PCB board production automatic exposure system and method
By monitoring the alignment and tilt errors of the PCB substrate in real time and dynamically adjusting the exposure system parameters, the problem of uneven exposure was solved, achieving high-precision automated exposure of the PCB board and improving product quality and production efficiency.
CN119629868BActive Publication Date: 2025-11-04深圳市塔联科技有限公司
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Patent Information
- Application Number
- CN202411760936.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-03
- Publication Date
- 2025-11-04
- Estimated Expiration
- 2044-12-03
AI Technical Summary
Technical Problem
In the current PCB manufacturing process, uneven exposure intensity leads to conductivity and aesthetic issues, affecting product quality.
Method used
By acquiring the initial alignment feature information of the PCB substrate, the error during the exposure process is monitored in real time, and the exposure system parameters, including light intensity, exposure time and brightness, are dynamically adjusted. Compensation is performed using image edge properties and spatial features to achieve automated exposure control.
Benefits of technology
It improves the stability and accuracy of the exposure process, ensures the conductivity and aesthetics of the PCB board, reduces manual intervention, and improves production efficiency and consistency.
✦ Generated by Eureka AI based on patent content.
Abstract
The present application relates to the technical field of PCB, and particularly relates to a PCB production automatic exposure system and method. Through real-time acquisition and analysis of the alignment offset information of the PCB substrate, the substrate position tilt information and the pattern alignment precision, the present application can more accurately monitor the possible error sources in the exposure process, dynamically adjust the initial parameters of the exposure system through the overall exposure deviation, alignment error and tilt error, effectively balance the exposure intensity of the whole exposure area, compensate for different areas according to the real-time light intensity of each area, dynamically adjust the exposure time according to the real-time light intensity of each area, ensure that each line is formed under appropriate exposure intensity through real-time acquisition of the exposure image and adjustment of the light intensity, and analyze the exposure quality of each area through real-time acquisition of the edge information of the image.
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