Etching production device for nuclear track membrane production

Abstract

The invention discloses an etching production device for nuclear track membrane production, and relates to the technical field of plastic film nuclear track membrane etching.The device comprises an etching box and a cleaning box, a second support is installed on the side wall, away from the cleaning box, of the etching box, and unwinding equipment is installed at the upper end of the second support; a first support is arranged on the side wall, away from the etching box, of the cleaning box, a winding device is installed at the upper end of the first support, supporting guide rollers are installed at the upper end of the side wall of the etching box and the upper end of the side wall of the cleaning box, a plurality of first guide rollers are installed in the etching box, and a plurality of second guide rollers are installed in the cleaning box. According to the invention, a brand-new high-concentration etching solution is sprayed onto a plastic film, the etching efficiency of the etching solution on the plastic film is effectively improved, water after cleaning is conveyed to other cleaning modules close to one side of the etching box in sequence, multiple purposes of water are achieved, and the concentration of the etching solution in recycled wastewater is improved.

Description

Technical Field

[0001] The invention relates to the technical field of plastic film nuclear pore membrane etching, in particular to an etching production device for nuclear pore membrane production. Background Art

[0002] Plastic film nuclear pore membrane etching refers to bombarding the plastic film with high-energy heavy ions or fission fragments to produce micropores inside it, and then expanding these micropores through chemical etching methods to obtain a nuclear pore membrane with a specific pore size and pore density.

[0003] Most existing plastic film nuclear pore membrane etching devices directly immerse the treated plastic film in an etching solution for etching. However, as the etching proceeds, the concentration of the etching solution decreases, which in turn leads to a decrease in etching efficiency, affects the etching of the plastic film, and is inconvenient for users to use.

[0004] In view of the above problems, an improved etching production device for producing nuclear pore membranes is now designed. Summary of the invention

[0005] The object of the present invention is to provide an etching production device for producing a nuclear pore membrane to solve the problems raised in the above background technology.

[0006] To achieve the above object, the present invention provides the following technical solutions:

[0007] An etching production device for producing nuclear pore membranes, comprising an etching box and a cleaning box, the etching box and the cleaning box are arranged closely, a second bracket is installed on the side wall of the etching box away from the cleaning box, a reeling device is installed on the upper end of the second bracket, a first bracket is arranged on the side wall of the cleaning box away from the etching box, a reeling device is installed on the upper end of the first bracket, support guide rollers for guiding and conveying plastic film are installed on the upper ends of two opposite side walls of the etching box and the cleaning box, a plurality of first guide rollers for conveying the plastic film inside the etching box in an S shape are installed horizontally inside the etching box, a plurality of second guide rollers for conveying the plastic film inside the cleaning box in an S shape are installed horizontally inside the cleaning box, and one of the etching rollers perpendicular to the first guide rollers An etching box door is provided on the side wall of the box for the staff to place plastic film conveniently, the bottom of the etching box below the etching box door is provided with a groove for collecting etching liquid, and a cleaning box door is provided on one of the side walls of the cleaning box perpendicular to the second guide roller for the staff to place plastic film conveniently, the bottom of the cleaning box below the cleaning box door is provided with a groove for collecting waste water, a spray etching mechanism for spray etching the plastic film is provided inside the etching box, a cleaning mechanism for cleaning the etched plastic film is provided inside the cleaning box, a scraping mechanism for scraping liquid on the plastic film is provided at the upper end of the side wall on the output side of the etching box and the cleaning box, and a drying mechanism for drying the cleaned plastic film is provided on the first bracket between the cleaning box and the winding device.

[0008] As a further solution of the present invention: the spray etching mechanism includes a plurality of groups of spray modules corresponding to the vertically arranged plastic films, the spray modules include two first fixed boxes, the two first fixed boxes are vertically installed on the inner walls of the etching box on both sides of the corresponding plastic films, a plurality of first branch pipes are horizontally arranged inside the first fixed box, a first nozzle is horizontally installed on the side wall of the first branch pipe close to the corresponding plastic film, one end of the first nozzle away from the first branch pipe passes through the first fixed box and faces the plastic film, a first main pipe is installed at one end of the first branch pipe, and a nozzle for spraying to the plastic film is installed on the side wall of the first fixed box. The first main pipe is a connecting pipe for conveying etching liquid, and the end of the connecting pipe away from the first fixed box passes through the side wall of the etching box and is installed with an etching liquid conveying pipe, the input end of the etching liquid conveying pipe is connected to the etching liquid conveying equipment, a third water pump is installed at the lower end of the side wall of the etching box, the input end of the third water pump is installed with a first pumping pipe, the end of the first pumping pipe away from the third water pump is arranged at the bottom of the etching box, the output end of the third water pump is installed with a second drain pipe, the end of the second drain pipe away from the third water pump is arranged on the waste etching liquid treatment equipment, and a heating component for heating the etching liquid is arranged inside the first fixed box.

[0009] As a further solution of the present invention: the heating assembly includes a heater, the heater is installed on the inner wall of the first fixed box, the interior of the first fixed box is filled with water, an S-shaped heating tube for heating the etching liquid is arranged between the heater and the first branch pipe, the input end of the S-shaped heating tube is connected to the output end of the connecting tube, and the output end of the S-shaped heating tube is connected to the first main pipe.

[0010] As a further solution of the present invention: a pressure relief valve for maintaining the pressure balance inside the first fixed box is provided on the first fixed box.

[0011] As a further solution of the present invention: the cleaning mechanism includes several groups of cleaning modules corresponding to the vertically arranged plastic films, the cleaning modules include two second fixed boxes, the two second fixed boxes are vertically installed on the inner walls of the cleaning box on both sides of the corresponding plastic films, a second branch pipe is horizontally installed inside the second fixed box, several second nozzles are installed on the side wall of the second branch pipe close to the plastic film, one end of the second nozzle away from the second branch pipe passes through the side wall of the second fixed box and faces the plastic film, a second main pipe is installed at one end of the second branch pipe, a second water pipe is installed on the side wall of the second main pipe, one end of the second water pipe away from the second main pipe passes through the second fixed box and the side wall of the cleaning box and is arranged on the outside of the cleaning box, and a segmented component for making full use of cleaning water is arranged inside the cleaning box.

[0012] As a further solution of the present invention: the segmented assembly includes a plurality of partitions, which are vertically installed on the inner wall of the cleaning box between two adjacent groups of cleaning modules, and the lower end of the partition is installed at the bottom of the cleaning box. The partition is provided with an opening for the plastic film to pass through. The plurality of partitions divide the cleaning box into a plurality of cleaning rooms. A second pumping pipe for extracting waste liquid from the bottom of the cleaning box is installed on the side wall of the cleaning room close to the etching box, and a second water pump is installed at the output end of the second pumping pipe through the side wall of the cleaning box, and a first drain pipe is installed at the output end of the second water pump. The first drain pipe The end away from the second water pump is arranged on the waste etching liquid treatment equipment, and the bottom of the other cleaning rooms on the side of the etching box away from the second water pumping pipe are all installed with a third water pumping pipe for extracting the cleaning water at the bottom of the cleaning box, the output end of the third water pumping pipe passes through the side wall of the cleaning box and is installed with the first water pump, the output end of the first water pump is installed with the first water pipe, the end of the first water pipe away from the first water pump is installed at the input end of the second water pipe of the adjacent cleaning module close to the etching box side, and the input end of the second water pipe of the cleaning module inside the cleaning room close to the first bracket is installed with an inlet pipe for conveying clean water.

[0013] As a further solution of the present invention: a rubber pad for blocking and scraping off the cleaning water is installed on the inner wall of the opening of the partition.

[0014] As a further solution of the present invention: the scraping mechanism includes two fixed plates, and the two fixed plates are arranged on both sides of the plastic film on the output side of the etching box and the cleaning box, and a scraper block for scraping liquid on the plastic film is installed at one end of the fixed plate close to the plastic film, and an elastic telescopic rod is installed at one end of the fixed plate away from the scraper block, and a mounting plate is installed at one end of the elastic telescopic rod away from the fixed plate, and the mounting plate is installed on the corresponding inner wall of the etching box and the cleaning box.

[0015] As a further solution of the present invention: triangular ribs for stabilizing the connection are provided at the connection points between the elastic telescopic rod and the mounting plate and the fixing plate.

[0016] As a further solution of the present invention: the drying mechanism includes a drying box, which is installed on the upper end of the first bracket between the cleaning box and the winding device, and the drying box is sleeved on a plastic film. Drying heaters are installed on the top and bottom of the drying box, and an exhaust fan for extracting water vapor is installed on the top of the drying box.

[0017] Compared with the prior art, the present invention has the following beneficial effects:

[0018] The present invention always delivers new high-concentration etching liquid to the first nozzle through the etching liquid delivery pipe, and then sprays the etching liquid onto the plastic film through the first nozzle. Under the action of gravity, the etched etching liquid flows to the bottom of the etching box and is delivered to the waste etching liquid treatment equipment for reprocessing, thereby always maintaining the concentration of the etching liquid and effectively improving the etching efficiency of the etching liquid on the plastic film.

[0019] The present invention delivers clean water to a cleaning module close to one side of a first bracket, and then delivers the cleaned water to other cleaning modules close to one side of an etching box in sequence, so as to achieve multiple uses of water and avoid waste of water resources. At the same time, it can increase the concentration of etching liquid in the recovered waste water, avoid excessive water from entering into the waste etching liquid treatment equipment, and improve the recovery and treatment efficiency of the etching liquid.

[0020] The present invention scrapes the plastic film on the output side of the etching box and the cleaning box by a scraping block, thereby reducing the influence between the etching and cleaning processes, improving the cleaning and drying efficiency, and facilitating the use of users. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the main structure of the present invention.

[0022] Figure 2 It is a rear view structural schematic diagram of the present invention.

[0023] Figure 3 It is a cross-sectional structural schematic diagram of the present invention.

[0024] Figure 4 It is a structural schematic diagram of the spray etching mechanism in the present invention.

[0025] Figure 5 It is a structural schematic diagram of the cleaning mechanism in the present invention.

[0026] Figure 6 It is a structural schematic diagram of the drying box in the present invention.

[0027] Among them: 1. Etching box; 2. Etching box door; 3. Cleaning box; 4. Cleaning box door; 5. First bracket; 6. Winding device; 7. Exhaust fan; 8. Drying box; 9. Support guide roller; 10. Unwinding device; 11. Second bracket; 12. First spray pipe; 13. First fixed box; 14. First guide roller; 15. First pumping pipe; 16. Second pumping pipe; 17. Partition; 18. Second guide roller; 19. Second fixed box; 20. Third pumping pipe; 21. Wiper block; 22. Fixed plate; 23, elastic telescopic rod; 24, mounting plate; 25, water inlet pipe; 26, first water pump; 27, first water delivery pipe; 28, second water delivery pipe; 29, first drainage pipe; 30, second water pump; 31, etching liquid delivery pipe; 32, second drainage pipe; 33, third water pump; 34, heater; 35, first main pipe; 36, first branch pipe; 37, S-shaped heating pipe; 38, connecting pipe; 39, second main pipe; 40, second branch pipe; 41, second nozzle; 42, drying heater. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] See also Figure 1-Figure 6In an embodiment of the present invention, an etching production device for producing a nuclear pore membrane comprises an etching box 1 and a cleaning box 3, wherein the etching box 1 and the cleaning box 3 are arranged closely together, a second bracket 11 is installed on the side wall of the etching box 1 away from the cleaning box 3, and a reeling device 10 is installed on the upper end of the second bracket 11, a first bracket 5 is arranged on the side wall of the cleaning box 3 away from the etching box 1, and a reeling device 6 is installed on the upper end of the first bracket 5, and support guide rollers 9 for guiding and conveying a plastic film are installed on the upper ends of two opposite side walls of the etching box 1 and the cleaning box 3, and a plurality of first guide rollers 14 for conveying the plastic film inside the etching box 1 in an S shape are installed horizontally inside the etching box 1, and a plurality of second guide rollers 18 for conveying the plastic film inside the cleaning box 3 in an S shape are installed horizontally inside the cleaning box 3, and the first guide rollers 18 are installed horizontally inside the cleaning box 3, and the second guide rollers 18 ... An etching box door 2 is provided on one of the side walls of the etching box 1 perpendicular to 14, for the staff to place the plastic film conveniently; the bottom of the etching box 1 below the etching box door 2 is provided with a groove for collecting the etching liquid; a cleaning box door 4 is provided on one of the side walls of the cleaning box 3 perpendicular to the second guide roller 18, for the staff to place the plastic film conveniently; the bottom of the cleaning box 3 below the cleaning box door 4 is provided with a groove for collecting waste water; a spray etching mechanism for spray etching the plastic film is provided inside the etching box 1; a cleaning mechanism for cleaning the etched plastic film is provided inside the cleaning box 3; a scraping mechanism for scraping liquid on the plastic film is provided at the upper end of the side wall on the output side of the etching box 1 and the cleaning box 3; a drying mechanism for drying the cleaned plastic film is provided on the first bracket 5 between the cleaning box 3 and the winding device 6.

[0030] The spray etching mechanism includes a plurality of spray modules corresponding to the vertically arranged plastic films, and the spray modules include two first fixed boxes 13, which are vertically installed on the inner walls of the etching box 1 on both sides of the corresponding plastic films. A plurality of first branch pipes 36 are horizontally arranged inside the first fixed box 13, and a first nozzle 12 is horizontally installed on the side wall of the first branch pipe 36 close to the corresponding plastic film. One end of the first nozzle 12 away from the first branch pipe 36 passes through the first fixed box 13 and faces the plastic film. A first main pipe 35 is installed at one end of the first branch pipe 36, and a device for conveying etching liquid to the first main pipe 35 is installed on the side wall of the first fixed box 13. A connecting pipe 38 is provided, and one end of the connecting pipe 38 away from the first fixed box 13 passes through the side wall of the etching box 1 and is equipped with an etching liquid delivery pipe 31. The input end of the etching liquid delivery pipe 31 is connected to the etching liquid delivery device. A third water pump 33 is installed at the lower end of the side wall of the etching box 1. The input end of the third water pump 33 is installed with a first pumping pipe 15. The end of the first pumping pipe 15 away from the third water pump 33 is arranged at the bottom of the etching box 1. A second drain pipe 32 is installed at the output end of the third water pump 33. The end of the second drain pipe 32 away from the third water pump 33 is arranged on the waste etching liquid treatment device. A heating component for heating the etching liquid is arranged inside the first fixed box 13.

[0031] The heating assembly includes a heater 34, which is installed on the inner wall of the first fixed box 13. The interior of the first fixed box 13 is filled with water. An S-shaped heating tube 37 for heating the etching liquid is arranged between the heater 34 and the first branch pipe 36. The input end of the S-shaped heating tube 37 is connected to the output end of the connecting tube 38, and the output end of the S-shaped heating tube 37 is connected to the first main pipe 35.

[0032] When in use, the heater 34 is started, and the heater 34 heats the water inside the first fixed box 13 to a specified temperature. The etching liquid is transported to the inside of the connecting pipe 38 through the etching liquid delivery pipe 31. The connecting pipe 38 transports the etching liquid to the inside of the S-shaped heating pipe 37. The S-shaped heating pipe 37 transports the etching liquid to the inside of the first main pipe 35. The first main pipe 35 transports the etching liquid to the inside of the first branch pipe 36. The first branch pipe 36 transports the etching liquid to the inside of the first nozzle 12. The first nozzle 12 sprays the etching liquid onto the plastic film. At the same time, the water inside the first fixed box 13 heats the etching liquid inside the S-shaped heating pipe 37, the first main pipe 35 and the first branch pipe 36.

[0033] The used etching liquid will flow to the bottom of the etching box 1, and the third water pump 33 will be started to suck out the waste etching liquid through the first pumping pipe 15, and the waste etching liquid will be transported to the waste etching liquid treatment equipment through the second drainage pipe 32 for reuse.

[0034] The cleaning mechanism includes several groups of cleaning modules corresponding to the vertically arranged plastic films, and the cleaning modules include two second fixed boxes 19, which are vertically installed on the inner walls of the cleaning box 3 on both sides of the corresponding plastic films. A second branch pipe 40 is horizontally installed inside the second fixed box 19, and several second nozzles 41 are installed on the side wall of the second branch pipe 40 close to the plastic film. One end of the second nozzle 41 away from the second branch pipe 40 passes through the side wall of the second fixed box 19 and faces the plastic film. A second main pipe 39 is installed at one end of the second branch pipe 40, and a second water pipe 28 is installed on the side wall of the second main pipe 39. One end of the second water pipe 28 away from the second main pipe 39 passes through the second fixed box 19 and the side wall of the cleaning box 3 and is arranged on the outside of the cleaning box 3. The interior of the cleaning box 3 is provided with a segmented component for making full use of cleaning water.

[0035] The segmented assembly includes a plurality of partitions 17, which are vertically mounted on the inner wall of the cleaning box 3 between two adjacent groups of cleaning modules, and the lower end of the partition 17 is mounted on the bottom of the cleaning box 3. The partition 17 is provided with an opening for the plastic film to pass through. The plurality of partitions 17 divide the cleaning box 3 into a plurality of cleaning rooms. A second pumping pipe 16 for extracting waste liquid from the bottom of the cleaning box 3 is installed on the side wall of the cleaning room close to the etching box 1, and a second water pump 30 is installed at the output end of the second pumping pipe 16 through the side wall of the cleaning box 3, and a first drain pipe 29 is installed at the output end of the second water pump 30, and the first drain pipe 29 is away from the second water pump 3. 0 is arranged on the waste etching liquid treatment equipment, the second pumping pipe 16 is far away from the bottom of other cleaning rooms on the side of the etching box 1, and a third pumping pipe 20 for extracting cleaning water from the bottom of the cleaning box 3 is installed, the output end of the third pumping pipe 20 passes through the side wall of the cleaning box 3 and is installed with a first water pump 26, the output end of the first water pump 26 is installed with a first water pipe 27, the end of the first water pipe 27 away from the first water pump 26 is installed at the input end of the second water pipe 28 of the cleaning module adjacent to the side of the etching box 1, and the input end of the second water pipe 28 of the cleaning module inside the cleaning room close to the first bracket 5 is installed with a water inlet pipe 25 for conveying clean water.

[0036] When in use, clean water is transported to the input end of the second water pipe 28 of the cleaning module near the first bracket 5 side through the water inlet pipe 25, and the clean water passes through the second main pipe 39, the second branch pipe 40 and the second nozzle 41 in sequence. The second nozzle 41 sprays the clean water onto the plastic film, and then the first water pump 26 is started, and the water at the bottom of the cleaning room near the first bracket 5 side is extracted through the third pumping pipe 20, and the water is transported to the second water pipe 28 of the adjacent cleaning module near the etching box 1 side through the first water pipe 27, thereby realizing multiple uses of water. Finally, the second water pump 30 is started, and the waste water at the bottom of the cleaning room near the etching box 1 side is extracted through the second pumping pipe 16, and the waste water is transported to the waste etching liquid treatment equipment through the first drain pipe 29.

[0037] The scraping mechanism includes two fixed plates 22, which are arranged on both sides of the plastic film on the output side of the etching box 1 and the cleaning box 3. The end of the fixed plate 22 close to the plastic film is equipped with a scraper block 21 for scraping liquid on the plastic film, and the end of the fixed plate 22 away from the scraper block 21 is equipped with an elastic telescopic rod 23, and the end of the elastic telescopic rod 23 away from the fixed plate 22 is equipped with a mounting plate 24, and the mounting plate 24 is installed on the corresponding inner walls of the etching box 1 and the cleaning box 3.

[0038] When in use, the elastic telescopic rod 23 pushes the fixed plate 22 to move, and the fixed plate 22 pushes the wiper block 21 to move, so that the wiper block 21 is closely attached to the side wall of the plastic film, thereby scraping off the liquid on the plastic film.

[0039] The drying mechanism includes a drying box 8, which is installed on the upper end of the first bracket 5 between the cleaning box 3 and the winding device 6. The drying box 8 is sleeved on a plastic film. Drying heaters 42 are installed on the top and bottom of the drying box 8. An exhaust fan 7 for extracting water vapor is installed on the top of the drying box 8.

[0040] Working principle of an etching production device for producing nuclear pore membranes:

[0041] When in use, the plastic film output by the unwinding device 10 first enters the etching box 1. At the same time, the heater 34 is started. The heater 34 heats the water inside the first fixed box 13 to a specified temperature. The etching liquid is transported to the inside of the connecting pipe 38 through the etching liquid delivery pipe 31. The connecting pipe 38 transports the etching liquid to the inside of the S-shaped heating pipe 37. The S-shaped heating pipe 37 transports the etching liquid to the inside of the first main pipe 35. The first main pipe 35 transports the etching liquid to the inside of the first branch pipe 36. The first branch pipe 36 transports the etching liquid to the inside of the first nozzle 12. The first nozzle 12 sprays the etching liquid onto the plastic film. At the same time, the water inside the first fixed box 13 heats the etching liquid inside the S-shaped heating pipe 37, the first main pipe 35 and the first branch pipe 36.

[0042] The used etching liquid will flow to the bottom of the etching box 1, and the third water pump 33 will be started to suck out the waste etching liquid through the first pumping pipe 15, and the waste etching liquid will be transported to the waste etching liquid treatment equipment through the second drainage pipe 32 for reuse.

[0043] After being etched by the etching box 1, the plastic film enters the cleaning box 3. At the same time, the clean water is transported to the input end of the second water pipe 28 of the cleaning module near the first bracket 5 side through the water inlet pipe 25. The clean water passes through the second main pipe 39, the second branch pipe 40 and the second nozzle 41 in sequence. The second nozzle 41 sprays the clean water onto the plastic film, and then the first water pump 26 is started. The water at the bottom of the cleaning room near the first bracket 5 side is extracted through the third water pumping pipe 20, and the water is transported to the second water pipe 28 of the cleaning module near the etching box 1 side through the first water pipe 27, thereby realizing multiple uses of water. Finally, the second water pump 30 is started, and the waste water at the bottom of the cleaning room near the etching box 1 side is extracted through the second water pumping pipe 16, and the waste water is transported to the waste etching liquid treatment equipment through the first drain pipe 29.

[0044] The plastic film cleaned in the cleaning box 3 enters the drying box 8 for drying, and then the drying box 8 conveys the plastic film and reels it on the reeling device 6.

[0045] It is obvious to those skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and that the present invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention.

Claims

1. An etching production device for producing nuclear pore membranes, comprising an etching box (1) and a cleaning box (3), wherein the etching box (1) and the cleaning box (3) are arranged closely together, a second bracket (11) is installed on the side wall of the etching box (1) away from the cleaning box (3), and a reeling device (10) is installed on the upper end of the second bracket (11), a first bracket (5) is installed on the side wall of the cleaning box (3) away from the etching box (1), and a reeling device (6) is installed on the upper end of the first bracket (5), and support guide rollers (9) for guiding and conveying plastic film are installed on the upper ends of two opposite side walls of the etching box (1) and the cleaning box (3), a plurality of first guide rollers (14) for conveying the plastic film inside the etching box (1) in an S-shape are installed horizontally inside the etching box (1), and a plurality of second guide rollers (18) for conveying the plastic film inside the cleaning box (3) in an S-shape are installed horizontally inside the cleaning box (3), characterized in that: An etching box door (2) is provided on one of the side walls of the etching box (1) perpendicular to the first guide roller (14) for workers to place plastic film. The bottom of the etching box (1) below the etching box door (2) is provided with a groove for collecting etching liquid. A cleaning box door (4) is provided on one of the side walls of the cleaning box (3) perpendicular to the second guide roller (18) for workers to place plastic film. The bottom of the cleaning box (3) below the cleaning box door (4) is provided with a groove for collecting waste water. A spray etching mechanism for spray etching the plastic film is provided inside the etching box (1). A cleaning mechanism for cleaning the etched plastic film is provided inside the cleaning box (3). A scraping mechanism for scraping liquid on the plastic film is provided at the upper end of the side walls on the output side of the etching box (1) and the cleaning box (3). A drying mechanism for drying the cleaned plastic film is provided on the first bracket (5) between the cleaning box (3) and the winding device (6).

2. The etching production device for producing a nuclear pore membrane according to claim 1, characterized in that: The spray etching mechanism comprises a plurality of spray modules corresponding to the vertically arranged plastic films, the spray modules comprising two first fixed boxes (13), the two first fixed boxes (13) being vertically mounted on the inner walls of the etching box (1) on both sides of the corresponding plastic films, a plurality of first branch pipes (36) being horizontally mounted inside the first fixed box (13), a first nozzle (12) being horizontally mounted on the side wall of the first branch pipe (36) close to the corresponding plastic film, one end of the first nozzle (12) away from the first branch pipe (36) passing through the first fixed box (13) and facing the plastic film, a first main pipe (35) being mounted on one end of the first branch pipe (36), and a connecting pipe for conveying etching liquid to the first main pipe (35) being mounted on the side wall of the first fixed box (13) (38), the end of the connecting pipe (38) away from the first fixed box (13) passes through the side wall of the etching box (1) and is equipped with an etching liquid delivery pipe (31), the input end of the etching liquid delivery pipe (31) is connected to the etching liquid delivery device, a third water pump (33) is installed at the lower end of the side wall of the etching box (1), the input end of the third water pump (33) is installed with a first pumping pipe (15), the end of the first pumping pipe (15) away from the third water pump (33) is arranged at the bottom of the etching box (1), the output end of the third water pump (33) is equipped with a second drain pipe (32), the end of the second drain pipe (32) away from the third water pump (33) is arranged on the waste etching liquid treatment device, and a heating component for heating the etching liquid is arranged inside the first fixed box (13).

3. The etching production device for producing a nuclear pore membrane according to claim 2, characterized in that: The heating assembly comprises a heater (34), the heater (34) being mounted on the inner wall of a first fixed box (13), the interior of the first fixed box (13) being filled with water, an S-shaped heating pipe (37) for heating the etching liquid being arranged between the heater (34) and the first branch pipe (36), the input end of the S-shaped heating pipe (37) being connected to the output end of the connecting pipe (38), and the output end of the S-shaped heating pipe (37) being connected to the first main pipe (35).

4. The etching production device for producing a nuclear pore membrane according to claim 3, characterized in that: The first fixed box (13) is provided with a pressure relief valve for maintaining the internal pressure balance of the first fixed box (13).

5. The etching production device for producing a nuclear pore membrane according to claim 1, characterized in that: The cleaning mechanism comprises a plurality of cleaning modules corresponding to the vertically arranged plastic films. The cleaning modules comprise two second fixed boxes (19). The two second fixed boxes (19) are vertically mounted on the inner walls of the cleaning box (3) on both sides of the corresponding plastic films. A second branch pipe (40) is horizontally mounted inside the second fixed box (19). A plurality of second spray pipes (41) are mounted on the side wall of the second branch pipe (40) close to the plastic film. One end of the second spray pipe (41) away from the second branch pipe (40) passes through the side wall of the second fixed box (19) and faces the plastic film. A second main pipe (39) is mounted on one end of the second branch pipe (40). A second water pipe (28) is mounted on the side wall of the second main pipe (39). One end of the second water pipe (28) away from the second main pipe (39) passes through the second fixed box (19) and the side wall of the cleaning box (3) and is arranged outside the cleaning box (3). A segmented component for fully utilizing cleaning water is arranged inside the cleaning box (3).

6. The etching production device for producing a nuclear pore membrane according to claim 5, characterized in that: The segmentation assembly comprises a plurality of partitions (17), wherein the partitions (17) are vertically mounted on the inner wall of the cleaning box (3) between two adjacent groups of cleaning modules, wherein the lower end of the partitions (17) is mounted on the bottom of the cleaning box (3), wherein an opening is provided on the partitions (17) for facilitating the passage of a plastic film, wherein the plurality of partitions (17) divide the cleaning box (3) into a plurality of cleaning rooms, wherein a second water pumping pipe (16) for extracting waste liquid from the bottom of the cleaning box (3) is mounted on the side wall of the cleaning room close to the etching box (1), wherein a second water pump (30) is mounted on the output end of the second water pumping pipe (16) through the side wall of the cleaning box (3), wherein a first drainage pipe (29) is mounted on the output end of the second water pump (30), wherein the first drainage pipe (29) is away from the second water pump ( One end of the second pumping pipe (16) is arranged on the waste etching liquid treatment equipment, the bottom of other cleaning rooms on the side away from the etching box (1) are all equipped with a third pumping pipe (20) for extracting cleaning water from the bottom of the cleaning box (3), the output end of the third pumping pipe (20) passes through the side wall of the cleaning box (3) and is equipped with a first water pump (26), the output end of the first water pump (26) is equipped with a first water delivery pipe (27), the end of the first water delivery pipe (27) away from the first water pump (26) is installed at the input end of the second water delivery pipe (28) of the cleaning module adjacent to the side of the etching box (1), and the input end of the second water delivery pipe (28) of the cleaning module inside the cleaning room close to the first bracket (5) is equipped with a water inlet pipe (25) for delivering clean water.

7. The etching production device for producing a nuclear pore membrane according to claim 6, characterized in that: A rubber pad for blocking and scraping off the cleaning water is installed on the inner wall of the opening of the partition (17).

8. The etching production device for producing a nuclear pore membrane according to claim 1, characterized in that: The scraping mechanism comprises two fixed plates (22), the two fixed plates (22) being arranged on both sides of the plastic film at the output side of the etching box (1) and the cleaning box (3), a scraping block (21) for scraping liquid on the plastic film being installed at one end of the fixed plate (22) close to the plastic film, an elastic telescopic rod (23) being installed at one end of the fixed plate (22) away from the scraping block (21), a mounting plate (24) being installed at one end of the elastic telescopic rod (23) away from the fixed plate (22), and the mounting plate (24) being installed on the inner wall of the corresponding etching box (1) and the cleaning box (3).

9. The etching production device for producing a nuclear pore membrane according to claim 8, characterized in that: The connection points between the elastic telescopic rod (23), the mounting plate (24) and the fixing plate (22) are all provided with triangular ribs for stabilizing the connection.

10. The etching production device for producing a nuclear pore membrane according to claim 1, characterized in that: The drying mechanism comprises a drying box (8), the drying box (8) being mounted on the upper end of a first bracket (5) between a cleaning box (3) and a winding device (6), the drying box (8) being sleeved on a plastic film, a drying heater (42) being mounted on the top and bottom of the drying box (8), and an exhaust fan (7) for extracting water vapor being mounted on the top of the drying box (8).

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