A plasma generator and magnetron sputtering coating machine
By setting multiple air inlets in the plasma generator cavity and adjusting the gas inlet volume with a regulating valve, the problem of insufficient uniformity of the atmosphere concentration in the plasma generator cavity is solved, and the uniformity of the plasma energy density is achieved and the coating quality is improved.
Patent Information
- Application Number
- CN202411995252.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2025-04-08
AI Technical Summary
The atmosphere concentration uniformity of the existing plasma generation chamber is poor, resulting in differences in the energy density of the plasma, affecting the coating quality.
A plasma generator is designed. The plasma generator is equipped with multiple air inlets. The gas supply assembly is equipped with gas sources that respectively pass through two different gases. Each air inlet is connected to two gas sources and is equipped with a regulating valve to adjust the gas intake amount. By adjusting the gas mixing ratio of the mixed gas, the energy density of the plasma is adjusted.
By adjusting the gas intake amount of each air intake port, the plasma energy density in different areas of the plasma generation cavity can be consistent, the coating quality can be improved, and the advantages of simple structure, low cost and easy to implement application.
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Figure CN119789292A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of magnetron sputtering coating, and in particular to a plasma generator and a magnetron sputtering coating machine. Background Art
[0002] The plasma generator is the core device in the magnetron sputtering coating equipment. Among them, the plasma generator that uses the gas discharge method to generate plasma mainly includes a shell with a plasma generating chamber, a discharge component installed in the plasma generating chamber, and a gas supply component for introducing gas into the generating chamber. When working, a mixed gas (for example, an AR main gas mixed with one or more of oxygen, nitrogen, acetylene and methane) is introduced into the plasma generating chamber through the gas supply component, and plasma is generated under the action of the discharge component. In the prior art, the plasma generating chamber is generally provided with only one gas inlet connected to the gas supply component to introduce the mixed gas into the plasma generating chamber. There is a phenomenon that the atmosphere concentration of the mixed gas near the gas inlet position area is high, the atmosphere concentration of the mixed gas far from the gas inlet position area is low, and the uniformity of the atmosphere concentration of the mixed gas in the plasma generating chamber is poor, which will lead to differences in the energy density of the plasma in different position areas in the plasma generating chamber, thereby affecting the coating quality, especially when the size of the plasma generating chamber is large, this problem is particularly prominent. In order to weaken this problem, there is also a method of setting multiple air inlets in different positions of the plasma generating chamber to introduce the mixed gas. However, the existing technology directly connects the multiple air inlets to the gas supply assembly, and the mixed gas supplied by the gas supply assembly is directly introduced into each air inlet. It is impossible to adjust the air intake volume of each air inlet. Although it can improve the uniformity of the atmosphere concentration of the mixed gas in the plasma generating chamber to a certain extent, the improvement is limited, and it still cannot effectively solve the problem of different energy density of plasma in different positions of the plasma generating chamber. Summary of the invention
[0003] The technical problem to be solved by the present invention is to overcome the deficiencies in the prior art and provide a plasma generator and a magnetron sputtering coating machine which can improve the uniformity of plasma energy density, have a simple structure, low cost, and are easy to implement and apply.
[0004] In order to solve the above technical problems, the present invention adopts the following technical solutions:
[0005] A plasma generator comprises a shell having a plasma generating chamber and a gas supply assembly for introducing gas into the plasma generating chamber, wherein the plasma generating chamber is provided with a plurality of gas inlets, the gas supply assembly is provided with a first gas source and a second gas source for respectively introducing two different gases, each gas inlet is connected to the first gas source and the second gas source, and the plasma generator is provided with a regulating valve for adjusting the gas intake amount of at least one gas corresponding to at least one gas inlet.
[0006] As a further improvement of the above technical solution:
[0007] An air distribution plate is arranged in the plasma generating chamber, and a plurality of air inlets are arranged on the air distribution plate, and each air inlet is connected with a first air source and a second air source through an air guide channel arranged on the air distribution plate.
[0008] The air distribution plate is provided with a plurality of air guide channels, and at least one air guide channel is connected to more than two air inlets at the same time.
[0009] The regulating valve comprises an adjusting screw, which is threadedly connected to the air distribution plate and can be screwed to adjust the length of the adjusting screw extending into the air guide channel connected to the corresponding air inlet.
[0010] Each air inlet is connected to the first air source and the second air source through pipelines.
[0011] The regulating valve is arranged on the pipeline connected to the corresponding air inlet.
[0012] The plasma generating chamber is a long strip-shaped chamber, and a plurality of air inlets are sequentially arranged at intervals along the length direction of the long strip-shaped chamber.
[0013] The long strip cavity is divided into a plurality of air distribution sections connected in sequence along the length direction, each air distribution section is provided with more than one air inlet, and each air distribution section is provided with a corresponding regulating valve for simultaneously regulating the air intake amount of at least one gas in all the air inlets of the air distribution section.
[0014] A magnetron sputtering coating machine is provided with the above-mentioned plasma generator.
[0015] Compared with the prior art, the advantages of the present invention are:
[0016] The plasma generating chamber of the plasma generator of the present invention is provided with a plurality of air inlets, and the air supply assembly is provided with a first air source and a second air source for respectively introducing two different gases, and at the same time, a regulating valve for adjusting the air intake amount of at least one gas is provided corresponding to at least one air inlet, and different gases in the mixed gas for generating plasma can be divided into two gases through the first air source and the second air source and separately introduced into each air inlet, and the air intake amount of at least one gas of the air inlet is adjusted by the regulating valve, and the mixing ratio of the mixed gas introduced into the plasma generating chamber by the air inlet can be adjusted, thereby adjusting the mixing ratio of the mixed gas at the position area of the air inlet, and the energy density of the plasma generated at the position area of the air inlet can be adjusted by adjusting the mixing ratio of the mixed gas, so that the energy density of the plasma generated at different positions in the plasma generating chamber is consistent, and the energy density of the plasma generated in the entire plasma generating chamber is uniform and consistent, which can improve the coating quality. The plasma generator has the advantages of simple structure, low cost, and easy implementation and application. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 It is a schematic diagram of the cross-sectional structure of the plasma generator.
[0018] Figure 2 This is a schematic diagram of the main structure of the air distribution plate.
[0019] Figure 3 for Figure 2 Enlarged structural diagram at A in the middle.
[0020] Figure 4 for Figure 2 Enlarged structural diagram at B in the middle.
[0021] Legend:
[0022] 1. Shell; 11. Plasma generating chamber; 12. Air inlet; 2. First air source; 3. Second air source; 4. Regulating valve; 5. Air distribution plate; 51. Air guide channel. DETAILED DESCRIPTION
[0023] The present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.
[0024] Embodiment 1:
[0025] like Figure 1 and Figure 2As shown, the plasma generator of this embodiment includes a shell 1 having a plasma generating chamber 11 and a gas supply assembly for introducing gas into the plasma generating chamber 11, the plasma generating chamber 11 is provided with a plurality of gas inlets 12, the gas supply assembly is provided with a first gas source 2 and a second gas source 3 for respectively introducing two different gases, each gas inlet 12 is connected to the first gas source 2 and the second gas source 3, and the plasma generator is provided with a regulating valve 4 for adjusting the gas intake amount of at least one gas corresponding to at least one gas inlet 12. The plasma generating chamber 11 of the plasma generator is provided with a plurality of gas inlets 12, and the gas supply assembly is provided with a first gas source 2 and a second gas source 3 for respectively introducing two different gases, and a regulating valve 4 for adjusting the gas intake amount of at least one gas is provided corresponding to at least one gas inlet 12, and different gases in the mixed gas used to generate plasma can be divided into two gases through the first gas source 2 and the second gas source 3 and separately introduced into each gas inlet 12, and the gas intake amount of at least one gas of the gas inlet 12 is adjusted by the regulating valve 4, and the gas mixing ratio of the mixed gas introduced into the plasma generating chamber 11 by the gas inlet 12 can be adjusted, thereby adjusting the gas mixing ratio of the mixed gas at the position area of the gas inlet 12, and the energy density of the plasma generated at the position area of the gas inlet 12 can be adjusted by adjusting the gas mixing ratio of the mixed gas, so that the energy density of the plasma generated at different positions in the plasma generating chamber 11 is consistent, and the energy density of the plasma generated in the entire plasma generating chamber 11 is uniform and consistent, which can improve the coating quality. The plasma generator has the advantages of simple structure, low cost, and easy implementation and application.
[0026] The gas introduced by the first gas source 2 and the second gas source 3 may be a single gas or a mixed gas of multiple gases. For example, the first gas source 2 may introduce AR main gas, and the second gas source 3 may introduce one or a mixed gas of more than two of oxygen, nitrogen, acetylene and methane. The type and kind of gas introduced by the first gas source 2 and the second gas source 3 are adjusted and selected according to actual production needs.
[0027] In this embodiment, each air inlet 12 is provided with a regulating valve 4 for regulating the intake amount of any one of the two gases. In other embodiments, each air inlet 12 may also be provided with a regulating valve 4 for regulating the intake amount of the two gases, which can regulate the flow rate of any one of the gases, facilitating the adjustment of the mixing ratio and flow rate of the mixed gas. Or any other number of air inlets 12 may be provided with regulating valves 4 for regulating the intake amount of one or both gases.
[0028] In this embodiment, an air distribution plate 5 is provided in the plasma generating chamber 11, and a plurality of air inlets 12 are provided on the air distribution plate 5, and each air inlet 12 is connected to the first air source 2 and the second air source 3 through an air guide channel 51 provided on the air distribution plate 5. Specifically, each air inlet 12 is connected to the first air source 2 through one air guide channel 51, and each air inlet 12 is connected to the second air source 3 through another air guide channel 51. Since the air inlets 12 and the air guide channels 51 are both provided on the air distribution plate 5, it is convenient to manufacture and assemble, the cost can be reduced, and the structure is simple and compact.
[0029] In this embodiment, Figure 3 and Figure 4 As shown, the air distribution plate 5 is provided with a plurality of air guide channels 51, and at least one air guide channel 51 is connected to more than two air inlets 12 at the same time. The number and total length of the air guide channels 51 provided on the air distribution plate 5 can be reduced, the processing can be simplified, the cost can be reduced, and the impact on the structural strength of the air distribution plate 5 can be reduced. Preferably, every two air inlets 12 are connected to the first air source 2 at the same time through one air guide channel 51, and every two air inlets 12 are connected to the second air source 3 at the same time through another air guide channel 51.
[0030] In this embodiment, the regulating valve 4 includes an adjusting screw, which is threadedly connected to the air distribution plate 5 and can be adjusted by screwing the length of the adjusting screw extending into the air guide channel 51 connected to the corresponding air inlet 12. By adjusting the length of the adjusting screw extending into the air guide channel 51 connected to the corresponding air inlet 12, the flow area of the air guide channel 51 can be changed, thereby adjusting the air intake. The arrangement of this type of regulating valve 4 on the basis of the air distribution plate 5 has the advantages of simple and compact structure, low cost, and easy adjustment. In other embodiments, the regulating valve 4 can also adopt other existing valves that can adjust the air intake, and the setting position of the regulating valve 4 can also be set at other reasonable positions in the air circuit connecting the air inlet 12 and each air source. For example, the regulating valve 4 can adopt an air regulating screw, which is arranged in the air circuit and used as a connecting joint at the same time. The purpose of adjusting the air intake can be achieved by replacing different air regulating screws.
[0031] In this embodiment, the plasma generating chamber 11 is a long strip-shaped chamber, and the plurality of air inlets 12 are arranged in sequence and at intervals along the length direction of the long strip-shaped chamber. The gas is introduced into the plasma generating chamber 11 at a plurality of positions along the length direction of the long strip-shaped chamber, which is conducive to ensuring the uniformity of the gas volume at each position area. In other embodiments, when the plasma generating chamber 11 is a chamber of other shapes, the plurality of air inlets 12 may also be arranged in other positions and ways, specifically in accordance with the principle of ensuring the uniformity of the gas volume at each position area of the plasma generating chamber 11.
[0032] In another embodiment, preferably, the long strip cavity is divided into a plurality of gas distribution sections connected in sequence along the length direction, each gas distribution section is provided with one or more gas inlets 12, and each gas distribution section is provided with a regulating valve 4 for simultaneously regulating the gas inlet amount of at least one gas in all gas inlets 12 of the gas distribution section. The gas inlet amount of at least one gas in all gas inlets 12 of the entire gas distribution section is regulated by one regulating valve 4, and the energy density of the plasma generated at different positions of the long strip cavity is regulated by regulating the mixing ratio of the mixed gas within the range of each gas distribution section of the long strip cavity. In this way, the number of regulating valves 4 can be saved, the compactness of the structure can be improved, and the cost can be reduced.
[0033] Embodiment 2:
[0034] The plasma generator of this embodiment is basically the same as that of embodiment 1, the main difference being that, in this embodiment, each air inlet 12 is connected to the first air source 2 and the second air source 3 through a pipeline. That is, each air inlet 12 of this embodiment is directly connected to the first air source 2 and the second air source 3 through a pipeline, and the pipeline can adopt a conventional air guide pipe. And in this embodiment, the regulating valve 4 is arranged on the pipeline connected to the corresponding air inlet 12. This embodiment does not need to design and manufacture the air distribution plate 5, and only commercially available air guide pipes and regulating valves 4 are used, which makes it easier to implement and apply.
[0035] Embodiment 3:
[0036] The magnetron sputtering coating machine of this embodiment is provided with the plasma generator of embodiment 1 or 2. Since the magnetron sputtering coating machine of this embodiment is provided with the plasma generator of embodiment 1 or 2, it also has the advantages of the plasma generator.
[0037] The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. For those skilled in the art, improvements and changes obtained without departing from the technical concept of the present invention should also be regarded as the protection scope of the present invention.
Claims
1. A plasma generator, comprising a housing (1) having a plasma generating chamber (11) and a gas supply assembly for introducing gas into the plasma generating chamber (11), characterized in that: The plasma generating chamber (11) is provided with a plurality of gas inlets (12); the gas supply assembly is provided with a first gas source (2) and a second gas source (3) for respectively introducing two different gases; each gas inlet (12) is connected to the first gas source (2) and the second gas source (3); and the plasma generator is provided with a regulating valve (4) for regulating the intake amount of at least one gas corresponding to at least one gas inlet (12).
2. The plasma generator according to claim 1, characterized in that: An air distribution plate (5) is provided in the plasma generating chamber (11), a plurality of air inlets (12) are provided on the air distribution plate (5), and each air inlet (12) is connected to a first air source (2) and a second air source (3) via an air guide channel (51) provided on the air distribution plate (5).
3. The plasma generator according to claim 2, characterized in that: The air distribution plate (5) is provided with a plurality of air guide channels (51), and at least one air guide channel (51) is simultaneously connected to more than two air inlets (12).
4. The plasma generator according to claim 2, characterized in that: The regulating valve (4) comprises an adjusting screw, which is threadably connected to the air distribution plate (5) and can be screwed to adjust the length of the screw extending into the air guide channel (51) connected to the corresponding air inlet (12).
5. The plasma generator according to claim 1, characterized in that: Each air inlet (12) is connected to the first air source (2) and the second air source (3) through pipelines.
6. The plasma generator according to claim 5, characterized in that: The regulating valve (4) is arranged on a pipeline connected to the corresponding air inlet (12).
7. The plasma generator according to any one of claims 1 to 6, characterized in that: The plasma generating chamber (11) is a long strip-shaped chamber, and a plurality of air inlets (12) are sequentially arranged at intervals along the length direction of the long strip-shaped chamber.
8. The plasma generator according to claim 7, characterized in that: The long strip-shaped cavity is divided into a plurality of air distribution sections connected in sequence along the length direction, each air distribution section is provided with one or more air inlets (12), and each air distribution section is provided with a corresponding regulating valve (4) for simultaneously regulating the air intake amount of at least one gas in all the air inlets (12) in the air distribution section.
9. A magnetron sputtering coating machine, characterized in that: The magnetron sputtering coating machine is provided with the plasma generator according to any one of claims 1 to 8.