Method for preparing crater glass cover plate by etching and crater glass cover plate

Abstract

The invention provides a method for preparing a crater glass cover plate through etching and the crater glass cover plate, and the method comprises the steps: pasting an acid-resistant protective film on a preset crater area on the surface of the glass cover plate, and forming etching protection on the preset crater area; etching the glass cover plate coated with the acid-resistant protective film under the condition of keeping swinging and rotating at the same time, and thinning the surface of the glass cover plate except the preset crater area; after the etched glass cover plate is washed clean, the acid-resistant protective film is removed, and the crater glass cover plate is obtained. According to the method for preparing the crater glass cover plate by etching and the crater glass cover plate provided by the invention, the surface, except the preset crater area, on the glass cover plate is greatly thinned by a flow etching process, so that the glass cover plate with the crater structure is obtained; therefore, the defects that when the crater glass cover plate is prepared by an existing method, the crater position cannot be formed in place, edge collapse is easily caused, and the yield is low are overcome.

Description

Technical Field

[0001] The invention relates to the technical field of glass etching, and in particular to a method for etching and preparing a crater glass cover plate and a crater glass cover plate. Background Art

[0002] The so-called crater refers to the raised shape of the camera hole of the glass cover. Since the crater surface of the crater glass cover is higher than its surface, this type of glass cover is also called unequal thickness 2D glass cover.

[0003] At present, in the process of making crater glass cover plates on the market, machining is used to cold carve the large surface of the glass cover plate, and then the large surface of the glass cover plate is ground down by matching the corresponding grinding head with the CNC machine: on the one hand, this process not only has certain requirements on the equipment but also needs to match the grinding head of corresponding specifications. On the other hand, this process not only has a long processing procedure, but also the crater position cannot be formed in place, which is easy to cause edge collapse, and causes many product defects during the production process, affecting the yield of the production process. Summary of the invention

[0004] Based on the technical problems existing in the background technology, the present invention proposes a method for etching to prepare a crater glass cover plate and a crater glass cover plate, and the surface of the glass cover plate except for a preset crater area is greatly thinned through a flow etching process, so as to obtain a glass cover plate with a crater structure, thereby overcoming the defects of the existing method for preparing the crater glass cover plate, such as the crater position cannot be formed in place, easy to cause edge collapse, and low yield rate.

[0005] The present invention provides a method for etching and preparing a crater glass cover plate, comprising the following steps:

[0006] S1. Covering the preset crater area on the surface of the glass cover plate with an acid-resistant protective film to form etching protection for the preset crater area;

[0007] S2, etching the glass cover plate covered with the acid-resistant protective film while simultaneously shaking and rotating, so as to achieve thinning of the surface of the glass cover plate except for the preset crater area;

[0008] S3, after rinsing the etched glass cover plate, removing the acid-resistant protective film, thus obtaining the crater glass cover plate.

[0009] In the present invention, an acid-resistant protective film is first formed on the preset crater area on the surface of the glass cover plate to shield and protect the preset crater area, and then the surface of the glass cover plate is locally thinned by an innovative flow etching method. The glass cover plate is flow-etched while maintaining swing and rotation conditions, thereby achieving large-surface thinning and objectively forming high-precision cutting of the crater. Thereafter, the acid-resistant protective film is peeled off to obtain the crater glass cover plate;

[0010] The above method of the present invention can effectively obtain the required unequal thickness crater structure, and no microcracks will occur in the preparation process, and no grinding, polishing and repair processing are required. The R angle of the unequal thickness crater is also uniform and smooth, the crater has an obvious three-dimensional effect, and the edge feels smooth. The whole method is simple and convenient, and the yield rate is high.

[0011] Preferably, in step S1, the acid-resistant protective film is made of at least one of PVC, PP, PE or PET, and has a thickness of preferably 0.1-1 mm.

[0012] Preferably, step S2 specifically includes: placing the glass cover plate covered with the acid-resistant protective film in an etching device, driving the glass cover plate to swing left and right while continuously rotating, and spraying etching liquid onto the surface of the glass cover plate where the crater is preset.

[0013] Preferably, the angle of spraying the etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located, and the temperature of the etching liquid is 25-35°C.

[0014] In the actual working process, the etching equipment is controlled to make the glass cover plate swing left and right at a frequency of 10-15 Hz, a rotation speed of 5-10 Hz, and a spray pressure of 30-40 Hz.

[0015] In the present invention, etching is performed while maintaining swinging and rotating at the same time, and the glass cover plate that swings left and right and rotates is etched by a top spraying method in which etching liquid is sprayed in a direction parallel to the surface of the glass cover plate directly above. During this period, the glass cover plate swings left and right at a certain frequency in the etching equipment, and continuously rotates at a certain frequency at the same time, and the parameters such as the temperature and direction of the etching liquid are controlled, so as to finally obtain the required unequal thickness craters and the required crater bottom R angle and crater arc edge width.

[0016] Preferably, the etching solution comprises, by weight percentage: 1-5% hydrofluoric acid, 5-30% fluoride salt, 5-10% inorganic acid, 1-5% crown ether surfactant, 0.1-1% anionic surfactant, and the balance water;

[0017] Preferably, the crown ether surfactant is a polyethylene glycol-grafted crown ether, which is formed by condensing an amino crown ether and polyethylene glycol.

[0018] In the present invention, hydrofluoric acid and fluoride salt are the main components for etching the glass surface, the inorganic acid has the function of promoting the cleaning and etching of the glass cover plate, the crown ether surfactant is formed by chemically grafting the crown ether group and polyethylene glycol, and because the crown ether group can better form a chelate with the metal ions generated during etching, making it easier to be dissolved in water, it can effectively solve the problem of the insolubility of by-products in the etching process, avoid the product from adhering to the surface of the glass substrate, improve the etching rate and etching effect, and improve the etching depth of the large surface of the glass cover plate; the anionic surfactant has the function of cooperating with the crown ether surfactant to reduce the surface tension of the etching solution, so it can play a role in cleaning the glass surface;

[0019] The present invention utilizes the etching liquid to etch the glass cover plate, and can quickly and efficiently etch a large surface and deep into the glass, thereby improving the efficiency of preparing the crater cover plate glass.

[0020] Preferably, the fluoride salt is at least one of ammonium fluoride, potassium fluoride or lithium fluoride, the inorganic acid is at least one of hydrochloric acid, sulfuric acid or nitric acid, and the anionic surfactant is at least one of sodium dodecyl sulfate, sodium hexadecyl sulfate, sodium octadecyl sulfate, dioctyl sodium succinate or sodium dodecylbenzene sulfonate.

[0021] Preferably, in step S3, removing the acid-resistant protective film specifically comprises: peeling off the acid-resistant protective film from the glass cover plate under light, and cleaning the remaining traces.

[0022] Preferably, the method further comprises step S4, post-processing the crater glass cover plate;

[0023] Preferably, the post-processing includes cutting and chemical strengthening.

[0024] The present invention also provides a crater glass cover plate, which is prepared by the above method.

[0025] Beneficial effects:

[0026] In the present invention, an acid-resistant protective layer is first formed in a preset crater area on the surface of the glass cover plate, and then the glass cover plate is thinned on a large surface by flow etching, and finally the acid-resistant protective layer is peeled off to realize the preparation of the crater glass cover plate.

[0027] In the present invention, an innovative flow etching process is used to obtain a smooth glass cover plate with good large-surface uniformity, avoiding the defects of large-surface unevenness and limited thinning thickness caused by the traditional etching process; the method of the present invention improves the yield, saves costs, and increases production capacity. The R angles of craters of unequal thickness are uniform and smooth, the product craters have obvious three-dimensional effects, and the edges feel smooth. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 This is a schematic diagram of the R angle of the crater glass cover plate described in Example 1;

[0029] Figure 2 This is a schematic diagram of the finished product of the crater glass cover described in Example 1. DETAILED DESCRIPTION

[0030] The technical solutions of the present invention are described in detail below through specific embodiments. However, it should be clearly stated that these embodiments are for illustration only and are not to be construed as limiting the scope of the present invention.

[0031] Example 1

[0032] This embodiment provides a method for etching and preparing a crater glass cover plate, specifically comprising:

[0033] (1) Cutting a 2 mm thick glass raw material into a 400×500 mm medium sheet, cleaning it and using it as a glass cover plate, and pasting a polyurethane acid-resistant UV anti-adhesive film on one side of the glass cover plate to a preset crater area on the glass cover plate by pasting, thereby forming etching protection;

[0034] (2) After the edge of the glass cover plate covered with the acid-resistant UV anti-viscosity film is fixed by a clamp, it is placed in an etching device, the glass cover plate is driven to swing left and right while continuously rotating, and an etching liquid is sprayed on the side of the glass cover plate where the preset crater is located, the angle of spraying the etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located, the etching liquid temperature is 30° C., and the etching liquid includes, by weight percentage: 3% hydrofluoric acid, 18% ammonium fluoride, 7% hydrochloric acid, 3% crown ether surfactant, 0.6% sodium dodecyl sulfate, and the remainder water, so that the surface of the glass cover plate except the preset crater area is thinned until the glass cover plate is thinned to a thickness of 0.57 μm;

[0035] The specific preparation method of the crown ether surfactant comprises: adding polyethylene glycol (PEG-400) to anhydrous dioxane, heating to 60°C, adding pyridine (50% by weight of the polyethylene glycol) and thionyl chloride (1 times by weight of the polyethylene glycol), heating and refluxing for 2 hours, adding ice water, separating and concentrating to obtain chloromethylated polyethylene glycol; dissolving the chloromethylated polyethylene glycol in dichloromethane, adding triethylamine (5% by weight of the polyethylene glycol) and 4'-aminobenzo-18-crown-6 (20% by weight of the polyethylene glycol), heating and refluxing for 12 hours, and concentrating to obtain the crown ether surfactant;

[0036] (3) After rinsing the etched glass cover, use 250mJ / cm 2The acid-resistant UV anti-viscosity film is separated from the glass cover plate by ultraviolet irradiation. After the acid-resistant UV anti-viscosity film is peeled off, ultrasonic cleaning and drying are performed to obtain the crater glass cover plate.

[0037] Figure 1 This is a schematic diagram of the R angle of the crater glass cover plate described in Example 1, referring to Figure 1 It can be seen that the R angle of the unequal thickness crater on the glass cover is 2.0, uniform and smooth.

[0038] Figure 2 This is a schematic diagram of the finished product of the crater glass cover plate described in Example 1, referring to Figure 2 It can be seen that the crater has a significant three-dimensional effect and the edges feel smooth.

[0039] Example 2

[0040] This embodiment also provides a method for etching and preparing a crater glass cover plate, which specifically includes:

[0041] (1) Cutting a 2 mm thick glass raw material into a 400×500 mm medium sheet, cleaning it and using it as a glass cover plate, and pasting a polyurethane acid-resistant UV anti-adhesive film on one side of the glass cover plate to a preset crater area on the glass cover plate by pasting, thereby forming etching protection;

[0042] (2) Fixing the edge of the glass cover plate with the acid-resistant UV anti-viscosity film with a clamp, placing it in an etching device, driving the glass cover plate to swing left and right while continuously rotating, and spraying etching liquid on the side of the glass cover plate where the preset crater is located, the angle of spraying the etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located, the temperature of the etching liquid is 37° C., and the etching liquid includes, by weight percentage: 1% hydrofluoric acid, 30% potassium fluoride, 5% nitric acid, 5% crown ether surfactant, 0.1% sodium hexadecyl sulfate, and the remainder water, so that the surface of the glass cover plate except the preset crater area is thinned until the glass cover plate is thinned to a thickness of 0.57 μm;

[0043] The specific preparation method of the crown ether surfactant is shown in Example 1;

[0044] (3) After rinsing the etched glass cover, use 250mJ / cm 2 The acid-resistant UV anti-viscosity film is separated from the glass cover plate by ultraviolet irradiation. After the acid-resistant UV anti-viscosity film is peeled off, ultrasonic cleaning and drying are performed to obtain the crater glass cover plate.

[0045] Example 3

[0046] This embodiment also provides a method for etching and preparing a crater glass cover plate, which specifically includes:

[0047] (1) Cutting a 2 mm thick glass raw material into a 400×500 mm medium sheet, cleaning it and using it as a glass cover plate, and pasting a polyurethane acid-resistant UV anti-adhesive film on one side of the glass cover plate to a preset crater area on the glass cover plate by pasting, thereby forming etching protection;

[0048] (2) Fixing the edge of the glass cover plate with the acid-resistant UV anti-viscosity film with a clamp, placing it in an etching device, driving the glass cover plate to swing left and right while continuously rotating, and spraying etching liquid on the side of the glass cover plate where the preset crater is located, the angle of spraying the etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located, the temperature of the etching liquid is 25° C., and the etching liquid includes, by weight percentage: 5% hydrofluoric acid, 5% lithium fluoride, 10% hydrochloric acid, 1% crown ether surfactant, 1% sodium dodecylbenzene sulfonate, and the remainder water, so that the surface of the glass cover plate except the preset crater area is thinned until the glass cover plate is thinned to a thickness of 0.57 μm;

[0049] The specific preparation method of the crown ether surfactant is shown in Example 1;

[0050] (3) After rinsing the etched glass cover, use 250mJ / cm 2 The acid-resistant UV anti-viscosity film is separated from the glass cover plate by ultraviolet irradiation. After the acid-resistant UV anti-viscosity film is peeled off, ultrasonic cleaning and drying are performed to obtain the crater glass cover plate.

[0051] Comparative Example 1

[0052] This comparative example proposes a method for preparing a crater glass cover by etching. The specific method is referred to Example 1, except that in step (2), the etching solution comprises, by weight percentage, 3% hydrofluoric acid, 18% ammonium fluoride, 7% hydrochloric acid, 0.6% sodium dodecyl sulfate, and the remainder water, so that the surface of the glass cover except for the preset crater area is thinned.

[0053] Comparative Example 2

[0054] This comparative example proposes a method for preparing a crater glass cover by etching. The specific method is as described in Example 1, except that in step (2), the etching solution comprises, by weight percentage, 3% hydrofluoric acid, 18% ammonium fluoride, 7% hydrochloric acid, 2.5% polyethylene glycol (PEG-400), 0.5% 4'-aminobenzo-18-crown ether-6, 0.6% sodium dodecyl sulfate, and the remainder water, so that the surface of the glass cover except the preset crater area is thinned.

[0055] The etching rate, thickness non-uniformity and actual effect of the crater glass cover plates obtained in the examples and comparative examples were tested, and the results are shown in Table 1 below:

[0056] Table 1 Etching effect data of the crater glass cover plate of the embodiment and the comparative example

[0057]

[0058] It can be seen from Table 1 above that the present invention innovates the flow etching process to obtain a smooth glass cover plate with good uniformity over a large surface.

[0059] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A method for preparing a crater glass cover by etching, characterized in that: The steps include: S1. Covering the preset crater area on the surface of the glass cover plate with an acid-resistant protective film to form etching protection for the preset crater area; S2, etching the glass cover plate covered with the acid-resistant protective film while simultaneously shaking and rotating, so as to achieve thinning of the surface of the glass cover plate except for the preset crater area; S3, after rinsing the etched glass cover plate, removing the acid-resistant protective film, thus obtaining the crater glass cover plate.

2. The method for preparing a crater glass cover by etching according to claim 1, characterized in that: In step S1, the material of the acid-resistant protective film is at least one of PVC, PP, PE or PU.

3. The method for preparing a crater glass cover by etching according to claim 1 or 2, characterized in that: Step S2 specifically includes: placing the glass cover plate covered with the acid-resistant protective film in an etching device, driving the glass cover plate to swing left and right while continuously rotating, and spraying etching liquid onto the surface of the glass cover plate where the crater is preset.

4. The method for preparing a crater glass cover by etching according to claim 3, characterized in that: The angle of spraying the etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located, and the temperature of the etching liquid is 25-35°C.

5. The method for preparing a crater glass cover by etching according to claim 3 or 4, characterized in that: The etching solution comprises, by weight percentage: 1-5% hydrofluoric acid, 5-30% fluoride salt, 5-10% inorganic acid, 1-5% crown ether surfactant, 0.1-1% anionic surfactant, and the balance water; Preferably, the crown ether surfactant is a polyethylene glycol-grafted crown ether, which is formed by condensing a hydroxy crown ether and polyethylene glycol.

6. The method for preparing a crater glass cover by etching according to claim 5, characterized in that: The fluoride salt is at least one of ammonium fluoride, potassium fluoride or lithium fluoride, the inorganic acid is at least one of hydrochloric acid, sulfuric acid or nitric acid, and the anionic surfactant is at least one of sodium dodecyl sulfate, sodium hexadecyl sulfate, sodium octadecyl sulfate, dioctyl sodium succinate or sodium dodecylbenzene sulfonate.

7. The method for preparing a crater glass cover plate by etching according to any one of claims 1 to 6, characterized in that: In step S3, the removal of the acid-resistant protective film specifically includes: peeling off the acid-resistant protective film from the glass cover plate under light, and cleaning the remaining traces.

8. The method for preparing a crater glass cover plate by etching according to any one of claims 1 to 7, characterized in that: The method further comprises step S4, post-processing the crater glass cover plate; Preferably, the post-processing includes cutting and chemical strengthening.

9. A crater glass cover, prepared by the method according to any one of claims 1 to 8.

Images