Wafer cassette loading and unloading system for epitaxial reactor and epitaxial reactor

Abstract

A system (1) for loading and unloading cassettes (2) of wafers (3) of an epitaxial reactor (4), the system (1) comprising: a carousel platform (5) configured to transport at least one cassette (2), where the carousel platform (5) is pivotably connectable to the epitaxial reactor (4) about a carousel axis (7); a carousel actuator (6) configured to drive rotation of the carousel platform (5) relative to the epitaxy reactor (4) about a carousel axis (7); at least one support platform (8) adapted to support the at least one cartridge (2), where the at least one support platform (8) is pivotally connected to the carousel platform (5) about an axis of rotation (9) different from the carousel axis (7); a rotary actuator (10) configured to drive a rotation of the at least one support platform (8) relative to the carousel platform (5) about the axis of rotation (9).

Description

Technical Field

[0001] The present invention relates to a wafer cassette loading and unloading system for an epitaxial reactor, and an epitaxial reactor comprising such a loading and unloading system. Background Art

[0002] Wafers used for epitaxial deposition processes of semiconductor materials are typically stored and shipped in cassettes in which the wafers are stacked horizontally and spaced apart from one another.

[0003] These cassettes generally comprise a front side accessible from the outside for loading and unloading wafers from the cassette and an opposite, completely or at least partially closed back side.

[0004] They are known to the inventors of epitaxial reactors equipped with a wafer cassette loading and unloading system.

[0005] These loading and unloading systems known to the inventors comprise a platform pivotally articulated to an axis, onto which at least one wafer cassette can be loaded.

[0006] The platform can be pivoted between a first operating position and a second operating position, in which the platform faces outward from the epitaxial reactor so that the wafer box can be loaded or unloaded from the outside, and in which the platform faces inward toward the epitaxial reactor so that the wafers contained in the box can be manipulated by automated components of the epitaxial reactor, such as a handling robot.

[0007] It is known to the inventors that at least two wafer cassettes may be loaded onto the platform adjacent to each other so that the wafers contained in one cassette are used for a test process or testing, while the wafers contained in the other cassette are used for final processing.

[0008] Wafer cassette loading and unloading systems like this are difficult to interface with automated loading and unloading systems such as SMIF or AGV systems. In particular, loading and unloading a second wafer cassette adjacent to a first wafer cassette is complicated or impractical. Therefore, such loading and unloading systems require an operator to manually load and unload the wafer cassettes.

[0009] In addition, this type of wafer box loading and unloading system requires that the front side of the wafer box faces the operator during loading and unloading. However, exposing the front side of the wafer box to the operator is undesirable because it increases the risk of wafer contamination or the risk of dropping and damaging the wafer.

[0010] Therefore, there is a need for a wafer cassette loading and unloading system that can easily interface with an automated loading and unloading system such as a SMIF or AGV system, or can also be used manually.

[0011] There is also a need for a wafer cassette loading and unloading system that simplifies the loading and unloading of one or more wafer cassettes.

[0012] There is also a need for a wafer cassette loading and unloading system that minimizes the risk of contamination or damage to wafers that are to be or have been subjected to epitaxial deposition processing. Summary of the invention

[0013] An object of the present invention is to provide a wafer cassette loading and unloading system for an epitaxial reactor, and an epitaxial reactor including the loading and unloading system, thereby solving at least some of the problems highlighted in the prior art.

[0014] A specific object of the present invention is to provide a wafer box loading and unloading system for an epitaxial reactor, and an epitaxial reactor including the loading and unloading system, which can be easily interfaced with an automatic loading and unloading system, or can also be manually operated.

[0015] Another specific object of the present invention is to provide a wafer cassette loading and unloading system for an epitaxial reactor, and an epitaxial reactor comprising the loading and unloading system, which simplifies the loading and unloading of one or more wafer cassettes.

[0016] Another specific object of the present invention is to provide a wafer box loading and unloading system for an epitaxial reactor, and an epitaxial reactor comprising the same, which loading and unloading system minimizes the risk of contamination or damage to wafers that are to undergo or have undergone epitaxial deposition processing.

[0017] Another specific object of the present invention is to provide a wafer box loading and unloading system for an epitaxial reactor and an epitaxial reactor including the loading and unloading system, which loading and unloading system has a small footprint and reduced complexity, and also allows the wafer box to be transported closer to the epitaxial reactor handling robot, thereby avoiding undesirable stress on the handling robot.

[0018] This and other objects are achieved by a wafer cassette loading and unloading system for an epitaxial reactor and an epitaxial reactor comprising such a loading and unloading system according to the independent claims.

[0019] The dependent claims relate to preferred and advantageous embodiments of the invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to better understand the present invention and appreciate its advantages, some illustrative and non-limiting embodiments thereof will be described below with reference to the accompanying drawings, in which:

[0021] - Figure 1A and Figure 1B is a schematic perspective view of a wafer cassette loading and unloading system in first and second operating positions according to the prior art known to the inventor;

[0022] - Figure 2 is a schematic perspective bottom view of a wafer cassette loading and unloading system according to an implementation form of the present invention;

[0023] - Figure 3 yes Figure 2 A schematic perspective top view of a wafer cassette loading and unloading system depicted in;

[0024] - Figure 4 yes Figure 2 A schematic cross-sectional view of a wafer cassette loading and unloading system depicted in;

[0025] - Figure 5 yes Figure 2 A schematic side view of a wafer cassette loading and unloading system depicted in;

[0026] - Figure 6 is a schematic top view of a portion of an epitaxial reactor according to an embodiment of the present invention. DETAILED DESCRIPTION

[0027] Referring to the drawings, a wafer cassette loading and unloading system is generally indicated by the reference numeral 1.

[0028] The loading and unloading system 1 is configured to be able to load and unload a cassette 2 of wafers 3 into and from an epitaxial reactor 4 .

[0029] Typically, the cassette 2 comprises a front side 23 accessible from the outside for loading and unloading wafers 3 from the cassette 2 and an opposite rear side 24 which is at least partially closed.

[0030] The system 1 comprises a carousel platform 5 configured to transport at least one cassette 2 .

[0031] The turntable platform 5 is pivotably connected to the epitaxial reactor 4 about a turntable axis 7 .

[0032] The turntable axis 7 is substantially transverse to the turntable platform 5 .

[0033] The system 1 further comprises a turntable actuator 6 .

[0034] The turntable actuator 6 is configured to drive the turntable platform 5 to rotate around the turntable axis 7. Specifically, the turntable actuator 6 is configured to operate the rotation of the turntable platform 5 around the turntable axis 7 relative to the epitaxial reactor 4.

[0035] In this way, the turntable platform 5 is capable of transporting at least one wafer 3 cassette 2 from a first operating position to a second operating position by rotation of at least one cassette 2 around the turntable axis 7. Specifically, the first operating position may correspond to a position where the cassette 2 can be automatically or manually loaded into or unloaded from the epitaxial reactor 4. The second operating position may correspond to a position where the wafers 3 in the wafer cassette 2 can be moved by an automatic component of the epitaxial reactor 4, such as a handling robot 11.

[0036] The rotation of the turntable platform 5 relative to the epitaxial reactor 4 specifically refers to the rotation of the turntable platform 5 relative to the fixed frame of the epitaxial reactor 4 .

[0037] According to one aspect of the invention, the system 1 further comprises at least one supporting platform 8 adapted to support at least one wafer 3 cassette 2 .

[0038] In particular, the supporting platform 8 is adapted to support a single cassette 2 of one or more cassettes 2 , which can be transported by the carousel platform 5 .

[0039] At least one supporting platform 8 is pivotally connected to the turntable platform 5 about a rotation axis 9 .

[0040] The rotation axis 9 is different from the turntable axis 7 .

[0041] The rotation axis 9 is substantially parallel to the turntable axis 7 .

[0042] Furthermore, the system 1 comprises a rotary actuator 10 .

[0043] The rotary actuator 10 is configured to operate the rotation of the at least one support platform 8 around the rotation axis 9. Specifically, the rotary actuator 10 is configured to operate the rotation of the at least one support platform 8 around the rotation axis 9 relative to the turntable platform 5.

[0044] Advantageously, the system 1 configured in this manner enables easy loading and unloading of one or more wafer 3 cassettes 2 by an automated system such as a SMIF or AGV or manually. In fact, the system 1 configured in this manner allows one or more cassettes 2 to be loaded or unloaded in substantially the same first operating position for each cassette 2 and can be conveniently positioned for automatic or manual loading, thus simplifying the loading and unloading operations.

[0045] Another advantage is that the system 1 configured in this way minimizes the risk of contamination or damage to the wafers 3 contained in one or more cassettes 2, since it does not require that the front side 23 of the cassette 2 be exposed towards the operator during loading and unloading operations on the system 1. In fact, the system 1 allows the cassette 2 to be loaded or unloaded on the support platform 8 with the rear side 24 of the cassette 2 facing the operator. Subsequently, when the cassette 2 is, for example, placed in the second operating position, the system 1 enables the cassette 2 to be rotated by rotation of the support platform 8 supporting the cassette 2 about the rotation axis 9, thereby exposing the front side 23 of the cassette 2 towards the interior of the epitaxial reactor 4, for example towards a handling robot 11 capable of handling the wafers 3 in the cassette 2.

[0046] Another advantage is that the system 1 so configured also allows the wafer 3 cassette 2 to be moved closer to the handling robot 11 in the epitaxial reactor 4 than prior art systems known to the inventors, thereby avoiding undesirable stresses on the handling robot 11 .

[0047] According to one embodiment, the system 1 comprises a gear mechanism 12 .

[0048] A gear 12 connects the rotary actuator 10 to the at least one supporting platform 8 .

[0049] The gear 12 is configured to rotate the support platform 8 relative to the turntable platform 5 about the rotation axis 9 .

[0050] According to one form of implementation, the system 1 comprises a motion transmission system connecting the rotary actuator 10 with at least one supporting platform 8 , which may comprise a drive chain and / or a timing belt and / or a mechanical coupling.

[0051] According to one embodiment, the system 1 comprises a sprocket 13 .

[0052] The sprocket 13 is pivotally connected to the turntable platform 5 .

[0053] Furthermore, the sprocket 13 is positioned coaxially with the turntable axis 7. In this way, the sprocket 13 can be pivoted relative to the turntable platform 5 about the turntable axis 7.

[0054] The system 1 also comprises at least one drive wheel 14 .

[0055] At least one drive wheel 14 is attached to the respective support platform 8. Furthermore, the drive wheel 14 is positioned coaxially with the axis of rotation 9.

[0056] The drive wheel 14 engages with the sprocket 13 .

[0057] Furthermore, the rotary actuator 10 is operatively connected to the sprocket 13 in order to initiate a rotation of the sprocket 13 relative to the turntable platform 5 about the turntable axis 7 .

[0058] Advantageously, configuring the system 1 in this manner allows the cassette 2 to be transported from a first operating position to a second operating position by rotation of the rotating transfer platform 5. Furthermore, with the sprocket 13 and drive wheel 14 configured and meshed together in this manner, the cassette 2 can be rotated to expose its front 23 or rear as desired.

[0059] By way of example, a cassette 2 of wafers 3 can be loaded on the support platform 8 in a first operating position, with the rear side 24 of the cassette 2 facing an operator or an automated system. Subsequently, the cassette 2 can be transported from the first operating position to a second operating position, by a rotation of the turntable platform 5 relative to the epitaxial reactor 4 about the turntable axis 7 driven by the turntable actuator 6, to which the support platform 8 is connected. When travelling between the first and second operating positions, or in the second operating position, by a rotation of the support platform 8 relative to the turntable platform 5 about the rotation axis 9 driven by the rotary actuator 10 and in particular performed via the rotation of the drive wheel 14, the cassette 2 can pivot itself so as to expose its front side 23 towards the handling robot 11 in the epitaxial reactor 4, integral with the support platform 8, driven by the rotation of the sprocket 13, with which the drive wheel 14 meshes.

[0060] According to one embodiment, the sprocket 13 and the at least one drive wheel 14 are placed in a substantially coplanar position.

[0061] According to one embodiment, at least one drive wheel 14 meshes with the sprocket 13 on the outside relative to the turntable axis 7 .

[0062] According to one embodiment, at least one drive wheel 14 meshes internally with the sprocket 13 relative to the turntable axis 7 .

[0063] According to one embodiment, the rotary actuator 10 comprises a drive gear 15 .

[0064] The drive gear 15 is engaged with the sprocket 13. The drive gear 15 is configured to command a rotation of the sprocket 13 about the turntable axis 7.

[0065] According to one embodiment, the sprocket 13, the at least one drive wheel 14 and the drive gear 15 are placed substantially in a coplanar position.

[0066] According to one embodiment, at least one drive gear 15 engages externally with the sprocket 13 relative to the turntable axis 7 .

[0067] According to one embodiment, at least one drive gear 15 engages internally with the sprocket 13 relative to the turntable axis 7 .

[0068] According to one embodiment, the sprocket 13 , the at least one drive wheel 14 and the drive gear 15 , if provided, have cylindrical or helical teeth.

[0069] According to one embodiment, the system 1 comprises a shaft 16 .

[0070] The shaft 16 is attached to the turntable platform 5 .

[0071] Furthermore, the shaft 16 extends along the turntable axis 7 , being substantially coaxial thereto.

[0072] The shaft 16 is interposed between the turntable actuator 6 and the turntable platform 5 .

[0073] Specifically, the shaft 16 is configured to receive the rotational motion from the turntable actuator 6 and transmit the rotational motion to the turntable platform 5 , thereby driving the turntable platform 5 to rotate about the turntable axis 7 .

[0074] According to one embodiment, the shaft 16 extends through the sprocket 13 .

[0075] According to one embodiment, the shaft 16 is positioned opposite the support platform 8 relative to the turntable platform 5 .

[0076] According to one embodiment, each support platform 8 comprises a respective rotation axis 25 . The rotation axis 25 extends coaxially with the respective rotation axis 9 .

[0077] The rotating shaft 25 is attached to the supporting platform 8 and the corresponding driving wheel 14 .

[0078] According to one form of implementation, the rotation axis 25 extends through the turntable platform 5. In this way, the rotation axis 25 integrally connects the support platform 8 to the corresponding drive wheel 14, positioned opposite each other with respect to the turntable platform 5.

[0079] According to one embodiment, the turntable actuator 6 is a servomotor.

[0080] According to one form of implementation, the turntable actuator 6 is connected to an end of the shaft 16 that is opposite to the end of the shaft 16 to which the turntable platform 5 is connected.

[0081] According to one embodiment, the rotary actuator 10 is a servomotor.

[0082] According to one embodiment, the turntable platform 5 is a plate, for example circular and coaxial with the turntable axis 7 .

[0083] According to one form of implementation, the support platform 8 is a plate. According to one form of implementation, the support platform 8 is a circular or prismatic plate, or substantially shaped to reflect the shape of the lower wall of the box 2 .

[0084] According to one embodiment, at least one supporting platform 8 is positioned relative to the turntable platform 5 opposite to the sprocket 13 and the at least one driving wheel 14 .

[0085] According to one form of implementation, the system 1 comprises a plurality of support platforms 8 , which are pivotally connected to the turntable platform 5 about respective and different axes of rotation 9 .

[0086] The respective axes of rotation 9 are parallel to one another and to the turntable axis 7 .

[0087] According to one embodiment, the system 1 comprises three supporting platforms 8 .

[0088] Advantageously, one of the three support platforms 8 can be used to support and transport the wafer 3 cassette 2 for a test procedure or test, another of the three support platforms 8 can be used to support and transport the wafer 3 cassette 2 for a final process in the epitaxial reactor reaction chamber 4, and another of the three support platforms 8 can be used to support and transport the wafer 3 cassette 2 into the epitaxial reactor reaction chamber 4. Thus, the system 1 configured in this manner can be used in an epitaxial reactor 4 having more than one reaction chamber and allows for quick and easy replenishment or removal of wafers 3 to be processed or treated.

[0089] According to one embodiment, the support platforms 8 are positioned on the turntable platform 5 at equal angles to one another.

[0090] According to one embodiment, three support platforms 8 are positioned on the turntable platform 5 at substantially equal distances of 120° from each other.

[0091] According to one embodiment, the respective drive wheels 14 of a plurality of support platforms 8 engage with the same sprocket 13 .

[0092] Advantageously, this configuration allows the rotation of all the supporting platforms 8 to be driven solely by the rotation of the gearwheel 13 with which the drive wheel 14 connected to the respective supporting platform 8 meshes.

[0093] According to one embodiment, the turntable platform 5 comprises a top wall 17 and an opposite lower wall 18 .

[0094] The top wall 17 of the turntable platform 5 faces at least one supporting platform 8. Specifically, the supporting platform 8 is located above the top wall 17 of the turntable platform 5.

[0095] The lower wall 18 of the turntable platform 5 faces the sprocket 12. According to one embodiment, the lower wall 18 also faces the at least one drive wheel 14, the drive gear 15 and the shaft 16.

[0096] According to one embodiment, the system 1 comprises a reflector element 19 .

[0097] The reflector element 19 comprises at least one reflecting surface 20 .

[0098] According to one embodiment, the reflective surface 20 is positioned substantially parallel to the turntable axis 7 .

[0099] Advantageously, the reflector element 19 is adapted to reflect a laser beam coming from the epitaxial reactor 4, for example a laser beam emitted by the handling robot 11, and used for detecting the wafers 3 contained in the cassette 2 supported by the supporting platform 8. For example, the laser beam emitted by the handling robot 11 can be reflected by the reflector 19 in the direction of the partially open rear side 24 of the cassette 2 in order to detect the number and placement of the wafers 3 contained in the cassette 2.

[0100] According to one form of implementation, the reflector element 19 comprises a number of reflecting surfaces 20 equal to the number of supporting platforms 8 connected to the same turntable platform 5 .

[0101] According to one embodiment, each reflective surface 20 extends in a plane parallel to the turntable axis 7 .

[0102] According to one form of implementation, each reflective surface 20 is positioned in line with, and facing, the corresponding supporting platform 8 .

[0103] According to one form of implementation, each reflective surface is located between the turntable axis 7 and the supporting platform 8 .

[0104] According to this embodiment, in which the system comprises three support platforms 8, the reflector element 19 comprises three reflecting surfaces 20, which are positioned parallel to the turntable axis 7 and are arranged substantially in the shape of an equilateral triangle.

[0105] According to this embodiment, in which the turntable platform 5 is a circular plate, each reflective surface 20 is positioned parallel to the turntable axis 7 and transverse to a radial axis of the turntable platform 5 .

[0106] According to one embodiment, the reflector element 19 comprises a support adapted to support one or more reflecting surfaces 20 .

[0107] According to one embodiment, the reflector element 19 is located on the top wall 17 of the turntable platform 5 .

[0108] According to one embodiment, the reflector element 19 is located on the turntable axis 7 .

[0109] According to one embodiment, the reflector element 19 is positioned substantially concentrically with respect to the turntable axis 7 .

[0110] According to one embodiment, the reflector element 19 is connected to the top wall 17 of the turntable platform 5 .

[0111] According to one embodiment, the reflector element 19 extends along the turntable axis 7 opposite the lower wall 18 of the turntable platform 5 .

[0112] According to one embodiment, the turntable actuator 6 and the rotary actuator 10 are positioned opposite to the turntable platform 5 and the support platform 8 .

[0113] According to one form of implementation, the turntable actuator 6 and the rotary actuator 10 are positioned below the lower wall 18 , included within the vertically occupied footprint, ie in the direction of the turntable axis 7 relative to the turntable platform 5 .

[0114] According to one embodiment, the system 1 comprises a detection system 21 .

[0115] The detection system 21 is configured to detect the position and orientation of one or more support platforms 8 or one or more boxes 2 supported by the corresponding support platforms 8 relative to the turntable platform 5.

[0116] Advantageously, with the aid of the detection system 21, it can be checked whether the box 2 supported by the support platform 8 is correctly oriented during the handling and transport phases of the box. For example, the detection system 21 can detect whether the box 2 is correctly positioned, with the front side 23 of the box 2 facing the handling robot 11 when the box 2 is in the second operating position, or whether the box 2 is correctly positioned, with the rear side 24 of the box 2 facing the operator when the box 2 is in the first operating position.

[0117] According to one embodiment, the detection system 21 comprises at least one detection device, such as a laser sensor or an image detector.

[0118] According to one embodiment, one or more detection devices are positioned above one or more support platforms 8 relative to the turntable platform 5 , facing the support platforms 8 .

[0119] According to another embodiment, one or more detection devices are positioned in line with the top wall 17 of the turntable platform 5 , facing the support platform 8 .

[0120] According to another aspect of the present invention, the epitaxial reactor 4 comprises at least one reaction chamber.

[0121] The wafer 3 may be inserted into the reaction chamber to perform an epitaxial deposition process of the semiconductor material.

[0122] The epitaxial reactor 4 also comprises at least one loading and unloading system 1 of the cassettes 2 of wafers 3 as previously described.

[0123] According to one embodiment, the reactor 4 comprises a handling robot 11 .

[0124] The transfer robot 11 is configured to move the wafers 3 contained in the corresponding cassettes 2 .

[0125] Furthermore, the transfer robot 11 is configured to transfer wafer carriers contained in corresponding carrier cassettes 26 .

[0126] According to one embodiment, the epitaxial reactor 4 comprises at least two systems 1. According to one embodiment, the epitaxial reactor 4 comprises at least two reaction chambers.

[0127] According to one embodiment, the epitaxial reactor 4 comprises two reaction chambers and two systems 1 .

[0128] Advantageously, one of the two systems 1 can be used to handle cassettes 2 of wafers 3 that are to be or have been subjected to an epitaxial deposition process, while the other of the two systems 1 can be used to handle cassettes for supports 26 containing wafer holders.

[0129] According to one embodiment, the handling robot 11 is located substantially between the two systems 1 .

[0130] According to one form of implementation, the epitaxial reactor 4 comprises a loading station 22 or “centering unit (CU)”.

[0131] According to one embodiment, the loading station 22 is located on the handling robot 11 .

[0132] According to one embodiment, the loading station 22 is located between two systems 1 .

[0133] Advantageously, in the epitaxial reactor 4 configured in this manner, the handling robot 11 is able to pick up a wafer holder from a corresponding supporting cassette 26 of the first system 1 and place the wafer holder on the loading station 22. Subsequently, the handling robot 11 is able to pick up a wafer 3 from a corresponding cassette 2 of the second system 1 and place the wafer 3 on the wafer holder previously placed on the loading station 22. In this manner, a wafer supported by a wafer holder can be moved by the handling robot 11 and can be transported in the direction of one or more reaction chambers of the epitaxial reactor 4.

[0134] According to one embodiment, the epitaxial reactor 4 comprises a single system 1 .

[0135] According to one embodiment, the epitaxial reactor 4 comprises two reaction chambers and a single system 1 .

[0136] According to one embodiment, the handling robot 11 is positioned in line with the system 1 .

[0137] According to one embodiment, the handling robot 11 is located between two reaction chambers.

[0138] According to one form of implementation, the loading station 22 is positioned in line with the handling robot 11 and the system 1 .

[0139] Advantageously, in the epitaxial reactor 4 configured in this way, the cassettes 2 for wafers 3 and the cassettes for supports 26 can be loaded on the same system 1. The handling robot 11 can then pick up the wafer holder from the corresponding support cassette 26 in the system 1 and place the wafer holder on the loading station 22. The handling robot can then pick up the wafer 3 from the corresponding cassette 2 of the same system 1 and place the wafer 3 on the wafer holder previously placed on the loading station 22. Another advantage is that this configuration reduces the footprint of the epitaxial reactor 4.

[0140] Of course, a person skilled in the art will be able to make modifications or adaptations to the present invention without departing from the scope of the claims set forth below.

[0141] Reference numerals list

[0142] 1 Wafer box loading and unloading system

[0143] 2 boxes

[0144] 3 chips

[0145] 4 Epitaxial reactor

[0146] 5 turntable platform

[0147] 6-disc actuator

[0148] 7 Turntable axis

[0149] 8 Support platform

[0150] 9 Rotation axis

[0151] 10 Rotary Actuator

[0152] 11Transporting Robot

[0153] 12 Gears

[0154] 13 Sprocket

[0155] 14 driving wheels

[0156] 15 driving gear

[0157] 16 axes

[0158] 17 Top wall of turntable platform

[0159] 18 The lower wall of the turntable platform

[0160] 19 reflector elements

[0161] 20 reflective surfaces

[0162] 21 Detection system

[0163] 22 loading stations

[0164] 23. Front side of box

[0165] 24 The back of the box

[0166] 25 Rotation axis

[0167] 26 Support Box

Claims

1. A system (1) for loading and unloading a wafer (3) cassette (2) of an epitaxial reactor (4), the system (1) comprising: a turntable platform (5) configured to transport at least one cassette (2), wherein the turntable platform (5) is pivotably connectable to the epitaxial reactor (4) about a turntable axis (7); - a turntable actuator (6) configured to drive the turntable platform (5) to rotate relative to the epitaxial reactor (4) about a turntable axis (7); It is characterized in that - at least one supporting platform (8) adapted to support at least one cassette (2), wherein the at least one supporting platform (8) is pivotally connected to the carousel platform (5) about a rotation axis (9) different from the carousel axis (7); - A rotary actuator (10) configured to operate the rotation of at least one support platform (8) relative to the turntable platform (5) about a rotation axis (9).

2. The system (1) according to claim 1 comprises a gear (12) connecting the rotary actuator (10) to at least one supporting platform (8), wherein the gear (12) is configured to rotate the supporting platform (8) relative to the turntable platform (5) around the rotation axis (9).

3. The system (1) according to claim 1 or 2, comprising a sprocket (13) pivotally connected to the turntable platform (5), wherein the sprocket (13) is coaxially positioned with the turntable axis (7), in, The system (1) comprises at least one drive wheel (14) attached to at least one support platform (8), wherein the drive wheel (14) is coaxially positioned with the rotation axis (9), and wherein the drive wheel (14) is engaged with a sprocket (13), wherein the rotary actuator (10) is operably connected to the sprocket (13) so as to drive the sprocket (13) to rotate relative to the turntable platform (5) around the turntable axis (7), and Optionally, at least one drive wheel (14) meshes with the sprocket (13) externally relative to the turntable axis (7).

4. The system (1) according to claim 3, wherein: The rotary actuator (10) includes a drive gear (15) engaged with the sprocket (13), wherein the drive gear (15) is configured to operate the rotation of the sprocket (13) around the turntable axis (7), Wherein, optionally, the sprocket (13), at least one drive wheel (14) and the drive gear (15) are placed substantially in a coplanar position, wherein, optionally, the drive gear (15) is externally meshed with the sprocket (13) relative to the turntable axis (7), and Optionally, the sprocket (13), at least one drive wheel (14) and the drive gear (15) have cylindrical teeth or helical teeth.

5. The system (1) according to any of the preceding claims, comprising a shaft (16) attached to the turntable platform (5) and extending along the turntable axis (7), being coaxial with the turntable axis (7), in, A shaft (16) is interposed between the turntable actuator (6) and the turntable platform (5), and wherein the shaft (16) is configured to receive a rotational motion from the turntable actuator (6) and transmit the rotational motion to the turntable platform (5), thereby driving the turntable platform (5) to rotate around the turntable axis (7), wherein the shaft (16) extends through the sprocket (13), and Optionally, the shaft (16) is positioned relative to the turntable platform (5) and the support platform (8).

6. The system (1) according to claim 3 or 4, wherein: Each support platform (8) comprises a respective rotation axis (25) extending coaxially with the respective rotation axis (9), wherein the rotating shaft (25) is attached to the supporting platform (8) and the corresponding driving wheel (14), and Wherein, the rotating shaft (25) extends through the turntable platform (5).

7. A system (1) according to any preceding claim, wherein: The turntable actuator (6) is a servo motor, and / or Wherein, the rotary actuator (10) is a servo motor.

8. The system (1) according to any of the preceding claims, comprising three support platforms (8) rotatably connected to the turntable platform (5) about respective and different rotation axes (9), in, The respective rotation axes (9) are parallel to each other and to the turntable axis (7), Wherein, optionally, the support platforms (8) are positioned at equal angles to each other on the turntable platform (5), Wherein, optionally, the corresponding driving wheels (14) of the plurality of supporting platforms (8) are meshed with the same sprocket (13), wherein, optionally, the turntable platform (5) is a circular plate coaxial with the turntable axis (7), and the support platform (8) is a plate, and Optionally, at least one supporting platform (8) is positioned relative to the turntable platform (5) and the sprocket wheel (13) and the driving wheel (14).

9. The system (1) according to any preceding claim, wherein: The turntable platform (5) comprises a top wall (17) and an opposite lower wall (18), wherein the top wall (17) of the turntable platform (5) faces at least one supporting platform (8), wherein the system (1) comprises a reflector element (19) comprising at least one reflecting surface (20) positioned substantially parallel to the turntable axis (7), wherein the reflector element (19) is connected to the top wall (17) of the turntable platform (5) at the turntable axis (7), and wherein the reflector element (19) extends along the turntable axis (7) opposite to the lower wall (18) of the turntable platform (5), wherein, optionally, the reflector (19) comprises a plurality of reflecting surfaces (20) equal to the number of supporting platforms (8) connected to the same turntable platform (5), Wherein, optionally, each reflective surface (20) extends in a plane parallel to the turntable axis (7) and is positioned in a straight line with the corresponding support platform (8) and overlooks the corresponding support platform (8).

10. The system (1) according to any one of the preceding claims, comprising a detection system (21) configured to detect the position and orientation of the one or more support platforms (8) or one or more boxes (2) supported by the respective support platforms (8) relative to the turntable platform (5), in, Optionally, the detection system (21) comprises one or more detection devices positioned above the one or more support platforms (8) relative to the turntable platform (5), facing the support platforms (8), and Wherein, optionally, the detection device is a laser sensor or an image detector.

11. An epitaxial reactor (4) comprising at least one reaction chamber and at least one wafer (3) cassette (2) loading and unloading system (1) according to any one of the preceding claims, and Optionally, wherein The epitaxial reactor (4) includes a handling robot (11) configured to handle wafers (3) contained in corresponding cassettes (2).

12. The epitaxial reactor (4) according to claim 11, comprising at least two reaction chambers and at least two systems (1) according to any one of claims 1 to 10, in, The epitaxial reactor (4) comprises a handling robot (11) located substantially between the two systems (1), and The epitaxial reactor (4) comprises a loading station (22) positioned by a handling robot (11) between the two systems (1).

13. The epitaxial reactor (4) according to claim 11, comprising at least two reaction chambers and a single system (1) according to any one of claims 1 to 10, in, The epitaxial reactor (4) comprises a handling robot (11) positioned by the system (1), and Therein, the epitaxial reactor (4) comprises a loading station (22) positioned by a handling robot (11) and a system (1).

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