Field anti-plasma dynamic formation device and method

Abstract

The present invention discloses a device and method for dynamically forming field anti-plasma, belonging to the field of plasma technology. The device includes a collision fusion zone and two formation zones at both ends thereof; the formation zone includes a vacuum chamber, a main discharge coil, a bias coil, and an ionization coil; the main discharge coil is wound on the outer surface of the vacuum chamber; the bias coil is wound on the outside of the main discharge coil; the ionization coil is arranged perpendicular to the main discharge coil and the bias coil; the bias circuit simultaneously passes reverse currents through multiple bias coils, and the bias coils generate reverse magnetic fields in the vacuum chamber; the ionization coils form a rotating magnetic field, ionize the gas in the vacuum chamber, and generate plasma; the main discharge branch passes forward currents through the main discharge coils, and the main discharge coils generate an axial gradient forward magnetic field, dynamically forming field anti-plasma, and collision fusion occurs in the collision fusion zone. This improves the reliability and stability of the power supply operation and the repeatability of the dynamic formation of field anti-plasma.

Description

Technical Field

[0001] The present invention belongs to the field of plasma technology, and more specifically, relates to a device and method for dynamically forming a field anti-plasma. Background Art

[0002] Field-reversed configuration is an innovative magnetic confinement concept in fusion research, attracting much attention for its potential in high-beta operation and compact device design. Field-reversed configuration plasmas are known for their dominant poloidal magnetic field and smaller toroidal magnetic field. This compact annular structure makes them easier to transport and translate. This feature is not only beneficial for engineering construction and diagnostic layout, but also enables the FRC to effectively separate the formation zone, compression zone and other regions within the device, thereby optimizing the design of the experimental device. Based on the field-reversed theta pinch (FRTP) technology, the easy transport and translation characteristics of the FRC have been applied to experimental studies of transport and collision fusion, showing broad application prospects in the fields of space propulsion and fusion energy.

[0003] The existing field-inverted θ-pinch dynamic FRC formation device is mainly composed of a vacuum chamber, a θ-pinch coil group and a magnetic mirror coil. The formation process can be summarized into four steps: first, a certain amount of neutral gas is injected into the vacuum chamber, and the θ-pinch coil is discharged at the same time to apply an initial bias magnetic field in the vacuum chamber; when the bias magnetic field reaches the maximum, the θ-pinch coil is discharged again to generate a high-frequency oscillating magnetic field in the vacuum, which will ionize the gas in the vacuum chamber and freeze the bias magnetic field; then the current flowing through the θ-pinch coil is allowed to rise rapidly in a time sequence, so that the plasma in the chamber forms FRC while ejecting to one side, thereby achieving the purpose of dynamic formation. The typical power supply topology of the field-inverted θ-pinch is as follows: Figure 1 As shown, it includes a bias (Bias) branch, a pre-ionization (PI) branch, a field inversion (Main) branch, and a freewheeling (Crowbar) branch. When the power supply is working, capacitors C1, C2, and C3 are first charged to the set voltage value, and then switches S1, S2, and S3 are turned on in sequence to discharge the θ-pinch coil, and finally switch S4 is turned on to complete the freewheeling. Among them, hydrogen thyristors are generally used as switches for S1-S4. The entire power supply works in the pulse discharge mode, and will eventually flow through the θ-pinch coil as shown. Figure 2 The current shown.

[0004] However, existing circuits, where the branches are directly connected in parallel, exhibit severe mutual coupling. For example, if the preionization and field reversal branches are directly connected in parallel, the impedance between the branches is very low. This results in severe oscillatory coupling between the two branches during discharge, resulting in voltage and current spikes. This not only places higher demands on the capacitance of the two branches and the withstand voltage and inrush current parameters of the hydrogen thyristors, but can also affect the proper timing conduction of the hydrogen thyristors in both branches, severely impacting the reliability of the power supply. Furthermore, due to the high voltage and current parameters of the formation zone power supply, pulsed high-voltage switches are generally used, which are complex to drive. Using a large number of switches can compromise discharge reliability and repeatability. Therefore, the design of the formation zone power supply should minimize the circuit structure and minimize the use of pulsed high-voltage switches. During the dynamic formation process of plasma, the final mass is influenced by factors such as ionization and reverse field injection, processes that are closely related to the quality of the power supply discharge and the accuracy of the timing control.

[0005] Therefore, the branches of the existing plasma generation circuit are directly connected in parallel, resulting in severe mutual coupling, which leads to higher requirements for electronic components, increases the cost of the device, and causes poor quality of plasma generation. Summary of the Invention

[0006] In response to the defects of the related art, the purpose of the present invention is to provide a field anti-plasma dynamic formation device and method, aiming to solve the problem that the branches of the existing plasma generation circuit are directly connected in parallel, there is serious mutual coupling, which leads to higher requirements for electronic components, increased device costs, and poor plasma generation quality.

[0007] To achieve the above objectives, in a first aspect, the present invention provides a field counter plasma dynamic formation device, comprising two formation zones and a collision fusion zone, wherein the two formation zones are arranged at both ends of the collision fusion zone;

[0008] The formation area includes a vacuum chamber, a main discharge coil, a bias coil and an ionization coil;

[0009] The main discharge coil is wound on the outer surface of the vacuum chamber; the bias coil is wound on the outside of the main discharge coil; the ionization coil is arranged perpendicular to the main discharge coil and the bias coil;

[0010] The ionization coil is used to form a rotating magnetic field to ionize the gas in the vacuum chamber to generate plasma;

[0011] A bias circuit is connected in series to the bias coils, and the bias circuit is used to simultaneously pass reverse currents through the bias coils; the bias coils are used to generate reverse magnetic fields in the vacuum chamber;

[0012] Each main discharge coil is connected to a main discharge branch and a freewheeling branch in parallel; the main discharge branch is used to pass a forward current into the corresponding main discharge coil; the main discharge coil is used to generate an axial gradient forward magnetic field in the vacuum chamber to dynamically form a field-inverted plasma; the freewheeling branch is automatically connected when the current of the main discharge coil is maximum, and is used to reduce the current of the main discharge coil;

[0013] The anti-configuration plasma undergoes collision and fusion in the collision and fusion zone.

[0014] Optionally, the device further comprises an end chamber, wherein the end chambers are respectively located outside the two forming areas;

[0015] The end chamber is used to increase the space at both ends of the vacuum chamber and reduce the contact between the plasma and the vacuum chamber wall.

[0016] Optionally, each of the ionization coils is composed of two groups of identical coils, and the coils of each group differ by 90°.

[0017] Optionally, the main discharge branch is composed of a main discharge capacitor Cmain and a hydrogen thyristor switch Smain connected in series;

[0018] The freewheeling branch is composed of a DC diode Dcrowbar and a freewheeling resistor Rcrowbar connected in series.

[0019] Optionally, the turn-on time interval of the hydrogen thyristor switches Smain in the main discharge branches of two adjacent main discharge coils is in the range of 1-3 μs.

[0020] Optionally, the bias circuit is composed of a capacitor Cbias and a hydrogen thyristor switch Sbias connected in series.

[0021] Optionally, one forming zone includes 12 main discharge coils, 6 ionization coils and 12 bias coils.

[0022] In a second aspect, the present invention further provides a method for dynamically forming a field-reverse plasma, which is applied to the apparatus for dynamically forming a field-reverse plasma as described in any one of the first aspects, comprising:

[0023] S1. Turning on the bias circuit, which feeds a reverse current into the bias coil, causes the bias coil to generate a reverse magnetic field in the vacuum chamber, providing an initial bias magnetic field.

[0024] S2. Turning on the ionization coil to form a rotating magnetic field to ionize the gas in the vacuum chamber and generate a plasma whose internal magnetic field is the initial bias magnetic field;

[0025] S3. According to the distance of each main discharge coil from the central collision and fusion zone, the main discharge coils are connected in sequence from far to near. The main discharge coil group generates an axial gradient positive magnetic field in the vacuum chamber to dynamically form a field-inverted plasma. When the current of the main discharge coil group reaches the maximum value in turn, the corresponding freewheeling branch is automatically connected, the current in the main discharge coil group decreases in turn, and the field-inverted plasma enters the collision and fusion zone to form a fusion field-inverted plasma.

[0026] Compared with the prior art, the above technical solutions conceived by the present invention can achieve the following beneficial effects:

[0027] 1. The present invention provides a device for the dynamic formation of field-back plasma, with independent branch circuits. Generally speaking, the bias circuit voltage is lower than that of the main discharge circuit. Compared to existing solutions in which the bias circuit and main discharge circuit are connected in parallel, the required circuit component withstand voltage is selected based on the maximum branch voltage. In this solution, component parameters can be flexibly selected based on the actual conditions of each branch during use, resulting in a simple device structure and reduced costs. Furthermore, the branches of this solution are independent of each other, eliminating the shunting phenomenon found in existing solutions. Therefore, using components with the same parameters, this solution can achieve greater current in the coil, resulting in higher power efficiency, thereby improving discharge reliability and stability, and enhancing the quality of the generated plasma.

[0028] 2. The present invention provides a field reverse plasma dynamic formation device, which uses hydrogen thyristor as a pulse high-voltage switch. The driving process is relatively complex, and there is a certain failure rate in triggering conduction. The conduction probability of a single hydrogen thyristor is about 90%. In the existing solution, because the four branches are connected in parallel, the overall discharge success rate is about 65% (90%). 4 ), in this solution, by decoupling the original coil and circuit, the use of hydrogen thyratron is reduced, the discharge success rate can be increased to 80-90%, which greatly improves the discharge reliability and the quality of the generated field anti-plasma. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 This is a typical power supply topology diagram of the inverse θ-pinch in the existing technology;

[0030] Figure 2 Schematic diagram of typical current waveform of the discharge of the field reverse θ-pinch power supply in the prior art;

[0031] Figure 3 Schematic diagram of a field counter plasma dynamic formation device provided by an embodiment of the present invention;

[0032] Figure 4 Schematic diagram of a formation area of ​​a field counter plasma dynamic formation device provided by an embodiment of the present invention;

[0033] Figure 5 is a side view of a formation region of a field counter plasma dynamic formation device provided by an embodiment of the present invention;

[0034] Figure 6 It is a partial isometric view of a main discharge coil and a bias coil in a formation region of a field counter plasma dynamic formation device provided by an embodiment of the present invention;

[0035] Figure 7 1 is a schematic diagram of a bias coil assembly circuit provided by an embodiment of the present invention;

[0036] Figure 8 This is a schematic diagram of a single main discharge coil circuit provided by an embodiment of the present invention;

[0037] Figure 9 Schematic diagram of the process of dynamically forming a field counter plasma according to an embodiment of the present invention, wherein (a), (b), and (c) are schematic diagrams of the process corresponding to different moments;

[0038] Figure 10 1 is a comparative schematic diagram of the formation area circuit and coil corresponding to the prior art and the embodiment of the present invention.

[0039] In all the drawings, the same figure numbers are used to represent the same elements or structures, among which, 1-vacuum chamber; 2-main discharge coil; 3-bias coil; 4-ionization coil; 5-end chamber; 6-formation area; 7-collision fusion area; 8-magnetic mirror coil; 9-magnetic lines; 10-plasma; 11-main discharge branch; 12-freewheeling branch. DETAILED DESCRIPTION

[0040] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely for the purpose of explaining the present invention and are not intended to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.

[0041] The contents involved in the above embodiment are described below in conjunction with a preferred embodiment.

[0042] Example 1

[0043] like Figure 3 and Figure 4 As shown, the present invention provides a field counter plasma dynamic forming device, comprising two forming regions 6 and a collision fusion region 7, wherein the two forming regions 6 are arranged at both ends of the collision fusion region 7;

[0044] The forming area 6 includes a vacuum chamber 1, a main discharge coil 2, a bias coil 3 and an ionization coil 4;

[0045] The main discharge coil 2 is wound on the outer surface of the vacuum chamber 1; the bias coil 3 is wound on the outside of the main discharge coil 2; the ionization coil 4 is arranged perpendicular to the main discharge coil 2 and the bias coil 3;

[0046] The ionization coil 4 is used to form a rotating magnetic field to ionize the gas in the vacuum chamber 1 to generate plasma;

[0047] A plurality of bias coils 3 are connected in series and then connected to a bias circuit, wherein the bias circuit is used to simultaneously pass a reverse current through the plurality of bias coils 3, and the bias coils 3 are used to generate a reverse magnetic field in the vacuum chamber;

[0048] Each main discharge coil 2 is connected to a main discharge branch 11 and a freewheeling branch 12 in parallel; the main discharge branch 11 is used to pass a forward current into the corresponding main discharge coil 2; the main discharge coil is used to generate an axial gradient forward magnetic field in the vacuum chamber 1 to dynamically form a field-inverted plasma; the freewheeling branch 12 is automatically connected when the current of the main discharge coil 2 is maximum, and is used to reduce the current of the main discharge coil 2;

[0049] The anti-configuration plasma undergoes collision and fusion in the collision and fusion zone 7 .

[0050] The temperature and density of the fusion field anti-configuration plasma generated in the collision fusion zone 7 are greater than the temperature and density of the field anti-configuration plasma.

[0051] An embodiment of the present invention provides a field-reverse plasma dynamic formation device, which aims to solve the problem of low power supply reliability in the prior art. In the prior art, since the branches of the circuit are directly connected in parallel, there is serious mutual coupling, which affects the reliability of the power supply. In addition, the hydrogen thyristor switch used in the prior art is complex to drive, and the discharge reliability and repeatability are poor, while the quality of the field-reverse configuration requires high accuracy and repeatability of the power supply. This embodiment improves the reliability and stability of the power supply by decoupling the four branches of bias (Bias), pre-ionization (PI), field reverse (Main) and freewheeling (Crowbar) in the dynamic formation process, thereby improving the parameters and repeatability of the final formation of the field-reverse configuration plasma.

[0052] like Figure 4 、 Figure 5 and Figure 6As shown, the field counter plasma dynamic formation device includes a vacuum chamber 1, a main discharge coil group consisting of multiple main discharge coils 2, a bias coil group consisting of multiple bias coils 3, and an ionization coil consisting of multiple ionization coils 4. The bias coils 3 and the main discharge coils 2 are arranged in a double layer, with each bias coil 3 located outside the main discharge coil 2 and placed perpendicular to the ionization coil 4.

[0053] First, the bias circuit is turned on so that a reverse current flows into the bias coil 3, and an appropriate amount of gas is injected into the vacuum chamber 1. Then, the ionization coil 4 is started to generate a rotating magnetic field to ionize the gas in the vacuum chamber 1 and generate plasma. The main discharge branch 11 connected to each main discharge coil 2 is triggered and turned on according to a specific timing, so that a forward current flows into the main discharge coil 2 group according to the timing, forming a field anti-plasma in the vacuum chamber 1 and ejecting it toward the collision and fusion zone 7 in the middle. Finally, when the current of the main discharge coil 2 reaches the highest point, the freewheeling branch 12 of each main discharge coil 2 is actively turned on in turn, and the current slowly decreases to zero. Finally, the field anti-configuration plasma dynamically formed in the formation zone 6 on both sides is ejected into the collision and fusion zone 7 in the middle for collision and fusion.

[0054] The bias circuit is composed of a capacitor Cbias and a hydrogen thyristor switch Sbias connected in series; the main discharge branch 11 is composed of a main discharge capacitor Cmain and a hydrogen thyristor switch Smain connected in series;

[0055] The freewheeling branch 12 is composed of a DC diode Dcrowbar and a freewheeling resistor Rcrowbar connected in series.

[0056] During operation, the hydrogen thyristor switch Sbias in the bias circuit is turned on, and the reverse-connected capacitor Cbias discharges, causing a reverse current to flow into the bias coil 3. The bias coil circuit diagram is shown in FIG. Figure 7 As shown, multiple bias coils are connected in series to increase the coil self-inductance. The value of the external inductance Lbias is determined according to the mutual inductance generated by the main discharge coil and the bias coil in the actual process.

[0057] Each ionization coil consists of two sets of identical coils, each set of coils is 90 degrees apart. When the reverse current in the bias coil reaches its maximum, the ionization coil starts to work, generating a rotating magnetic field, thereby ionizing the gas in the vacuum chamber and generating a density of about 10 19-20 m -3 The plasma is ionized, and the magnetic field strength inside the plasma is the initial bias magnetic field; each set of coils differs by 90°, making the distribution of the ionized plasma in the vacuum chamber more uniform.

[0058] The circuit diagram of a single main discharge coil is as follows: Figure 8As shown, each coil is connected to two branches, a main discharge branch 11 and a freewheeling branch 12. The main discharge branch 11 is generally composed of a main discharge capacitor Cmain and a hydrogen thyristor switch Smain, and the freewheeling branch 12 is composed of a DC diode Dcrowbar and a freewheeling resistor Rcrowbar connected in series.

[0059] The specific operation process of the dynamic formation method in the formation zone is as follows: triggering the hydrogen thyristor switch Sbias in the bias circuit to discharge the capacitor Cbias, causing a reverse current to flow into the coil, and at the same time injecting an appropriate amount of gas into the vacuum chamber to start the ionization coil to generate a rotating magnetic field to ionize the gas in the vacuum chamber. At this time, the internal magnetic field of the initial ionized plasma is the reverse magnetic field generated by the bias coil in the vacuum chamber; when the plasma density reaches a predetermined value, the hydrogen thyristors in the multiple main discharge coil circuits are triggered and turned on according to a specific timing, that is, the hydrogen thyristor switches Smain in the main discharge circuits are turned on in sequence from far to near according to the distance from the central collision and fusion zone. The opening time interval of the hydrogen thyristor switches Smain in the main discharge circuits of two adjacent main discharge coils is 1-3μs, and the capacitor in the main discharge circuit is discharged, so that a forward current is sequentially passed into the main discharge coils; at this time, the plasma in the vacuum chamber has an axial gradient forward magnetic field due to the main discharge coil group, such as Figure 9 As shown in the schematic diagram of the dynamic formation of field-reversed plasma process, it can be seen that the magnetic field generated by the magnetic mirror coil 8 cooperates with the magnetic field generated by the bias coil group to form the initial magnetic field configuration. With the positive magnetic field of the axial gradient generated by the main discharge coil group, the plasma 10 moves to one side along the envelope of the magnetic field line 9. Finally, when the current of the main discharge coil reaches its highest point, the DC diode Dcrowbar of the freewheeling branch automatically turns on, and the current slowly decreases to zero through the freewheeling resistor Rcrowbar, continuously exerting pressure on the movement of the plasma toward the center and accelerating the plasma. The plasma gradually forms a field-reversed magnetic field configuration with positive outside and negative inside at the intersection of the formation zone and the collision and fusion zone. Ultimately, the field-reversed configuration plasma dynamically formed on both sides is ejected into the formation zone in the middle for collision and fusion.

[0060] Based on the above embodiment, the number of main discharge coils 2, bias coils 3, and ionization coils 4 is greater than two, and their number is positively correlated with the length of the vacuum chamber 1. In this embodiment, one formation area includes 12 main discharge coils, 6 ionization coils, and 12 bias coils; the other formation area has the same configuration.

[0061] In a specific embodiment, the bias circuit uses four 54.1μF capacitors in parallel, with an initial capacitor voltage of -15kV, a series inductance of 100μH, a bias coil self-inductance of 7.1μH, and a line resistance of approximately 200mΩ, which can generate a current of -17.5kA in the coil; when the coil diameter is 647mm, a maximum magnetic field of -0.07T can be generated in the vacuum chamber; an 8μF capacitor is used in the main discharge circuit, with an initial capacitor voltage of 30kV and a freewheeling resistance of 20mΩ; the main discharge coil has a coil self-inductance of 1μH, and the main discharge coil starts to discharge when the bias coil current reaches a maximum value, and each coil discharges in turn with an interval of 2μs. The maximum discharge current of the main discharge coil is approximately 75kA. When the coil diameter is 699mm, a maximum magnetic field of 0.23T can be generated in the vacuum chamber, causing the plasma to dynamically form a field inversion shape.

[0062] The embodiment of the present invention can decouple the original coil and circuit, such as Figure 10As shown, the upper circuit is a schematic diagram of the forming zone circuit and coil in the prior art, while the lower circuit is a schematic diagram of the forming zone circuit and coil in an embodiment of the present invention. To meet the four stages of the dynamic forming process—bias, preionization, field reversal, and freewheeling—each individual coil is connected to four parallel branches corresponding to these four stages. During coil operation, capacitors C1, C2, and C3 in the four branches connected to each coil are first charged to a set voltage value. Switches S1, S2, and S3 are then sequentially turned on to discharge the θ-pinch coil. Finally, switch S4 is turned on to complete freewheeling. Hydrogen thyristors are typically used as switches for S1-S4. In the embodiment of the present invention, a bias coil group composed of a bias coil 3 is separately designed in the bias stage, and the bias coil group is connected in series to replace the bias branch in the original circuit; the pre-ionization branch is replaced by an ionization coil group composed of an ionization coil 4; the field reversal branch and the freewheeling branch are realized by the main discharge branch 11 and the freewheeling branch 12 connected to the main discharge coil 2; during operation, the capacitor Cbias and the capacitor CMain are first charged to a set voltage value, and then Sbias is turned on to generate a reverse magnetic field in the vacuum chamber, and then the ionization field coil group composed of the ionization field coil 4 starts to work, ionizes the gas injected into the vacuum chamber, and generates plasma, and finally SMain is turned on to turn on the main discharge branch 11, and a forward current is passed into the main discharge coil 2, and a forward magnetic field is generated in the vacuum chamber. When the current of the main discharge coil 2 reaches a maximum value, the freewheeling resistor diode Dcrowbar can automatically turn on, and the freewheeling stage begins. Compared with the existing circuit, the embodiment of the present invention reduces the influence between the branches. Specifically, the circuit voltage in the bias phase is usually lower than the circuit voltage of the main discharge. The existing circuit is connected in parallel, and the device can only be selected according to the main discharge branch with the largest voltage. The embodiment of the present invention can flexibly select the parameters of each component according to the actual situation of each circuit during use. Secondly, the branches of the existing plasma generation circuit are directly connected in parallel, which has serious mutual coupling. Since the impedance between the branches is very small, severe oscillation coupling will be generated between the two branches during discharge, thereby causing voltage and current spikes. This situation not only increases the requirements for capacitors, hydrogen thyristor withstand voltage and inrush current parameters, increases the cost of the device, but also may interfere with the normal conduction of the hydrogen thyristor according to the predetermined timing, thereby seriously affecting the reliability of the power supply, resulting in higher requirements for electronic components, increased device cost, and poor plasma generation quality. The present invention can decouple the four branches connected by the original single coil, improve the success rate of the overall discharge, effectively improve the reliability and stability of the power supply, and obtain a dynamic field inversion shape with higher parameters (density, temperature and movement speed).

[0063] Example 2

[0064] The present invention further provides a method for dynamically forming a field counter plasma, which is applied to the device for dynamically forming a field counter plasma as described in the first embodiment, comprising:

[0065] S1. Turning on the bias circuit, which feeds a reverse current into the bias coil, causes the bias coil to generate a reverse magnetic field in the vacuum chamber, providing an initial bias magnetic field.

[0066] S2. Turning on the ionization coil to form a rotating magnetic field to ionize the gas in the vacuum chamber and generate a plasma whose internal magnetic field is the initial bias magnetic field;

[0067] S3. According to the distance of each main discharge coil from the central collision and fusion zone, the main discharge coils are connected in sequence from far to near. The main discharge coil group generates an axial gradient positive magnetic field in the vacuum chamber to dynamically form a field-inverted plasma. When the current of the main discharge coil group reaches the maximum value in turn, the corresponding freewheeling branch is automatically connected, the current in the main discharge coil group decreases in turn, and the field-inverted plasma enters the collision and fusion zone to form a fusion field-inverted plasma.

[0068] Among them, the temperature and density of the fusion field antiplasma are higher than those of the field anticonfiguration plasma.

[0069] Based on the field-reverse plasma dynamic formation device and power supply structure of the present invention, the above method is adopted to improve the density, temperature and movement speed of the dynamically formed field-reverse configuration plasma through reliable and stable circuit operation and high-precision timing coordination.

[0070] It will be easily understood by those skilled in the art that the above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A field-reverse plasma dynamic formation device, characterized in that: It includes two forming areas and a collision and fusion area, wherein the two forming areas are arranged at both ends of the collision and fusion area; The formation area includes a vacuum chamber, a main discharge coil, a bias coil and an ionization coil; The main discharge coil is wound on the outer surface of the vacuum chamber; the bias coil is wound on the outside of the main discharge coil; the ionization coil is arranged perpendicular to the main discharge coil and the bias coil; The ionization coil is used to form a rotating magnetic field to ionize the gas in the vacuum chamber to generate plasma; A bias circuit is connected in series to the bias coils, and the bias circuit is used to simultaneously pass reverse currents through the bias coils; the bias coils are used to generate reverse magnetic fields in the vacuum chamber; Each main discharge coil is connected to a main discharge branch and a freewheeling branch in parallel; the main discharge branch is used to pass a forward current into the corresponding main discharge coil; the main discharge coil is used to generate an axial gradient forward magnetic field in the vacuum chamber to dynamically form a field-inverted plasma; the freewheeling branch is automatically connected when the current of the main discharge coil is maximum, and is used to reduce the current of the main discharge coil; The anti-configuration plasma undergoes collision and fusion in the collision and fusion zone.

2. The device according to claim 1, wherein The device further comprises an end chamber, wherein the end chambers are respectively located outside the two forming areas; The end chamber is used to increase the space at both ends of the vacuum chamber and reduce the contact between the plasma and the vacuum chamber wall.

3. The device according to claim 1, wherein Each of the ionization coils is composed of two groups of identical coils, and the phase difference between the coils in each group is 90 degrees.

4. The device according to claim 1, wherein The main discharge branch is composed of a main discharge capacitor Cmain and a hydrogen thyristor switch Smain in series; The freewheeling branch is composed of a DC diode Dcrowbar and a freewheeling resistor Rcrowbar connected in series.

5. The device according to claim 4, characterized in that The turn-on time interval of the hydrogen thyristor switch Smain in the main discharge branches of two adjacent main discharge coils is in the range of 1-3 μs.

6. The device according to claim 1, wherein The bias circuit is composed of a capacitor Cbias and a hydrogen thyristor switch Sbias connected in series.

7. The device according to claim 1, wherein One forming zone includes 12 main discharge coils, 6 ionization coils and 12 bias coils.

8. A method for dynamically forming a field-reverse plasma, characterized in that: Applicable to the field counter plasma dynamic formation device according to any one of claims 1 to 7, comprising: S1. Turning on the bias circuit, which feeds a reverse current into the bias coil, causes the bias coil to generate a reverse magnetic field in the vacuum chamber, providing an initial bias magnetic field. S2. Turning on the ionization coil to form a rotating magnetic field to ionize the gas in the vacuum chamber and generate a plasma whose internal magnetic field is the initial bias magnetic field; S3. According to the distance of each main discharge coil from the central collision and fusion zone, the main discharge coils are connected in sequence from far to near. The main discharge coil group generates an axial gradient positive magnetic field in the vacuum chamber to dynamically form a field-inverted plasma. When the current of the main discharge coil group reaches the maximum value in turn, the corresponding freewheeling branch is automatically connected, the current in the main discharge coil group decreases in turn, and the field-inverted plasma enters the collision and fusion zone to form a fusion field-inverted plasma.

Images