Plasma generator using resonant waveguide provided with tuner

Abstract

Disclosed is a plasma generating apparatus using a resonant waveguide. The plasma generating device includes: an annular or elliptical central waveguide having a plurality of slits on an inner surface thereof; the first incident waveguide is connected with the central waveguide through a connecting wire in a manner of being capable of propagating electromagnetic waves; an electromagnetic wave supply unit that transmits electromagnetic waves to the incident waveguide; and a plasma chamber in which an electromagnetic wave entrance window is formed, and which is positioned on the exit side of the slit so as to be sealed from the inside of the central waveguide, so that electromagnetic waves flowing in through the slit are radiated to the outside.

Description

Technical Field

[0001] The present invention relates to a plasma generating device using a resonant waveguide, and in particular to a plasma generating device using a resonant waveguide capable of generating uniform and large-area plasma. Background Art

[0002] Generally, for large-area substrates, especially flexible OLED thin film processes or plasma treatment of functional fabrics, the roll-to-roll method is very efficient.

[0003] Since the roll-to-roll method processes the base material by scanning from one end to the other, a plasma source that can cover the entire size of the base material is required. However, for microwave plasma sources based on the prior art, their length or diameter is limited to the microwave wavelength, so there are limitations on the processing of base materials larger than a certain size.

[0004] In order to solve these problems, an elliptical plasma source using electromagnetic waves that is formed into a long track shape in one direction is manufactured and used for plasma treatment of a large area of ​​a to-be-processed object. However, it is difficult to apply power to generate uniform plasma in the length direction of the long track shape, so there is a problem that it is difficult to generate uniform and large-area plasma. In addition, it is also difficult to adjust the density of large-area plasma. Summary of the invention

[0005] Technical issues

[0006] Therefore, the problem to be solved by the present invention is to provide a plasma generating device using a resonant waveguide, which can maintain uniform electromagnetic wave power throughout the entire section of the resonant waveguide and can generate a large area plasma with maintained density and uniformity in a plasma chamber.

[0007] Another object is to provide a plasma generating device using a resonant waveguide, which can make the density of plasma more uniform or increase the density of plasma.

[0008] Technical Solution

[0009] According to an embodiment of the present invention, a plasma generating device using a resonant waveguide includes: a central waveguide of an annular or elliptical shape, with a plurality of slits on the inner side; a first incident waveguide, connected to the central waveguide through wiring so as to transmit electromagnetic waves; an electromagnetic wave supply unit, transmitting electromagnetic waves to the incident waveguide; and a plasma chamber, which is formed with an electromagnetic wave incident window, and is located at the outlet side of the slit in a sealed manner with the interior of the central waveguide, so that the electromagnetic waves flowing in through the slit are radiated to the outside. The electromagnetic wave is input into the central waveguide in the normal direction, and resonance occurs while the central waveguide is rotated, thereby forming a strong resonant electromagnetic wave in the central waveguide, and the strong electromagnetic wave can be emitted through the slit.

[0010] In one embodiment, a second incident waveguide may be included relative to the first incident waveguide, and the second incident waveguide can be connected to the central waveguide for electromagnetic wave propagation through wiring at a location symmetrical to the center point of the central waveguide. When the incident waveguide is placed on the diagonal line, the waves in the central waveguide propagate in the same direction and resonate, while compensating for the disadvantage that the power decreases as it moves away from the incident waveguide. The central waveguide forms resonance to reduce the loss of electromagnetic waves, while inducing the generation of plasma in the chamber through uniform electromagnetic wave distribution. The present plasma generating source provides a structure for generating plasma inside the chamber by applying electromagnetic waves from multiple slits at specified positions in the straight section of the central waveguide.

[0011] A relatively strong electromagnetic wave is formed near the incident waveguide, and the electromagnetic wave becomes weaker as it moves away from the incident waveguide, thereby solving the problem of uneven plasma in the straight line section. In order to solve this problem, the present invention introduces a structure in which electromagnetic waves are incident from two directions, and the first incident waveguide and the second incident waveguide are set at symmetrical positions at the center point, so that microwaves are propagated in the same direction in the waveguide, and at the same time, electromagnetic waves are supplied from both sides to solve the problem that the intensity of the electromagnetic waves becomes weaker as it moves away from the incident part.

[0012] In one embodiment, it may include: a third incident waveguide, which is parallel to the first incident waveguide and connected to the center waveguide in the same row as the second incident waveguide by wiring so that electromagnetic waves can be transmitted; and a fourth incident waveguide, which is parallel to the second incident waveguide and connected to the center waveguide in the same row as the first incident waveguide by wiring so that electromagnetic waves can be transmitted. The structure of the four incident waveguides is a structure in which waves are incident in two different directions, so that standing waves can be induced inside the waveguide. By forming standing waves, electromagnetic waves with uniform intensity can be induced in each slit. In addition, the first, second, third, and fourth incident waveguides are respectively located in the normal direction of the center part of each center waveguide, which is symmetrical in the vertical and horizontal directions, thereby having the characteristic of reducing the problem of uneven strong electric field intensity near different incident waveguides.

[0013] In one embodiment, the central waveguide includes: a first straight rectangular waveguide; a second straight rectangular waveguide parallel to the first straight rectangular waveguide; a first curved rectangular waveguide connecting the end of the first straight rectangular waveguide and the end of the second straight rectangular waveguide on one side so as to propagate electromagnetic waves; and a second curved rectangular waveguide connecting the end of the first straight rectangular waveguide and the end of the second straight rectangular waveguide on the other side so as to propagate electromagnetic waves, and the first incident waveguide is connected in parallel with the first curved rectangular waveguide at the end of the first straight rectangular waveguide to propagate electromagnetic waves.

[0014] In one embodiment, relative to the first incident waveguide, a second incident waveguide may be included, wherein the second incident waveguide can be connected to the central waveguide for electromagnetic wave propagation through wiring at a location symmetrical to the center point of the central waveguide, and the second incident waveguide is connected in parallel with the second curved rectangular waveguide at the end portion of the second straight rectangular waveguide to propagate electromagnetic waves.

[0015] In one embodiment, it may include: a third incident waveguide, which is parallel to the first incident waveguide and connected to the center waveguide in the same row as the second incident waveguide through wiring so as to propagate electromagnetic waves; and a fourth incident waveguide, which is parallel to the second incident waveguide and connected to the center waveguide in the same row as the first incident waveguide through wiring so as to propagate electromagnetic waves, the third incident waveguide is connected in parallel with the second curved rectangular waveguide at the end of the first straight rectangular waveguide to propagate electromagnetic waves, and the fourth incident waveguide is connected in parallel with the first curved rectangular waveguide at the end of the second straight rectangular waveguide to propagate electromagnetic waves.

[0016] In one embodiment, the straight rectangular waveguide and the curved rectangular waveguide are TE modes, one of the two surfaces perpendicular to the electric field in the straight rectangular waveguide and the curved rectangular waveguide is upright and facing inward, and the slit can be formed on the inner side surface of the straight rectangular waveguide.

[0017] In one embodiment, the straight rectangular waveguide may be WR430, the curved rectangular waveguide may be WR284, and the incident waveguide may be WR340.

[0018] In one embodiment, a tuner may be included on the surface facing the slit in the linear rectangular waveguide. Each slit includes a tuner, by which the wavelength in the resonant waveguide can be adjusted to adjust the power intensity of the microwave applied to each slit. By adjusting the position of the tuner located opposite each slit in the linear rectangular waveguide, the wavelength in each tube can be changed, thereby changing the intensity of the electromagnetic wave applied to the slit. In addition, the intensity of the electromagnetic wave applied to the slit at the next position can also be affected. This is a means for independently controlling the intensity of the electromagnetic wave (plasma density) applied to each slit in each plasma generating source structure, and as the plasma generating device becomes larger, the problem of uneven electromagnetic waves applied to each slit becomes more serious. In order to solve these problems, the tuner that controls each slit is located opposite the slit.

[0019] In one embodiment, tuners may be included corresponding to the number of the slits.

[0020] In one embodiment, the tuner is a stub tuner, and the tuner may be disposed from the outside of the outer side through the inside.

[0021] Effects of the Invention

[0022] According to the plasma generating device utilizing a resonant waveguide of the present invention, since the power of the electromagnetic wave is kept uniform in the entire resonant waveguide, electromagnetic waves with uniform power can be radiated into the plasma chamber through a plurality of slits, thereby being able to generate a large-area plasma in the plasma chamber with maintained density and uniformity.

[0023] In addition, since the power of the electromagnetic wave flowing in from each of the plurality of slits can be adjusted to be uniform by the tuner, there is an advantage that the density of the plasma in the plasma chamber can be made more uniform or high-density plasma can be generated. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 is a cross-sectional view for explaining the structure of a plasma generating device using a resonant waveguide according to an embodiment of the present invention;

[0025] Figure 2 yes Figure 1 A perspective view of the central waveguide and the incident waveguide is shown;

[0026] Figure 3 1 is a cross-sectional view showing the transmission of electromagnetic waves and the generation of plasma in a plasma generating device using a resonant waveguide according to an embodiment of the present invention. DETAILED DESCRIPTION

[0027] Hereinafter, a plasma generating device using a resonant waveguide according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. The present invention may be subjected to various modifications and may have various forms, and therefore specific embodiments are illustrated in the accompanying drawings and described in detail in this specification. However, it should be understood that this does not limit the present invention to a specific disclosure method, but includes all modifications, equivalent technical solutions and alternative solutions included in the concept and technical scope of the present invention. When describing the accompanying drawings, similar components are marked with similar reference numerals. In the accompanying drawings, in order to clarify the present invention, the size of the structure is shown enlarged than the actual size.

[0028] The terms "first", "second", etc. may be used to describe various constituent elements, but these constituent elements should not be limited by these terms. The terms are only used to distinguish one constituent element from another constituent element. For example, without departing from the scope of the present invention, the first constituent element may be named as the second constituent element, and similarly, the second constituent element may also be named as the first constituent element.

[0029] The terms used in this application are only used to illustrate specific embodiments and are not intended to limit the present invention. Unless the context clearly indicates a different meaning, a singular expression includes a plural expression. In this application, terms such as "including" or "having" are used to specify the existence of features, steps, actions, constituent elements, components, or combinations thereof recorded in the specification, and shall not be understood as excluding in advance the existence or additional possibility of one or more other features or steps, actions, constituent elements, components, or combinations thereof.

[0030] Unless otherwise defined, all terms used in this application, including technical terms and scientific terms, have the same meaning as those generally understood by those skilled in the art to which the present invention belongs. Terms defined in commonly used dictionaries should be interpreted as having the same meaning as that in the context of the relevant technology, and should not be interpreted in an ideal or overly formal sense unless explicitly defined in this application.

[0031] Figure 1 is a cross-sectional view for explaining the structure of a plasma generating device using a resonant waveguide according to an embodiment of the present invention. Figure 2 It is shown Figure 1A perspective view of the center waveguide and the incident waveguide is shown.

[0032] Reference Figure 1 and Figure 2 The resonant waveguide according to an embodiment of the present invention may include: a central waveguide 110 , a first incident waveguide 141 , an electromagnetic wave supplying portion, and a plasma chamber 130 .

[0033] The central waveguide 110 may be arranged in a track shape so as to transmit electromagnetic waves in a clockwise or counterclockwise direction. For example, it may be arranged in a ring shape or an ellipse shape. The central waveguide 110 is a rectangular waveguide.

[0034] Specifically, the central waveguide 110 may include a first straight rectangular waveguide 111 , a second straight rectangular waveguide 112 , a first curved rectangular waveguide 113 , and a second curved rectangular waveguide 114 .

[0035] The first linear rectangular waveguide 111 is a waveguide extending linearly from one direction of the central waveguide 110 .

[0036] The second linear rectangular waveguide 112 is a waveguide that is parallel to the first linear rectangular waveguide 111 at the center waveguide 110 .

[0037] The first curved rectangular waveguide 113 connects ends of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 at one side of the central waveguide 110 , that is, in the direction of one end of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 so that electromagnetic waves can propagate.

[0038] The second curved rectangular waveguide 114 connects ends of the first and second linear rectangular waveguides 111 and 112 at the other side of the central waveguide 110 , i.e., in the other end direction of the first and second linear rectangular waveguides 111 and 112 so that electromagnetic waves can propagate.

[0039] In the structure of the central waveguide 110, the first straight rectangular waveguide and the second straight rectangular waveguide 112 and the first curved rectangular waveguide and the second curved rectangular waveguide 114 are in TE mode, and the central waveguide 110 can be vertically configured so that one of the two faces perpendicular to the electric field in the first straight rectangular waveguide and the second straight rectangular waveguide 112 and the first curved rectangular waveguide and the second curved rectangular waveguide 114 faces the inner side of the ring or ellipse of the central waveguide 110. At this time, the face facing the inner side of the ring or ellipse of the central waveguide 110 among the two vertical faces of each rectangular waveguide 111, 112, 113, 114 is the inner side of the central waveguide 110, and the face facing the outer side of the ring or ellipse of the central waveguide 110 is the outer side of the central waveguide 110.

[0040] In one embodiment, the first straight rectangular waveguide and the second straight rectangular waveguide 112 may be formed of WR430 waveguides, and the first curved rectangular waveguide and the second curved rectangular waveguide 114 may be formed of WR284 waveguides.

[0041] In addition, the central waveguide 110 may include a plurality of slits 115. The slits 115 may be configured to radiate electromagnetic waves within the central waveguide 110 to the outside. For example, a plurality of slits 115 may be arranged at predetermined intervals on the inner side surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112. The shape of the slits 115 is not particularly limited, and for example, the slits 115 may be configured to have a size that expands from the inside of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 to the inner side surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112.

[0042] The first incident waveguide 141 injects electromagnetic waves into the interior of the central waveguide 110. The first incident waveguide 141 can be connected to the central waveguide 110 by connecting the electromagnetic waves. At this time, the first incident waveguide 141 can be connected to the first curved rectangular waveguide 113 in parallel with the first curved rectangular waveguide 113 at the end of the first straight rectangular waveguide 111 connected to the first curved rectangular waveguide 113. The transmission path of the electromagnetic wave incident from the first incident waveguide 141 is: after being incident on the first straight rectangular waveguide 111, it is transmitted in a clockwise direction when passing through the second curved rectangular waveguide 114, and then can pass through the second straight rectangular waveguide 112 and the second curved rectangular waveguide 114. As an example, the first incident waveguide 141 can be configured so that the side connected to the outer side surface of the first straight rectangular waveguide 111 gradually becomes thinner in the direction of the first straight rectangular waveguide 111.

[0043] The electromagnetic wave supply unit 120 transmits electromagnetic waves to the first incident waveguide 141. For example, the electromagnetic wave supply unit may include a power supply unit and a magnetron that oscillates electromagnetic waves into the first incident waveguide 141. A plurality of electromagnetic wave supply units 120 may be provided, and in this case, each electromagnetic wave supply unit 120 may transmit electromagnetic waves to the first incident waveguide 141 and second to fourth incident waveguides 152 described later.

[0044] The plasma chamber 130 is disposed along the inner circumference of the central waveguide 110 and is located inside the central waveguide 110 so that electromagnetic waves can be incident from the central waveguide 110. For example, the plasma chamber 130 may be provided in a ring shape or an elliptical shape.

[0045] In order to allow electromagnetic waves to be incident on the inside of the plasma chamber 130, the plasma chamber 130 may include an electromagnetic wave incident window 131. The electromagnetic wave incident window 131 is disposed facing the plurality of slits 115 of the central waveguide 110. That is, the electromagnetic wave incident window 131 is located at the exit side of the plurality of slits 115 in a manner that the inside of the central waveguide 110 is sealed, and is configured to allow the electromagnetic waves introduced through the plurality of slits 115 to be radiated to the outside of the plurality of slits 115, that is, to the inside of the plasma chamber 130. The electromagnetic wave incident window 131 may be provided in plurality, and may cover the exit side of the plurality of slits 115 provided in each of the linear rectangular waveguides 111, 112 corresponding to the inner side surface of the first linear rectangular waveguide 111 and the inner side surface of the second linear rectangular waveguide 112.

[0046] In addition, the plasma generating device using a resonant waveguide according to an embodiment of the present invention may further include a second incident waveguide 142 .

[0047] The second incident waveguide 142 injects electromagnetic waves into the interior of the central waveguide 110. The second incident waveguide 142 can be connected to the central waveguide 110 by wiring at a location symmetrical to the center point of the central waveguide 110 relative to the first incident waveguide 141 so that electromagnetic waves can be transmitted. At this time, the second incident waveguide 142 is connected in parallel with the second curved rectangular waveguide 114 at the end of the second straight rectangular waveguide 112 connected to the second curved rectangular waveguide 114 so that electromagnetic waves can be transmitted. In one embodiment, the second incident waveguide 142 can be arranged in a diagonal direction with the first incident waveguide 141. The transmission path of the electromagnetic wave incident from the second incident waveguide 142 is: after being incident on the second straight rectangular waveguide 112, it is transmitted in a clockwise direction when passing through the first curved rectangular waveguide 113, and then passes through the first straight rectangular waveguide 111 and the second curved rectangular waveguide 114. The frequency of the electromagnetic wave incident through the second incident waveguide 142 may be the same as the frequency of the electromagnetic wave incident through the first incident waveguide 141. As an example, the second incident waveguide 142 may be configured such that a surface connected to the outer side surface of the second linear rectangular waveguide 112 gradually tapers toward the second linear rectangular waveguide 112.

[0048] In addition, the plasma generating device using a resonant waveguide according to an embodiment of the present invention may further include a third incident waveguide 151 and a fourth incident waveguide 152 .

[0049] The third incident waveguide 151 injects electromagnetic waves into the interior of the central waveguide 110. The third incident waveguide 151 is parallel to the first incident waveguide 141 and can be connected to the central waveguide 110 in the same row as the second incident waveguide 142 by wiring so that electromagnetic waves can be transmitted. At this time, the third incident waveguide 151 is connected in parallel with the second curved rectangular waveguide 114 at the end of the first straight rectangular waveguide 111 connected to the second curved rectangular waveguide 114 so that electromagnetic waves can be transmitted. The transmission path of the electromagnetic wave incident from the third incident waveguide 151 is: after being incident on the first straight rectangular waveguide 111, it is transmitted in a counterclockwise direction when passing through the first curved rectangular waveguide 113, and then passes through the second straight rectangular waveguide 112 and the second curved rectangular waveguide 114. The frequency of the electromagnetic wave incident from the third incident waveguide 151 can be the same as the frequency of the electromagnetic wave incident from the first incident waveguide 141 and the second incident waveguide 142. At this time, the electromagnetic wave incident from the third incident waveguide 151 may be an electromagnetic wave having the same frequency, amplitude, and phase angle as the electromagnetic wave incident from the first incident waveguide 141 and the second incident waveguide 142. For example, the third incident waveguide 151 may be configured such that a side connected to the outer side surface of the first linear rectangular waveguide 111 gradually tapers toward the first linear rectangular waveguide 111.

[0050] The fourth incident waveguide 152 injects electromagnetic waves into the interior of the central waveguide 110. The fourth incident waveguide 152 is parallel to the second incident waveguide 142, and can transmit electromagnetic waves by connecting at a location where the central waveguide 110 in the same row as the first incident waveguide 141 intersects. At this time, the fourth incident waveguide 152 is connected in parallel with the first curved rectangular waveguide 113 at the end of the second straight rectangular waveguide 112 connected to the first curved rectangular waveguide 113 to transmit electromagnetic waves. The transmission path of the electromagnetic wave incident from the fourth incident waveguide 152 is: after being incident on the second straight rectangular waveguide 112, it is transmitted in a counterclockwise direction when passing through the second curved rectangular waveguide 114, and then passes through the first straight rectangular waveguide 111 and the first curved rectangular waveguide 113. The frequency of the electromagnetic wave incident from the fourth incident waveguide 152 can be the same as the frequency of the electromagnetic wave incident from the third incident waveguide 151. As an example, the fourth input waveguide 152 may be configured such that a surface connected to the outer side surface of the second linear rectangular waveguide 112 gradually tapers toward the second linear rectangular waveguide 112 .

[0051] In one embodiment, the first to fourth incident waveguides 152 may be formed of a WR340 waveguide.

[0052] In addition, the plasma generating device using a resonant waveguide according to an embodiment of the present invention may further include a tuner 160 .

[0053] There may be a plurality of tuners 160 , which are disposed on surfaces of the first and second linear rectangular waveguides 111 and 112 of the central waveguide 110 facing the plurality of slits 115 , that is, on outer surfaces of the first and second linear rectangular waveguides 111 and 112 .

[0054] The number of the tuners 160 corresponds to the number of the plurality of slots 115 , and the tuners 160 may be disposed to face the plurality of slots 115 on the outer sides of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 .

[0055] In one embodiment, the tuner 160 may be a stub tuner, and may be provided from the outside of the outer side of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 to penetrate the inside. In this case, the tuner 160 may be of a type with a fixed insertion length, or of a type with an adjustable insertion length to adjust the distance between the slits 115. When the insertion length of the tuner 160 is of a fixed type, the insertion length of the tuner 160 may be set differently in the central waveguide 110 along the propagation direction of the electromagnetic wave, so that the spacing relative to each slit 115 may be configured to be different from each other in the propagation direction of the electromagnetic wave. For example, the tuner 160 may be provided with a structure in which the insertion length may be changed.

[0056] Next, we will refer to Figure 3 The electromagnetic wave incident process and the plasma forming process of a plasma generating device using a resonant waveguide according to an embodiment of the present invention are described. Figure 3 1 is a cross-sectional view showing the transmission of electromagnetic waves and the generation of plasma in a plasma generating device using a resonant waveguide according to an embodiment of the present invention.

[0057] In order to form plasma in the plasma chamber 130 , electromagnetic waves are incident into the central waveguide 110 through the first to fourth incident waveguides 152 .

[0058] The electromagnetic wave incident from the first incident waveguide 141 is incident into the first straight rectangular waveguide 111 of the central waveguide 110 , and then is transmitted toward the second straight rectangular waveguide 112 via the second curved rectangular waveguide 114 .

[0059] The electromagnetic wave incident from the second incident waveguide 142 is incident into the second straight rectangular waveguide 112 of the central waveguide 110 , and then is transmitted toward the first straight rectangular waveguide 111 via the first curved rectangular waveguide 113 .

[0060] The electromagnetic waves incident through the first incident waveguide 141 and the second incident waveguide 142 are electromagnetic waves of the same frequency, and are synthesized and transmitted in the same direction (clockwise direction).

[0061] The electromagnetic wave incident from the third incident waveguide 151 is incident into the first straight rectangular waveguide 111 of the central waveguide 110 , and then is transmitted toward the second straight rectangular waveguide 112 via the first curved rectangular waveguide 113 .

[0062] The electromagnetic wave incident from the fourth incident waveguide 152 is incident into the second straight rectangular waveguide 112 of the central waveguide 110 , and then is transmitted toward the first straight rectangular waveguide 111 via the second curved rectangular waveguide 114 .

[0063] The electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 are electromagnetic waves of the same frequency, and are synthesized and transmitted in the same direction (counterclockwise). In addition, the electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 may be electromagnetic waves having the same frequency, amplitude, and phase angle as the electromagnetic waves incident through the first incident waveguide 141 and the second incident waveguide 142.

[0064] Thus, the electromagnetic waves incident through the first and second incident waveguides 141 and 142 propagate in opposite directions from the electromagnetic waves incident through the third and fourth incident waveguides 151 and 152 , causing interference, and can be induced as standing waves in the central waveguide 110 as electromagnetic waves with the same properties.

[0065] Next, the electromagnetic waves in the central waveguide 110 are introduced into the multiple slits 115 arranged in the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112, and then radiated to the interior of the plasma chamber 130 through the electromagnetic wave incident window 131 of the plasma chamber 130, so that plasma is generated in the plasma chamber 130.

[0066] During the transmission process of electromagnetic waves and the generation process of plasma, the power of the electromagnetic waves incident from the first incident waveguide 141 will decrease as it moves away from the first incident waveguide 141. However, the electromagnetic waves incident and transmitted from the first incident waveguide 141 are synthesized and propagated after an additional electromagnetic wave is incident from the second incident waveguide 142 in the same direction. Therefore, even if the power of the electromagnetic waves incident and transmitted from the first incident waveguide 141 gradually decreases, the power of the electromagnetic waves can be kept uniform throughout the entire central waveguide 10 due to the additional electromagnetic waves incident from the second incident waveguide 142 and transmitted in the same direction.

[0067] The structure for solving the power reduction problem of these electromagnetic waves is also applicable to the electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 and transmitted in the central waveguide 110 .

[0068] In addition, the electromagnetic waves transmitted after being incident from the third incident waveguide 151 and the fourth incident waveguide 152 have the same properties as the electromagnetic waves transmitted after being incident from the first incident waveguide 141 and the second incident waveguide 142 and propagate in opposite directions. Therefore, standing waves are induced in the central waveguide 110, and electromagnetic waves with uniform power flow into the multiple slits 115.

[0069] In this way, since the power of the electromagnetic wave is kept uniform throughout the central waveguide 110 and the electromagnetic wave with uniform power is introduced into the plurality of slits 115 , plasma with uniform density can be generated throughout the entire area of ​​the plasma chamber 130 .

[0070] In addition, during the transmission of the electromagnetic wave and the generation of the plasma, the power of the electromagnetic wave applied to the plasma chamber 130 may be adjusted by the tuner 160 .

[0071] That is, the tuner 160 facing each slit 115 is arranged along the propagation direction of the electromagnetic wave incident and transmitted from the first incident waveguide 141 and the second incident waveguide 142 so that its insertion length can be spaced or changed between the slits 115 so that the power of the electromagnetic wave introduced into each slit 115 is more uniform, thereby making the density of the plasma generated in the plasma chamber 130 more uniform, or generating high-density plasma.

[0072] In addition, since the central waveguide 110 and the plasma chamber 130 are provided in a ring shape or an elliptical shape, plasma in a large area can be generated.

[0073] The above description of the embodiments is provided to enable those skilled in the art to utilize or implement the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be applied to other embodiments without departing from the scope of the present invention. Therefore, the present invention is not limited to the embodiments described herein, but should be interpreted in the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A plasma generating device using a resonant waveguide, wherein: include: A circular or elliptical central waveguide with multiple slits on the inner side; A first incident waveguide connected to the central waveguide via wiring so as to transmit electromagnetic waves; An electromagnetic wave supply unit, transmitting the electromagnetic wave to the incident waveguide; as well as The plasma chamber is formed with an electromagnetic wave incident window and is located on the exit side of the slit in a sealed manner with the interior of the central waveguide so as to radiate the electromagnetic wave flowing in through the slit to the outside.

2. The plasma generating device using a resonant waveguide according to claim 1, wherein: With respect to the first incident waveguide, a second incident waveguide is included, and the second incident waveguide can be connected to the central waveguide through wiring at a position symmetrical to the center point of the central waveguide so as to propagate electromagnetic waves.

3. The plasma generating device using a resonant waveguide according to claim 2, wherein: include: A third incident waveguide, which is parallel to the first incident waveguide and connected to the center waveguide in the same row as the second incident waveguide by wiring so as to transmit electromagnetic waves; and The fourth incident waveguide is parallel to the second incident waveguide and is connected to the first incident waveguide at a point where the waveguide intersects the central waveguide in the same row as the first incident waveguide so as to transmit electromagnetic waves.

4. The plasma generating device using a resonant waveguide according to claim 1, wherein: The central waveguide comprises: a first straight rectangular waveguide; A second straight rectangular waveguide, parallel to the first straight rectangular waveguide; a first curved rectangular waveguide connecting an end of the first straight rectangular waveguide and an end of the second straight rectangular waveguide on one side so that electromagnetic waves can propagate; and a second curved rectangular waveguide, which connects an end of the first straight rectangular waveguide and an end of the second straight rectangular waveguide on the other side so that electromagnetic waves can propagate; The first incident waveguide is connected in parallel with the first curved rectangular waveguide at the end portion of the first straight rectangular waveguide to propagate electromagnetic waves.

5. The plasma generating device using a resonant waveguide according to claim 4, wherein: With respect to the first incident waveguide, a second incident waveguide is included, and the second incident waveguide can be connected to the central waveguide for electromagnetic wave propagation through wiring at a location symmetrical to the center point of the central waveguide, The second incident waveguide is connected in parallel with the second curved rectangular waveguide at the end portion of the second straight rectangular waveguide to propagate electromagnetic waves.

6. The plasma generating device using a resonant waveguide according to claim 5, wherein: include: A third incident waveguide, which is parallel to the first incident waveguide and connected to the center waveguide in the same row as the second incident waveguide by wiring so as to transmit electromagnetic waves; and a fourth incident waveguide which is parallel to the second incident waveguide and is connected to the center waveguide in the same row as the first incident waveguide by wiring so as to transmit electromagnetic waves, The third incident waveguide is connected in parallel with the second curved rectangular waveguide at the end of the first straight rectangular waveguide to transmit electromagnetic waves. The fourth incident waveguide is connected in parallel with the first curved rectangular waveguide at the end portion of the second straight rectangular waveguide to be able to propagate electromagnetic waves.

7. The plasma generating device using a resonant waveguide according to any one of claims 4 to 6, wherein: The straight rectangular waveguide and the curved rectangular waveguide are in TE mode, One of the two surfaces perpendicular to the electric field in the straight rectangular waveguide and the curved rectangular waveguide stands upright and faces inward, The slit is formed on the inner side surface of the linear rectangular waveguide.

8. The plasma generating device using a resonant waveguide according to claim 7, wherein: The straight rectangular waveguide is WR430, The curved rectangular waveguide is WR284, The incident waveguide is WR340.

9. The plasma generating device using a resonant waveguide according to any one of claims 4 to 6, wherein: The invention comprises a tuner arranged on a surface of the linear rectangular waveguide facing the slit.

10. The plasma generating device using a resonant waveguide according to claim 9, wherein: The number of the tuners corresponds to the number of the slits.

11. The plasma generating device using a resonant waveguide according to claim 9, wherein: The tuner is a stub tuner, The tuner is provided from the outside of the outer surface to penetrate the inside.

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