A suction electrode for large beam current ion implanter

Abstract

The present invention relates to the technical field of semiconductor process equipment, and discloses a suction electrode for a large beam current ion implanter, comprising a ground electrode metal plate and a suppressor electrode metal plate and an insulator arranged between the ground electrode metal plate and the suppressor electrode metal plate, the ground electrode metal plate is provided with a ground electrode shielding tube, the suppressor electrode metal plate is provided with a suppressor electrode shielding tube, and the ground electrode shielding tube and the suppressor electrode shielding tube are both sleeved outside the insulator; one end of the ground electrode shielding tube has a first end plate that closes the ground electrode shielding tube; one end of the suppressor electrode shielding tube has a second end plate that closes the suppressor electrode shielding tube; the insulator is located between the first end plate and the second end plate. In the present invention, a double-layer coating of the insulator is achieved, which not only effectively eliminates the possibility of conductive contaminants from the external space of the shielding tube adhering to the surface of the insulator, but also eliminates the adverse effects of conductive contaminants generated by the shielding tube itself on the insulator.

Description

Technical Field

[0001] The invention relates to the technical field of semiconductor process equipment, and in particular to a suction electrode used for a large beam current ion implanter. Background Art

[0002] The existing large beam current ion implanter suction electrode structure mainly includes two parts: the ground electrode metal plate and the suppressor electrode metal plate. A high voltage of several thousand volts is usually applied between the ground electrode metal plate and the suppressor electrode metal plate to ensure that the secondary electrons generated by the ion beam bombarding the graphite when passing through the suction electrode slit can be integrated into the ion beam and move together, so that the ion beam is electrically neutral and does not diverge. In order to isolate the high voltage, a cylindrical ceramic insulator is usually installed between the ground electrode metal plate and the suppressor electrode metal plate.

[0003] However, when the ion beam passes through the electrode, it will also generate a lot of contamination process products. These contamination process products have conductive properties and are easily attached to the surface of the insulator, causing the insulation function of the insulator to fail. The electrode must be removed from the equipment regularly and replaced with a new insulator. This process is not only time-consuming and labor-intensive, reducing the production efficiency of the implanter, but also has a negative impact on the stability of the process.

[0004] The Chinese invention patent with the announcement number CN107808813A discloses "an insulating device for extracting electrodes", which includes the insulator by welding a metal shielding tube on the ground metal plate, and at the same time, the structure of the insulator is modified to increase the length of the insulation path. Although this method has extended the service life of the insulator to a certain extent, it still has defects. The shielding tube is made of metal, and conductive pollutants will still be generated during the manufacturing process and attached to the surface of the insulator. In addition, the insulator structure is not optimized enough. Although the length of the insulation path has increased, the tortuosity of the insulation path is still not high, which affects the service life of the electrode. Summary of the invention

[0005] In order to solve the technical problems existing in the background technology, the present invention proposes a suction electrode for a large beam current ion implanter.

[0006] The present invention proposes a suction electrode for a large beam current ion implanter, comprising a ground electrode metal plate and a suppressor electrode metal plate and an insulator arranged between the ground electrode metal plate and the suppressor electrode metal plate. Different from the prior art, the ground electrode metal plate is provided with a ground electrode shielding tube, the suppressor electrode metal plate is provided with a suppressor electrode shielding tube, and the ground electrode shielding tube and the suppressor electrode shielding tube are both sleeved outside the insulator;

[0007] One end of the ground electrode shielding cylinder has a first end plate for closing the ground electrode shielding cylinder. Specifically, the first end plate is fixed to a side of the ground electrode metal plate opposite to the suppression electrode metal plate.

[0008] One end of the suppressor shielding tube has a second end plate for closing the suppressor shielding tube. Specifically, the second end plate is fixed to a side of the suppressor metal plate opposite to the ground metal plate.

[0009] The insulator is located between the first end plate and the second end plate.

[0010] Specifically in some embodiments, the ground electrode shielding tube has a portion sleeved on the outside of the suppression electrode shielding tube, and a first gap is formed between the inner side wall of the ground electrode shielding tube and the outer side wall of the suppression electrode shielding tube.

[0011] As a further optimized solution of the present invention, a first distance greater than zero is formed between one end of the suppressor shielding tube away from the suppressor metal plate and the first end plate.

[0012] As a further optimized solution of the present invention, a second distance greater than zero is formed between one end of the ground electrode shielding tube away from the ground electrode metal plate and the suppression electrode metal plate, and the first distance is not greater than the second distance.

[0013] As a further optimized solution of the present invention, a second interval is formed between the inner side surface of the suppressor pole shielding tube and the outer side wall of the insulator, and the second interval is not smaller than the first interval.

[0014] Specifically, in some embodiments, the suppressor shielding tube has a portion sleeved on the outside of the grounding shielding tube, and the distance between the inner wall of the suppressor shielding tube and the outer wall of the grounding shielding tube is greater than zero.

[0015] As a further optimized solution of the present invention, the first end plate is mounted on the ground electrode metal plate through a first fixing member, and the second end plate is mounted on the suppression electrode metal plate through a second fixing member.

[0016] As a further optimized solution of the present invention, a first annular groove is formed on the outer side surface of the insulator.

[0017] As a further optimized solution of the present invention, the insulator has a first connection part, a middle connection part and a second connection part, the middle connection part is located between the first connection part and the second connection part, the first connection part is connected to the ground pole metal plate, the second connection part is connected to the suppression pole metal plate, the outer diameter of the middle connection part is larger than the outer diameters of the first connection part and the second connection part, a first step surface is formed between the middle connection and the first connection part, a second step surface is formed between the middle connection and the second connection part, and a second annular groove is formed on the first step surface and / or the second step surface.

[0018] As a further optimized solution of the present invention, the suppressor metal plate is provided with a suppressor positioning groove matching the second end plate, and / or:

[0019] The ground electrode metal plate is provided with a ground electrode positioning groove matching the first end plate.

[0020] In the present invention, the proposed extraction electrode for a large beam ion implanter realizes double-layer coating of the insulator by respectively installing shielding tubes (including a ground electrode shielding tube and a suppressor electrode shielding tube) on the ground electrode metal plate and the suppressor electrode metal plate. This not only effectively eliminates the possibility of conductive pollutants from the external space of the shielding tube adhering to the surface of the insulator, but also eliminates the adverse effects of conductive pollutants generated by the shielding tube itself on the insulator.

[0021] Furthermore, the present invention optimizes the structure of the insulator, not only providing a second annular groove on both side end faces, but also adding multiple first annular grooves on the side faces, effectively increasing the insulation path length and insulation path tortuosity of the insulator, and greatly reducing the risk of conductive contaminants on the path conduction of the insulator itself. The present invention significantly increases the service life of the suction pole, extends the maintenance cycle, saves a lot of time, improves the production utilization rate of the large beam ion implanter, and reduces the frequency of manual maintenance.

[0022] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a partial cross-sectional schematic diagram of the structure of the present invention;

[0024] Figure 2 It is a schematic diagram of the explosion of the structure of the present invention;

[0025] Figure 3 This is a schematic diagram of the structure of the ground electrode metal plate of the present invention;

[0026] Figure 4 This is a schematic diagram of the structure of the inhibitory metal plate of the present invention;

[0027] Figure 5 This is a schematic diagram of the structure of the ground electrode shielding tube of the present invention;

[0028] Figure 6 This is a schematic diagram of the structure of the suppressor shielding tube of the present invention;

[0029] Figure 7 It is a schematic diagram of the insulator structure of the present invention;

[0030] In the figure: 1, ground electrode metal plate; 10, ground electrode positioning groove; 2, suppression electrode metal plate; 20, suppression electrode positioning groove; 3, insulator; 30, middle connecting part; 31, first connecting part; 32, second connecting part; 300, first annular groove; 301, second annular groove; 4, ground electrode shielding tube; 40, first end plate; 5, suppression electrode shielding tube; 50, second end plate; 6, first fixing member; 7, second fixing member. DETAILED DESCRIPTION

[0031] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar symbols throughout represent the same or similar elements or elements with the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0032] like Figure 1-Figure 7 The sucking electrode for a large beam current ion implanter shown in the figure comprises a ground electrode metal plate 1, a suppressor electrode metal plate 2 and an insulator 3 arranged between the ground electrode metal plate 1 and the suppressor electrode metal plate 2, the insulator 3 is made of a ceramic material, and the ground electrode metal plate 1 and the suppressor electrode metal plate 2 are disc-shaped, a ground electrode shielding tube 4 is arranged on the ground electrode metal plate 1, and a suppressor electrode shielding tube 5 is arranged on the suppressor electrode metal plate 2, and both the ground electrode shielding tube 4 and the suppressor electrode shielding tube 5 are sleeved outside the insulator 3;

[0033] One end of the ground electrode shielding cylinder 4 has a first end plate 40 for closing the ground electrode shielding cylinder 4. Specifically, the first end plate 40 is fixed to a side of the ground electrode metal plate 1 opposite to the suppression electrode metal plate 2 through a first fixing member 6.

[0034] One end of the suppressor shielding tube 5 has a second end plate 50 for closing the suppressor shielding tube 5. Specifically, the second end plate 50 is fixed to a side of the suppressor metal plate 2 opposite to the ground metal plate 1 through a second fixing member 7.

[0035] It should be noted here that the first fixing member 6 and the second fixing member 7 can be existing fixing members such as screws that can realize the connection between two components;

[0036] The insulator 3 is located between the first end plate 40 and the second end plate 50;

[0037] In order to achieve a better shielding effect, the ground electrode shielding tube 4 and the suppression electrode shielding tube 5 are structures of inner and outer arrangement. Specifically, in this embodiment, the ground electrode shielding tube 4 has a portion sleeved on the outside of the suppression electrode shielding tube 5, and a first interval is formed between the inner side wall of the ground electrode shielding tube 4 and the outer side wall of the suppression electrode shielding tube 5. Of course, those skilled in the art can also set it as follows: the suppression electrode shielding tube 5 has a portion sleeved on the outside of the ground electrode shielding tube 4, and the distance between the inner side wall of the suppression electrode shielding tube 5 and the outer side wall of the ground electrode shielding tube 4 is greater than zero (this situation is not shown in the figure);

[0038] During the installation process, the ground shielding tube 4 is first fixed to the ground metal plate 1 through the first fixing piece 6, and then the suppression pole shielding tube 5 is fixed to the suppression pole metal plate 2 through the second fixing piece 7, and then one end of the insulator 3 is fixed to the ground metal plate 1 or the suppression pole metal plate 2 through screws, and then the other end of the insulator 3 is fixed to the suppression pole metal plate 2 or the ground metal plate 1 through screws. It should be noted that the screws penetrate the ground metal plate 1 and the first end plate 40 and are threadedly connected to the insulator 3, and the screws penetrate the suppression pole metal plate 2 and the second end plate 50 and are connected to the insulator 3; while completing the installation of the insulator 3, the fixation between the suppression pole metal plate 2 and the ground metal plate 1 is realized, and high-voltage electrical isolation is realized through the insulator 3 between the ground metal plate 1 and the suppression pole metal plate 2;

[0039] By respectively installing shielding tubes (including ground electrode shielding tube 4 and suppression electrode shielding tube 5) on the ground electrode metal plate 1 and the suppression electrode metal plate 2, double-layer covering of the insulator 3 is achieved, which not only effectively eliminates the possibility of conductive pollutants from the external space of the shielding tube adhering to the surface of the insulator 3, but also eliminates the adverse effects of conductive pollutants generated by the shielding tube itself on the insulator 3.

[0040] Preferably, there are at least three groups of insulators 3, suppression pole shielding tubes 5 and ground pole shielding tubes 4 between the ground pole metal plate 1 and the suppression pole metal plate 2, one group of ground pole shielding tubes 4, one group of suppression pole shielding tubes 5 and one group of insulators 3 corresponding to each other, and a gap is formed between any two adjacent groups of insulators 3, thereby ensuring the stability of the connection between the ground pole metal plate 1 and the suppression pole metal plate 2.

[0041] Preferably, a first distance greater than zero is formed between one end of the suppressor shielding tube 5 away from the suppressor metal plate 2 and the first end plate 40 .

[0042] Preferably, a second distance greater than zero is formed between one end of the ground electrode shielding cylinder 4 away from the ground electrode metal plate 1 and the suppression electrode metal plate 2, and the first distance is not greater than the second distance.

[0043] Preferably, a second interval is formed between the inner side surface of the suppressor pole shielding cylinder 5 and the outer side wall of the insulator 3 , and the second interval is not less than the first interval.

[0044] Preferably, the outer side surface of the insulator 3 is provided with a first annular groove 300, and a plurality of first annular grooves 300 are provided, and a gap is formed between any two adjacent groups of first annular grooves 300;

[0045] Further, the insulator 3 has a first connection part 31, a middle connection part 30 and a second connection part 32, the middle connection part 30 is located between the first connection part 31 and the second connection part 32, the first connection part 31 is connected to the ground electrode metal plate 1, the first annular groove 300 is opened on the outside of the middle connection part, the second connection part 32 is connected to the suppression electrode metal plate 2, the outer diameter of the middle connection part 30 is larger than the outer diameters of the first connection part 31 and the second connection part 32, a first stepped surface is formed between the middle connection and the first connection part 31, a second stepped surface is formed between the middle connection and the second connection part 32, and a second annular groove 301 is opened on the first stepped surface and the second stepped surface;

[0046] The insulation path length and insulation path tortuosity of the insulator 3 are effectively increased, and the risk of conductive contaminants on the path conduction of the insulator 3 itself is greatly reduced. The present invention significantly increases the service life of the anode, prolongs the maintenance cycle, saves a lot of time, increases the production utilization rate of the large beam current ion implanter, and reduces the frequency of manual maintenance.

[0047] Preferably, in order to realize the positioning of the suppressor shielding tube 5, a suppressor positioning groove 20 matching with the second end plate 50 is opened on the suppressor metal plate 2;

[0048] In order to achieve the positioning of the ground pole shielding tube 4, a ground pole positioning groove 10 matching the first end plate 40 is opened on the ground pole metal plate 1. During the installation process, the second end plate 50 of the suppression pole shielding tube 5 is placed in the suppression pole positioning groove 20, and the second end plate 50 is fixed to the suppression pole metal plate 2 by screws (second fixing member 7). The first end plate 40 is placed in the ground pole positioning groove 10 and fixed to the ground pole metal plate 1 by screws (second fixing member 7).

[0049] It should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0050] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0051] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral one; it can be a mechanical connection, an electrical connection, or communication with each other; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0052] In the present invention, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0053] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A suction electrode for a large beam current ion implanter, comprising a ground electrode metal plate (1) and a suppressor electrode metal plate (2) and an insulator (3) arranged between the ground electrode metal plate (1) and the suppressor electrode metal plate (2), characterized in that: The ground electrode metal plate (1) is provided with a ground electrode shielding tube (4), the suppressing electrode metal plate (2) is provided with a suppressing electrode shielding tube (5), and the ground electrode shielding tube (4) and the suppressing electrode shielding tube (5) are both sleeved outside the insulator (3); One end of the ground electrode shielding cylinder (4) has a first end plate (40) for closing the ground electrode shielding cylinder (4); One end of the suppressor shielding tube (5) has a second end plate (50) for closing the suppressor shielding tube (5); The insulator (3) is located between the first end plate (40) and the second end plate (50).

2. The suction electrode for a large beam current ion implanter according to claim 1, characterized in that: The ground electrode shielding cylinder (4) has a portion which is sleeved on the outside of the suppressing electrode shielding cylinder (5), and a first gap is formed between the inner side wall of the ground electrode shielding cylinder (4) and the outer side wall of the suppressing electrode shielding cylinder (5).

3. The suction electrode for a large beam current ion implanter according to claim 2, characterized in that: A first distance greater than zero is formed between one end of the suppressor shielding cylinder (5) away from the suppressor metal plate (2) and the first end plate (40).

4. The suction electrode for a large beam current ion implanter according to claim 3, characterized in that: A second distance greater than zero is formed between one end of the ground electrode shielding cylinder (4) away from the ground electrode metal plate (1) and the suppression electrode metal plate (2), and the first distance is not greater than the second distance.

5. The suction electrode for a large beam current ion implanter according to claim 2, characterized in that: A second interval is formed between the inner side surface of the suppressor shielding cylinder (5) and the outer side wall of the insulator (3), and the second interval is not smaller than the first interval.

6. The suction electrode for a large beam current ion implanter according to claim 1, characterized in that: The suppressor shielding tube (5) has a portion which is sleeved on the outside of the grounding shielding tube (4), and the distance between the inner wall of the suppressor shielding tube (5) and the outer wall of the grounding shielding tube (4) is greater than zero.

7. The suction electrode for a large beam current ion implanter according to claim 1, characterized in that: The first end plate (40) is mounted on the ground electrode metal plate (1) via a first fixing member (6), and the second end plate (50) is mounted on the suppression electrode metal plate (2) via a second fixing member (7).

8. The suction electrode for a large beam current ion implanter according to claim 1, characterized in that: The outer side surface of the insulator (3) is provided with a first annular groove (300).

9. The suction electrode for a large beam current ion implanter according to claim 1, characterized in that: The insulator (3) comprises a first connection portion (31), a middle connection portion (30) and a second connection portion (32); the middle connection portion (30) is located between the first connection portion (31) and the second connection portion (32); the first connection portion (31) is connected to the ground electrode metal plate (1); the second connection portion (32) is connected to the suppression electrode metal plate (2); the outer diameter of the middle connection portion (30) is greater than the outer diameters of the first connection portion (31) and the second connection portion (32); a first stepped surface is formed between the middle connection portion and the first connection portion (31); a second stepped surface is formed between the middle connection portion and the second connection portion (32); and a second annular groove (301) is provided on the first stepped surface and / or the second stepped surface.

10. The suction electrode for a large beam current ion implanter according to claim 1, characterized in that: The suppressor metal plate (2) is provided with a suppressor positioning groove (20) matching the second end plate (50); and / or: The ground electrode metal plate (1) is provided with a ground electrode positioning groove (10) matching the first end plate (40).

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