Auxiliary positioning device and auxiliary positioning method for shield

Abstract

The invention provides an auxiliary positioning device for a shield, which comprises a base used for being fixed on a reference workpiece, a radial distance measuring unit and a height adjusting unit are arranged on the base, the radial distance measuring unit comprises a bearing surface and a positioning surface perpendicular to the bearing surface, the bearing surface can move on the base along the radial direction, and the height adjusting unit is arranged on the positioning surface. The height adjusting unit comprises a fixing block and a positioning block, the fixing block can move on the base in the radial direction, and the positioning block can vertically move along the fixing block; wherein within the radial movement range of the bearing surface, the positioning surface can be attached to the top periphery of the shield ring structure to measure the radial distance of the shield, and the fixing block can abut against the top periphery of the shield ring structure within the radial movement range of the fixing block and enable the positioning block to be attached to the shield. Therefore, the target height of the shield is set.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor cleaning equipment, and in particular to an auxiliary positioning device and an auxiliary positioning method for a shield. Background Art

[0002] As semiconductor devices develop towards higher integration and smaller size, the requirements for the cleanliness of substrates such as wafer surfaces are increasing during the semiconductor manufacturing process.

[0003] Depending on the cleaning medium, semiconductor cleaning technology is mainly divided into two process routes: wet cleaning and dry cleaning. At present, substrate cleaning is mainly based on wet cleaning process. Wet cleaning is a technology that uses specific chemical liquids and deionized water to clean the surface of the wafer without damage according to different process requirements to remove particles, organic matter, inorganic matter, metal ions and other impurities on the surface of the wafer. Wet cleaning is divided into single-wafer cleaning and tank cleaning. In the single-wafer cleaning equipment, only one wafer is cleaned at a time in each cleaning chamber. Compared with the tank cleaning equipment, it has higher process environment control ability and particle removal ability, which can effectively solve the problem of cross-contamination between wafers. In addition, the single-wafer cleaning equipment can also process the chemical liquid after cleaning through the cleaning liquid recovery component to achieve a higher chemical liquid recycling rate.

[0004] See also Figure 1 , discloses a schematic diagram of the cavity structure of a single-wafer cleaning device in the prior art. The cavity of the single-wafer cleaning device includes a cleaning liquid recovery component 100, a lifting module 200, a spray device 300, a chuck 600 and a rotating shaft 700. The rotating shaft 700 drives the chuck 600 to rotate, and the chuck 600 adsorbs and supports the wafer 400. The cleaning liquid recovery component 100 is a structure for recovering the cleaning liquid sprayed on the surface of the wafer to complete the process. After the cleaning liquid enters the processing module 130 of the component 100, it can be recycled by a pump 131 or discharged by a drain pipe 132. In addition, the cleaning liquid recovery component 100 can prevent liquid splashing, and cooperate with the bottom cavity to provide a complete airflow cycle for the process cleaning process and reduce particle residue. The cleaning liquid is usually recovered by a composite cavity 120 structure formed by multiple layers of conical rings (i.e., shields 110), and different layers of shields 110 process different chemical liquids. To meet the airflow circulation requirements of each composite cavity 120, each layer of shield 110 has a certain design size relative to the assembly position of the wafer 400. However, the shield 110 has large parts and a hollow structure, so there will be an error between the actual size of the assembly and the design size.

[0005] The shield 110 has a multi-layer conical ring structure. In order to meet the airflow circulation requirements of each cavity 120, each layer of the shield 110 needs to be installed at a set position. In other words, for different layers of ring structures, there are requirements for the radial distance and axial distance of the top circumference relative to the wafer 400, and there are requirements for the concentricity and horizontality of the top circumference of the ring structure on the same layer. However, how to achieve multi-level and multi-angle measurement, and measure the radial distance and axial distance at the same time, and improve the measurement efficiency, has become a problem to be solved urgently. Summary of the invention

[0006] To achieve the above-mentioned purpose and other related purposes, the present invention provides an auxiliary positioning device for a shield, comprising a base for fixing to a reference workpiece, the base being provided with a radial distance measuring unit and a height adjustment unit, the radial distance measuring unit comprising a bearing surface and a positioning surface perpendicular to the bearing surface, the bearing surface being able to move radially on the base, the height adjustment unit comprising a fixed block and a positioning block, the fixed block being able to move radially on the base, and the positioning block being able to move vertically along the fixed block;

[0007] Among them, within the radial movement range of the bearing surface, the positioning surface can fit the top circumference of the shield ring structure to measure the radial distance of the shield, and the fixing block can resist the top circumference of the shield ring structure within its radial movement range and make the positioning block fit with the shield to set the target height of the shield.

[0008] Furthermore, the reference workpiece is a chuck or a rotating shaft.

[0009] Furthermore, a boss is provided at the bottom of the base, and the inner diameter of the boss is the same as the outer diameter of the reference workpiece.

[0010] Furthermore, the positioning block and the fixing block are respectively provided with scale lines and corresponding scales to set the target height of the shield.

[0011] Furthermore, the bearing surface and the base are respectively provided with scale lines and corresponding scales to measure the radial distance of the shield.

[0012] Furthermore, the positioning surface is a curved surface.

[0013] Furthermore, the bottom surface of the positioning block extends outwardly to form a supporting surface.

[0014] Furthermore, there are multiple radial distance measuring units, which are evenly distributed on the base along the circumferential direction.

[0015] Furthermore, a mark for marking direction is provided at the center of the base.

[0016] The present invention also provides an auxiliary positioning method, comprising:

[0017] Fix the auxiliary positioning device to the reference workpiece, install the shield on the lifting module and adjust it to be consistent with the height of the auxiliary positioning device;

[0018] The radial distance measuring unit is radially moved to fit the top circumference of the shield ring structure, and the value on the radial distance measuring unit is read as the radial distance of the shield;

[0019] Use the lifting module to adjust the shield to the target height;

[0020] The height adjustment unit is radially moved until the positioning block abuts against the top circumference of the shield ring structure, and the value on the height adjustment unit is read as the shield height.

[0021] Furthermore, before the lifting module adjusts the shield to the target height, the height adjustment unit is radially moved to the top circumference of the supporting surface supporting the shield ring structure.

[0022] Furthermore, when the shield is a multi-layer structure, auxiliary positioning is performed on each layer of the shield in sequence from high to low.

[0023] Further, when there are multiple radial distance measuring units, multiple radial distances of the shield are measured.

[0024] The invention provides an auxiliary positioning device and an auxiliary positioning method for the assembly position of a shield structure, which can complete the concentricity detection, processing parameter measurement and assembly positioning of the shield at one time, and the installation is also completed synchronously after the measurement is completed. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 A schematic diagram of the cavity structure of a single-wafer cleaning device in the prior art is disclosed;

[0026] Figure 2 A schematic structural diagram of an auxiliary positioning device for a shield in one embodiment of the present invention is disclosed;

[0027] Figure 3 A schematic structural diagram of a radial distance measuring unit of an auxiliary positioning device for a shield in one embodiment of the present invention is disclosed;

[0028] Figure 4 A schematic structural diagram of a distance measuring unit of an auxiliary positioning device for a shield in one embodiment of the present invention is disclosed;

[0029] Figure 5 A schematic top view of an auxiliary positioning device for a shield having six radial auxiliary positioning members in one embodiment of the present invention is disclosed.

[0030] Figures 6A-6F A method for assisting the positioning of a shield using an auxiliary positioning device in one embodiment of the present invention is disclosed. DETAILED DESCRIPTION

[0031] The following describes the embodiments of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention.

[0032] In the description of the present invention, it should be noted that, unless otherwise specified, "plurality" means two or more than two; the terms "upper", "lower", "inner", "outer", etc., indicating the orientation or positional relationship, are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0033] See also Figure 1 Since the shield 110 is a conical ring structure, in order to measure whether each layer of the shield 110 is installed in place, the radial distance D between the top circumference of the ring structure and the center of the wafer is selected based on the wafer. i and the axial distance H between the top periphery and the wafer surface i As a measurement and positioning parameter (where i represents the number of layers of the shield 110). Figure 1 The protective cover 110 of the cleaning liquid recovery assembly 100 shown in the figure has three layers, which are the first protective cover, the second protective cover, and the third protective cover from bottom to top, based on the wafer 400. The radial distances between one or more positions to be tested on the top circumference of different rings of the protective cover 110 and the center of the wafer 400 are D 1 , D 2 and D 3 The axial distances between one or more locations to be measured on the top circumference of different rings and the surface of the wafer 400 are H 1 , H 2 and H 3 .

[0034] Figures 1 to 5An auxiliary positioning device 500 for a shield for detecting the assembly position of a shield 110 structure provided in a specific embodiment of the present invention is disclosed. Since the position of the shield from the wafer cannot be directly measured, the auxiliary positioning device 500 for the shield is coaxially placed on a reference workpiece to detect the installation position of the shield 110 relative to the reference workpiece, thereby verifying the accuracy of the assembly of the shield 110. In order to prevent the introduction of new particles to contaminate the wafer during the measurement process, the reference workpiece can select a chuck 600 or a rotating shaft 700 coaxial with the wafer 400, thereby achieving indirect measurement of the radial distance and axial distance between the wafer 400 and the shield 110.

[0035] See also Figure 2 In a specific embodiment of the present invention, an auxiliary positioning device 500 for a shield is provided, comprising a base 510, a radial distance measuring unit 520 and a height adjustment unit 530 arranged on the base 510. Preferably, there can be a plurality of radial distance measuring units 520, which are evenly distributed on the base 510. In order to better adapt to the shapes of the wafer and the chuck and eliminate the error of distance measurement in the radial direction, the shape of the base 510 is circular, and when installed, the center of the base 510 coincides with the center of the reference workpiece in the vertical direction. The radial distance measuring units 520 are evenly distributed on the base 510 along the circumferential direction. In a specific embodiment, the reference workpiece is a chuck 600, and a boss 511 is arranged at the bottom of the base 510, and the inner diameter of the boss 511 is the same as the outer diameter of the chuck 600. The chuck 600 can be engaged in the boss 511, so that the auxiliary positioning device 500 for the shield is stably installed on the chuck 600, and the auxiliary positioning device 500 for the shield is prevented from offsetting or slipping during the auxiliary positioning process. The boss 511 may be a whole annular boss, or may be composed of a plurality of protrusions distributed on the base 510. The present invention does not limit the shape of the boss 511, as long as the inner periphery of the boss 511 can be engaged with the outer periphery of the chuck 600. In another specific embodiment, the reference workpiece is a rotating shaft 700, the inner diameter of the boss 511 on the base 510 is the same as the outer diameter of the rotating shaft 700, and the base 510 is fixed to the rotating shaft 700 for auxiliary positioning.

[0036] The radial distance measuring unit 520 and the height adjustment unit 530 can be used to measure the radial distance D between the top circumference of the ring structure of the shield 110 and the reference workpiece. i (hereinafter referred to as the shield radial distance D i ) and adjusting the height of the top periphery of the ring structure of the shield 110 (hereinafter referred to as the shield height) to the target height H i . Figure 3The structure diagram of the radial distance measuring unit 520 of the auxiliary positioning device 500 for the shield in a specific embodiment of the present invention is shown. The radial distance measuring unit 520 includes a bearing surface 521 and a positioning surface 522 perpendicular to the bearing surface 521. A first guide hole 523 is provided on the bearing surface 521, and a first screw 524 passes through the first guide hole 523 to fix the radial distance measuring unit 520 on the base 510. In one example, the first guide hole 523 is a long strip waist hole, which is convenient for adjusting the position of the radial distance measuring unit 520 on the base 510. When measuring the top circumference position of the shield 110, it is necessary to fit the positioning surface 522 with the top circumference edge. Therefore, within the radial movement range of the bearing surface 521, the positioning surface 522 can reach the position of fitting the top circumference of the ring of the shield 110 in the radial direction, that is, the length of the first guide hole 523 on the bearing surface 521 is set to be long enough. Further, the positioning surface 522 is an arc surface, which is adapted to the ring structure of the top circumference of the shield 110. A first marking line 525 is also provided on the bearing surface 521 of the radial distance measuring unit 520 , and a first scale line 526 matching the first marking line 525 is provided on the base 510 for reading the scale value of the radial distance of the shield.

[0037] See also Figure 4 , discloses a schematic diagram of the structure of a height adjustment unit 530 in a specific embodiment of the present invention, wherein the height adjustment unit 530 includes an L-shaped fixing block 531 and a positioning block 532. A second groove 513 is provided on the base 510 for the fixing block 531 to move in the radial direction of the base 510, a second guide hole 5312 is provided in the second groove 513, a screw hole matching with a second screw 5311 is provided on the horizontal portion of the fixing block 531, and the second screw 5311 fixes the fixing block 531 to the base 510 through the screw hole of the fixing block 531 and the second guide hole 5312 on the base 510. The vertical part of the positioning block 532 is provided with a screw hole matched with the third screw 5321, and the vertical part of the fixed block 531 is provided with a third guide hole 5322 in the shape of an elongated strip extending in the vertical direction. The third screw 5321 fixes the positioning block 532 to the fixed block 531 through the third guide hole 5322 of the fixed block 531 and the screw hole of the positioning block 532. After the third screw 5321 is loosened, the positioning block 532 can move up and down along the fixed block 531. The positioning block 532 is also provided with a second marking line 5323, and the fixed block 531 is provided with a second scale line 5313 matching the second marking line 5321 for reading the scale value of the shield height. Preferably, the bottom of the positioning block 532 extends a supporting surface 5324 in the horizontal direction for supporting the top circumference of the ring structure of the shield 110.

[0038] See also Figure 1The lifting module 200 can adjust the height of the shield 110 relative to the reference workpiece and the auxiliary positioning device 500 for the shield. When the height of the shield 110 measured by the auxiliary positioning device 500 for the shield does not meet the preset height, the lifting module 200 is required to adjust the height of the shield 100.

[0039] When using the auxiliary positioning device 500 for the shield, first use the lifting module 200 to adjust the position to be measured on the top circumference of the ring structure of the shield 110 to be consistent with the height of the auxiliary positioning device 500 for the shield, adjust the positioning surface 522 of each radial distance measuring unit 520 to fit the top circumference of the ring structure of the shield 110, and measure the value of each radial distance measuring unit 520 respectively. The measurement of multiple positions can ensure the concentricity of the shield 110. If the radial distance and concentricity meet the process requirements, the fixed block 531 is moved on the second guide hole 5312 until the positioning block 532 is against the top circumference of the ring structure of the shield 110, and the supporting surface 5324 of the positioning block 532 supports the top circumference of the ring structure of the shield 110 and then fixed. Within the radial movement range of the fixed block 531, the positioning block 532 needs to reach the position against the shield 110, so the second guide hole 5312 needs to be long enough. Then, the height of the top circumference of the ring structure of the shield 110 is adjusted to the target height H by using the height adjustment unit 530 and the lifting module 200. 1 Since the shield is a multi-layer structure, the order of measurement and auxiliary positioning is from the top layer to the bottom layer. By using the auxiliary positioning device 500 for the shield of the present invention, the concentricity detection, processing parameter measurement and assembly positioning of the shield 110 can be completed at one time.

[0040] Generally speaking, during the assembly process, in order to meet the airflow circulation requirements of each cavity 120, the radial distances between the top circumferences of the ring structures of different layers of shields 101 and the reference workpiece are equal, and the spacing between the top circumferences of the ring structures of different layers of shields 101 is equal.

[0041] like Figure 5 As shown, six radial distance measuring units 520 are evenly arranged circumferentially on the base 510, which are used to measure the radial distance between the position to be measured on the top circumference of the ring structure of the shield 101 and the reference workpiece. The test position of the radial auxiliary positioning member 530 pointed by the arrow 540 is 0°, and the test angles of the other five radial distance measuring units 520 are 60°, 120°, 180°, 240°, and 300° respectively. Similarly, multiple height adjustment units 530 can also be evenly arranged circumferentially on the base 510.

[0042] See also Figure 2, the center of the base 510 is also provided with a mark, namely an arrow 540, which is used to indicate the cyclic measurement and auxiliary positioning direction of the auxiliary positioning device 500 for the shield. The direction indicated by the arrow 540 during the first round of measurement is set as the initial position. In some specific embodiments, the initial position can point to the direction of the wafer in and out of the door (not shown in the figure), or any position can be selected as a reference. Then, the direction indicated by the arrow 540 is adjusted to an angle direction different from the initial position for cyclic measurement and positioning to ensure the uniformity of concentricity and horizontality. Further, the direction of the cyclic test is an equally divided angle of the circle to ensure the uniform distribution of the test angle and improve the accuracy and uniformity of the measurement. In addition, a more dense angle can be selected, and the angle spacing can be ensured to be uniform, further improving the accuracy of the measurement. In a specific embodiment, 30°, 90°, 150°, 210°, 270° and 330° can be selected on the basis of multiple radial distance measurement units 520 for testing and positioning in sequence. In another specific embodiment, when the reference workpiece is a rotating shaft 700, the rotating shaft 700 can automatically control the direction indicated by the arrow 540, and rotate the auxiliary positioning device 500 for the shield to different positions for cyclic measurement, thereby avoiding errors caused by manual adjustment.

[0043] Figures 6A-6F FIG. 5 is a method for assisting the positioning of the shield 110 using an auxiliary positioning device 500 of the present invention. Fig. 6A First, the auxiliary positioning device 500 is fixed on the chuck 600, and the shield 110 is installed on the lifting module 200. The lifting module 200 adjusts the position to be measured on the top circumference of the ring structure of the shield 110 to be consistent with the height of the auxiliary positioning device 500 for the shield. In other specific embodiments, the auxiliary positioning device 500 can also be fixed on the rotating shaft. Figure 6B , move the positioning surface 522 of the radial distance measuring unit 520 on the auxiliary positioning device 500 to fit the top circumference of the shield 110, read the scale of the radial distance measuring unit 520 as the radial distance of the shield 110, and judge whether it meets the process requirements. In this step, multiple radial distance measuring units 520 can be used to measure the radial distance of the shield 110 to measure whether the concentricity of the shield 110 meets the requirements. Figure 6C-6E, move the height adjustment unit 530 radially to the supporting surface 5324 to support the top circumference of the shield 110, and then the lifting module 200 adjusts the shield 110 to the target height. In this step, the supporting surface 5324 can not only assist in supporting the shield 110, but also control the start and stop of the lifting module 200 corresponding to the scale of the height adjustment unit 530 when the lifting module 200 adjusts the height of the shield 110, so that the height adjustment of the shield 110 is more precise. After the shield reaches the target height, adjust the height adjustment unit 530 until the supporting surface 5324 is flush with the outer peripheral edge of the shield 110, and read the height value of the shield 110 for verification. If the height of the shield 110 meets the process requirements, the positioning is successful. If the height of the shield 110 does not meet the process requirements, readjust the shield 110 to the target height. Fig. 6F As shown, when assisting in positioning the multi-layer shield 110 structure, each layer of the shield is measured and positioned in sequence from the highest layer to the lowest layer.

[0044] In summary, the present invention has specifically and thoroughly disclosed the relevant technology through the above-mentioned implementation modes and related drawings, so that those skilled in the art can implement it accordingly. The above-mentioned embodiments are only used to illustrate the present invention, not to limit the present invention. The scope of rights of the present invention shall be defined by the claims of the present invention. As for the change of the number of elements described herein or the replacement of equivalent elements, etc., they shall still fall within the scope of rights of the present invention.

Claims

1. An auxiliary positioning device for a shield, characterized in that: The invention comprises a base for fixing to a reference workpiece, wherein the base is provided with a radial distance measuring unit and a height adjustment unit, wherein the radial distance measuring unit comprises a bearing surface and a positioning surface perpendicular to the bearing surface, wherein the bearing surface can move radially on the base, and wherein the height adjustment unit comprises a fixed block and a positioning block, wherein the fixed block can move radially on the base, and wherein the positioning block can move vertically along the fixed block; Among them, within the radial movement range of the bearing surface, the positioning surface can fit the top circumference of the shield ring structure to measure the radial distance of the shield, and the fixing block can resist the top circumference of the shield ring structure within its radial movement range and make the positioning block fit with the shield to set the target height of the shield.

2. The auxiliary positioning device for the shield according to claim 1, characterized in that: The reference workpiece is a chuck or a rotating shaft.

3. The auxiliary positioning device for the shield according to claim 1, characterized in that: A boss is provided at the bottom of the base, and the inner diameter of the boss is the same as the outer diameter of the reference workpiece.

4. The auxiliary positioning device for the shield according to claim 1, characterized in that: The positioning block and the fixing block are respectively provided with scale lines and corresponding scales to set the target height of the shield.

5. The auxiliary positioning device for the shield according to claim 1, characterized in that: The bearing surface and the base are respectively provided with scale lines and corresponding scales to measure the radial distance of the shield.

6. The auxiliary positioning device for the shield according to claim 1, characterized in that: The positioning surface is a cambered surface.

7. The auxiliary positioning device for the shield according to claim 1, characterized in that: The bottom surface of the positioning block extends outwardly to form a supporting surface.

8. The auxiliary positioning device for the shield according to claim 1, characterized in that: There are multiple radial distance measuring units, which are evenly distributed on the base along the circumferential direction.

9. The auxiliary positioning device for the shield according to claim 1, characterized in that: A mark for marking direction is also provided at the center of the base.

10. An auxiliary positioning method using the auxiliary positioning device for a shield according to any one of claims 1 to 9, characterized in that: include: Fix the auxiliary positioning device to the reference workpiece, install the shield on the lifting module and adjust it to be consistent with the height of the auxiliary positioning device; The radial distance measuring unit is radially moved to fit the top circumference of the shield ring structure, and the value on the radial distance measuring unit is read as the radial distance of the shield; Use the lifting module to adjust the shield to the target height; The height adjustment unit is radially moved until the positioning block abuts against the top circumference of the shield ring structure, and the value on the height adjustment unit is read as the shield height.

11. The auxiliary positioning method according to claim 10, characterized in that: Before the lifting module adjusts the shield to the target height, the height adjustment unit is radially moved to the top circumference of the supporting surface supporting the shield ring structure.

12. The auxiliary positioning method according to claim 10, characterized in that: When the shield is a multi-layer structure, each layer of the shield is assisted in positioning in order from high to low.

13. The auxiliary positioning method according to claim 10, characterized in that: When there are multiple radial distance measuring units, multiple radial distances of the shield are measured.

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