Color filter structure and forming method thereof

Abstract

The invention discloses a color filter structure and a forming method thereof, and relates to the technical field of display, and the color filter structure comprises a substrate which comprises a light-transmitting area and a light-shielding area and is provided with a first side and a second side which are opposite to each other; the shading layer is located on the first side and covers the shading area; the light resistance structure is located on the first side and covers the light-transmitting area; the protection layer is located on the first side and covers the light shielding layer and the light resistance structure; the shielding layer is located on the second side; the anti-reflection layer is located on the second side, the shielding layer is located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer is located between the refractive index of the shielding layer and the refractive index of air. By additionally arranging the anti-reflection layer, the anti-reflection layer is located on the second side, the shielding layer is located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer is located between the refractive index of the shielding layer and the refractive index of air. Therefore, the transmittance of the light from the shielding layer to the air can be effectively increased, the transmittance of the color filter structure is improved, and the color brightness of the displayed image quality is further improved.

Description

Technical Field

[0001] The present invention relates to the field of display technology, and in particular to a color filter structure and a method for forming the same. Background Art

[0002] With the advancement and development of science and technology, liquid crystal displays have been widely used. Among them, thin film transistor liquid crystal displays (TFT-LCD) have gradually occupied the display field due to their low power consumption, excellent picture quality and high production yield.

[0003] The TFT-LCD is composed of two pieces of glass, with a color filter on the top and a TFT (Thin Film Transistor) on the bottom, with a layer of liquid crystal in the middle, and a complete display module with components such as polarizer, backlight and drive circuit. Among them, the color filter (CF) is a key component of the TFT-LCD, which is used to make the LCD produce color images. It is mainly composed of a transparent glass substrate, a black matrix layer (BM) and a color photoresist layer.

[0004] However, the performance of existing color filter structures needs to be further improved. Summary of the invention

[0005] The problem solved by the present invention is to provide a color filter structure and a forming method thereof, so as to improve the transmittance of the color filter structure.

[0006] To solve the above problems, the technical solution of the present invention provides a color filter structure, including: a substrate, the substrate including a light-transmitting area and a light-shielding area, the substrate having a first side and a second side opposite to each other; a light-shielding layer, the light-shielding layer is located on the first side, and the light-shielding layer covers the light-shielding area; a light-blocking structure, the light-blocking structure is located on the first side, and the light-blocking structure covers the light-transmitting area; a protective layer, the protective layer is located on the first side, and the protective layer covers the light-shielding layer and the light-blocking structure; a shielding layer, the shielding layer is located on the second side; an anti-reflection layer, the anti-reflection layer is located on the second side, the shielding layer is located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer is between the refractive index of the shielding layer and the refractive index of air.

[0007] Optionally, the light blocking structure is also located on a portion of the light shielding layer.

[0008] Optionally, the photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

[0009] Optionally, the material of the protective layer includes: polymethyl methacrylate or polyimide.

[0010] Optionally, the material of the anti-reflection layer includes: polymethyl methacrylate or polyimide.

[0011] Optionally, the material of the shielding layer includes: indium tin oxide.

[0012] Optionally, the refractive index relationship between the anti-reflection layer, the shielding layer and air is: Wherein, n1 is the refractive index of air, n2 is the refractive index of the shielding layer, and n3 is the refractive index of the anti-reflection layer.

[0013] Optionally, it further includes a plurality of support columns, wherein the support columns are located on the first side, the support columns are located on the protective layer, and the support columns correspond to the light-shielding layer.

[0014] Correspondingly, the technical solution of the present invention also provides a method for forming a color filter structure, comprising: providing a substrate, the substrate comprising a light-transmitting area and a light-shielding area, the substrate having a first side and a second side opposite to each other; forming a shielding layer on the second side; forming a light-shielding layer on the first side, the light-shielding layer covering the light-shielding area; forming a light-blocking structure on the first side, the light-blocking structure covering the light-transmitting area; forming a protective layer on the first side, the protective layer covering the light-shielding layer and the light-blocking structure; after forming the protective layer, forming an anti-reflection layer on the second side, the shielding layer being located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer being between the refractive index of the shielding layer and the refractive index of air.

[0015] Optionally, the light blocking structure is also located on a portion of the light shielding layer.

[0016] Optionally, the photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

[0017] Optionally, the refractive index relationship between the anti-reflection layer, the shielding layer and air is: Wherein, n1 is the refractive index of air, n2 is the refractive index of the shielding layer, and n3 is the refractive index of the anti-reflection layer.

[0018] Optionally, after forming the anti-reflection layer, the method further includes: forming a plurality of support columns on the first side, wherein the support columns are located on the protective layer and correspond to the light-shielding layer.

[0019] Compared with the prior art, the technical solution of the present invention has the following advantages:

[0020] In the color filter structure of the technical solution of the present invention, by adding the anti-reflection layer, the anti-reflection layer is located on the second side, and the shielding layer is located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer is between the refractive index of the shielding layer and the refractive index of air. In this way, the transmittance of light from the shielding layer to the air can be effectively increased, the transmittance of the color filter structure is improved, and the color brightness of the display quality is further improved.

[0021] Furthermore, the light blocking structure is also located on a portion of the light shielding layer. By also locating the light blocking structure on a portion of the light shielding layer, a gap between the light shielding layer and the light blocking layer is prevented, thereby preventing the problem of light leakage.

[0022] Furthermore, the refractive index relationship between the anti-reflection layer, the shielding layer and the air is: Wherein, n1 is the refractive index of air, n2 is the refractive index of the shielding layer, and n3 is the refractive index of the anti-reflection layer. When the refractive index of the anti-reflection layer is between the refractive index of the shielding layer and the refractive index of air, and the refractive index relationship among the anti-reflection layer, the shielding layer and air is: When , the reflection of light from the shielding layer to the air can be completely eliminated. At this time, the transmittance of light from the shielding layer to the air is optimal, and the corresponding color brightness of the display image quality is also optimal.

[0023] In the method for forming a color filter structure of the technical solution of the present invention, by forming the anti-reflection layer, the anti-reflection layer is located on the second side, and the shielding layer is located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer is between the refractive index of the shielding layer and the refractive index of air. In this way, the transmittance of light from the shielding layer to the air can be effectively increased, the transmittance of the color filter structure is improved, and the color brightness of the display quality is further improved.

[0024] Furthermore, the light blocking structure is also located on a portion of the light shielding layer. By also locating the light blocking structure on a portion of the light shielding layer, a gap between the light shielding layer and the light blocking layer is prevented, thereby preventing the problem of light leakage.

[0025] Furthermore, the refractive index relationship between the anti-reflection layer, the shielding layer and the air is: Wherein, n1 is the refractive index of air, n2 is the refractive index of the shielding layer, and n3 is the refractive index of the anti-reflection layer. When the refractive index of the anti-reflection layer is between the refractive index of the shielding layer and the refractive index of air, and the refractive index relationship among the anti-reflection layer, the shielding layer and air is: When , the reflection of light from the shielding layer to the air can be completely eliminated. At this time, the transmittance of light from the shielding layer to the air is optimal, and the corresponding color brightness of the display image quality is also optimal. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figures 1 to 7 It is a structural schematic diagram of each step of the method for forming a color filter structure according to an embodiment of the present invention. DETAILED DESCRIPTION

[0027] As described in the background art, the performance of the existing color filter structure needs to be improved, which will be described in detail below.

[0028] With people's continuous pursuit of display image quality, color brightness, and in order to restore the dynamic range of the natural environment as much as possible, the HDR (High Dynamic Range) standard has gradually been valued by people, and the brightness index is the core of HDR, which corresponds to the demand for improved transmittance in the color filter of liquid crystal display technology (LCD). With the popularization of intelligent devices such as mobile phones, PADs, watches, and new generation car machines, touch-type LCD display technology is becoming more and more common in daily life. In order to obtain better picture effects on touch LCDs, color filters with back-plated indium tin oxide (ITO) film layers have become a widely used filter design technology. The indium tin oxide film layer is used to shield the electrical signals between the touch area and the display area, so as to obtain the high color gamut and high transmittance advantages of IPS screens, and also ensure the sensitivity of touch.

[0029] However, the applicant has found that although the ITO film has a high visible light transmittance, its high refractive index as an inorganic gold material will still produce obvious total reflection and large-angle refraction of light at certain angles in the cross section, thereby losing transmittance.

[0030] The applicant has found that the above problem occurs because the indium tin oxide film layer, as a coating layer between the substrate and the air, has a greater refractive index than glass and air, and cannot play a role in enhancing transmittance, but instead reduces the transmittance of light.

[0031] The applicant has further discovered that according to the principle of anti-reflection, under ideal conditions, adding a film layer between two media can achieve the effect of reducing reflection and increasing transmittance if the refractive index of the new film layer is between the refractive indexes of the two layers of media.

[0032] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0033] In the description of the present invention, it should be understood that the terms "upper", "lower", "top surface", "bottom surface" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the positions or elements referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limitations of the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0034] Figures 1 to 7 It is a structural schematic diagram of each step of the method for forming a color filter structure according to an embodiment of the present invention.

[0035] Please refer to Figure 1 , providing a substrate 100, wherein the substrate 100 includes a light-transmitting area A and a light-shielding area B, and the substrate 100 has a first side 100a and a second side 100b opposite to each other.

[0036] It should be noted that, in this embodiment, the first side 100a is the front side of the substrate 100, the second side 100b is the back side of the substrate 100, the substrate 100 includes a plurality of pixel areas, each pixel area includes a plurality of light-transmitting areas A, and the light-shielding areas B are located between adjacent light-transmitting areas A. The light-transmitting areas A need to be coated with a photoresist layer on their surfaces in subsequent processes, and the light-resistance layer blocks the color light that does not need to be transmitted, and the light-transmitting areas A need to be coated with a light-shielding layer on their surfaces in subsequent processes, and the light-shielding layer prevents light crosstalk between the photoresist layers formed on adjacent light-transmitting areas A.

[0037] In this embodiment, the substrate 100 needs to be a light-transmitting substrate 100 , and specifically a glass substrate 100 may be used.

[0038] Please refer to Figure 2 , a shielding layer 101 is formed on the second side 100b.

[0039] It should be noted that, in this embodiment, the shielding layer 101 is used to shield the electrical signals of the touch area and the display area, so as to obtain the advantages of high color gamut and high transmittance of the IPS screen and ensure the sensitivity of the touch.

[0040] In this embodiment, the shielding layer 101 needs to be made of a transparent material, and specifically can be made of indium tin oxide.

[0041] In this embodiment, the shielding layer 101 is formed on the back side of the substrate 100 by using a coating process.

[0042] Please refer to Figure 3After forming the shielding layer 101, a light shielding layer 102 is formed on the first side 100a, and the light shielding layer 102 covers the light shielding area B.

[0043] In this embodiment, the material of the light shielding layer 102 is a black organic material, and the black organic material can be a black photoresist. The corresponding method for forming the light shielding layer 102 includes: forming a light shielding material layer (not shown) on the surface of the substrate 100; exposing and developing the light shielding material layer to form the light shielding layer 102 on the surface of the light shielding area B.

[0044] In other embodiments, the material of the light shielding layer may also be metal. The corresponding method for forming the light shielding layer includes: forming a light shielding material layer on the surface of the substrate; forming a patterned mask layer on the surface of the light shielding material layer; etching the light shielding material layer using the patterned mask layer as a mask to form the light shielding layer on the surface of the light shielding area.

[0045] Please refer to Figure 4 After forming the light shielding layer 102 , a light blocking structure 103 is formed on the first side 100 a , and the light blocking structure 103 covers the light-transmitting area A.

[0046] It should be noted that, in this embodiment, the light blocking structure 103 allows light to become monochromatic light after passing through the light blocking structure 103 to meet the needs of the device. The light blocking structure 103 includes a plurality of photoresist layers, and each of the light-transmitting areas A has one of the photoresist layers; the plurality of photoresist layers include a red photoresist layer 1031, a green photoresist layer 1032, and a blue photoresist layer 1033. Each pixel area has at least one of the red photoresist layers 1031, at least one of the green photoresist layers 1032, and at least one of the blue photoresist layers 1033.

[0047] In this embodiment, the material of the photoresist layer includes photoresist that transmits monochromatic light. The material of the red photoresist layer 1031 includes photoresist that transmits red light, the material of the green photoresist layer 1032 includes photoresist that transmits green light, and the material of the blue photoresist layer 1033 includes photoresist that transmits blue light.

[0048] In this embodiment, the light blocking structure 103 is also located on a portion of the light shielding layer 102. Specifically, the red light blocking layer 1031 is also located on a portion of the light shielding layer 102, the green light blocking layer 1032 is also located on a portion of the light shielding layer 102, and the blue light blocking layer 1033 is also located on a portion of the light shielding layer 102. By also locating the light blocking structure 103 on a portion of the light shielding layer 102, a gap is prevented from appearing between the light shielding layer 102 and the light blocking layer, thereby preventing the problem of light leakage.

[0049] In this embodiment, the method for forming the red photoresist layer 1031 includes: forming a red photoresist material layer (not shown) on the surface of the substrate 100 and the surface of the light-shielding layer 102; exposing and developing the red photoresist material layer to form a red photoresist layer 1031 on one of the light-transmitting areas A and a portion of the light-shielding layer 102.

[0050] In this embodiment, the method for forming the green photoresist layer 1032 includes: forming a green photoresist material layer (not shown) on the surface of the substrate 100 and the surface of the light-shielding layer 102; exposing and developing the green photoresist material layer to form the green photoresist layer 1032 on one of the light-transmitting areas A and a portion of the light-shielding layer 102.

[0051] In this embodiment, the method for forming the blue photoresist layer 1033 includes: forming a blue photoresist material layer (not shown) on the surface of the substrate 100 and the surface of the light-shielding layer 102; exposing and developing the blue photoresist material layer to form the blue photoresist layer 1033 on one of the light-transmitting areas A and a portion of the light-shielding layer 102.

[0052] It should be noted that there is no distinction in the order of manufacturing the red photoresist layer 1031 , the green photoresist layer 1032 , and the blue photoresist layer 1033 .

[0053] Please refer to Figure 5 After the light blocking structure 103 is formed, a protective layer 104 is formed on the first side 100 a , and the protective layer 104 covers the light shielding layer 102 and the light blocking structure 103 .

[0054] In this embodiment, the protective layer 104 is used to cover and protect the light-shielding layer 102 and the light-blocking structure 103. The material of the protective layer 104 needs to be a transparent material to ensure that light can penetrate and illuminate the light-blocking structure 103. The material of the protective layer 104 can specifically be polymethyl methacrylate or polyimide.

[0055] Please refer to Figure 6 After forming the protective layer 104, a transmittance-enhancing layer 105 is formed on the second side 100b, the shielding layer 101 is located between the substrate 100 and the transmittance-enhancing layer 105, and the refractive index of the transmittance-enhancing layer 105 is between the refractive index of the shielding layer 101 and the refractive index of air.

[0056] By adding the anti-reflection layer 105, the anti-reflection layer 105 is located on the second side 100b, and the shielding layer 101 is located between the substrate 100 and the anti-reflection layer 105, and the refractive index of the anti-reflection layer 105 is between the refractive index of the shielding layer 101 and the refractive index of air. In this way, the transmittance of light from the shielding layer 101 to the air can be effectively increased, the transmittance of the color filter structure is improved, and the color brightness of the display quality is further improved.

[0057] It should be noted that when the refractive index of the anti-reflection layer 105 is between the refractive index of the shielding layer 101 and the refractive index of air, and the refractive index relationship among the anti-reflection layer 105, the shielding layer 101 and air also satisfies: When , the reflection of light from the shielding layer 101 to the air can be completely eliminated. At this time, the transmittance of light from the shielding layer 101 to the air is optimal, and the color brightness of the corresponding display quality is also optimal. Wherein, n1 is the refractive index of air, n2 is the refractive index of the shielding layer 101, and n3 is the refractive index of the anti-reflection layer 105.

[0058] In this embodiment, the anti-reflection layer 105 is used to reduce light reflection between the shielding layer 101 and the air and increase light transmittance, so the anti-reflection layer 105 also needs to be a transparent material. The material of the anti-reflection layer 105 can specifically be polymethyl methacrylate or polyimide.

[0059] Please refer to Figure 7 After the anti-reflection layer 105 is formed, a plurality of support columns 106 are formed on the first side 100 a . The support columns 106 are located on the protective layer 104 , and the support columns 106 correspond to the light shielding layer 102 .

[0060] It should be noted that, in this embodiment, the support column 106 is used to support the color filter structure and the active matrix substrate after the color filter structure is used to form a liquid crystal display, so as to leave enough space for the liquid crystal layer between the color filter structure and the active matrix substrate. The purpose of the support column 106 corresponding to the light shielding layer 102 is to prevent the light from being located on the light blocking structure 103, thereby affecting the transmission of light in the light-transmitting area A.

[0061] In this embodiment, the material of the support column 106 includes an organic material, specifically, photoresist. The process of forming the support column 106 adopts an exposure and development process.

[0062] Correspondingly, a color filter structure is also provided in the embodiment of the present invention, please continue to refer to Figure 7, comprising: a substrate 100, the substrate 100 comprising a light-transmitting area A and a light-shielding area B, the substrate 100 having a first side 100a and a second side 100b opposite to each other; a light-shielding layer 102, the light-shielding layer 102 being located at the first side 100a and covering the light-shielding area B; a light-blocking structure 103, the light-blocking structure 103 being located at the first side 100a and covering the light-transmitting area A; a protective layer 104, the protective layer 105 being arranged at the first side 100a and covering the light-shielding area A; 04 is located on the first side 100a, and the protective layer 104 covers the shading layer 102 and the light blocking structure 103; the shielding layer 101, the shielding layer 101 is located on the second side 100b; the anti-reflection layer 105, the anti-reflection layer 105 is located on the second side 100b, the shielding layer 101 is located between the substrate 100 and the anti-reflection layer 105, and the refractive index of the anti-reflection layer 105 is between the refractive index of the shielding layer 101 and the refractive index of air.

[0063] By adding the anti-reflection layer 105, the anti-reflection layer 105 is located on the second side 100b, and the shielding layer 101 is located between the substrate 100 and the anti-reflection layer 105, and the refractive index of the anti-reflection layer 105 is between the refractive index of the shielding layer 101 and the refractive index of air. In this way, the transmittance of light from the shielding layer 101 to the air can be effectively increased, the transmittance of the color filter structure is improved, and the color brightness of the display quality is further improved.

[0064] In this embodiment, the light blocking structure 103 is also located on a portion of the light shielding layer 102 .

[0065] In this embodiment, the photoresist structure 103 includes a red photoresist layer 1031 , a green photoresist layer 1032 and a blue photoresist layer 1033 .

[0066] In this embodiment, the material of the protection layer 104 includes polymethyl methacrylate or polyimide.

[0067] In this embodiment, the material of the anti-reflection layer 105 includes: polymethyl methacrylate or polyimide.

[0068] In this embodiment, the material of the shielding layer 101 includes: indium tin oxide.

[0069] In this embodiment, the refractive index relationship between the anti-reflection layer 105, the shielding layer 101 and the air is: Wherein, n1 is the refractive index of air, n2 is the refractive index of the shielding layer 101, and n3 is the refractive index of the anti-reflection layer 105. When the refractive index of the anti-reflection layer 105 is between the refractive index of the shielding layer 101 and the refractive index of air, and the refractive index relationship among the anti-reflection layer 105, the shielding layer 101 and air is: When the reflection of light from the shielding layer 101 to the air is completely eliminated, the transmittance of light from the shielding layer 101 to the air is optimal, and the color brightness of the corresponding display quality is also optimal.

[0070] In this embodiment, a plurality of support columns 106 are further included. The support columns 106 are located on the first side 100 a , and the support columns 106 are located on the protection layer 104 , and the support columns 106 correspond to the light shielding layer 102 .

[0071] It should be understood that the examples and embodiments herein are merely illustrative and that various modifications and corrections may be made by those skilled in the art without departing from the spirit and scope of the present invention as defined in this application and the appended claims.

Claims

1. A color filter structure, characterized in that: include: A substrate, the substrate comprising a light-transmitting area and a light-shielding area, the substrate having a first side and a second side opposite to each other; a light shielding layer, the light shielding layer being located on the first side and covering the light shielding area; a light blocking structure, the light blocking structure being located on the first side and covering the light-transmitting area; a protective layer, the protective layer being located on the first side and covering the light shielding layer and the light blocking structure; a shielding layer, the shielding layer being located at the second side; The anti-reflection layer is located on the second side, the shielding layer is located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer is between the refractive index of the shielding layer and the refractive index of air.

2. The color filter structure according to claim 1, wherein: The light blocking structure is also located on a portion of the light shielding layer.

3. The color filter structure according to claim 1, wherein: The photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

4. The color filter structure according to claim 1, wherein: The material of the protective layer includes: polymethyl methacrylate or polyimide.

5. The color filter structure according to claim 1, wherein: The material of the anti-reflection layer includes: polymethyl methacrylate or polyimide.

6. The color filter structure according to claim 1, wherein: The material of the shielding layer includes: indium tin oxide.

7. The color filter structure according to claim 1, wherein: The refractive index relationship between the anti-reflection layer, the shielding layer and air is: Where n1 is the refractive index of air, n2 is the refractive index of the shielding layer, and n3 is the refractive index of the anti-reflection layer.

8. The color filter structure according to claim 1, wherein: It also includes a plurality of support columns, wherein the support columns are located on the first side, the support columns are located on the protective layer, and the support columns correspond to the light shielding layer.

9. A method for forming a color filter structure, characterized in that: include: Providing a substrate, the substrate comprising a light-transmitting area and a light-shielding area, the substrate having a first side and a second side opposite to each other; forming a shielding layer on the second side; forming a light shielding layer on the first side, wherein the light shielding layer covers the light shielding area; forming a light blocking structure on the first side, wherein the light blocking structure covers the light-transmitting area; A protective layer is formed on the first side, the protective layer covers the light-shielding layer and the light-blocking structure; after the protective layer is formed, an anti-reflection layer is formed on the second side, the shielding layer is located between the substrate and the anti-reflection layer, and the refractive index of the anti-reflection layer is between the refractive index of the shielding layer and the refractive index of air.

10. The method for forming a color filter structure according to claim 9, wherein: The light blocking structure is also located on a portion of the light shielding layer.

11. The method for forming a color filter structure according to claim 9, wherein: The photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

12. The method for forming a color filter structure according to claim 9, wherein: The refractive index relationship between the anti-reflection layer, the shielding layer and air is: Wherein, n1 is the refractive index of air, n2 is the refractive index of the shielding layer, and n3 is the refractive index of the anti-reflection layer.

13. The method for forming a color filter structure according to claim 9, wherein: After forming the anti-reflection layer, the method further includes: forming a plurality of support columns on the first side, wherein the support columns are located on the protective layer and correspond to the light shielding layer.

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