A method for preparing a three-dimensional structured wear-resistant superhydrophobic layer on a metal substrate

Abstract

A method for preparing a three-dimensional structured wear-resistant superhydrophobic layer on a metal substrate, which relates to a method for preparing a superhydrophobic layer on a metal substrate. In order to solve the problem of poor mechanical stability of existing superhydrophobic materials. In the present invention, a porous graphene layer is prepared on the surface of the metal substrate. The obtained porous graphene layer is a three-dimensional porous nano-hydrophobic material. At the same time, through air pressure infiltration, a secondary superhydrophobic layer is formed inside and on the surface of the porous graphene layer, and finally a three-dimensional hydrophobic structure synergistically combined with porous graphene and a hydrophobic film is obtained; the thickness of the three-dimensional hydrophobic structure is 10-20 μm, with high stability, and still has the same hydrophobic ability inside after the surface layer is peeled off and lost due to friction or impact damage, improving the service life of the hydrophobic layer. And the present invention has the advantages of short reaction time, less time-consuming, low energy consumption, high efficiency and easy operation.

Description

Technical Field

[0001] The present invention relates to a method for preparing a superhydrophobic layer on a metal substrate. Background Art

[0002] Superhydrophobic materials can generally be applied to the fields of oil-water separation, self-cleaning, medicine, anti-icing, textiles, anti-corrosion, cultural relic protection, prevention and control of water pollutants, anti-reflection, etc. However, the current research on superhydrophobic materials has not reached the ultimate and mature stage. Therefore, developing more suitable superhydrophobic materials for the development of the new era and broadening the application fields of superhydrophobic materials are also the key points in the current research on superhydrophobic materials. Materials with a stable contact angle θ>150° on the surface are superhydrophobic materials. Based on the different adhesion forces of liquid droplets and the surface in the superhydrophobic state, the morphology of superhydrophobic materials is divided into five forms: Wenzel state, Cassie state, lotus leaf state, Wenzel-Cassie state, and gecko state. Among these five forms, the "lotus leaf state" with extremely small adhesion force between water droplets and the surface and a rolling angle α<10° is the most widely studied state of superhydrophobic materials. In recent years, some methods for synthesizing superhydrophobic materials proposed at home and abroad also consider relatively simple operations and the use of relatively inexpensive raw materials. However, some of these methods include a series of continuous multi-stage procedures that require specific technical conditions, which will greatly limit their actual implementation on an industrial scale. Therefore, future research on superhydrophobic materials needs to pay more attention to methods that can prepare materials with excellent performance and easy control of actual application implementation conditions while using materials with low prices and simple operations. Currently, the price of preparing superhydrophobic materials using fluoropolymers is relatively high, making the cost of superhydrophobic materials prepared from fluoropolymers higher. Most of them are only prepared in the laboratory and are difficult to circulate in the market. Therefore, most methods for preparing superhydrophobic materials are limited to the laboratory and model theory processes. Therefore, how to truly apply these methods in practice, successfully achieve commercialization, and make superhydrophobic materials truly circulate in the market is the future development direction of superhydrophobic materials.

[0003] Since most superhydrophobic materials are thin film structures not exceeding 1 micron, the surface mechanical stability is poor, mainly reflected in poor wear resistance. During the application process, after local friction or impact damage, the superhydrophobic thin film is damaged, and thus the hydrophobic ability is lost. Summary of the Invention

[0004] In order to solve the problem of poor mechanical stability of existing superhydrophobic materials, the present invention proposes a method for preparing a three-dimensional structure wear-resistant superhydrophobic layer on a metal substrate.

[0005] The method for preparing a three-dimensional structure wear-resistant superhydrophobic layer on a metal substrate according to the present invention is carried out according to the following steps:

[0006] 1. After cutting, grinding, and polishing the metal substrate for pretreatment, ultrasonically pre-clean it successively with acetone, alcohol, and deionized water to clean the surface and obtain a pretreated metal substrate;

[0007] 2. Sandblast the surface of the metal substrate to obtain a metal substrate with a graphene layer; after sandblasting, multiple layers of graphene are obtained on the surface of the metal substrate;

[0008] The sandblasting process is as follows: The sandblasting material used for sandblasting is high-purity graphite with a particle size of 150 - 200 mesh, the sandblasting speed is 25 - 30 m 2 / h, and repeat sandblasting 3 times;

[0009] 3. Place the metal substrate with a graphene layer obtained in step 2 into a plasma chemical vapor deposition device for plasma bombardment;

[0010] The plasma bombardment process is as follows: Evacuate the plasma chemical vapor deposition device to a pressure of 5 Pa, introduce argon and hydrogen, then adjust the pressure in the plasma chemical vapor deposition device to 100 Pa, heat up to 850 °C - 900 °C, and after reaching the temperature, turn on the radio frequency power supply and perform plasma bombardment for 3 - 5 min;

[0011] 4. Repeat step 2 and step 3 until a graphene layer with a thickness of 10 - 20 μm is obtained on the surface of the metal substrate;

[0012] 5. Place the metal substrate with a graphene layer obtained in step 4 into a plasma chemical vapor deposition device, introduce methane, argon, and hydrogen, adjust the pressure in the device to 100 Pa, adjust the temperature to 850 °C - 930 °C, turn on the radio frequency power supply, and deposit graphene;

[0013] 6. Place the metal substrate with a three-dimensional porous graphene layer obtained in step 5 into a reaction kettle filled with dopamine aqueous solution and react for 1 - 2 h, and the pressure in the reaction kettle is 10 - 15 MPa; then add chlorosilane and react for another 1 - 2 h under a pressure of 10 - 15 MPa. After the reaction is completed, take it out and dry it to finish.

[0014] The principle and beneficial effects of the present invention are as follows:

[0015] The present invention prepares a porous graphene layer on the surface of a metal matrix. The obtained porous graphene layer is a three-dimensional porous nano-hydrophobic material. At the same time, through air pressure infiltration, chlorosilane forms a secondary super-hydrophobic layer inside and on the surface of the porous graphene layer, and finally a three-dimensional hydrophobic structure combining porous graphene and a hydrophobic film is prepared. The thickness of the three-dimensional hydrophobic structure is 10-20 μm, with high stability. Even after the surface is peeled and damaged due to friction or impact, the interior still has the same hydrophobic ability, improving the service life of the hydrophobic layer. Moreover, the present invention has the advantages of short reaction time, less time-consuming, low energy consumption, high efficiency, and easy operation. Description of the Drawings

[0016] Figure 1 It is a contact angle photograph of the three-dimensional structure wear-resistant super-hydrophobic layer prepared on the metal matrix in Example 1;

[0017] Figure 2 It is a surface SEM image of the three-dimensional structure wear-resistant super-hydrophobic layer prepared on the metal matrix in Example 1. Detailed Embodiments

[0018] The technical solution of the present invention is not limited to the following listed specific embodiments, but also includes any reasonable combination between the specific embodiments.

[0019] Detailed Embodiment 1: The method for preparing a three-dimensional structure wear-resistant super-hydrophobic layer on a metal matrix in this embodiment is carried out according to the following steps:

[0020] I. After cutting, grinding, and polishing the metal matrix for pretreatment, ultrasonic pre-cleaning is successively carried out using acetone, alcohol, and deionized water to clean the surface, obtaining a pretreated metal matrix;

[0021] II. Sandblasting treatment is carried out on the surface of the metal matrix to obtain a metal matrix with a graphene layer; after sandblasting treatment, multiple layers of graphene are obtained on the surface of the metal matrix.

[0022] The sandblasting treatment process is as follows: The sandblasting material used for sandblasting treatment is high-purity graphite with a particle size of 150-200 mesh, the sandblasting speed is 25-30 m 2 / h, and sandblasting is repeated 3 times;

[0023] III. The metal matrix with a graphene layer obtained in step II is placed in a plasma chemical vapor deposition device for plasma bombardment; after the graphene layer on the surface of the metal matrix undergoes mild plasma bombardment, partial carbon-carbon bond breakage occurs in the graphene, generating defects, realizing nano-scale etching, and making the graphene layer become a graphene lattice structure. The exposed part of the metal matrix is used as the nucleation point for chemical vapor deposition of graphene;

[0024] The plasma bombardment process is as follows: evacuate the plasma chemical vapor deposition device to a pressure of 5 Pa, introduce argon and hydrogen, then adjust the gas pressure in the plasma chemical vapor deposition device to 100 Pa, heat up to 850 °C - 900 °C, and after reaching the temperature, turn on the radio frequency power supply and perform plasma bombardment for 3 - 5 min;

[0025] IV. Repeat Step II and Step III until a graphene layer with a thickness of 10 - 20 μm is obtained on the metal substrate;

[0026] V. Place the metal substrate with the graphene layer obtained in Step IV into the plasma chemical vapor deposition device, introduce methane, argon, and hydrogen, adjust the gas pressure in the device to 100 Pa, adjust the temperature to 850 °C - 930 °C, turn on the radio frequency power supply, and deposit graphene; during the deposition of graphene, use the porous graphene layer on the metal substrate obtained in Step IV as a template, and the chemically vapor - deposited graphene grows in the pores of the porous graphene layer, with the growth direction perpendicular to the original graphene layer. The growth of graphene in the pores of the porous graphene layer further reduces the pores of the porous graphene layer, resulting in a three - dimensional porous graphene layer with even tinier pores; the pores of the three - dimensional porous graphene layer reach the nanoscale and have superhydrophobic properties;

[0027] VI. Place the metal substrate with the three - dimensional porous graphene layer obtained in Step V into a reaction kettle filled with dopamine aqueous solution and react for 1 - 2 h, with the gas pressure in the reaction kettle being 10 - 15 MPa; then add chlorosilane and react for another 1 - 2 h under a pressure of 10 - 15 MPa. After the reaction is completed, take it out and dry it, and it is completed; infiltrate the three - dimensional porous graphene layer under a pressure of 10 - 15 MPa, and chlorosilane forms a secondary superhydrophobic layer on the inside and surface of the porous graphene layer.

[0028] This embodiment has the following beneficial effects:

[0029] In this embodiment, by preparing a porous graphene layer on the metal substrate, the obtained porous graphene layer is a three - dimensional porous nano - hydrophobic material. At the same time, through pressure infiltration, chlorosilane forms a secondary superhydrophobic layer on the inside and surface of the porous graphene layer, and finally a three - dimensional hydrophobic structure combining porous graphene and a hydrophobic film is prepared; the thickness of the three - dimensional hydrophobic structure is 10 - 20 μm, with high stability, and still has the same hydrophobic ability inside even after the surface layer is peeled off and damaged due to friction or impact, improving the service life of the hydrophobic layer. And this embodiment has the advantages of short reaction time, less time - consuming, low energy - consumption, high efficiency, and easy operation.

[0030] Specific Embodiment 2: The difference between this embodiment and Specific Embodiment 1 is that the metal substrate described in Step I is stainless steel, carbon steel, aluminum alloy, or copper alloy.

[0031] Embodiment 3 in detail: The difference between this embodiment and Embodiment 1 or 2 is that: in Step 1, the grinding is carried out with sandpaper not lower than 800#.

[0032] Embodiment 4 in detail: The difference between this embodiment and any one of Embodiments 1 to 3 is that: the sandblasting treatment process in Step 2 is as follows: the sandblasting material used for sandblasting is high-purity graphite, the particle size is 150 mesh, the sandblasting speed is 30m 2 / h, and sandblasting is repeated 3 times.

[0033] Embodiment 5 in detail: The difference between this embodiment and any one of Embodiments 1 to 4 is that: the power of the radio frequency power supply in Step 3 is 70-90W.

[0034] Embodiment 6 in detail: The difference between this embodiment and any one of Embodiments 1 to 5 is that: the flow rate ratio of argon to hydrogen in Step 3 is 1:1.

[0035] Embodiment 7 in detail: The difference between this embodiment and any one of Embodiments 1 to 6 is that: the power of the radio frequency power supply in Step 5 is 210-250W, and the deposition time is 5-8 min.

[0036] Embodiment 8 in detail: The difference between this embodiment and any one of Embodiments 1 to 7 is that: the flow rate of methane in Step 5 is 20 sccm-40 sccm, the flow rate of argon is 10 sccm-50 sccm, and the flow rate of hydrogen is 40-50 sccm.

[0037] Embodiment 9 in detail: The difference between this embodiment and any one of Embodiments 1 to 8 is that: the concentration of dopamine in Step 6 is 100-150 g / L.

[0038] Embodiment 10 in detail: The difference between this embodiment and any one of Embodiments 1 to 9 is that: the mass ratio of dopamine to chlorosilane in Step 6 is 1:0.1-0.15.

[0039] Example 1

[0040] The method for preparing a three-dimensional structure wear-resistant superhydrophobic layer on a metal substrate in this example is carried out according to the following steps:

[0041] I. After the metal substrate is subjected to cutting, grinding and polishing pretreatment, it is ultrasonically pre-cleaned successively with acetone, alcohol and deionized water to clean the surface, and a pretreated metal substrate is obtained;

[0042] The metal substrate is 316 stainless steel;

[0043] The grinding is carried out with 1000# sandpaper;

[0044] II. Perform sandblasting treatment on the surface of the metal substrate to obtain a metal substrate with a graphene layer; after sandblasting treatment, multiple layers of graphene are obtained on the surface of the metal substrate;

[0045] The sandblasting treatment process is as follows: The sandblasting material used for sandblasting treatment is high-purity graphite with a particle size of 200 mesh, and the sandblasting speed is 30m 2 / h, and sandblasting is repeated 3 times;

[0046] III. Place the metal substrate with a graphene layer obtained in step II into a plasma chemical vapor deposition device for plasma bombardment; after the graphene layer on the surface of the metal substrate undergoes mild plasma bombardment, partial carbon-carbon bond breakage occurs in the graphene, generating defects, realizing nano-scale etching, and making the graphene layer become a graphene lattice structure;

[0047] The plasma bombardment process is as follows: Vacuum the plasma chemical vapor deposition device to a pressure of 5 Pa, introduce argon and hydrogen, then adjust the gas pressure in the plasma chemical vapor deposition device to 100 Pa, heat up to 900 °C, and after reaching the temperature, turn on the radio frequency power supply and perform plasma bombardment for 4 min;

[0048] The power of the radio frequency power supply is 80 W;

[0049] The gas flow rate of argon is 20 sccm, and the gas flow rate of hydrogen is 20 sccm;

[0050] IV. Repeat step II and step III until a graphene layer with a thickness of 10 μm is obtained on the surface of the metal substrate;

[0051] V. Place the metal substrate with a graphene layer obtained in step IV into a plasma chemical vapor deposition device, introduce methane, argon and hydrogen, adjust the gas pressure in the device to 100 Pa, adjust the temperature to 900 °C, turn on the radio frequency power supply, and perform graphene deposition; during the graphene deposition process, use the porous graphene layer on the metal substrate obtained in step IV as a template, and the chemically vapor-deposited graphene grows in the pores of the porous graphene layer, and the growth direction is perpendicular to the original graphene layer. The growth of the generated graphene in the pores of the porous graphene layer further reduces the pores of the porous graphene layer, and a three-dimensional porous graphene layer with smaller pores is obtained; the pores of the three-dimensional porous graphene layer reach the nano-scale and have superhydrophobic properties;

[0052] The power of the radio frequency power supply is 240 W, and the deposition time is 6 min;

[0053] The flow rate of methane is 30 sccm, the flow rate of argon is 30 sccm, and the flow rate of hydrogen is 40 sccm;

[0054] VI. Place the metal substrate with a three-dimensional porous graphene layer obtained in Step V into a reaction kettle filled with an aqueous dopamine solution and react for 2 h under a pressure of 15 MPa in the reaction kettle; then add chlorosilane and react for another 2 h under a pressure of 15 MPa. After the reaction is completed, take it out and dry it, and it is completed; infiltrate the three-dimensional porous graphene layer under a pressure of 15 MPa, and the chlorosilane forms a secondary superhydrophobic layer inside and on the surface of the porous graphene layer;

[0055] The concentration of the dopamine is 150 g / L;

[0056] The mass ratio of the dopamine to the chlorosilane is 1:0.15.

[0057] In this embodiment, by preparing a porous graphene layer on the surface of the metal substrate, the obtained porous graphene layer is a three-dimensional porous nano-hydrophobic material. At the same time, through pressure infiltration, the chlorosilane forms a secondary superhydrophobic layer inside and on the surface of the porous graphene layer, and finally a three-dimensional hydrophobic structure combined and synergistic with porous graphene and a hydrophobic film is prepared; the thickness of the three-dimensional hydrophobic structure is 10 μm, with high stability, and still has the same hydrophobic ability inside after the surface is peeled and damaged due to friction or impact, improving the service life of the hydrophobic layer. Figure 1 It is a contact angle photo of the three-dimensional structure wear-resistant superhydrophobic layer prepared on the metal substrate in Example 1; it can be seen that the surface water contact angle of the superhydrophobic material prepared in Example 1 reaches 163.5°. Figure 2 It is a surface SEM image of the three-dimensional structure wear-resistant superhydrophobic layer prepared on the metal substrate in Example 1. Figure 2 It can be seen that the eyelashes of the three-dimensional structure wear-resistant superhydrophobic layer prepared on the metal substrate in Example 1 are in a dense porous structure.

[0058] Example 2

[0059] The method for preparing a three-dimensional structure wear-resistant superhydrophobic layer on the metal substrate in this embodiment is carried out according to the following steps:

[0060] I. After the metal substrate is subjected to cutting, grinding and polishing pretreatment, it is ultrasonically pre-cleaned successively with acetone, alcohol and deionized water to clean the surface and obtain a pretreated metal substrate;

[0061] The metal substrate is 316 stainless steel;

[0062] The grinding is carried out with 1000# sandpaper;

[0063] II. Perform sandblasting treatment on the surface of the metal substrate to obtain a metal substrate with a graphene layer; multiple layers of graphene are obtained on the surface of the metal substrate after sandblasting treatment;

[0064] The sandblasting treatment process is as follows: the sandblasting material used for sandblasting treatment is high-purity graphite with a particle size of 200 mesh, and the sandblasting speed is 30 m2 per hour, and repeat sandblasting three times;

[0065] III. Place the metal substrate with a graphene layer obtained in Step II into a plasma chemical vapor deposition device for plasma bombardment; after the graphene layer on the surface of the metal substrate undergoes mild plasma bombardment, partial carbon-carbon bond breakage occurs in the graphene, generating defects, achieving nano-scale etching, and transforming the graphene layer into a graphene lattice structure;

[0066] The plasma bombardment process is as follows: evacuate the plasma chemical vapor deposition device to a pressure of 5 Pa, introduce argon and hydrogen, then adjust the gas pressure in the plasma chemical vapor deposition device to 100 Pa, heat up to 900 °C, and after reaching the temperature, turn on the radio frequency power supply and perform plasma bombardment for 4 minutes;

[0067] The power of the radio frequency power supply is 80 W;

[0068] The gas flow rate of argon is 20 sccm, and the gas flow rate of hydrogen is 20 sccm;

[0069] IV. Repeat Step II and Step III until a graphene layer with a thickness of 20 μm is obtained on the surface of the metal substrate;

[0070] V. Place the metal substrate with a graphene layer obtained in Step IV into a plasma chemical vapor deposition device, introduce methane, argon, and hydrogen, adjust the gas pressure in the device to 100 Pa, adjust the temperature to 900 °C, turn on the radio frequency power supply, and perform graphene deposition; during the graphene deposition process, use the porous graphene layer on the metal substrate obtained in Step IV as a template, and the chemically vapor-deposited graphene grows in the pores of the porous graphene layer, with the growth direction perpendicular to the original graphene layer. The growth of the generated graphene in the pores of the porous graphene layer further reduces the pores of the porous graphene layer, resulting in a three-dimensional porous graphene layer with even tinier pores; the pores of the three-dimensional porous graphene layer reach the nano-scale and have superhydrophobic properties;

[0071] The power of the radio frequency power supply is 240 W, and the deposition time is 6 minutes;

[0072] The flow rate of methane is 30 sccm, the flow rate of argon is 30 sccm, and the flow rate of hydrogen is 40 sccm;

[0073] VI. Place the metal substrate with a three-dimensional porous graphene layer obtained in Step V into a reaction kettle filled with dopamine aqueous solution and react for 2 hours, with the pressure in the reaction kettle being 15 MPa; then add chlorosilane and react for another 2 hours under a pressure of 15 MPa. After the reaction is completed, take it out and dry it, and it is finished; infiltrate the three-dimensional porous graphene layer under a pressure of 15 MPa, and chlorosilane forms a secondary superhydrophobic layer inside and on the surface of the porous graphene layer;

[0074] The concentration of the dopamine is 150 g / L;

[0075] The mass ratio of the dopamine to the chlorosilane is 1:0.15.

[0076] The surface water contact angle of the superhydrophobic material prepared in Example 2 reaches 163.5°. The surface of the superhydrophobic material is polished with 1000# sandpaper, and the polished thicknesses are 5 and 10 μm. After testing, the surface water contact angles of the polished superhydrophobic material are 164.2° and 166.4°, indicating that the three-dimensional hydrophobic structure prepared in this example still has the same hydrophobic ability inside after friction loss, improving the service life of the hydrophobic layer.

Claims

1. A method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate, characterized in that: The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate is carried out according to the following steps:

1. After the metal substrate is pre-treated by cutting, grinding and polishing, ultrasonic pre-cleaning is performed using acetone, alcohol and deionized water in sequence to clean the surface to obtain a pre-treated metal substrate; 2. sandblasting the surface of the metal substrate to obtain a metal substrate with a graphene layer; after the sandblasting, multilayer graphene is obtained on the surface of the metal substrate; The sandblasting process is as follows: the sandblasting material used in the sandblasting is high-purity graphite, the particle size is 150-200 mesh, and the sandblasting speed is 25-30m 2 / h, repeat sandblasting 3 times; 3. placing the metal substrate with the graphene layer obtained in step 2 in a plasma chemical vapor deposition device for plasma bombardment; The plasma bombardment process is as follows: evacuate the plasma chemical vapor deposition device to a pressure of 5 Pa, introduce argon and hydrogen, then adjust the gas pressure in the plasma chemical vapor deposition device to 100 Pa, raise the temperature to 850° C. to 900° C., turn on the radio frequency power supply after reaching the temperature, and perform plasma bombardment for 3 to 5 minutes; 4. Repeat steps 2 and 3 until a graphene layer with a thickness of 10 to 20 μm is obtained on the surface of the metal substrate; 5. placing the metal substrate with the graphene layer obtained in step 4 in a plasma chemical vapor deposition device, introducing methane, argon and hydrogen, adjusting the gas pressure in the device to 100 Pa, adjusting the temperature to 850° C. to 930° C., turning on the radio frequency power supply, and depositing graphene; 6. Place the metal substrate with a three-dimensional porous graphene layer obtained in step 5 in a reactor filled with dopamine aqueous solution and react for 1 to 2 hours at a pressure of 10 to 15 MPa; then add chlorosilane and react for 1 to 2 hours at a pressure of 10 to 15 MPa. After the reaction is completed, take it out and dry it.

2. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: The metal substrate in step 1 is stainless steel, carbon steel, aluminum alloy or copper alloy.

3. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: The grinding described in step 1 uses sandpaper of no less than 800#.

4. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: The sandblasting process in step 2 is as follows: the sandblasting material used in the sandblasting is high-purity graphite with a particle size of 150 mesh and a sandblasting speed of 30m 2 / h, repeat sandblasting 3 times.

5. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: The power of the RF power supply in step 3 is 70-90W.

6. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: In step 3, the flow ratio of argon and hydrogen is 1:

1.

7. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: In step 5, the power of the radio frequency power supply is 210-250 W, and the deposition time is 5-8 min.

8. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: In step 5, the flow rate of methane is 20 sccm to 40 sccm, the flow rate of argon is 10 sccm to 50 sccm, and the flow rate of hydrogen is 40 to 50 sccm.

9. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: The concentration of dopamine in step six is ​​100-150 g / L.

10. The method for preparing a three-dimensional wear-resistant super-hydrophobic layer on a metal substrate according to claim 1, characterized in that: In step six, the mass ratio of dopamine to chlorosilane is 1:0.1-0.15.

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