A photovoltaic silicon wafer pretreatment cleaning machine

Abstract

The present invention discloses a pre-treatment cleaning machine for photovoltaic wafers, which relates to the technical field of photovoltaic wafer cleaning. It includes a main body mechanism. The main body mechanism includes a pre-treatment area. One side of the pre-treatment area is fixedly connected with a cleaning area, and one side of the cleaning area is fixedly connected with a drying area. A first conveyor belt is placed on one side of the pre-treatment area. A second conveyor belt and a third conveyor belt are rotatably connected in the inner cavity of the pre-treatment area. A controller is fixedly connected to the outside of the cleaning area, and the controller is used to control all power supplies. A processing mechanism is arranged in the inner cavity of the pre-treatment area; the processing mechanism includes a soaking unit. This pre-treatment cleaning machine for photovoltaic wafers, by setting the processing mechanism, avoids the input of excessive mechanical grasping devices, reduces the production cost, and accelerates the contact between the photovoltaic wafers and the cleaning solution, optimizes the pre-treatment effect of the photovoltaic wafers, and improves the pre-treatment efficiency of the photovoltaic wafers.

Description

Technical Field

[0001] The present invention relates to the technical field of photovoltaic silicon wafer cleaning, and specifically to a pre-treatment cleaning machine for photovoltaic silicon wafers. Background Technique

[0002] Photovoltaic silicon wafers are mainly made of solar-grade polysilicon. Through processes such as crystal pulling, slicing, polishing, and cleaning, the silicon rods are processed into thin slices. Photovoltaic silicon wafers have characteristics such as high purity, good electrical conductivity, and mechanical strength.

[0003] During the production, transportation, and storage of photovoltaic silicon wafers, they will inevitably come into contact with various pollution sources, such as dust, grease, metal ions, etc. If these pollutants are not removed, they will seriously affect the performance of solar cells. At this time, a cleaning machine is used to clean the photovoltaic silicon wafers. And before cleaning, it is necessary to pre-treat the photovoltaic silicon wafers and soak them with a special solution to soften the stains on their surfaces. However, when pre-treating the photovoltaic silicon wafers, usually a basketful of photovoltaic silicon wafers is switched between multiple soaking pools and cleaning pools through a mechanical grasping device, which greatly increases the input of mechanical equipment. And due to the small distance between the stacked photovoltaic silicon wafers and the limitation of the material basket, it leads to untimely sufficient contact between each photovoltaic silicon wafer and the solution, resulting in poor pre-treatment effect and efficiency.

[0004] Combining the above problems, we will find that the existing pre-treatment cleaning machines for photovoltaic silicon wafers on the market are very difficult to avoid the above-mentioned problems simultaneously during use. And even if they can be solved, they need to be solved with the cooperation of external tools, thus unable to achieve the desired effect. Therefore, we propose a pre-treatment cleaning machine for photovoltaic silicon wafers. Summary of the Invention

[0005] The purpose of the present invention is to provide a pre-treatment cleaning machine for photovoltaic silicon wafers to solve the problems raised in the above background technique.

[0006] To achieve the above purpose, the present invention provides the following technical solution: A pre-treatment cleaning machine for photovoltaic silicon wafers, including a main body mechanism. The main body mechanism includes a pre-treatment area. One side of the pre-treatment area is fixedly connected with a cleaning area, and one side of the cleaning area is fixedly connected with a drying area. A first conveyor belt is placed on one side of the pre-treatment area. The inner cavity of the pre-treatment area is rotatably connected with a second conveyor belt and a third conveyor belt. The outside of the cleaning area is fixedly connected with a controller, and the controller is used to control all power supplies. A processing mechanism is arranged in the inner cavity of the pre-treatment area;

[0007] The processing mechanism includes a soaking unit. The soaking unit is arranged in the inner cavity of the pre-treatment area and is used to soak and process the photovoltaic silicon wafers;

[0008] The processing mechanism includes a guiding unit, which is arranged in the inner cavity of the pretreatment area. The guiding unit is used in cooperation with the soaking unit and is used to guide the photovoltaic wafers in baskets.

[0009] The processing mechanism further includes a moving unit, which is arranged on the opposite sides of the support frame. The moving unit is used in cooperation with the soaking unit and the guiding unit and is used to transfer the photovoltaic wafers after soaking.

[0010] Preferably, the soaking unit includes a support frame, the opposite sides of which are fixedly connected to the outer surface of the pretreatment area. A hydraulic rod is fixedly connected to the inner top of the support frame, and a basket cover is fixedly connected to the telescopic end of the hydraulic rod. A material basket is placed on the top of the first conveyor belt. The basket cover is used in cooperation with the material basket. A first telescopic rod is fixedly connected to the inner bottom of the pretreatment area, and a limiting piece is fixedly connected to the telescopic end of the first telescopic rod. A first spring is slidably sleeved on the surface of the first telescopic rod. One end of the first spring is fixedly connected to the inner bottom of the pretreatment area, and the other end of the first spring is fixedly connected to the bottom of the limiting piece.

[0011] Preferably, a number of equally spaced special-shaped holes are formed in the top of the basket cover, and the special-shaped holes are used to increase the generation of bubbles. A number of equally spaced leakage holes are formed in the bottom of the material basket.

[0012] Preferably, the guiding unit includes guide grooves formed on the opposite sides of the inner cavity of the pretreatment area. The guide grooves include a horizontal groove and a vertical groove, and the horizontal groove and the vertical groove are connected in an L shape. First guide rods are slidably connected in the inner cavities of both guide grooves. The opposite ends of the two first guide rods are fixedly connected together with a positioning block. A first clamping hole and a second clamping hole are formed in one side of the positioning block. A first clamping block is fixedly connected to the bottom of the material basket, and the surface of the first clamping block is in contact with the inner cavity of the first clamping hole. A second clamping block is fixedly connected to the top of the limiting piece, and the surface of the second clamping block is in contact with the inner cavity of the second clamping hole. Second guide rods are fixedly connected to both sides of the second clamping block, and the surfaces of the second guide rods are slidably connected in the inner cavity of the vertical groove. Electric push rods are fixedly connected to both sides of the pretreatment area, and a guide block is fixedly connected to the telescopic end of the electric push rod. One side of the guide block penetrates into the inner cavity of the pretreatment area. A hole is formed in the inner wall of the pretreatment area, and the surface of the guide block is slidably connected in the inner cavity of the hole. A clamping rod is fixedly connected to the bottom of the guide block. A clamping groove for cooperating with the clamping rod is formed on the surface of the first guide rod, and the surface of the clamping rod is in contact with the inner cavity of the clamping groove. A rubber block is fixedly connected to the upper surface of the second guide rod, and the rubber block is used to reduce the impact force when the first guide rod falls into the vertical groove.

[0013] Preferably, an extension plate is fixedly connected to the inner side of the pretreatment area. A special-shaped plate is fixedly connected to one side of the extension plate. An L-shaped groove is formed in the inner wall of the positioning block. A stopper is slidably connected to the inner cavity of the L-shaped groove. A stop rod is fixedly connected to one side of the material basket. One end of the stop rod contacts one side of the stopper. The cooperation between the stop rod and the stopper realizes the limit of the maximum displacement of the material basket. A connecting rod is fixedly connected to one side of the stopper. The connecting rod is slidably connected to the inner cavity of the L-shaped groove. One end of the connecting rod is rotatably connected to a roller through a bearing. The roller is in rolling contact with the surface of the special-shaped plate. A tension spring is fixedly connected to the inner bottom of the L-shaped groove. One end of the tension spring is fixedly connected to the bottom of the connecting rod.

[0014] Preferably, a plurality of friction rollers are rotatably connected to the inner bottom wall of the first card hole through one-way bearings. A silica gel pad is fixedly connected to the surface of the friction rollers. The surface of the friction rollers contacts the bottom of the first card block.

[0015] Preferably, support plates are fixedly connected to both sides of the pretreatment area. A guide ring is fixedly sleeved on the surface of the telescopic end of the electric push rod. A guide post is fixedly connected to the lower surface of the guide ring. A guide groove for cooperating with the guide post is formed in the top of the support plate. The surface of the guide post is slidably connected to the inner cavity of the guide groove.

[0016] Preferably, the moving unit includes positioning plates fixedly connected to the inner side of the support frame. The number of the positioning plates is two. The two positioning plates are arranged oppositely. A rotating cylinder is rotatably connected to the top of the positioning plate. A spiral groove is formed in the inner wall of the rotating cylinder. A connecting column is slidably connected to the inner cavity of the rotating cylinder. A short rod for cooperating with the spiral groove is fixedly connected to the surface of the connecting column. The surface of the short rod is slidably connected to the inner cavity of the spiral groove. The top end of the connecting column is fixedly connected to a touch plate. The telescopic end of the hydraulic rod is fixedly connected to a jacking plate. The top of the jacking plate contacts the bottom of the touch plate. A spring telescopic rod is fixedly connected to the surface of the rotating cylinder. The telescopic end of the spring telescopic rod is fixedly connected to a pushing block. Stopping blocks are fixedly connected to both sides of the material basket. The pushing block is used to apply a thrust to the stopping block. One end of the pushing block is rotatably connected to a roller through a rotating shaft. The surface of the roller is in rolling contact with the surface of the material basket.

[0017] Preferably, two oppositely arranged sliding grooves are formed in the inner side of the support frame. The surface of the touch plate is slidably connected to the inner cavity of the sliding groove. A sliding column is fixedly connected to the inner wall of the sliding groove. The inner wall of the touch plate is slidably connected to the surface of the sliding column.

[0018] Preferably, a third spring is fixedly connected to the inner bottom of the sliding groove. One end of the third spring is fixedly connected to the bottom of the touch plate. The third spring is slidably sleeved on the surface of the sliding rod.

[0019] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0020] By setting up the soaking unit, the present invention can limit the photovoltaic wafers in the material basket through the cooperation of the material basket and the basket cover. With the cooperation of the hydraulic rod and the first telescopic rod, the basketful of photovoltaic wafers can be reciprocated vertically in the soaking solution, accelerating the full contact between the soaking solvent and the single photovoltaic wafer, thereby optimizing the pretreatment effect and improving the pretreatment efficiency.

[0021] By setting up the guiding unit, the present invention can smoothly guide the photovoltaic wafers to the lower part of the hydraulic rod, realizing automatic feeding during the pretreatment of the photovoltaic wafers and guiding during the soaking of the photovoltaic wafers, ensuring the continuity of the pretreatment process and improving the pretreatment efficiency of the photovoltaic wafers.

[0022] By setting up the moving unit, the present invention can push the trigger plate by retracting the telescopic end of the hydraulic rod, realizing the rotation of the spring telescopic rod, and enabling the push block to push the blocking block, so that the pretreated photovoltaic wafers can be moved to the second conveyor belt together with the material basket, thus realizing the automatic discharging of the pretreated photovoltaic wafers; by setting up the processing mechanism, the input of excessive mechanical grasping devices is avoided, the production cost is reduced, the contact between the photovoltaic wafers and the cleaning solution is accelerated, the pretreatment effect of the photovoltaic wafers is optimized, and the pretreatment efficiency of the photovoltaic wafers is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 is a schematic diagram of the overall structure of the present invention;

[0024] Figure 2 is a top view of the pretreatment area of the present invention;

[0025] Figure 3 is a schematic diagram of the cooperation between the material basket and the basket cover of the present invention;

[0026] Figure 4 is an exploded three-dimensional schematic diagram of the positioning block, the first clamping block and the second clamping block of the present invention;

[0027] Figure 5 is a three-dimensional schematic diagram of the special-shaped plate of the present invention;

[0028] Figure 6 is a three-dimensional schematic diagram of the horizontal groove and the vertical groove of the present invention;

[0029] Figure 7 is a three-dimensional schematic diagram of the guiding column and the guiding groove of the present invention;

[0030] Figure 8 is a sectional schematic diagram of the friction roller and the silica gel pad of the present invention;

[0031] Figure 9Partial three-dimensional schematic diagram of the mobile unit of the present invention;

[0032] Figure 10 Three-dimensional schematic diagram of the cooperation between the spiral groove and the short rod of the present invention.

[0033] In the figure: 1. Main body mechanism; 11. Pretreatment area; 12. Cleaning area; 13. Drying area; 14. First conveyor belt; 15. Second conveyor belt; 16. Third conveyor belt; 17. Controller; 2. Processing mechanism; 21. Soaking unit; 2101. Support frame; 2102. Hydraulic rod; 2103. Basket cover; 2104. Material basket; 2105. First telescopic rod; 2106. Limiting piece; 2107. First spring; 2108. Shaped hole; 2109. Leakage hole; 22. Guiding unit; 2201. Horizontal groove; 2202. Vertical groove; 2203. First guide rod; 2204. Positioning block; 2205. First clamping hole; 2206. Second clamping hole; 2207. First clamping block; 2208. Second clamping block; 2209. Second guide rod; 2210. Electric push rod; 2211. Guide block; 2212. Clamping rod; 2213. Clamping groove; 2214. Rubber block; 2215. Extension plate; 2216. Shaped plate; 2217. L-shaped groove; 2218. Stopper; 2219. Stop rod; 2220. Connecting rod; 2221. Roller; 2222. Tension spring; 2223. Friction roller; 2224. Silicone pad; 2225. Support plate; 2226. Guide ring; 2227. Guide post; 2228. Guide groove; 23. Mobile unit; 2301. Positioning plate; 2302. Rotating cylinder; 2303. Spiral groove; 2304. Connecting column; 2305. Short rod; 2306. Touching plate; 2307. Lifting plate; 2308. Spring telescopic rod; 2309. Pushing block; 2310. Blocking block; 2311. Roller; 2312. Sliding groove; 2313. Sliding column; 2314. Third spring. Specific embodiments

[0034] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0035] Embodiment 1: Please refer to Figures 1-10, the present invention provides a technical solution: a photovoltaic silicon wafer pretreatment cleaning machine, including a main body mechanism 1. The main body mechanism 1 includes a pretreatment area 11. One side of the pretreatment area 11 is fixedly connected with a cleaning area 12. The cleaning area 12 is used for successively applying a cleaning solvent and spraying and cleaning a single photovoltaic silicon wafer after soaking. One side of the cleaning area 12 is fixedly connected with a drying area 13. The drying area 13 is used for drying the cleaned photovoltaic silicon wafers. A first conveyor belt 14 is placed on one side of the pretreatment area 11. The first conveyor belt 14 is used for conveying the basketed photovoltaic silicon wafers that have not been processed. A second conveyor belt 15 and a third conveyor belt 16 are rotatably connected to the inner cavity of the pretreatment area 11. The second conveyor belt 15 is used for conveying and placing the basketed photovoltaic silicon wafers after pretreatment. The third conveyor belt 16 is used for conveying the single photovoltaic silicon wafers after pretreatment to the cleaning area 12. A controller 17 is fixedly connected to the outside of the cleaning area 12. The controller 17 is used for controlling all power supplies. A processing mechanism 2 is arranged in the inner cavity of the pretreatment area 11;

[0036] The processing mechanism 2 includes a soaking unit 21. The soaking unit 21 is arranged in the inner cavity of the pretreatment area 11. The soaking unit 21 is used for soaking the photovoltaic silicon wafers.

[0037] As a further limitation of the processing mechanism 2 of the present invention, the soaking unit 21 includes a support frame 2101. The opposite sides of the support frame 2101 are fixedly connected with the outer surface of the pretreatment area 11. A hydraulic rod 2102 is fixedly connected to the inner top of the support frame 2101. The telescopic end of the hydraulic rod 2102 is fixedly connected with a basket cover 2103. A material basket 2104 is placed on the top of the first conveyor belt 14. The basket cover 2103 is used in cooperation with the material basket 2104. A first telescopic rod 2105 is fixedly connected to the inner bottom of the pretreatment area 11. The telescopic end of the first telescopic rod 2105 is fixedly connected with a limiting piece 2106. A first spring 2107 is slidably sleeved on the surface of the first telescopic rod 2105. One end of the first spring 2107 is fixedly connected to the inner bottom of the pretreatment area 11. The other end of the first spring 2107 is fixedly connected to the bottom of the limiting piece 2106; By setting the soaking unit 21, the photovoltaic silicon wafers can be limited in the material basket 2104 through the cooperation of the material basket 2104 and the basket cover 2103. With the cooperation of the hydraulic rod 2102 and the first telescopic rod 2105, the basketed photovoltaic silicon wafers are vertically reciprocated in the soaking solution, accelerating the full contact between the soaking solvent and the single photovoltaic silicon wafers, thereby optimizing the pretreatment effect and improving the pretreatment efficiency.

[0038] A plurality of abnormally-shaped holes 2108 arranged at equal distances are formed in the top of the basket cover 2103. The abnormally-shaped holes 2108 are used to increase the generation of bubbles. A plurality of leakage holes 2109 arranged at equal distances are formed in the bottom of the material basket 2104. By providing the abnormally-shaped holes 2108 and the leakage holes 2109, the shape of the abnormally-shaped holes 2108 is based on the shape of a Venturi tube. In cooperation with the vertical movement of the material basket 2104 and the basket cover 2103, the immersion solution passes through the abnormally-shaped holes 2108 and the leakage holes 2109, increasing the generation of bubbles. During the vertical movement of the material basket 2104, while bubbles are generated, there are also bubble ruptures. The ruptured bubbles can generate. The bubble rupture is a rapid energy release process. The gas in the bubble quickly diffuses into the surrounding water, forming an instantaneous local high-pressure area. This high-pressure area will transmit pressure waves to the surrounding water areas, having a higher frequency and energy, thereby being able to increase the impact effect on the stains adhered to the surface of the photovoltaic silicon wafer.

[0039] The specific implementation of this embodiment is as follows: when cleaning photovoltaic silicon wafers, the user places the basket 2104 full of photovoltaic silicon wafers on the first conveyor belt 14, and after the basket 2104 is transported to the designated position by the first conveyor belt 14, the basket 2104 containing photovoltaic silicon wafers is guided to the top of the first telescopic rod 2105, that is, directly below the basket cover 2103, by the guide unit 22. At this time, the hydraulic rod 2102 is activated by the controller 17 to extend the telescopic end of the hydraulic rod 2102 downward, thereby driving the basket 2104 to move upward. The cover 2103 moves down to contact with the top of the material basket 2104. The inner top of the basket cover 2103 is fixedly connected with a rubber pad to achieve soft contact with the photovoltaic silicon wafers and protect the photovoltaic silicon wafers. Through the cooperation of the basket cover 2103 and the material basket 2104, the downward pressure of the hydraulic rod 2102 is transmitted to the limit piece 2106, the first telescopic rod 2105 and the first spring 2107, so that the first telescopic rod 2105 and the first spring 2107 are compressed. The elastic coefficient of the first spring 2107 is greater than that of the material basket 2104 and the photovoltaic silicon wafer collection. The total weight of the material basket 2104 is less than the pressing force of the hydraulic rod 2102. With the compression of the first telescopic rod 2105 and the first spring 2107, the photovoltaic silicon wafer follows the basket 2104 and the basket cover 2103 to immerse in the soaking solution. After being pressed down to a certain height, the telescopic end of the hydraulic rod 2102 is retracted upward by a certain distance. This distance is to ensure that the basket cover 2103 does not separate from the soaking solution. The vertical movement is repeated for a set number of times. During the vertical movement, the soaking solution passes through the special-shaped holes 2108 and the leakage holes 2109, which increases the generation of bubbles. During the vertical movement of the basket 2104, bubbles are generated and burst at the same time. The bubble burst is a rapid energy release process. The gas in the bubble quickly diffuses into the surrounding water to form an instantaneous local high-pressure area. This high-pressure area will propagate pressure waves to the surrounding waters with higher frequency and energy, thereby increasing the effect of impacting and disintegrating the stains adhered to the surface of the photovoltaic silicon wafer, thereby accelerating the full contact between the soaking solvent and the single photovoltaic silicon wafer, optimizing the pretreatment effect and improving the pretreatment efficiency.

[0040] Example 2: Please refer to Figures 1-10 The present invention provides a technical solution: a photovoltaic silicon wafer pretreatment cleaning machine. The present invention makes corresponding improvements to the technical problems mentioned in the background technology. The processing mechanism 2 includes a guide unit 22, which is arranged in the inner cavity of the pretreatment area 11. The guide unit 22 is used in conjunction with the soaking unit 21. The guide unit 22 is used to guide the photovoltaic silicon wafers in the basket.

[0041] As a further limitation of the processing mechanism 2 of the present invention, the guiding unit 22 includes guide grooves opened on opposite sides of the inner cavity of the pretreatment area 11. The guide grooves include a horizontal groove 2201 and a vertical groove 2202. The horizontal groove 2201 and the vertical groove 2202 are connected in an L shape. The inner cavities of both guide grooves are slidably connected with first guide rods 2203. The opposite ends of the two first guide rods 2203 are fixedly connected together with a positioning block 2204. A first card hole 2205 and a second card hole 2206 are opened on one side of the positioning block 2204. The bottom of the material basket 2104 is fixedly connected with a first card block 2207. The surface of the first card block 2207 is in contact with the inner cavity of the first card hole 2205. The top of the limiting piece 2106 is fixedly connected with a second card block 2208. The surface of the second card block 2208 is in contact with the inner cavity of the second card hole 2206. Both sides of the second card block 2208 are fixedly connected with second guide rods 2209. The surface of the second guide rod 2209 is slidably connected with the inner cavity of the vertical groove 2202. Both sides of the pretreatment area 11 are fixedly connected with electric push rods 2210. The telescopic end of the electric push rod 2210 is fixedly connected with a guide block 2211. One side of the guide block 2211 penetrates into the inner cavity of the pretreatment area 11. A hole is opened on the inner wall of the pretreatment area 11. The surface of the guide block 2211 is slidably connected with the inner cavity of the hole. The bottom of the guide block 2211 is fixedly connected with a clamping rod 2212. A card slot 2213 for cooperating with the clamping rod 2212 is opened on the surface of the first guide rod 2203. The surface of the clamping rod 2212 is in contact with the inner cavity of the card slot 2213. A rubber block 2214 is fixedly connected to the upper surface of the second guide rod 2209. The rubber block 2214 is used to reduce the impact force when the first guide rod 2203 falls into the vertical groove 2202; by setting the guiding unit 22, it is possible to smoothly guide the photovoltaic silicon wafers contained to the lower part of the hydraulic rod 2102, realizing automatic feeding during the pretreatment of the photovoltaic silicon wafers, and realizing the guiding during the immersion of the photovoltaic silicon wafers, ensuring the continuity of the pretreatment process and improving the pretreatment efficiency of the photovoltaic silicon wafers.

[0042] An extension plate 2215 is fixedly connected to the inner side of the preprocessing area 11. A special-shaped plate 2216 is fixedly connected to one side of the extension plate 2215. An L-shaped groove 2217 is formed in the inner wall of the positioning block 2204. A blocking block 2218 is slidably connected to the inner cavity of the L-shaped groove 2217. A blocking rod 2219 is fixedly connected to one side of the material basket 2104. One end of the blocking rod 2219 contacts one side of the blocking block 2218. The cooperation between the blocking rod 2219 and the blocking block 2218 realizes the limit of the maximum displacement of the material basket 2104. A connecting rod 2220 is fixedly connected to one side of the blocking block 2218. The connecting rod 2220 is slidably connected to the inner cavity of the L-shaped groove 2217. One end of the connecting rod 2220 is rotatably connected to a roller 2221 through a bearing. The roller 2221 is rollingly connected to the surface of the special-shaped plate 2216. A tension spring 2222 is fixedly connected to the inner bottom of the L-shaped groove 2217. One end of the tension spring 2222 is fixedly connected to the bottom of the connecting rod 2220; by setting the cooperation of the extension plate 2215, the special-shaped plate 2216, the blocking block 2218, the blocking rod 2219, the connecting rod 2220, the roller 2221 and the tension spring 2222, as the positioning block 2204 moves towards the direction of the first conveyor belt 14, the roller 2221 contacts the higher part of the special-shaped plate 2216, so that the connecting rod 2220 rises a certain distance. When the connecting rod 2220 rises, it stretches the tension spring 2222. The rising of the connecting rod 2220 causes the blocking block 2218 to move upward in the inner cavity of the L-shaped groove 2217. The material basket 2104 follows the conveying of the first conveyor belt 14 to drive the blocking rod 2219 to contact the blocking block 2218, thus realizing the limit of the moving distance of the material basket 2104 and avoiding excessive movement of the material basket 2104. The tension spring 2222 can reset the vertical displacement of the connecting rod 2220 when the roller 2221 moves to the lower part of the special-shaped plate 2216.

[0043] A plurality of friction rollers 2223 are rotatably connected to the inner bottom wall of the first card hole 2205 through one-way bearings. A silica gel pad 2224 is fixedly connected to the surface of the friction rollers 2223. The surface of the friction rollers 2223 contacts the bottom of the first card block 2207; by setting the cooperation of the one-way bearings, the friction rollers 2223 and the silica gel pad 2224, the forward movement of the material basket 2104 can be realized smoothly, and the reverse movement is blocked, thus ensuring the stability of the material basket 2104 after movement.

[0044] On both sides of the pretreatment area 11, there are fixed connection support plates 2225. A guide ring 2226 is fixedly sleeved on the surface of the telescopic end of the electric push rod 2210. A guide post 2227 is fixedly connected to the lower surface of the guide ring 2226. A guide groove 2228 that cooperates with the guide post 2227 is opened at the top of the support plate 2225. The surface of the guide post 2227 is slidably connected to the inner cavity of the guide groove 2228; by setting the cooperation of the support plate 2225, the guide ring 2226, the guide post 2227 and the guide groove 2228, the guiding of the moving track of the telescopic end of the electric push rod 2210 is realized, and the stability of the telescopic end of the electric push rod 2210 during telescoping is increased.

[0045] The specific implementation of this embodiment is as follows: When the basket 2104 filled with photovoltaic silicon wafers moves through the first conveyor belt 14 to one end of the first clamping block 2207 and starts to be inserted into the first clamping hole 2205 on one side of the positioning block 2204, in the initial state, the positioning block 2204 is located at the position closest to the first conveyor belt 14. When one end of the first clamping block 2207 is inserted into the inner cavity of the first clamping hole 2205, at the same time, the first clamping block 2207 will contact the first friction roller 2223 and push the friction roller 2223 to rotate. As the first clamping block 2207 continues to move, the first clamping block 2207 will successively contact all the friction rollers 2223. Since the friction rollers 2223 are driven by one-way bearings, the reverse rotation of the friction rollers 2223 is locked, preventing the first clamping block 2207 from moving back. And the friction between the friction roller 2223 and the first clamping block 2207 is increased by the silica gel pad 2224, improving the stability after the first clamping block 2207 is inserted into the first clamping hole 2205. When the first clamping block 2207 is completely inserted into the first clamping hole 2205, before that, through the cooperation of the extension plate 2215, the special-shaped plate 2216, the stopper 2218, the connecting rod 2220, the roller 2221 and the tension spring 2222, the stopper 2218 is raised to a certain height to block the blocking rod 2219 on one side of the basket 2104, thereby limiting the moving distance of the basket 2104 and preventing the basket 2104 from moving excessively. The controller 17 is used to start the two electric push rods 2210, and the telescopic ends of the two electric push rods 2210 retract. At this time, the clamping rod 2212 is embedded in the inner cavity of the clamping groove 2213. As the telescopic ends of the electric push rods 2210 retract, the guide block 2211 and the clamping rod 2212 are driven to move in the direction of the second clamping block 2208. The movement of the clamping rod 2212 drives the first guide rod 2203 to move, and the movement of the first guide rod 2203 drives the positioning block 2204 with the first clamping block 2207 inserted to move, thereby realizing the conveying of the basket 2104 filled with photovoltaic silicon wafers. When the first guide rod 2203 moves to the entrance of the vertical groove 2202 in the inner cavity of the horizontal groove 2201, the first guide rod 2203 moves to the top of the rubber block 2214. At the same time, the second clamping block 2208 is completely inserted into the inner cavity of the second clamping hole 2206, realizing the fitting of the second clamping block 2208 and the positioning block 2204. During the movement of the positioning block 2204, the roller 2221 is driven to move on the surface of the special-shaped plate 2216. When the roller 2221 moves to the lowest point of the special-shaped plate 2216, due to the reaction force of the tension spring 2222, the stopper 2218 falls into the inner cavity of the L-shaped groove 2217, canceling the block on the blocking rod 2219. At this time, the hydraulic rod 2102 is driven, and through the downward extension of the telescopic end of the hydraulic rod 2102, the basket 2104 is pressed down by the basket cover 2103. During the downward movement of the basket 2104, the positioning block 2204 and the two first guide rods 2203 are driven to move downward. When moving vertically, the first guide rod 2203 is guided by the vertical groove 2202. When the first guide rod 2203 moves downward,The clamping rod 2212 disengages from the inner cavity of the clamping groove 2213. The downward movement of the positioning block 2204 pushes the second clamping block 2208 downward. There is appropriate friction between the second clamping block 2208 and the second clamping hole 2206, ensuring the stability of the engagement between the second clamping block 2208 and the second clamping hole 2206 when the material basket 2104 moves vertically. The downward movement of the second clamping block 2208 simultaneously drives the second guide rod 2209 to move downward in the inner cavity of the vertical groove 2202, ensuring the stability of the second clamping block 2208 during vertical movement. Thus, the guiding of the material basket 2104 containing photovoltaic wafers during loading and soaking is realized, ensuring the smooth progress of the pretreatment process and improving the efficiency of photovoltaic wafer pretreatment.

[0046] Embodiment 3: Please refer to Figures 1-10 , the present invention provides a technical solution: a pretreatment cleaning machine for photovoltaic wafers. The present invention makes corresponding improvements to the technical problems mentioned in the background art. The processing mechanism 2 further includes a moving unit 23. The moving unit 23 is arranged on the opposite sides of the support frame 2101. The moving unit 23 is used in cooperation with the soaking unit 21 and the guiding unit 22, and the moving unit 23 is used to transfer the photovoltaic wafers after soaking is completed.

[0047] As a further limitation of the processing mechanism 2 of the present invention, the moving unit 23 includes a positioning plate 2301 fixedly connected to the inner side of the support frame 2101. The number of the positioning plates 2301 is two, and the two positioning plates 2301 are arranged oppositely. The top of the positioning plate 2301 is rotatably connected to a rotating cylinder 2302 through a bearing. A spiral groove 2303 is formed in the inner wall of the rotating cylinder 2302. A connecting column 2304 is slidably connected to the inner cavity of the rotating cylinder 2302. A short rod 2305 that cooperates with the spiral groove 2303 is fixedly connected to the surface of the connecting column 2304. The surface of the short rod 2305 is slidably connected to the inner cavity of the spiral groove 2303. The top end of the connecting column 2304 is fixedly connected to a touch plate 2306. The telescopic end of the hydraulic rod 2102 is fixedly connected to a jacking plate 2307. The top of the jacking plate 2307 is in contact with the bottom of the touch plate 2306. A spring telescopic rod 2308 is fixedly connected to the surface of the rotating cylinder 2302. The telescopic end of the spring telescopic rod 2308 is fixedly connected to a pushing block 2309. Blocks 2310 are fixedly connected to both sides of the material basket 2104. The pushing block 2309 is used to apply a thrust to the blocks 2310. One end of the pushing block 2309 is rotatably connected to a roller 2311 through a rotating shaft. The surface of the roller 2311 is in rolling contact with the surface of the material basket 2104; by setting the moving unit 23, it is possible to push the touch plate 2306 by means of the retraction of the telescopic end of the hydraulic rod 2102, realize the rotation of the spring telescopic rod 2308, and make the pushing block 2309 push the blocks 2310, so that the photovoltaic wafers after pretreatment are moved to the second conveyor belt 15 together with the material basket 2104, thus realizing the automatic blanking of the photovoltaic wafers after pretreatment.

[0048] On the inner side of the support frame 2101, two oppositely arranged sliding grooves 2312 are provided. The surface of the trigger plate 2306 is slidably connected to the inner cavity of the sliding groove 2312. A sliding column 2313 is fixedly connected to the inner wall of the sliding groove 2312, and the inner wall of the trigger plate 2306 is slidably connected to the surface of the sliding column 2313; By providing the sliding groove 2312 and the sliding column 2313, the guiding of the vertical displacement of the trigger plate 2306 is realized, and the stability of the trigger plate 2306 during vertical displacement is increased.

[0049] A third spring 2314 is fixedly connected to the inner bottom of the sliding groove 2312. One end of the third spring 2314 is fixedly connected to the bottom of the trigger plate 2306. The third spring 2314 is slidably sleeved on the surface of the sliding rod; By providing the third spring 2314, when the trigger plate 2306 moves upward, the third spring 2314 is stretched. When the trigger plate 2306 loses the jacking force, the reaction force of the third spring 2314 can realize the reset of the trigger plate 2306.

[0050] The specific implementation mode of this embodiment is as follows: When the pretreatment of the photovoltaic silicon wafer is completed, the hydraulic rod 2102 drives the basket cover 2103 to move upward to the initial height. At this time, the material basket 2104 containing the photovoltaic silicon wafer is located at the top of the first telescopic rod 2105, and the bottom of the material basket 2104 is flush with the top of the second conveyor belt 15. Through the controller 17, the telescopic end of the hydraulic rod 2102 is controlled to move upward and retract. At this time, it drives the two jacking plates 2307 to push the two trigger plates 2306 from bottom to top, so that the trigger plate 2306 moves upward. The upward movement of the trigger plate 2306 drives the connecting column 2304 to move upward. The upward movement of the connecting column 2304 drives the short rod 2305 to move upward. Through the cooperation of the short rod 2305 and the spiral groove 2303, the rotating cylinder 2302 rotates. The rotation of the rotating cylinder 2302 drives the spring telescopic rod 2308 to rotate. The rotation of the spring telescopic rod 2308 makes the push block 2309 contact the blocking block 2310 and generates a thrust on the blocking block 2310. During the rotation of the push block 2309, first, it contacts the side surface of the material basket 2104 through the roller 2311. The roller 2311 can reduce the friction between the push block 2309 and the material basket 2104. The spring telescopic rod 2308 is provided to ensure that the push block 2309 always contacts the blocking block 2310, so as to realize the smooth pushing of the material basket 2104, and make the material basket 2104 move to the top of the second conveyor belt 15. When a part of the material basket 2104 contacts the second conveyor belt 15, the second conveyor belt 15 is started through the controller 17 to realize the fixed-distance conveying of the material basket 2104, ensuring that the pretreated photovoltaic silicon wafers can be stably placed on the top of the second conveyor belt 15. Subsequently, the photovoltaic silicon wafers are taken out one by one by manual or external manipulator equipment and placed on the third conveyor belt 16 for subsequent cleaning and drying.

[0051] It should be noted that in this text, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprising", "including" or any other variation thereof are intended to cover non-exclusive inclusion, such that a process, method, article or device comprising a series of elements not only includes those elements but also includes other elements not expressly listed, or elements inherent to such process, method, article or device.

[0052] Although the embodiments of the present invention have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A photovoltaic silicon wafer pretreatment cleaning machine, comprising a main body (1), the main body (1) comprising a pretreatment area (11), one side of the pretreatment area (11) is fixedly connected to a cleaning area (12), one side of the cleaning area (12) is fixedly connected to a drying area (13), a first conveyor belt (14) is placed on one side of the pretreatment area (11), the inner cavity of the pretreatment area (11) is rotatably connected to a second conveyor belt (15) and a third conveyor belt (16), the outer side of the cleaning area (12) is fixedly connected to a controller (17), the controller (17) is used to control all power supplies, and is characterized in that: The inner cavity of the pre-treatment area (11) is provided with a treatment mechanism (2); The processing mechanism (2) comprises a soaking unit (21), the soaking unit (21) is arranged in the inner cavity of the pre-processing area (11), and the soaking unit (21) is used to soak the photovoltaic silicon wafer; The processing mechanism (2) comprises a guiding unit (22), the guiding unit (22) being arranged in the inner cavity of the pre-processing area (11), the guiding unit (22) being used in conjunction with the soaking unit (21), and the guiding unit (22) being used to guide the photovoltaic silicon wafers in the basket; The processing mechanism (2) further comprises a moving unit (23), wherein the moving unit (23) is arranged on the opposite side of the support frame (2101), and the moving unit (23) is used in conjunction with the soaking unit (21) and the guide unit (22), and the moving unit (23) is used to realize the transfer of the photovoltaic silicon wafer after the soaking is completed; The soaking unit (21) comprises a support frame (2101), the opposite side of the support frame (2101) is fixedly connected to the outer surface of the pretreatment area (11), the inner top of the support frame (2101) is fixedly connected to a hydraulic rod (2102), the telescopic end of the hydraulic rod (2102) is fixedly connected to a basket cover (2103), a material basket (2104) is placed on the top of the first conveyor belt (14), and the basket cover (2103) is used in conjunction with the material basket (2104). The inner bottom of the pretreatment area (11) is fixedly connected with a first telescopic rod (2105), the telescopic end of the first telescopic rod (2105) is fixedly connected with a limiting plate (2106), the surface sliding sleeve of the first telescopic rod (2105) is provided with a first spring (2107), one end of the first spring (2107) is fixedly connected to the inner bottom of the pretreatment area (11), and the other end of the first spring (2107) is fixedly connected to the bottom of the limiting plate (2106).

2. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 1, characterized in that: The top of the basket cover (2103) is provided with a plurality of equidistantly arranged irregular holes (2108), and the irregular holes (2108) are used to increase the generation of bubbles. The bottom of the material basket (2104) is provided with a plurality of equidistantly arranged leakage holes (2109).

3. The photovoltaic silicon wafer pretreatment cleaning machine according to claim 1, characterized in that: The guide unit (22) comprises a guide groove opened on the opposite side of the inner cavity of the pretreatment area (11), the guide groove comprises a transverse groove (2201) and a vertical groove (2202), the transverse groove (2201) and the vertical groove (2202) are connected in an L shape, the inner cavities of the two guide grooves are both slidably connected with a first guide rod (2203), the opposite ends of the two first guide rods (2203) are commonly fixedly connected with a positioning block (2204), and one side of the positioning block (2204) is provided with a first clamping hole (2201). 205) and a second clamping hole (2206), the bottom of the material basket (2104) is fixedly connected with a first clamping block (2207), the surface of the first clamping block (2207) contacts the inner cavity of the first clamping hole (2205), the top of the limiting plate (2106) is fixedly connected with a second clamping block (2208), the surface of the second clamping block (2208) contacts the inner cavity of the second clamping hole (2206), and the second guide rods (2208) are fixedly connected on both sides of the second clamping block (2208). 209), the surface of the second guide rod (2209) is slidably connected to the inner cavity of the vertical groove (2202), both sides of the pretreatment area (11) are fixedly connected with electric push rods (2210), the telescopic end of the electric push rod (2210) is fixedly connected with a guide block (2211), one side of the guide block (2211) penetrates into the inner cavity of the pretreatment area (11), the inner wall of the pretreatment area (11) is provided with a hole, the surface of the guide block (2211) is slidably connected to the inner cavity of the hole, the The bottom of the guide block (2211) is fixedly connected with a clamping rod (2212); the surface of the first guide rod (2203) is provided with a clamping groove (2213) used in conjunction with the clamping rod (2212); the surface of the clamping rod (2212) is in contact with the inner cavity of the clamping groove (2213); the upper surface of the second guide rod (2209) is fixedly connected with a rubber block (2214); the rubber block (2214) is used to reduce the impact force when the first guide rod (2203) falls into the vertical groove (2202).

4. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 3, characterized in that: An extension plate (2215) is fixedly connected to the inner side of the pretreatment area (11), and a special-shaped plate (2216) is fixedly connected to one side of the extension plate (2215). An L-shaped groove (2217) is provided on the inner wall of the positioning block (2204), and a stopper (2218) is slidably connected to the inner cavity of the L-shaped groove (2217). A stopper rod (2219) is fixedly connected to one side of the material basket (2104), and one end of the stopper rod (2219) contacts one side of the stopper block (2218). The cooperation between the stopper rod (2219) and the stopper block (2218) is realized. Now, for limiting the maximum displacement of the material basket (2104), a connecting rod (2220) is fixedly connected to one side of the stop block (2218), and the connecting rod (2220) is slidably connected to the inner cavity of the L-shaped groove (2217). One end of the connecting rod (2220) is rotatably connected to a roller (2221) through a bearing, and the roller (2221) is rollingly connected to the surface of the special-shaped plate (2216). A tension spring (2222) is fixedly connected to the inner bottom of the L-shaped groove (2217), and one end of the tension spring (2222) is fixedly connected to the bottom of the connecting rod (2220).

5. The photovoltaic silicon wafer pretreatment cleaning machine according to claim 3, characterized in that: The inner bottom wall of the first clamping hole (2205) is rotatably connected to a plurality of friction rollers (2223) via a one-way bearing, and the surface of the friction roller (2223) is fixedly connected to a silicone pad (2224), and the surface of the friction roller (2223) is in contact with the bottom of the first clamping block (2207).

6. The photovoltaic silicon wafer pretreatment cleaning machine according to claim 3, characterized in that: Support plates (2225) are fixedly connected to both sides of the pretreatment area (11), a guide ring (2226) is fixedly sleeved on the surface of the telescopic end of the electric push rod (2210), a guide column (2227) is fixedly connected to the lower surface of the guide ring (2226), a guide groove (2228) for use with the guide column (2227) is formed on the top of the support plate (2225), and the surface of the guide column (2227) is slidably connected to the inner cavity of the guide groove (2228).

7. The photovoltaic silicon wafer pretreatment cleaning machine according to claim 3, characterized in that: The mobile unit (23) comprises a positioning plate (2301) fixedly connected to the inner side of the support frame (2101), the number of the positioning plates (2301) is two, the two positioning plates (2301) are arranged opposite to each other, the top of the positioning plate (2301) is rotatably connected to a rotating cylinder (2302) via a bearing, the inner wall of the rotating cylinder (2302) is provided with a spiral groove (2303), the inner cavity of the rotating cylinder (2302) is slidably connected to a connecting column (2304), the surface of the connecting column (2304) is fixedly connected to a short rod (2305) used in conjunction with the spiral groove (2303), the surface of the short rod (2305) is slidably connected to the inner cavity of the spiral groove (2303), the top of the connecting column (2304) is fixedly connected to the inner cavity of the spiral groove (2303), A touch plate (2306) is fixedly connected to the hydraulic rod (2102), the telescopic end of the hydraulic rod (2102) is fixedly connected to a lifting plate (2307), the top of the lifting plate (2307) is in contact with the bottom of the touch plate (2306), the surface of the rotating cylinder (2302) is fixedly connected to a spring telescopic rod (2308), the telescopic end of the spring telescopic rod (2308) is fixedly connected to a push block (2309), both sides of the material basket (2104) are fixedly connected to a blocking block (2310), the pushing block (2309) is used to apply thrust to the blocking block (2310), one end of the pushing block (2309) is rotatably connected to a roller (2311) through a rotating shaft, and the surface of the roller (2311) is in rolling contact with the surface of the material basket (2104).

8. The photovoltaic silicon wafer pretreatment cleaning machine according to claim 7, characterized in that: The inner side of the support frame (2101) is provided with two oppositely arranged sliding grooves (2312), the surface of the touch plate (2306) is slidably connected to the inner cavity of the sliding groove (2312), the inner wall of the sliding groove (2312) is fixedly connected with a sliding column (2313), and the inner wall of the touch plate (2306) is slidably connected to the surface of the sliding column (2313).

9. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 8, characterized in that: A third spring (2314) is fixedly connected to the inner bottom of the slide groove (2312), one end of the third spring (2314) is fixedly connected to the bottom of the touch plate (2306), and the third spring (2314) is slidably sleeved on the surface of the slide rod.

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