Processing platform for ceramic products

Abstract

The machining platform for the ceramic products comprises a workbench main body, a protective baffle ring is fixedly connected to the upper end face of the workbench main body, a driving source is erected in the middle of the workbench main body, and a polishing grinding wheel is rotationally arranged in the protective baffle ring; the driving source is in driving connection with a self-adjusting rotating shaft for monitoring the rotating state of the polishing grinding wheel, the self-adjusting rotating shaft is in driving connection with the protective baffle ring, the device can control the state through the rotating speed in the ceramic machining process, ceramic can be machined only when the rotating speed reaches the constant rotating speed, and the ceramic machining precision is greatly improved.

Description

Technical Field

[0001] The invention relates to the technical field of grinding equipment, in particular to a processing platform for ceramic products. Background Art

[0002] Ceramic processing is a workshop that specializes in processing ceramics. Ceramic processing requires special processing tools and processing technology. The processing of ceramic materials is a special case of mechanical processing. General machining workshops do not have the ability to process ceramics. For ceramic materials, due to their special physical and mechanical properties, they could only be processed by grinding methods at first. With the development of mechanical processing technology, ceramic materials can now be processed by a variety of processes similar to metal processing.

[0003] Chinese patent publication number CN111774999B provides a grinding device for ceramic processing that can perform uniform grinding and stable fixation. A grinding device for ceramic processing includes: a base plate for installing the entire device; a rotating component installed on the base plate and powered by a motor; a moving component installed on the base plate; a grinding component installed on the moving component and grinding by continuous contact with the ceramic. The present invention can automatically rotate the ceramic by cooperating with a reduction motor and a placement plate, thereby improving the uniformity of grinding the ceramic surface. The telescopic rod and the arc-shaped grinding plate can reduce damage to the ceramic during the grinding process. The first gear and the second gear can automatically grind the ceramic surface evenly up and down without manual pulling.

[0004] It grinds ceramics by installing a grinding component. However, the grinding disc is prone to speed fluctuations at the beginning of rotation and during rotation. When the speed deviates from the preset speed during ceramic processing, it will cause insufficient or excessive grinding of the ceramic, which will affect the processing accuracy of the ceramic. Therefore, a grinding device that can only operate within a specified speed range is required.

[0005] Therefore, it is necessary to provide a processing platform for ceramic products to solve the above technical problems. Summary of the invention

[0006] The object of the present invention is to provide a processing platform for ceramic products to solve the above technical problems.

[0007] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a processing platform for ceramic products, comprising a workbench main body, the upper end surface of the workbench main body is fixedly connected to a protective stop ring, a driving source is mounted in the middle of the workbench main body, the polishing wheel is rotatably arranged inside the protective stop ring, the driving source is drivably connected to a self-adjusting shaft for monitoring the rotation state of the polishing wheel, and the self-adjusting shaft is drivably connected to the protective stop ring.

[0008] As a further solution of the present invention, the self-adjusting shaft includes a shaft body, an adaptive rod, a positioning ring and a limit plate. The shaft body is driven and connected to a driving source. The limit plate is assembled and connected to one end of the shaft body away from the driving source. The adaptive rod is fixedly connected to the outer end surface of the shaft body. The adaptive rod is fitted with the bottom of the polishing wheel. The positioning ring is fixedly connected to the end of the adaptive rod away from the shaft body.

[0009] Furthermore, the bottom area of ​​the limiting plate is larger than the rotating shaft body, the limiting plate may be in the shape of a frustum or a prism, and the limiting plate is assembled and connected to the rotating shaft body by bolts or snaps.

[0010] As a further solution of the present invention, a centrifugal cavity is provided inside the adaptive rod, a movable sealing plate is slidably connected inside the centrifugal cavity, and the movable sealing plate is elastically connected to the inner wall of the centrifugal cavity on one side of the rotating shaft body.

[0011] Furthermore, the adaptive rods are provided in multiple groups and are evenly and symmetrically distributed on the side end surface of the shaft body.

[0012] As a further solution of the present invention, a control cavity is opened inside the protective baffle ring, a movable baffle is movably embedded inside the control cavity, a driving slider for controlling the movement of the movable baffle is elastically connected inside the control cavity, and the control cavity is connected to the centrifugal cavity.

[0013] Furthermore, the movable baffle is movably embedded in the control cavity.

[0014] As a further solution of the present invention, driving convex plates are provided on both sides of the upper end surface of the driving slider, and the driving convex plates are tightly fitted with the inner wall of the control cavity. A conical protrusion adapted to the driving convex plates is provided at the bottom of the movable baffle.

[0015] Furthermore, the driving convex plate is provided with an inclined surface which fits with the driving slider, a partition plate is provided in the middle of the control cavity, the driving sliders are symmetrically distributed on both sides of the partition plate, and conical protrusions are symmetrically provided on the bottom of the movable baffle. Through the symmetrical setting of the conical protrusions and the driving slider, the driving slider is more stable during the process of driving the movable baffle to rise or fall.

[0016] As a further solution of the present invention, the outer end surface of the positioning ring is rotatably connected to the inner wall of the protective gear ring through a rotating bearing, a connecting cavity is provided inside the rotating bearing, the centrifugal cavity is connected to the connecting cavity through a connecting hole, and the control cavity is connected to the connecting cavity.

[0017] Furthermore, the rotating bearings are provided in two groups, which are rotatably connected to the upper and lower parts of the side end surface of the positioning ring respectively, the gaps between the rotating bearings form a connecting cavity, and the control cavity is provided with a notch connected to the connecting cavity.

[0018] As a further solution of the present invention, a liquid spray hole is opened inside the limiting plate, and the side end face of the rotating shaft body is rotatably connected to a liquid injection box. One end of the liquid spray hole is opened on the side end face of the limiting plate, and the end of the liquid spray hole away from the limiting plate is connected to the liquid injection box.

[0019] Furthermore, the liquid spray hole is arranged to be inclined at one end of the limit plate to improve the impact effect of the internal pressure machining fluid in the liquid spray hole on the polishing grinding wheel. The liquid injection box is connected to a liquid supply pipe.

[0020] As a further solution of the present invention, a temperature-sensitive layer is provided on the side of the adaptive rod that is in contact with the polishing wheel, and a closing plate is slidably connected to the interior of the rotating shaft body. One end of the closing plate passes through the rotating shaft body and extends to the interior of the centrifugal chamber and is fixedly connected to the movable closing plate. A conducting hole adapted to the spray hole is opened on the surface of the closing plate.

[0021] When the present invention is in use, the self-adjusting shaft is driven by a driving source to drive the polishing wheel to rotate for processing ceramics. The self-adjusting shaft can monitor the rotational speed of the polishing wheel and control the opening and closing of the protective gear ring by the rotational speed. When the rotational speed of the polishing wheel is stable, the protective gear ring can be opened to process the ceramics, thereby avoiding the influence of the fluctuation of the polishing wheel rotational speed on the ceramic processing. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The present invention is further described below in conjunction with the accompanying drawings and embodiments.

[0023] Figure 1 It is a schematic diagram of the structure of the present invention;

[0024] Figure 2 It is a schematic diagram of the local structure of the processing workbench of the present invention;

[0025] Figure 3 It is a schematic diagram of the self-adjusting rotating shaft structure of the present invention;

[0026] Figure 4 It is a schematic diagram of the internal structure of the present invention;

[0027] Figure 5 The present invention Figure 4 The enlarged structural diagram at A in the middle;

[0028] Figure 6 The present invention Figure 4 The enlarged structural diagram at B in the middle;

[0029] Figure 7 It is a schematic diagram of the internal structure of the protective gear ring of the present invention;

[0030] Figure 8 It is a schematic diagram of the cross-sectional structure of the processing workbench of the present invention;

[0031] Fig. 9 It is a schematic diagram of the driving structure of the driving slider of the present invention;

[0032] Fig.10 It is a schematic diagram of the internal structure of the present invention when it is in use;

[0033] Fig.11 The present invention Fig.11 The enlarged structural diagram at C in the middle;

[0034] Fig.12 It is a schematic diagram of the structure of the rotating shaft body and the closing plate of the present invention.

[0035] In the figure: 1. workbench body; 2. polishing wheel; 3. self-adjusting shaft; 4. protective ring; 5. driving source; 6. rotating bearing; 7. connecting hole; 8. shaft body; 9. adaptive rod; 10. positioning ring; 11. spray hole; 12. limit plate; 13. temperature sensing layer; 14. control chamber; 15. centrifugal chamber; 16. movable sealing plate; 17. liquid injection box; 18. conducting hole; 19. closing plate; 20. driving slider; 21. movable baffle; 22. conical protrusion; 23. driving convex plate; 24. connecting chamber. DETAILED DESCRIPTION

[0036] Embodiment 1

[0037] like Figure 1 As shown, a processing platform for ceramic products includes a workbench body 1, the upper end surface of the workbench body 1 is fixedly connected to a protective stop ring 4, a driving source 5 is mounted in the middle of the workbench body 1, a polishing wheel 2 is rotatably arranged inside the protective stop ring 4, the driving source 5 is drivingly connected to a self-adjusting shaft 3 for monitoring the rotation state of the polishing wheel 2, and the self-adjusting shaft 3 is drivingly connected to the protective stop ring 4.

[0038] When in use, the self-adjusting shaft 3 is driven by the driving source 5 to drive the polishing wheel 2 to rotate for processing ceramics. The self-adjusting shaft 3 can monitor the rotation speed of the polishing wheel 2, and at the same time control the opening and closing of the protective gear ring 4 by the rotation speed. When the rotation speed of the polishing wheel 2 is stable, the protective gear ring 4 is opened to process the ceramics, thereby avoiding the influence of the rotation speed fluctuation of the polishing wheel 2 on the ceramic processing.

[0039] like Figure 1 - Figure 4 As shown, the self-adjusting shaft 3 includes a shaft body 8, an adaptive rod 9, a positioning ring 10 and a limit plate 12. The shaft body 8 is drivingly connected to the driving source 5. The limit plate 12 is assembled and connected to the end of the shaft body 8 away from the driving source 5. The adaptive rod 9 is fixedly connected to the outer end surface of the shaft body 8. The adaptive rod 9 is fitted with the bottom of the polishing wheel 2. The positioning ring 10 is fixedly connected to the end of the adaptive rod 9 away from the shaft body 8.

[0040] Furthermore, the bottom area of ​​the limiting plate 12 is larger than the rotating shaft body 8, and the limiting plate 12 may be in the shape of a frustum or a prism, and the limiting plate 12 is assembled and connected to the rotating shaft body 8 by bolts or snaps.

[0041] When in use, the polishing wheel 2 is placed between the limit plate 12 and the adaptive rod 9, and the polishing wheel 2 is fit with the adaptive rod 9 through the limit plate 12, so that the polishing wheel 2 is fixed, so that when the rotating shaft body 8 is driven by the driving source 5 to rotate, the polishing wheel 2 can be driven to rotate synchronously, thereby processing the ceramics, and the limit plate 12 is assembled by bolts or snaps, which can facilitate the user to disassemble and replace the polishing wheel 2, and the device is more convenient to use.

[0042] Embodiment 2

[0043] Based on the first embodiment, Figure 1 - Figure 6 As shown, a centrifugal chamber 15 is provided inside the adaptive rod 9 , and a movable sealing plate 16 is slidably connected inside the centrifugal chamber 15 . The movable sealing plate 16 is elastically connected to the inner wall of the centrifugal chamber 15 on one side of the rotating shaft body 8 .

[0044] Furthermore, a plurality of adaptive rods 9 are provided, which are evenly and symmetrically distributed on the side end surface of the rotating shaft body 8 .

[0045] like Figure 1 - Figure 8 As shown, a control chamber 14 is provided inside the protective ring 4 , a movable baffle 21 is movably embedded inside the control chamber 14 , a driving slider 20 for controlling the movement of the movable baffle 21 is elastically connected inside the control chamber 14 , and the control chamber 14 is connected to the centrifugal chamber 15 .

[0046] Furthermore, the protective baffle ring 4 is provided with a notch adapted to the movable baffle 21 .

[0047] When in use, the interior of the centrifugal chamber 15 is elastically slidable with a movable sealing plate 16 through elastic parts such as springs. When the rotating shaft body 8 drives the polishing wheel 2 to rotate, the adaptive rod 9 also rotates synchronously with the polishing wheel 2, and then under the action of centrifugal force, the movable sealing plate 16 will slide inside the centrifugal chamber 15, so that the medium in the centrifugal chamber 15 enters the interior of the control chamber 14, so that the internal pressure of the control chamber 14 increases, thereby driving the movement of the driving slider 20 through the pressure change, and then driving the position of the movable baffle 21. When the polishing wheel 2 reaches the specified speed, the movable baffle 21 can be lowered, so that the protective ring 4 has a gap for ceramic processing. When the speed of the polishing wheel 2 fluctuates and exceeds the preset working speed, the position of the movable sealing plate 16 inside the centrifugal chamber 15 will change, thereby causing the internal pressure of the control chamber 14 to change, and then the driving slider 20 drives the movable baffle 21 to move up, reminding and interrupting the user to continue processing, thereby effectively ensuring the processing accuracy of ceramic processing.

[0048] like Figure 1 - Figure 4 and Figure 7 - Fig. 9 As shown, driving convex plates 23 are provided on both sides of the upper end surface of the driving slider 20 , and the driving convex plates 23 are tightly fitted with the inner wall of the control cavity 14 . A conical protrusion 22 that fits with the driving convex plates 23 is provided at the bottom of the movable baffle 21 .

[0049] When in use, in the initial state, the conical protrusion 22 at the bottom of the movable baffle 21 fits with the driving convex plate 23 on one side of the driving slider 20. As the polishing wheel 2 rotates, the internal pressure of the control chamber 14 increases to push the driving slider 20 to move. When the specified speed is reached, the position of the movable sealing plate 16 is stable. At this time, the conical protrusion 22 fits with the upper surface of the driving slider 20, thereby reducing the height of the movable baffle 21 inside the control chamber 14. When the speed of the polishing wheel 2 fluctuates, the driving slider 20 will slide inside the control chamber 14 and push the movable baffle 21 upward under the action of the driving convex plate 23 to remind the user to stop processing. The spacing between the driving convex plates 23 can be adaptively set according to the speed accuracy that needs to be controlled.

[0050] Furthermore, the driving protrusion 23 is provided with an inclined surface that fits with the driving slider 20, a partition plate is provided in the middle of the control chamber 14, the driving sliders 20 are symmetrically distributed on both sides of the partition plate, and conical protrusions 22 are symmetrically provided at the bottom of the movable baffle 21. Through the symmetrical setting of the conical protrusions 22 and the driving slider 20, the driving slider 20 is more stable during the process of driving the movable baffle 21 to rise or fall.

[0051] like Figure 1 - Figure 6 and Figure 8 As shown, the outer end surface of the positioning ring 10 is rotatably connected to the inner wall of the protective ring 4 through a rotating bearing 6, a connecting cavity 24 is provided inside the rotating bearing 6, the centrifugal cavity 15 is connected to the connecting cavity 24 through a connecting hole 7, and the control cavity 14 is connected to the connecting cavity 24.

[0052] Furthermore, two groups of rotating bearings 6 are provided, which are rotatably connected to the upper and lower parts of the side end surface of the positioning ring 10 respectively. The gap between the rotating bearings 6 forms a connecting cavity 24. The control cavity 14 is provided with a notch connected to the connecting cavity 24. A pressure relief hole is provided at the bottom of one side of the centrifugal cavity 15 that is close to the rotating shaft body 8, so as to facilitate the sliding of the movable sealing plate 16 inside the centrifugal cavity 15.

[0053] When in use, the positioning ring 10 rotates synchronously with the polishing wheel 2, so that a rotating bearing 6 is provided to ensure the stability of the connection between the centrifugal chamber 15 and the control chamber 14. While the rotating bearing 6 rotationally connects the positioning ring 10 with the protective gear ring 4, a connecting chamber 24 is provided inside to complete the connection between the centrifugal chamber 15 and the control chamber 14, so that the internal pressure of the centrifugal chamber 15 can be transmitted to the inside of the control chamber 14 through the connecting chamber 24 during the continuous rotation of the positioning ring 10, and the movable baffle 21 is controlled by the change in the internal pressure of the centrifugal chamber 15, so that the self-adjusting shaft 3 can adaptively control the state of the protective gear ring 4 as the speed changes, and the setting of the connecting chamber 24 ensures that the connection between the centrifugal chamber 15 and the control chamber 14 will not be affected by the rotation of the adaptive rod 9.

[0054] Embodiment 3

[0055] Based on the first and second embodiments, Figure 1 - Figure 6 and Fig.10 - Fig.12 As shown, a liquid injection hole 11 is opened inside the limiting plate 12, and a liquid injection box 17 is rotatably connected to the side end surface of the rotating shaft body 8. One end of the liquid injection hole 11 is opened on the side end surface of the limiting plate 12, and the end of the liquid injection hole 11 away from the limiting plate 12 is connected to the liquid injection box 17.

[0056] Furthermore, the liquid spray hole 11 is tilted at one end that is in contact with the limiting plate 12 to improve the impact effect of the internal pressure processing fluid of the liquid spray hole 11 on the polishing grinding wheel 2. The liquid injection box 17 is connected to a liquid supply pipe.

[0057] When in use, a liquid spray hole 11 is opened inside the limit plate 12, and the liquid spray hole 11 passes through the rotating shaft body 8 and is connected with the liquid injection box 17, so that the processing fluid is transported to the surface of the polishing wheel 2 through the limit plate 12 through the liquid injection box 17, and the limit plate 12 rotates synchronously with the polishing wheel 2 as the rotating shaft body 8 rotates. The processing fluid sprayed through the liquid spray hole 11 can be evenly sprayed on the surface of the polishing wheel 2 under the action of centrifugal force and liquid pressure, which can effectively lubricate the surface of the polishing wheel 2 and improve the cleaning effect of the processing debris on the surface of the polishing wheel 2. The traditional liquid adding method solves the problems of uneven surface coverage and poor debris cleaning, and further improves the effect of ceramic processing.

[0058] like Figure 1 - Figure 6 and Fig.10 - Fig.12 As shown, a temperature-sensitive layer 13 is provided on one side of the adaptive rod 9 that is in contact with the polishing wheel 2, a closing plate 19 is slidably connected to the interior of the rotating shaft body 8, one end of the closing plate 19 passes through the rotating shaft body 8 and extends to the interior of the centrifugal chamber 15 and is fixedly connected to the movable closing plate 16, and a conducting hole 18 adapted to the spray hole 11 is opened on the surface of the closing plate 19.

[0059] When in use, the conduction of the spray hole 11 is controlled by providing a closing plate 19. When the device is turned on, the closing plate 19 moves horizontally inside the rotating shaft body 8 as the movable closing plate 16 moves, so that the conducting hole 18 is connected with the spray hole 11. At this time, the machining fluid can be sprayed through the spray hole 11 to the surface of the polishing wheel 2 for preliminary lubrication. When the polishing wheel 2 reaches the specified speed, the position of the movable closing plate 16 is stable. At this time, the conduction hole 18 is disconnected from the spray hole 11. The centrifugal chamber 15 is provided with a temperature-sensitive layer 13, which is used to sense the temperature of the polishing wheel 2 and transmit it to the inside of the centrifugal chamber 15. The inside of the centrifugal chamber 15 is filled with a medium, and the medium can be a material with a high thermal expansion coefficient such as gas or alcohol. As the temperature of the polishing wheel 2 increases, the internal pressure of the centrifugal chamber 15 will increase, and the driving slider 20 controls the internal pressure of the chamber 14 due to the engagement of the conical protrusion 22 and the driving convex plate 23. The force is stable, thereby increasing the internal pressure of the centrifugal chamber 15, pushing the movable sealing plate 16 back a short distance, so that the conduction hole 18 is connected with the spray hole 11, so that the processing fluid can cool the polishing wheel 2. When the temperature is too high, the internal pressure of the centrifugal chamber 15 is higher than the abutment force between the conical protrusion 22 and the driving convex plate 23, the driving slider 20 continues to move so that the conical protrusion 22 abuts against the upper surface of the driving convex plate 23, so that the movable baffle 21 rises, reminding the user to stop processing to avoid the influence of excessive temperature on the processing accuracy. At this time, you can wait for the polishing wheel 2 to cool naturally, or actively reduce the speed and actively control the conduction hole 18 to be connected with the spray hole 11, and actively cool it through the processing fluid. At the same time, the setting of the adaptive rod 9 can drive the bottom of the polishing wheel 2 to form a vortex airflow when the adaptive rod 9 rotates to actively cool the polishing wheel 2, thereby improving the stability of the polishing wheel 2 working for a long time.

[0060] Working principle: The self-adjusting shaft 3 is driven by the driving source 5 to drive the polishing wheel 2 to rotate for processing ceramics. The self-adjusting shaft 3 can monitor the rotation speed of the polishing wheel 2, and at the same time control the opening and closing of the protective gear ring 4 by the rotation speed. When the rotation speed of the polishing wheel 2 is stable, the protective gear ring 4 is opened to process the ceramics, thereby avoiding the influence of the rotation speed fluctuation of the polishing wheel 2 on the ceramic processing. The polishing wheel 2 is placed between the limit plate 12 and the adaptive rod 9, and the polishing wheel 2 is fit with the adaptive rod 9 through the limit plate 12, so that the polishing wheel 2 is fixed, so that when the shaft body 8 rotates under the drive of the driving source 5, the polishing wheel 2 can be driven to rotate synchronously, thereby processing the ceramics, and the limit plate 12 is assembled by bolts or buckles, which can be easily used. The user can disassemble and replace the polishing wheel 2, and the device is relatively convenient to use. The interior of the centrifugal chamber 15 is elastically slidable with a movable sealing plate 16 through elastic parts such as springs. When the shaft body 8 drives the polishing wheel 2 to rotate, the adaptive rod 9 also rotates synchronously with the polishing wheel 2, and then the movable sealing plate 16 slides inside the centrifugal chamber 15 under the action of centrifugal force, so that the medium in the centrifugal chamber 15 enters the control chamber 14, so that the pressure inside the control chamber 14 increases, thereby driving the movement of the driving slider 20 through the pressure change, and then driving the position of the movable baffle 21. When the polishing wheel 2 reaches the specified speed, the movable baffle 21 can be lowered, so that the protective ring 4 has a gap for ceramic processing. When the speed of the polishing wheel 2 fluctuates and exceeds the preset working speed, The movable sealing plate 16 will change its position inside the centrifugal chamber 15, thereby changing the pressure inside the control chamber 14, and then causing the driving slider 20 to drive the movable baffle 21 to move upward, reminding and interrupting the user's continued processing, thereby effectively ensuring the processing accuracy of ceramic processing. In the initial state, the conical protrusion 22 at the bottom of the movable baffle 21 fits with the driving convex plate 23 on one side of the driving slider 20. As the polishing wheel 2 rotates, the pressure inside the control chamber 14 increases, pushing the driving slider 20 to move. When the specified speed is reached, the position of the movable sealing plate 16 is stable. At this time, the conical protrusion 22 fits with the upper surface of the driving slider 20, thereby reducing the height of the movable baffle 21 inside the control chamber 14. When the speed of the polishing wheel 2 fluctuates, the driving slider 20 will The control chamber 14 slides inside and pushes the movable baffle 21 upward under the action of the driving convex plate 23 to remind the user to stop processing. The spacing between the driving convex plates 23 can be adaptively set according to the speed accuracy that needs to be controlled. The positioning ring 10 rotates synchronously with the polishing wheel 2, so as to ensure the stability of the connection between the centrifugal chamber 15 and the control chamber 14. A rotating bearing 6 is provided. While the rotating bearing 6 rotatably connects the positioning ring 10 with the protective ring 4, a connecting chamber 24 is provided inside to complete the connection between the centrifugal chamber 15 and the control chamber 14, so that the internal pressure of the centrifugal chamber 15 can be transmitted to the inside of the control chamber 14 through the connecting chamber 24 during the continuous rotation of the positioning ring 10, and the movable baffle 21 is controlled by the change of the internal pressure of the centrifugal chamber 15.Thus, the self-adjusting shaft 3 can adaptively control the state of the guard ring 4 as the rotation speed changes, and the setting of the connecting chamber 24 ensures that the connection between the centrifugal chamber 15 and the control chamber 14 will not be affected by the rotation of the adaptive rod 9. The limit plate 12 is provided with a spray hole 11 inside, and the spray hole 11 passes through the shaft body 8 and is connected with the injection box 17, so that the processing fluid is transported to the surface of the polishing wheel 2 through the limit plate 12 through the injection box 17, and the limit plate 12 rotates synchronously with the polishing wheel 2 as the shaft body 8 rotates. The processing fluid sprayed through the spray hole 11 can be evenly sprayed on the surface of the polishing wheel 2 under the action of centrifugal force and liquid pressure, which can effectively While lubricating the surface of the polishing wheel 2, the cleaning effect of the processing debris on the surface of the polishing wheel 2 is improved. The problems of uneven coverage and poor debris cleaning in the traditional liquid adding method on the surface are solved, and the effect of ceramic processing is further improved. The conduction of the spray hole 11 is controlled by providing a closing plate 19. When the device is turned on, the closing plate 19 moves horizontally inside the rotating shaft body 8 as the movable closing plate 16 moves, so that the conducting hole 18 is connected with the spray hole 11. At this time, the processing fluid can be sprayed to the surface of the polishing wheel 2 through the spray hole 11 for preliminary lubrication. When the polishing wheel 2 reaches the specified speed, the position of the movable closing plate 16 is stable. At this time, the conducting hole 18 and the spray hole 11 are connected. The connection is disconnected. Since the centrifugal chamber 15 is provided with a temperature-sensitive layer 13, the temperature-sensitive layer 13 is used to sense the temperature of the polishing wheel 2 and transmit it to the inside of the centrifugal chamber 15. The inside of the centrifugal chamber 15 is filled with a medium. The medium can be a gas or alcohol or other material with a high thermal expansion coefficient. As the temperature of the polishing wheel 2 increases, the pressure inside the centrifugal chamber 15 will increase. The driving slider 20 stabilizes the pressure inside the control chamber 14 due to the engagement of the conical protrusion 22 and the driving convex plate 23, thereby increasing the pressure inside the centrifugal chamber 15 and pushing the movable sealing plate 16 back a short distance, so that the conduction hole 18 is connected with the spray hole 11, so that the processing fluid can cool the polishing wheel 2. When the temperature is too high When the internal pressure of the centrifugal chamber 15 is higher than the contact force between the conical protrusion 22 and the driving convex plate 23, the driving slider 20 continues to move so that the conical protrusion 22 contacts the upper surface of the driving convex plate 23, so that the movable baffle 21 rises, reminding the user to stop processing to avoid excessive temperature affecting the processing accuracy. At this time, you can wait for the polishing wheel 2 to cool naturally, or actively reduce the speed and actively control the connection between the guide hole 18 and the spray hole 11, and actively cool it through the processing fluid. At the same time, the setting of the adaptive rod 9 can drive the bottom of the polishing wheel 2 to form a vortex airflow when the adaptive rod 9 rotates to actively cool the polishing wheel 2, thereby improving the stability of the polishing wheel 2 for long-term operation.

Claims

1. A processing platform for ceramic products, comprising a workbench body, characterized in that: A protective stop ring is fixedly connected to the upper end surface of the workbench body, a driving source is mounted in the middle of the workbench body, the polishing wheel is rotatably arranged inside the protective stop ring, the driving source is drivably connected to a self-adjusting shaft for monitoring the rotation state of the polishing wheel, and the self-adjusting shaft is drivably connected to the protective stop ring.

2. A ceramic product processing platform according to claim 1, characterized in that: The self-adjusting shaft includes a shaft body, an adaptive rod, a positioning ring and a limit plate. The shaft body is driven and connected to a driving source. The limit plate is assembled and connected to one end of the shaft body away from the driving source. The adaptive rod is fixedly connected to the outer end surface of the shaft body. The adaptive rod is fitted with the bottom of the polishing wheel. The positioning ring is fixedly connected to one end of the adaptive rod away from the shaft body.

3. A ceramic product processing platform according to claim 2, characterized in that: A centrifugal cavity is provided inside the adaptive rod, and a movable sealing plate is slidably connected inside the centrifugal cavity. The movable sealing plate is elastically connected to the inner wall of the centrifugal cavity on one side of the rotating shaft body.

4. A ceramic product processing platform according to claim 3, characterized in that: A control cavity is provided inside the protective baffle ring, a movable baffle is movably embedded inside the control cavity, a driving slider for controlling the movement of the movable baffle is elastically connected inside the control cavity, and the control cavity is communicated with the centrifugal cavity.

5. A ceramic product processing platform according to claim 4, characterized in that: Driving convex plates are arranged on both sides of the upper end surface of the driving slider, and the driving convex plates are tightly fitted with the inner wall of the control cavity. A conical protrusion adapted to the driving convex plates is arranged at the bottom of the movable baffle.

6. A ceramic product processing platform according to claim 4, characterized in that: The outer end surface of the positioning ring is rotatably connected to the inner wall of the protective ring through a rotating bearing, a connecting cavity is provided inside the rotating bearing, the centrifugal cavity is connected to the connecting cavity through a connecting hole, and the control cavity is connected to the connecting cavity.

7. A ceramic product processing platform according to claim 6, characterized in that: A liquid injection hole is provided inside the limit plate, a liquid injection box is rotatably connected to the side end surface of the shaft body, one end of the liquid injection hole is provided on the side end surface of the limit plate, and the end of the liquid injection hole away from the limit plate is connected to the liquid injection box.

8. A ceramic product processing platform according to claim 7, characterized in that: A temperature-sensitive layer is provided on the side where the adaptive rod is in contact with the polishing wheel, and a closing plate is slidably connected to the interior of the rotating shaft body. One end of the closing plate passes through the rotating shaft body and extends to the interior of the centrifugal chamber and is fixedly connected to the movable closing plate. A conducting hole adapted to the spray hole is opened on the surface of the closing plate.

Images