Method for recovering and purifying nickel target material in Cu-64 preparation process

Abstract

The invention belongs to the technical field of medical isotope production, and relates to a method for recovering and purifying a target material, in particular to a method for recovering and purifying a nickel target material in a Cu-64 preparation process. Acid is added into the recovered nickel solution in the Cu-64 preparation process to adjust the hydrogen ion concentration to be 6-8 mol / L, and an acidic nickel solution is obtained; carrying out primary column separation on the acidic nickel solution by adopting TK201 resin to obtain an effluent; and carrying out secondary column separation on the effluent by adopting AGMP-1 resin to obtain the recovered and purified nickel solution. According to the recovery and purification method provided by the invention, impurity elements such as Cu and Co can be remarkably reduced, the purity of nickel in the recovered nickel target material is greatly improved, and the recovery rate of nickel is relatively high.

Description

Technical Field

[0001] The invention belongs to the technical field of medical isotope production, relates to a method for recovering and purifying a target material, and specifically relates to a method for recovering and purifying a nickel target material in a process of preparing Cu-64. Background Art

[0002] The information disclosed in this background technology section is only intended to enhance the understanding of the overall background of the invention, and should not necessarily be regarded as an admission or any form of suggestion that the information constitutes the prior art already known to a person skilled in the art.

[0003] Cu-64 is an important medical radioisotope that can emit both β - (0.653 MeV, 17.4%) and β + (0.579MeV, 3.9%), with a half-life of 12.7h, can perform PET (positron emission tomography) diagnosis and treatment simultaneously, and is expected to be used in integrated diagnosis and treatment research based on radionuclides. Due to the convenience of production and the limitation of half-life, Cu-64 is usually produced by accelerator irradiation of Ni-64, and then separated by AG1-X8 to obtain Cu-64 that meets the standard product. As the raw material for the production of Cu-64, Ni-64 has a high market price and accounts for an important proportion of the production cost of Cu-64. It needs to be recycled and reused in the production process of Cu-64. The purity of the recovered Ni-64 directly affects the purity of the Cu-64 product. If the impurity content of other radionuclides such as Fe, Cu, Zn, Co, and Au in Ni-64 can be reduced, the amount of impurities generated during the irradiation process can be reduced, thereby improving the yield and nuclear purity of Cu-64.

[0004] At present, the separation methods for preparing positron nuclide Cu-64 by accelerator irradiation nickel include anion column separation, Cu resin separation, etc. Anion column separation is to use Cu, Co, and Ni to form complexes with chloride ions to varying degrees under hydrochloric acid conditions. For separation, both Cu and Co can form complex anions in the hydrochloric acid medium and be adsorbed on the anion resin, among which the complexing ability of Cu is stronger than that of Co, especially under the conditions of 4mol / L and 5mol / L hydrochloric acid, the adsorption capacity of the anion resin for Cu and Co is very different. However, nickel has almost no complexing ability for chloride ions and is not adsorbed by the resin, thereby completing the separation of Cu from Co and Ni. And the advantage of ion exchange resin separation of Cu is that the available Ni raw material target material is purified and recovered to a certain extent, but the purity is not high. As a leaching resin, Cu resin has a specific adsorption capacity for copper under the condition of pH = 2 to 5, and has almost no adsorption for Co and Ni, which can better separate Cu from other elements. After obtaining the target product Cu, the large amount of element Ni remaining in the solution can be reused as the raw material for the next target production due to its high price, but due to the different purification methods and efficiencies of Cu, there are impurities of different contents in Ni, which will affect the purity of Ni after recovery, and then cause too many impurities to be generated during the next target shooting, which will cause trouble for the separation and purification of copper. Summary of the invention

[0005] In order to solve the problem of a large amount of impurities (Fe, Cu, Zn, Co, Au, etc.) in the nickel target material recovered in the process of preparing Cu-64, so as to improve the yield and nuclear purity of Cu-64 prepared by using recycled nickel target material, the purpose of the present invention is to provide a recovery and purification method for nickel target material in the process of preparing Cu-64. The recovery and purification method provided by the present invention can significantly reduce impurities such as Cu and Co, greatly improve the nickel purity in the recovered nickel target material, and the nickel recovery rate is relatively high.

[0006] In order to achieve the above object, the technical solution of the present invention is:

[0007] In a first aspect, a method for recovering and purifying a nickel target material in a Cu-64 preparation process comprises the following steps:

[0008] Adding an acid solution to the recovered nickel solution in the process of preparing Cu-64 to adjust the hydrogen ion concentration to 6-8 mol / L, thereby obtaining an acidic nickel solution;

[0009] Using TK201 resin to perform a column separation on the acidic nickel solution to obtain an effluent;

[0010] The effluent is subjected to secondary column separation using AGMP-1 resin to obtain a recovered purified nickel solution.

[0011] The extractant loaded by TK201 resin is tertiary amine, which can bind hydrogen ions. Under different hydrogen ion concentrations (i.e., acidity), the degree of tertiary amine binding to hydrogen ions is different. The present invention first adjusts the acidity of the recovered nickel solution. Studies have shown that when the acidity is 6-8 mol / L, the distribution coefficient of TK201 resin to elements such as Cu, Zn, and Co is 30-150, and the distribution coefficient to nickel is only 3-5. Therefore, the present invention first adjusts the hydrogen ion concentration of the recovered nickel solution to 6-8 mol / L, and then uses TK201 resin for column separation to pre-separate Ni from impurities such as Cu, Zn, and Co in the recovered nickel solution. However, after separation by TK201 resin column alone, the content of impurities such as Cu and Co is still high. Therefore, the present invention further separates by column through AGMP-1 resin of macroporous anion resin, and adsorbs impurities such as Cu and Co on the ion column, which can significantly reduce impurities such as Cu and Co, and greatly improve the purity of nickel in the recovered nickel target.

[0012] The present invention can achieve high recovery rate of nickel through the above technical solution. In order to further improve the recovery rate of nickel, the present invention uses an acid solution with a hydrogen ion concentration of 6 to 8 mol / L to wash the separation column after the primary column separation, and the washing liquid is mixed with the effluent for secondary column separation. Although the TK201 resin has a low distribution coefficient for nickel under the condition of an acidity of 6 to 8 mol / L, it can still adsorb a small amount of nickel. In order to recover this part of nickel, the present invention further uses an acid solution of 6 to 8 mol / L for washing, thereby achieving a high recovery rate of nickel. Although the washing liquid contains a small amount of impurities such as Cu, Zn, and Co at this time, its content is less, and the subsequent use of AGMP-1 resin for secondary column separation can avoid the increase of the impurity content of Cu, Zn, and Co in the recovered purified nickel solution.

[0013] In order to realize the reuse of TK201 resin, the present invention uses an acid solution with a pH of 2 to 3 to elute the TK201 resin after the primary column separation or after washing with a 6 to 8 mol / L acid solution.

[0014] On the other hand, a recovery and purification system for a nickel target material in a Cu-64 preparation process is provided, which is used to implement the above recovery and purification method, comprising:

[0015] A nickel solution acidity adjustment device is used to adjust the hydrogen ion concentration of the nickel solution recovered in the process of preparing Cu-64;

[0016] A first separation column, filled with TK201 resin, for performing a primary column separation on the acidic nickel solution from the nickel solution acidity adjustment device;

[0017] The second separation column is filled with AGMP-1 resin and is used for performing secondary column separation on the effluent from the first separation column.

[0018] The beneficial effects of the present invention are:

[0019] The present invention adjusts the acidity of the recovered nickel solution to 6-8 mol / L. The TK201 resin has different distribution coefficients for various metal ions under the acidity condition. At this time, nickel and other impurity metal ions can be pre-separated, and then AGMP-1 resin is used for further column separation. Cu, Co, Zn and other impurity ions can be further adsorbed on the ion column, thereby obtaining a higher-purity recovered and purified nickel solution. Compared with the method of recovering nickel by Cu resin, TK221 resin and TK201 resin, the method provided by the present invention has a lower impurity content in the obtained recovered and purified nickel solution and a higher recovery rate. DETAILED DESCRIPTION

[0020] It should be noted that the following detailed descriptions are exemplary and are intended to provide further explanation of the present invention. Unless otherwise specified, all technical and scientific terms used herein have the same meanings as those commonly understood by those skilled in the art to which the present invention belongs.

[0021] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and / or "including" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0022] In view of the presence of a large amount of impurities (Fe, Cu, Zn, Co, Au, etc.) in the nickel target material recovered in the process of preparing Cu-64, which affects the yield and nuclear purity of the recycled nickel target material in preparing Cu-64, the present invention proposes a method for recovering and purifying the nickel target material in the process of preparing Cu-64.

[0023] A typical embodiment of the present invention provides a method for recovering and purifying a nickel target in the process of preparing Cu-64, comprising the following steps:

[0024] Adding an acid solution to the recovered nickel solution in the process of preparing Cu-64 to adjust the hydrogen ion concentration to 6-8 mol / L, thereby obtaining an acidic nickel solution;

[0025] Using TK201 resin to perform a column separation on the acidic nickel solution to obtain an effluent;

[0026] The effluent is subjected to secondary column separation using AGMP-1 resin to obtain a recovered purified nickel solution.

[0027] Before column separation, the filling resin is generally placed in a solution of corresponding acidity for immersion and then filled into the separation column; or, after the filling resin is filled into the separation column, a corresponding solution is added so that the filling resin is completely soaked with the solution of corresponding acidity. In the embodiment of the present invention, before column separation, after the filling resin (TK201 resin, AGMP-1 resin, etc.) is filled into the separation column, hydrochloric acid with an acidity of 6 to 8 mol / L is used to completely soak the filling resin in the separation column, and then column separation is performed.

[0028] The present invention can significantly reduce impurities such as Cu and Co and greatly improve the nickel purity in the recovered nickel target material through the column separation and coordination of TK201 resin and AGMP-1 resin.

[0029] The acid solution of the present invention may be hydrochloric acid, sulfuric acid, nitric acid, etc. In some embodiments, the acid solution is hydrochloric acid. Hydrochloric acid contains chloride ions, which can cooperate with the resin to complex metal ions, thereby achieving high-efficiency adsorption of impurity metal ions.

[0030] In some embodiments, the volume ratio of the acidic nickel solution to the TK201 resin is 5:1 to 5. Under this condition, the impurity metal ions can be better removed and the recovery rate of Ni can be guaranteed. When the volume ratio of the acidic nickel solution to the TK201 resin is 5:1 to 1.2, the impurity metal ions are better removed and the recovery rate of Ni is higher.

[0031] In some embodiments, an acid solution with a hydrogen ion concentration of 6 to 8 mol / L is used to wash the separation column after the primary column separation, and the washing liquid is mixed with the effluent to perform secondary column separation. By washing with a 6 to 8 mol / L acid solution, a small amount of nickel adsorbed on the TK201 resin can be recovered to improve the recovery rate of nickel.

[0032] In one or more embodiments, the ratio of the volume of the acid solution used for washing to the volume of the TK201 resin column is 1:1 to 5. Under this condition, the recovery effect of nickel is better.

[0033] In some embodiments, during the primary column separation, the loading speed of the acidic nickel solution onto the column is 0.1 to 2 mL / min, preferably 0.5 to 1.0 mL / min.

[0034] In some embodiments, the particle size of TK201 resin is 100 to 150 microns. Studies have shown that the separation effect is better under this condition.

[0035] In some embodiments, the mesh size of the AGMP-1 resin is 100 to 200 meshes. Studies have shown that the separation effect is better under this condition.

[0036] In some embodiments, after the primary column separation, the TK201 resin after the primary column separation or after the washing with the 6-8 mol / L acid solution is eluted with an acid solution with a pH of 2-3, so that the TK201 resin can be reused and the recycling cost can be reduced.

[0037] A second embodiment of the present invention provides a system for recovering and purifying a nickel target in a process of preparing Cu-64, which is used to implement the above-mentioned recovery and purification method, comprising:

[0038] A nickel solution acidity adjustment device is used to adjust the hydrogen ion concentration of the nickel solution recovered in the process of preparing Cu-64;

[0039] A first separation column, filled with TK201 resin, for performing a primary column separation on the acidic nickel solution from the nickel solution acidity adjustment device;

[0040] The second separation column is filled with AGMP-1 resin and is used for performing secondary column separation on the effluent from the first separation column.

[0041] In some embodiments, an acid liquid storage device and a mixing device are included. The acid liquid storage device provides an acid solution to the first separation column after primary column separation to wash the TK201 resin in the first separation column. The washing liquid after washing enters the mixing device. The effluent after primary column separation enters the mixing device. The washing liquid and the effluent are mixed in the mixing device and then enter the second separation column for secondary column separation.

[0042] In some embodiments, a recovered purified nickel solution collecting device is included, which is used to collect the recovered purified nickel solution after secondary column separation in the second separation column.

[0043] In order to enable those skilled in the art to more clearly understand the technical solution of the present invention, the technical solution of the present invention will be described in detail below in combination with specific embodiments and comparative examples.

[0044] Example 1

[0045] Prepare a nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Hydrochloric acid is added to adjust the acidity to 6 mol / L, and this is used as a simulated solution. The content of each metal element in the simulated solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L, and the content of Zn, Fe, and Mn elements (far less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5 mL of the simulated solution, pass it through 1 mL of TK201 resin (Triskem, resin particle size is 100-150 microns) for column separation to obtain an effluent; then wash the separation column with 5 mL of 6 mol / L hydrochloric acid, rinse Ni and obtain a washing solution, the column loading and washing speed is 1.0 mL / min, the effluent is mixed with the washing solution to obtain a recovered pre-purified Ni solution, and the effluent is mixed with the washing solution to obtain a recovered pre-purified Ni solution. The recovered pre-purified Ni solution was passed through 5 mL of AGMP-1 resin (AGMP-1 is a Bio-Rad macroporous anion resin, 100-200 mesh), and 9.3 mL of effluent was collected to obtain the recovered purified Ni solution. The content of Cu in the final recovered purified Ni solution was reduced to 0.05 mg / L, the content of Co was reduced to 5 μg / L, and the recovery rate of Ni was 98%.

[0046] Example 2

[0047] Prepare the nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Hydrochloric acid is added to adjust the acidity to 6 mol / L, and this is used as the simulated solution. The content of each metal element in the simulated solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L, and the content of Zn, Fe, and Mn elements (much less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5 mL of the simulated solution, pass it through 3 mL of TK201 resin (Triskem, resin particle size is 100-150 microns) for column separation to obtain an effluent; then wash the separation column with 5 mL 8 mol / L hydrochloric acid, rinse Ni and obtain a washing solution, the column loading and washing speed is 0.75 mL / min, and the effluent and washing solution are mixed to obtain a recovered pre-purified Ni solution. The recovered pre-purified Ni solution was passed through AGMP-1 resin (AGMP-1 is a Bio-Rad macroporous anion resin, 100-200 mesh), and 9.1 mL of effluent was collected, which was the recovered purified Ni solution. The content of Cu in the final recovered purified Ni solution was reduced to 0.08 mg / L, the content of Co was reduced to 19 μg / L, and the recovery rate of Ni was 95%.

[0048] Example 3

[0049] Prepare the nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Hydrochloric acid is added to adjust the acidity to 6 mol / L, and this is used as the simulated solution. The content of each metal element in the simulated solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L, and the content of Zn, Fe, and Mn elements (much less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5mL of the simulated solution, pass it through 5mL of TK201 resin (Triskem, resin particle size is 100-150 microns) for column separation to obtain effluent; then wash the separation column with 5mL 8mol / L hydrochloric acid, rinse Ni and obtain washing solution, the column loading and washing speed is 0.5mL / min, and the effluent and washing solution are mixed to obtain a recovered pre-purified Ni solution. The recovered pre-purified Ni solution was passed through AGMP-1 resin (AGMP-1 is a Bio-Rad macroporous anion resin, 100-200 mesh), and 8.4 mL of effluent was collected, which was the recovered purified Ni solution. The content of Cu in the final recovered purified Ni solution was reduced to 0.11 mg / L, the content of Co was reduced to 23 μg / L, and the recovery rate of Ni was 92%.

[0050] Comparative Example 1

[0051] Prepare the nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Hydrochloric acid is added to adjust the acidity to 6 mol / L, and this is used as the simulated solution. The content of each metal element in the simulated solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L, and the content of Zn, Fe, and Mn elements (much less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5mL of the simulated solution and pass it through a 1.5mL Cu resin column (Triskem, resin particle size is 100-150 microns) for column separation to obtain an effluent; the Cu resin will adsorb copper, and Ni and Co will flow out with the effluent. Then wash the column with 3.5mL 0.01mol / L hydrochloric acid to rinse the remaining Ni, and obtain a total of 4.8mL of effluent and washing liquid, which is the recovery pre-purified Ni solution. The content of Cu in the final recovered and purified Ni solution dropped to 0.3 mg / L, and the content of Co dropped to 0.1 mg / L, which were almost unchanged, and the recovery rate of Ni was 98%. The content of Cu and Co in the recovered and purified Ni solution was still high, and the removal rate of Cu and Co by the method of this comparative example was low.

[0052] Comparative Example 2

[0053] Prepare the nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Add hydrochloric acid to adjust the acidity to 6 mol / L, and use this as the simulated solution. The content of each metal element in the simulated solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The content of Zn, Fe, and Mn elements (much less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5 mL of the simulated solution and pass it through an anion column AG1-X8 (Bio-Rad commercially available resin, size 5.5 mL) with a resin column volume of 5.5 mL. Resin particle size is 200-400 mesh) for column separation to obtain effluent; anion column AG1-X8 will adsorb copper, and Ni and Co will flow out with the effluent. The column is then washed with 27.5mL 6mol / L hydrochloric acid, and the remaining Ni is rinsed to obtain washings, and a total of 32mL of effluent and washings are obtained, which is to recover the purified Ni solution. The content of Cu in the final recovered purified Ni solution is reduced to 0.07mg / L, and the content of Co is reduced to 0.01mg / L, and the recovery rate of Ni is 92%. The content of Cu and Co in the recovered purified Ni solution is still high, and the method of this comparative example has a low removal rate for Cu and Co.

[0054] Comparative Example 3

[0055] Prepare the nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Hydrochloric acid is added to adjust the acidity to 6 mol / L, and this is used as the simulated solution. The content of each metal element in the simulated solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L, and the content of Zn, Fe, and Mn elements (far less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5mL of the simulated solution, pass it through 1mL of TK201 resin (Triskem, resin particle size is 100-150 microns) for column separation to obtain effluent; the column loading speed is 1mL / min, and then wash the separation column with 5mL 6mol / L hydrochloric acid to rinse Ni and obtain washing liquid. The effluent and washing liquid are mixed to obtain 10mL of recovered and purified Ni solution. The content of Cu in the final recovered and purified Ni solution is reduced to 0.12mg / L, the content of Co is reduced to 24μg / L, and the recovery rate of Ni is 98%. The contents of Cu and Co in the recovered and purified Ni solution are still relatively high, and the removal rate of Cu and Co by the method of this comparative example is relatively low.

[0056] Comparative Example 4

[0057] Prepare the nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Hydrochloric acid is added to adjust the acidity to 6 mol / L, and this is used as the simulated dissolving solution. The content of each metal element in the simulated dissolving solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L, and the content of Zn, Fe, and Mn elements (far less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5mL of the simulated dissolving solution, pass it through 5mL of AGMP-1 resin (AGMP-1 is a macroporous anion resin, 100-200 mesh) for column separation to obtain the effluent, use 25mL of 6mol / L hydrochloric acid to wash the separation column to obtain the washing liquid, and obtain the effluent and washing liquid totaling 30mL, which is the recovered and purified Ni solution. The content of Cu in the final recovered and purified Ni solution is reduced to 0.04mg / L, the content of Co is reduced to 10μg / L, and the recovery rate of Ni is 97%. The contents of Cu and Co in the recovered and purified Ni solution are still relatively high, and the removal rate of Cu and Co by the method of this comparative example is relatively low.

[0058] Comparative Example 5

[0059] Prepare a nickel recovery solution after the irradiated nickel target is separated by anion resin. The metal elements are all stable elements. Hydrochloric acid is added to adjust the acidity to 6 mol / L, and this is used as a simulated dissolving solution. The content of each metal element in the simulated dissolving solution is: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L, and the content of Zn, Fe, and Mn elements (much less than 0.1 mg / L) is lower than that of Cu and Co, so Zn, Fe, and Mn elements are not considered. Take 5 mL of the simulated dissolving solution, pass it through 1 mL of TK201 resin (Triskem, resin particle size is 100-150 microns) for column separation to obtain a primary effluent; wherein the column loading speed is 1 mL / min, and then wash the separation column with 5 mL of 6 mol / L hydrochloric acid to rinse Ni to obtain a primary washing solution, and mix the effluent with the washing solution to obtain 10 mL of a primary recovery pre-purified Ni solution. The pre-purified Ni solution was recovered once and separated by column with 1 mL of TK201 resin (Triskem, with a resin particle size of 100-150 microns) to obtain a secondary effluent; wherein the column speed was 1 mL / min, and the separation column was washed with 5 mL of 6 mol / L hydrochloric acid, and Ni was rinsed clean to obtain a secondary washing liquid, and the secondary effluent was mixed with the secondary washing liquid to obtain 15.4 mL of recovered purified Ni solution. The content of Cu in the final recovered purified Ni solution was reduced to 0.07 mg / L, and the content of Co was reduced to 21 μg / L, and the recovery rate of Ni was 91%. The content of Cu and Co in the recovered purified Ni solution is still relatively high, and the removal rate of Cu and Co by the method of this comparative example is relatively low.

[0060] The calculation method of the recovery rate in the present invention is: the total mass of Ni ions in the recovery solution ÷ the total mass of Ni ions in the simulated solution × 100%.

[0061] The calculation method of the removal rate in the present invention is: (the total mass of impurity ions in the simulated solution-the total mass of impurity ions in the recovery solution) ÷ the total mass of Ni ions in the simulated solution × 100%.

[0062] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A method for recovering and purifying a nickel target material in the process of preparing Cu-64, characterized in that: The steps include: Adding an acid solution to the recovered nickel solution in the process of preparing Cu-64 to adjust the hydrogen ion concentration to 6-8 mol / L, thereby obtaining an acidic nickel solution; Using TK201 resin to perform a column separation on the acidic nickel solution to obtain an effluent; The effluent is subjected to secondary column separation using AGMP-1 resin to obtain a recovered purified nickel solution.

2. The method for recovering and purifying the nickel target in the process of preparing Cu-64 according to claim 1, characterized in that: The acid solution is hydrochloric acid; Alternatively, the volume ratio of the acidic nickel solution to the TK201 resin is 5:1 to 5, preferably 5:1 to 1.

2.

3. The method for recovering and purifying the nickel target in the process of preparing Cu-64 according to claim 1, characterized in that: The separation column after the primary column separation is washed with an acid solution having a hydrogen ion concentration of 6 to 8 mol / L, and the washing liquid is mixed with the effluent to perform secondary column separation.

4. The method for recovering and purifying a nickel target in the process of preparing Cu-64 according to claim 3, characterized in that: The ratio of the volume of the acid solution used for washing to the volume of the TK201 resin column is 1:1-5.

5. The method for recovering and purifying the nickel target in the process of preparing Cu-64 according to claim 1, characterized in that: During the primary column separation, the loading rate of the acidic nickel solution onto the column is 0.1 to 2 mL / min, preferably 0.5 to 1.0 mL / min.

6. The method for recovering and purifying the nickel target in the process of preparing Cu-64 according to claim 1, characterized in that: The particle size of TK201 resin is 100 to 150 microns.

7. The method for recovering and purifying a nickel target in the process of preparing Cu-64 according to claim 1, characterized in that: The mesh size of AGMP-1 resin is 100 to 200 mesh.

8. The method for recovering and purifying a nickel target in the process of preparing Cu-64 according to claim 1, characterized in that: After the primary column separation, the TK201 resin after the primary column separation or after washing with the 6-8 mol / L acid solution is eluted with an acid solution having a pH of 2-3.

9. A system for recovering and purifying nickel target materials in the process of preparing Cu-64, characterized in that: The recovery and purification method according to claim 1 comprises: A nickel solution acidity adjustment device is used to adjust the hydrogen ion concentration of the nickel solution recovered in the process of preparing Cu-64; A first separation column, filled with TK201 resin, for performing a primary column separation on the acidic nickel solution from the nickel solution acidity adjustment device; The second separation column is filled with AGMP-1 resin and is used for performing secondary column separation on the effluent from the first separation column.

10. The nickel target recovery and purification system in the process of preparing Cu-64 according to claim 9, characterized in that: It comprises an acid solution storage device and a mixing device. The acid solution storage device provides an acid solution to the first separation column after primary column separation to wash the TK201 resin in the first separation column. The washing liquid after washing enters the mixing device. The effluent after primary column separation enters the mixing device. The washing liquid and the effluent are mixed in the mixing device and then enter the second separation column for secondary column separation.