A recovery purification method of a nickel target material in a Cu-64 production process
By using a combined column separation method with TK201 and AGMP-1 resins, the problem of impurities in nickel targets was solved, enabling high-purity recovery of nickel and efficient preparation of Cu-64, thus improving the yield and purity of Cu-64.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- STATE POWER INVESTMENT NUCLIDES TONGCHUANG (CHONGQING) TECH CO LTD
- Filing Date
- 2024-11-21
- Publication Date
- 2026-05-08
AI Technical Summary
In the process of preparing Cu-64, the recovery of nickel targets in the existing technology results in a large number of impurities (Fe, Cu, Zn, Co, Au, etc.), which affect the yield and purity of the target. Moreover, the existing separation methods are difficult to effectively reduce the impurity content.
A combined column separation method using TK201 and AGMP-1 resins was adopted. By adjusting the acidity of the nickel solution to 6-8 mol/L, TK201 resin was first used for primary column separation, followed by AGMP-1 resin for secondary column separation. Combined with acid washing, nickel and impurities were separated and recovered.
It significantly reduced the content of impurities such as Cu and Co, improved the purity and recovery rate of nickel, and enhanced the production efficiency and purity of Cu-64.
Abstract
Description
Technical Field
[0001] This invention belongs to the field of medical isotope production technology, and relates to methods for the recovery and purification of target materials, specifically a method for the recovery and purification of nickel target materials in the process of preparing Cu-64. Background Technology
[0002] The information disclosed in this background section is intended only to enhance understanding of the overall background of the invention and is not necessarily to be construed as an admission or in any way implying that such information constitutes prior art known to those skilled in the art.
[0003] Cu-64 is an important medical radioactive isotope that can simultaneously emit beta-64. - (0.653 MeV, 17.4%) and β + With a half-life of 12.7 h and a concentration of 0.579 MeV (3.9%), Cu-64 can be used for both PET (positron emission tomography) diagnosis and treatment, and holds promise for integrated diagnostic and therapeutic research based on radionuclides. Due to ease of production and limitations in its half-life, Cu-64 is typically produced by irradiating Ni-64 with an accelerator, followed by separation using AG1-X8 to obtain Cu-64 that meets standard requirements. As a raw material for Cu-64 production, Ni-64 has a high market price and constitutes a significant portion of the production cost, necessitating recycling and reuse during the Cu-64 production process. The purity of the recycled Ni-64 directly affects the purity of the Cu-64 product. Reducing the impurity content of other radionuclides such as Fe, Cu, Zn, Co, and Au in Ni-64 can decrease the amount of impurities generated during irradiation, thereby improving the yield and purity of Cu-64.
[0004] Currently, separation methods for preparing the positron-emitting nuclide Cu-64 from nickel irradiated by accelerators include anion column separation and Cu resin separation. Anion column separation utilizes the fact that Cu, Co, and Ni form complexes with chloride ions to varying degrees under hydrochloric acid conditions. In the separation process, both Cu and Co can form complex anions in hydrochloric acid medium and be adsorbed onto anion exchange resins. Cu has a stronger complexing ability than Co, especially under 4 mol / L and 5 mol / L hydrochloric acid conditions, where the adsorption capacity of the anion exchange resin for Cu and Co differs significantly. Nickel, on the other hand, has almost no complexing ability for chloride ions and is not adsorbed by the resin, thus completing the separation of Cu from Co and Ni. The advantage of using ion exchange resins to separate Cu is that it allows for a certain degree of purification and recovery of usable Ni target material, although the purity is not high. Cu resin, as an extraction resin, has a specific adsorption capacity for copper under pH conditions of 2 to 5, but almost no adsorption for Co and Ni, thus better separating Cu from other elements. After obtaining the target product Cu, the remaining large amount of Ni in the solution, due to its high cost, can be reused as raw material for the next target production. However, due to different purification methods and efficiencies for Cu, Ni contains varying amounts of impurities. These impurities affect the purity of Ni after recovery, leading to excessive impurities generated during the next target production, thus hindering the separation and purification of copper. Summary of the Invention
[0005] To address the issue of numerous impurities (Fe, Cu, Zn, Co, Au, etc.) present in the recovered nickel target material during the Cu-64 preparation process, and to improve the yield and purity of Cu-64 preparation using recovered nickel targets, this invention aims to provide a method for recovering and purifying nickel targets during the Cu-64 preparation process. The recovery and purification method provided by this invention can significantly reduce impurities such as Cu and Co, greatly improve the purity of nickel in the recovered nickel target material, and achieve a high nickel recovery rate.
[0006] To achieve the above objectives, the technical solution of the present invention is as follows:
[0007] In a first aspect, a method for recovering and purifying nickel target material during the preparation of Cu-64 includes the following steps:
[0008] An acid solution was added to the recovered nickel solution from the Cu-64 preparation process to adjust the hydrogen ion concentration to 6-8 mol / L, thus obtaining an acidic nickel solution.
[0009] The acidic nickel solution was subjected to a single column separation using TK201 resin to obtain the eluent;
[0010] The effluent was subjected to secondary column separation using AGMP-1 resin to obtain a recovered and purified nickel solution.
[0011] The extractant supported on TK201 resin is a tertiary amine. Tertiary amines can bind hydrogen ions, and the degree to which tertiary amines bind hydrogen ions varies under different hydrogen ion concentrations (i.e., acidity). This invention first adjusts the acidity of the recovered nickel solution. Studies have shown that at an acidity of 6–8 mol / L, the partition coefficient of TK201 resin for elements such as Cu, Zn, and Co is 30–150, while the partition coefficient for nickel is only 3–5. Therefore, this invention first adjusts the hydrogen ion concentration of the recovered nickel solution to 6–8 mol / L, and then uses TK201 resin for column separation to pre-separate Ni from impurities such as Cu, Zn, and Co in the recovered nickel solution. However, even after column separation with TK201 resin alone, the content of impurities such as Cu and Co is still relatively high. Therefore, this invention uses AGMP-1 macroporous anion exchange resin for further column separation, adsorbing impurities such as Cu and Co onto the ion column, which can significantly reduce the content of impurities such as Cu and Co and greatly improve the purity of nickel in the recovered nickel target.
[0012] This invention achieves high nickel recovery rates through the aforementioned technical solution. To further improve the nickel recovery rate, the separation column after primary column separation is washed with an acid solution of 6–8 mol / L hydrogen ion concentration. The washing solution is then mixed with the effluent for secondary column separation. Although the partition coefficient of TK201 resin for nickel is relatively low under acidity conditions of 6–8 mol / L, it can still adsorb a small amount of nickel. To recover this portion of nickel, this invention further washes with an acid solution of 6–8 mol / L, thereby improving the nickel recovery rate. Although the washing solution may contain small amounts of impurities such as Cu, Zn, and Co, their content is low, and the subsequent secondary column separation using AGMP-1 resin avoids an increase in the content of impurities such as Cu, Zn, and Co in the purified nickel solution.
[0013] To achieve the reuse of TK201 resin, this invention elutes the TK201 resin after the first column separation using an acid solution with a pH of 2-3 or after washing with an acid solution of 6-8 mol / L.
[0014] On the other hand, a system for recovering and purifying nickel targets used in the preparation of Cu-64, for implementing the above-mentioned recovery and purification method, includes:
[0015] A nickel recovery solution acidity adjustment device is used to adjust the hydrogen ion concentration of the nickel recovery solution in the process of preparing Cu-64;
[0016] The first separation column, filled with TK201 resin, is used for primary column separation of acidic nickel solution from the nickel recovery solution acidity adjustment device.
[0017] The second separation column, filled with AGMP-1 resin, is used for secondary column separation of the effluent from the first separation column.
[0018] The beneficial effects of this invention are as follows:
[0019] This invention adjusts the acidity of the nickel recovery solution to 6–8 mol / L. Under this acidity condition, the partition coefficients of TK201 resin differ for each metal ion, enabling pre-separation of nickel from other impurity metal ions. Then, further column separation using AGMP-1 resin further adsorbs Cu, Co, Zn, and other impurity ions onto the ion column, resulting in a higher-purity recovered nickel solution. Compared to nickel recovery using Cu resin, TK221 resin, and TK201 resin, the method provided by this invention yields a recovered nickel solution with lower impurity content and a higher recovery rate. Detailed Implementation
[0020] It should be noted that the following detailed descriptions are exemplary and intended to provide further illustration of the invention. Unless otherwise specified, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains.
[0021] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of exemplary embodiments according to the invention. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.
[0022] Given that the nickel target material recovered during the Cu-64 preparation process contains a large number of impurities (Fe, Cu, Zn, Co, Au, etc.), which affect the yield and nuclear purity of Cu-64 preparation, this invention proposes a method for recovering and purifying nickel target material during the Cu-64 preparation process.
[0023] A typical embodiment of the present invention provides a method for recovering and purifying nickel targets during the preparation of Cu-64, comprising the following steps:
[0024] An acid solution was added to the recovered nickel solution from the Cu-64 preparation process to adjust the hydrogen ion concentration to 6-8 mol / L, thus obtaining an acidic nickel solution.
[0025] The acidic nickel solution was subjected to a single column separation using TK201 resin to obtain the eluent;
[0026] The effluent was subjected to secondary column separation using AGMP-1 resin to obtain a recovered and purified nickel solution.
[0027] Before column separation, the packing resin is typically soaked in a solution of appropriate acidity before being filled into the separation column; alternatively, after filling the separation column, a suitable solution is added to ensure the packing resin is completely wetted by the solution of the appropriate acidity. In this embodiment of the invention, before column separation, after filling the separation column with packing resin (TK201 resin, AGMP-1 resin, etc.), the packing resin inside the separation column is completely wetted with hydrochloric acid with an acidity of 6–8 mol / L, and then column separation is performed.
[0028] This invention utilizes column separation and coordination of TK201 resin and AGMP-1 resin to significantly reduce impurities such as Cu and Co, thereby greatly improving the nickel purity in recovered nickel targets.
[0029] The acid solution described in this invention can be hydrochloric acid, sulfuric acid, nitric acid, etc. In some embodiments, the acid solution is hydrochloric acid. Hydrochloric acid contains chloride ions, which can synergistically complex metal ions with the resin, thereby achieving high-efficiency adsorption of impurity metal ions.
[0030] In some embodiments, the volume ratio of acidic nickel solution to TK201 resin is 5:1 to 5. Under this condition, the removal of impurity metal ions is better, and the recovery rate of Ni is guaranteed. When the volume ratio of acidic nickel solution to TK201 resin is 5:1 to 1.2, the removal of impurity metal ions is even better, and the recovery rate of Ni is higher.
[0031] In some embodiments, the separation column after primary column separation is washed with an acid solution having a hydrogen ion concentration of 6–8 mol / L. The washing solution is then mixed with the effluent for secondary column separation. Washing with the 6–8 mol / L acid solution allows for the recovery of small amounts of nickel adsorbed on the TK201 resin, thereby improving the nickel recovery rate.
[0032] In one or more embodiments, the volume ratio of the acid solution used for washing to the TK201 resin column is 1:1 to 5. This condition results in better nickel recovery.
[0033] In some embodiments, during primary column separation, the loading rate of the acidic nickel solution onto the column is 0.1–2 mL / min, preferably 0.5–1.0 mL / min.
[0034] In some embodiments, the particle size of TK201 resin is 100–150 micrometers. Studies have shown that the separation effect is better under these conditions.
[0035] In some embodiments, the AGMP-1 resin has a mesh size of 100 to 200 mesh. Studies have shown that the separation effect is better under these conditions.
[0036] In some embodiments, after primary column separation, the TK201 resin, after washing with an acid solution of pH 2-3 or 6-8 mol / L, is eluted. This enables the reuse of TK201 resin and reduces recycling costs.
[0037] A second embodiment of the present invention provides a system for recovering and purifying nickel targets used in the preparation of Cu-64, for implementing the above-mentioned recovery and purification method, comprising:
[0038] A nickel recovery solution acidity adjustment device is used to adjust the hydrogen ion concentration of the nickel recovery solution in the process of preparing Cu-64;
[0039] The first separation column, filled with TK201 resin, is used for primary column separation of acidic nickel solution from the nickel recovery solution acidity adjustment device.
[0040] The second separation column, filled with AGMP-1 resin, is used for secondary column separation of the effluent from the first separation column.
[0041] In some embodiments, an acid storage device and a mixing device are included. The acid storage device provides an acid solution to a first separation column after primary column separation to wash the TK201 resin in the first separation column. The washing liquid after washing enters the mixing device, and the effluent after primary column separation enters the mixing device. The washing liquid and the effluent are mixed in the mixing device and then enter a second separation column for secondary column separation.
[0042] In some embodiments, a nickel recovery and purification solution collection device is included for collecting the nickel recovery and purification solution after secondary column separation in a second separation column.
[0043] To enable those skilled in the art to better understand the technical solution of the present invention, the technical solution of the present invention will be described in detail below with reference to specific embodiments and comparative examples.
[0044] Example 1
[0045] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were not considered as they were much lower than those of Cu and Co. 5 mL of the simulated solution was passed through a 1 mL column of TK201 resin (Triskem, with a particle size of 100-150 μm) to obtain the effluent. The column was then washed with 5 mL of 6 mol / L hydrochloric acid to remove Ni, yielding a washing solution. The loading and washing rate was 1.0 mL / min. The effluent and washing solution were mixed to obtain a pre-purified Ni recovery solution. The pre-purified Ni solution was passed through 5 mL of AGMP-1 resin (AGMP-1 is a Bio-Rad macroporous anion exchange resin, 100-200 mesh), and 9.3 mL of effluent was collected, which was the purified Ni solution. The final purified Ni solution showed a Cu content reduced to 0.05 mg / L and a Co content reduced to 5 μg / L, with a Ni recovery rate of 98%.
[0046] Example 2
[0047] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were not considered as they were much lower than those of Cu and Co. 5 mL of the simulated solution was passed through a 3 mL column of TK201 resin (Triskem, with a particle size of 100-150 μm) to obtain the effluent. The column was then washed with 5 mL of 8 mol / L hydrochloric acid to remove Ni, yielding a washing solution. The loading and washing rate was 0.75 mL / min. The effluent and washing solution were mixed to obtain a pre-purified Ni recovery solution. The pre-purified Ni solution was passed through AGMP-1 resin (AGMP-1 is a Bio-Rad macroporous anion exchange resin, 100-200 mesh), and 9.1 mL of effluent was collected, which was the purified Ni solution. The final purified Ni solution showed a Cu content reduced to 0.08 mg / L and a Co content reduced to 19 μg / L, with a Ni recovery rate of 95%.
[0048] Example 3
[0049] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were not considered compared to Cu and Co. 5 mL of the simulated solution was passed through a 5 mL column of TK201 resin (Triskem, with a particle size of 100-150 μm) to obtain the effluent. The column was then washed with 5 mL of 8 mol / L hydrochloric acid to remove Ni, yielding a washing solution. The loading and washing rate was 0.5 mL / min. The effluent and washing solution were mixed to obtain a pre-purified Ni recovery solution. The pre-purified Ni solution was passed through AGMP-1 resin (AGMP-1 is a Bio-Rad macroporous anion exchange resin, 100-200 mesh), and 8.4 mL of effluent was collected, which was the purified Ni solution. The final purified Ni solution showed a Cu content reduced to 0.11 mg / L and a Co content reduced to 23 μg / L, with a Ni recovery rate of 92%.
[0050] Comparative Example 1
[0051] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were not considered as they were much lower than those of Cu and Co. 5 mL of the simulated solution was passed through a 1.5 mL Cu resin column (Triskem, resin particle size 100-150 μm) for column separation to obtain the effluent. The Cu resin adsorbed copper, while Ni and Co flowed out with the effluent. The column was then washed with 3.5 mL of 0.01 mol / L hydrochloric acid to wash away the remaining Ni, resulting in a total of 4.8 mL of effluent and washings, which constituted the pre-purified Ni recovery solution. The final purified Ni solution showed that the Cu content decreased to 0.3 mg / L and the Co content decreased to 0.1 mg / L, remaining almost unchanged, with a Ni recovery rate of 98%. However, the Cu and Co contents in the purified Ni solution remained relatively high, and the method in this comparative example showed low removal rates for Cu and Co.
[0052] Comparative Example 2
[0053] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were lower than those of Cu and Co, therefore Zn, Fe, and Mn were not considered. 5 mL of the simulated solution was passed through a 5.5 mL anion exchange column AG1-X8 (Bio-Rad commercially available resin, size [not specified]). Column separation was performed using resin with a particle size of 200-400 mesh to obtain the effluent. An anion exchange column AG1-X8 adsorbed copper, while Ni and Co eluted with the effluent. The column was then washed with 27.5 mL of 6 mol / L hydrochloric acid to remove the remaining Ni, yielding a washing solution. The total volume of effluent and washing solution (32 mL) constituted the purified Ni solution. The final purified Ni solution showed a Cu concentration reduced to 0.07 mg / L and a Co concentration reduced to 0.01 mg / L, with a Ni recovery rate of 92%. However, the Cu and Co concentrations in this purified Ni solution remained relatively high, and the method used in this comparative example showed a low removal rate for Cu and Co.
[0054] Comparative Example 3
[0055] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were not considered as they were much lower than Cu and Co. 5 mL of the simulated solution was passed through a 1 mL column of TK201 resin (Triskem, with a particle size of 100-150 μm) to obtain the effluent. The column loading rate was 1 mL / min. The column was then washed with 5 mL of 6 mol / L hydrochloric acid to remove Ni, yielding a washing solution. The effluent and washing solution were mixed to obtain 10 mL of purified Ni recovery solution. The final purified Ni solution showed a Cu concentration reduced to 0.12 mg / L and a Co concentration reduced to 24 μg / L, with a Ni recovery rate of 98%. The recovered and purified Ni solution still contained high levels of Cu and Co, and the method in this comparative example showed low removal rates of Cu and Co.
[0056] Comparative Example 4
[0057] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were not considered as they were much lower than Cu and Co. 5 mL of the simulated solution was passed through a 5 mL column of AGMP-1 resin (AGMP-1 is a macroporous anion exchange resin, 100-200 mesh) to obtain the effluent. The column was washed with 25 mL of 6 mol / L hydrochloric acid to obtain the washing solution. The total volume of effluent and washing solution (30 mL) was the purified Ni recovery solution. The final purified Ni solution showed a Cu concentration reduced to 0.04 mg / L and a Co concentration reduced to 10 μg / L, with a Ni recovery rate of 97%. The recovered and purified Ni solution still contained high levels of Cu and Co, and the method in this comparative example showed low removal rates of Cu and Co.
[0058] Comparative Example 5
[0059] A nickel recovery solution was prepared after separation from an irradiated nickel target using anion exchange resin. All metal elements were stable. Hydrochloric acid was added to adjust the acidity to 6 mol / L, and this solution was used as a simulated solution. The concentrations of each metal element in the simulated solution were: Ni 20 g / L, Cu 1 mg / L, Co 0.1 mg / L. The concentrations of Zn, Fe, and Mn (much lower than 0.1 mg / L) were not considered as they were much lower than those of Cu and Co. 5 mL of the simulated solution was passed through a 1 mL column of TK201 resin (Triskem, with a particle size of 100-150 μm) to obtain the primary effluent. The column loading rate was 1 mL / min. The column was then washed with 5 mL of 6 mol / L hydrochloric acid to remove Ni, yielding a primary washing solution. The effluent and washing solution were mixed to obtain 10 mL of a pre-purified Ni recovery solution. The pre-purified Ni solution was subjected to column separation using 1 mL of TK201 resin (Triskem, with a particle size of 100-150 μm) to obtain a secondary effluent. The column loading rate was 1 mL / min. The column was then washed with 5 mL of 6 mol / L hydrochloric acid to remove Ni, yielding a secondary wash solution. The secondary effluent and wash solution were mixed to obtain 15.4 mL of purified Ni solution. The final purified Ni solution showed a reduction in Cu content to 0.07 mg / L and Co content to 21 μg / L, with a Ni recovery rate of 91%. However, the Cu and Co content in this purified Ni solution remained relatively high, and the method used in this comparative example showed a low removal rate for Cu and Co.
[0060] The recovery rate in this invention is calculated as follows: total mass of Ni ions in the recovered solution ÷ total mass of Ni ions in the simulated solution × 100%.
[0061] The removal rate in this invention is calculated as follows: (total mass of impurity ions in the simulated solution - total mass of impurity ions in the recovered solution) ÷ total mass of Ni ions in the simulated solution × 100%.
[0062] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.
Claims
1. A method for recovering and purifying nickel target material during the preparation of Cu-64, characterized in that, Includes the following steps: An acid solution was added to the recovered nickel solution from the Cu-64 preparation process to adjust the hydrogen ion concentration to 6-8 mol / L, thus obtaining an acidic nickel solution. The acidic nickel solution was subjected to a single column separation using TK201 resin to obtain the eluent; The effluent was subjected to secondary column separation using AGMP-1 resin to obtain a recovered and purified nickel solution.
2. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, The acid solution is hydrochloric acid; Alternatively, the volume ratio of acidic nickel solution to TK201 resin is 5:1~5.
3. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, The volume ratio of acidic nickel solution to TK201 resin is 5:1~1.
2.
4. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, The separation column after primary column separation was washed with an acid solution with a hydrogen ion concentration of 6-8 mol / L. The washing solution was then mixed with the effluent for secondary column separation.
5. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 4, characterized in that, The ratio of the volume of the acid solution used for washing to the volume of the TK201 resin column is 1:1~5.
6. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, During single-column separation, the loading rate of the acidic nickel solution onto the column is 0.1~2 mL / min.
7. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, During single-column separation, the loading rate of the acidic nickel solution onto the column is 0.5~1.0 mL / min.
8. The method for recovering and purifying nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, The particle size of TK201 resin is 100~150 micrometers.
9. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, The mesh size of AGMP-1 resin is 100~200 mesh.
10. The method for recovering and purifying the nickel target material during the preparation of Cu-64 as described in claim 1, characterized in that, After the first column separation, the TK201 resin, which had been washed with an acid solution of pH 2-3 or 6-8 mol / L acid solution after the first column separation, was eluted.
11. A system for recovering and purifying nickel targets used in the preparation of Cu-64, characterized in that, To implement the recovery and purification method of claim 1, the method comprises: A nickel recovery solution acidity adjustment device is used to adjust the hydrogen ion concentration of the nickel recovery solution in the process of preparing Cu-64; The first separation column, filled with TK201 resin, is used for primary column separation of acidic nickel solution from the nickel recovery solution acidity adjustment device. The second separation column, filled with AGMP-1 resin, is used for secondary column separation of the effluent from the first separation column.
12. The nickel target recovery and purification system for the preparation of Cu-64 as described in claim 11, characterized in that, The system includes an acid storage device and a mixing device. After primary column separation, the acid storage device provides an acid solution to the first separation column to wash the TK201 resin in the first separation column. The washing liquid after washing enters the mixing device, and the effluent after primary column separation enters the mixing device. The washing liquid and the effluent are mixed in the mixing device and then enter the second separation column for secondary column separation.
Citation Information
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