A butterfly valve and thin film deposition equipment

Abstract

The present invention provides a butterfly valve and a thin film deposition device, wherein the butterfly valve comprises a valve body, a valve plate and a cleaning member, wherein the valve body is provided with a channel; the valve plate is located in the channel and is rotatably connected to the valve body, and the valve plate is used to open or close the channel; the cleaning member is connected to the valve plate, and the cleaning member is arranged to extend along the circumference of the inner wall of the valve body, and an inclined ring is arranged on the outer side of the valve plate; wherein, when the self-cleaning function is started, the valve plate is rotated to drive the cleaning member to rotate closely against the inner wall of the valve body. The present application arranges a cleaning member in an inclined ring on the outer side of the valve plate, and the valve plate rotates to drive the cleaning member to rotate closely against the inner wall of the valve body, at which time the cleaning member acts as a scraper structure to scrape off impurities accumulated on the inner wall of the valve body; at the same time, when the cleaning member is arranged closely against the inner wall of the valve body along the circumference of the valve body, the cleaning member acts as a baffle structure to allow impurities to adhere to the cleaning member; the cleaning member is used to solve the problem of deposited dirt on the inner surface of the butterfly valve, thereby extending the service life of the butterfly valve and avoiding frequent maintenance, thereby improving the production time of the thin film deposition device.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor production, and in particular to a butterfly valve and thin film deposition equipment. Background Art

[0002] The pressure control butterfly valve is a valve that controls the medium pressure in the pipeline by rotating the valve plate; its working principle is similar to that of an ordinary butterfly valve, that is, the butterfly plate rotates around the valve shaft, thereby changing the flow area of ​​the medium in the pipeline, thereby achieving the purpose of controlling pressure.

[0003] However, the butterfly valve used in thin film deposition equipment is different from other butterfly valve equipment. In order to avoid dirt clogging and jamming the valve, a certain gap is maintained between the valve plate and the valve body. However, in order to ensure the pressure control effect, the gap cannot be too large. Generally, the gap between the valve plate and the valve body is between 0.025 and 0.1 mm. Since the thin film deposition equipment will produce a large amount of powder (mostly SIO) through the exhaust end during use, the residual gas upstream of the butterfly valve will react and adhere to the inner wall of the pipeline. After accumulation, the powder will peel off due to the suction force. Or the residual gas will react and adhere to the pressure control butterfly valve, making the valve plate gap smaller and smaller, affecting the pressure control effect, and even causing the valve plate to jam. In order to solve this problem, the existing equipment can only define maintenance cycles, disassemble the butterfly valve, and clean it manually. It is extremely time-consuming to stop the vacuum pump and backfill the equipment to normal pressure, thus affecting the production time of the equipment. Summary of the invention

[0004] The embodiments of the present invention provide a butterfly valve and a thin film deposition device to solve the problem of deposited dirt on the inner surface of the butterfly valve, extend the service life of the butterfly valve, avoid frequent maintenance, and thus improve the production time of the thin film deposition device.

[0005] The present invention provides a butterfly valve, comprising:

[0006] A valve body, wherein the valve body is provided with a passage;

[0007] A valve plate, the valve plate is located in the channel and is rotatably connected to the valve body, and the valve plate is used to open or close the channel;

[0008] A cleaning member, the cleaning member is connected to the valve plate, the cleaning member is extended along the circumference of the inner wall of the valve body, and is inclinedly annularly arranged on the outer side of the valve plate;

[0009] When the self-cleaning function is activated, the valve plate is rotated to drive the cleaning member to rotate closely against the inner wall of the valve body.

[0010] In the butterfly valve provided by the present invention, the cleaning member is a metal ring.

[0011] In the butterfly valve provided by the present invention, the cleaning member is a rubber ring.

[0012] In the butterfly valve provided by the present invention, the butterfly valve is provided with two cleaning members, one of which is a metal ring and the other is a rubber ring, and the two cleaning members are arranged on the outer side of the valve plate at different inclined angles.

[0013] In the butterfly valve provided by the present invention, the butterfly valve also includes a rotating shaft, which extends from one side of the valve body to the other side of the valve body along the radial direction of the valve body, the rotating shaft is rotatably connected to the valve body, and the rotating shaft is fixedly connected to the valve plate.

[0014] In the butterfly valve provided by the present invention, the rotating shaft is provided with a groove, the groove is extended along the length direction of the rotating shaft, and the groove is formed by an inward depression of one side of the rotating shaft, and the valve plate is embedded in the groove.

[0015] In the butterfly valve provided by the present invention, the upper end of the cleaning member is fixed between the upper end of the valve plate and the upper groove wall of the groove, and the lower end of the cleaning member is fixed between the lower end of the valve plate and the lower groove wall of the groove.

[0016] In the butterfly valve provided by the present invention, the valve plate is provided with a plurality of through holes distributed along its radial direction, the rotating shaft is provided with a plurality of fixing holes distributed along its length direction, and the butterfly valve also includes a plurality of locking members, one end of the locking member is locked and fixed by passing through the through holes and the fixing holes in sequence from one side of the valve plate.

[0017] In the butterfly valve provided by the present invention, the butterfly valve also includes a driving assembly, which is fixedly connected to the valve body. The valve body is also provided with a through hole, one end of the rotating shaft is connected to the driving assembly, and the other end extends through the through hole to the other side of the valve body.

[0018] The present invention also provides a thin film deposition device, which comprises the butterfly valve described in any one of the above items.

[0019] The present application arranges the cleaning member in an oblique ring on the outer side of the valve plate, and the cleaning member is extended along the circumferential direction of the inner wall of the valve body. When the self-cleaning function is started, the valve plate rotates to drive the cleaning member to rotate closely against the inner wall of the valve body, thereby scraping off impurities accumulated on the inner wall of the valve body to ensure the cleanliness of the inner wall of the valve body, avoid impurities falling during the production process to affect the product quality, and avoid excessive accumulation of impurities that may cause the valve plate to become stuck. At this time, the cleaning member acts as a scraper structure to scrape off the dirt; at the same time, when the valve plate is rotated to a specified position, the cleaning member is closely against the valve body along the circumference of the valve body. When the inner wall of the butterfly valve is arranged, the cleaning member also has a baffle function, and the residual reaction gas adheres to the cleaning member and avoids adhering to the inner wall of the valve body, thereby ensuring the cleanliness of the inner wall of the valve body and avoiding the accumulation of impurities such as powder to cause the valve plate to be stuck. At this time, the cleaning member acts as a baffle structure to block the residual reaction gas on the surface of the cleaning member to avoid the residual reaction gas adhering to the inner wall of the valve body; therefore, the cleaning member has a self-cleaning function and a baffle function, which solves the problem of deposition and dirt on the internal surface of the butterfly valve from two aspects, prolongs the service life of the butterfly valve, avoids frequent maintenance, and thus improves the production time of the thin film deposition equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying any creative work.

[0021] Figure 1a-1b The following are the structural diagrams of butterfly valves at the current stage;

[0022] Figure 2a-2d Each structural diagram of the butterfly valve in the embodiment of the present invention;

[0023] Figure 3 An exploded view of a butterfly valve in an embodiment of the present invention;

[0024] The reference numerals in the figures are:

[0025] 1. Valve body; 11. Channel; 2. Valve plate; 21. Through hole; 3. Cleaning part; 4. Rotating shaft; 41. Groove; 42. Fixing hole; 5. Locking part; 6. Driving assembly. DETAILED DESCRIPTION

[0026] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. Now, in conjunction with the accompanying drawings, the preferred embodiments of the present invention are described in detail.

[0027] Reference Figures 2a to 3 As shown, it shows an embodiment of the butterfly valve of the present invention. The butterfly valve comprises a valve body 1, a valve plate 2 and a cleaning member 3, wherein the valve body 1 is provided with a channel 11; the valve plate 2 is located in the channel 11 and is rotatably connected to the valve body 1, and the valve plate 2 is used to open or close the channel 11; the cleaning member 3 is connected to the valve plate 2, and the cleaning member 3 is arranged to extend along the circumference of the inner wall of the valve body 1, and is arranged in an inclined ring on the outer side of the valve plate 2; wherein, when the self-cleaning function is activated, the valve plate 2 is rotated to drive the cleaning member 3 to rotate close to the inner wall of the valve body 1.

[0028] Specifically, refer to Figure 1a to Figure 1b As shown, the butterfly valve is a valve for controlling the flow rate of the medium in the pipeline. By adjusting the opening and closing angle of the valve plate 2 in the medium flow channel 11, the purpose of opening and closing or adjusting the flow rate of the medium is achieved. The butterfly valve in this embodiment is mainly used in semiconductor production equipment. The medium pressure in the pipeline is controlled by the rotation of the valve plate 2, thereby ensuring the safety of semiconductor production and the stable operation of the equipment. However, the butterfly valve used in the thin film deposition equipment is different from other butterfly valve equipment. In order to avoid dirt clogging and blocking the valve, a certain gap will be maintained between the valve plate 2 and the valve body 1. However, in order to ensure the pressure control effect, the gap cannot be too large. Generally, the gap between the valve plate 2 and the valve body 1 is between 0.025 and 0.1 mm. Since the thin film deposition equipment will generate a large amount of powder (mostly SIO) through the exhaust end during use; the residual gas upstream of the butterfly valve will react and adhere to the inner wall of the pipeline, and the powder will peel off due to the suction force after accumulation; or the residual gas reacts and adheres to the pressure control butterfly valve, making the gap between the valve plate 2 smaller and smaller, affecting the pressure control effect, and even causing the valve plate 2 to get stuck.

[0029] Therefore, in order to solve the problem of excessive reaction gas adhering to the inner wall of the channel 11 of the butterfly valve to avoid affecting the product quality and equipment operation, the butterfly valve in this embodiment includes a valve body 1, a valve plate 2 and a cleaning member 3. The valve body 1 has the function of supporting and fixing other structural members to fix the valve plate 2 on the valve body 1. The valve body 1 is provided with a channel 11, which is a flow channel 11 for the medium. The channel 11 is mainly cylindrical and runs through both ends of the valve body 1 so that the medium can flow through one end of the valve body 1. The valve plate 2 is rotatably connected to the valve body 1, and the valve plate 2 is located in the channel 11. To ensure the pressure control effect, the valve plate 2 and the channel 11 are gap-connected, that is, there is a gap between the valve plate 2 and the inner wall of the valve body 1. The valve plate 2 is used to open or close the channel 11, so the structure of the valve plate 2 fits the structure of the channel 11, that is, the valve plate 2 is annular; by rotating the valve plate 2, the fixed angle of the valve plate 2 and the valve body 1 is adjusted, thereby adjusting the channel 11. 1, thereby adjusting the opening and closing angle of the medium in the channel 11, thereby controlling the pressure of the device; the cleaning member 3 is connected to the valve plate 2, and further, the cleaning member 3 is detachably connected to the valve plate 2, and the cleaning member 3 is welded to the valve plate 2 by welding; the cleaning member 3 is extended along the circumferential direction of the inner wall of the valve body 1, that is, to fit the shape of the valve plate 2 and better fit the inner wall of the valve body 1, the cleaning member 3 is set to a circular ring shape, and the cleaning member 3 is connected to the valve plate 2. The cleaning member 3 is arranged on the outer side of the valve plate 2 at an angle along the circumference of the valve plate 2, that is, the cleaning member 3 can be freely adjusted to be arranged on the outer side of the valve plate 2 at different angles; more specifically, the cleaning member 3 is arranged on the outer side of the valve plate 2 at an angle at a specific angle, and the specific angle is an angle calculated after determining the opening and closing angle of the valve plate 2 and the channel 11 according to the actual pressure control demand. According to the specific angle, the cleaning member 3 is arranged on the outer side of the valve plate 2 at the size of the specific angle.

[0030] When the self-cleaning function is started, the valve plate 2 is rotated to drive the cleaning member 3 to rotate, and the cleaning member 3 rotates closely against the inner wall of the valve body 1, thereby scraping off dirt and impurities such as powder and dust accumulated on the inner wall of the valve body 1 to achieve the self-cleaning function of the valve body 1; in addition, when the valve plate 2 is rotated to a specified opening and closing angle, the cleaning member 3 can also be set at the edge of the inner wall of the valve body 1, that is, the outer side of the cleaning member 3 abuts against the inner wall of the valve body 1, and the cleaning member 3 is extended along the circumferential direction of the inner wall of the valve body 1, so that the cleaning member 3 has the function of a baffle, that is, when the reaction gas flows along the channel 11, the reaction gas adheres to the cleaning member 3, so as to prevent the reaction gas from adhering to the inner wall of the valve body 1, thereby causing impurities to accumulate and the valve plate 2 to become stuck.

[0031] The present application arranges the cleaning member 3 in an oblique ring on the outer side of the valve plate 2, and the cleaning member 3 is extended along the circumferential direction of the inner wall of the valve body 1. When the self-cleaning function is started, the valve plate 2 rotates to drive the cleaning member 3 to rotate closely against the inner wall of the valve body 1, thereby scraping off the impurities accumulated on the inner wall of the valve body 1 to ensure the cleanliness of the inner wall of the valve body 1, avoid impurities falling during the production process to affect the product quality, and avoid excessive accumulation of impurities that may cause the valve plate 2 to become stuck. At this time, the cleaning member 3 acts as a scraper structure to scrape off the dirt. At the same time, when the valve plate 2 is rotated to a specified position, and the cleaning member 3 is tightly pressed along the circumference of the valve body 1, When the cleaning member 3 is arranged close to the inner wall of the valve body 1, the cleaning member 3 also has a baffle function, and the residual reaction gas adheres to the cleaning member 3 but avoids adhering to the inner wall of the valve body 1, thereby ensuring the cleanliness of the inner wall of the valve body 1 and avoiding the accumulation of impurities such as powder, which may cause the valve plate 2 to get stuck. At this time, the cleaning member 3 acts as a baffle structure to block the residual reaction gas on the surface of the cleaning member 3 to avoid the residual reaction gas adhering to the inner wall of the valve body 1; therefore, the cleaning member 3 has a self-cleaning function and a baffle function to solve the problem of deposited dirt on the inner surface of the butterfly valve, extend the service life of the butterfly valve, avoid frequent maintenance, and thus improve the production time of the thin film deposition equipment.

[0032] In one embodiment, the cleaning member 3 is a metal ring (not shown in the figure). Specifically, in order to ensure the self-cleaning function of the cleaning member 3, that is, the cleaning member 3 can scrape off the dirt on the inner wall of the valve body 1 more smoothly, the cleaning member 3 is set as a metal ring, and the metal ring is set to extend along the circumference of the inner wall of the valve body 1. When the self-cleaning function is started, the valve plate 2 is rotated so that the metal ring rotates closely against the inner wall of the valve body 1, thereby scraping off the dirt on the inner wall of the valve body 1 to achieve the self-cleaning step of the inner wall of the valve body 1. The strength and hardness of the metal ring are high, so that the cleaning effect of the cleaning member 3 is higher. At the same time, the metal ring can also be set as a baffle structure at the edge of the inner wall of the valve body 1, so that the reaction gas adheres to the metal ring to avoid the accumulation of impurities on the inner wall of the valve body 1.

[0033] More specifically, the metal ring is a thin metal sheet, and the metal material of the metal ring needs to be a material with high hardness and low thermal expansion coefficient, which can be selected from but not limited to Invar alloy (FeNi36), super Invar alloy (FeNi31C05), stainless Invar alloy (C054Cr9Fe), so that when the cleaning member 3 is tightly attached to the inner wall of the valve body 1 and rotates, the cleaning member 3 can effectively scrape off the attachments or products on the inner wall of the valve body 1.

[0034] In a specific embodiment, the cleaning member 3 is a rubber ring (not shown in the figure). Specifically, the cleaning member 3 is made of rubber material, and the cleaning member 3 is a rubber ring, and the rubber material has corrosion resistance and elasticity. Therefore, when the cleaning member 3 is used as a baffle structure, that is, when the cleaning member 3 is close to the inner wall of the valve body 1 along the circumferential direction of the inner wall of the valve body 1, the cleaning member 3 can block the reaction gas from adhering to the inner wall of the valve body 1, so that the reaction gas and other impurities adhere to the surface of the cleaning member 3, avoiding the valve plate 2 from getting stuck. At this time, the rubber ring can resist corrosion from various reaction gases, and can also resist special plasma bombardment of PECVD (PECVD is the abbreviation of Plasma Enhanced Chemical Vapor Deposition, which is a technology that uses plasma to enhance the reaction during chemical vapor deposition), thereby improving the structural stability of the cleaning member 3 and improving the service life of the cleaning member 3. At the same time, the rubber ring can also be used as a scraper structure. When the self-cleaning function is started, the valve plate 2 is rotated so that the rubber ring rotates closely against the inner wall of the valve body 1, thereby scraping off the dirt on the inner wall of the valve body 1 to achieve the self-cleaning step of the inner wall of the valve body 1.

[0035] Furthermore, the rubber ring is interference fit with the valve body 1, and at the same time, the rubber ring is elastic. When the rubber ring rotates with the valve plate 2, the rubber ring can be compressed. Since the rubber ring is interference fit with the valve body 1, the tightness of the rubber ring and the inner wall of the valve body 1 is improved, so that the reaction gas can better adhere to the surface of the rubber ring, thereby improving the baffle effect of the cleaning member 3 and improving the cleaning effect of the cleaning member 3.

[0036] More specifically, the rubber ring is made of fluororubber or perfluororubber material. Fluororubber (FKM) has the following characteristics: Chemical stability: Fluororubber has excellent chemical stability and can resist corrosion from a variety of acids, alkalis, greases, fuels and solvents; High temperature resistance: Fluororubber can maintain its elasticity and sealing performance at higher temperatures, and can usually be used in a temperature range of -20°C to +200°C; under certain special formulas, its high temperature resistance can be further improved to +250°C or even higher; Low temperature resistance: Although fluororubber has excellent high temperature resistance, its low temperature resistance is also relatively good, and it can maintain a certain flexibility at lower temperatures, thereby ensuring the sealing effect; Electrical insulation: Fluororubber has good electrical insulation and is suitable for occasions requiring electrical isolation; Wear resistance: Fluororubber has good wear resistance and can resist friction and wear to a certain extent, extending its service life. Perfluororubber (FFKM) has the following characteristics: Excellent chemical inertness: Perfluororubber is more chemically inert than fluororubber and can resist more types of corrosive media, including some strong acids and strong alkalis. This makes the perfluororubber ring more suitable for use in extreme chemical environments; Higher high temperature resistance: The high temperature resistance of perfluororubber is usually better than that of fluororubber, and it can be used at +300°C or even higher, and is suitable for sealing media such as high-temperature steam and hot oil; Oxidation resistance: Perfluororubber has excellent oxidation resistance and can maintain its performance stability in oxidizing media; Low permeability: The gas permeability of perfluororubber is extremely low, and it is suitable for occasions that require strict sealing, such as high-pressure gas pipeline systems. Therefore, the material of the rubber ring is fluororubber or perfluororubber, thereby increasing the service life of the cleaning member 3.

[0037] In one embodiment, the butterfly valve is provided with two cleaning members 3 (not shown in the figure), one of the cleaning members 3 is a metal ring, and the other of the cleaning members 3 is a rubber ring, and the two cleaning members 3 are arranged on the outer side of the valve plate 2 at different angles. Specifically, the butterfly valve is provided with two cleaning members 3, and one of the cleaning members 3 is a metal ring, and the other of the cleaning members 3 is a rubber ring. Since the metal ring has the characteristic of high hardness, the metal ring is used as a scraper structure to better scrape the inner wall of the valve body 1, scrape off the impurities on the inner wall of the valve body 1, improve the cleaning effect of the inner wall of the valve body 1, and avoid the accumulation of impurities causing the valve plate 2 to get stuck; at the same time, the rubber ring has the advantages of corrosion resistance, resistance to PECVD special plasma bombardment and elasticity, so the rubber ring is used as a baffle structure to be arranged close to the inner wall of the valve body 1, so that the rubber ring can attach the residual reaction gas to its surface to avoid the accumulation of impurities on the valve body. 1 causes the valve plate 2 to get stuck; the two cleaning members 3 are respectively arranged on the outer side of the valve plate 2 at different angles. When the cleaning member 3 is needed to be used as a scraper structure, the valve plate 2 is rotated to make the metal ring rotate closely against the inner wall of the valve body 1, and scrape off the impurities on the inner wall of the valve body 1; when the cleaning member 3 is needed to be used as a baffle structure, the valve plate 2 is rotated to rotate the rubber ring to a position that is closely fitted with the inner wall of the valve body 1, and the butterfly valve is used in a state where it is kept stationary, so that the residual reaction gas is attached to the rubber ring. When cleaning, only the rubber ring needs to be cleaned, and there is no need to clean the valve body 1, the valve plate 2 and other structures, thereby improving the cleaning efficiency and avoiding the valve plate 2 from getting stuck.

[0038] Therefore, in this embodiment, by providing the cleaning members 3 of two different materials, different cleaning members 3 can be used according to different usage conditions. When the cleaning member 3 is needed to be used as a scraper structure, the metal ring is used to scrape the inner wall of the valve body 1. When the cleaning member 3 is needed to be used as a baffle structure, the rubber ring is used to block the inner wall of the valve body 1. This allows the butterfly valve to be self-cleaned more accurately, improves the cleaning effect and cleaning efficiency, and also increases the service life of the cleaning member 3.

[0039] In a specific embodiment, refer to Figure 3As shown, the butterfly valve further includes a rotating shaft 4, which extends from one side of the valve body 1 to the other side of the valve body 1 along the radial direction of the valve body 1, the rotating shaft 4 is rotatably connected to the valve body 1, and the rotating shaft 4 is fixedly connected to the valve plate 2. Specifically, the butterfly valve further includes a rotating shaft 4, the rotating shaft 4 is used to drive the valve plate 2 to rotate, one end of the rotating shaft 4 is extended from one side of the valve body 1 toward the other side of the valve body 1, and the rotating shaft 4 passes through the channel 11 along the radial direction of the valve body 1, and the valve plate 2 is fixed on the rotating shaft 4 along the length direction of the rotating shaft 4, and the rotating shaft 4 is rotatably connected to the valve body 1, therefore, the rotating shaft 4 is rotated to drive the valve plate 2 to rotate 360° in the channel 11 with the rotating shaft 4 as the center, so as to control the size of the opening and closing angle of the channel 11, so as to control the flow rate of the reaction gas, and thus control the pressure of the equipment. The butterfly valve has high structural stability, and the valve plate 2 is fixed on the rotating shaft 4 along the length direction of the rotating shaft 4 to improve the smoothness of rotation and the degree of fixation of the valve plate 2.

[0040] In one embodiment, referring to Figure 3 As shown, the rotating shaft 4 is provided with a groove 41, which is extended along the length direction of the rotating shaft 4, and the groove 41 is formed by the inward depression of one side of the rotating shaft 4, and the valve plate 2 is embedded in the groove 41. Specifically, the valve plate 2 is fixed on the rotating shaft 4. In order to improve the fixing degree of the valve plate 2 and the rotating shaft 4, the rotating shaft 4 is provided with a groove 41, which is extended along the length direction of the rotating shaft 4, and the groove 41 is formed by the inward depression of one side of the rotating shaft 4. The groove 41 is used to fix and install the valve plate 2, and the valve plate 2 is embedded in the groove 41, and the upper and lower ends of the valve plate 2 are respectively abutted against the upper and lower groove walls of the groove 41, thereby preliminarily fixing the valve plate 2 on the rotating shaft 4, and the upper and lower ends of the valve plate 2 are fixedly connected to the rotating shaft 4, thereby improving the fixing degree of the valve plate 2 and the rotating shaft 4, ensuring the stability of the rotation of the valve plate 2, and improving the structural stability of the butterfly valve.

[0041] In a specific embodiment, refer to Figure 2a to Figure 2dAs shown, the upper end of the cleaning member 3 is fixed between the upper end of the valve plate 2 and the upper groove wall of the groove 41, and the lower end of the cleaning member 3 is fixed between the lower end of the valve plate 2 and the lower groove wall of the groove 41. Specifically, the cleaning member 3 is detachably connected to the valve plate 2, and the upper end of the cleaning member 3 is fixed between the upper end of the valve plate 2 and the upper groove wall of the groove 41, and the lower end of the cleaning member 3 is fixed between the lower end of the valve plate 2 and the lower groove wall of the groove 41, that is, the upper and lower ends of the cleaning member 3 are respectively connected to the upper and lower ends of the valve plate 2, and the cleaning member 3 is located between the valve plate 2 and the groove wall of the groove 41, thereby improving the fixing degree of the cleaning member 3. When the rotating shaft 4 rotates, the valve plate 2 and the cleaning member 3 are driven to rotate, thereby improving the fixing degree of the valve plate 2, the cleaning member 3 and the rotating shaft 4, and improving the rotation smoothness of the butterfly valve.

[0042] In one embodiment, referring to Figure 3 As shown, the valve plate 2 is provided with a plurality of through holes 21 distributed along its radial direction, the rotating shaft 4 is provided with a plurality of fixing holes 42 distributed along its length direction, and the butterfly valve also includes a plurality of locking members 5, one end of the locking member 5 is locked and fixed by passing through the through hole 21 and the fixing hole 42 in sequence from one side of the valve plate 2. Specifically, in order to further fix the valve plate 2 and the rotating shaft 4, a plurality of through holes 21 are provided at intervals in the radial direction of the valve plate 2, and the through holes 21 pass through both sides of the valve plate 2. A plurality of fixing holes 42 are provided at intervals in the length direction of the rotating shaft 4, and the fixing holes 42 are correspondingly arranged to the through holes 21, and the fixing holes 42 pass through the groove wall of the groove 41 toward the other side of the rotating shaft 4. The butterfly valve also includes a plurality of locking members 5, and the number of the locking members 5 is corresponding to the number of the through holes 21 and the fixing holes 42. When installing the valve plate 2 and the rotating shaft 4, the valve plate 2 is embedded in the groove 41, and one end of the locking member 5 is passed through the through holes 21 from one side of the valve plate 2 in sequence into the fixing hole 42, and one end of the locking member 5 is locked and fixed to the fixing hole 42, thereby further fixing the valve plate 2 and the rotating shaft 4, preventing the valve plate 2 from falling off the rotating shaft 4, and improving the structural stability of the butterfly valve.

[0043] In a specific embodiment, refer to Figures 2a to 3As shown, the butterfly valve further includes a driving assembly 6, which is fixedly connected to the valve body 1, and the valve body 1 is also provided with a through hole, one end of the rotating shaft 4 is connected to the driving assembly 6, and the other end passes through the through hole and extends to the other side of the valve body 1. Specifically, the butterfly valve further includes a driving assembly 6, which serves as a power source of the butterfly valve and is used to drive the rotating shaft 4 to rotate, and the driving assembly 6 is fixedly connected to one end of the valve body 1, and the valve body 1 is provided with a through hole, and the through hole passes through both sides of the valve body 1 to connect the channel 11 and the driving assembly 6, so when the rotating shaft 4 is installed, one end of the rotating shaft 4 is connected to the driving assembly 6, and the other end passes through the through hole and extends to the other side of the valve body 1 and is rotatably connected to the valve body 1, so that the rotating shaft 4 can rotate in the channel 11, thereby driving the valve plate 2 and the cleaning member 3 to rotate in the channel 11. The butterfly valve has high structural stability, and the structure of the rotating shaft 4 is stable.

[0044] This embodiment also provides a thin film deposition device (not shown in the figure), which includes a butterfly valve. The butterfly valve can adopt any one of the butterfly valves provided by the present invention. Since the specific structure and working principle of the butterfly valve have been introduced in detail in the previous description, they will not be repeated here for the sake of conciseness of the description.

[0045] The thin film deposition equipment in this embodiment adopts the butterfly valve provided by the present invention. The butterfly valve can realize a self-cleaning function, and the problem of deposited dirt on the inner surface of the butterfly valve is solved by the cleaning member 3, thereby extending the service life of the butterfly valve and avoiding frequent maintenance of the butterfly valve, so as to increase the production time of the thin film deposition equipment and avoid affecting the operation of the thin film deposition equipment.

[0046] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed by the present invention, and these modifications or replacements should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention shall be based on the protection scope of the claims.

Claims

1. A butterfly valve, characterized in that: include: A valve body, wherein the valve body is provided with a passage; A valve plate, the valve plate is located in the channel and is rotatably connected to the valve body, and the valve plate is used to open or close the channel; A cleaning member, the cleaning member is connected to the valve plate, the cleaning member is extended along the circumference of the inner wall of the valve body, and is inclinedly annularly arranged on the outer side of the valve plate; When the self-cleaning function is activated, the valve plate is rotated to drive the cleaning member to rotate closely against the inner wall of the valve body.

2. The butterfly valve according to claim 1, characterized in that: The cleaning member is a metal ring.

3. The butterfly valve according to claim 1, characterized in that: The cleaning member is a rubber ring.

4. The butterfly valve according to claim 1, characterized in that: The butterfly valve is provided with two cleaning members, one of which is a metal ring and the other is a rubber ring, and the two cleaning members are arranged on the outer side of the valve plate at different tilt angles.

5. The butterfly valve according to claim 1, characterized in that: The butterfly valve further comprises a rotating shaft, which extends from one side of the valve body to the other side of the valve body along the radial direction of the valve body, the rotating shaft is rotatably connected to the valve body, and the rotating shaft is fixedly connected to the valve plate.

6. The butterfly valve according to claim 5, characterized in that: The rotating shaft is provided with a groove, the groove is extended along the length direction of the rotating shaft, and the groove is formed by an inward depression of one side of the rotating shaft, and the valve plate is embedded in the groove.

7. The butterfly valve according to claim 6, characterized in that: The upper end of the cleaning member is fixed between the upper end of the valve plate and the upper groove wall of the groove, and the lower end of the cleaning member is fixed between the lower end of the valve plate and the lower groove wall of the groove.

8. The butterfly valve according to claim 5, characterized in that: The valve plate is provided with a plurality of through holes distributed along its radial direction, the rotating shaft is provided with a plurality of fixing holes distributed along its length direction, and the butterfly valve also includes a plurality of locking members, one end of the locking member is passed through the through holes and the fixing holes in sequence from one side of the valve plate and locked and fixed.

9. The butterfly valve according to claim 5, characterized in that: The butterfly valve also includes a driving assembly, which is fixedly connected to the valve body. The valve body is also provided with a through hole, one end of the rotating shaft is connected to the driving assembly, and the other end passes through the through hole and extends to the other side of the valve body.

10. A thin film deposition device, characterized in that: The butterfly valve comprises the butterfly valve according to any one of claims 1 to 9.

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