A semi-consolidated abrasive magnetron sputtering surface microstructure polishing pad and its preparation method

Abstract

This invention belongs to the field of polishing technology and discloses a semi-bonded abrasive magnetron sputtering surface microstructure polishing pad and its preparation method. The device includes a polishing pad, one side of which is an arc surface with multiple spiral grooves and drainage channels arranged on the arc surface, and the multiple spiral grooves and drainage channels are connected in an arc shape; the other side of the polishing pad is a smooth arc surface for fixed connection with the outer surface of the polishing tool, and the top of the smooth arc surface is an end face; the multiple spiral grooves are modularly installed on one side of the polishing pad, and the spiral grooves on the polishing pad are connected to the drainage channels, which increases the flow performance of the polishing fluid in the polishing area, thereby achieving a better cooling and heat dissipation effect. The modular arrangement of the microstructure on the surface of the polishing pad aims to enhance the contact stability during the polishing process, extend the service life of the polishing pad, improve the processing efficiency of the workpiece, and solve the technical problem that existing polyurethane polishing pads are prone to wear and blockage during workpiece processing, resulting in unstable material removal.

Description

Technical Field

[0001] This invention belongs to the field of polishing technology and relates to a semi-consolidated abrasive magnetron sputtering surface microstructure polishing pad and its preparation method. Background Technology

[0002] In the ultra-precision elastic polishing process, in order to obtain better surface quality of the workpiece, a processing method with "flexible" characteristics is used, such as airbag polishing and small tool polishing, which can achieve the workpiece service requirements of high efficiency, high quality and high precision.

[0003] Airbag polishing covers and small tool polishing can meet the processing requirements of large-sized workpieces and free-form surfaces. The end effector is usually hemispherical, which has poor flexibility, is easy to wear, and has poor adaptability to complex surfaces.

[0004] To prevent hard abrasive particles from damaging the inner layer of the pressurized airbag polishing cover or small polishing tools, causing rapid tool wear, industrial applications generally use relatively inexpensive and easily replaceable polyurethane polishing pads. These pads function to transport polishing fluid, remove polishing debris, and transfer load, significantly impacting the material removal rate and surface finish of the workpiece. However, polyurethane polishing pads are highly susceptible to wear and clogging during workpiece processing, leading to unstable material removal and affecting the certainty of material removal. Summary of the Invention

[0005] To address the shortcomings of existing technologies, the present invention aims to provide a semi-consolidated abrasive magnetron microstructure polishing pad and its preparation method, thereby solving the technical problem that existing polyurethane polishing pads are prone to wear and clogging during workpiece processing, leading to unstable material removal.

[0006] To achieve the above objectives, the present invention adopts the following technical solution:

[0007] This invention provides a semi-bonded abrasive magnetron sputtering surface microstructure polishing pad, comprising a polishing pad, one side of which is an arc surface with multiple spiral grooves and drainage channels connected in an arc shape; the other side of which is a smooth arc surface for fixed connection with the outer surface of a polishing tool, the top of which is an end face; multiple spiral grooves are modularly mounted on one side of the polishing pad; the polishing pad is obtained by sequentially injecting diamond abrasive particles and a first mixture into a 3D printed mold and allowing it to stand, the first mixture being a mixture of magnetorheological hydroxyl iron powder, carbon nanotube microparticles, silicone rubber curing agent, and silicone rubber;

[0008] The spiral grooves are set along the nonlinear implicit function iteratively in the Ellipse model;

[0009] The nonlinear implicit function is: ;

[0010] in, The x-axis is... The vertical axis is , For the major diameter of an ellipse, For the minor diameter of the ellipse, , , It is a constant;

[0011] The included angle between two adjacent spiral groove modules is 5°-10°; the diameter of the spiral groove decreases continuously from one end to the other.

[0012] Furthermore, the plurality of drainage grooves are arranged in concentric circles, and the drainage grooves are perpendicular to the rotation axis of the polishing pad.

[0013] Furthermore, the polishing pad is processed by a 3D printing mold, which includes an upper mold and a lower mold, and the polishing pad is disposed between the upper mold and the lower mold.

[0014] Furthermore, the inner surface of the lower mold is provided with pre-formed holes for semi-consolidated abrasive particles arranged in a uniform manner.

[0015] The present invention also provides a method for preparing a semi-consolidated abrasive magnetron sputtering surface microstructure polishing pad, comprising the following steps: mixing magnetorheological hydroxyl iron powder, carbon nanotube particle powder, silicone rubber curing agent, and silicone rubber to obtain a first mixture; sequentially injecting diamond abrasive particles and the first mixture into a 3D printing mold; and allowing it to stand to obtain a polishing pad.

[0016] Furthermore, the method for preparing the semi-consolidated abrasive magnetron microstructure polishing pad also includes the following steps: mixing polymer polyol, diisocyanate, chain extender and catalyst to obtain a second mixture; mixing cerium oxide abrasive powder and the second mixture and injecting it into a 3D printing mold, vulcanizing and allowing it to stand to obtain the polishing pad.

[0017] Furthermore, the method for preparing the semi-consolidated abrasive magnetron microstructure polishing pad also includes the following steps: mixing diamond abrasive powder, carbon nanotube powder, and elastic photosensitive resin, and then photocuring and 3D printing to obtain the polishing pad; the proportions of the diamond abrasive powder, carbon nanotube powder, and elastic photosensitive resin vary depending on the processing requirements.

[0018] Further, the magnetorheological hydroxyl iron powder, carbon nanotube particles, silicone rubber curing agent, and silicone rubber are mixed in a ratio of 2:1:1:6 to obtain a first mixture; the polymer polyol, diisocyanate, chain extender, and catalyst are mixed in a ratio of 3:5:1:1 to obtain a second mixture.

[0019] Compared with the prior art, the present invention has the following beneficial technical effects:

[0020] This invention discloses a semi-bonded abrasive magnetron sputtering surface microstructure polishing pad. One side of the pad features a modularly arranged biomimetic conch shell-like surface groove microstructure, consisting of spiral grooves and drainage channels. The other side of the pad is a smooth arc surface adhered to the outer layer of a tool. The polishing pad is prepared using a magnetorheological iron powder composite curing strategy, with uniformly distributed semi-bonded abrasive particles on its surface. This allows for connection with flexible polishing tools such as airbag polishing covers and small tool polishing heads, and, combined with magnetron sputtering polishing, forms an ultra-precision composite machining process. The polishing pad, serving as an end effector, has modularly arranged spiral grooves and drainage channels on one side. The dimensions of the spiral grooves and drainage channels increase proportionally with the radius of the polishing pad. The spiral grooves and drainage channels on the polishing pad are connected, increasing the flow performance of the polishing fluid in the polishing area, thus achieving better cooling and heat dissipation. The modular groove arrangement creates a uniform stress distribution in the processing area, reducing friction and wear on the polishing pad. The modular arrangement of the microstructure on the polishing pad surface aims to enhance contact stability during the polishing process, extend the service life of the polishing pad, and improve workpiece processing efficiency.

[0021] This invention discloses a semi-bonded abrasive magnetron microstructure polishing pad. Compared with general groove textures, the polishing contact area of ​​the biomimetic groove texture of the conch shell surface polishing pad is increased by at least 15%, and the surface roughness of the workpiece after processing is significantly improved. Under the same conditions, its friction and wear are reduced by more than 30% compared with general groove textures. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the structure of a semi-consolidated abrasive magnetron surface microstructure polishing pad according to the present invention;

[0023] Figure 2 This is a bottom view of a semi-consolidated abrasive magnetron microstructure polishing pad according to the present invention;

[0024] Figure 3 This is a top view of a semi-bonded abrasive magnetron-controlled surface microstructure polishing pad according to the present invention;

[0025] Figure 4 This is a schematic diagram of the surface microstructure distribution of the polishing pad in an embodiment of the present invention;

[0026] Figure 5 This is a frontal top view of the cross-section of the 3D printed mold in an embodiment of the present invention;

[0027] Figure 6 This is a top view of the lower mold in an embodiment of the present invention;

[0028] Figure 7 This is a schematic diagram of the lower mold structure in an embodiment of the present invention;

[0029] Figure 8 This is a mathematical schematic diagram of the spiral groove in an embodiment of the present invention.

[0030] Figure label:

[0031] 1- Spiral groove; 2- Drainage groove; 3- Polishing pad; 4- End face; 5- Smooth arc surface; 6- 3D printed mold; 7- Upper mold; 8- Lower mold; 9- Semi-bonded abrasive pre-made hole position. Detailed Implementation

[0032] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0033] Example 1

[0034] This invention discloses a semi-bonded abrasive magnetron sputtering surface microstructure polishing pad, comprising a polishing pad 3, wherein one side of the polishing pad 3 is an arc surface, as shown below. Figure 1 As shown, multiple spiral grooves 1 and drainage grooves 2 are provided on the arc surface, and the multiple spiral grooves 1 and drainage grooves 2 are connected in an arc shape; the other side of the polishing pad 3 is a smooth arc surface 5, as shown in the figure. Figure 3 As shown, it is used for fixed connection with the outer surface of the polishing tool, and the top of the smooth arc surface is the end face 4; multiple spiral grooves 1 are modularly installed on one side of the polishing pad 3.

[0035] The polishing pad 3 has a modular arrangement of biomimetic conch shell surface grooves on one side, with semi-solidified abrasive particles; the other side of the polishing pad is a smooth arc surface 5 that is attached to the outer layer of the tool for connection with the surface of flexible polishing tools such as airbag polishing cover and small tool polishing head, and is combined with magnetron polishing method to form ultra-precision composite processing.

[0036] By extracting biomimetic conch shell features, the width of the surface ribs, the width of the side ribs, the microgroove spacing, the rib height, the height of the two side ribs, the small diameter of the ribs, the large diameter of the ribs, and the initial longitudinal helix angle were obtained. After topology optimization, a convergent fitting model was obtained. Utilizing the wear-resistant properties of the biomimetic prototype, the microstructure was applied to polishing pad 3 to improve the normal polishing force and optimize the contact distribution. This fully utilizes the surface features of the conch shell, reduces wear on the elastic polishing pad, and improves its performance, thereby enhancing workpiece polishing efficiency and processing quality.

[0037] Compared to conventional groove textures, the polishing pad 3 with its biomimetic groove texture on the conch shell surface increases the polishing contact area by at least 15%, and significantly improves the surface roughness of the workpiece after processing. Under the same conditions, its friction and wear are reduced by more than 30% compared to conventional groove textures.

[0038] One side of the polishing pad 3 is an arc surface, on which are modularly arranged spiral grooves 1 and drainage grooves 2. The dimensions of the spiral grooves 1 and drainage grooves 2 increase proportionally with the radius of the polishing pad 3. The spiral grooves 1 and drainage grooves 2 on the polishing pad 3 are connected, which increases the flow performance of the polishing fluid in the polishing area, thereby achieving a better cooling and heat dissipation effect. The modular arrangement of the spiral grooves 1 forms a uniform stress distribution in the processing area, reducing the friction and wear of the polishing pad 3. The modular arrangement of the microstructures on the surface of the polishing pad 3 is designed to enhance the contact stability during the polishing process, extend the service life of the polishing pad, and improve the processing efficiency of the workpiece.

[0039] In summary, the polishing pad 3 optimizes the uniformity of stress distribution and the fluid flow of the grinding fluid by adopting a biomimetic conch shell surface microstructure design method, and significantly reduces its friction and wear during the polishing process.

[0040] Example 2

[0041] This invention provides a semi-bonded abrasive magnetron-controlled surface microstructure polishing pad, such as... Figure 2 As shown, one side of the polishing pad 3 is an arc surface, on which multiple spiral grooves 1 and drainage grooves 2 are provided. The spiral grooves 1 are modularly installed on one side of the polishing pad 3, and the spiral grooves 1 are shaped like tree trunks, while the drainage grooves 2 are shaped like tree branches, as shown. Figure 4 As shown, the smallest biomimetic unit of the spiral groove 1 and the flow guide groove 2 has a smooth transition slope, which enhances the flow effect, flow velocity, and integrity of the flow area, thereby ensuring the stability of the processing. The improved contact performance and flow characteristics significantly reduce the friction and wear of the biomimetic polishing pad, thus achieving a more uniform material removal process and extending the service life of the polishing pad. In the elastic polishing process, the biomimetic groove with optimized curvature combined with the annular fluid guide groove plays an important role in ultra-precision polishing, especially for the processing of aspherical workpieces.

[0042] The nonlinear implicit function setting for the iteration of the helical groove 1 along the Ellipse model. Specifically, the result obtained after the helical groove 1 iterates along the Ellipse model. The non-linear implicit function setting for the tolerance value is as follows: ,in, The x-axis is... The vertical axis is , For the major diameter of an ellipse, For the minor diameter of the ellipse, , , It is a constant, such as Figure 8 As shown.

[0043] In this embodiment, =0.49, =0.87, =5.47, =11.97, =-1, in mm, to ensure that the spiral groove 1 can meet the curvature requirements of contact machining. Furthermore, The tolerance value represents the convergence accuracy. Since biomimetic data extraction requires accuracy, it can ensure that the obtained solution is very accurate and reliable.

[0044] =0.49, =0.87, =5.47, =11.97, =-1 is one type of groove curve, which can be adjusted according to the actual situation.

[0045] Multiple spiral grooves 1 are modularly installed on one side of the polishing pad 3, and the spiral grooves 1 are connected to the guide grooves 2 in an arc shape. This changes the wear pattern of the polishing pad 3, effectively blocking abrasive debris and thus improving the wear resistance of the polishing pad 3. It also improves the fluid flow of the grinding fluid, uniformizes the polishing force, reduces the polishing temperature, enhances lubrication performance, accelerates the removal of old abrasive grains, increases the adaptability of the polished surface shape, improves polishing efficiency, and improves the surface finish of the workpiece. If polishing debris cannot be removed in time, the surface quality will deteriorate. Therefore, this structure can improve the tolerance of abrasive grains, enhance the fluid flow of the grinding fluid, better remove the contour peaks of the polished surface, improve the uniformity of stress distribution, and reduce subsurface microcracks in workpieces where plastic removal is the primary process.

[0046] The included angle between two adjacent spiral groove 1 modules is 5°-10°, and the diameter of the spiral groove 1 decreases continuously from end face 4 to the other end. The size of the included angle affects the overall layout of the spiral groove 1 and the flow path of the fluid within it. A smaller included angle means that the spiral is tighter and the flow path of the fluid within it is more tortuous; while a larger included angle makes the spiral looser and the flow path relatively straighter. The included angle in this embodiment can more effectively remove material, dissipate heat, and collect waste liquid, thereby obtaining a better polishing effect.

[0047] The diversion channel 2 is arranged in concentric circles, and the concentric circles are arranged according to... Arrangement, among which, The x-axis is... The vertical axis is , For the major diameter of an ellipse, For the minor diameter of the ellipse, It is a constant.

[0048] Furthermore, the drainage groove 2 is perpendicular to the rotation axis of the polishing pad 3. This is to ensure that the fluid can be effectively guided away along a path perpendicular to the rotation direction of the polishing pad 3, thereby avoiding interference with the polishing process and ensuring that the fluid can evenly cover the surface of the polishing pad 3 or be effectively removed from it.

[0049] When the polishing pad 3 rotates at high speed, the polishing fluid will have a certain boosting effect on the end-effector, which is conducive to forming a stable processing area between the polishing pad 3 and the workpiece. At the same time, the high-speed rotation of the tool is conducive to the discharge of abrasive chips, which can reduce polishing pad wear, extend polishing pad service life, and improve the problem of uneven abrasive distribution and uncertain abrasive trajectory that makes the removal process difficult to control, aiming to delay the generation of micro-cracks on the workpiece surface.

[0050] like Figure 5 As shown, the polishing pad 3 is processed by a 3D printed mold 6, which includes an upper mold 7 and a lower mold 8. The polishing pad 3 is disposed between the upper mold 7 and the lower mold 8. Both the upper mold 7 and the lower mold 8 are prepared by photopolymer 3D printing. By using 3D printing technology to process the polishing pad 3, the processing efficiency and accuracy are improved, the cost is reduced, and the design flexibility is enhanced.

[0051] like Figure 6 He Ru Figure 7 As shown, the inner surface of the lower mold 8 is provided with uniformly arranged semi-bonded abrasive pre-formed holes 9 to enhance the contact stability of the polishing pad 3 during processing. The holes 9 need to be uniformly arranged on the inner surface of the lower mold 8 to ensure that the abrasive grains of the polishing pad 3 can be evenly distributed and act on the workpiece surface during operation. The layout of the semi-bonded abrasive pre-formed holes 9 can be adjusted and optimized according to the shape and size of the polishing pad 3 and the expected polishing effect.

[0052] This invention discloses a semi-bonded abrasive magnetron-controlled surface microstructure polishing pad, which solves the shortcomings of traditional tool polishing processes, such as tool wear and clogging caused by poor material properties and contact stability of polyurethane polishing pads, leading to unstable material removal functions. By utilizing the modular spiral grooves 1 of the microstructure on the outer arc surface of the polishing pad 3, a uniform stress distribution is formed in the processing area, reducing the friction and wear of the polishing pad 3. At the same time, the pre-set holes 9 of the semi-bonded abrasive particles form a more uniform and stable material removal environment, which enhances the contact stability during processing, extends the service life of the polishing pad, and improves the processing efficiency of the workpiece.

[0053] Example 3

[0054] This invention discloses a method for preparing a semi-consolidated abrasive magnetron sputtering surface microstructure polishing pad, comprising the following steps:

[0055] A first mixture is obtained by mixing magnetorheological hydroxyl iron powder, carbon nanotube powder, silicone rubber curing agent, and silicone rubber; diamond abrasive powder and the first mixture are sequentially injected into a 3D printed mold 6; and the mixture is left to stand to obtain a polishing pad 3. The first mixture is obtained by mixing magnetorheological hydroxyl iron powder, carbon nanotube powder, silicone rubber curing agent, and silicone rubber in a ratio of 2:1:1:6.

[0056] Specifically, 2μm magnetorheological hydroxyl iron powder, carbon nanotube powder, silicone rubber curing agent, and silicone rubber are mixed in a ratio of 2:1:1:6 to obtain a first mixture. The first mixture is stirred for 3 minutes at a constant speed using an electric stirrer. Diamond abrasive powder is weighed, with the diamond abrasive powder accounting for 3% to 9% of the first mixture. The diamond abrasive particles are evenly sprinkled into the pre-made holes 9 of the semi-solidified abrasive particles. The first mixture is then injected into the 3D printing mold 6. In this embodiment, the 3D printing mold 6 is made of plastic. After standing in a vacuum environment for 5 minutes to remove excess air bubbles, it is placed in a uniform preset magnetic field generated by a 100-300mT permanent magnet and left to stand for 3 hours to complete the curing reaction. After this, the 3D printing mold 6 is removed from the magnetic field and left to stand in a constant temperature chamber for 24 hours. The final polishing pad 3 is then trimmed.

[0057] Example 4

[0058] This invention discloses a method for preparing a semi-consolidated abrasive magnetron sputtering surface microstructure polishing pad, comprising the following steps:

[0059] A second mixture is obtained by mixing polymer polyol, diisocyanate, chain extender, and catalyst; cerium oxide abrasive powder and the second mixture are mixed and injected into a 3D printing mold 6, and vulcanized and allowed to stand to obtain a polishing pad 3. The polymer polyol, diisocyanate, chain extender, and catalyst are mixed in a ratio of 3:5:1:1 to obtain the second mixture.

[0060] Specifically, the polymer polyol, diisocyanate, chain extender, and catalyst are mixed in a ratio of 3:5:1:1, and then 25%-30% by weight of cerium oxide abrasive powder with a particle size of 2μm is added. After thorough mixing, the mixture is poured into a 3D printing mold 6. In this embodiment, the 3D printing mold 6 is made of metal. After vulcanization at a temperature of 60-80°C and a vulcanization heating of 3 hours (heating and vulcanization occur simultaneously), it is left to stand and form a polishing pad 3. It should be noted that the polishing pad 3 here is a polyurethane polishing pad to achieve better wear resistance and polishing effect.

[0061] Example 5

[0062] This invention discloses a method for preparing a semi-consolidated abrasive magnetron sputtering surface microstructure polishing pad, comprising the following steps:

[0063] A polishing pad 3 is obtained by mixing diamond abrasive powder, carbon nanotube powder, and elastic photosensitive resin and then photocuring and 3D printing. The proportions of the diamond abrasive powder, carbon nanotube powder, and elastic photosensitive resin vary depending on the processing requirements.

[0064] Specifically, 25% diamond abrasive powder and 10% carbon nanotube powder are thoroughly mixed with elastic photosensitive resin, and polishing pad 3 is directly fabricated by photopolymerization 3D printing. In this embodiment, the polishing pad 3 has a tensile strength of 4.1-5.0 MPa, an elongation at break of 51-60%, a Shore hardness of 90-95A, and a viscosity of 775 cps.

[0065] Tensile strength refers to the ratio of the maximum tensile force a material can withstand in a tensile test to its original cross-sectional area. Tensile strength of 4.1-5.0 MPa reflects the mechanical strength and durability of polishing pad 3.

[0066] Elongation at break refers to the ratio of the elongation at break to the original length of a material when the specimen breaks in a tensile test. The elongation at break of polishing pad 3 is between 51% and 60%, which has good elasticity and ductility. This helps polishing pad 3 to be less prone to breakage when subjected to pressure, thereby extending its service life.

[0067] Shore hardness is a method for measuring the hardness of a material. The "A" indicates that it was measured using a Shore A hardness tester. The Shore hardness of polishing pad 3 is between 90 and 95A, which is moderate. This moderate hardness helps polishing pad 3 maintain a stable shape and performance during the polishing process, while providing sufficient elasticity to adapt to different polishing needs.

[0068] Viscosity is a physical quantity that measures the resistance to fluid flow.

[0069] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting the present invention.

[0070] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

Claims

1. A semi-consolidated abrasive magnetic control surface microstructure polishing pad, characterized in that: comprising a polishing pad (3), one side of the polishing pad (3) is a circular arc surface, a plurality of spiral grooves (1) and drainage grooves (2) are arranged on the circular arc surface, and the plurality of spiral grooves (1) and drainage grooves (2) are connected in an arc shape; the other side of the polishing pad (3) is a smooth arc surface (5) for fixed connection with the outer surface of a polishing tool, the top of the smooth arc surface is an end surface (4); a plurality of spiral grooves (1) are modularly installed on one side of the polishing pad (3); the polishing pad (3) is obtained by sequentially injecting diamond abrasive particles and a first mixture into a 3D printing mold (6) and then standing; the first mixture is obtained by mixing magnetorheological hydroxyl iron powder, carbon nanotube particle powder, a silicon rubber curing agent and silicon rubber; the spiral grooves (1) are arranged along a nonlinear implicit function of an Ellipse model iteration; the included angle between adjacent two spiral groove (1) modules is 5°-10°; and the pipe diameter of the spiral groove (1) is continuously reduced from the end surface (4) to the other end. The nonlinear implicit function is: ; wherein is the abscissa, is the ordinate, is the major axis of the ellipse, is the minor axis of the ellipse, , , is a constant; 2.The semi-consolidated abrasive magnetic control surface microstructure polishing pad according to claim 1, characterized in that: a plurality of the drainage grooves (2) are arranged in a concentric circle manner; the drainage grooves (2) are perpendicular to the rotation axis of the polishing pad (3). 3.The semi-consolidated abrasive magnetic control surface microstructure polishing pad according to claim 2, characterized in that: the polishing pad (3) is processed by a 3D printing mold (6), the 3D printing mold (6) comprises an upper mold (7) and a lower mold (8), and the polishing pad (3) is arranged between the upper mold (7) and the lower mold (8). 4.The semi-consolidated abrasive magnetic control surface microstructure polishing pad according to claim 3, characterized in that: a plurality of semi-consolidated abrasive pre-pore sites (9) are uniformly arranged on the inner surface of the lower mold (8). comprising the following steps: mixing magnetorheological hydroxyl iron powder, carbon nanotube particle powder, a silicon rubber curing agent and silicon rubber to obtain a first mixture; sequentially injecting diamond abrasive particles and the first mixture into a 3D printing mold (6); and standing to obtain a polishing pad (3). The semi-consolidated abrasive magnetic control surface microstructure polishing pad preparation method further comprises the following steps:

5. A method of making a semi-bonded abrasive magnetic controlled surface microstructured polishing pad as claimed in any one of claims 1 to 4, wherein, mixing polymer polyol, diisocyanate, chain extender and catalyst to obtain a second mixture; mixing cerium oxide abrasive powder and the second mixture, and then injecting into a 3D printing mold (6) to vulcanize and stand to obtain a polishing pad (3). The semi-consolidated abrasive magnetic control surface microstructure polishing pad preparation method further comprises the following steps:

6. The method of making a semi-bonded abrasive magnetic controlled surface microstructured polishing pad of claim 5, wherein, mixing diamond abrasive powder, carbon nanotube particle powder and elastic photosensitive resin, and then performing photo-curing 3D printing to obtain a polishing pad (3); the ratio of the diamond abrasive powder, the carbon nanotube particle powder and the elastic photosensitive resin changes with the processing requirement. 8.The semi-consolidated abrasive magnetic control surface microstructure polishing pad preparation method according to claim 7, characterized in that:

7. The method of making a semi-bonded abrasive magnetic controlled surface microstructured polishing pad of claim 6, wherein, the magnetorheological hydroxyl iron powder, the carbon nanotube particle, the silicon rubber curing agent and the silicon rubber are mixed at a ratio of 2:1:1:6 to obtain a first mixture; ​ ​ ​ ​ The polymer polyol, diisocyanate, chain extender, catalyst are mixed in a ratio of 3:5:1:1 to obtain a second mixture. The polymer polyol, diisocyanate, chain extender, catalyst are mixed in a ratio of 3:5:1:1 to obtain a second mixture.

Images