Circulating type gas-liquid two-phase discharge plasma device and system

Abstract

The invention provides a circulating type gas-liquid two-phase discharge plasma device and system, and belongs to the technical field of plasmas. The device comprises an insulation ionization region, wherein a gas phase medium is introduced into the insulation ionization region; the liquid film generation unit is arranged above the insulation ionization area and is used for storing and discharging a liquid phase medium; a liquid phase medium discharged by the liquid film generation unit forms a liquid film flowing downwards in the insulation ionization region; the discharge unit is used for inducing the insulation ionization area to generate discharge, the gas phase medium is ionized to generate plasma, and the plasma is adsorbed in the flowing liquid film; and the circulating unit is arranged below the insulation ionization area and is used for collecting the liquid-phase medium flowing down from the insulation ionization area and automatically enabling the collected liquid-phase medium to flow back into the liquid film generation unit. The reaction activity, the action area and the uniformity of the plasma to the liquid-phase medium are improved, the efficient utilization of the liquid-phase medium to the plasma is realized, and the device has the advantages of wide application range, high practicability and the like.

Description

Technical Field

[0001] The invention relates to the field of plasma technology, in particular to a circulating gas-liquid two-phase discharge plasma device and a circulating gas-liquid two-phase discharge plasma system. Background Art

[0002] Low-temperature plasma technology has received extensive attention and research in environmental pollution control, material modification, biomedicine, etc. due to its advantages such as flexible application, convenient regulation and high reactivity.

[0003] Since the generation of low-temperature plasma is a series of excitation ionization processes in which a large number of molecules are driven by external energy, the efficient use of external driving energy to achieve maximum excitation ionization is the main way to improve the application of low-temperature plasma technology.

[0004] Usually in a gas discharge environment, due to the insulating properties of the gas medium in the absence of external excitation energy, when the external driving energy of the gas discharge space reaches the excitation ionization threshold of the gas molecules, a series of excitation ionization processes of the gas molecules can be induced in the discharge space; while in a partially conductive liquid discharge environment, the liquid only undergoes charge rearrangement under the electric field rather than producing a series of highly reactive particles. In a non-conductive liquid environment, since the breakdown threshold of the liquid phase medium is usually higher than that of the gas phase medium, the discharge process based on liquid conditions usually occurs at the gas phase and the gas-liquid two-phase surface, resulting in the plasma zone acting on the liquid phase medium mainly concentrated on the liquid surface.

[0005] In current research, discharge inside liquid is mainly achieved by bubbling into the liquid to increase the gas-liquid two-phase area, thereby establishing a plasma reaction zone in the liquid. Since the state, distribution and movement freedom of bubbles inside the liquid are relatively large, the control of the plasma reaction zone inside the liquid still needs to be solved. Summary of the invention

[0006] The purpose of the present invention is to provide a circulating gas-liquid two-phase discharge plasma device and system to solve the problem in the prior art that plasma cannot be efficiently utilized by liquid phase medium.

[0007] In order to achieve the above object, the present invention provides a circulating gas-liquid two-phase discharge plasma device, the device comprising:

[0008] an insulating ionization zone, wherein a gas phase medium is introduced into the insulating ionization zone;

[0009] A liquid film generating unit is arranged above the insulating ionization zone and is used to store and discharge the liquid phase medium; the liquid phase medium discharged by the liquid film generating unit forms a liquid film flowing downward in the insulating ionization zone;

[0010] A discharge unit, used for inducing discharge in the insulating ionization zone, ionizing the gas phase medium to generate plasma, and the plasma is adsorbed in the flowing liquid film;

[0011] The circulation unit is arranged below the insulating ionization zone and is used for collecting the liquid phase medium flowing down from the insulating ionization zone and automatically returning the collected liquid phase medium to the liquid film generating unit.

[0012] Preferably, it also includes: a chassis, wherein the insulating ionization zone, liquid film generating unit, discharge unit and circulation unit are all installed in the chassis, and an air inlet hole for conveying the gas phase medium to the insulating ionization zone is provided on one side wall of the chassis, and an exhaust hole for discharging the gas phase medium is provided on the other side wall.

[0013] Preferably, a plurality of airflow rectifying plates are arranged in the chassis located inside the air inlet, each layer of airflow rectifying plates is provided with a plurality of airflow rectifying holes, and the airflow rectifying holes on the airflow rectifying plates of two adjacent layers are staggeredly distributed.

[0014] Preferably, the insulating ionization zone includes: at least one insulator and at least one gas phase discharge zone, the gas phase discharge zone is located next to the insulator, the liquid medium flows downward along the outer wall of the insulator close to the gas phase discharge zone to form a liquid film, and the discharge unit induces discharge in the gas phase discharge zone.

[0015] Preferably, there are two insulators, and the gap between the two insulators constitutes a gas phase discharge region.

[0016] Preferably, the number of the insulators is at least three, all of which are arranged in sequence at equal intervals, and the gap between every two adjacent insulators constitutes a gas phase discharge region.

[0017] Preferably, the discharge unit comprises: a high voltage electrode and a low voltage electrode, and the high voltage electrode and the low voltage electrode are respectively mounted on the non-liquid film surfaces of the first and last insulators.

[0018] Preferably, the liquid film generating unit comprises:

[0019] A water collection tank for storing liquid medium;

[0020] At least one water inlet trough is located below the water collection tank, the top of each water inlet trough is connected to the bottom of the water collection tank, the bottom is connected to the top of the corresponding insulator, and the bottom of each water inlet trough is provided with a drain port, and the liquid medium discharged from the drain port flows to the side wall of the corresponding insulator to form a water film;

[0021] At least one set of flow regulating components, installed inside the corresponding water inlet tank, for regulating the flow of the liquid medium in the water inlet tank;

[0022] At least one group of liquid film rectifiers is installed on the outer wall of the corresponding water inlet trough and is used to adjust the height of the drain outlet to adjust the thickness of the water film on the outer wall of the insulator.

[0023] Preferably, the flow regulating component comprises: a plurality of liquid flow rectifying plates arranged in the water inlet trough, each layer of the liquid flow rectifying plates is provided with a plurality of liquid flow rectifying holes, and the liquid flow rectifying holes on the liquid flow rectifying plates of two adjacent layers are staggeredly distributed.

[0024] Preferably, the circulation unit comprises:

[0025] At least one collecting tank, each collecting tank is installed at the bottom of the corresponding insulator, used to collect the liquid medium flowing down from the insulator, and each collecting tank is provided with a one-way liquid permeable membrane;

[0026] At least one drain pipe, a first end of each drain pipe is connected to the bottom of the corresponding liquid collecting tank, a second end of each drain pipe is connected to a capillary tube, and an end of the capillary tube away from the exhaust pipe is connected to the liquid film generating unit.

[0027] Preferably, the diameter of the capillary tube is smaller than that of the drainage tube, the height of the first end of each drainage tube is higher than the height of the second end, and the liquid collecting tank below the one-way liquid permeable membrane and the drainage tube are pre-filled with liquid medium.

[0028] Preferably, the insulator is made of a hydrophilic insulating material.

[0029] The present invention also provides a circulating gas-liquid two-phase discharge plasma system, the system comprising:

[0030] The above-mentioned circulating gas-liquid two-phase discharge plasma device comprises: an insulating ionization zone, a liquid film generating unit and a discharge unit;

[0031] A gas supply device, used for conveying gaseous medium into the insulating ionization zone;

[0032] A liquid supply device, used for conveying liquid medium to the liquid film generating unit;

[0033] The control device is used to control the start and stop of the discharge unit.

[0034] Through the above technical solution, the present invention has at least the following technical effects:

[0035] 1. The liquid medium of the present invention forms a liquid film in the insulating ionization zone, which can improve the penetration of the plasma generated by the gas phase medium during ionization into the liquid phase medium, and improve the reaction activity, action area and uniformity of the plasma to the liquid phase medium, thereby realizing the efficient utilization of the liquid phase medium to the plasma;

[0036] 2. The present invention uses a circulation unit to return the liquid medium flowing down from the insulating ionization zone to the liquid film generating unit, thereby realizing the circulation of the liquid medium, improving the uniformity of the plasma in the liquid medium and the practicality of the device;

[0037] 3. The present invention can be widely used in the fields of comprehensive treatment of wastewater and waste gas, sterilization and disinfection, biomedicine, etc., and has strong treatment performance.

[0038] Other features and advantages of the present invention will be described in detail in the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] The accompanying drawings are used to provide a further understanding of the embodiments of the present invention and constitute a part of the specification. Together with the following specific embodiments, they are used to explain the embodiments of the present invention, but do not constitute a limitation on the embodiments of the present invention. In the accompanying drawings:

[0040] Figure 1 It is a schematic diagram of the overall structure of a circulating gas-liquid two-phase discharge plasma device provided by one embodiment of the present invention;

[0041] Figure 2 is a side view of a circulating gas-liquid two-phase discharge plasma device provided by an optional embodiment of the present invention;

[0042] Figure 3 is a side view of a circulating gas-liquid two-phase discharge plasma device provided by a second optional embodiment of the present invention;

[0043] Figure 4 is a side view of a circulating gas-liquid two-phase discharge plasma device provided by a third optional embodiment of the present invention;

[0044] Figure 5 is a schematic structural diagram of an airflow straightening plate provided in one embodiment of the present invention;

[0045] Figure 6 It is a structural schematic diagram of a liquid flow rectifying plate provided in one embodiment of the present invention;

[0046] Figure 7 is a block diagram of a circulating gas-liquid two-phase discharge plasma system provided by one embodiment of the present invention;

[0047] Figure 8 It is a schematic diagram of the height position of a circulating gas-liquid two-phase discharge plasma device after debugging provided by an embodiment of the present invention.

[0048] Description of Reference Numerals

[0049] 1. Liquid film; 2. Chassis; 3. Air inlet; 4. Exhaust hole; 5. Air flow straightening plate; 6. Air flow straightening hole; 7. Insulator; 8. Gas phase discharge area; 9. High voltage electrode; 10. Low voltage electrode; 11. Water collecting tank; 12. Water inlet trough; 13. Drain port; 14. Liquid flow straightening plate; 15. Liquid flow straightening hole; 16. Liquid collecting tank; 17. One-way liquid permeable membrane; 18. Drain pipe; 19. Capillary; 20. Baffle. DETAILED DESCRIPTION

[0050] The specific implementation of the embodiment of the present invention is described in detail below in conjunction with the accompanying drawings. It should be understood that the specific implementation described here is only used to illustrate and explain the embodiment of the present invention, and is not used to limit the embodiment of the present invention.

[0051] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by technicians in the technical field to which this application belongs; the terms used herein are only for the purpose of describing specific embodiments and are not intended to limit this application; the terms "including" and "having" in the specification and claims of this application and the above-mentioned figure descriptions and any variations thereof are intended to cover non-exclusive inclusions.

[0052] In the description of the embodiments of the present application, the technical terms "first", "second", etc. are only used to distinguish different objects, and cannot be understood as indicating or implying relative importance or implicitly indicating the number, specific order or primary and secondary relationship of the indicated technical features. In the description of the embodiments of the present application, the meaning of "multiple" is more than two, unless otherwise clearly and specifically defined.

[0053] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0054] In the description of the embodiments of the present application, the term "multiple" refers to more than two (including two). Similarly, "multiple groups" refers to more than two groups (including two groups), and "multiple pieces" refers to more than two pieces (including two pieces).

[0055] In the description of the embodiments of the present application, unless otherwise clearly specified and limited, technical terms such as "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present application can be understood according to the specific circumstances.

[0056] Embodiment 1

[0057] Figure 1 FIG. 1 is a schematic diagram of the overall structure of a circulating gas-liquid two-phase discharge plasma device provided in one embodiment of the present invention. Figure 1 As shown, this embodiment provides a circulating gas-liquid two-phase discharge plasma device, the device comprising: an insulating ionization zone, a liquid film generating unit, a discharge unit and a circulation unit;

[0058] A gas phase medium is introduced into the insulating ionization zone;

[0059] The liquid film generating unit is arranged above the insulating ionization zone, and is used for storing and discharging the liquid phase medium; the liquid phase medium discharged by the liquid film generating unit forms a liquid film 1 flowing downward in the insulating ionization zone;

[0060] A discharge unit; used to induce discharge in the insulating ionization zone, ionize the gas phase medium to generate plasma, and the plasma is adsorbed in the flowing liquid film 1;

[0061] The circulation unit is arranged below the insulating ionization zone, and is used for collecting the liquid phase medium flowing down from the insulating ionization zone, and automatically returning the collected liquid phase medium to the liquid film generating unit.

[0062] In this embodiment, a certain amount of liquid medium is injected into the liquid film generating unit, and then the liquid medium is discharged through the liquid film generating unit. The liquid medium can form a liquid film 1 in the insulating ionization zone; at this time, the energy control discharge unit is driven by external coupling regulation to discharge, so as to realize the reaction process and energy efficiency optimization of gas discharge plasma under the coexistence of gas-liquid two phases; the penetration of plasma into the liquid medium is optimized through the liquid film 1, which can effectively improve the proportion and uniformity of the liquid medium plasma reaction zone, and improve the comprehensive utilization efficiency of plasma.

[0063] Secondly, the circulation unit of this embodiment can automatically return the liquid medium flowing down from the insulating ionization zone to the liquid film generating unit, thereby realizing the circulation of the liquid medium and improving the uniformity of the plasma in the liquid medium and the practicality of the device.

[0064] As a further optimization of this embodiment, the device also includes: a chassis 2, the insulating ionization zone, the liquid film generating unit, the discharge unit and the circulation unit are all installed in the chassis 2, and an air inlet 3 for conveying the gas phase medium to the insulating ionization zone is provided on one side wall of the chassis 2, and an exhaust hole 4 for discharging the gas phase medium is provided on the other side wall; the gas phase medium enters the chassis 2 through the air inlet 3, and then flows into the insulating ionization zone. After starting the discharge unit, the gas phase medium in the insulating ionization zone is ionized.

[0065] In the process of treating waste gas and other gaseous wastes, the gaseous medium composed of the mixed gas of the waste gas and the air is introduced into the chassis 2 through the air inlet 3, and the gaseous medium then flows into the insulating ionization zone for ionization. The air ionization generates plasma, and the waste gas is treated by the plasma. After the mixed gas enters the chassis 2, in order to ensure that the gaseous medium is evenly distributed in the insulating ionization zone; therefore, a multi-layer airflow rectifying plate 5 is provided in the chassis 2 located inside the air inlet 3, such as Figure 5 As shown, the airflow rectifying plate 5 is made of insulating material, such as polytetrafluoroethylene material, and each layer of the airflow rectifying plate 5 is provided with a plurality of airflow rectifying holes 6. The airflow rectifying holes 6 on the two adjacent layers of the airflow rectifying plates 5 are staggered. In this embodiment, the airflow rectifying plates 5 are preferably provided with two layers; the staggered airflow rectifying holes 6 can improve the dispersion of the gas phase medium and improve the uniformity of the gas phase medium in the insulating ionization zone.

[0066] As a further optimization of this embodiment, the insulating ionization zone includes: at least one insulator 7 and at least one gas phase discharge zone 8, the gas phase discharge zone 8 is located next to the insulator 7, and the insulator 7 is made of an insulating material with a certain hydrophilicity, such as quartz glass, ceramic, polytetrafluoroethylene and the like. The liquid medium flows downward along the outer wall of the insulator 7 close to the gas phase discharge zone 8 to form a liquid film 1, and the discharge unit induces discharge in the gas phase discharge zone 8.

[0067] In this embodiment, the insulating ionization zone can have only one insulator 7, and a gas phase discharge zone 8 is set on one side of the insulator 7, or a gas phase discharge zone 8 is set on the two opposite sides of the insulator 7. At this time, the gas phase discharge zone 8 is formed by the gap between the outer wall of the insulator 7 and the inner wall of the chassis 2.

[0068] In this embodiment, the insulating ionization zone can use two insulators 7, and the gap between the two insulators 7 constitutes a gas phase discharge zone 8. The liquid medium flows to the two opposite outer walls of the two insulators 7 to form a liquid film 1 on the outer walls.

[0069] In this embodiment, the insulating ionization zone may also use three or more insulators 7 , all of which are arranged in sequence at equal intervals, and the gap between every two adjacent insulators 7 constitutes a gas phase discharge zone 8 .

[0070] In this embodiment, the discharge unit includes: a high voltage electrode 9 and a low voltage electrode 10. The installation positions of the high voltage electrode 9 and the low voltage electrode 10 are adjusted according to the number of insulators 7, for example:

[0071] When only one insulator 7 is provided, Figure 3 As shown, a high voltage electrode 9 and a low voltage electrode 10 are respectively installed on the front and rear side walls or the left and right side walls of the insulator 7;

[0072] When two insulators 7 are provided, as Figure 2 As shown, the high voltage electrode 9 and the low voltage electrode 10 are respectively mounted on the non-liquid film surfaces of the two insulators 7. Figure 2 In the figure, the high voltage electrode 9 is mounted on the left outer wall of the left insulator 7, and the low voltage electrode 10 is mounted on the right outer wall of the right insulator 7;

[0073] When three or more insulators 7 are provided, Figure 4 As shown, the high voltage electrode 9 and the low voltage electrode 10 are respectively mounted on the non-liquid film surfaces of the first and last insulators 7. Figure 4 In the embodiment, a high voltage electrode 9 is installed on the left outer wall of the first insulator 7 on the left, and a low voltage electrode 10 is installed on the right outer wall of the first insulator 7 on the right.

[0074] As a further optimization of this embodiment, Figure 1 As shown, the liquid film generating unit comprises: a liquid collecting tank, a water inlet tank 12, a flow regulating component and a liquid film rectifier;

[0075] The water collecting tank 11 is used to store the liquid medium. In this embodiment, only one water collecting tank 11 may be provided. The water collecting tank 11 adopts an open structure or a semi-open structure, and the liquid medium is stored in the water collecting tank 11. Secondly, the number of water collecting tanks 11 may correspond to the number of insulators 7 one by one, and each water collecting tank 11 transports the liquid medium on the surface of the insulator 7 below it.

[0076] The water inlet trough 12 is located below the water collecting tank 11, and the number of the water inlet troughs 12 corresponds to the number of the insulators 7. The top of each water inlet trough 12 is connected to the bottom of the water collecting tank 11, and the bottom is connected to the top of the corresponding insulator 7. A drain port 13 is provided at the bottom of each water inlet trough 12, and the liquid medium discharged from the drain port 13 flows to the side wall of the corresponding insulator 7 to form a water film.

[0077] A group flow regulating component is installed inside the corresponding water inlet tank 12, and is used to regulate the flow of the liquid medium in the water inlet tank 12, that is, each water inlet tank 12 is provided with a flow regulating component;

[0078] In this embodiment, the flow regulating assembly includes: a plurality of liquid flow rectifying plates 14 arranged in the water inlet tank 12, each layer of the liquid flow rectifying plates 14 is provided with a plurality of liquid flow rectifying holes 15, and the liquid flow rectifying holes 15 on the liquid flow rectifying plates 14 of two adjacent layers are staggered, such as Figure 6 As shown, the liquid flow rectifying plates 14 in each water inlet trough 12 are preferably provided with two layers, and the liquid flow rectifying plates 14 are made of insulating material. Both ends of the liquid flow rectifying plates 14 can penetrate the side walls of the water inlet trough 12. By changing the insertion depth of the liquid flow rectifying plates 14 and the staggered position of the liquid flow rectifying holes 15, the flow cross-sectional area of ​​the two adjacent upper and lower liquid flow rectifying holes 15 is adjusted to achieve flow regulation of the liquid phase medium in the water inlet trough 12.

[0079] The liquid film rectifier is installed on the outer wall of the corresponding water inlet trough 12. The number of liquid film rectifiers corresponds to the number of insulators 7. The liquid film rectifier is used to adjust the height of the drain port 13 to adjust the thickness of the water film on the outer wall of the insulator 7.

[0080] In this embodiment, the liquid film rectifier includes a baffle 20 slidably connected to the outer wall of the water inlet trough 12 and an adjusting member installed on the top of the water inlet trough 12, wherein the adjusting member can be an electric push rod, which adopts an automatic adjustment method; it can also adopt a screw adjustment structure, and the baffle 20 is manually raised and lowered. For example, a nut is installed on the outer wall of the baffle 20, and a connecting ear is provided on the top of the outer wall of the water inlet trough 12. The upper part of the screw is rotatably connected to the connecting ear, and the baffle 20 is driven to rise and fall by rotating the screw. The baffle 20 can be made of a rubber plate. When the bottom surface of the baffle 20 contacts the insulator 7, the drain outlet 13 is blocked; by adjusting the height of the baffle 20, the thickness of the liquid medium flowing out of the drain outlet 13 can be adjusted.

[0081] As for the connection method of the baffle 20 on the outer wall of the water inlet trough 12, a vertical slide rail can be provided on the outer wall of the water inlet trough 12, and a vertical slide groove can be provided on the inner wall of the baffle 20, and the baffle 20 is slidably connected to the slide rail through the slide groove.

[0082] As a further optimization of this embodiment, the following two implementations can be adopted for the circulation unit in this embodiment:

[0083] First, the circulation unit is composed of a water collecting tank, a water pump and a water pipe. The number of water collecting tanks corresponds to the number of insulators 7. The water collecting tank is located below the insulator 7. The liquid medium flowing down the insulator 7 is collected in the water collecting tank, and then the water pump pumps the liquid medium into the water collecting tank 11 to realize the recycling of the liquid medium.

[0084] Second, the circulation unit includes: a liquid collecting tank 16, a liquid drain pipe 18, a capillary tube 19 and a one-way liquid permeable membrane 17;

[0085] The number of the liquid collecting trough 16, the drainage pipe 18 and the capillary tube 19 all corresponds to the number of the insulators 7. The liquid collecting trough 16 is located below the insulator 7 and is used to collect the liquid medium flowing down from the insulator 7. The length of the liquid collecting trough 16 is greater than the length of the insulator 7, which can prevent the liquid medium from flowing out of the liquid collecting trough 16. Each liquid collecting trough 16 is provided with a one-way liquid permeable membrane 17, which plays a one-way conductive role for the liquid medium, that is, the liquid medium can only penetrate from the upper surface of the one-way liquid permeable membrane 17 to the bottom of the one-way liquid permeable membrane 17. At the same time, the first end of each drainage pipe 18 is connected to the bottom of the corresponding liquid collecting trough 16, and the second end of each drainage pipe 18 is connected to the capillary tube 19, and the end of the capillary tube 19 away from the exhaust pipe is connected to the water collecting tank 11 of the liquid film generating unit.

[0086] Secondly, the diameter of the capillary tube 19 is smaller than that of the drainage tube 18 , the height of the first end of each drainage tube 18 is higher than the height of the second end, the drainage tube 18 is in a U-shaped structure, and the capillary tube 19 is in an L-shaped structure.

[0087] In this embodiment, before the device performs ionization operation, it is necessary to pre-inject liquid medium into the liquid collecting tank 16. When the liquid collecting tank 16 below the unidirectional liquid permeable membrane 17 is filled with liquid medium, the liquid level at the second end of the discharge pipe 18 maintains a certain height difference with the liquid level in the liquid collecting tank 16. By utilizing the potential energy generated by the liquid within the height difference and the capillary action of the capillary 19, the liquid medium in the capillary 19 can be pushed into the lateral section of the capillary 19.

[0088] That is, the potential energy generated by the liquid within the height difference can be expressed as:

[0089]

[0090] Where ρ is the liquid density, S1 is the cross-sectional area of ​​the sump and the drain pipe, h is the integral variable, h1 is the lower limit of the integral (the liquid level at the second end of the drain pipe), and h2 is the upper limit of the integral (the liquid level in the sump);

[0091] The driving potential energy that pushes the liquid medium in the capillary to move to the outlet of the capillary is:

[0092]

[0093] Where h3 is the height of the capillary outlet.

[0094] When W1>W2, (W1-W2)<P 膜 ×S 膜 (Where S 膜 is the area of ​​the one-way liquid permeable membrane, P 膜 is the maximum pressure that a one-way liquid permeable membrane can withstand).

[0095] At this time, after the liquid medium flowing down from the insulator 7 flows into the liquid collecting tank 16 again, the potential energy of the liquid medium in the liquid collecting tank 16 increases, and the liquid medium can be pushed out from the water outlet of the capillary 19, so that the liquid medium flows back to the water collecting tank 11, realizing the circulation of the liquid medium. This method utilizes potential energy conversion to realize the reflux of the liquid medium. Compared with the water pump reflux method, this method has a simpler structure.

[0096] Embodiment 2

[0097] Figure 7 is a block diagram of a circulating gas-liquid two-phase discharge plasma system provided by one embodiment of the present invention, such as Figure 7 As shown, this embodiment provides a circulating gas-liquid two-phase discharge plasma system, the system comprising:

[0098] The above-mentioned circulating gas-liquid two-phase discharge plasma device comprises: an insulating ionization zone, a liquid film generating unit and a discharge unit;

[0099] A gas supply device, used for conveying gaseous medium into the insulating ionization zone;

[0100] A liquid supply device, used for conveying liquid medium to the liquid film generating unit;

[0101] The control device is used to control the start and stop of the discharge unit.

[0102] In this embodiment, a gas phase medium is introduced into the insulating ionization zone;

[0103] The liquid film generating unit is arranged above the insulating ionization zone, and is used for storing and discharging the liquid phase medium; the liquid phase medium discharged by the liquid film generating unit forms a liquid film 1 flowing downward in the insulating ionization zone;

[0104] The discharge unit is used to induce discharge in the insulating ionization zone, ionize the gas phase medium to generate plasma, and the plasma is adsorbed in the flowing liquid film 1;

[0105] The circulation unit is arranged below the insulating ionization zone, and is used for collecting the liquid phase medium flowing down from the insulating ionization zone, and automatically returning the collected liquid phase medium to the liquid film generating unit.

[0106] In this embodiment, a certain amount of liquid medium is injected into the liquid film generating unit, and then the liquid medium is discharged through the liquid film generating unit. The liquid medium can form a liquid film 1 in the insulating ionization zone; at this time, the energy control discharge unit is driven by external coupling regulation to discharge, so as to realize the reaction process and energy efficiency optimization of gas discharge plasma under the coexistence of gas-liquid two phases; the penetration of plasma into the liquid medium is optimized through the liquid film 1, which can effectively improve the proportion and uniformity of the liquid medium plasma reaction zone, and improve the comprehensive utilization efficiency of plasma.

[0107] Secondly, the circulation unit of this embodiment can automatically return the liquid medium flowing down from the insulating ionization zone to the liquid film generating unit, thereby realizing the circulation of the liquid medium and improving the uniformity of the plasma in the liquid medium and the practicality of the device.

[0108] The circulating gas-liquid two-phase discharge plasma system of this embodiment can be used in the fields of comprehensive wastewater and waste gas treatment, sterilization and disinfection, and biomedicine. By optimizing the permeability of plasma to the liquid medium during the gas-liquid two-phase discharge process, the comprehensive energy utilization efficiency of the plasma is improved, providing support for further optimizing the application of low-temperature plasma technology.

[0109] Embodiment 3

[0110] In this embodiment, the debugging operation of the circulating gas-liquid two-phase discharge plasma device of embodiment 1 in different working environments is as follows:

[0111] First, the liquid film rectifier is closed to ensure that no liquid medium flows out of the drain port 13; liquid is added from the upstream water collection tank 11 until the liquid fills the water inlet tank 12 and the water collection tank 11; secondly, liquid is added to the liquid collection tank 16 from the one-way liquid permeable membrane 17 on the upper surface of the liquid collection tank 16, and the liquid level in the capillary 19 is observed while adding liquid;

[0112] (1) When the liquid in the capillary 19 flows autonomously to the upstream water collection tank 11 and no liquid seeps out of the liquid collection tank 16, the structural characteristics of the device meet the requirements of the self-circulation function;

[0113] (2) When the liquid in the capillary tube 19 flows autonomously to the upstream water collection tank 11, but there is liquid seepage in the liquid collection tank 16, it is necessary to appropriately increase the liquid level height of the water outlet, reduce the cross-sectional area of ​​the drainage pipe 18 at the lower end of the liquid collection tank 16, or increase the cross-sectional area of ​​the capillary tube 19, until the capillary tube 19 drains water autonomously and no liquid seeps out of the liquid collection tank 16; in this embodiment, the capillary tube 19, the drainage pipe 18, or the liquid collection tank 16 may be replaced to increase the liquid level height of the water outlet, reduce the cross-sectional area of ​​the drainage pipe 18 at the lower end of the liquid collection tank 16, or increase the cross-sectional area of ​​the capillary tube 19;

[0114] (3) When the liquid in the capillary 19 cannot reach the liquid level of the sump 11 and there is liquid leakage on the surface of the sump 16, the liquid level at the water outlet can be lowered, the cross-sectional area of ​​the drainage pipe 18 at the lower end of the sump 16 can be increased, or the cross-sectional area of ​​the capillary 19 can be reduced until the capillary 19 drains water autonomously and no liquid leaks out of the sump 16.

[0115] After the capillary 19 drains water autonomously, immediately open the liquid film rectifier and adjust the position of the liquid film rectifier to control the thickness of the liquid film 1. Since the balance between the flow rate of the liquid film 1 and the flow rate in the capillary 19 is the key factor in maintaining the self-circulation of the liquid phase medium, when the thickness of the liquid film 1 reaches an ideal state, closely observe the liquid level height in the upstream water collection tank 11:

[0116] (1) When the liquid level increases slowly, the liquid level height of the outlet of the drain pipe 18 is appropriately increased, or the cross-sectional area of ​​the lower end of the sump 16 is reduced, or the cross-sectional area of ​​the capillary 19 is increased, so as to ensure that the capillary 19 can drain water autonomously and no liquid leaks out of the sump 16, until the liquid level height in the upstream sump 11 is stable and unchanged;

[0117] (2) When the liquid level slowly decreases, the outlet liquid level height is appropriately lowered, or the cross-sectional area of ​​the drainage pipe 18 at the lower end of the sump 16 is increased, or the cross-sectional area of ​​the capillary 19 is reduced, so as to ensure that the capillary 19 can drain water autonomously and no liquid leaks out of the sump 16, until the liquid level height in the upstream sump 11 remains stable; if the thickness of the liquid film 1 needs to be changed, the above-mentioned operation flow is also followed to slowly adjust the opening degree of the liquid film rectifier, and at the same time coordinately adjust the outlet position, or the cross-sectional area of ​​the drainage pipe 18 at the lower end of the sump 16, or the cross-sectional area of ​​the capillary 19, so as to maintain the stability of the direct self-circulation of the liquid phase during the process of adjusting the thickness of the liquid film 1.

[0118] In this embodiment, the dimensions of the insulator 7 are length × width × height: 50mm × 5mm × 15mm, the slot width of the liquid collecting trough 16 is 7mm, which is larger than the total width of the insulator 7 and the liquid film 1; the dimensions of the liquid flow straightening plate 14 are length × width × height: 48mm × 3mm × 1mm, and the liquid flow straightening plate 14 is provided with evenly distributed liquid flow straightening holes 15 with a diameter of 1mm, and the spacing between the liquid flow straightening holes 15 is 1mm.

[0119] Under the conditions that the height difference between the liquid level at the second end of the discharge pipe and the liquid level in the sump is Δh1=10 mm, the height difference between the liquid level in the sump and the capillary outlet is Δh2=46 mm, and the cross-sectional ratio of the discharge pipe to the capillary is 7:1, the parameters are adjusted to obtain a liquid film thickness of 1 mm, such as Figure 8 shown.

[0120] Embodiment 4

[0121] In this embodiment, for the cyclic gas-liquid two-phase discharge plasma device after debugging in Example 3, after adjusting the liquid film 1 with a thickness of 1 mm while maintaining the stable circulation operation of the cyclic gas-liquid two-phase discharge plasma device, acetone gas with a concentration of 100 ppm is introduced into the space in the device through the air inlet 3. When the excitation energy obtained by the discharge unit from the outside gradually increases, it can induce discharge in the gas phase and gas-liquid two-phase of the discharge area; in order to take into account the utilization efficiency of the gas-liquid two-phase plasma at the same time; under specific external driving energy conditions, when the discharge power is 15 W, the gas phase plasma reaction zone reaches the expected state (at this time, the gas phase acetone removal rate is 70%). In order to further improve the permeability of the plasma in the above-mentioned discharge area to the low-concentration acetone solution, the liquid phase film thickness can be gradually reduced to 0.8 mm, 0.5 mm, and 0.2 mm, respectively. The change law of the substance to be treated in the liquid medium is investigated, and the acetone removal rates are 30%, 39%, 48% and 54% respectively.

[0122] The gas-liquid two-phase discharge plasma device of this embodiment constitutes a discharge module of high-voltage electrode 9-insulator 7-liquid film 1-gas medium-liquid film 1-insulator 7-liquid film 1-gas medium-liquid film 1-insulator 7-low-voltage electrode 10. Since there are more insulating media in the discharge module, the external excitation energy required for the operation process is relatively large.

[0123] Therefore, the liquid medium of the present invention forms a liquid film in the insulating ionization zone, which can improve the penetration of the plasma generated by the gas phase medium during ionization to the liquid phase medium, and improve the reaction activity, action area and uniformity of the plasma to the liquid phase medium, thereby realizing the efficient utilization of the liquid phase medium to the plasma;

[0124] The present invention returns the liquid medium flowing down from the insulating ionization zone to the liquid film generating unit through a circulation unit, thereby realizing the circulation of the liquid medium and improving the uniformity of the plasma in the liquid medium and the practicality of the device; the present invention can be widely used in the fields of comprehensive treatment of wastewater and waste gas, sterilization and disinfection, biomedicine, etc., and has strong treatment performance.

[0125] It should also be noted that the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, commodity or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, commodity or device. In the absence of more restrictions, the elements defined by the sentence "comprises a ..." do not exclude the existence of other identical elements in the process, method, commodity or device including the elements.

[0126] The above are only embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included within the scope of the claims of the present application.

Claims

1. A circulating gas-liquid two-phase discharge plasma device, characterized in that: The device comprises: an insulating ionization zone, wherein a gas phase medium is introduced into the insulating ionization zone; A liquid film generating unit is arranged above the insulating ionization zone and is used for storing and discharging a liquid phase medium; the liquid phase medium discharged by the liquid film generating unit forms a liquid film (1) flowing downward in the insulating ionization zone; A discharge unit, used for inducing discharge in the insulating ionization zone, ionizing the gas phase medium to generate plasma, and the plasma is adsorbed in the flowing liquid film (1); The circulation unit is arranged below the insulating ionization zone and is used for collecting the liquid phase medium flowing down from the insulating ionization zone and automatically returning the collected liquid phase medium to the liquid film generating unit.

2. The circulating gas-liquid two-phase discharge plasma device according to claim 1, characterized in that: It also includes: a chassis (2), wherein the insulating ionization zone, the liquid film generating unit, the discharge unit and the circulation unit are all installed in the chassis (2), and an air inlet (3) for conveying a gas phase medium in the insulating ionization zone is provided on one side wall of the chassis (2), and an exhaust hole (4) for exhausting the gas phase medium is provided on the other side wall.

3. The circulating gas-liquid two-phase discharge plasma device according to claim 2, characterized in that: A plurality of airflow rectifying plates (5) are arranged in the chassis (2) located inside the air inlet hole (3), each layer of the airflow rectifying plates (5) is provided with a plurality of airflow rectifying holes (6), and the airflow rectifying holes (6) on the airflow rectifying plates (5) of two adjacent layers are staggered.

4. The circulating gas-liquid two-phase discharge plasma device according to claim 1, characterized in that: The insulating ionization zone comprises: at least one insulator (7) and at least one gas phase discharge zone (8), wherein the gas phase discharge zone (8) is located next to the insulator (7), the liquid phase medium flows downward along the outer wall of the insulator (7) close to the gas phase discharge zone (8) to form a liquid film (1), and the discharge unit induces the gas phase discharge zone (8) to generate discharge.

5. The circulating gas-liquid two-phase discharge plasma device according to claim 4, characterized in that: There are two insulators (7), and the gap between the two insulators (7) constitutes a gas phase discharge region (8).

6. The circulating gas-liquid two-phase discharge plasma device according to claim 4, characterized in that: The number of the insulators (7) is at least three, and all the insulators (7) are arranged in sequence at equal intervals, and the gap between every two adjacent insulators (7) forms a gas phase discharge region (8).

7. The circulating gas-liquid two-phase discharge plasma device according to claim 5 or 6, characterized in that: The discharge unit comprises: a high voltage electrode (9) and a low voltage electrode (10), wherein the high voltage electrode (9) and the low voltage electrode (10) are respectively mounted on the non-liquid film (1) surfaces of the first and last insulators (7).

8. The circulating gas-liquid two-phase discharge plasma device according to claim 4, characterized in that: The liquid film generating unit comprises: A water collecting tank (11) for storing liquid medium; At least one water inlet trough (12) is located below the water collecting tank (11), the top of each water inlet trough (12) is connected to the bottom of the water collecting tank (11), and the bottom is connected to the top of the corresponding insulator (7); a drainage port (13) is provided at the bottom of each water inlet trough (12), and the liquid medium discharged from the drainage port (13) flows to the side wall of the corresponding insulator (7) to form a water film; At least one set of flow regulating components, installed inside the corresponding water inlet tank (12), and used to regulate the flow of the liquid medium in the water inlet tank (12); At least one group of liquid film rectifiers is installed on the outer wall of the corresponding water inlet trough (12) and is used to adjust the height of the water outlet (13) to adjust the thickness of the water film on the outer wall of the insulator (7).

9. The circulating gas-liquid two-phase discharge plasma device according to claim 8, characterized in that: The flow regulating component comprises: a plurality of liquid flow rectifying plates (14) arranged in a water inlet tank (12), each layer of the liquid flow rectifying plates (14) being provided with a plurality of liquid flow rectifying holes (15), and the liquid flow rectifying holes (15) on two adjacent layers of the liquid flow rectifying plates (14) being staggered in distribution.

10. The circulating gas-liquid two-phase discharge plasma device according to claim 4, characterized in that: The circulation unit comprises: at least one liquid collecting trough (16), each liquid collecting trough (16) being installed at the bottom of the corresponding insulator (7) and used for collecting the liquid medium flowing down from the insulator (7), and each liquid collecting trough (16) being provided with a one-way liquid permeable membrane (17); At least one drainage pipe (18), the first end of each drainage pipe (18) is connected to the bottom of the corresponding liquid collecting tank (16), the second end of each drainage pipe (18) is connected to a capillary tube (19), and the end of the capillary tube (19) away from the exhaust pipe is connected to the liquid film generating unit.

11. The circulating gas-liquid two-phase discharge plasma device according to claim 10, characterized in that: The diameter of the capillary tube (19) is smaller than the diameter of the drainage tube (18); the height of the first end of each drainage tube (18) is higher than the height of the second end; and the liquid collecting tank (16) below the one-way liquid permeable membrane (17) and the drainage tube (18) are pre-filled with liquid medium.

12. The circulating gas-liquid two-phase discharge plasma device according to claim 10, characterized in that: The insulator (7) is made of hydrophilic insulating material.

13. A circulating gas-liquid two-phase discharge plasma system, characterized in that: The system comprises: The circulating gas-liquid two-phase discharge plasma device according to any one of claims 1 to 12, comprising: an insulating ionization zone, a liquid film generating unit and a discharge unit; A gas supply device, used for conveying gaseous medium into the insulating ionization zone; A liquid supply device, used for conveying liquid medium to the liquid film generating unit; The control device is used to control the start and stop of the discharge unit.

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