Tritium removal equipment and tritium removal method for low-temperature rectifying tower

Abstract

The invention relates to the technical field of radioactive substance recovery and purification, and provides tritium removal equipment and a tritium removal method for a low-temperature rectifying tower. The tritium removal equipment comprises a ventilation pipeline, a hydrogen supply device, a gas circulating pump and at least one adsorption device. The ventilation pipeline is provided with an air inlet connector and an air outlet connector which are communicated with the low-temperature rectifying tower so that the ventilation pipeline and the low-temperature rectifying tower can form a circulation loop. The hydrogen supply device can be selectively communicated with or disconnected from the circulation loop; the gas circulating pump is arranged on the ventilation pipeline, so that gas can enter the ventilation pipeline from the gas inlet connector and flow into the low-temperature rectifying tower from the gas outlet connector to form gas; the adsorption device can be selectively communicated with or disconnected from the ventilation pipeline; when the adsorption device is disconnected from the ventilation pipeline, the hydrogen supply device can be communicated with the circulation loop; when the hydrogen supply device is disconnected from the circulation loop, the adsorption device can be communicated with the ventilation pipeline. And radioactive contamination caused by maintenance or scrap treatment of the low-temperature rectifying tower is reduced.

Description

Technical Field

[0001] The present application relates to the technical field of radioactive material recovery and purification, and in particular to a detritiation device and a detritiation method for a cryogenic distillation tower. Background Art

[0002] In the related art, a cryogenic distillation tower is a device that performs a distillation process at low temperatures to separate components with different boiling points in the tower. Tritium is a radioactive isotope of hydrogen with a half-life of 12.5 years and is a highly permeable nuclide. When a cryogenic distillation tower is used to separate tritium-containing components, tritium will penetrate into the inner wall and pipeline of the distillation tower. These tritiums that penetrate into the interior of the material are difficult to remove by conventional gas replacement, vacuuming and other means. When the cryogenic distillation tower is inspected, repaired or recycled, the cryogenic distillation tower needs to be disassembled. At this time, the tritium that has penetrated into the interior of the material will be exposed to the environment, causing damage to the environment and personnel safety. Therefore, the cryogenic distillation tower that has handled tritium-containing substances needs to be detritium treated before inspection, repair or recycling to ensure the safety of the experimenters and the environment. Summary of the invention

[0003] In view of this, the embodiment of the present application is intended to provide a detritium removal device and a detritium removal method for a cryogenic distillation tower. The detritium removal device can be used to remove tritium from a cryogenic distillation tower. The detritium removal device includes:

[0004] A ventilation pipeline having an air inlet interface and an air outlet interface, which are respectively connected to the cryogenic distillation tower, so that the ventilation pipeline and the cryogenic distillation tower form a circulation loop;

[0005] A hydrogen supply device, which can be selectively connected or disconnected with the circulation loop;

[0006] A gas circulation pump is arranged on the ventilation pipeline, so that the gas can enter the ventilation pipeline from the gas inlet interface and flow into the cryogenic distillation tower from the gas outlet interface, so that the gas circulates in the circulation loop;

[0007] at least one adsorption device, capable of selectively connecting or disconnecting with the ventilation duct;

[0008] Wherein, when the adsorption device is disconnected from the ventilation pipe, the hydrogen supply device can be connected to the circulation loop to provide hydrogen to the low-temperature distillation tower to replace tritium; when the hydrogen supply device is disconnected from the circulation loop, the adsorption device can be connected to the ventilation pipe so that the adsorption device can absorb the replaced tritium.

[0009] In some embodiments, the adsorption device is disposed between the gas outlet interface and the gas circulation pump.

[0010] In some embodiments, the detritium removal device further comprises:

[0011] A gas buffer tank is arranged on the ventilation pipeline and located upstream of the gas circulation pump, and is used for buffering gas.

[0012] In some embodiments, the detritium removal device further comprises:

[0013] A flow controller is arranged on the ventilation pipeline and is used to detect and control the flow rate of the gas in the circulation loop.

[0014] In some embodiments, the detritium removal device further comprises:

[0015] At least one tritium ionization chamber is disposed on the ventilation pipe and is used to display the tritium content of the gas passing through the circulation loop.

[0016] In some embodiments, the tritium ionization chamber is located upstream of the adsorption device; and / or, the tritium ionization chamber is located downstream of the adsorption device.

[0017] In some embodiments, the parts of the detritiation device that are in contact with the gas in the circulation loop are all made of metal.

[0018] In some embodiments, the adsorption device is a hydrogen storage alloy bed or a molecular sieve adsorption bed.

[0019] In some embodiments, the detritium removal device further comprises:

[0020] A movable platform, the hydrogen supply device, the ventilation pipeline, the gas circulation pump and the adsorption device are all arranged on the movable platform.

[0021] In some embodiments, the detritiation device includes a replacement mode control and a detritiation mode control, the replacement mode control is used to execute a replacement mode program, and the detritiation mode control is used to execute a detritiation mode program;

[0022] When executing the replacement mode procedure, the adsorption device is disconnected from the ventilation pipeline, and the hydrogen supply device can be connected to the circulation loop to provide hydrogen to the cryogenic distillation tower to replace tritium;

[0023] When executing the detritiation mode procedure, the hydrogen supply device is disconnected from the circulation loop, and the adsorption device can be connected to the ventilation pipe so that the adsorption device can absorb the displaced tritium.

[0024] In some embodiments, the detritiation device includes a replacement time control and a detritiation time control, the replacement time control is used to set the running time of the replacement mode program, and the detritiation time control is used to set the running time of the detritiation mode program.

[0025] In some embodiments, the detritiation device includes at least one detritiation icon for selecting the operation time of the replacement mode program and the operation time of the detritiation mode program corresponding to the cryogenic distillation column.

[0026] In some embodiments, the detritiation device includes at least one detritiation control for selecting an operating procedure corresponding to the cryogenic distillation tower.

[0027] The embodiment of the present application provides a detritus removal device for a cryogenic distillation tower. The removed tritium will be solidified in the adsorption device 30 to reduce the radioactive contamination caused by the maintenance or scrapping of the cryogenic distillation tower. The radioactivity of the cryogenic distillation tower after treatment can be reduced by more than 99%.

[0028] The present application also provides a method for removing tritium from a cryogenic distillation tower, comprising:

[0029] Connecting a detritiation device to the cryogenic distillation tower to form a circulation loop, and disconnecting an adsorption device of the detritiation device from the circulation loop;

[0030] Starting a gas circulation pump of the detritium removal device to circulate gas in the circulation loop;

[0031] Connecting the hydrogen supply device of the detritium removal equipment to the circulation loop to introduce hydrogen into the cryogenic distillation tower to replace tritium;

[0032] The hydrogen supply device is disconnected from the circulation loop, and the adsorption device is connected to the circulation loop to adsorb tritium in the gas in the circulation loop.

[0033] In some embodiments, after the step of connecting the hydrogen supply device of the detritium removal equipment to the circulation loop to introduce hydrogen into the cryogenic distillation tower to replace tritium, the detritium removal method further comprises:

[0034] The tritium content value of the tritium ionization chamber of the detritium removal device is obtained, and after the value is stabilized, the introduction of hydrogen into the cryogenic distillation tower is stopped.

[0035] In some embodiments, after the step of disconnecting the hydrogen supply device from the circulation loop and connecting the adsorption device to the circulation loop to adsorb tritium from the gas in the circulation loop, the detritium removal method further comprises:

[0036] The tritium content value of the tritium ionization chamber of the detritium removal device is obtained, and the gas circulation pump is turned off after the value is less than a predetermined value.

[0037] In the method for removing tritium from a cryogenic distillation tower provided in an embodiment of the present application, the connection between the adsorption device and the circulation loop is first disconnected before the gas circulates in the circulation loop. Hydrogen is provided by a hydrogen supply device to displace tritium. The adsorption device is then connected to the circulation loop, so that the adsorption device absorbs tritium in the circulation loop to achieve the purpose of removing tritium. The detritium effect of the cryogenic distillation tower can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] Figure 1 It is a structural schematic diagram of a detritus removal device of a cryogenic distillation tower in one embodiment of the present application;

[0039] Figure 2 Schematic diagram of a process for removing tritium from a cryogenic distillation tower in one embodiment of the present application.

[0040] Description of Reference Numerals

[0041] Detritium removal equipment 100; ventilation pipeline 10; air inlet interface 11; air outlet interface 12; gas circulation pump 20; adsorption device 30; gas buffer tank 40; flow controller 50; tritium ionization chamber 60; hydrogen supply device 70. DETAILED DESCRIPTION

[0042] The following is a further detailed description of the implementation of the present application in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present application but cannot be used to limit the scope of the present application.

[0043] It should be noted that in the embodiments of the present application, the orientation or positional relationship such as "upstream" and "downstream" is based on the orientation or positional relationship shown in the drawings. It should be understood that these orientation terms are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application. The present application is further described in detail below in conjunction with the drawings and specific embodiments.

[0044] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the embodiments of the present application can be understood according to specific circumstances.

[0045] In the description of this specification, the description with reference to the terms "some embodiments", "exemplarily", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the embodiments of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine different embodiments or examples described in this application and the features of different embodiments or examples without contradiction.

[0046] In the related art, after the cryogenic distillation tower processes tritium-containing substances, tritium will penetrate into the inner wall and pipeline of the cryogenic distillation tower. When the cryogenic distillation tower needs to be repaired or recycled, the tritium will be exposed to the outside environment and cause harm to people and the environment. Therefore, it is necessary to remove tritium from the cryogenic distillation tower.

[0047] In view of this, please refer to Figure 1 An embodiment of the present application provides a detritiation device 100 for a cryogenic distillation tower. The detritiation device 100 includes a ventilation pipeline 10, a hydrogen supply device 70, a gas circulation pump 20 and at least one adsorption device 30. The ventilation pipe 10 has an air inlet interface 11 and an air outlet interface 12, which are respectively connected to the cryogenic distillation tower so that the ventilation pipe 10 and the cryogenic distillation tower form a circulation loop; the hydrogen supply device 70 can be selectively connected or disconnected with the circulation loop; the gas circulation pump 20 is arranged on the ventilation pipe 10, so that the gas can enter the ventilation pipe 10 from the air inlet interface 11 and flow into the cryogenic distillation tower from the air outlet interface 12, forming a circulation flow of gas in the circulation loop; the adsorption device 30 can be selectively connected or disconnected with the ventilation pipe 10; wherein, when the adsorption device 30 is disconnected from the ventilation pipe 10, the hydrogen supply device 70 can be connected to the circulation loop to provide hydrogen to the cryogenic distillation tower to replace tritium; when the hydrogen supply device 70 is disconnected from the circulation loop, the adsorption device 30 can be connected to the ventilation pipe 10, so that the adsorption device 30 can absorb the replaced tritium.

[0048] A cryogenic distillation tower is a device that performs a distillation process at low temperatures, thereby separating components with different boiling points in the tower. Exemplarily, a cryogenic distillation tower generally has a feed port, a steam inlet, a steam outlet, a reflux port, and a kettle liquid port, and the air inlet interface 11 and the air outlet interface 12 of the detritium removal device 100 can be connected to any one of the feed port, the steam inlet, the steam outlet, the reflux port, and the kettle liquid port, respectively. For example, the steam inlet is detachably connected to the air outlet interface 12 of the detritium removal device 100, and the steam outlet is detachably connected to the air inlet interface 11 of the detritium removal device 100, and the other ports of the cryogenic distillation tower are closed so that the cryogenic distillation tower can be connected to the circulation loop to replace tritium. After the cryogenic distillation tower replaces tritium, a mixed gas is generated, hereinafter referred to as gas, and the gas includes hydrogen containing tritium, hereinafter referred to as tritiated hydrogen. The gas can enter the circulation loop and then circulate. Exemplarily, the air inlet interface 11 can be a VCR joint or a ferrule joint, and the air inlet interface 11 can be a VCR joint or a ferrule joint to improve the sealing effect. VCR refers to Vacuum Coupling Radius Seal, that is, a vacuum connection radial seal. The VCR joint includes a short rod, a female head, a gasket, a long rod and a male head, which has high cleanliness and good sealing, and is suitable for devices and systems that require no leakage. The ferrule joint includes a body, a nut, a front ferrule and a rear ferrule, and has the characteristics of reliable connection, high pressure resistance, temperature resistance, good sealing and repeatability, easy installation and maintenance, and safe and reliable operation.

[0049] The hydrogen supply device 70 is used to provide hydrogen to the cryogenic distillation tower, and the tritium in the cryogenic distillation tower is replaced by hydrogen. For example, if the inner wall and pipeline of the cryogenic distillation tower contain tritium, after the hydrogen is introduced, the tritium that has penetrated into the cryogenic distillation tower can be replaced to the greatest extent by hydrogen penetration into the cryogenic distillation tower material, so as to achieve the purpose of deep detritium removal. The hydrogen supply device 70 can be selectively connected or disconnected with the circulation loop, wherein the hydrogen supply device 70 can directly introduce hydrogen into the cryogenic distillation tower, for example, by connecting the steam inlet, steam outlet, feed port, reflux port or kettle liquid port of the cryogenic distillation tower; the hydrogen supply device 70 can also be connected to the ventilation pipe 10 to introduce hydrogen or disconnected to stop introducing hydrogen. Exemplarily, any section on the ventilation pipe 10 has a hydrogen inlet, and the hydrogen supply device 70 can be connected to the hydrogen inlet to provide hydrogen to the cryogenic distillation tower through the ventilation pipe 10.

[0050] The adsorption device 30 is used to adsorb tritium and can absorb tritium-containing hydrogen in the gas. For example, the adsorption device 30 can be a hydrogen storage alloy bed, and the metal in the hydrogen storage alloy bed can undergo a reversible reaction with the tritium-containing hydrogen. After the hydrogen storage alloy bed solidifies the tritium-containing hydrogen, it can be released again by heating, thereby realizing the recovery of the tritium element. The composition of the alloy can be set according to the composition of the gas in the cryogenic distillation tower to improve the adsorption effect of tritium. Alternatively, the adsorption device 30 can be a molecular sieve adsorption bed, which utilizes the microporous structure and chemical properties of the molecular sieve material to achieve the purpose of adsorbing tritium. The adsorption device 30 can be selectively connected or disconnected with the ventilation duct 10. After the adsorption device 30 is connected, the adsorption device 30 can adsorb tritium-containing hydrogen in the gas.

[0051] The gas circulation pump 20 can provide power for gas flow so that the gas circulates in the circulation loop. At the same time, the gas circulation pump 20 can play a role of pressurization. The pressurized gas enters the adsorption device 30, which can improve the adsorption effect of the adsorption device 30.

[0052] In order to improve the use stability of the detritiation device 100, illustratively, the parts of the detritiation device 100 that are in contact with the gas in the circulation loop are all made of metal. The metal material has good sealing performance, which can reduce the radiation effect of tritium on the detritiation device 100 and improve the service life of the detritiation device 100. For example, the parts of the ventilation pipe 10 that are in contact with the gas, such as the inner wall, are all made of metal. It is understandable that the amount of residual tritium in the cryogenic distillation tower is very small, and the detritiation mode time is very short, so the penetration of tritium into the detritiation device 100 when the gas is circulating is not specially considered here.

[0053] The embodiment of the present application provides a detritus removal device 100 for a cryogenic distillation tower. The removed tritium will be solidified in the adsorption device 30 to reduce the radioactive contamination caused by the maintenance or scrapping of the cryogenic distillation tower. The radioactive activity of the cryogenic distillation tower after treatment can be reduced by more than 99%.

[0054] By controlling the adsorption device 30 and the hydrogen supply device 70, the detritium removal device 100 can have two working modes, including a replacement mode and a detritium removal mode. In the replacement mode, the adsorption device 30 is disconnected from the ventilation pipe 10, and the hydrogen supply device 70 can be connected to the circulation loop to provide hydrogen to the cryogenic distillation tower to replace tritium; in the detritium removal mode, the hydrogen supply device 70 is disconnected from the circulation loop, and the adsorption device 30 can be connected to the ventilation pipe 10, so that the adsorption device 30 can absorb the replaced tritium.

[0055] In some embodiments, the detritium removal device 100 includes at least one detritium removal control for selecting an operating program corresponding to a cryogenic distillation tower. For example, each detritium removal control corresponds to a cryogenic distillation tower of a specification and model. The operating program of the detritium removal device 100 includes a replacement mode program corresponding to the replacement mode, and a detritium removal mode program corresponding to the detritium removal mode. It is understandable that cryogenic distillation towers of different specifications and models have different tritium contents and different required detritium removal times. In order to reduce repetitive operations and improve work efficiency, the detritium removal time corresponding to the specifications and models of the cryogenic distillation tower can be set in the detritium removal device 100. For example, the replacement mode time required for a cryogenic distillation tower of a specification and model is t1, and the detritium removal mode time is t2. The operating program corresponding to the cryogenic distillation tower is set to first perform the replacement mode program for t1 time, and then perform the detritium removal mode program for t2 time. With reference to this configuration, the detritiation device 100 can be built with multiple selectable operating programs to correspond to various specifications and models of cryogenic distillation towers. When performing detritiation work, it is only necessary to select the detritiation control corresponding to the cryogenic distillation tower of the specification and model, which can reduce repetitive work and improve work efficiency.

[0056] In some embodiments, the detritiation device 100 includes a replacement mode control and a detritiation mode control, the replacement mode control is used to execute the replacement mode program, and the detritiation mode control is used to execute the detritiation mode program; when executing the replacement mode program, the adsorption device 30 is disconnected from the ventilation pipe 10, and the hydrogen supply device 70 can be connected to the circulation loop to provide hydrogen to the low-temperature distillation tower to replace tritium; when executing the detritiation mode program, the hydrogen supply device 70 is disconnected from the circulation loop, and the adsorption device 30 can be connected to the ventilation pipe 10 so that the adsorption device 30 can absorb the replaced tritium.

[0057] The cryogenic distillation tower may contain other inert gases besides hydrogen. While hydrogen is introduced, tritium is adsorbed. The adsorption device 30 may absorb too much other content in the gas, such as other inert gases besides hydrogen, causing the adsorption device 30 to quickly reach a saturated state, thereby affecting the adsorption effect on tritium. Therefore, this embodiment sets a replacement mode control and a detritium removal mode control, first using the replacement mode and then the detritium removal mode. In the replacement mode, the connection between the adsorption device 30 and the circulation loop is disconnected. Hydrogen is provided by the hydrogen supply device 70 to displace tritium. After stopping the introduction of hydrogen, the adsorption device 30 is connected to the circulation loop again, so that the adsorption device 30 absorbs tritium in the circulation loop to achieve the purpose of detritium. Starting to adsorb tritium after replacing tritium can improve the adsorption effect of the adsorption device 30 on tritium.

[0058] There is no limitation on the implementation method of controlling whether the replacement mode program and the detritiation mode program are started, and controlling the switching between the replacement mode program and the detritiation mode program. For example, the replacement mode control and the detritiation mode control can be controlled by a mechanical starting structure, such as a button switch, a knob switch, etc., or by a control panel with an electronic display, such as an operator can control the replacement mode control and the detritiation mode control through a control panel to select the replacement mode program or the detritiation mode program.

[0059] In some embodiments, the detritium removal device 100 includes a replacement time control and a detritium removal time control, wherein the replacement time control is used to set the running time of the replacement mode program, and the detritium removal time control is used to set the running time of the detritium removal mode program. In this way, the replacement time can be adjusted by the replacement time control, and the detritium removal time can be adjusted by the detritium removal time control. The flexibility of operation can be improved to adapt to different detritium removal requirements in different situations, and the user can set the replacement time and detritium removal time according to the actual situation.

[0060] It is understandable that the time required for the replacement mode is related to the type and volume of the cryogenic distillation tower, gas flow rate and other parameters, and the time required for the detritus removal mode is related to the type and volume of the cryogenic distillation tower, the number of adsorption devices 30, adsorption capacity, gas flow rate and other parameters, and can be set according to specific circumstances. Exemplarily, the operation time of the replacement mode is not less than 72 hours.

[0061] In some embodiments, the detritium removal device 100 includes at least one detritium removal icon for selecting the running time of the replacement mode program and the running time of the detritium removal mode program of the corresponding cryogenic distillation tower. It is understandable that cryogenic distillation towers of different specifications and models have different tritium contents and different required detritium removal times. The detritium removal icon can display relevant parameters and can be in the form of a paper icon or an electronic icon. Through the prompt of the detritium removal icon, the corresponding running time can be selected according to the corresponding cryogenic distillation tower, which is convenient for selecting the corresponding running time for different cryogenic distillation towers according to the reference provided by the detritium removal icon, and it is convenient to adjust the running time according to the actual situation.

[0062] For some examples, see Figure 1 , the adsorption device 30 is arranged between the gas outlet interface 12 and the gas circulation pump 20. In this way, before the gas flows to the adsorption device 30, it first flows from the gas inlet interface 11 to the gas circulation pump 20, and the gas circulation pump 20 provides power, which can increase the gas pressure received by the adsorption device 30 and improve the adsorption effect of the adsorption device 30 on tritium.

[0063] For some examples, see Figure 1The detritium removal device 100 also includes a gas buffer tank 40, which is arranged on the ventilation pipe 10, upstream of the gas circulation pump 20, and is used to buffer gas. The gas buffer tank 40 can balance the gas flow to provide a stable airflow by storing and releasing gas, reduce the instability of the airflow caused by flow fluctuations, and stabilize the pressure in the detritium removal device 100. When the amount of gas required for the airflow increases, the gas buffer tank 40 can quickly release the gas, and when the amount of gas required for the airflow decreases, the gas buffer tank 40 reduces the speed of releasing the gas. After storing the gas, the gas buffer tank 40 provides the gas to the gas circulation pump 20, thereby improving the stability of the gas flow rate and pressure when the detritium removal device 100 is in operation.

[0064] For some examples, see Figure 1 The detritium removal device 100 also includes a flow controller 50, which is arranged on the ventilation pipe 10 and is used to detect and control the flow rate of the gas in the circulation loop. In order to adapt to the replacement efficiency of the hydrogen supply device 70, when replacing tritium, the gas flow rate is prevented from being too fast; at the same time, the flow rate can be reduced too slowly to affect the circulation effect, and when the adsorption device 30 adsorbs tritium, it absorbs too much other components in the gas, such as other inert gases other than hydrogen, causing the adsorption device 30 to quickly reach saturation and affect the tritium absorption effect. The flow controller 50 is used to facilitate the flow rate adjustment combined with the detritium effect to improve the detritium effect.

[0065] For some examples, see Figure 1 The detritium removal device 100 further includes at least one tritium ionization chamber 60, which is disposed on the ventilation pipe 10 and is used to display the tritium content of the gas passing through the circulation loop. The tritium content of the gas is obtained through the tritium ionization chamber 60, so as to timely understand the real-time value of the tritium content of the gas and the adsorption effect of the adsorption device 30.

[0066] In some embodiments, the tritium ionization chamber 60 is located upstream of the adsorption device 30. In this way, the tritium content of the gas left in the cryogenic distillation tower can be observed to understand the current detritium removal status of the cryogenic distillation tower.

[0067] For some examples, see Figure 1 The tritium ionization chamber 60 is located downstream of the adsorption device 30. In this way, the tritium content of the gas left in the adsorption device 30 can be observed to understand the tritium content of the gas after adsorption by the adsorption device 30, which can be used as a basis for determining whether to stop the detritium step.

[0068] In some embodiments, the tritium ionization chamber 60 is located upstream and downstream of the adsorption device 30. The tritium ionization chamber 60 is arranged upstream and downstream of the adsorption device 30 to obtain the tritium content in the gas, and the tritium content in the gas flowing out of the cryogenic distillation tower can be obtained, and the tritium content in the gas after adsorption by the adsorption device 30 can be obtained. By comparison, the adsorption effect of the adsorption device 30 can be obtained, and the settings of the detritium removal device 100, such as the alloy composition of the hydrogen storage alloy bed, the gas flow rate, etc. can be adjusted according to the adsorption effect.

[0069] In some embodiments, the detritium removal device 100 further includes a movable platform, and the hydrogen supply device 70, the ventilation pipe 10, the gas circulation pump 20 and the adsorption device 30 are all arranged on the movable platform. In this way, the overall movement is convenient and easy to use. Exemplarily, the gas buffer tank 40, the flow controller 50 and the tritium ionization chamber 60 are also arranged on the movable platform.

[0070] The present application also provides a method for removing tritium from a cryogenic distillation tower. Figure 2 ,include:

[0071] S1: connecting the detritiation equipment to the cryogenic distillation tower to form a circulation loop, and disconnecting the adsorption device of the detritiation equipment from the circulation loop;

[0072] S2: starting the gas circulation pump of the detritium removal equipment to circulate the gas in the circulation loop;

[0073] S3: connecting the hydrogen supply device of the detritium removal equipment to the circulation loop to introduce hydrogen into the cryogenic distillation tower to replace tritium;

[0074] S4: Disconnect the hydrogen supply device from the circulation loop, and connect the adsorption device to the circulation loop to adsorb tritium in the gas in the circulation loop.

[0075] Before the gas circulates in the circulation loop, the connection between the adsorption device 30 and the circulation loop is disconnected. Hydrogen is provided by the hydrogen supply device to replace tritium. The adsorption device 30 is then connected to the circulation loop, so that the adsorption device 30 absorbs tritium in the circulation loop to achieve the purpose of detritium removal. The detritium removal effect of the cryogenic distillation tower can be improved.

[0076] The detritiation method for a cryogenic distillation tower provided in the embodiments of the present application is applicable to the detritiation equipment for a cryogenic distillation tower in any embodiment of the present application.

[0077] In some embodiments, after the step of connecting the hydrogen supply device of the detritium removal equipment to the circulation loop to introduce hydrogen into the cryogenic distillation tower to replace tritium, the detritium removal method further comprises:

[0078] Obtain the tritium content value of the tritium ionization chamber of the detritium removal equipment, and stop introducing hydrogen into the cryogenic distillation tower after the value stabilizes.

[0079] The tritium content of the gas in the circulation loop is monitored by the tritium ionization chamber 60. Before connecting to the adsorption device 30, the tritium content in the gas gradually increases due to the continuous introduction of hydrogen to replace tritium. After increasing to a certain value, the value stops increasing. The hydrogen introduced into the cryogenic distillation tower can no longer replace tritium. The introduction of hydrogen is stopped, and the adsorption device 30 is connected to adsorb tritium. In this way, the tritium content of the gas in the circulation loop can be obtained in time, and while hydrogen is introduced and tritium is adsorbed, the adsorption device 30 may absorb too much other content in the gas, such as other inert gases other than hydrogen, and quickly reach a saturated state, which affects the adsorption effect on tritium. Starting to adsorb tritium after replacing tritium can improve the adsorption effect of the adsorption device 30 on tritium.

[0080] In some embodiments, after the step of disconnecting the hydrogen supply device from the circulation loop and connecting the adsorption device 30 to the circulation loop to adsorb tritium in the gas in the circulation loop, the detritiation method further includes: obtaining the tritium content value of the tritium ionization chamber 60 of the detritiation equipment 100, and closing the gas circulation pump 20 after the value is less than a predetermined value.

[0081] The tritium content of the gas in the circulation loop is monitored by the tritium ionization chamber 60. As the adsorption device 30 in the gas continues to adsorb tritium, the tritium content in the gas gradually decreases. When the value is less than a predetermined value, it can be determined that the adsorption is completed, and the gas circulation pump 20 is turned off to end the tritium absorption process.

[0082] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A detritium removal device for a cryogenic distillation tower, characterized in that: The detritium removal equipment comprises: A ventilation pipeline having an air inlet interface and an air outlet interface, which are respectively connected to the cryogenic distillation tower, so that the ventilation pipeline and the cryogenic distillation tower form a circulation loop; A hydrogen supply device, which can be selectively connected or disconnected with the circulation loop; A gas circulation pump is arranged on the ventilation pipeline, so that the gas can enter the ventilation pipeline from the gas inlet interface and flow into the cryogenic distillation tower from the gas outlet interface, so that the gas circulates in the circulation loop; at least one adsorption device, capable of selectively connecting or disconnecting with the ventilation duct; Wherein, when the adsorption device is disconnected from the ventilation pipe, the hydrogen supply device can be connected to the circulation loop to provide hydrogen to the low-temperature distillation tower to replace tritium; when the hydrogen supply device is disconnected from the circulation loop, the adsorption device can be connected to the ventilation pipe so that the adsorption device can absorb the replaced tritium.

2. The detritium removal device according to claim 1, characterized in that: The adsorption device is arranged between the gas outlet interface and the gas circulation pump.

3. The detritium removal device according to claim 1, characterized in that: The detritium removal equipment also includes: A gas buffer tank is arranged on the ventilation pipeline and located upstream of the gas circulation pump, and is used for buffering gas.

4. The detritium removal device according to claim 1, characterized in that: The detritium removal equipment also includes: A flow controller is arranged on the ventilation pipeline and is used to detect and control the flow rate of the gas in the circulation loop.

5. The detritium removal device according to claim 1, characterized in that: The detritium removal equipment also includes: At least one tritium ionization chamber is disposed on the ventilation pipe and is used to display the tritium content of the gas passing through the circulation loop.

6. The detritium removal device according to claim 1, characterized in that: The tritium ionization chamber is located upstream of the adsorption device; and / or, the tritium ionization chamber is located downstream of the adsorption device.

7. The detritium removal device according to claim 1, characterized in that: Parts of the detritiation device that are in contact with the gas in the circulation loop are all made of metal.

8. The detritium removal device according to claim 1, characterized in that: The adsorption device is a hydrogen storage alloy bed or a molecular sieve adsorption bed.

9. The detritium removal device according to any one of claims 1 to 8, characterized in that: The detritium removal equipment also includes: A movable platform, the hydrogen supply device, the ventilation pipeline, the gas circulation pump and the adsorption device are all arranged on the movable platform.

10. The detritium removal device according to any one of claims 1 to 8, characterized in that: The detritium removal device comprises a replacement mode control and a detritium removal mode control, wherein the replacement mode control is used to execute a replacement mode program, and the detritium removal mode control is used to execute a detritium removal mode program; When executing the replacement mode procedure, the adsorption device is disconnected from the ventilation pipeline, and the hydrogen supply device can be connected to the circulation loop to provide hydrogen to the cryogenic distillation tower to replace tritium; When executing the detritiation mode procedure, the hydrogen supply device is disconnected from the circulation loop, and the adsorption device can be connected to the ventilation pipe so that the adsorption device can absorb the displaced tritium.

11. The detritium removal device according to claim 10, characterized in that: The detritiation device comprises a replacement time control and a detritiation time control. The replacement time control is used to set the running time of the replacement mode program, and the detritiation time control is used to set the running time of the detritiation mode program.

12. The detritium removal device according to claim 11, characterized in that: The detritiation device comprises at least one detritiation icon for selecting the operation time of the replacement mode program and the operation time of the detritiation mode program corresponding to the low-temperature distillation column.

13. The detritium removal device according to any one of claims 1 to 8, characterized in that: The detritiation device includes at least one detritiation control unit for selecting an operating procedure corresponding to the cryogenic distillation tower.

14. A method for removing tritium from a cryogenic distillation tower, characterized in that: include: Connecting a detritiation device to the cryogenic distillation tower to form a circulation loop, and disconnecting an adsorption device of the detritiation device from the circulation loop; Starting a gas circulation pump of the detritium removal device to circulate gas in the circulation loop; Connecting the hydrogen supply device of the detritium removal equipment to the circulation loop to introduce hydrogen into the cryogenic distillation tower to replace tritium; The hydrogen supply device is disconnected from the circulation loop, and the adsorption device is connected to the circulation loop to adsorb tritium in the gas in the circulation loop.

15. The detritium removal method according to claim 14, characterized in that: After the step of connecting the hydrogen supply device of the detritium removal equipment to the circulation loop to introduce hydrogen into the cryogenic distillation tower to replace tritium, the detritium removal method further comprises: The tritium content value of the tritium ionization chamber of the detritium removal device is obtained, and after the value is stabilized, the introduction of hydrogen into the cryogenic distillation tower is stopped.

16. The detritium removal method according to claim 14 or 15, characterized in that: After the step of disconnecting the hydrogen supply device from the circulation loop and connecting the adsorption device to the circulation loop to adsorb tritium from the gas in the circulation loop, the detritium removal method further comprises: The tritium content value of the tritium ionization chamber of the detritium removal device is obtained, and the gas circulation pump is turned off after the value is less than a predetermined value.

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