Control method for measuring transverse profile and emittance of beam and beam diagnosis system

Abstract

The invention relates to the technical field of heavy ion accelerator beam diagnosis, in particular to a control method for measuring the transverse profile and the emittance of a beam and a beam diagnosis system. The control method comprises the following steps: S1, setting a measurement direction and a scanning range and speed of a measurement probe in a measurement process; s2, sending a measurement starting instruction to the programmable logic controller and the data acquisition electronics; s3, acquiring position data of the measuring probe returned by the programmable logic controller; receiving an acquisition ending signal of the data acquisition electronics, and storing the beam current intensity data into a corresponding current intensity data structure; and S4, according to the probe position data and the beam current intensity data, obtaining the measurement results of the beam current transverse profile and the beam current transverse emittance. According to the invention, the beam transverse profile and the beam transverse emittance can be rapidly and accurately measured by using the probe position data and the beam intensity data, so that beam matching transportation is improved, beam transmission efficiency is improved, and the accelerator beam debugging process is accelerated.

Description

Technical Field

[0001] The invention relates to the technical field of heavy ion accelerator beam diagnosis, and in particular to a control method for measuring beam transverse profile and emittance and a beam diagnosis system. Background Art

[0002] The beam diagnostic system is one of the most important systems in the heavy ion accelerator. The beam diagnostic system, often compared to the "eyes" of the accelerator, can help physicists to effectively debug the accelerator. The beam diagnostic content includes the measurement and monitoring of various parameters such as beam energy, current intensity, emittance, etc., which can ensure the parameter matching and stable operation of the beam in each section before and after the accelerator. Among them, the beam transverse profile and beam transverse emittance are key parameters affecting the beam quality. The beam transverse emittance refers to the degree of dispersion of charged particles in the beam in the transverse phase space. The increase in the beam transverse emittance and the resulting beam loss are crucial factors affecting the operation of the accelerator.

[0003] However, there is currently a lack of methods that can quickly and accurately measure the beam transverse profile and beam transverse emittance, which makes the process of physics personnel operating the accelerator to debug the beam parameters relatively slow. In view of this, there is an urgent need for a control method that can assist physics personnel operating the accelerator to debug the beam parameters and speed up the accelerator beam debugging process. Summary of the invention

[0004] The present invention aims to solve at least one of the technical problems existing in the related art. To this end, the present invention proposes a control method for measuring beam transverse profile and emittance and a beam diagnostic system to achieve the purpose of assisting personnel operating an accelerator to debug beam parameters and speed up the accelerator beam debugging process.

[0005] In a first aspect, the present invention provides a control method for measuring a beam transverse profile and emittance, the control method comprising: S1. Set the measurement direction, and set the scanning range and speed of the measurement probe during the measurement process; S2, sending a start measurement instruction to the programmable logic controller and data acquisition electronics; S3, obtaining the measurement probe position data sent back by the programmable logic controller; Upon receiving a signal from the data acquisition electronics to complete the acquisition, the beam current intensity data is stored in a corresponding current intensity data structure; S4. According to the measurement probe position data and beam current intensity data, the measurement results of the beam transverse profile and the beam transverse emittance are obtained.

[0006] According to a control method for measuring beam transverse profile and emittance provided by the present invention, after sending a start measurement instruction to a programmable logic controller and data acquisition electronics, the method further comprises: S21, judging whether the intercepting probe interferes with the movement of the measuring probe, and when the judgment result is no, controlling the execution of the start measurement instruction.

[0007] According to a control method for measuring beam transverse profile and emittance provided by the present invention, after obtaining the measurement probe position data returned by the programmable logic controller, the method further includes: According to all the probe position data returned by the programmable logic controller, the position information of the measuring probe is extracted and stored in the corresponding position data structure.

[0008] According to a control method for measuring beam transverse profile and emittance provided by the present invention, the measuring direction includes two directions: horizontal and vertical.

[0009] According to a control method for measuring beam transverse profile and emittance provided by the present invention, the setting of the scanning range and speed of the measuring probe during the measurement process includes: When measuring the beam transverse profile, set the scanning range and speed of the profile measurement probe; When measuring the beam lateral emittance, the scanning range and step length of the first emittance measurement probe are set, and the scanning range and speed of the second emittance measurement probe are set.

[0010] According to a control method for measuring beam transverse profile and emittance provided by the present invention, the scanning range of the measuring probe is set accordingly according to the inner diameter of the vacuum pipe and the motor limit of the measuring probe.

[0011] According to a control method for measuring beam transverse profile and emittance provided by the present invention, the step of determining whether the intercepting probe interferes with the motion of the measuring probe comprises: When measuring the beam transverse profile, if the motion of the interception probe interferometer profile measurement probe is detected, the start measurement instruction is re-executed; When measuring the beam lateral emittance, if it is detected that the interception probe interferes with the movement of the first emittance measurement probe and the second emittance measurement probe, the execution of the start measurement instruction is terminated.

[0012] According to a control method for measuring beam transverse profile and emittance provided by the present invention, during the process of measuring beam transverse emittance, the measurement process can be interrupted at any time and restored to the measurement start state.

[0013] According to a control method for measuring a beam transverse profile and an emittance provided by the present invention, the measurement results of the beam transverse profile and the beam transverse emittance are obtained, including: The angle value is calculated according to the position data of the first emittance measurement probe and the second emittance measurement probe and the distance therebetween, and the beam lateral emittance is then calculated according to the angle value, the position data of the first emittance measurement probe and the beam current intensity data.

[0014] In a second aspect, the present invention further provides a beam diagnostic system, which adopts any of the above control methods for measuring beam transverse profile and emittance; The beam diagnostic system includes: Motion control module for remote control of programmable logic controllers; A data acquisition module, used for information interaction with data acquisition electronics; The data processing module is used to receive and analyze the data packet of the measuring probe position transmitted by the programmable logic controller.

[0015] The above one or more technical solutions in the present invention have at least one of the following technical effects: By acquiring the probe position data and beam current intensity data, the beam transverse profile and beam transverse emittance can be quickly and accurately measured, thereby improving beam matching and transportation, increasing beam transmission efficiency, and accelerating the accelerator beam debugging process.

[0016] In addition to the technical problems solved by the present invention, the technical features of the technical solutions constituted, and the advantages brought about by the technical features of these technical solutions described above, other technical features of the present invention and the advantages brought about by these technical features will be further explained in conjunction with the accompanying drawings or will be understood through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0018] Figure 1 A schematic flow chart of a control method for measuring beam transverse profile and emittance provided in an embodiment of the present invention.

[0019] Figure 2 A schematic diagram of a control method for measuring a beam transverse profile provided by an embodiment of the present invention.

[0020] Figure 3 A schematic diagram of a control method for measuring beam lateral emittance provided by an embodiment of the present invention.

[0021] Figure 4A flowchart of offline data analysis of beam lateral emittance measurement results provided in an embodiment of the present invention.

[0022] Figure 5 A flow chart of a computer receiving PLC feedback data provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0023] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be clearly described below in conjunction with the drawings of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0024] In the description of the embodiments of the present invention, it should be noted that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the embodiments of the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limitations on the embodiments of the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0025] In the description of the embodiments of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the embodiments of the present invention can be understood according to specific circumstances.

[0026] In the embodiments of the present invention, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0027] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the embodiment of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0028] In the present invention, PLC is the abbreviation of Programmable Logic Controller, which is a digital computing and operating electronic system.

[0029] Data acquisition electronics refers to the hardware equipment that collects beam signals during the measurement of beam transverse profile and transverse emittance. Data acquisition electronics are usually used to capture analog or digital signals and convert this information into data form that can be processed by computers.

[0030] In order to assist the physics personnel operating the accelerator to debug the beam parameters and speed up the accelerator beam debugging process, in an embodiment of the present invention, a control method for measuring the beam transverse profile and emittance is introduced.

[0031] like Figure 1 As shown, the main steps of the control method include: S1, setting the measurement direction, setting the scanning range and speed of the measurement probe during the measurement process. S2, sending a start measurement instruction to the programmable logic controller and the data acquisition electronics. S3, obtaining the measurement probe position data sent back by the programmable logic controller, receiving the acquisition end signal from the data acquisition electronics, and storing the beam current intensity data in the corresponding current intensity data structure. S4, according to the probe position data and the beam current intensity data, obtaining the measurement results of the beam transverse profile and the beam transverse emittance.

[0032] Furthermore, after sending the start measurement instruction to the programmable logic controller and the data acquisition electronics, the method further includes: S21, judging whether the intercepting probe interferes with the movement of the measurement probe, and when the judgment result is no, controlling the execution of the start measurement instruction.

[0033] Furthermore, after obtaining the measuring probe position data returned by the programmable logic controller, the method further includes: extracting the position information of the measuring probe according to all the probe position data returned by the programmable logic controller, and storing the position information in a corresponding position data structure.

[0034] The measuring direction includes two directions: horizontal and vertical.

[0035] In this embodiment, by acquiring the measurement probe position data and beam current intensity data, the beam transverse profile and beam transverse emittance can be quickly and accurately measured, thereby improving beam matching and transportation, increasing beam transmission efficiency, and accelerating the accelerator beam debugging process.

[0036] According to a control method for measuring beam transverse profile and emittance provided by the present invention, the setting of the scanning range and speed of the measuring probe during the measurement process includes: when measuring the beam transverse profile, setting the scanning range and speed of the profile measuring probe. When measuring the beam transverse emittance, setting the scanning range and step size of the first emittance measuring probe, and setting the scanning range and speed of the second emittance measuring probe.

[0037] Furthermore, the scanning range of the measuring probe is set accordingly according to the inner diameter of the vacuum pipe and the motor limit of the measuring probe.

[0038] Furthermore, the determination of whether the interception probe interferes with the movement of the measurement probe includes: when measuring the transverse profile of the beam, if it is detected that the interception probe interferes with the movement of the profile measurement probe, then re-executing the start measurement instruction; when measuring the transverse emittance of the beam, if it is detected that the interception probe interferes with the movement of the first emittance measurement probe and the second emittance measurement probe, then terminating the execution of the start measurement instruction.

[0039] In addition, during the measurement of beam lateral emittance, the measurement process can be interrupted at any time and restored to the measurement start state.

[0040] Furthermore, the measurement results of obtaining the beam transverse profile and the beam transverse emittance include: calculating the angle value based on the position data of the first emittance measurement probe and the second emittance measurement probe and the distance between the two, and then obtaining the beam transverse emittance based on the angle value, the position data of the first emittance measurement probe and the beam current intensity data.

[0041] Specifically, there are some subtle differences between the control methods of measuring the beam transverse profile and the beam transverse emittance. Therefore, the control methods of measuring the beam transverse profile and the beam transverse emittance are respectively introduced in detail below.

[0042] like Figure 2 As shown in the figure, the measurement direction of the beam transverse profile is input into the computer. The measurement direction of the beam transverse profile is divided into horizontal measurement and vertical measurement.

[0043] Input the scanning range and speed of the profile measurement probe into the computer. After confirming that they are correct, input the start measurement command into the computer. The computer sends the measurement command about the beam transverse profile to the PLC and data acquisition electronics, and waits for the PLC and data acquisition electronics to finish collecting data.

[0044] If the computer detects motion of another intercept probe interferometer profiling probe, the start measurement command is not allowed to be executed.

[0045] The computer receives the probe position data sent back by the PLC, extracts the position information of the measuring probe, and stores the position information in a corresponding position data structure.

[0046] The computer receives the acquisition end signal from the data acquisition electronics and stores the beam current intensity data into the corresponding current intensity data structure.

[0047] Finally, the computer will calculate the measurement results of the beam cross-section based on the probe position data and the beam current intensity data. In particular, the measurement results of the beam cross-section can be intuitively displayed on the graphical human-computer interaction interface. At the same time, the measurement results of the beam cross-section can be saved so that the physicists operating the accelerator can perform offline analysis.

[0048] like Figure 3 As shown in the figure, the control method for measuring the lateral emittance of the beam is introduced in detail as follows: Input the measurement direction of beam transverse emittance into the computer. The measurement direction of beam transverse emittance is divided into horizontal measurement and vertical measurement.

[0049] Input the scanning range and step length of the first emittance measurement probe into the computer. Input the scanning range and speed of the second emittance measurement probe into the computer. The scanning range of the first emittance measurement probe is set according to the inner diameter of the vacuum pipe where the first emittance measurement probe is located and the motor limit of the first emittance measurement probe. The step length of the first emittance measurement probe determines the number of times the first emittance measurement probe moves within the scanning range. The scanning range of the second emittance measurement probe is set according to the inner diameter of the vacuum pipe where the second emittance measurement probe is located and the motor limit of the second emittance measurement probe. The speed of the second emittance measurement probe determines the speed at which the second emittance measurement probe moves within the scanning range.

[0050] Input the start measurement instruction to the computer, the computer sends the measurement command about the beam lateral emittance to the PLC and data acquisition electronics, and waits for the PLC and data acquisition electronics to finish collecting data.

[0051] In particular, if the computer detects that other intercepting probes interfere with the movement of the first emittance measurement probe and the second emittance measurement probe, the start measurement instruction is not allowed to be executed. In addition, when measuring the beam lateral emittance, the measurement process can be interrupted at any time and restored to the measurement start state.

[0052] The computer receives the probe position data sent back by the PLC, extracts the position information of the first emittance measurement probe and the second emittance measurement probe, and stores the position information into a corresponding position data structure.

[0053] The computer receives the acquisition end signal from the data acquisition electronics and stores the beam current intensity data into the corresponding current intensity data structure.

[0054] Finally, the computer calculates the angle value based on the position data of the first emittance measurement probe and the second emittance measurement probe and the distance between the two probes. The computer then calculates the measurement result of the beam transverse emittance based on the angle value, the position data of the first emittance measurement probe and the beam current intensity data.

[0055] At the same time, the measurement results of beam transverse emittance can be intuitively displayed on the graphical human-computer interface. The measurement results of beam transverse emittance can also be stored locally, which is convenient for physics personnel operating the accelerator to perform offline analysis. The measurement results of beam transverse emittance are restored using twist parameters to perform secondary verification of the measurement results of beam transverse emittance, further ensuring the accuracy and reliability of the measurement results of beam transverse emittance.

[0056] like Figure 4 As shown, the method for the computer to automatically perform offline analysis on the stored beam transverse emittance measurement results is as follows: receiving the beam transverse emittance measurement result data file storage path input by the user. The beam transverse emittance measurement result data file content is divided into 3 columns, the first column of data is the first emittance measurement probe position data, the second column of data is the second emittance measurement probe position data, and the third column of data is the beam current intensity data at the corresponding probe position.

[0057] Upload the measurement results of the beam transverse emittance to the computer and store the data in the corresponding calculation data structure. Receive the measurement background data entered by the user, and the default measurement background data value is 0. The computer uses the twist parameter calculation results and combines the emittance ellipse calculation formula: ; Among them, β, α and γ are Twiss parameters, also known as Courant-Snyder parameters, which are used to describe the beam characteristics in particle accelerators; A represents the area of ​​the ellipse.

[0058] Draw the emittance ellipse to perform secondary verification on the measurement results of the beam lateral emittance.

[0059] like Figure 5 As shown, the method for the computer to receive the data returned by the PLC is: Wait for PLC connection and determine the PLC connection status. If PLC is connected, determine whether the length of the data received by the computer is greater than 0.

[0060] If the length of the data received by the computer is greater than 0, it is determined whether the received data contains an end marker. If the received data contains an end marker, the computer stops receiving data and executes the data parsing command.

[0061] The computer executes the data analysis command and calculates the total number of points collected in the current experiment according to the user's instruction type.

[0062] Among them, the computer executes the data analysis command including: determining whether it is a measurement instruction about the beam transverse profile, and if so, calculating the total number of points corresponding to the beam transverse profile; if not, determining whether it is a measurement instruction about the beam transverse emittance, and if so, calculating the total number of points corresponding to the beam transverse emittance.

[0063] Specifically, if the current execution is a measurement instruction about the beam transverse profile, the total number of points collected in the current experiment is the number of points collected by the second emittance measurement probe in one scan. If the current execution is an emittance measurement instruction, the total number of points collected in the current experiment is the product of the number of points collected by the second emittance measurement probe in one scan and the number of steps moved by the first emittance measurement probe. Based on the total number of points collected in the current experiment, the computer extracts the position data of the corresponding probe in the PLC return data, stores it in the corresponding data structure, and finally generates the probe position information data.

[0064] For example, if the current instruction is about the beam transverse profile measurement, the probe position data is extracted and stored in the profile data structure. If the current instruction is about the beam transverse emittance measurement, the probe position data is extracted and stored in the emittance data structure.

[0065] The step of calculating the measurement result of beam lateral emittance includes: calculating the angle matrix X' according to the position matrix X of the first emittance measurement probe, the position matrix Y of the second emittance measurement probe and the distance L between the first emittance measurement probe and the second emittance measurement probe.

[0066] The angle matrix X' is calculated as follows: X'=(YX) / L (1) Specifically, emittance refers to the area occupied by charged particles in the beam in the two-dimensional phase space with the horizontal coordinate position and the vertical coordinate angle, which characterizes the lateral size and forward angle information of the beam. The emittance is usually represented by ε, and the root mean square emittance can be further calculated according to the following formula: (2) in, Calculated by the square and weighted method of X, It is calculated by the square and weighted method of X' to make the calculation result as accurate as possible.

[0067] Specifically, the square sum weighted method is a method commonly used in mathematics, statistics, and machine learning. This method can transform a matrix array into a single metric while taking into account the weight of each value.

[0068] In addition, during the beam injection and transmission process in the accelerator, Twiss parameters α, β, and γ are important parameters for the lateral emittance of the beam. At the starting point of the beam, they represent the divergence and focusing degree of the beam, and at the end point of the beam, they represent the size of the beam and the change in divergence. The Twiss parameters are further calculated by the following formula: (3); (4); (5).

[0069] On the other hand, based on the same inventive concept, another embodiment of the present invention introduces a beam diagnostic system, which adopts the control method for measuring beam transverse profile and emittance introduced in any one of the above embodiments.

[0070] The beam diagnostic system mainly includes a motion control module, a data acquisition module and a data processing module. The motion control module is used for remote control of the programmable logic controller. The data acquisition module is used for information exchange with the data acquisition electronics. The data processing module is used to receive and parse the data packets of the measurement probe position transmitted by the programmable logic controller.

[0071] Specifically, the data processing module is used to calculate the angle value according to the position data of the first emittance measurement probe, the position data of the second emittance measurement probe, and the distance between the first emittance measurement probe and the second emittance measurement probe. The position data, angle value, and beam current intensity data form a three-dimensional array to generate the final beam transverse emittance measurement result.

[0072] The motion control module is used to determine whether the measurement direction is horizontal or vertical.

[0073] In the horizontal direction, the first horizontal emittance measuring probe and the second horizontal emittance measuring probe are used to measure the beam lateral emittance in the horizontal direction.

[0074] The vertical direction measurement uses the first vertical emittance measurement probe and the second vertical emittance measurement probe to measure the beam lateral emittance in the vertical direction.

[0075] Furthermore, the measurement range and step length of the first emittance measurement probe, and the measurement range and speed of the second emittance measurement probe are determined to determine the scanning method for measuring the lateral emittance this time.

[0076] The data acquisition module is used to exchange information with the data acquisition electronics. Before the beam signal is collected, the data acquisition module sends the total number of collected points to the data acquisition electronics, and then sends a command to start collecting. After receiving the collection command, the data acquisition electronics starts collecting and records the number of collected points. If the number of collected points is equal to the total number of points, the collection is stopped and the beam signal information is sent to the data acquisition module. After the data acquisition module receives the beam signal information of this emittance measurement, it is stored in the local data structure. If the lateral emittance measurement is stopped midway, the data acquisition module sends a reset command to the data acquisition electronics and restores the data acquisition state of the data acquisition electronics to the initial state.

[0077] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

[0078] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A control method for measuring beam transverse profile and emittance, characterized in that: include: S1. Set the measurement direction, and set the scanning range and speed of the measurement probe during the measurement process; S2, sending a start measurement instruction to the programmable logic controller and data acquisition electronics; S3, obtaining the measurement probe position data sent back by the programmable logic controller; Upon receiving a signal from the data acquisition electronics to complete the acquisition, the beam current intensity data is stored in a corresponding current intensity data structure; S4. According to the measurement probe position data and beam current intensity data, the measurement results of the beam transverse profile and the beam transverse emittance are obtained.

2. The control method for measuring beam transverse profile and emittance according to claim 1, characterized in that: After sending the start measurement instruction to the programmable logic controller and the data acquisition electronics, the method further includes: S21, judging whether the intercepting probe interferes with the movement of the measuring probe, and when the judgment result is no, controlling the execution of the start measurement instruction.

3. The control method for measuring beam transverse profile and emittance according to claim 1, characterized in that: After obtaining the measurement probe position data returned by the programmable logic controller, the method further includes: According to all the probe position data returned by the programmable logic controller, the position information of the measuring probe is extracted and stored in the corresponding position data structure.

4. The control method for measuring beam transverse profile and emittance according to any one of claims 1 to 3, characterized in that: The measuring direction includes two directions: horizontal and vertical.

5. The control method for measuring beam transverse profile and emittance according to claim 2, characterized in that: The scanning range and speed of the measuring probe during the setting of the measurement process include: When measuring the beam transverse profile, set the scanning range and speed of the profile measurement probe; When measuring the beam lateral emittance, the scanning range and step length of the first emittance measurement probe are set, and the scanning range and speed of the second emittance measurement probe are set.

6. The control method for measuring beam transverse profile and emittance according to claim 5, characterized in that: The scanning range of the measuring probe is set accordingly according to the inner diameter of the vacuum pipe and the motor limit of the measuring probe.

7. The control method for measuring beam transverse profile and emittance according to claim 6, characterized in that: The determining whether the intercepting probe interferes with the motion of the measuring probe comprises: When measuring the beam transverse profile, if the motion of the interception probe interferometer profile measurement probe is detected, the start measurement instruction is re-executed; When measuring the beam lateral emittance, if it is detected that the interception probe interferes with the movement of the first emittance measurement probe and the second emittance measurement probe, the execution of the start measurement instruction is terminated.

8. The control method for measuring beam transverse profile and emittance according to claim 7, characterized in that: During the measurement of beam lateral emittance, the measurement process can be interrupted at any time and restored to the measurement start state.

9. The control method for measuring beam transverse profile and emittance according to claim 5, characterized in that: The measurement results of obtaining the beam transverse profile and the beam transverse emittance include: The angle value is calculated according to the position data of the first emittance measurement probe and the second emittance measurement probe and the distance therebetween, and the beam lateral emittance is then calculated according to the angle value, the position data of the first emittance measurement probe and the beam current intensity data.

10. A beam diagnostic system, characterized in that: A control method for measuring beam transverse profile and emittance as claimed in any one of claims 1 to 9; The beam diagnostic system includes: Motion control module for remote control of programmable logic controllers; A data acquisition module, used for information interaction with data acquisition electronics; The data processing module is used to receive and analyze the data packet of the measuring probe position transmitted by the programmable logic controller.

Images