Reaction container of chemical vapor deposition equipment, driving system and use method

Abstract

The invention relates to a reaction container of chemical vapor deposition equipment, a driving system and a using method. The reaction container comprises the reaction container, a connecting mechanism and a driving device. The reaction container is used for providing a reaction space for a chemical vapor deposition reaction. The connecting mechanism comprises at least two connecting assemblies which are arranged on one outer surface of the reaction container. The driving device comprises a rotating power source and a first driving shaft. The first driving shaft is connected to the rotating power source, the at least two plug connectors are connected to the first driving shaft, and the rotating power source can drive the plug connectors to rotate in the circumferential direction through the first driving shaft. The at least two connecting assemblies are arranged corresponding to the two plug connectors so that the driven plug connectors can be connected or disconnected in a one-to-one correspondence mode. The connecting mechanism is driven by the driving device, so that the connecting mechanism drives the reaction container to move, and the reaction container moves in the reaction system.

Description

Technical Field

[0001] This patent relates to the field of chemical vapor deposition, and in particular to a reaction container, a drive system and a method of use of a chemical vapor deposition device. Background Art

[0002] Silicon carbide is a representative ceramic material that has been widely used in the entire industrial field due to its excellent physical, chemical and electrical properties.

[0003] In recent years, as the development of semiconductor processing components using silicon carbide materials has been actively progressing, the importance of silicon carbide materials has been increasing. In particular, silicon carbide materials are widely used as components for etching processes in semiconductor process components due to their high plasma resistance.

[0004] Silicon carbide materials used for semiconductor etching process parts are made by the traditional method of manufacturing silicon carbide. Since the quality and performance cannot be met by this method, it is manufactured by chemical vapor deposition.

[0005] Chemical vapor deposition of silicon carbide uses a mixture of Si-containing gases such as SiH4, SiCl2, SiCl4 and C-containing gases such as C2H2, CH4, C3H8 as raw material gases, or CH3SiCl3, CH3SiH3,

[0006] (CH3)3SiH) etc. There are some deposition methods using monolithic raw materials, and the manufacture of silicon carbide materials by chemical vapor deposition has the disadvantage of low productivity because the process is carried out in a batch heating furnace.

[0007] In order to improve the efficiency of the reaction, the intermittent heating furnace needs to be replaced by a continuous one, but how to achieve transportation within the continuous reaction system has become a major problem. Summary of the invention

[0008] In order to solve or at least partially solve the above technical problems, this patent provides a reaction container, a driving system and a method of use of a chemical vapor deposition device.

[0009] A driving system for a reaction vessel of a chemical vapor deposition device comprises: a reaction vessel, a connecting mechanism and a driving device. The reaction vessel is used to provide a reaction space for a chemical vapor deposition reaction. The connecting mechanism comprises at least two connecting components, which are arranged on an outer surface of the reaction vessel. The driving device comprises a rotating power source and a first driving shaft. The first driving shaft is connected to the rotating power source, and at least two connectors are connected to the first driving shaft. The rotating power source can drive the connectors to rotate in a circumferential direction through the first driving shaft. At least two connecting components are arranged correspondingly to the two connectors so that the driven connectors can be connected or disconnected one by one.

[0010] Preferably, the connecting assembly includes: a cover plate and a connecting portion, the cover plate is connected to the outer surface of the reaction container through the connecting portion, and a receiving groove is formed between the cover plate and the outer surface of the reaction container, and the outer surface shape of the connector is adapted to the receiving groove so as to be inserted into or removed from the receiving groove.

[0011] Preferably, the cross section of the receiving groove parallel to the outer surface of the reaction container is a part of a circle, and the central angle of the cross section is less than 180 degrees. The outer surface shape of the plug-in component is a part of a circle in the cross section parallel to the cover plate, and the cross section area of ​​the plug-in component is less than or equal to the cross section area of ​​the receiving groove parallel to the outer surface of the reaction container.

[0012] Preferably, the number of connection components is 2-10, and the connection components are evenly distributed along the circumference of several concentrically arranged first virtual circles on the outer surface of the reaction container. The plug-in components are evenly distributed along the circumference of several concentrically arranged second virtual circles, and each second virtual circle is arranged corresponding to the first virtual circle.

[0013] Preferably, the first driving shaft comprises: a shaft body and a transmission gear sleeved on the shaft body. The rotating power source comprises: a motor, a driving gear sleeved on the output shaft of the motor, and the driving gear meshes with the transmission gear to drive the shaft body to rotate.

[0014] Preferably, the driving device further comprises: a linear power source and a second driving shaft. The second driving shaft is sleeved on the first driving shaft, and the first driving shaft can rotate freely relative to the second driving shaft. The linear power source can drive the connector to move closer or farther along a direction perpendicular to the outer surface of the reaction container provided with the connecting assembly through the second driving shaft and the first driving shaft, so as to drive the reaction container to move when the connector is connected to the connecting assembly.

[0015] Preferably, the linear power source is a gas rod or a hydraulic rod. The rotary power source also includes a sliding base. The motor is arranged on the sliding base, and the sliding base is connected to the second drive shaft. The sliding base is driven by the second drive shaft and moves synchronously with the second drive shaft. The chemical vapor deposition equipment reaction system also includes a guide rail, which is arranged along the length direction of the first drive shaft, and the reaction container is arranged on the guide rail and moves along the guide rail. The sliding base is also arranged on the guide rail and moves along the guide rail.

[0016] Preferably, a rolling groove is provided on one side of the connector facing the reaction container. The driving system of the reaction container of the chemical vapor deposition device also includes a rolling ball. The rolling ball is clamped in the rolling groove, the rolling ball can roll in the rolling groove, and a part of the rolling ball is exposed outside the rolling groove.

[0017] Preferably, the driving system of the reaction container of the chemical vapor deposition equipment further includes a control module and at least one first sensor.

[0018] At least one first sensor is arranged in the rolling groove to send a contact completion signal to the control module after the first sensor contacts the rolling ball.

[0019] Preferably, the driving system of the reaction vessel of the chemical vapor deposition equipment further includes a control module, a plurality of first sensors and a plurality of second sensors. The plurality of first sensors are communicatively connected to the control module, and the plurality of first sensors are arranged on a side of the connector facing the reaction vessel, so that when the connector abuts against the reaction vessel, a contact completion signal is sent to the control module. The plurality of second sensors are communicatively connected to the control module, and the plurality of second sensors are arranged in the connection assembly, so that when the connector is connected to the connection assembly, a docking completion signal is sent to the control module.

[0020] An embodiment of the present invention further discloses a reaction system of a chemical vapor deposition device. The reaction system of the chemical vapor deposition device includes a driving system of a reaction container of the chemical vapor deposition device.

[0021] An embodiment of the present invention further discloses a method for using a driving system of a reaction container of a chemical vapor deposition device, the method comprising:

[0022] In response to the first docking signal, the driving device is started, so that the first driving shaft drives the connector to move toward the reaction container.

[0023] In response to the completion contact signal, the driving device is stopped and the rotation power source is started to rotate the connector, and the contact signal is generated when the connector contacts the reaction container and the first type of sensor sends a completion contact signal.

[0024] In response to the docking completion signal, the rotation power source is stopped, and the docking completion signal is generated when the plug-in component is connected to the connecting component and the second sensor sends the docking completion signal.

[0025] Restart the driving device to drive the first driving shaft to push the reaction container to move.

[0026] Preferably, after the step of restarting the driving device to drive the first driving shaft to push the reaction container to move, the method further includes:

[0027] In response to a first separation signal, the rotary power source is started to rotate the first drive shaft to separate the connector from the connecting component. The first separation signal is generated by the light sensor when it is detected that the reaction container reaches the target position.

[0028] After the first driving shaft rotates by a preset angle, the rotating power source is stopped.

[0029] The driving device is started to make the first driving shaft drive the connector to move in a direction away from the reaction container.

[0030] Compared with the prior art, the driving device of the present application is connected to the reaction container through a connecting mechanism, and the driving device drives the reaction container to move along a preset direction. At the same time, through the setting of the connecting mechanism, a better movable connection is achieved between the driving device and the reaction container, and the external force output by the driving device is transmitted through the connecting mechanism, so that the reaction container can be evenly stressed, ensuring that the reaction container moves forward smoothly under the drive of the driving device, and avoiding the rotation of the reaction container during the movement. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the implementation of this patent, the following is a brief introduction to the relevant drawings. It can be understood that the drawings described below are only used to illustrate some implementations of this patent, and ordinary technicians in this field can also obtain many other technical features and connection relationships not mentioned in this article based on these drawings.

[0032] Figure 1 It is a three-dimensional schematic diagram of a driving system of a reaction container of a chemical vapor deposition device in an embodiment of the present patent;

[0033] Figure 2 It is a three-dimensional schematic diagram of a driving system of a reaction container of a chemical vapor deposition device in an embodiment of the present patent;

[0034] Figure 3 It is a three-dimensional schematic diagram of a driving system of a reaction container of a chemical vapor deposition device in an embodiment of the present patent;

[0035] Figure 4 It is a three-dimensional schematic diagram of a driving device of an embodiment of the present patent;

[0036] Figure 5 It is a three-dimensional schematic diagram of a reaction vessel of a chemical vapor deposition device according to an embodiment of the present patent;

[0037] Figure 6 It is a three-dimensional schematic diagram of a reaction vessel of a chemical vapor deposition device according to an embodiment of the present patent;

[0038] Figure 7 It is a control module diagram of a driving system of a reaction container of a chemical vapor deposition device in an embodiment of the present patent;

[0039] Figure 8 This is a flow chart of a method for using a driving system of a reaction vessel of a chemical vapor deposition device according to an embodiment of the present patent.

[0040] Description of reference numerals:

[0041] 1. Reaction container; 2. Connecting mechanism; 21. Connecting assembly; 210. Connecting part; 220. Cover plate; 230. Accommodating groove; 3. Driving device; 31. First driving shaft; 32. Rotating power source; 33. Linear power source; 34. Sliding base; 311. Connector; 312. Shaft; 313. Transmission gear; 314. Second driving shaft; 4. Guide rail; 5. Rolling ball. DETAILED DESCRIPTION

[0042] The patent is described in detail below in conjunction with the accompanying drawings.

[0043] refer to Figure 5 , Figure 6 It can be seen that the chemical vapor deposition reaction system equipment set up to improve the chemical vapor deposition reaction efficiency can be set up with three different workstations, and the three workstations respectively perform different treatments on the reaction container 1. Figure 5 or Figure 6 We can clearly see that since the three stations need to perform different work processes, in order to prevent the stations from affecting each other during work, the stations need to be isolated from each other by gates. Therefore, the movement of the reaction vessel 1 between the three stations of the reaction system has become the primary problem that the chemical vapor deposition reaction system needs to solve.

[0044] In addition, through Figure 5 We can find that in the middle station of the chemical vapor deposition reaction system, gas needs to be introduced into the reaction vessel 1 to realize the reaction inside the reaction vessel 1. In order to enable the external gas supply component to dock with the reaction vessel 1 smoothly, it is necessary to keep the orientation of the reaction vessel 1 accurate. In other words, when docking the gas supply pipeline, the docking side wall of the reaction vessel 1 needs to be kept vertical with the gas supply pipeline of the gas supply component to ensure that the gas supply pipeline can be docked with the reaction vessel 1 smoothly.

[0045] In order to meet the docking requirements between the reaction container 1 and the gas supply assembly, the reaction container 1 needs to maintain an accurate orientation during movement to prevent the reaction container 1 from deflecting when moving in the reaction system, thereby further preventing the orientation of the reaction container 1 from deviating.

[0046] In view of this, the embodiment of this patent proposes a driving system for a reaction vessel 1 of a chemical vapor deposition device to solve the above technical problems.

[0047] First embodiment

[0048] like Figure 1 , Figure 2 , Figure 3The embodiment of the present invention shown discloses a driving system for a reaction vessel 1 of a chemical vapor deposition device, comprising: a reaction vessel 1, a connecting mechanism 2 and a driving device 3. The reaction vessel 1 is used to provide a reaction space for a chemical vapor deposition reaction. The connecting mechanism 2 comprises at least two connecting components 21, which are arranged on an outer surface of the reaction vessel 1. The driving device 3 comprises a rotating power source 32 and a first driving shaft 31. The first driving shaft 31 is connected to the rotating power source 32, and at least two connectors 311 are connected to the first driving shaft 31. The rotating power source 32 can drive the connector 311 to rotate in the circumferential direction through the first driving shaft 31. At least two connecting components 21 are arranged correspondingly to the two connectors 311 so that the driven connectors 311 are connected or disconnected one by one.

[0049] During the movement of the reaction vessel 1, the driving device 3 needs to be docked with the connecting mechanism 2 arranged on the reaction vessel 1, and the reaction vessel 1 is driven to move by the driving device 3. The connecting components 21 of at least two connecting mechanisms 2 are arranged on the outer surface of the reaction vessel 1. During the docking process between the driving device 3 and the reaction vessel 1, each connecting component 21 needs to be connected with the corresponding plug-in connector 311 on the driving device 3. Specifically, the connecting components 21 are distributed on the outer surface of the reaction vessel 1. When docking is required, the plug-in connector 311 arranged on the first driving shaft 31 will follow the first driving shaft 31 to move toward the reaction vessel 1 until the first driving shaft 31 abuts against the outer surface of the reaction vessel 1. The rotating power source 32 drives the first driving shaft 31 to rotate around its axis, and the plug-in connector 311 arranged on the first driving shaft 31 will rotate with the first driving shaft 31, and at this time, each plug-in connector 311 will dock with the connecting component 21. When the first driving shaft 31 advances along the movement direction of the reaction vessel 1, it will push the reaction vessel 1 to move together. Since the driving device 3 is connected to the reaction container 1 by docking the connecting component 21 with the connector 311, the driving device 3 will not be separated from the reaction container 1 during the process of the driving device 3 pushing the reaction container 1 to move. It can be understood that the posture of the reaction container 1 is not easily shifted due to the action of the driving device 3.

[0050] Furthermore, there are multiple connecting components 21, so after the driving device 3 is docked, multiple points of contact will be achieved between the driving device 3 and the reaction vessel 1. At this time, the external force from the driving device 3 on the reaction vessel 1 will be more uniform, so that when the reaction vessel 1 moves along the target trajectory through each station, its orientation is unlikely to change, thereby ensuring that when the reaction vessel 1 is performing a vapor deposition reaction, the gas supply pipeline of the gas supply component is smoothly docked with the reaction vessel 1, ensuring the smooth progress of the chemical vapor deposition reaction.

[0051] In addition, if Figure 1As shown in the embodiment of the present invention, the connecting component 21 includes: a cover plate 220 and a connecting portion 210, the cover plate 220 is connected to the outer surface of the reaction container 1 through the connecting portion 210, and a receiving groove 230 is formed between the cover plate 220 and the outer surface of the reaction container 1, and the outer surface shape of the connector 311 is adapted to the receiving groove 230 so as to be inserted into or removed from the receiving groove 230.

[0052] In the process of chemical vapor deposition (CVD), the sealing and stability of the reaction vessel 1 are crucial. CVD, as a technology for depositing thin films on the surface of substrates, is widely used in the fields of semiconductor manufacturing, photovoltaic industry and coating technology. In order to ensure the smooth progress of the reaction process, the reaction vessel 1 needs to remain stable under high temperature and low pressure environment, and be closely connected with the gas supply system and exhaust system. Therefore, when the driving device 3 drives the reaction vessel 1 to the target station, the driving device 3 needs to be separated from the reaction vessel 1 to leave the reaction vessel 1 alone in the station. Therefore, the connecting component 21 needs to be able to achieve a movable connection with the driving device 3, while ensuring that the connecting component 21 and the driving device 3 will not be separated during the movement. The receiving groove 230 formed by the cover plate 220 and the connecting portion 210 can be used to accommodate and allow the plug-in 311 to extend into, and the plug-in 311 is limited by the receiving groove 230, so as to avoid the separation problem of the driving device 3 during the driving process. The opening direction of the receiving groove 230 is perpendicular to the movement direction of the reaction vessel 1, so that during the movement of the reaction vessel 1, the connection between the driving device 3 and the connecting mechanism 2 is not easily affected. When the driving device 3 is disconnected from the connecting mechanism 2 , the orientation of the reaction container 1 is not easily affected, thereby ensuring the orientation of the reaction container 1 during the movement.

[0053] Further, if Figure 1 and Figure 3 As shown, the cross section of the receiving groove 230 parallel to the outer surface of the reaction vessel 1 is a part of a circle, and the center angle of the cross section is less than 180 degrees. The outer surface shape of the connector 311 is a part of a circle in the cross section parallel to the cover plate 220, and the cross section area of ​​the connector 311 is less than or equal to the cross section area of ​​the receiving groove 230 parallel to the outer surface of the reaction vessel 1. The number of connecting components 21 is 2-10, and the connecting components 21 are evenly distributed along the circumferential direction of several concentrically arranged first virtual circles on the outer surface of the reaction vessel 1. The connectors 311 are evenly distributed along the circumferential direction of several concentrically arranged second virtual circles, and each second virtual circle is arranged corresponding to the first virtual circle.

[0054] It is not difficult to infer from the above contents that the cross section of a receiving groove 230 formed by the cover plate 220 and the connecting portion 210 is a part of a circle with a central angle less than 180 degrees, so that the side walls on both sides of the opening of the receiving groove 230 are both arcs close to each other. When the plug-in component 311 is inserted into the receiving groove 230 for docking, the plug-in component 311 may generate slight friction with the side walls of the receiving groove 230. At this time, the side walls on both sides of the opening of the receiving groove 230 can guide the plug-in component 311 to slide into the interior to complete the docking between the plug-in component 311 and the connecting component 21.

[0055] At the same time, the connection components 21 are evenly distributed according to a plurality of concentrically arranged first virtual circles, and the location of the connection components 21 is the point of action of the force exerted by the driving device 3 on the outer surface of the reaction container 1. At this time, the driving force exerted by the driving device 3 on the reaction container 1 can be dispersed outward from the center of the first virtual circle and evenly distributed on the outer surface of the reaction container 1. At this time, the force exerted on the surface of the reaction container 1 is more uniform and dispersed, avoiding the deviation of the orientation of the reaction container 1 caused by excessive force at a certain point.

[0056] Since multiple connection components 21 can be distributed on different concentric first virtual circles, the distribution of the connection components 21 becomes more uniform compared to a single virtual circle. Further, the connector 311 is distributed according to several concentric second virtual circles, so when the first drive shaft 31 rotates, the connector 311 connected to the first drive shaft 31 will rotate at the same time. Since the second virtual circle corresponds to the first virtual circle, and each connector 311 is evenly distributed on the second virtual circle, during the docking process of the drive device 3 and the connection mechanism 2, when the first drive shaft 31 rotates, the docking between all the connectors 311 and the connection components 21 can be achieved, thereby improving the docking efficiency between the drive device 3 and the connection mechanism 2. In some embodiments, the connection components 21 located on several first virtual circles are staggered, and similarly, the connectors 311 corresponding to the several second virtual circles are also staggered. Through such a distribution setting, the external force applied by the drive device 3 to the surface of the reaction vessel 1 can be more evenly dispersed to ensure that the orientation of the reaction vessel 1 during the movement is stable.

[0057] like Figure 4As shown, in an embodiment of the present invention, the first drive shaft 31 includes: a shaft body 312 and a transmission gear 313 sleeved on the shaft body 312. The rotational power source 32 includes: a motor, a drive gear is sleeved on the output shaft of the motor, and the drive gear is engaged with the transmission gear 313 to drive the shaft body 312 to rotate. Specifically, the drive device 3 also includes: a linear power source 34 and a second drive shaft 314. The second drive shaft 314 is sleeved on the first drive shaft 31, and the first drive shaft 31 can rotate freely relative to the second drive shaft 314. The linear power source 34 can drive the connector 311 to move closer or farther along the direction perpendicular to the outer surface of the reaction container 1 provided with the connecting assembly 21 through the second drive shaft 314 and the first drive shaft 31, so as to drive the reaction container 1 to move when the connector 311 is connected to the connecting assembly 21.

[0058] It is not difficult to infer from the above content that the first drive shaft 31 needs to drive each connector 311 to rotate together so that the connector 311 can be inserted into the receiving groove 230 of the connecting assembly 21 to achieve docking. Therefore, when the motor of the rotating power source 32 is working, the driving gear sleeved on the output shaft of the motor can drive the transmission gear 313 to rotate, and at this time, the transmission gear 313 can drive the shaft body 312 to rotate together. Driven by the shaft body 312, the connectors 311 uniformly arranged on the first drive shaft 31 can be smoothly inserted into the receiving groove 230. In addition, the rotation angle of the first drive shaft 31 needs to be accurately controlled during the docking of the driving device 3 with the docking mechanism to meet the rotation angle of each connector 311. The rotation angle of the motor can be accurately controlled, thereby ensuring the rotation angle of the first drive shaft 31 to ensure docking accuracy.

[0059] Further, the driving device 3 needs to drive the reaction vessel 1 to move along a straight line, and the linear power source 34 can drive the second drive shaft 314 to move along a straight line, and at the same time drive the first drive shaft 31 that is mutually sleeved with the second drive shaft 314 to move. The plug-in connector 311 connected to the first drive shaft 31 is connected to the docking assembly arranged on the reaction vessel 1, and the reaction vessel 1 can be pushed by the first drive shaft 31 and move along a straight line to meet the movement between various stations in the reaction system. The first drive shaft 31 and the second drive shaft 314 that are sleeved with each other can generate relative rotation between them, so that the first drive shaft 31 drives each plug-in connector 311 to rotate and realize the docking with the reaction vessel 1. In this embodiment, the first drive shaft 31 is sleeved on the outside of the second drive shaft 314, and of course, in other embodiments, the second drive shaft 314 can also be sleeved on the outside of the first drive shaft 31.

[0060] In addition, the linear power source 34 is a gas rod or a hydraulic rod. The rotational power source 32 also includes a sliding base 34. The motor is arranged on the sliding base 34, and the sliding base 34 is connected to the second drive shaft 314. The sliding base 34 is driven by the second drive shaft 314 and moves synchronously with the second drive shaft 314. The chemical vapor deposition equipment reaction system also includes a guide rail 4, which is arranged along the length direction of the first drive shaft 31, and the reaction vessel 1 is arranged on the guide rail 4 and moves along the guide rail 4. The sliding base 34 is also arranged on the guide rail 4 and moves along the guide rail 4.

[0061] It is not difficult to infer from the above content that the sliding base 34 is used to fix the motor that drives the first drive shaft 31 to rotate. In the process of the driving device 3 driving the reaction container 1 to move, the first drive shaft 31 mutually sleeved with the second drive shaft 314 will move together with the second drive shaft 314, and the second drive shaft 314 will move along a straight line under the drive of the linear power source 34. The sliding base 34 connected to the second drive shaft 314 and the first drive shaft 31 mutually sleeved with the second drive shaft 314 will move together with the extension and contraction of the second drive shaft 314, thereby realizing the synchronous movement of the motor set on the sliding base 34 and the first drive shaft 31, and the motor can always drive the rotation of the first drive shaft 31 to meet the docking or undocking between the driving device 3 and the reaction container 1. Because the linear power source 34 not only needs to promote the movement of the first drive shaft 31 and the second drive shaft 314, but also needs to promote the reaction container 1 to move along a fixed straight line direction. Therefore, the linear power source 34 needs to have a sufficiently large output force, and the linear power source 34 using a gas rod or a hydraulic rod can meet the movement of the reaction vessel 1 to ensure that the reaction vessel 1 moves between various stations to complete the reaction work. Furthermore, the guide rail 4 arranged along the movement direction of the reaction vessel 1 can reduce the resistance of the reaction vessel 1 during the movement along the guide rail 4. The guide rail 4 has rollers, and the rollers on the guide rail 4 will rotate during the translation of the reaction vessel 1, thereby reducing the friction between the guide rail 4 and the reaction vessel 1. At the same time, the guide rail 4 has a guiding effect on the movement direction of the reaction vessel 1, which can make the reaction vessel 1 move in the correct direction to improve the accuracy of the movement of the reaction vessel 1.

[0062] like Figure 2 , Figure 4 As shown, in the embodiment of the present invention, a rolling groove is provided on one side of the connector 311 facing the reaction container 1. The driving system of the reaction container 1 of the chemical vapor deposition device also includes a rolling ball 5. The rolling ball 5 is clamped in the rolling groove, the rolling ball 5 can roll in the rolling groove, and a part of the rolling ball 5 is exposed outside the rolling groove.

[0063] It is not difficult to infer from the above contents that when the driving device 3 is connected to the connecting mechanism 2, the rolling ball 5 will abut against the outer surface of the reaction vessel 1. When the first driving shaft 31 rotates to drive the plug-in connector 311 to rotate, the rolling ball 5 and the side wall of the reaction vessel 1 will also rotate. The arrangement of the rolling ball 5 avoids direct contact between the plug-in connector 311 and the surface of the reaction vessel 1, reduces the friction between the first driving shaft 31 and the reaction vessel 1 during the rotation process, and reduces the rotation resistance of the first driving shaft 31. It is convenient for the first driving shaft 31 to drive the plug-in connector 311 to be smoothly inserted into the receiving groove 230, and complete the docking between the driving device 3 and the connecting mechanism 2.

[0064] Furthermore, the driving system of the reaction vessel 1 of the chemical vapor deposition device further comprises a control module and at least one first sensor. The first sensor is arranged in the rolling groove to send a contact completion signal to the control module after the first sensor abuts against the rolling ball 5 .

[0065] It is not difficult to conclude from the above contents that when the rolling ball 5 abuts against the outer wall of the reaction vessel 1, the rolling ball 5 will be compressed inwardly, thereby squeezing the first sensor arranged in the rolling groove and triggering the first sensor. At this time, it indicates that the plug-in connector 311 arranged on the first driving shaft 31 has completed the contact with the reaction vessel 1, and the first sensor can send a signal to the control module so as to rotate the first driving shaft 31 in the next step to insert the plug-in connector 311 into the receiving groove 230 to complete the docking. It is avoided that the first driving shaft 31 starts to rotate before it contacts the reaction vessel 1, which ensures the docking success rate between the driving device 3 and the docking mechanism and avoids docking errors.

[0066] Second embodiment

[0067] In the first embodiment, a rolling ball 5 is provided on the first drive shaft 31, and the first drive shaft 31 is judged to be in contact with the reaction container 1 by squeezing the rolling ball 5, and the first drive shaft 31 is driven to rotate to complete docking according to the contact result between the first drive shaft 31 and the reaction container 1. However, the first embodiment does not make a judgment on the docking result, and the driving device 3 needs to drive the reaction container 1 to operate after the docking is completed.

[0068] In view of this, in the second embodiment of the present invention, Figure 7The driving system of the reaction vessel 1 of the chemical vapor deposition device shown also includes a control module, a plurality of first sensors and a plurality of second sensors. The plurality of first sensors are connected to the control module in communication, and the plurality of first sensors are arranged on a side of the connector 311 facing the reaction vessel 1, so as to send a contact completion signal to the control module when the connector 311 abuts against the reaction vessel 1. The plurality of second sensors are connected to the control module in communication, and the plurality of second sensors are arranged in the connection component 21, so as to send a docking completion signal to the control module when the connector 311 is connected to the connection component 21.

[0069] It is not difficult to deduce from the above content that when the connector 311 contacts the side wall of the reaction vessel 1 under the drive of the first drive shaft 31, the first sensor arranged on the connector 311 will be triggered. The first sensor after triggering will send a signal to the control module, indicating that the first drive shaft 31 can perform rotation docking work at this time. The first drive shaft 31 drives the connector 311 to rotate so that the connector 311 is inserted into the accommodating cavity of the docking assembly. When the connector 311 triggers the second sensor arranged in the connecting assembly 21, it indicates that the connector 311 has completed docking with the docking assembly. At this time, the reaction vessel 1 can be smoothly pushed to move along the preset direction by the first drive shaft 31, avoiding the error and failure in the movement process of the driving device 3 pushing the reaction vessel 1 after the connector 311 and the docking assembly have not been completely docked, thereby avoiding driving the first drive shaft 31 in advance due to the fact that the connector 311 and the docking assembly have not been completely docked.

[0070] More specifically, the first sensor can be a pressure sensor, and a preset pressure value is set in the control module. When the pressure on the pressure sensor exceeds the preset value, it indicates that the connector 311 is in contact with the surface of the reaction vessel 1. When the connector 311 is in contact with the surface of the reaction vessel 1, the first drive shaft 31 can be rotated to dock the connector 311 with the docking assembly. The second sensor can also be a pressure sensor, and is set in the receiving groove 230 of the docking assembly. When the connector 311 extends into the receiving groove 230 and contacts the pressure sensor in the receiving groove 230, it indicates that the connector 311 has completed docking with the docking assembly and can push the reaction vessel 1.

[0071] Third embodiment

[0072] The third embodiment of the present invention further discloses a reaction system of a chemical vapor deposition device. The reaction system of the chemical vapor deposition device includes the driving system of the reaction container 1 of the chemical vapor deposition device mentioned above.

[0073] By setting up a driving system for the reaction vessel 1 of the chemical vapor deposition equipment, the reaction vessel 1 can move between various stations in the chemical vapor deposition equipment. At the same time, the driving system can ensure the posture of the reaction vessel 1 in each station, so that when gas needs to be injected into the reaction vessel 1, the posture and direction of the reaction vessel 1 can always be kept accurate, ensuring the docking between the gas supply component and the reaction vessel 1.

[0074] Based on the above supply system reference Figure 8 As shown, an embodiment of the present invention further discloses a method for using a driving system of a reaction vessel 1 of a chemical vapor deposition device, the method comprising:

[0075] In response to the first docking signal, the driving device 3 is started, so that the first driving shaft 31 drives the connector 311 to move toward the reaction container 1 .

[0076] In response to the contact completion signal, the driving device 3 is stopped and the rotation power source 32 is started to rotate the connector 311. The contact signal is generated when the connector 311 contacts the reaction container 1, and the contact completion signal is sent by the first type of sensor.

[0077] In response to the docking completion signal, the rotation power source 32 is stopped. The docking completion signal is generated when the connector 311 is connected to the connecting assembly 21 and is sent by the second sensor.

[0078] The driving device 3 is restarted to drive the first driving shaft 31 to push the reaction container 1 to move.

[0079] When the reaction vessel 1 needs to be moved in the system, refer to Figure 5 , Figure 6 It can be seen that the gates on both sides of the reaction vessel 1 need to be lowered when the reaction is carried out at the station to ensure the airtightness inside the station during the reaction. Therefore, when the reaction vessel 1 needs to be moved, after the gates on both sides of the station where the reaction vessel 1 is located are opened, the control starts the drive device 3 so that the first drive shaft 31 of the drive device 3 moves toward the reaction vessel 1. After the drive device 3 contacts the outer wall of the reaction vessel 1, the first drive shaft 31 of the drive device 3 has reached the docking position, and the control drive rod device and the reaction vessel 1 are docked. After the completion of the docking is detected, the reaction vessel 1 can move together under the drive of the drive device 3, and the drive device 3 can drive the reaction vessel 1 to move toward the next target station. And because the drive device 3 has completed the docking with the reaction vessel 1, the degree of freedom of the reaction vessel 1 is limited by the drive device 3, so the movement of the reaction vessel 1 and the first drive shaft 31 will remain synchronized, and the orientation and posture of the reaction vessel 1 during the movement will not be affected.

[0080] Specifically, after the step of restarting the driving device 3 to drive the first driving shaft 31 to push the reaction container 1 to move, the method further includes:

[0081] In response to the first separation signal, the rotational power source 32 is started to rotate the first driving shaft 31 to separate the connector 311 from the connecting assembly 21. The first separation signal is generated by the light sensor when it is detected that the reaction container 1 reaches the target position.

[0082] After the first driving shaft 31 rotates by a preset angle, the rotating power source 32 stops.

[0083] The driving device 3 is started, so that the first driving shaft 31 drives the plug-in component 311 to move in a direction away from the reaction container 1 .

[0084] After the reaction vessel 1 is transported to the target station by using the driving device 3, the reaction vessel 1 needs to be reacted inside, so it is necessary to release the connection between the driving device 3 and the reaction vessel 1 so that the reaction vessel 1 can stay in the station alone. A light sensor is set at the station of the reaction vessel 1 to detect whether the reaction vessel 1 has reached the target position. When the light sensor detects that the reaction vessel 1 has reached the target position, a first separation signal can be issued. According to the first separation signal that the reaction vessel 1 has reached the station, the first drive shaft 31 is reversed so that the connector 311 is separated from the receiving groove 230, thereby completing the separation of the connector 311 from the docking assembly. When the first drive shaft 31 rotates a preset angle, it indicates that the connector 311 has been completely separated from the docking assembly. The driving device 3 is started to drive the first drive shaft 31 to retreat, and the first drive shaft 31 is away from the reaction vessel 1, so that the gates on both sides of the reaction system station can be naturally lowered, avoiding interference with the first drive shaft 31 to ensure the normal operation of the reaction system.

[0085] Finally, it should be noted that ordinary technicians in this field can understand that in order to make readers better understand this patent, the implementation methods of this patent propose many technical details. However, even without these technical details and various changes and modifications based on the above-mentioned implementation methods, the technical solutions claimed for protection by the claims of this patent can be basically realized. Therefore, in practical applications, various changes can be made to the above-mentioned implementation methods in form and details without departing from the spirit and scope of this patent.

Claims

1. A driving system for a reaction vessel of a chemical vapor deposition device, characterized in that: include: A reaction container, used to provide a reaction space for chemical vapor deposition reaction; The connection mechanism comprises: at least two connection components, which are arranged on an outer surface of the reaction container; The drive device comprises: Rotating power source; A first drive shaft connected to the rotational power source; At least two connectors are connected to the first drive shaft, and the rotary power source can drive the connectors to rotate in the circumferential direction through the first drive shaft; At least two of the connection assemblies are arranged correspondingly to the two plug connectors so that the driven plug connectors can be connected or disconnected in a one-to-one correspondence.

2. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 1, characterized in that: The connection component comprises: a cover plate and a connecting portion, wherein the cover plate is connected to the outer surface of the reaction container through the connecting portion, A receiving groove is formed between the cover plate and the outer surface of the reaction container; The outer surface shape of the plug connector is adapted to the receiving groove so as to be inserted into or removed from the receiving groove.

3. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 2, characterized in that: The cross section of the containing groove parallel to the outer surface of the reaction container is a part of a circle, and the central angle of the cross section is less than 180 degrees; The outer surface of the connector is a part of a circle in a cross section parallel to the cover plate, and the cross-sectional area of ​​the connector is less than or equal to the cross-sectional area of ​​the accommodating groove in a cross section parallel to the outer surface of the reaction container.

4. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 2, characterized in that: The number of the connection components is 2-10, and the connection components are evenly distributed along the circumferential direction of a plurality of concentrically arranged first virtual circles on the outer surface of the reaction container; The connectors are evenly distributed along the circumferential direction of a plurality of concentrically arranged second virtual circles, and each of the second virtual circles is arranged corresponding to the first virtual circle.

5. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 1, characterized in that: The first drive shaft comprises: A shaft body and a transmission gear sleeved on the shaft body; The rotary power source comprises a motor, an output shaft of the motor is sleeved with a driving gear, and the driving gear is meshed with the transmission gear to drive the shaft body to rotate.

6. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 5, characterized in that: The driving device further comprises: Linear power source; A second driving shaft, sleeved on the first driving shaft, the first driving shaft being able to freely rotate relative to the second driving shaft; The linear power source can drive the connector to move closer or farther along a direction perpendicular to the outer surface of the reaction container on which the connecting component is disposed through the second driving shaft and the first driving shaft, so as to drive the reaction container to move when the connector is connected to the connecting component.

7. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 6, characterized in that: The linear power source is a gas rod or a hydraulic rod; The rotary power source also includes: A sliding base, the motor is arranged on the sliding base, the sliding base is connected to the second driving shaft, and the sliding base is driven by the second driving shaft and moves synchronously with the second driving shaft; The chemical vapor deposition equipment reaction system also includes: A guide rail is arranged along the length direction of the first driving shaft, and the reaction container is arranged on the guide rail and moves along the guide rail; the sliding base is also arranged on the guide rail and moves along the guide rail.

8. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 1, characterized in that: A rolling groove is provided on one side of the connector facing the reaction container; The driving system of the reaction container of the chemical vapor deposition equipment also includes: A rolling ball is clamped in the rolling groove, the rolling ball can roll in the rolling groove, and a part of the rolling ball is exposed outside the rolling groove.

9. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 8, characterized in that: The driving system of the reaction container of the chemical vapor deposition equipment also includes: Control module; At least one first sensor is disposed in the rolling groove to send a contact completion signal to the control module after the first sensor and the rolling ball come into contact with each other.

10. The driving system of the reaction container of the chemical vapor deposition equipment according to claim 1, characterized in that: The driving system of the reaction container of the chemical vapor deposition equipment also includes: Control module; A plurality of first sensors are communicatively connected with the control module, and the plurality of first sensors are arranged on a side of the connector facing the reaction container, so as to send a contact completion signal to the control module when the connector abuts against the reaction container; A plurality of second sensors are communicatively connected with the control module, and the plurality of second sensors are arranged in the connection component so as to send a docking completion signal to the control module when the connector is connected with the connection component.

11. A reaction system of a chemical vapor deposition device, characterized in that: The reaction system of the chemical vapor deposition equipment comprises a driving system of a reaction container of the chemical vapor deposition equipment as claimed in any one of claims 1 to 10.

12. A method for using a driving system of a reaction container of a chemical vapor deposition device, characterized in that: The method of use includes: In response to the first docking signal, the driving device is started, so that the first driving shaft drives the connector to move toward the reaction container; In response to a contact completion signal, stopping the driving device and starting the rotational power source to rotate the connector, wherein the contact completion signal is generated by the first type of sensor when the connector contacts the reaction container; In response to a docking completion signal, stopping the rotational power source, wherein the docking completion signal is generated when the connector is connected to the connection assembly and is sent by the second sensor; Restart the driving device to drive the first driving shaft to push the reaction container to move.

13. The method for using the driving system of the reaction container of the chemical vapor deposition equipment according to claim 12, characterized in that: After restarting the driving device to drive the first driving shaft to push the reaction container to move, the method further includes: In response to a first separation signal, the rotary power source is started to rotate the first drive shaft to separate the connector from the connection assembly, wherein the first separation signal is generated by a light sensor when it is detected that the reaction container reaches a target position; After the first drive shaft rotates by a preset angle, stopping the rotation power source; The driving device is started to enable the first driving shaft to drive the connector to move in a direction away from the reaction container.

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