Radio frequency power supply voltage control method and device, storage medium and electronic equipment

Abstract

The invention relates to a radio frequency power supply voltage control method and device, a storage medium and electronic equipment. The method comprises the following steps: setting a target voltage for a target process environment; using a PID controller to control a radio frequency power supply of the target process environment, so that the output voltage of the target process environment reaches the target voltage, obtaining the output power of the target process environment, and determining the output power as target feed-forward power; when the target process environment enters the production line control process, under the condition that the current feed-forward power of the target process environment is not equal to the target feed-forward power, the target feed-forward power is used for controlling a radio frequency power supply; and under the condition that the output voltage of the target process environment reaches the voltage steady state, the PID controller is used for controlling the radio frequency power supply, so that the output voltage of the target process environment reaches the target voltage. The technical problem that the radio frequency power supply voltage of the etching machine cannot be stably controlled is solved.

Description

Technical Field

[0001] The present application relates to the field of microelectronics, and in particular to a method, device, storage medium and electronic device for controlling a radio frequency power supply voltage. Background Art

[0002] The etcher is a device for implementing the wafer etching process in the field of microelectronics. The etching process is the next manufacturing process of the photolithography process. The wafer produces photolithography lines during the photolithography process. The etcher uses specific free gases to react chemically with the photolithography lines to achieve high-precision etching effects. The RF power supply is the key core equipment of the etching process. The RF power supply generates voltage and forms an electric field, thereby pushing the free gas to adhere to the wafer and react chemically with the photolithography lines, such as Figure 1 The schematic diagram of the etching machine is shown in the figure. In addition to the gas ratio, another important factor affecting the quality of the etching process is the control of the strength of the electric field, which is mainly achieved by controlling the voltage of the RF power supply. The electric field must be stable during the etching process. However, with the change of the free gas and the change of the pressure, the electric field is always in an unstable state. At present, there is no RF power supply that can meet the requirements, so it is very important to quickly achieve the voltage steady state of the RF power supply through the outer loop control. The etching process requires that the control parameters are as simple as possible, the time to reach the target voltage steady state cannot exceed 0.3 seconds, and the voltage fluctuation cannot exceed 1%. Due to the constant change of the characteristics of the etching environment, it is difficult for the traditional PID controller (proportional, integral and derivative, proportional-integral-differential controller) to find a set of parameters that meet all voltage process requirements, and manual parameter adjustment is time-consuming. Modern control algorithms such as LQR (linear quadratic regulator) and MPC (Model Predictive Control) require model parameters with a certain degree of accuracy, which are not applicable. Therefore, it is necessary to develop a control strategy with simple adjustable parameters that can quickly reach a steady state to meet this requirement. Summary of the invention

[0003] The present application provides a method, device, storage medium and electronic device for controlling a radio frequency power supply voltage to solve the technical problem that the radio frequency power supply voltage of an etcher cannot be controlled in a stable state.

[0004] In a first aspect, the present application provides a method for controlling an RF power supply voltage, comprising: setting a target voltage for a target process environment; using a PID controller to control the RF power supply of the target process environment so that the output voltage of the target process environment reaches the target voltage, obtaining the output power of the target process environment, and determining the output power as the target feedforward power; when the target process environment enters a production line control process, when the current feedforward power of the target process environment is not equal to the target feedforward power, using the target feedforward power to control the RF power supply; when the output voltage of the target process environment reaches a voltage steady state, using the PID controller to control the RF power supply so that the output voltage of the target process environment reaches the target voltage.

[0005] In the second aspect, the present application provides a control device for an RF power supply voltage, comprising: a setting module, used to set a target voltage for a target process environment; a first control module, used to use a PID controller to control the RF power supply of the above-mentioned target process environment, so that the output voltage of the above-mentioned target process environment reaches the above-mentioned target voltage, obtain the output power of the above-mentioned target process environment, and determine the above-mentioned output power as the target feedforward power; a second control module, used to control the above-mentioned RF power supply using the above-mentioned target feedforward power when the above-mentioned target process environment enters a production line control process and when the current feedforward power of the above-mentioned target process environment is not equal to the above-mentioned target feedforward power; a third control module, used to control the above-mentioned RF power supply using the above-mentioned PID controller when the output voltage of the above-mentioned target process environment reaches a voltage steady state, so that the output voltage of the above-mentioned target process environment reaches the above-mentioned target voltage.

[0006] As an optional example, the above-mentioned device also includes: a first acquisition module, which is used to use a response curve algorithm to obtain the load characteristic parameters of the above-mentioned target process environment before using the PID controller to control the RF power supply of the above-mentioned target process environment, wherein the above-mentioned load characteristic parameters include the maximum power that the above-mentioned RF power supply can receive, the minimum power that the above-mentioned RF power supply can receive, the minimum voltage output by the above-mentioned target process environment, the response rate time and the lag time; a setting module, which is used to use the above-mentioned target voltage and the above-mentioned load characteristic parameters to set the basic parameters of the above-mentioned PID controller.

[0007] As an optional example, the above-mentioned acquisition module includes: a first processing unit, used to filter the above-mentioned target process environment; a second processing unit, used to perform open-loop control on the above-mentioned target process environment and disconnect the feedback channel; an input unit, used to input a step signal into the above-mentioned target process environment to obtain a characteristic curve output by the above-mentioned target process environment; a first acquisition unit, used to obtain the maximum power that the above-mentioned RF power supply can receive, the minimum power that the above-mentioned RF power supply can receive, the minimum voltage output by the above-mentioned target process environment, the above-mentioned response rate time and the above-mentioned lag time from the above-mentioned characteristic curve.

[0008] As an optional example, the above-mentioned tuning module includes: a first calculation unit, used to calculate the ascent speed according to the maximum power that the above-mentioned RF power supply can receive, the minimum power that the above-mentioned RF power supply can receive, the above-mentioned target voltage, the minimum voltage output by the above-mentioned target process environment and the above-mentioned response rate time; a second calculation unit, used to calculate the proportionality, integral time and differential time according to the above-mentioned ascent speed and the above-mentioned lag time; a tuning unit, used to tune the basic parameters of the above-mentioned PID controller according to the above-mentioned proportionality, the above-mentioned integral time and the above-mentioned differential time.

[0009] As an optional example, the above-mentioned device also includes: a second acquisition module, used to obtain the current feedforward power of the above-mentioned target process environment before using the above-mentioned target feedforward power to control the above-mentioned RF power supply; a judgment module, used to judge whether the above-mentioned current feedforward power is equal to the above-mentioned target feedforward power; a fourth control module, used to use the above-mentioned PID controller to control the above-mentioned RF power supply when the above-mentioned current feedforward power is equal to the above-mentioned target feedforward power, so that the output voltage of the above-mentioned target process environment reaches the above-mentioned target voltage.

[0010] As an optional example, the above-mentioned third control module includes: a second acquisition unit, used to acquire the steady-state voltage when the output voltage of the above-mentioned target process environment reaches the voltage steady state; a third calculation unit, used to calculate the voltage difference between the above-mentioned target voltage and the above-mentioned steady-state voltage, and input the above-mentioned voltage difference to the above-mentioned PID controller to obtain the target power output by the above-mentioned PID controller; a fourth calculation unit, used to calculate the power sum of the above-mentioned target power and the above-mentioned target feedforward power, and input the above-mentioned power sum to the above-mentioned target process environment, so that the output voltage of the above-mentioned target process environment reaches the above-mentioned target voltage.

[0011] As an optional example, the third control module further includes: a third acquisition unit, used to acquire the current output voltage of the target process environment after the power and input into the target process environment; a judgment unit, used to judge whether the current output voltage is equal to the target voltage; and a control unit, used to control the RF power supply using the PID controller according to the current output voltage when the current output voltage is not equal to the target voltage, so that the output voltage of the target process environment reaches the target voltage.

[0012] In a third aspect, the present application provides a storage medium storing a computer program, wherein the computer program executes the above-mentioned method for controlling the RF power supply voltage when executed by a processor.

[0013] In a fourth aspect, the present application further provides an electronic device, comprising a memory and a processor, wherein the memory stores a computer program, and the processor is configured to execute the above-mentioned method for controlling the RF power supply voltage through the computer program.

[0014] In an embodiment of the present application, a method is adopted in which a target voltage is set for a target process environment; a PID controller is used to control the RF power supply of the target process environment so that the output voltage of the target process environment reaches the target voltage, the output power of the target process environment is obtained, and the output power is determined as the target feedforward power; when the target process environment enters the production line control process, when the current feedforward power of the target process environment is not equal to the target feedforward power, the target feedforward power is used to control the RF power supply; when the output voltage of the target process environment reaches a voltage steady state, the PID controller is used to control the RF power supply so that the output voltage of the target process environment reaches the target voltage. Since in the above method By setting the target voltage, before the target process environment enters the production line control, the PID controller is used to control the RF power supply of the target process environment so that the output voltage of the target process environment reaches the target voltage, and the output power at this time is determined as the target feedforward power. When the target process environment enters the production line control process, if the current feedforward power of the target process environment is not equal to the target feedforward power, a segmented control strategy is adopted. The target feedforward power is first used to control the RF power supply so that the output voltage of the target process environment reaches a voltage steady state, and then the PID controller is used to control the RF power supply so that the output voltage of the target process environment reaches the target voltage, thereby achieving the purpose of steady-state control of the RF power supply voltage, and then solving the technical problem that the RF power supply voltage of the etcher cannot be steadily controlled. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and, together with the description, serve to explain the principles of the present application.

[0016] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, for ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0017] One or more embodiments are exemplarily described by pictures in the corresponding drawings, and these exemplified descriptions do not constitute limitations on the embodiments. Elements with the same reference numerals in the drawings represent similar elements, and unless otherwise stated, the figures in the drawings do not constitute proportional limitations.

[0018] Figure 1 is a schematic diagram of an etching machine according to an optional method for controlling the RF power supply voltage according to an embodiment of the present application;

[0019] Figure 2 is a flow chart of an optional method for controlling the voltage of a radio frequency power supply according to an embodiment of the present application;

[0020] Figure 3 is a system communication block diagram of an optional method for controlling the voltage of a radio frequency power supply according to an embodiment of the present application;

[0021] Figure 4 is a graph of a pre-filtering RF power response curve of an optional RF power voltage control method according to an embodiment of the present application;

[0022] Figure 5 is a filtered RF power response curve diagram of an optional RF power voltage control method according to an embodiment of the present application;

[0023] Figure 6 is a characteristic curve diagram of a radio frequency power supply according to an optional method for controlling the voltage of a radio frequency power supply according to an embodiment of the present application;

[0024] Figure 7 is a flow chart of a preparation of an optional method for controlling the voltage of a radio frequency power supply according to an embodiment of the present application;

[0025] Figure 8 is a flow chart of segmented control execution of an optional method for controlling the voltage of a radio frequency power supply according to an embodiment of the present application;

[0026] Fig. 9 is a PID control block diagram of an optional method for controlling the RF power supply voltage according to an embodiment of the present application;

[0027] Fig.10 is a schematic structural diagram of an optional RF power supply voltage control device according to an embodiment of the present application;

[0028] Fig.11 is a schematic diagram of an optional electronic device according to an embodiment of the present application. DETAILED DESCRIPTION

[0029] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application.

[0030] The disclosure below provides many different embodiments or examples to realize the different structures of the present application. In order to simplify the disclosure of the present application, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application. In addition, the present application can repeat reference numbers and / or letters in different examples. This repetition is for the purpose of simplification and clarity, and does not itself indicate the relationship between the various embodiments and / or settings discussed.

[0031] Embodiment 1, in order to solve the technical problem that the RF power supply voltage of the etcher cannot be controlled in a steady state, according to the first aspect of the embodiment of the present application, a method for controlling the RF power supply voltage is provided, optionally, as Figure 2 As shown, the above method includes:

[0032] S202, setting a target voltage for a target process environment;

[0033] S204, using a PID controller to control the RF power supply of the target process environment so that the output voltage of the target process environment reaches the target voltage, obtaining the output power of the target process environment, and determining the output power as the target feedforward power;

[0034] S206, when the target process environment enters the production line control process, if the current feedforward power of the target process environment is not equal to the target feedforward power, use the target feedforward power to control the RF power supply;

[0035] S208, when the output voltage of the target process environment reaches a voltage steady state, use a PID controller to control the RF power supply so that the output voltage of the target process environment reaches a target voltage.

[0036] In the first embodiment, the target process environment may be an etching process. A PID controller (Proportion Integration Differentiation) is composed of a proportional unit (P), an integral unit (I) and a differential unit (D). By setting the three parameters Kp, Ki and Kd. The PID controller is mainly suitable for systems whose basic linearity and dynamic characteristics do not change over time.

[0037] In the first embodiment, the system communication block diagram of the etching machine system is as follows: Figure 3 As shown, the client's host computer exchanges information with the etcher system through shared memory. The etcher system communicates with the voltage acquisition module and the RF power supply as an EtherCAT (Ethernet control automation technology, an open architecture, Ethernet-based fieldbus system) master station. The etcher system can store the recipe parameters of the PID controller.

[0038] Optionally, in the first embodiment of the present invention, by setting the target voltage, before the target process environment enters the production line control, the PID controller is used to control the RF power supply of the target process environment so that the output voltage of the target process environment reaches the target voltage, and the output power at this time is determined as the target feedforward power. When the target process environment enters the production line control process, the output of the RF power supply from 0 output to output is still unstable. When the current feedforward power of the target process environment is not equal to the target feedforward power, if the PID controller is directly used to control the RF power supply to change the target power, the matching time to reach the target voltage will be prolonged or continuously oscillate, or even the target voltage cannot be reached. Therefore, the present application adopts a segmented control strategy, first using the target feedforward power to control the RF power supply, so that the output voltage of the target process environment is quickly stabilized near the power required for the target voltage, so as to achieve a fast and stable response effect. When the output voltage of the target process environment is stabilized near the power required for the target voltage, the PID controller is immediately switched in, and the PID controller is used to control the RF power supply, so that the output voltage of the target process environment reaches the target voltage and stabilizes at the target voltage, thereby achieving the purpose of steady-state control of the RF power supply voltage, thereby solving the technical problem that the RF power supply voltage of the etcher cannot be steadily controlled.

[0039] Embodiment 2: Since the characteristics of the etching environment are constantly changing, it is difficult for a traditional PID controller to find a set of parameters that meet all voltage process requirements. The optimal PID gain parameters of the RF power supply change with the target voltage. Manual participation is required to find the optimal gain parameters, and the optimal PID gain parameters must be found manually for the target voltages used in all processes. The workload is huge and manual parameter adjustment is time-consuming. Therefore, it is necessary to use a response curve algorithm to adjust the basic parameters of the PID controller according to the load characteristic parameters of the target process environment, thereby reducing manual parameter adjustment and improving the voltage regulation speed.

[0040] Optionally, before using the PID controller to control the RF power supply of the target process environment, the method further includes:

[0041] Using a response curve algorithm to obtain load characteristic parameters of a target process environment, wherein the load characteristic parameters include a maximum power that the RF power source can receive, a minimum power that the RF power source can receive, a minimum voltage output by the target process environment, a response rate time, and a hysteresis time;

[0042] Use the target voltage and load characteristic parameters to tune the basic parameters of the PID controller.

[0043] In the second embodiment, the response curve algorithm, that is, the self-tuning algorithm, obtains the load characteristic parameters of the controlled object according to the step response curve of the target process environment, including the maximum power that the RF power supply can receive, the minimum power that the RF power supply can receive, the minimum voltage output by the target process environment, the response rate time and the lag time, and then uses the target voltage and the load characteristic parameters to adjust the basic parameters of the PID controller. The self-tuning algorithm has a certain fault tolerance for the gain parameters of the PID controller, that is, the parameters of the PID controller may not be the optimal adjustment time, but only need to be able to stabilize the voltage near the target voltage. There are no high requirements for the self-tuning algorithm of the PID controller, and the parameters can be automatically adjusted by the program, eliminating the workload of manual parameter adjustment, thereby saving the workload of manual optimization.

[0044] In the third embodiment, the control cycle of the RF power supply itself does not exceed 25us, and the external voltage acquisition cycle is 1ms, so the response curve of the collected RF power supply is prone to step, such as Figure 4 The RF power response curve before filtering is shown. This curve is difficult to auto-tune the rate of change, so filtering is required to eliminate the step of the response curve.

[0045] Optionally, using a response curve algorithm to obtain load characteristic parameters of a target process environment includes:

[0046] Filter the target process environment;

[0047] Perform open-loop control on the target process environment and disconnect the feedback channel;

[0048] Input a step signal to the target process environment to obtain a characteristic curve output by the target process environment;

[0049] The maximum power that the RF power source can receive, the minimum power that the RF power source can receive, the minimum voltage output by the target process environment, the response rate time, and the lag time are obtained from the characteristic curve.

[0050] Optionally, using the target voltage and load characteristic parameters, basic parameters of the PID controller are tuned including:

[0051] The flight speed is calculated according to the maximum power that the RF power source can receive, the minimum power that the RF power source can receive, the target voltage, the minimum voltage output by the target process environment, and the response rate time;

[0052] The proportionality, integral time and differential time are calculated according to the flying speed and the lag time;

[0053] The basic parameters of the PID controller are adjusted according to the proportionality, integral time and differential time.

[0054] In the third embodiment, the target process environment is filtered, such as Figure 5 The response curve of the RF power supply after filtering shown in the figure shows the trend of the S curve, eliminating the step of the response curve. In view of this characteristic, the response curve method is used to perform basic parameter self-tuning on the PID controller. First, the response curve of the open-loop system to the step input signal must be determined experimentally. The specific steps are as follows:

[0055] 1. Perform open-loop control, disconnect the feedback channel, and input a step signal Au to the target process environment;

[0056] 2. Record the output characteristic curve of the target process environment, such as Figure 6 The characteristic curve of the RF power supply shown;

[0057] 3. Obtain the minimum power umin that the RF power supply can receive, the maximum power umax that the RF power supply can receive, the minimum voltage ymin output by the target process environment, the response rate time T and the lag time τ from the characteristic curve;

[0058] 4. Calculate K according to formula (1) and the ascent velocity ε according to formula (2);

[0059]

[0060] Among them, △y and △u in formula (1) are given by Figure 6It is obtained from the characteristic curve of the RF power supply shown in the figure, and ymax is the target voltage.

[0061] 5. According to the required ascent speed τ and ascent speed ε, the basic parameters Kp, Ki, and Kd of the PID controller are calculated according to the empirical formula in Table 1 below. The linear change of Kp, Ki, and Kd can be achieved, so that it can better fit the load characteristics of the RF power supply. There are no high requirements for the PID self-tuning algorithm, and the parameters can be automatically adjusted by the program, eliminating the workload of manual parameter adjustment.

[0062] (Table 1)

[0063] PID Controller Types Proportional degree δ(%) Integration time Ti Derivative time Td P ετ PI 1.1ετ 3.3τ PID 0.85ετ 2τ 0.5τ

[0064] In the third embodiment, the preparation process of the factory parameters of the PID controller is as follows: Figure 7 As shown, the specific steps are as follows:

[0065] 1. Prepare target process environment such as gas and pressure;

[0066] 2. Automatically obtain the load characteristic parameters of the target process environment through the response curve algorithm;

[0067] 3. Set the target voltage, and use the target voltage and load characteristic parameters to automatically adjust the basic parameters Kp, Ki, and Kd of the PID controller;

[0068] 4. Use the automatically tuned PID controller to control the RF power supply of the target process environment to reach the target voltage, and determine the output power of the target process environment at this time as the target feedforward power.

[0069] When the target process environment enters the production line control process, first determine whether the current feedforward power of the target process environment is equal to the target feedforward power. If they are equal, directly enter the voltage control mode, and use the PID controller to control the RF power supply to reach the target voltage and stabilize at the target voltage. If they are not equal, first enter the power control mode, use the target feedforward power to control the RF power supply, quickly make the RF power supply voltage reach near the target voltage and reach a voltage steady state, then enter the voltage control mode, use the PID controller to control the RF power supply to reach the target voltage and stabilize at the target voltage, thereby achieving the purpose of steady-state control of the RF power supply voltage, and then solving the technical problem of being unable to steadily control the RF power supply voltage of the etcher.

[0070] In a fourth embodiment, before using the target feedforward power to control the RF power supply, the method further includes:

[0071] Obtain the current feedforward power of the target process environment;

[0072] Determine whether the current feedforward power is equal to the target feedforward power;

[0073] When the current feedforward power is equal to the target feedforward power, a PID controller is used to control the RF power supply so that the output voltage of the target process environment reaches the target voltage.

[0074] In the fourth embodiment, when the target process environment enters the production line control process, Figure 8 The segmented control execution flow chart shown first obtains the current feedforward power of the target process environment, and determines whether the current feedforward power is equal to the target feedforward power. If they are equal, the voltage control mode is directly entered, and the PID controller is used to control the RF power supply to reach the target voltage and stabilize at the target voltage. If they are not the same, a segmented control strategy is adopted, first entering the voltage control mode, using the target feedforward power to control the RF power supply, quickly making the RF power supply voltage reach near the target voltage and reach a voltage steady state, and then entering the voltage control mode, using the PID controller to control the RF power supply to reach the target voltage and stabilize at the target voltage, thereby achieving steady-state control of the RF power supply voltage.

[0075] In a fifth embodiment, when the output voltage of the target process environment reaches a voltage steady state, using a PID controller to control the RF power supply so that the output voltage of the target process environment reaches a target voltage includes:

[0076] Obtaining a steady-state voltage when the output voltage of the target process environment reaches a voltage steady state;

[0077] The voltage difference between the target voltage and the steady-state voltage is calculated, and the voltage difference is input into the PID controller to obtain the target power output by the PID controller;

[0078] The power sum of the target power and the target feed-forward power is calculated, and the power sum is input into the target process environment so that the output voltage of the target process environment reaches the target voltage.

[0079] In the fifth embodiment, in the process of using the PID controller to control the RF power supply so that the output voltage of the target process environment reaches the target voltage, as shown in FIG. Fig. 9 The PID control block diagram shown in the figure, the calculation formula (discrete form) of the PID link is shown in formula (3):

[0080]

[0081] in, Fig. 9 Yd(s) is the target voltage. F(s) is the feedforward link, and its output is the feedforward power Uf. e is the voltage difference between the target voltage and the current voltage of the RF power supply. Up is the target power value received by the RF power supply output by the PID controller. U is the sum of Up and Uf powers, and is also the target power value received by the final RF power supply. G(s) is the controlled object, i.e., the target process environment, and Y(s) is the voltage reached by the RF power supply.

[0082] First, obtain the current voltage of the RF power supply, that is, the steady-state voltage when the voltage reaches steady state, calculate the voltage difference between the target voltage and the steady-state voltage, and then input it into the PID controller. The PID controller outputs the target power, calculates the power sum of the target power and the target feedforward power, and then inputs it into the target process environment, so that the output voltage of the target process environment reaches the target voltage.

[0083] Embodiment 6: After the power and the input into the target process environment, the method further comprises:

[0084] Get the current output voltage of the target process environment;

[0085] Determine whether the current output voltage is equal to the target voltage;

[0086] When the current output voltage is not equal to the target voltage, a PID controller is used to control the RF power supply according to the current output voltage so that the output voltage of the target process environment reaches the target voltage.

[0087] In the sixth embodiment, after the output voltage of the target process environment is reached, feedback is continued. When the current output voltage of the target process environment does not reach the target voltage, that is, the current output voltage Y(s) is not equal to the target voltage Yd(s), the voltage difference between the target voltage Yd(s) and the current output voltage Y(s) is recalculated, and then the PID controller is used to control the RF power supply so that the output voltage of the target process environment reaches the target voltage, thereby stabilizing the output voltage of the target process environment at the target voltage.

[0088] It should be noted that, for the aforementioned method embodiments, for the sake of simplicity, they are all expressed as a series of action combinations, but those skilled in the art should be aware that the present application is not limited by the described order of actions, because according to the present application, certain steps can be performed in other orders or simultaneously. Secondly, those skilled in the art should also be aware that the embodiments described in the specification are all preferred embodiments, and the actions and modules involved are not necessarily required by the present application.

[0089] In order to solve the technical problem that the RF power supply voltage of the etcher cannot be controlled in a stable state, according to another aspect of the embodiment of the present application, a control device for the RF power supply voltage is also provided, such as Fig.10 As shown, including:

[0090] A setting module 1002, used to set a target voltage for a target process environment;

[0091] A first control module 1004 is used to control the RF power supply of the target process environment using a PID controller so that the output voltage of the target process environment reaches a target voltage, obtain the output power of the target process environment, and determine the output power as the target feedforward power;

[0092] The second control module 1006 is used to control the RF power supply using the target feedforward power when the target process environment enters the production line control process and the current feedforward power of the target process environment is not equal to the target feedforward power;

[0093] The third control module 1008 is used to control the RF power supply using a PID controller when the output voltage of the target process environment reaches a voltage steady state, so that the output voltage of the target process environment reaches a target voltage.

[0094] It should be noted that the setting module 1002 in this embodiment can be used to execute step S202 in the embodiment of the present application, the first control module 1004 in this embodiment can be used to execute step S204 in the embodiment of the present application, the second control module 1006 in this embodiment can be used to execute step S206 in the embodiment of the present application, and the third control module 1008 in this embodiment can be used to execute step S208 in the embodiment of the present application.

[0095] As an optional example, the above device further includes:

[0096] A first acquisition module is used to obtain the load characteristic parameters of the target process environment using a response curve algorithm before using a PID controller to control the RF power supply of the target process environment, wherein the load characteristic parameters include a maximum power that the RF power supply can receive, a minimum power that the RF power supply can receive, a minimum voltage output by the target process environment, a response rate time, and a hysteresis time;

[0097] The tuning module is used to tune the basic parameters of the PID controller using the target voltage and load characteristic parameters.

[0098] As an optional example, the acquisition module includes:

[0099] A first processing unit, used for filtering the target process environment;

[0100] A second processing unit is used to perform open-loop control on the target process environment and disconnect the feedback channel;

[0101] An input unit, used for inputting a step signal into a target process environment to obtain a characteristic curve output by the target process environment;

[0102] The first acquisition unit is used to acquire the maximum power that the RF power source can receive, the minimum power that the RF power source can receive, the minimum voltage output by the target process environment, the response rate time and the hysteresis time from the characteristic curve.

[0103] As an optional example, the tuning module includes:

[0104] A first calculation unit is used to calculate the flying speed according to the maximum power that the RF power source can receive, the minimum power that the RF power source can receive, the target voltage, the minimum voltage output by the target process environment, and the response rate time;

[0105] A second calculation unit is used to calculate the proportionality, integral time and differential time according to the ascent speed and the lag time;

[0106] The tuning unit is used to tune the basic parameters of the PID controller according to the proportionality, integral time and differential time.

[0107] As an optional example, the above device further includes:

[0108] A second acquisition module is used to acquire the current feedforward power of the target process environment before using the target feedforward power to control the RF power supply;

[0109] A judgment module, used to judge whether the current feedforward power is equal to the target feedforward power;

[0110] The fourth control module is used to control the RF power supply using a PID controller when the current feedforward power is equal to the target feedforward power, so that the output voltage of the target process environment reaches the target voltage.

[0111] As an optional example, the third control module includes:

[0112] A second acquisition unit, used for acquiring a steady-state voltage when the output voltage of the target process environment reaches a steady-state voltage;

[0113] A third calculation unit is used to calculate a voltage difference between the target voltage and the steady-state voltage, and input the voltage difference to the PID controller to obtain a target power output by the PID controller;

[0114] The fourth calculation unit is used to calculate the power sum of the target power and the target feed-forward power, and input the power sum into the target process environment so that the output voltage of the target process environment reaches the target voltage.

[0115] As an optional example, the third control module further includes:

[0116] A third acquisition unit, configured to acquire a current output voltage of the target process environment after the power and voltage are input into the target process environment;

[0117] A judging unit, used to judge whether the current output voltage is equal to the target voltage;

[0118] The control unit is used to control the RF power supply using a PID controller according to the current output voltage when the current output voltage is not equal to the target voltage, so that the output voltage of the target process environment reaches the target voltage.

[0119] For other examples of this embodiment, please refer to the above examples and will not be repeated here.

[0120] Fig.11 is a schematic diagram of an optional electronic device according to an embodiment of the present application, such as Fig.11 As shown, it includes a processor 1102, a communication interface 1104, a memory 1106 and a communication bus 1108, wherein the processor 1102, the communication interface 1104 and the memory 1106 communicate with each other through the communication bus 1108, wherein,

[0121] Memory 1106, used for storing computer programs;

[0122] The processor 1102 is used to execute the computer program stored in the memory 1106 to implement the following steps:

[0123] Setting the target voltage for the target process environment;

[0124] Using a PID controller to control the radio frequency power supply of the target process environment so that the output voltage of the target process environment reaches a target voltage, the output power of the target process environment is obtained, and the output power is determined as the target feedforward power;

[0125] When the target process environment enters the production line control process, when the current feedforward power of the target process environment is not equal to the target feedforward power, the target feedforward power is used to control the RF power supply;

[0126] When the output voltage of the target process environment reaches a voltage steady state, a PID controller is used to control the RF power supply so that the output voltage of the target process environment reaches a target voltage.

[0127] Optionally, in this embodiment, the communication bus may be a PCI (Peripheral Component Interconnect) bus or an EISA (Extended Industry Standard Architecture) bus. The communication bus may be divided into an address bus, a data bus, a control bus, etc. For ease of representation, Fig.11The communication interface is used for communication between the above electronic device and other devices.

[0128] The memory may include RAM, or may include non-volatile memory, such as at least one disk memory. Optionally, the memory may also be at least one storage device located away from the aforementioned processor.

[0129] As an example, the memory 1106 may include, but is not limited to, the setting module 1002, the first control module 1004, the second control module 1006, and the third control module 1008 in the control device for the RF power supply voltage. In addition, other module units in the control device for the RF power supply voltage may also be included but are not limited to, which will not be repeated in this example.

[0130] The above-mentioned processor can be a general-purpose processor, which can include but not be limited to: CPU (Central Processing Unit), NP (Network Processor), etc.; it can also be DSP (Digital Signal Processing), ASIC (Application Specific Integrated Circuit), FPGA (Field-Programmable Gate Array) or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components.

[0131] Optionally, the specific examples in this embodiment may refer to the examples described in the above embodiments, and this embodiment will not be described in detail here.

[0132] It can be understood by those skilled in the art that Fig.11 The structure shown is for illustration only. The device for implementing the above-mentioned RF power supply voltage control method may be a terminal device, which may be a smart phone (such as an Android phone, an iOS phone, etc.), a tablet computer, a PDA, a mobile Internet device (Mobile Internet Devices, MID), a PAD, and other terminal devices. Fig.11 The structure of the electronic device is not limited. For example, the electronic device may also include Fig.11 More or fewer components (such as network interfaces, display devices, etc.) shown in, or having Fig.11 Different configurations shown.

[0133] A person of ordinary skill in the art can understand that all or part of the steps in the various methods of the above embodiments can be completed by instructing the hardware related to the terminal device through a program, and the program can be stored in a computer-readable storage medium, which can include: a flash drive, ROM, RAM, a magnetic disk or an optical disk, etc.

[0134] According to another aspect of the embodiments of the present application, a computer-readable storage medium is provided, in which a computer program is stored, wherein the computer program executes the steps in the above-mentioned method for controlling the RF power supply voltage when executed by a processor.

[0135] Optionally, in this embodiment, a person of ordinary skill in the art may understand that all or part of the steps in the various methods of the above embodiments may be completed by instructing hardware related to the terminal device through a program, and the program may be stored in a computer-readable storage medium, and the storage medium may include: a flash drive, a read-only memory (ROM), a random access memory (RAM), a disk or an optical disk, etc.

[0136] The serial numbers of the above-mentioned embodiments of the present application are for description only and do not represent the advantages or disadvantages of the embodiments.

[0137] If the integrated units in the above embodiments are implemented in the form of software functional units and sold or used as independent products, they can be stored in the above computer-readable storage medium. Based on this understanding, the technical solution of the present application, or the part that contributes to the prior art, or all or part of the technical solution can be embodied in the form of a software product, which is stored in a storage medium and includes several instructions for enabling one or more computer devices (which may be personal computers, servers, or network devices, etc.) to execute all or part of the steps of the methods described in the various embodiments of the present application.

[0138] In the above embodiments of the present application, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, please refer to the relevant description of other embodiments.

[0139] In the several embodiments provided in the present application, it should be understood that the disclosed client can be implemented in other ways. Among them, the device embodiments described above are only schematic. For example, the division of the units is only a logical function division. There may be other division methods in actual implementation. For example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of units or modules, which can be electrical or other forms.

[0140] The units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0141] In addition, each functional unit in each embodiment of the present application may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of software functional units.

[0142] The above is only a preferred implementation of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. A method for controlling a radio frequency power supply voltage, characterized in that: include: Setting the target voltage for the target process environment; Using a PID controller to control the radio frequency power supply of the target process environment so that the output voltage of the target process environment reaches the target voltage, obtaining the output power of the target process environment, and determining the output power as the target feedforward power; When the target process environment enters the production line control process, when the current feedforward power of the target process environment is not equal to the target feedforward power, using the target feedforward power to control the radio frequency power supply; When the output voltage of the target process environment reaches a voltage steady state, the PID controller is used to control the radio frequency power supply so that the output voltage of the target process environment reaches the target voltage.

2. The method according to claim 1, characterized in that Before using the PID controller to control the RF power supply of the target process environment, the method further includes: Using a response curve algorithm to obtain load characteristic parameters of the target process environment, wherein the load characteristic parameters include a maximum power that the RF power source can receive, a minimum power that the RF power source can receive, a minimum voltage output by the target process environment, a response rate time, and a hysteresis time; The target voltage and the load characteristic parameters are used to adjust the basic parameters of the PID controller.

3. The method according to claim 2, characterized in that The step of using a response curve algorithm to obtain the load characteristic parameters of the target process environment includes: Performing filtering on the target process environment; Performing open-loop control on the target process environment and disconnecting the feedback channel; Inputting a step signal to the target process environment to obtain a characteristic curve output by the target process environment; The maximum power that the RF power source can receive, the minimum power that the RF power source can receive, the minimum voltage output by the target process environment, the response rate time, and the lag time are obtained from the characteristic curve.

4. The method according to claim 2, characterized in that: The use of the target voltage and the load characteristic parameters to adjust the basic parameters of the PID controller includes: The flying speed is calculated according to the maximum power that the RF power source can receive, the minimum power that the RF power source can receive, the target voltage, the minimum voltage output by the target process environment, and the response rate time; Calculating the proportionality, integral time and differential time according to the soaring speed and the lag time; The basic parameters of the PID controller are adjusted according to the proportionality, the integral time and the differential time.

5. The method according to claim 1, characterized in that Before using the target feedforward power to control the radio frequency power source, the method further includes: Acquiring a current feedforward power of the target process environment; Determining whether the current feedforward power is equal to the target feedforward power; When the current feed-forward power is equal to the target feed-forward power, the PID controller is used to control the radio frequency power supply so that the output voltage of the target process environment reaches the target voltage.

6. The method according to claim 1, characterized in that When the output voltage of the target process environment reaches a voltage steady state, using the PID controller to control the RF power supply so that the output voltage of the target process environment reaches the target voltage includes: Obtaining a steady-state voltage when the output voltage of the target process environment reaches a voltage steady state; Calculating a voltage difference between the target voltage and the steady-state voltage, and inputting the voltage difference into the PID controller to obtain a target power output by the PID controller; A power sum of the target power and the target feed-forward power is calculated, and the power sum is input into the target process environment so that the output voltage of the target process environment reaches the target voltage.

7. The method according to claim 6, characterized in that After inputting the power and the inputting power into the target process environment, the method further comprises: Obtaining the current output voltage of the target process environment; Determining whether the current output voltage is equal to the target voltage; In a case where the current output voltage is not equal to the target voltage, the PID controller is used to control the RF power supply according to the current output voltage so that the output voltage of the target process environment reaches the target voltage.

8. A control device for radio frequency power supply voltage, characterized in that: include: A setting module, used to set a target voltage for a target process environment; A first control module is used to control the RF power supply of the target process environment using a PID controller so that the output voltage of the target process environment reaches the target voltage, obtain the output power of the target process environment, and determine the output power as the target feedforward power; A second control module is used to control the RF power supply using the target feedforward power when the target process environment enters the production line control process and when the current feedforward power of the target process environment is not equal to the target feedforward power; The third control module is used to control the RF power supply using the PID controller when the output voltage of the target process environment reaches a voltage steady state, so that the output voltage of the target process environment reaches the target voltage.

9. A computer-readable storage medium storing a computer program, characterized in that: When the computer program is executed by a processor, the method according to any one of claims 1 to 7 is executed.

10. An electronic device comprising a memory and a processor, characterized in that: A computer program is stored in the memory, and the processor is configured to execute the method according to any one of claims 1 to 7 through the computer program.

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