Substrate sample injector device used in vacuum coating instrument

Abstract

The invention discloses a substrate sample injector device used in a vacuum coating instrument, a sample injector base and a sample injector cover plate are assembled in an aligned manner, and a sample injection groove and a gear groove are respectively formed in the sample injector base; after the substrate rack is filled with the substrate, the substrate rack and the substrate cover plate are assembled and arranged in the sample introduction groove; the transmission gear is mounted in the gear groove; the rack is arranged in the substrate frame, the rack and the substrate frame are integrally designed, and the rack is meshed with the transmission gear; the sector gear is fixedly connected with the switching rod, and one end of the sector gear is meshed with the transmission gear. Therefore, a plurality of substrates with different specifications can be additionally arranged in the film plating instrument at one time, a multi-film continuous plating function is realized, the substrates can be alternately replaced without relieving the vacuum of a cavity of the vacuum film plating instrument during use, the idle running time of repeatedly vacuumizing / de-vacuumizing and heating / cooling during the operation of the instrument is greatly shortened, and the working efficiency is improved. The operation cycle of the vacuum coating instrument is shortened, the efficiency is improved, the service life of the instrument is prolonged, and the energy consumption, pollution and labor cost are reduced.

Description

Technical Field

[0001] The present application relates to the technical field of vacuum coating, and in particular to a substrate feeder device used in a vacuum coating apparatus. Background Art

[0002] With the miniaturization and multifunctionality of devices, growing materials on a substrate to prepare thin films, thick films and nanostructures of various morphologies has become the technical basis for the diversification of devices. For this reason, various vacuum coating technologies are widely used in production.

[0003] Vacuum coating is a process that uses physical or chemical methods to deposit materials onto the surface of a substrate to form a thin film under low pressure. Through this technology, high-purity and high-precision thin film deposition can be achieved, giving it specific optical, electrical, mechanical and other properties. Therefore, vacuum coating has important application value in modern industry. For example, in semiconductor manufacturing, vacuum coating is used to make various functional layers on wafers; in the optical field, anti-reflection, anti-reflection and other effects can be achieved through coating; in mechanical manufacturing, vacuum coating can improve the wear resistance and corrosion resistance of parts. High-quality thin film coating requires high vacuum (10 -4 Pa or above) and high growth temperature conditions. To achieve the above conditions, the instrument needs to spend a lot of time heating the substrate and increasing the vacuum degree of the deposition chamber. After the coating is completed, a lot of time is needed to dissipate the heat of the film, which often accounts for more than 80% of the effective operation time of the instrument. Restricted by the working principle, the vacuum coating instrument can only coat one thin film in one working cycle. If the film is to be coated continuously, the instrument needs to be repeatedly "evacuated / de-vacuumed", the substrate is replaced, and "heated / heated", which consumes a lot of time and wastes a lot of resources.

[0004] At present, there is no good solution to the above technical problems, and vacuum coating has always used the "high consumption and low output" operating mode. Summary of the invention

[0005] The present application aims to solve one of the technical problems in the related art at least to some extent.

[0006] To this end, the first purpose of the present application is to provide a substrate sampler device for use in a vacuum coating apparatus. During the vacuum coating process, multiple substrates of different specifications can be installed in the coating apparatus at one time, thereby solving the limitation that the instrument can only coat one thin film in one cycle of operation. Under the premise of maintaining the consistency of the experimental environment (vacuum degree, growth temperature, etc.), the function of continuous coating of multiple films can be realized.

[0007] The second object of the present application is to provide a substrate sampler device for use in a vacuum coating apparatus. When the present invention is used, the substrates can be replaced in rotation without releasing the vacuum in the chamber of the vacuum coating apparatus, which greatly compresses the idling time of repeated "vacuum extraction / de-vacuuming" and "heat addition / dissipation" during the operation of the instrument. It has the remarkable characteristics of shortening the operating cycle of the vacuum coating apparatus, improving the efficiency of equipment use, extending the life of the instrument, reducing energy consumption, reducing environmental pollution, and saving labor costs.

[0008] To achieve the above-mentioned purpose, the first embodiment of the present application proposes a substrate injector device for use in a vacuum coating instrument, comprising an injector base, an injector cover, a substrate rack, a substrate cover, a transmission gear, a fan gear, a transfer rod, a baffle and a rack, wherein the injector base is assembled with the injector cover, and an injection slot and a gear slot are respectively provided on the injector base; after the substrate rack is loaded with a substrate, it is assembled with the substrate cover and placed in the injection slot; the transmission gear is installed in the gear slot; the rack is arranged in the substrate rack, and the rack and the substrate rack are designed as an integral whole, and the rack is meshed with the transmission gear; the fan gear is fixedly connected to the transfer rod, and one end of the fan gear is meshed with the transmission gear, and the transfer rod is installed on the control handle rod of the vacuum coating instrument; the baffle and the fan gear are fixed on the transfer rod in reverse.

[0009] A substrate sampler device for use in a vacuum coating apparatus according to an embodiment of the present application can, during the vacuum coating process, load multiple substrates of different specifications into the coating apparatus at one time, thereby resolving the limitation that the apparatus can only coat one thin film in one operating cycle, and realizing the function of continuous coating of multiple films while maintaining the consistency of the experimental environment (vacuum degree, growth temperature, etc.). When the present invention is used, there is no need to release the vacuum in the chamber of the vacuum coating apparatus to realize the rotation replacement of substrates, thereby greatly compressing the idling time of repeated "vacuum extraction / de-vacuuming" and "heat addition / dissipation" during the operation of the apparatus, and having the remarkable characteristics of shortening the operating cycle of the vacuum coating apparatus, improving the utilization efficiency of the equipment, extending the life of the apparatus, reducing energy consumption, reducing environmental pollution, and saving labor costs.

[0010] In addition, the substrate feeder device for a vacuum coating apparatus proposed in the present application may also have the following additional technical features:

[0011] In one embodiment of the present application, the injection slot is arranged in the center of the injector base, one side of the injection slot is tangent to the gear slot, and a spring sheet slot is provided in the center of the other side, and a heating window is opened in the middle of the injection slot.

[0012] In one embodiment of the present application, the substrate rack is embedded in the sample injection slot, and a plurality of substrate slots are provided in the substrate rack, and the substrate slots are evenly distributed in the substrate rack, and a positioning slot is provided at the other side of the substrate rack corresponding to the substrate slot.

[0013] In one embodiment of the present application, a coating window is opened in the center of the injector cover.

[0014] In one embodiment of the present application, the substrate slots may be set to different specifications, including quantity, size, shape, etc., and sub-substrate slots may be nested in the substrate slots.

[0015] The advantages of this application compared with the existing technology are:

[0016] (1) During the vacuum coating process, multiple substrates of different specifications can be installed in the coating instrument at one time, which solves the limitation that the instrument can only coat one thin film in one cycle. Under the premise of maintaining the consistency of the experimental environment (vacuum degree, growth temperature, etc.), the function of continuous coating of multiple films can be realized.

[0017] (2) When the present invention is used, the substrates can be replaced in rotation without releasing the vacuum in the chamber of the vacuum coating instrument, which greatly reduces the idling time of the instrument during repeated "vacuum extraction / release" and "heat addition / dissipation". It has the remarkable characteristics of shortening the operation cycle of the vacuum coating instrument, improving the efficiency of equipment use, extending the life of the instrument, reducing energy consumption, reducing environmental pollution, and saving labor costs.

[0018] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become apparent from the description below, or will be learned through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the following description of the embodiments in conjunction with the accompanying drawings, in which:

[0020] Figure 1 is a three-dimensional diagram of a substrate sampler device used in a vacuum coating apparatus according to one embodiment of the present application;

[0021] Figure 2 is a three-dimensional diagram of a substrate feeder device used in a vacuum coating apparatus according to another embodiment of the present application;

[0022] Figure 3 A three-dimensional diagram of an injector base of a substrate injector device used in a vacuum coating apparatus according to an embodiment of the present application;

[0023] Figure 4 A three-dimensional diagram of an injector cover plate of a substrate injector device used in a vacuum coating apparatus according to an embodiment of the present application;

[0024] Figure 5 A three-piece substrate rack of a substrate sampler device used in a vacuum coating apparatus according to an embodiment of the present application;

[0025] Figure 6 A three-dimensional diagram of a basic cover plate of a substrate feeder device used in a vacuum coating apparatus according to an embodiment of the present application;

[0026] Figure 7 A three-dimensional diagram of a transmission gear of a substrate feeder device used in a vacuum coating apparatus according to an embodiment of the present application;

[0027] Figure 8 A three-dimensional diagram of a sector gear of a substrate feeder device used in a vacuum coating apparatus according to an embodiment of the present application;

[0028] Fig. 9 A three-dimensional diagram of an adapter column of a substrate sampler device used in a vacuum coating apparatus according to an embodiment of the present application;

[0029] Fig.10 It is a stereoscopic view of a baffle of a substrate injector device used in a vacuum coating apparatus according to an embodiment of the present application.

[0030] As shown in the figure: 1. Injector base; 2. Injector cover; 3. Substrate rack; 4. Substrate cover; 5. Transmission gear; 6. Fan gear; 7. Adapter rod; 8. Baffle; 9. Injection slot; 10. Gear slot; 11. Rack; 12. Spring sheet slot; 13. Heating window; 14. Substrate slot; 15. Positioning slot; 16. Coating window. DETAILED DESCRIPTION

[0031] Embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements with the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present application, and should not be construed as limitations on the present application. On the contrary, the embodiments of the present application include all changes, modifications and equivalents that fall within the spirit and connotation of the appended claims.

[0032] A substrate sample feeder device for use in a vacuum coating apparatus according to an embodiment of the present application will be described below in conjunction with the accompanying drawings.

[0033] like Figure 1-Figure 10As shown, a substrate sampler device for a vacuum coating apparatus according to an embodiment of the present application may include a sampler base 1, a sampler cover 2, a substrate rack 3, a substrate cover 4, a transmission gear 5, a sector gear 6, a transfer rod 7, a baffle 8 and a rack 11, wherein the sampler base 1 is assembled with the sampler cover 2, and a sampler slot 9 and a gear slot 10 are respectively provided on the sampler base 1, and the substrate rack 3 is assembled with the substrate cover 4 after loading the substrate and placed in the sampler base 1. The transmission gear 5 is installed in the gear groove 10, the rack 11 is arranged in the substrate rack 3, and the rack 11 and the substrate rack 3 are designed as an integral whole, the rack 11 is meshed with the transmission gear 5, the sector gear 6 is fixedly connected to the transfer rod 7, and one end of the sector gear 6 is meshed with the transmission gear 5, the transfer rod 7 is installed on the control handle rod of the vacuum coating instrument, the baffle 8 and the sector gear 6 are fixed on the transfer rod 7 in reverse, and a coating window 16 is opened in the center of the injector cover 2.

[0034] It can be understood that the sampler base 1 is the basic supporting component of the entire device, which provides a stable platform for installing and supporting other components. The sampler base 1 is provided with a sample injection slot 9 and a gear slot 10. The sample injection slot 9 is used to accommodate and fix the assembly of the substrate rack 3 and the substrate cover plate 4 to ensure the stability and accuracy of the substrate during the coating process. The gear slot 10 is used to install the transmission gear 5 to provide power for the automatic movement of the substrate rack 3.

[0035] The sampler cover 2 is assembled with the sampler base 1 to form a closed sampler space. A coating window 16 is provided in the center of the sampler cover 2. When the substrate on the substrate rack 3 moves below the coating window 16, the coating source can coat the substrate through the window.

[0036] The substrate rack 3 is a component for loading substrates. It is designed with different specifications according to actual needs to accommodate substrates of different sizes and shapes. After loading the substrate, the substrate rack 3 is assembled with the substrate cover plate 4 and placed in the sample injection slot 9. A rack 11 is provided in the substrate rack 3, which meshes with the transmission gear 5. When the transmission gear rotates, it drives the rack 11 and the substrate rack 3 to move together, thereby realizing automatic replacement of substrates and sequential coating.

[0037] The substrate cover plate 4 is used to hold and fix the substrate on the substrate rack 3 to prevent the substrate from being displaced or falling off during the coating process. It is buckled on the substrate rack 3 and together with the substrate rack 3 forms a stable substrate loading unit to ensure the smooth progress of the coating process.

[0038] The transmission gear 5 is installed in the gear slot 10, and it is a key component for realizing the automatic movement of the substrate frame 3. The transmission gear 5 is meshed with the rack 11 in the substrate frame 3. When the transmission gear rotates, it drives the rack 11 and the substrate frame 3 to move to a specified position together, thereby realizing automatic replacement of the substrate.

[0039] The sector gear 6 is fixedly connected to the transfer rod 7, and one end of the sector gear 6 is meshed with the transmission gear 5. When the control handle of the vacuum coating apparatus is turned, the transfer rod 7 and the sector gear 6 are driven to rotate together. The rotation of the sector gear 6 further drives the transmission gear 5 to rotate, thereby realizing the automatic movement of the substrate rack 3 and the sequential replacement of substrates.

[0040] The transfer rod 7 is installed on the control handle rod of the vacuum coating apparatus, and it plays the role of connecting the sector gear 6 and the control handle. By rotating the control handle, the sector gear 6 and the transmission gear 5 can be easily driven to rotate, thereby realizing the automatic movement of the substrate rack 3 and the sequential coating of the substrates.

[0041] The baffle plate 8 is fixed on the transfer rod 7 in the opposite direction to the sector gear 6. When it is necessary to protect the substrate from pollution or the influence of the coating source, the control handle can be turned to make the baffle plate 8 cover the coating window 16. In this way, even if the environment inside the coating apparatus changes, it will not affect the substrate, ensuring the stability and safety of the coating process.

[0042] The rack 11 is arranged in the substrate rack 3 and meshes with the transmission gear 5. It is one of the key components for realizing the automatic movement of the substrate rack 3. When the transmission gear 5 rotates, it drives the rack 11 and the substrate rack 3 to move to the specified position together, thereby realizing the automatic replacement of substrates and sequential coating.

[0043] In one embodiment of the present application, Figure 1-Figure 3 As shown, the injection slot 9 is arranged in the center of the injector base 1, one side of the injection slot 9 is tangent to the gear slot 10, and the center of the other side is provided with a spring sheet slot 12, and a heating window 13 is opened in the middle of the injection slot 9.

[0044] It is understandable that the injection slot 9 is arranged at the central position of the injector base 1. Such a design can ensure that the substrate rack 3 can maintain balance during movement, and reduce the risk of uneven coating or damage to the substrate due to position offset. The shape of the injection slot 9 is usually matched with the shape of the substrate rack 3, so as to tightly accommodate and fix the assembly of the substrate rack 3 and the substrate cover plate 4.

[0045] One side of the sample injection slot 9 is tangent to the gear slot 10. The transmission gear 5 can directly mesh with the rack 11 in the substrate rack 3. When the transmission gear 5 rotates in the gear slot 10, it can effectively drive the rack 11 and the substrate rack 3 to move together, thereby realizing automatic replacement of substrates and sequential coating.

[0046] A spring sheet slot 12 is provided at the center of the other side of the sample injection slot 9. The spring sheet slot 12 is used to install a spring sheet. When the substrate rack 3 and the substrate cover plate 4 are assembled and placed in the sample injection slot 9, the spring sheet can be pressed on the substrate rack 3 or the substrate cover plate 4, thereby ensuring that they are tightly fitted in the sample injection slot 9 to prevent displacement or falling off during the coating process.

[0047] A heating window 13 is provided in the middle of the sample injection slot 9. The design of the heating window 13 allows the substrate to be heated during the coating process to improve the coating quality and adhesion. The heating window 13 is usually connected to an external heating source (such as a heating wire, a heating plate, etc.), and the substrate temperature can be accurately controlled by controlling the power and time of the heating source. The position and size of the heating window 13 are usually determined according to the specific requirements of the coating process.

[0048] In one embodiment of the present application, Figure 1 , Figure 2 , Figure 3 and Figure 5 As shown, the substrate rack 3 is embedded in the sample feeding slot 9, and a plurality of substrate slots 14 are arranged in the substrate rack 3, and the substrate slots 14 are evenly distributed in the substrate rack 3. A positioning slot 15 is arranged at the other side of the substrate rack 3 corresponding to the substrate slots 14.

[0049] It is understandable that the substrate rack 3 is designed to be tightly embedded in the injection slot 9. This design ensures the stability and accuracy of the substrate rack 3 during the coating process and prevents the risk of uneven coating or damage to the substrate due to positional displacement or shaking. When the substrate rack 3 is fully embedded in the injection slot 9, its surface should fit tightly with the bottom surface of the injection slot 9 to form a closed coating space.

[0050] A plurality of substrate slots 14 are provided in the substrate rack 3. These substrate slots 14 are evenly distributed in the substrate rack 3 and are used to load substrates to be coated. The shape and size of each substrate slot 14 usually match the shape and size of the substrate to ensure that the substrate can fit tightly in the slot to prevent displacement or falling off during the coating process. At the same time, the number and arrangement of the substrate slots 14 can be adjusted according to actual needs to meet the coating needs of different scales and types.

[0051] On the other side of the substrate rack 3, a positioning slot 15 is provided corresponding to the substrate slot 14. The positioning slot 15 is designed to ensure the accurate positioning of the substrate in the substrate slot 14. When the substrate is placed in the substrate slot 14, its edge portion can be inserted into the positioning slot 15, thereby preventing the substrate from moving or tilting during the coating process. This design not only improves the accuracy and uniformity of the coating, but also reduces the risk of coating defects caused by substrate position deviation.

[0052] In one embodiment of the present application, Figure 1 , Figure 2 and Figure 5 As shown, the substrate slot 14 can be set to different specifications, including quantity, size, shape, etc., and a sub-substrate slot can be nested in the substrate slot 14.

[0053] It is understood that the flexibility and customizability of the substrate slots 14 enable the substrate rack 3 to adapt to a variety of different scales and types of coating requirements. By adjusting the number, size, shape of the substrate slots 14 and the design of the nested sub-substrate slots, users can flexibly configure the substrate rack 3 to meet their specific coating requirements.

[0054] Embodiment: Taking the coating of ZnO thin film by JGP450 high vacuum magnetron sputtering coating apparatus as an example, the specific use and implementation of the device of the present invention is explained.

[0055] Since the vacuum chamber of the coating instrument is a high vacuum oil-free environment, before using the device of the present invention, the user must strictly follow the experimental standards to clean the various components of the sampler. After cleaning and drying, align and assemble the sampler base 1, the transmission gear 5 and the sampler cover 2 and install them on the heater of the coating instrument. Remove the baffle plate at the end of the coating instrument control handle, and fix the sector gear 6, the baffle plate 8 and the adapter rod 7 to the end of the control handle.

[0056] The user formulates the parameters of the substrate rack 3 according to actual needs (this embodiment takes a three-piece substrate rack as an example), prepares the corresponding substrates and loads them into the substrate slot 14 of the substrate rack 3, buckles the substrate cover 4 on the substrate rack 3 to hold the substrate, and then loads it into the sampler injection slot 9, and adjusts the position of the substrate rack 3 so that the first substrate is exposed at the coating window 16 of the sampler cover 2. Close the hatch of the coating instrument, start the vacuuming, substrate heating and other preparation processes in sequence, and start coating when the coating instrument state reaches the designed working state. After the coating of the first thin film is completed, turn the control handle outside the coating instrument to make the fan gear 6 mesh with the transmission gear 5. Turn the control handle clockwise to drive the rack 11 of the substrate rack 3 to move the substrate rack 3 forward. When the second substrate appears at the coating window 16 of the sampler cover 2, appropriately adjust the position of the substrate rack 3 so that the spring sheet in the spring sheet slot 12 just clamps the positioning card slot 15 to ensure that the substrate is in the best coating position.

[0057] The user can set the number of teeth of the sector gear 6 according to the parameters of the substrate rack 3 to facilitate the adjustment of the position of the substrate rack 3. If the target material needs to be replaced for the second film, the control handle can be turned to make the baffle 8 cover the coating window 16 to protect the substrate from contamination. After a simple adjustment of the instrument state, the second round of film coating can be started, which saves a lot of time in the preparation stages such as chamber heat dissipation, opening the cabin to take out the film, reloading the substrate, re-vacuuming and reheating the substrate, which can greatly compress the instrument's no-load operation state and greatly improve the instrument's use efficiency.

[0058] By analogy, with the aid of the sample injector device of the present invention, during the vacuum coating process, multiple substrates of different specifications can be installed in the coating instrument at one time, thereby overcoming the limitation that the instrument can only coat one thin film in one cycle of operation, and realizing the function of continuous coating of multiple films while maintaining the consistency of the experimental environment (vacuum degree, growth temperature, etc.).

[0059] Using the JGP450 high vacuum magnetron sputtering coating instrument to coat ZnO thin film, assuming that the sputtering coating time is 1 hour, a complete coating process takes about 6 hours (of which chamber vacuuming, substrate heating and cabin heat dissipation take about 5 hours). If 3 thin films are continuously coated, the instrument needs to run for at least 18 hours, and it takes two working days to complete the thin film coating work. If the substrate sampler device of the present invention is used to assist in the coating of thin films, under the same work requirements, the required working time is only about 5+1×3=8 hours, and the thin film coating work can be completed within one working day, which will greatly save the manpower and material costs of the instrument operation, improve the instrument operation efficiency, and reduce the risk of instrument operation. It has excellent promotion and practical value in related fields.

[0060] In summary, a substrate sampler device for a vacuum coating instrument according to an embodiment of the present application can install multiple substrates of different specifications in the coating instrument at one time during the vacuum coating process, thereby solving the limitation that the instrument can only coat one thin film in one operation cycle, and realizing the function of continuous coating of multiple films under the premise of maintaining the consistency of the experimental environment (vacuum degree, growth temperature, etc.). When the present invention is used, the rotation replacement of substrates can be realized without releasing the vacuum of the vacuum coating instrument chamber, which greatly compresses the idling time of repeated "vacuum extraction / de-vacuumization" and "heat addition / dissipation" during the operation of the instrument. It has the remarkable characteristics of shortening the operation cycle of the vacuum coating instrument, improving the efficiency of equipment use, extending the life of the instrument, reducing energy consumption, reducing environmental pollution, and saving labor costs.

[0061] In the description of this specification, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0062] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0063] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and deform the above embodiments within the scope of the present application.

Claims

1. A substrate sampler device for a vacuum coating apparatus, characterized in that: The invention comprises an injector base (1), an injector cover plate (2), a substrate rack (3), a substrate cover plate (4), a transmission gear (5), a sector gear (6), a transfer rod (7), a baffle plate (8) and a rack (11), wherein: The injector base (1) is assembled in alignment with the injector cover (2), and an injector slot (9) and a gear slot (10) are respectively provided on the injector base (1); After the substrate is loaded, the substrate rack (3) is assembled with the substrate cover plate (4) and placed in the sample injection slot (9); The transmission gear (5) is installed in the gear groove (10); The rack (11) is arranged in the substrate rack (3), and the rack (11) and the substrate rack (3) are designed as an integral whole, and the rack (11) is meshed with the transmission gear (5); The sector gear (6) is fixedly connected to the transfer rod (7), and one end of the sector gear (6) is meshed with the transmission gear (5), and the transfer rod (7) is installed on the control handle rod of the vacuum coating instrument; The baffle plate (8) and the sector gear (6) are fixed on the transfer rod (7) in opposite directions.

2. A substrate sample feeder device for a vacuum coating apparatus according to claim 1, characterized in that: The injection slot (9) is arranged at the center of the injector base (1), one side of the injection slot (9) is tangent to the gear slot (10), a spring sheet slot (12) is arranged at the center of the other side, and a heating window (13) is arranged in the middle of the injection slot (9).

3. A substrate sample feeder device for a vacuum coating apparatus according to claim 1, characterized in that: The substrate rack (3) is embedded in the sample feeding slot (9), a plurality of substrate slots (14) are provided in the substrate rack (3), the substrate slots (14) are evenly distributed in the substrate rack (3), and a positioning slot (15) is provided at the other side of the substrate rack (3) corresponding to the substrate slots (14).

4. A substrate sample feeder device for a vacuum coating apparatus according to claim 1, characterized in that: A coating window (16) is provided in the center of the sample injector cover plate (2).

5. The substrate sample feeder device for a vacuum coating apparatus according to claim 3, characterized in that: The substrate slot (14) can be set to different specifications, including quantity, size, shape, etc., and a sub-substrate slot can be nested in the substrate slot (14).

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