Device and method for measuring PH value of aluminum oxide polishing solution of semiconductor gallium oxide
CN119595625AActive Publication Date: 2025-03-11MEI KE RUI (JIANG SU) XIAN JIN CAI LIAO KE JI YOU XIAN GONG SI
Patent Information
- Application Number
- CN202411935376.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-26
- Publication Date
- 2025-03-11
- Estimated Expiration
- 2044-12-26
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Figure CN119595625A_ABST
Abstract
The invention discloses equipment and a method for measuring the PH value of an aluminum oxide polishing solution of semiconductor gallium oxide, and belongs to the technical field of PH value measurement. The device comprises a cylinder, an annular cylinder cover and an annular water storage tank fixedly mounted on the upper side of the annular cylinder cover, a layered sampling assembly is mounted in the cylinder and comprises a fixed rod fixedly mounted in the cylinder, a movable ring is slidably connected to the outer side of the fixed rod, and a plurality of storage grooves are uniformly formed in the outer side of the movable ring in the circumferential direction. In the process of measuring the PH value of the aluminum oxide polishing solution, a movable plate is moved to drive a rotating cover and a connecting ring to move, after the rotating cover and the connecting ring penetrate into the preparation solution, the rotating cover can rotate relative to the connecting ring, and under the cooperation of an opening, a small amount of the preparation solution in a cylinder sequentially enters a storage tank, so that the PH value of the aluminum oxide polishing solution is measured. Furthermore, the sampling positions are different, so that the sampling effect is good.
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Citation Information
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