Ultrapure water preparation equipment and method based on wafer material production
By designing adjustable extrusion components and positioning components in ultrapure water preparation equipment, combined with the monitoring of pressure sensors, the problem of inconvenient adjustment of peristaltic booster mechanism and hose disassembly and assembly is solved, and efficient and clean ultrapure water preparation is achieved.
Patent Information
- Application Number
- CN202510215327.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-26
- Publication Date
- 2025-03-28
AI Technical Summary
In the existing ultrapure water preparation equipment, the peristaltic booster mechanism is not convenient to adjust the degree of the extruded hose, and is not convenient to disassemble and assemble and regularly replace the hose, resulting in long-term use contamination of ultrapure water and affecting purity.
An ultrapure water preparation equipment based on wafer material production is designed, using extrusion components and positioning components to adjust the extrusion degree of the hose, and monitoring and adjustment through pressure sensors, the mechanical structure design of the pressurization mechanism reduces contact with raw water, and improves the adjustability and cleanliness of the equipment.
The pressurization degree is adjusted according to actual needs, reducing secondary pollution to ultrapure water, extending the service life of the hose, and improving the purity and preparation efficiency of ultrapure water.
Smart Images

Figure CN119712510A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of ultrapure water preparation, and in particular to an ultrapure water preparation device and method based on wafer material production. Background Art
[0002] When ultrapure water preparation equipment is preparing ultrapure water, a pressurizing mechanism is usually required to extract raw water for ultrapure water preparation so that the raw water can gradually flow through different preparation equipment to complete the purification of the raw water and prepare ultrapure water.
[0003] Publication number CN118270867A discloses ultrapure water preparation equipment, and the problem raised in its background technology is: the existing ultrapure water needs to be pressurized during production, and the pressurization method includes a booster. When pressurizing, this type of equipment often needs to adjust the speed to adjust the pressurization level. In addition, it needs to maintain air tightness, which results in some parts often not being lubricated and cooled in time.
[0004] Based on the existing technology, there are the following problems: The boosting mechanism required for the existing ultrapure water preparation is usually selected according to the preparation process, wherein pressurization is performed by peristalsis. Since it is transported in a hose, it does not contact with a mechanical mechanism, and the probability of secondary contamination is reduced, it is widely used in the later processes of ultrapure water preparation. However, the existing peristaltic boosting mechanism is not convenient for adjusting the degree of squeezing the hose, and thus is not convenient for adjustment according to actual usage conditions, and is not convenient for disassembly and assembly of the hose, and thus is not convenient for regular replacement of the hose, which affects long-term use. Although the above-mentioned application document adjusts the pressurization degree of the water liquid pressurizing cylinder by adjusting the amount by which the extension plate moves out of the pressurizing plate, a large number of mechanical structures are set up, which increases the contact between the raw water and the mechanical structures. Long-term use causes pollution to the raw water, thereby affecting the purity of the ultrapure water preparation. There are certain shortcomings. In order to solve the above-mentioned problems, an ultrapure water preparation device and method based on wafer material production are proposed. Summary of the invention
[0005] In order to overcome the shortcomings of the above-mentioned prior art, the present invention provides an ultrapure water preparation device and method based on wafer material production, which is convenient for adjusting the degree of extrusion of the hose according to the ultrapure water preparation needs and for replacing the hose, thereby reducing secondary pollution to the ultrapure water and facilitating the actual preparation of ultrapure water for use.
[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: an ultrapure water preparation device based on wafer material production, including an ultrapure water preparation device, and also including a pressurizing device to pressurize the liquid during the ultrapure water preparation process, the pressurizing device comprising: The housing is provided with a hose for conveying liquid, and the front of the housing is provided with an extrusion mechanism extending into the housing and used to squeeze the hose to pressurize the conveyed liquid. The bottom of the housing is provided with a detachable base, and the extrusion mechanism includes: The extrusion assembly is arranged in a ring array in the housing and can rotate along the center line of the housing to extrude the hose. The extrusion assembly includes: A limiting shell, a first electromagnet is fixedly provided on the bottom inner wall of the limiting shell, a first limiting block is sleeved on the inner wall of the limiting shell, a second electromagnet is provided on the bottom of the first limiting block, and the side where the second electromagnet and the first electromagnet are close to each other are the same poles, a second limiting block extending to the top of the limiting shell is fixedly provided on the top of the first limiting block, a limiting assembly for limiting the hose is provided on the top of the second limiting block, so that the position of the limiting assembly is adjusted by repulsive force to squeeze the hose, and the degree of squeezing of the hose can be adjusted, and a positioning assembly for positioning the limiting assembly is provided at the bottom of the limiting shell.
[0007] Furthermore, the extrusion assembly further comprises: A limiting groove is provided at the bottom of the first limiting block, a pressure sensor is fixedly provided on the top inner wall of the limiting groove, and a first spring is fixedly provided at the bottom of the pressure sensor; The mounting plate is sleeved on the inner wall of the limit groove, and the bottom of the mounting plate is fixedly connected to the top of the second electromagnet, and the top of the mounting plate is fixedly connected to the bottom of the first spring to monitor the degree of squeezing of the hose by the limit assembly through the pressure sensor. A limit rod is fixedly provided on the top of the mounting plate and located on the outside of the pressure sensor, and the upper ends of the side walls of the limit rod are sleeved in the first limit block to limit the movement of the mounting plate.
[0008] Furthermore, the limiting component includes: The mounting frame is fixedly arranged on the top of the second limit block, the inner side of the mounting frame is rotatably provided with a rotating shaft, the side wall of the rotating shaft is fixedly sleeved with an intermediate piece, the side wall of the rotating shaft and both sides of the intermediate piece are rotatably provided with stoppers, the outer wall of the stopper and the intermediate piece are both annularly designed, and the outer wall diameter of the stopper is larger than the outer wall diameter of the intermediate piece, so as to limit the hose between the stoppers, and the diameter value of the stopper being larger than the intermediate piece is smaller than the thickness of the hose after extrusion and bonding; The rotating member is embedded in the side where the middle member and the stop member are close to each other, so that the middle member and the stop member are rotationally connected and the gap between the middle member and the stop member is limited.
[0009] Further, the positioning component includes: A positioning shell is fixedly arranged at the bottom of the limiting shell, a positioning groove is opened inside the positioning shell, a wedge-shaped block is slidably arranged on the inner wall of the positioning groove, a threaded tube extending to the outside of the positioning shell is fixedly arranged on the side wall of the wedge-shaped block, and a first threaded rod is threadedly connected to the inner wall of one end of the threaded tube located outside the limiting shell; The positioning rod is sleeved on the top inner wall of the positioning shell and extends into the limiting shell. One end of the positioning rod located in the limiting shell is located inside the second electromagnet. The bottom of the positioning rod is designed in an arc shape and faces the inclined surface of the wedge block.
[0010] Furthermore, the extrusion mechanism further comprises: The servo motor is fixed on the back of the shell. The output shaft of the servo motor is fixed with a rotating rod extending into the shell and rotatably connected to the back of the shell through a coupling. The side wall of one end of the rotating rod located in the shell is fixedly connected to the bottom of the limit shell arranged in a circular array. The center of the front of the shell is designed to be open. An adjustment component for adjusting the position of the wedge block is provided at one end of the rotating rod close to the front of the shell. The adjustment component includes: The second threaded rod is fixed at one end of the rotating rod close to the front side of the shell. The side wall of the second threaded rod is rotatably provided with a first gear. The side wall of the first threaded rod is fixedly sleeved with a second gear meshing with the first gear to drive the first threaded rods arranged in a circular array to rotate synchronously.
[0011] Furthermore, the adjustment component also includes: A first spline sleeve is rotatably disposed on a side wall of the second threaded rod and is fixedly connected to a side of the first gear that is close to each other; A second spline sleeve is sleeved on the side wall of the second threaded rod, the first spline sleeve and the second spline sleeve are respectively designed as an outer spline sleeve and an inner spline sleeve, and are adapted to each other, a retaining ring is fixedly provided on the side wall of the second spline sleeve, and the inner wall diameter of the retaining ring is smaller than the inner wall diameter of the second spline sleeve, so as to fix the second spline sleeve through the second threaded rod; A fixed disk is fixedly sleeved on the side wall of the second threaded rod, the side wall of the fixed disk is rotatably connected to the side wall of the first threaded rod, and a movable sleeve arranged in a circular array is fixedly arranged on the side of the fixed disk away from the first gear, and the inner wall of the movable sleeve is slidably connected to the outer wall of the threaded tube to limit the movement of the threaded tube.
[0012] Furthermore, a first disassembly assembly for connecting the base and the shell is provided at the bottom of the base, and a second disassembly assembly is provided at the top of the shell. The first disassembly assembly, the second disassembly assembly and the extrusion mechanism cooperate to disassemble the hose. The first disassembly assembly includes: A third threaded rod is fixedly disposed at the bottom of the housing and extends to the bottom opening of the base; A threaded disc is threadedly connected to the side wall of the third threaded rod, a mounting sleeve is fixedly provided at the bottom of the threaded disc, and a pull ring is slidably connected to the outer wall of the mounting sleeve; The card blocks are sleeved on the top of the threaded disk in an annular array, and the bottom of the card blocks are fixed with a pull rod that can move vertically, and the bottom of the pull rod is fixed with a connecting plate, and the connecting plate is fixedly connected to the outer wall of the pull ring, and the top inner wall of the bottom opening of the base is provided with card grooves arranged in an annular array and adapted to the card blocks; The disassembly shell is fixed at the bottom of the threaded disk in a circular array and is located on the outside of the mounting sleeve. The inner wall of the disassembly shell is sleeved with a ring body, and the inner wall of the ring body is fixedly connected to the side wall of the pull rod. The bottom of the pull rod extends to the bottom of the disassembly shell. The pull rod is located on the side wall of one end of the disassembly shell and is located at the bottom of the ring body and a fourth spring is sleeved.
[0013] Further, the second disassembly assembly comprises: The disassembly block is sleeved on the top of the shell, a disassembly plate is fixedly provided on the top of the disassembly block, and the bottom of the disassembly plate cooperates with the top stop of the shell, the disassembly plate and the top of the shell are fixedly connected by bolts, the bottom of the disassembly block is designed to be arc-shaped, and the top of the shell is provided with a disassembly slot for sleeved the disassembly block.
[0014] Furthermore, the cross-sections of the first limit block and the second limit block are both designed as regular hexagons, and the inner side wall of the limit shell is adapted to the side wall of the first limit block; The radius of the first limit block is greater than that of the second limit block, so as to cooperate with the top inner wall stopper of the limit shell, thereby limiting the second limit block from being separated from the limit shell. The second limit block is located on one end side wall of the limit shell and is located on the top of the first limit block and is sleeved with a second spring; The first electromagnet and the second electromagnet are both designed in a ring shape; The shell is provided with a mounting groove for sleeved hose inside, and both sides of the base are provided with mounting holes for sleeved hose and connected with the mounting groove, and the inner wall of the mounting groove is connected with the inner wall of the disassembly and assembly through groove.
[0015] The present invention also provides a method for using an ultrapure water preparation device based on wafer material production, using the ultrapure water preparation device based on wafer material production, the method comprises the following steps: S1: preparing ultrapure water by an ultrapure water preparation device; S2: During the ultrapure water preparation process, the ultrapure water liquid is pressurized by a pressurizing device to meet the ultrapure water preparation needs.
[0016] The present invention provides an ultrapure water preparation device and method based on wafer material production. Compared with the prior art, it has the following beneficial effects: 1. The present invention pressurizes and transports the raw water required for ultrapure water preparation in a hose, thereby reducing the contact between the pressurizing mechanism and the raw water compared to the traditional pressurizing mechanism, thereby reducing the probability of secondary contamination of the raw water. The pressurizing mechanism is convenient for adjusting the pressurization level according to preparation requirements, thereby facilitating actual preparation and use, and facilitating regular replacement of the hose to avoid contamination of ultrapure water due to long-term use of the hose.
[0017] 2. The present invention adjusts the position of the limit assembly through the extrusion assembly, thereby adjusting the degree of extrusion of the hose by the limit assembly to adjust the pressure of the raw water delivery, thereby meeting the preparation requirements of the raw water in each ultrapure water preparation process, and the degree of extrusion of the hose by the limit assembly is grasped through the pressure sensor to facilitate the control of the pressurization degree. By making the pressure sensor act on the second electromagnet, the accuracy of monitoring the degree of extrusion of the hose is improved, which is convenient for actual adjustment of the degree of extrusion of the hose.
[0018] 3. The present invention prevents the hose from being deflected during the squeezing process by squeezing the hose between the stoppers, thereby preventing the pressurized delivery of raw water from being affected. The stoppers and the middle piece rotate relative to each other, allowing the stoppers and the middle piece to contact the hose more flexibly, thereby improving the limiting effect of the stopper on the hose during the squeezing process without affecting the squeezing of the hose.
[0019] 4. The present invention positions the limit assembly by cooperating with the positioning assembly and the adjustment assembly to avoid affecting the stability of the limit assembly in squeezing the hose, and through the first gear and the second gear, etc., it is convenient to synchronously adjust the positions of multiple limit assemblies arranged in a circular array, which is convenient for practical operation.
[0020] 5. The present invention facilitates the disassembly and assembly of the hose by cooperating with the first disassembly and assembly component, the second disassembly and assembly component and the extrusion mechanism, thereby facilitating the regular replacement of the hose to avoid contamination of ultrapure water by long-term use of the hose. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] Figure 1 This is a schematic diagram of the overall structure of the ultrapure water preparation equipment produced based on wafer materials of the present invention; Figure 2 It is a schematic structural diagram of the pressurizing device of the present invention; Figure 3 It is a schematic diagram of the longitudinal cross-sectional structure of the base and the shell of the present invention; Figure 4 The housing and base of the present invention are Figure 3 A schematic diagram of a longitudinal cross-sectional structure in the vertical direction; Figure 5 It is a schematic diagram of the exploded structure of the second disassembly assembly component, the housing, the base and the first disassembly assembly component of the present invention; Figure 6It is a schematic diagram of the exploded structure of the base, the shell and the second disassembly assembly of the present invention; Figure 7 It is a schematic diagram of the bottom structure of the base and the threaded disk of the present invention; Figure 8 It is a schematic cross-sectional structural diagram of the threaded disk of the present invention; Fig. 9 It is a schematic diagram of the cross-sectional structure of the base and the shell of the present invention; Fig.10 It is a schematic diagram of the structure of the extrusion mechanism of the present invention; Fig.11 It is a schematic diagram of the cross-sectional structure of the positioning shell and the limiting shell of the present invention; Fig.12 It is a schematic diagram of the structure of the positioning component and the adjusting component of the present invention; Fig.13 It is a schematic cross-sectional structural diagram of the movable sleeve of the present invention; Fig.14 It is a schematic diagram of the structure of the movable sleeve and the second spline sleeve of the present invention; Fig.15 It is a cross-sectional view of the limit shell and a schematic diagram of the rotating shaft structure of the present invention; Fig.16 It is a schematic diagram of the cross-sectional structure of the limiting shell of the present invention; Fig.17 It is a schematic cross-sectional structural diagram of a first limiting block of the present invention; Fig.18 It is a schematic diagram of the structure of the limiting component of the present invention.
[0022] Reference numerals in the above drawings: 1. Ultrapure water preparation device; 2. Pressurizing device; 21. Shell; 22. Base; 23. First disassembly assembly; 24. Hose; 25. Extrusion mechanism; 26. Second disassembly assembly; 27. Mounting slot; 231, threaded disc; 232, third threaded rod; 233, mounting sleeve; 234, slot; 235, pull ring; 236, block; 237, disassembly shell; 238, ring body; 239, connecting plate; 251, servo motor; 252, rotating rod; 253, extrusion assembly; 254, adjustment assembly; 2531, positioning assembly; 2532, limiting shell; 2533, limiting assembly; 2534, second limiting block; 2535, first limiting block; 2536, second electromagnet; 2537, first electromagnet; 2538, limiting groove; 2539, mounting plate; 2530, pressure sensor; 25311, positioning shell; 25312, positioning groove; 25313, positioning rod; 25314, wedge block; 25315, threaded tube; 25316, first threaded rod; 25331, mounting frame; 25332, middle piece; 25333, rotating piece; 25334, stopper; 2541, second threaded rod; 2542, first spline sleeve; 2543, fixed plate; 2544, first gear; 2545, retaining ring; 2546, second spline sleeve; 2548, movable sleeve; 261. Disassembly plate; 262. Disassembly block. DETAILED DESCRIPTION
[0023] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0024] Example 1: Please refer to Figure 1 , Figure 2 , Figure 3 , Figure 4 , Fig. 9 , Fig.10 , Fig.15 , Fig.16 and Fig.17 , an ultrapure water preparation device based on wafer material production, comprising an ultrapure water preparation device 1, and also comprising a pressurizing device 2 to pressurize the liquid during the ultrapure water preparation process, the pressurizing device 2 comprising: The housing 21 is provided with a hose 24 for conveying liquid, and the front of the housing 21 is provided with an extrusion mechanism 25 extending into the housing 21 and used to squeeze the hose 24 to pressurize the conveyed liquid. The bottom of the housing 21 is provided with a detachable base 22, and the extrusion mechanism 25 includes: The extrusion assembly 253 is disposed in the housing 21 in an annular array and can rotate along the center line of the housing 21 to extrude the hose 24. The extrusion assembly 253 includes: A limiting shell 2532 is provided with a first electromagnet 2537 fixedly disposed on the inner wall at the bottom of the limiting shell 2532, a first limiting block 2535 is sleeved on the inner wall of the limiting shell 2532, a second electromagnet 2536 is disposed at the bottom of the first limiting block 2535, and the side where the second electromagnet 2536 and the first electromagnet 2537 are close to each other are the same poles, a second limiting block 2534 extending to the top of the limiting shell 2532 is fixedly disposed on the top of the first limiting block 2535, a limiting assembly 2533 for limiting the hose 24 is disposed on the top of the second limiting block 2534, so that the position of the limiting assembly 2533 is adjusted by repulsive force to squeeze the hose 24, and the degree of squeezing of the hose 24 can be adjusted, and a positioning assembly 2531 for positioning the limiting assembly 2533 is disposed at the bottom of the limiting shell 2532.
[0025] The extrusion assembly 253 also includes: A limiting groove 2538 is provided at the bottom of the first limiting block 2535, a pressure sensor 2530 is fixedly provided on the top inner wall of the limiting groove 2538, and a first spring is fixedly provided at the bottom of the pressure sensor 2530; The mounting plate 2539 is sleeved on the inner wall of the limiting groove 2538, and the bottom of the mounting plate 2539 is fixedly connected to the top of the second electromagnet 2536, and the top of the mounting plate 2539 is fixedly connected to the bottom of the first spring, so as to monitor the degree of squeezing of the hose 24 by the limiting assembly 2533 through the pressure sensor 2530. A limiting rod is fixedly provided on the top of the mounting plate 2539 and on the outside of the pressure sensor 2530, and the upper ends of the side walls of the limiting rod are sleeved in the first limiting block 2535 to limit the movement of the mounting plate 2539.
[0026] In a specific implementation, the first electromagnet 2537 and the second electromagnet 2536 are started, and the repulsive force generated between the first electromagnet 2537 and the second electromagnet 2536 pushes the second electromagnet 2536, the mounting plate 2539, the first limit block 2535, the second limit block 2534 and the limit assembly 2533 to move, thereby adjusting the degree of squeezing of the hose 24 by the limit assembly 2533 to adjust the pressure of the raw water to be transported, thereby meeting the preparation requirements of the raw water in each ultrapure water preparation process; The force of supporting the second electromagnet 2536 is supported by the pressure sensor 2530, so that it is easy to grasp the force exerted on the limit assembly 2533 when the limit assembly 2533 is subjected to the reverse force of the hose 24, so as to grasp the degree of squeezing the hose 24 by the limit assembly 2533, so as to grasp the degree of pressurization. By making the pressure sensor 2530 act on the second electromagnet 2536, the accuracy of monitoring the degree of squeezing the hose 24 is improved, which is convenient for actual monitoring use; The cross-sections of the first limiting block 2535 and the second limiting block 2534 are both designed in a regular hexagonal shape, and the inner side wall of the limiting shell 2532 is adapted to the side wall of the first limiting block 2535, so as to limit the limiting assembly 2533, etc., so as to avoid the limiting assembly 2533 from being offset when rotating along the center line of the shell 21, so as to avoid affecting the position of the hose 24 inside the limiting assembly 2533; The radius of the first limiting block 2535 is greater than the radius of the second limiting block 2534, so as to cooperate with the top inner wall stopper of the limiting shell 2532, thereby limiting the second limiting block 2534 from being separated from the limiting shell 2532. The second limiting block 2534 is located on one end side wall of the limiting shell 2532 and is located on the top of the first limiting block 2535 and is sleeved with a second spring; The first electromagnet 2537 and the second electromagnet 2536 are both designed in a ring shape, so that the subsequent positioning component 2531 can limit the position of the second electromagnet 2536 without affecting the first electromagnet 2537 and the second electromagnet 2536 cooperating to adjust the position of the limit component 2533; See also Fig.18 , the limit assembly 2533 includes: The mounting frame 25331 is fixedly arranged on the top of the second limit block 2534. A rotating shaft is rotatably arranged on the inner side of the mounting frame 25331. A middle piece 25332 is fixedly sleeved on the side wall of the rotating shaft. Stoppers 25334 are rotatably arranged on the side walls of the rotating shaft and on both sides of the middle piece 25332. The outer walls of the stoppers 25334 and the middle piece 25332 are both annularly designed, and the outer wall diameter of the stopper 25334 is larger than the outer wall diameter of the middle piece 25332, so as to limit the hose 24 between the stoppers 25334. The diameter of the stopper 25334 is larger than the diameter of the middle piece 25332 and is smaller than the thickness of the hose 24 after extrusion and bonding. The rotating member 25333 is embedded in a side where the middle member 25332 and the stop member 25334 are close to each other, so that the middle member 25332 and the stop member 25334 are rotationally connected and limit the gap between the middle member 25332 and the stop member 25334.
[0027] In a specific implementation, when the position of the second limit block 2534 is adjusted by the first electromagnet 2537 and the second electromagnet 2536, the second limit block 2534 drives the installation frame 25331, the rotating shaft, the middle piece 25332 and the stopper 25334 to move, thereby adjusting the positions of the middle piece 25332 and the stopper 25334 to adjust the degree of squeezing of the hose 24; By squeezing the hose 24 between the stoppers 25334, the hose 24 is prevented from being deflected during the squeezing process, thereby preventing the pressurized delivery of raw water from being affected; By means of the embedded rotating part 25333, the middle piece 25332 is rotatably connected with the stopper 25334, so that the stopper 25334 and the middle piece 25332 rotate relative to each other, so that the stopper 25334 and the middle piece 25332 can contact the hose 24 more flexibly, thereby reducing the friction between the limiting component 2533 and the hose 24 during the rotation process, and improving the limiting effect of the stopper 25334 on the hose 24 during the extrusion of the hose 24 without affecting the extrusion of the hose 24. By adopting an embedded manner to set the rotating part 25333, it is avoided that the gap between the middle piece 25332 and the stopper 25334 is too large to damage the hose 24.
[0028] See also Fig.10 , the extrusion mechanism 25 also includes: The servo motor 251 is fixed on the back of the shell 21. The output shaft of the servo motor 251 is fixed with a rotating rod 252 extending into the shell 21 and rotatably connected to the back of the shell 21 through a coupling. The side wall of one end of the rotating rod 252 located in the shell 21 is fixedly connected to the bottom of the limiting shell 2532 arranged in a circular array. The center of the front of the shell 21 is designed to be open. The end of the rotating rod 252 close to the front of the shell 21 is provided with an adjusting component 254 for adjusting the position of the wedge block 25314.
[0029] During the specific implementation, the servo motor 251 is started, and the servo motor 251 drives the rotating rod 252 to rotate through the coupling, thereby driving the extrusion assembly 253 to rotate, so that the limiting assembly 2533 rotates along the center of the shell 21, so as to intermittently squeeze the hose 24, thereby transporting the raw water, and by adjusting the degree of squeezing the hose 24, it is convenient to adjust the pressure of the raw water to facilitate adjustment according to the preparation of ultrapure water.
[0030] See also Fig.11 , Fig.12 , Fig.13 and Fig.14 , the positioning component 2531 includes: The positioning shell 25311 is fixedly arranged at the bottom of the limiting shell 2532. A positioning groove 25312 is provided inside the positioning shell 25311. A wedge block 25314 is slidably provided on the inner wall of the positioning groove 25312. A threaded tube 25315 extending to the outside of the positioning shell 25311 is fixedly arranged on the side wall of the wedge block 25314. The inner wall of one end of the threaded tube 25315 located outside the limiting shell 2532 is threadedly connected to a first threaded rod 25316. The positioning rod 25313 is sleeved on the top inner wall of the positioning shell 25311 and extends into the limiting shell 2532. One end of the positioning rod 25313 located in the limiting shell 2532 is located on the inner side of the second electromagnet 2536. The bottom of the positioning rod 25313 is designed in an arc shape and faces the inclined surface of the wedge block 25314.
[0031] The adjustment assembly 254 includes: The second threaded rod 2541 is fixedly arranged at one end of the rotating rod 252 close to the front side of the shell 21. The side wall of the second threaded rod 2541 is rotatably provided with a first gear 2544. The side wall of the first threaded rod 25316 is fixedly sleeved with a second gear meshing with the first gear 2544 to drive the first threaded rods 25316 arranged in a circular array to rotate synchronously.
[0032] The adjustment assembly 254 also includes: The first spline sleeve 2542 is rotatably disposed on the side wall of the second threaded rod 2541 and is fixedly connected to a side of the first gear 2544 that is close to each other; The second spline sleeve 2546 is sleeved on the side wall of the second threaded rod 2541. The first spline sleeve 2542 and the second spline sleeve 2546 are designed as an outer spline sleeve and an inner spline sleeve respectively, and are adapted to each other. A retaining ring 2545 is fixedly provided on the side wall of the second spline sleeve 2546, and the inner wall diameter of the retaining ring 2545 is smaller than the inner wall diameter of the second spline sleeve 2546, so as to fix the second spline sleeve 2546 through the second threaded rod 2541; The fixed disk 2543 is fixedly sleeved on the side wall of the second threaded rod 2541. The side wall of the fixed disk 2543 is rotatably connected to the side wall of the first threaded rod 25316. A movable sleeve 2548 arranged in a circular array is fixedly provided on the side of the fixed disk 2543 away from the first gear 2544. The inner wall of the movable sleeve 2548 is slidably connected to the outer wall of the threaded tube 25315 to limit the movement of the threaded tube 25315.
[0033] In a specific implementation, after the position of the limit assembly 2533 is adjusted by the first electromagnet 2537 and the second electromagnet 2536, in order to ensure the stability of the limit assembly 2533, the first gear 2544 is rotated, and the first gear 2544 drives the first threaded rod 25316 to rotate through the second gear. When the first threaded rod 25316 rotates, the threaded tube 25315 and the wedge block 25314 are driven to move along the inner wall of the positioning groove 25312, so as to adjust the vertical height of the positioning rod 25313 through the inclined surface of the wedge block 25314, thereby adjusting the positioning of the second electromagnet 2536. The second spline sleeve 2546 is sleeved on the outer wall of the first spline sleeve 2542, and then the external nut is screwed on the side wall of the second threaded rod 2541 to squeeze and fix the second spline sleeve 2546 and the first spline sleeve 2542, thereby fixing the first gear 2544 and the second threaded rod 2541, and avoiding affecting the positioning of the limit assembly 2533 during the rotation of the rotating rod 252; The retaining ring 2545 is provided to facilitate the nut to squeeze the second spline sleeve 2546, so that the second threaded rod 2541, the first spline sleeve 2542 and the first gear 2544 can be fixed after the external nut is tightened.
[0034] Example 2: Please refer to Figure 5 , Figure 6 , Figure 7 and Figure 8 The technical solution of this embodiment is different from that of the first embodiment in that a first disassembly assembly 23 for connecting the base 22 and the shell 21 is provided at the bottom of the base 22, and a second disassembly assembly 26 is provided at the top of the shell 21. The first disassembly assembly 23, the second disassembly assembly 26 and the extrusion mechanism 25 cooperate to disassemble the hose 24. The first disassembly assembly 23 includes: The third threaded rod 232 is fixedly disposed at the bottom of the housing 21 and extends to the bottom opening of the base 22; The threaded disk 231 is threadedly connected to the side wall of the third threaded rod 232. A mounting sleeve 233 is fixedly provided at the bottom of the threaded disk 231. A pull ring 235 is slidably connected to the outer wall of the mounting sleeve 233. The clamping blocks 236 are sleeved on the top of the threaded disk 231 in an annular array. The bottom of the clamping blocks 236 is fixed with a pull rod that can move vertically. The bottom of the pull rod is fixed with a connecting plate 239, and the connecting plate 239 is fixedly connected to the outer wall of the pull ring 235. The top inner wall of the bottom opening of the base 22 is provided with a clamping groove 234 arranged in an annular array and adapted to the clamping blocks 236. The disassembly shell 237 is fixed in a circular array at the bottom of the threaded disk 231 and is located on the outside of the mounting sleeve 233. The inner wall of the disassembly shell 237 is sleeved with a ring body 238, and the inner wall of the ring body 238 is fixedly connected to the side wall of the pull rod. The bottom of the pull rod extends to the bottom of the disassembly shell 237. The pull rod is located at one end of the side wall of the disassembly shell 237 and is located at the bottom of the ring body 238 and a fourth spring is sleeved.
[0035] See also Figure 5 The second disassembly assembly 26 includes: The disassembly block 262 is sleeved on the top of the shell 21. A disassembly plate 261 is fixedly provided on the top of the disassembly block 262, and the bottom of the disassembly plate 261 cooperates with the top stop of the shell 21. The disassembly plate 261 is fixedly connected to the top of the shell 21 by bolts. The bottom of the disassembly block 262 is designed to be arc-shaped, and the top of the shell 21 is provided with a disassembly groove for sleeve-mounting the disassembly block 262.
[0036] In specific implementation, when the hose 24 needs to be replaced, the limiting assembly 2533 is moved away from the hose 24 by the squeezing mechanism 25 to reduce the squeezing of the hose 24 by the limiting assembly 2533. Then, the connectors of the hose 24 located on both sides of the base 22 are removed, and then the hose 24 can be pulled out, that is, the removal of the hose 24 is completed. When installing a new hose 24, the pull ring 235 is pulled downward, so that the pull ring 235 drives the connecting plate 239, the pull rod and the block 236 to move downward, so that the block 236 and the card slot 234 are connected. Separate, then, rotate the threaded disk 231 to separate the threaded disk 231 from the third threaded rod 232, so that the base 22 and the shell 21 can be separated, and then unscrew the bolts fixing the disassembly plate 261, so that the disassembly plate 261 and the disassembly block 262 can be removed, and the hose 24 is installed along the disassembly groove, and the two ends of the hose 24 are moved along the inner wall of the installation groove 27, so that the two ends of the hose 24 are moved to the installation hole, and the two ends of the hose 24 are pulled to the two sides of the base 22 along the installation hole, so as to replace the hose 24; By providing the clamping block 236 and the clamping slot 234 , when the threaded disk 231 is tightened, the clamping block 236 is embedded in the clamping slot 234 , thereby preventing the stability of the connection between the base 22 and the housing 21 from being affected when the limiting component 2533 and the like rotate.
[0037] The shell 21 has a mounting groove 27 for sleeves of the hose 24 , and both sides of the base 22 have mounting holes for sleeves of the hose 24 and connected to the mounting groove 27 . The inner wall of the mounting groove 27 is connected to the inner wall of the disassembly groove.
[0038] The embodiment of the present invention further provides a method for using an ultrapure water preparation device based on wafer material production, using an ultrapure water preparation device based on wafer material production, the method comprising the following steps: S1: Ultrapure water is prepared by an ultrapure water preparation device 1. The preparation of ultrapure water is a prior art and is not specifically limited here. The specific preparation of ultrapure water generally includes: Initial adsorption filtration stage: This stage includes honeycomb filter, activated carbon filter, compressed activated carbon filter and security filter to gradually remove colloids larger than 10um, suspended particles, residual chlorine, small molecular organic matter, colloids and suspended particles to ensure reverse osmosis water quality requirements; Reverse osmosis purification stage: to remove more than 95% of electrolytes and macromolecular compounds, including colloidal particles and viruses; Resin ion exchange stage: to remove ionic impurities in water and make the resistivity of water reach the requirements of ultrapure water; Terminal ultrafiltration: The ultrafiltration membrane removes impurities such as large molecular organic matter, bacteria and viruses in the water to ensure that the produced high-purity water is not contaminated by secondary pollution, so as to meet the definition and standards of ultrapure water.
[0039] S2: During the ultrapure water preparation process, the ultrapure water liquid is pressurized by the pressurizing device 2 to meet the ultrapure water preparation requirements.
[0040] Meanwhile, the contents not described in detail in this specification belong to the prior art known to those skilled in the art.
[0041] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.
[0042] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.
Claims
1. An ultrapure water preparation device based on wafer material production, comprising an ultrapure water preparation device, characterized in that: A pressurizing device is also included to pressurize the liquid during the ultrapure water preparation process, and the pressurizing device includes: The housing is provided with a hose for conveying liquid, and the front of the housing is provided with an extrusion mechanism extending into the housing and used to squeeze the hose to pressurize the conveyed liquid. The bottom of the housing is provided with a detachable base, and the extrusion mechanism includes: The extrusion assembly is arranged in a ring array in the housing and can rotate along the center line of the housing to extrude the hose. The extrusion assembly includes: A limiting shell, a first electromagnet is fixedly provided on the bottom inner wall of the limiting shell, a first limiting block is sleeved on the inner wall of the limiting shell, a second electromagnet is provided on the bottom of the first limiting block, and the side where the second electromagnet and the first electromagnet are close to each other are the same poles, a second limiting block extending to the top of the limiting shell is fixedly provided on the top of the first limiting block, a limiting assembly for limiting the hose is provided on the top of the second limiting block, so that the position of the limiting assembly is adjusted by repulsive force to squeeze the hose, and the degree of squeezing of the hose can be adjusted, and a positioning assembly for positioning the limiting assembly is provided at the bottom of the limiting shell.
2. The ultrapure water preparation device based on wafer material production according to claim 1, characterized in that: The extrusion assembly also includes: A limiting groove is provided at the bottom of the first limiting block, a pressure sensor is fixedly provided on the top inner wall of the limiting groove, and a first spring is fixedly provided at the bottom of the pressure sensor; The mounting plate is sleeved on the inner wall of the limit groove, and the bottom of the mounting plate is fixedly connected to the top of the second electromagnet, and the top of the mounting plate is fixedly connected to the bottom of the first spring to monitor the degree of squeezing of the hose by the limit assembly through the pressure sensor. A limit rod is fixedly provided on the top of the mounting plate and located on the outside of the pressure sensor, and the upper ends of the side walls of the limit rod are sleeved in the first limit block to limit the movement of the mounting plate.
3. The ultrapure water preparation equipment based on wafer material production according to claim 1, characterized in that: The limiting component comprises: The mounting frame is fixedly arranged on the top of the second limit block, the inner side of the mounting frame is rotatably provided with a rotating shaft, the side wall of the rotating shaft is fixedly sleeved with an intermediate piece, the side wall of the rotating shaft and both sides of the intermediate piece are rotatably provided with stoppers, the outer wall of the stopper and the intermediate piece are both annularly designed, and the outer wall diameter of the stopper is larger than the outer wall diameter of the intermediate piece, so as to limit the hose between the stoppers, and the diameter value of the stopper being larger than the intermediate piece is smaller than the thickness of the hose after extrusion and bonding; The rotating member is embedded in the side where the middle member and the stop member are close to each other, so that the middle member and the stop member are rotationally connected and the gap between the middle member and the stop member is limited.
4. The ultrapure water preparation equipment based on wafer material production according to claim 1, characterized in that: The positioning component comprises: A positioning shell is fixedly arranged at the bottom of the limiting shell, a positioning groove is opened inside the positioning shell, a wedge-shaped block is slidably arranged on the inner wall of the positioning groove, a threaded tube extending to the outside of the positioning shell is fixedly arranged on the side wall of the wedge-shaped block, and a first threaded rod is threadedly connected to the inner wall of one end of the threaded tube located outside the limiting shell; The positioning rod is sleeved on the top inner wall of the positioning shell and extends into the limiting shell. One end of the positioning rod located in the limiting shell is located inside the second electromagnet. The bottom of the positioning rod is designed in an arc shape and faces the inclined surface of the wedge block.
5. The ultrapure water preparation device based on wafer material production according to claim 4, characterized in that: The extrusion mechanism also includes: The servo motor is fixed on the back of the shell. The output shaft of the servo motor is fixed with a rotating rod extending into the shell and rotatably connected to the back of the shell through a coupling. The side wall of one end of the rotating rod located in the shell is fixedly connected to the bottom of the limit shell arranged in a circular array. The center of the front of the shell is designed to be open. An adjustment component for adjusting the position of the wedge block is provided at one end of the rotating rod close to the front of the shell. The adjustment component includes: The second threaded rod is fixed at one end of the rotating rod close to the front side of the shell. The side wall of the second threaded rod is rotatably provided with a first gear. The side wall of the first threaded rod is fixedly sleeved with a second gear meshing with the first gear to drive the first threaded rods arranged in a circular array to rotate synchronously.
6. The ultrapure water preparation device based on wafer material production according to claim 5, characterized in that: The adjustment component also includes: A first spline sleeve is rotatably disposed on a side wall of the second threaded rod and is fixedly connected to a side of the first gear that is close to each other; A second spline sleeve is sleeved on the side wall of the second threaded rod, the first spline sleeve and the second spline sleeve are respectively designed as an outer spline sleeve and an inner spline sleeve, and are adapted to each other, a retaining ring is fixedly provided on the side wall of the second spline sleeve, and the inner wall diameter of the retaining ring is smaller than the inner wall diameter of the second spline sleeve, so as to fix the second spline sleeve through the second threaded rod; A fixed disk is fixedly sleeved on the side wall of the second threaded rod, the side wall of the fixed disk is rotatably connected to the side wall of the first threaded rod, and a movable sleeve arranged in a circular array is fixedly arranged on the side of the fixed disk away from the first gear, and the inner wall of the movable sleeve is slidably connected to the outer wall of the threaded tube to limit the movement of the threaded tube.
7. The ultrapure water preparation equipment based on wafer material production according to claim 1, characterized in that: The bottom of the base is provided with a first disassembly assembly for connecting the base and the shell, and the top of the shell is provided with a second disassembly assembly. The first disassembly assembly, the second disassembly assembly and the extrusion mechanism cooperate to disassemble the hose. The first disassembly assembly includes: A third threaded rod is fixedly disposed at the bottom of the housing and extends to the bottom opening of the base; A threaded disk is threadedly connected to the side wall of the third threaded rod, a mounting sleeve is fixedly provided at the bottom of the threaded disk, and a pull ring is slidably connected to the outer wall of the mounting sleeve; The clamping blocks are sleeved on the top of the threaded disk in an annular array, and the bottom of the clamping blocks are fixed with a pull rod that can move vertically, and the bottom of the pull rod is fixed with a connecting plate, and the connecting plate is fixedly connected to the outer wall of the pull ring, and the top inner wall of the bottom opening of the base is provided with a ring-shaped array of slots that are adapted to the clamping blocks; The disassembly shell is fixed at the bottom of the threaded disk in a circular array and is located on the outside of the mounting sleeve. The inner wall of the disassembly shell is sleeved with a ring body, and the inner wall of the ring body is fixedly connected to the side wall of the pull rod. The bottom of the pull rod extends to the bottom of the disassembly shell. The pull rod is located on the side wall of one end of the disassembly shell and is located at the bottom of the ring body and a fourth spring is sleeved.
8. The ultrapure water preparation device based on wafer material production according to claim 7, characterized in that: The second disassembly assembly comprises: The disassembly block is sleeved on the top of the shell, a disassembly plate is fixedly provided on the top of the disassembly block, and the bottom of the disassembly plate cooperates with the top stop of the shell, the disassembly plate and the top of the shell are fixedly connected by bolts, the bottom of the disassembly block is designed to be arc-shaped, and the top of the shell is provided with a disassembly slot for sleeved disassembly block.
9. The ultrapure water preparation device based on wafer material production according to claim 8, characterized in that: The cross-sections of the first limit block and the second limit block are both designed as regular hexagons, and the inner side wall of the limit shell is adapted to the side wall of the first limit block; The radius of the first limit block is greater than that of the second limit block, so as to cooperate with the top inner wall stopper of the limit shell, thereby limiting the second limit block from being separated from the limit shell. The second limit block is located on one end side wall of the limit shell and is located on the top of the first limit block and is sleeved with a second spring; The first electromagnet and the second electromagnet are both designed in a ring shape; The shell is provided with a mounting groove for sleeved hose inside, and both sides of the base are provided with mounting holes for sleeved hose and connected with the mounting groove, and the inner wall of the mounting groove is connected with the inner wall of the disassembly and assembly through groove.
10. A method for using an ultrapure water preparation device based on wafer material production, characterized in that: Using the ultrapure water preparation equipment based on wafer material production according to any one of claims 1 to 9, the method comprises the following steps: S1: preparing ultrapure water by an ultrapure water preparation device; S2: During the ultrapure water preparation process, the ultrapure water liquid is pressurized by a pressurizing device to meet the ultrapure water preparation needs.
Citation Information
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