating source according to the required (set) output of the heating source, and even if the AC power input to the power control unit fluctuates, the difference between the required output of the heating source at each time point and the actual output of the heating source can be kept within the allowable range, and the substrate can be heated to a target temperature close to (or similar to) the substrate. Therefore, the reliability of substrate heat treatment can be improved. Furthermore, in the process of measuring the temperature of a substrate supported on a substrate support member, calculating the output of a heating source for heating the substrate to a target temperature based on the measured temperature of the substrate, setting the amount of applied power to the heating source based on the calculated output of the heating source, and controlling the amount of power supplied to the heating source by controlling the phase of an AC power supplied from a power source based on the set amount of applied power, while controlling the temperature of the heat treatment system, it is possible to control the phase of the AC power source by compensating the phase angle based on the difference between the measured value of the AC power source and a reference power value, so that the amount of power supplied to the heating source may be supplied with an error within an allowable range of the amount of applied power without being affected by fluctuations in the AC power source. In this way, the difference between the calculated output of the heating source at each time point of measuring the temperature of the substrate and the actual output of the heating source can be kept within an allowable range, and the substrate can be heated to a temperature close to the target temperature of the substrate to be heat-treated.

[0123] The power control device for temperature control according to one embodiment of the present disclosure measures the AC power supplied from the power supply through the power measuring unit, and compensates the phase angle according to the difference between the reference power value and the measured value to perform phase control of the AC power, so that the required power amount can be stably supplied to the heating source according to the demand (or required power amount) of the heating source. That is, regardless of the fluctuation of the AC power input to the power control unit, the required power amount can be supplied to the heating source within the tolerance range.

[0124] A heat treatment system including the power control device can stably supply the required amount of power to the heating source according to the required (set) output of the heating source while controlling the output of the heating source for heating the substrate according to the temperature of the substrate. In this way, even if there is a fluctuation in the AC power input to the power control unit, the difference between the (set) output of the heating source required at each time point (or period) and the actual output of the heating source can be kept within an allowable range, and the substrate can be heated to a temperature close to (or similar to) the target temperature of the substrate, thereby improving the reliability of the heat treatment of the substrate.

[0125] Furthermore, in the temperature control method of the heat treatment system of the present disclosure, in the process of measuring the temperature of the substrate supported on the substrate support member, calculating the output of the heating source according to the measured substrate temperature to heat the substrate to a target temperature, setting the amount of power applied to the heating source according to the calculated output of the heating source, and controlling the amount of power supplied to the heating source by controlling the phase of the AC power supplied from the power source according to the set applied power amount, the phase of the AC power is controlled by compensating the phase angle according to the difference between the measured value of the AC power and the reference power value, so that the amount of power can be supplied to the heating source from the applied power amount in a manner that the error is within an allowable range regardless of the fluctuation of the AC power. In this way, the difference between the calculated output of the heating source at each time point of measuring the substrate temperature and the actual output of the heating source can be kept within the allowable range, and the substrate can be heated to a target temperature close to the substrate to be heat-treated.

[0126] Although the power control device for temperature control, the heat treatment system having the device, and the temperature control method of the heat treatment system have been described with reference to specific embodiments, they are not limited thereto. Therefore, it will be readily understood by those skilled in the art that various modifications and changes may be made thereto without departing from the spirit and scope of the invention as defined by the appended claims.

Claims

1. A power control device for temperature control, characterized in that: include: a power control unit configured to control the amount of power supplied to the heating source by controlling the phase of the AC power supplied from the power source; as well as a power measurement unit connected to the power supply and configured to measure the AC power, The power control unit compensates for the phase angle according to the difference between the reference power value and the measured value measured by the power measurement unit, thereby controlling the phase of the AC power supply.

2. The power control device according to claim 1, wherein: The power control unit comprises: a phase calculation unit configured to calculate a control phase of the AC power source from the reference power value according to the amount of power applied to the heating source, and The phase angle compensation unit is configured to calculate the phase angle from the difference between the reference power value and the measurement value measured by the power measurement unit, and perform phase angle compensation on the control phase calculated by the phase calculation unit.

3. The power control device according to claim 2, wherein: The power control unit further includes a power setting unit configured to set the amount of power applied according to an output of the heating source.

4. The power control device according to claim 2, wherein: The phase angle compensation unit is configured to calculate the phase angle in proportion to a difference between the reference power value and a measurement value measured by the power measurement unit.

5. The power control device according to claim 4, wherein: The phase angle compensation unit is configured as When the difference between the reference power value and the measured value measured by the power measuring unit is a positive number, adding the phase angle to the control phase calculated by the phase calculating unit, and When the difference between the reference power value and the measurement value measured by the power measuring unit is a negative number, the phase angle is subtracted from the control phase calculated by the phase calculating unit.

6. The power control device according to claim 1, wherein: The power supply is configured to supply three-phase AC power.

7. The power control device according to claim 6, wherein: The power measurement unit is configured to measure the AC power of each phase, and The power control unit is configured to perform phase angle compensation on the AC power of each phase according to the difference between the reference power value and the measured value measured by the power measurement unit, thereby controlling the phase of the AC power of each phase.

8. A heat treatment system, characterized in that: include: A power control device for temperature control as claimed in any one of claims 1 to 7; a substrate support member disposed at a position opposite to the heating source and configured to support a substrate; a temperature measuring unit configured to measure the temperature of the substrate; as well as A heating intensity calculation unit is configured to calculate the output of the heating source according to the temperature of the substrate.

9. The heat treatment system according to claim 8, wherein: The heating source includes a plurality of lamps.

10. The heat treatment system according to claim 8, wherein: The amount of power applied to the heating source is determined according to the output of the heating source calculated by the heating intensity calculation unit.

11. A temperature control method for a heat treatment system, characterized in that: include: measuring a temperature of a substrate supported on a substrate support; calculating an output of a heating source for heating the substrate based on the measured temperature of the substrate; setting an amount of power applied to the heating source based on the calculated output of the heating source; as well as controlling the amount of power supplied to the heating source by controlling the phase of the AC power supplied from the power source according to the set amount of power applied, Wherein, controlling the amount of power supplied to the heating source comprises: the process of measuring said AC power supply, and The process of controlling the phase of the AC power source by compensating the phase angle according to the difference between the measured value of the AC power source and the reference power value.

12. The temperature control method according to claim 11, wherein: The process of controlling the phase of the AC power source includes: a process of calculating the control phase of the AC power source from the reference power value according to the set applied power amount, a process of calculating the phase angle using the difference between the reference power value and the measured value of the AC power source, and The process of compensating the calculated control phase with the calculated phase angle.

13. The temperature control method according to claim 12, wherein In the process of calculating the phase angle, the phase angle is calculated in proportion to the difference between the measured value of the AC power source and the reference power value.

14. The temperature control method according to claim 13, wherein: The process of compensating the calculated phase angle includes: When the value obtained by subtracting the measured value of the AC power source from the reference power value is positive, adding the calculated phase angle to the calculated control phase, and The process of subtracting the calculated phase angle from the calculated control phase when a value obtained by subtracting the measured value of the AC power source from the reference power value is a negative number.

15. The temperature control method according to claim 11, wherein the power supply is configured to supply a three-phase AC power supply, and In controlling the phase of the AC power, the phase of each phase of the AC power is controlled respectively by respectively compensating the phase angle according to a difference between a measured value of the AC power measured for each phase and the reference power value.

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