Composition

Abstract

The present invention relates to a composition containing an alkali soluble polymer and a colorant.

Description

Technical Field

[0001] The present invention relates to a composition containing an alkali-soluble polymer and a colorant, and also to a method for producing a cured layer, a layer, a light-converting device, an optical device, the use of the device, the use of the light-converting device and a method for producing an optical device. Background Art

[0002] JP 2022-33154A and JP 2021-113977 A (Toray) describe a polysiloxane-based resin composition (inventive example) containing polysiloxane, a white pigment, and an organic metal compound.

[0003] JP 2021-161401 A (Toray) discloses a polysiloxane-based resin composition, which, as stated in claim 1, contains a photoradical generator, polysiloxane, and a (meth)acrylic polymer or a Cardo-type polymer.

[0004] Patent Literature

[0005] 1. JP 2021-113977 A

[0006] 2. JP 2022-33154A

[0007] 3. JP 2021-161401 A Summary of the invention

[0008] However, the inventors of the present case have recently discovered that there are still one or more significant issues that need to be improved, as listed below: being able to develop with a low concentration of alkaline developer, preferably developing within a shorter development time and / or taking into account the reactivity and storage stability of the composition, achieving high sensitivity of the composition, reducing exposure energy and exposure time, improving the structure of the patterned cured film (bank structure), especially improving the bottom structure of the patterned cured film, providing improved curing of the bottom of the coated composition, achieving improved reflection and / or high optical density (OD) of the cured film, especially achieving improved reflection and / or high OD of a cured film with white and black pigments (gray banks).

[0009] The inventors of this case aim to solve one or more of the above problems.

[0010] The inventors of this case unexpectedly discovered that one or more of the above technical problems can be solved by the features defined in the claims.

[0011] That is, a new composition, preferably a photocurable composition, preferably the composition does not contain any polysiloxane, is found, the composition comprises at least:

[0012] i) an alkali-soluble polymer containing olefinic double bonds; and

[0013] ii) Colorants.

[0014] In another aspect, the present invention also relates to a method for manufacturing a solidified layer, which comprises at least the following steps;

[0015] (xi) providing the composition of the present invention onto a layer or substrate to form a coated layer; and

[0016] (Xii) The coated layer is baked to obtain a cured layer.

[0017] In another aspect, the invention relates to a layer obtained or obtainable by the process of the invention.

[0018] In another aspect, the present invention also relates to a layer comprising at least:

[0019] i) a polymer (A) which is derived or derivable from an alkali-soluble polymer containing olefinic double bonds; and

[0020] ii) Colorants.

[0021] In another aspect, the present invention also relates to a light conversion device comprising at least the layer of the present invention.

[0022] In another aspect, the present invention also relates to an optical device comprising at least the layer of the present invention or the light conversion device of the present invention.

[0023] In another aspect, the present invention also relates to use of the composition of the present invention or the layer of the present invention in a method for producing a photoconversion device.

[0024] In another aspect, the present invention also relates to use of the light conversion device of the present invention in a method for manufacturing an optical device.

[0025] In another aspect, the present invention also relates to a method for manufacturing an optical device, comprising at least:

[0026] The light conversion device of the present invention is provided in an optical device.

[0027] Further advantages of the present invention will become apparent from the following detailed description. DETAILED DESCRIPTION

[0028] In this specification, unless otherwise specified, symbols, units, abbreviations and terms have the following meanings.

[0029] In this specification, unless otherwise specifically stated, the singular includes the plural, and "one" or "it" means "at least one". In this specification, unless otherwise specifically stated, an element in a concept may be expressed in multiple species, and when describing an amount (e.g., mass % or mole %), it refers to the sum of multiple species. "And / or" includes all combinations of elements and also includes the use of the elements alone.

[0030] In the present specification, when "to / ~" or "-" is used to express a numerical range, both ends are included and the units are the same. For example, 5 to 25 mol% means 5 mol% or more and 25 mol% or less.

[0031] In this specification, hydrocarbon refers to a hydrocarbon containing carbon and hydrogen, and optionally containing oxygen or nitrogen. Hydrocarbon group refers to a hydrocarbon that is monovalent or divalent or higher. In this specification, aliphatic hydrocarbon refers to a straight-chain, branched or cyclic aliphatic hydrocarbon, and aliphatic hydrocarbon group refers to an aliphatic hydrocarbon that is monovalent or divalent or higher. Aromatic hydrocarbon refers to a hydrocarbon containing an aromatic ring, which may optionally contain not only an aliphatic hydrocarbon group as a substituent, but also be condensed with an alicyclic ring. Aromatic hydrocarbon group refers to an aromatic hydrocarbon that is monovalent or divalent or higher. In addition, aromatic ring refers to a hydrocarbon containing a conjugated unsaturated ring structure, and alicyclic ring refers to a hydrocarbon having a ring structure but not containing a conjugated unsaturated ring structure.

[0032] In this specification, an alkyl group refers to a group obtained by removing any hydrogen atom from a straight-chain or branched saturated hydrocarbon, including straight-chain alkyl groups and branched alkyl groups; a cycloalkyl group refers to a group obtained by removing a hydrogen atom from a saturated hydrocarbon having a cyclic structure, and the cyclic structure may contain a straight-chain or branched alkyl group as a side chain.

[0033] In this specification, an aryl group refers to a group obtained by removing any one hydrogen atom from an aromatic hydrocarbon. An alkylene group refers to a group obtained by removing any two hydrogen atoms from a straight-chain or branched saturated hydrocarbon. An arylene group refers to a hydrocarbon group obtained by removing any two hydrogen atoms from an aromatic hydrocarbon.

[0034] In this specification, the terms such as “C x-y ”, “C x -C y ” and “C x " indicates the number of carbon atoms in a molecule or substituent. For example, C 1-6 The alkyl group represents an alkyl group having 1 to 6 carbon atoms (e.g., methyl, ethyl, propyl, butyl, pentyl, and hexyl). In addition, the fluoroalkyl group used in the present specification refers to a group in which one or more hydrogen atoms in the alkyl group are replaced by fluorine, and the fluoroaryl group refers to a group in which one or more hydrogen atoms in the aryl group are replaced by fluorine.

[0035] In this specification, when a polymer has a plurality of repeating units, these repeating units are copolymerized, and these copolymerizations are any of alternating copolymerization, random copolymerization, block copolymerization, graft copolymerization, or a mixture of any of these.

[0036] In this specification, "%" represents mass %, and "ratio (proportion)" represents mass ratio.

[0037] According to the present invention, the composition is preferably a photocurable composition, preferably the composition does not contain any polysiloxane, and the composition comprises at least the following components, consists essentially of the following components, or consists of the following components:

[0038] i) an alkali-soluble polymer containing olefinic double bonds; and

[0039] ii) Colorants.

[0040] -Alkali soluble polymer

[0041] The composition according to the invention comprises an alkali-soluble polymer containing olefinic double bonds.

[0042] From the viewpoint of being able to develop with a low concentration alkaline developer, preferably developing with a shorter developing time, and taking both reactivity and storage stability into consideration, the solid acid value of the alkaline polymer is preferably 30 to 160 mgKOH / g, more preferably 50 to 150 mgKOH / g, and even more preferably 60 to 80 mgKOH / g. For example, the polymer can be preferably formed using 2-methyl-2-acrylic acid and the following polymers: 2-methyl-2-acrylic acid 2-hydroxyethyl ester, 2-acrylic acid 2-isocyanate and 2-methyl-2-acrylic acid methyl ester (C6H10O3.C6H7NO3.C5H8O2.C4H6O2)x (CAS registration number 1615232-03-05).

[0043] In a preferred embodiment of the present invention, from the perspective of ideal viscosity, reactivity, developability, and ease of operation, the weight average molecular weight of the alkali-soluble polymer is 1,000 to 100,000, more preferably 1,200 to 30,000, and even more preferably 3000 to 8000. Here, the weight average molecular weight is a polystyrene-converted weight average molecular weight measured by gel permeation chromatography.

[0044] Such alkali-soluble polymers can be, for example, from the ACA series of DAICE Lallnexco., such as (ACA) Z200M, (ACA) Z250, (ACA) Z251, (ACA) Z254F, (ACA) Z300, (ACA) Z320, as described in JP 2016-69400A (Natoko).

[0045] Preferably, the alkali-soluble polymer is a polymer containing an acryloyl group. Therefore, preferably, the alkali-soluble polymer is a (meth)acrylate polymer, more preferably a methacrylate polymer, an acrylate polymer or a combination thereof, and even more preferably, the polymer material is an acrylate polymer.

[0046] The alkali-soluble polymer used in the present invention may have a carboxyl group. By having a carboxyl group, the solubility of the alkali-soluble polymer in a low-concentration developer can be improved.

[0047] According to the present invention, the term "alkali-soluble polymer" refers to a polymer that is soluble in a 2.38% TMAH aqueous solution at 23.0±0.1°C.

[0048] -(Meth)acrylate polymer

[0049] Here, the term "(meth)acrylate" is a general term for acrylate and methacrylate.

[0050] According to the present invention, when low concentration developers are used and / or low curing temperatures are applied, it is preferred to use one or more (meth)acrylate polymers.

[0051] The alkali-soluble polymer used in the present invention can be selected from commonly used methacrylate polymers, acrylate polymers or combinations thereof, and is more preferably an acrylic polymer, such as polyacrylic acid, polymethacrylic acid, polyalkyl acrylate, polyalkyl methacrylate, etc. The acrylic polymer used in the present invention preferably contains repeating units containing an acryl group, and preferably further contains repeating units containing a carboxyl group.

[0052] Although the repeating unit containing a carboxyl group is not particularly limited as long as it is a repeating unit containing a carboxyl group in a side chain, a repeating unit derived from an unsaturated carboxylic acid, an unsaturated carboxylic anhydride or a mixture thereof is preferred.

[0053] Furthermore, the above-mentioned polymer preferably contains a hydroxyl group-containing repeating unit derived from a hydroxyl group-containing unsaturated monomer.

[0054] In addition, by applying the composition of the present invention on a substrate, performing imagewise exposure and development, a (patterned) cured film is formed. At this time, it is necessary to generate a solubility difference between the exposed area and the unexposed area, and the coating film in the unexposed area should have a certain or higher solubility in the developer. For example, if the dissolution rate (hereinafter sometimes referred to as the alkali dissolution rate or ADR, which will be described in detail later) of the pre-baked coating film in a 2.38% tetramethylammonium hydroxide (hereinafter sometimes referred to as TMAH) aqueous solution is / second or more, it is considered that a pattern can be formed by exposure and development. However, since the required solubility depends on the film thickness of the cured film to be formed and the development conditions, the alkali-soluble polymer should be appropriately selected according to the development conditions. Although it varies depending on the type and amount of the photosensitizer or silanol catalyst contained in the composition, for example, if the film thickness is 0.1 to 100 μm (1,000 to ), the dissolution rate in a 2.38% TMAH aqueous solution is preferably 50 to / second, more preferably 100 to / Second.

[0055] - Thiol-containing multifunctional compounds

[0056] According to the present invention, in a preferred embodiment, the composition further comprises a thiol-containing multifunctional compound, preferably, the thiol-containing multifunctional compound contains a pentaerythritol structure.

[0057] In a more preferred embodiment, the thiol-containing multifunctional compound is represented by the following chemical formula (I x )express:

[0058]

[0059] Among them, R 1a , R 1b , R 1c and R 1d are each independently selected from a hydrogen atom, an alkyl chain having 1 to 10 carbon atoms, a cyclic group having 3 to 10 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, an aryl group having 3 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, wherein at least one H atom is replaced by an SH group, wherein one or more non-adjacent CH2 groups may be replaced by an oxygen atom, C=O, C=S, C=Se, C=NH, SiH2, SO, SO2, OS or CONH, and wherein one or more H atoms may be replaced by D, F, Cl, Br, I, CN or NO2, wherein R 1a , R 1b , R 1c and R 1d At least one of them is not a hydrogen atom, preferably R 1a , R 1b , R 1c and R 1d At least two of them are not hydrogen atoms, and more preferably at least R 1a , R 1b , R 1c Not a hydrogen atom.

[0060] As the thiol-containing polyfunctional compound, publicly available compounds can be used. Examples of such thiol-containing polyfunctional compounds include difunctional thiols such as 1,4-bis(3-mercaptobutyryloxy)butane, 1,3,5-tris(2-(mercaptobutyryloxy)ethyl), tris-[(3-mercaptopropionyloxy)-ethyl-]-isocyanate, trimethylolpropane tris(3-mercaptopropionate), dipentaerythritol hexa(3-mercaptopropionate), trimethylolpropane tris(3-mercaptobutyrate), trimethylolethane tris(3-mercaptobutyrate), and other trifunctional thiols such as 2-hydroxymethyl-2-methyl-1,3-propanediol tris-(3-mercaptopropionate), trimethylolpropane tris(3-mercaptobutyrate) (Karenz MT-TPMB (trademark)), pentaerythritol tetra(3-mercaptobutyrate), trimethylolpropane tris(3-mercaptopropionate) (TMMP-LV; SC chem.), tetrafunctional thiol, such as pentaerythritol tetrakis (3-mercaptopropionate) (PEMP-LV: SC chem.), pentaerythritol tetrakis (3-mercaptobutyrate) (Karenz MT-PE-1 (trademark)). Among them, from the viewpoint of improving sensitivity to reduce exposure energy and exposure time, the thiol-containing multifunctional compound preferably contains a pentaerythritol structure, such as trimethylolpropane tris (3-mercaptobutyrate) (Karenz MT-TPMB (trademark)), pentaerythritol tetrakis (3-mercaptobutyrate) (Karenz MT-PE-1 (trademark)).

[0061] - Compounds containing at least two (meth)acryloyloxy groups

[0062] In a preferred embodiment of the present invention, the composition further comprises a compound containing at least two (meth)acryloyloxy groups.

[0063] Preferably, the at least two (meth)acryloyloxy groups are two or more acryloyloxy groups, methacryloyloxy groups or a combination thereof. Preferably, from the viewpoint of compatibility with the resin, the total amount of the compound containing the at least two (meth)acryloyloxy groups is 5 wt % to 1000 wt %, more preferably 10 wt % to 500 wt %, even more preferably 15 wt % to 300 wt % based on the total amount of the alkali-soluble polymer. Preferably, the compound is a monomer having a molecular weight of 2000 or less, more preferably 2000 to 50, even more preferably 1000 to 100. From the viewpoint of reactivity, it is preferably relatively smaller than the alkali-soluble polymer.

[0064] Here, the term "(meth)acryloyloxy" is a general term for acryloyloxy and methacryloyloxy. The compound is a compound that can react with an alkali-soluble polymer to form a cross-linked structure. Here, in order to form a cross-linked structure, a compound containing two or more reactive groups of acryloyloxy or methacryloyloxy is required, and in order to form a higher level of cross-linked structure, it is preferred to contain three or more acryloyloxy or methacryloyloxy groups.

[0065] In addition, the (meth)acryloyloxy group-containing compound can be used alone or in combination of two or more.

[0066] Preferably, the compound containing at least two (meth)acryloyloxy groups is a polyacrylate monomer having at least three (meth)acryloyloxy groups, more preferably, it is a polyacrylate monomer selected from one or more members of the group consisting of: a polyacrylate monomer having three (meth)acryloyloxy groups, a polyacrylate monomer having four (meth)acryloyloxy groups, a polyacrylate monomer having five (meth)acryloyloxy groups, a polyacrylate monomer having six (meth)acryloyloxy groups, even more preferably, it is a polyacrylate monomer having five (meth)acryloyloxy groups, a polyacrylate monomer having six (meth)acryloyloxy groups, or a mixture thereof.

[0067] Preferably, the polyacrylate monomer having three (meth)acryloyloxy groups is selected from one or more members of the group consisting of trimethylolpropane triacrylate, trimethylolpropane ethoxy triacrylate, trimethylolpropane propoxy triacrylate, glycerol propoxy triacrylate, and pentaerythritol triacrylate.

[0068] Preferably, the polyacrylate monomer having four (meth)acryloyloxy groups is selected from one or more members of the group consisting of pentaerythritol tetraacrylate, ditrimethylolpropane tetraacrylate, and pentaerythritol ethoxy tetraacrylate.

[0069] Preferably, the polyacrylate monomer having five (meth)acryloyloxy groups is dipentaerythritol hexaacrylate, and preferably the polyacrylate monomer having six (meth)acryloyloxy groups is dipentaerythritol pentaacrylate.

[0070] The most preferred compound is dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate or a mixture thereof.

[0071] -Surfactants

[0072] Further, the composition of the present invention may optionally contain a surfactant. Preferably, the surfactant is a halogen-containing surfactant, preferably, the surfactant has at least one cross-linking group, preferably, the halogen is selected from fluorine, chlorine, bromine and iodine, more preferably, the halogen is fluorine, more preferably, the surfactant is a halogen-containing surfactant having at least one cross-linking group, even more preferably, the surfactant is a fluorine-containing surfactant having at least one cross-linking group, further preferably, the surfactant is a fluorine-containing surfactant having at least one cross-linking group containing a perfluoroalkyl or perfluoroalkylene group.

[0073] Preferably, the total amount of surfactant is 0.0001 to 3 wt %, more preferably 0.001 to 1 wt %, even more preferably 0.01 to 0.6 wt %, further preferably 0.1 to 0.3 wt %, based on the total solid content of the composition.

[0074] The crosslinking group of the surfactant is, for example, an epoxy group or an ethylenically unsaturated group, preferably an ethylenically unsaturated group.

[0075] The surfactant of the present invention contains a perfluoroalkyl group or a perfluoroalkylene group, or from the perspective of achieving oil repellency on the outermost surface of the coating (cured) layer, the surfactant of the present invention may contain both a perfluoroalkyl group and a perfluoroalkylene (ester) group.

[0076] As the perfluoroalkyl group, for example, a perfluorobutyl group, a perfluorohexyl group, a perfluorooctyl group, or a combination thereof can be used.

[0077] As a perfluoroalkylene (ester) group, for example, -CF2-O-, -(CF2)2-O-, -(CF2)3-O-, -CF2-C(CF3)-O- or -C(CF3)-CF2-O-, or a divalent group having repeating units of -CF2-O-, -(CF2)2-O-, -(CF2)3-O-, -CF2-C(CF3)-O- or -C(CF3)-CF2-O- can be preferably used.

[0078] Examples of surfactants are, for example, acrylic copolymers having an epoxy group and a perfluoroalkyl group, acrylic copolymers having an epoxy group and a perfluoroalkylene ester group, acrylic copolymers having an ethylenically unsaturated group and a perfluoroalkyl group, acrylic copolymers having an ethylenically unsaturated group and a perfluoroalkylene ester group, epoxy (meth) acrylate polymers having an epoxy group and a perfluoroalkyl group, epoxy (meth) acrylate polymers having an epoxy group and a perfluoroalkylene ester group, epoxy (meth) acrylate polymers having an epoxy group and a perfluoroalkylene ester group, epoxy (meth) acrylate polymers having an ethylenically unsaturated group and a perfluoroalkyl group, epoxy (meth) acrylate polymers having an ethylenically unsaturated group and a perfluoroalkylene ester group.

[0079] More preferably, an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkyl group, an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkylene ester group is used.

[0080] Even more preferably, an acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkylene ester group is used.

[0081] As such a surfactant, publicly available surfactants can be used.

[0082] For example, as for the acrylic copolymer having an ethylenically unsaturated group and a perfluoroalkylene ester group, MEGAFACE RS series (DIC), particularly RS-72A, RS-78, and RS-90 can be preferably used.

[0083] The purpose of adding the surfactant is to improve coating characteristics, developability, achieve an improved hydrophobic partition wall surface, and / or achieve an improved oil-repellent partition wall surface.

[0084] -Colorants

[0085] According to the present invention, the composition comprises a colorant, preferably in a total amount of 3 to 80 wt %, preferably 5 to 50 wt %, based on the total solid content of the composition.

[0086] Preferably, the colorant is a first colorant selected from organic colorants and / or inorganic colorants, more preferably a black colorant selected from organic black pigments and / or inorganic black pigments, or a white colorant selected from organic white pigments and / or inorganic white pigments, further preferably a black colorant selected from organic black pigments and / or inorganic black pigments, even more preferably an inorganic black pigment, particularly preferably, the inorganic black pigment is zirconium nitride or titanium oxide, which may be coated with a polymer and / or an inorganic layer.

[0087] As the colorant (preferably a black colorant) used in the present invention, an inorganic pigment or an organic pigment, or a combination of two or more pigments may be used as long as the required absorbance is satisfied.

[0088] When an organic black colorant is used in the partition wall, it is preferred to combine two or more organic pigments to obtain a black pigment. For example, a black pigment can be obtained by mixing red, green, and blue organic pigments.

[0089] The colorant used in the present invention may be used together with a dispersant. As the dispersant, for example, an organic compound dispersant such as a polymer dispersant described in JP-A-2004-292672A may be used.

[0090] In a preferred embodiment of the present invention, the composition further comprises another colorant different from the first colorant. Preferably, the another colorant is a second colorant selected from organic colorants and / or inorganic colorants, more preferably a black colorant selected from organic black pigments and / or inorganic black pigments, or a white colorant selected from organic white pigments and / or inorganic white pigments, even more preferably a white colorant selected from organic white pigments and / or inorganic white pigments, and further preferably an inorganic white colorant.

[0091] Therefore, in a further preferred embodiment of the present invention, the composition comprises a first colorant and a second colorant, wherein the first colorant is a black pigment and the second colorant is a white pigment, to achieve a gray composition and a gray patterned partition wall.

[0092] As the first colorant and the second colorant, publicly available colorants can be preferably used.

[0093] In some embodiments of the present invention, the composition further comprises a third colorant different from the first colorant and the second colorant. Preferably, the third colorant is an inorganic black pigment, more preferably, the colorant is an inorganic black pigment selected from zirconium nitride and / or titanium oxide, which can be coated with a polymer and / or an inorganic layer.

[0094] In a preferred embodiment of the present invention, from the perspective of a smooth surface of the patterned layer (partition wall), improved OD, improved reflection and / or improved patterned, developed partition wall structure, the amount of the colorant (first colorant) is 0.1 to 50 wt %, preferably 1 to 30 wt %, more preferably 1.5 to 20 wt %, and even more preferably 2.0 to 15 wt %, based on the total weight of the alkali-soluble polymer of the composition.

[0095] In a preferred embodiment of the present invention, from the perspective of smooth surface, improved OD and / or improved reflection of the patterned layer (partition wall), the amount of the other colorant (second colorant) is 1 wt % to 400 wt %, preferably 5 wt % to 300 wt %, more preferably 10 wt % to 200 wt %, based on the total weight of the alkali-soluble polymer of the composition. By optimizing the amount of the other colorant, the pattern structure of the cured and developed film (partition wall) can also be improved.

[0096] In a preferred embodiment of the present invention, the ratio of the colorant (first colorant) to the other colorant (second colorant) is in the range of 0.0001 to 50 from the perspective of a smooth surface, improved OD, and / or improved reflection of the patterned layer (partition wall).

[0097] -Solvent

[0098] In a preferred embodiment of the present invention, the composition further comprises a solvent.

[0099] The type of the solvent is not particularly limited, and any publicly available solvent may be used as long as it can uniformly dissolve or disperse the alkali-soluble polymer, the polymerization initiator, and the compound containing at least two (meth)acryloyloxy groups.

[0100] Preferably, the solvent is selected from one or more members of the group consisting of: ethylene glycol monoalkyl ethers, such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers, such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates, such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monoalkyl ethers, such as propylene glycol monomethyl ether and propylene glycol monoethyl ether; propylene glycol alkyl ether acetates, such as PGMEA, propylene glycol monoethyl ether acetate and propylene glycol monopropyl ether acetate; aromatic hydrocarbons, such as benzene, toluene and xylene. benzene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerol; esters such as ethyl lactate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate; and cyclic esters such as γ-butyrolactone, more preferably the solvent is a combination of propylene glycol alkyl ether acetate or an ester and a cyclic ester such as γ-butyrolactone, preferably the total amount of the solvent accounts for 1% to 99% by weight of the total amount of the composition, preferably 5% to 90% by weight, more preferably 10% to 80% by weight, and further preferably 20% to 70% by weight.

[0101] -Polymerization initiator

[0102] The composition according to the present invention may contain a polymerization initiator. The polymerization initiator includes a polymerization initiator that generates an acid, a base or a free radical by radiation and a polymerization initiator that generates an acid, a base or a free radical by heat.

[0103] Therefore, in a preferred embodiment of the present invention, the composition further comprises a polymerization initiator, and more preferably, the polymerization initiator is selected from a photoradical initiator, a photoacid generator, or a combination of a photoradical initiator and a photoacid generator.

[0104] Examples of the above-mentioned photoacid generators include diazomethane compounds, diphenyliodonium salts, triphenylsulfonium salts, sulfonium salts, ammonium salts, phosphonium salts and sulfonamide compounds. The structures of these photoacid generators can be represented by formula (A):

[0105] R + X - (A)

[0106] In formula (A), R+ is hydrogen or an organic ion modified by carbon atoms or other heteroatoms, provided that the organic ion is selected from the group consisting of alkyl, aryl, alkenyl, acyl and alkoxy, for example, R + It is a diphenyliodonium ion or a triphenylsulfonium ion.

[0107] In addition, X - Preferably, the counterion is represented by any of the following formulas:

[0108] Yj Y -

[0109] Y6 -

[0110] R a p PY 6-p - ,

[0111] R a q BY 4-q - ,

[0112] R a q GaY 4-q - ,

[0113] R a SO3 - ,

[0114] (R a SO2)3C - ,

[0115] (R a SO2)2N - ,

[0116] R a COO - ,and

[0117] SCN -

[0118] in

[0119] Y is a halogen atom,

[0120] R a is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms, provided that each group is substituted with a substituent selected from the group consisting of fluorine, nitro and cyano, and R b is hydrogen or an alkyl group having 1 to 8 carbon atoms,

[0121] P is a number from 0 to 6, and

[0122] q is a number from 0 to 4.

[0123] Specific examples of counterions include: BF 4- 、(C6F5)4B - 、((CF3)2C6H3)4B - PF6 - 、(CF3CF2)3PF3 - 、SbF6 - 、(C6F5)4Ga - 、((CF3)2C6H3)4Ga - 、SCN - 、(CF3SO2)3C - 、(CF3SO2)2N - , formate ion, acetate ion, trifluoromethanesulfonate ion, nonafluorobutanesulfonate ion, methanesulfonate ion, butanesulfonate ion, benzenesulfonate ion, p-toluenesulfonate ion and sulfonate ion.

[0124] Among the photoacid generators that can be used in the present invention, photoacid generators that generate sulfonic acid or boric acid are particularly preferred. Examples thereof include triisopropylphenyl iodonium tetrakis(pentafluorophenyl)borate (PHOTOINITIATOR 2074 [trademark], manufactured by Rhodorsil), diphenyl iodonium tetrakis(perfluorophenyl)borate, and compounds having sulfonium ions and pentafluoroborate ions as cation and anion parts, respectively. In addition, examples of the photoacid generator include triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium camphorsulfonate, triphenylsulfonium tetrakis(perfluorophenyl)borate, 4-acetoxyphenyldimethylsulfonium hexafluoroarsenate, 1-(4-n-butoxynaphthalene-1-yl)tetrahydrothiophenium trifluoromethanesulfonate, 1-(4,7-dibutoxy-1-naphthyl)tetrahydrothiophenium trifluoromethanesulfonate, diphenyliodonium trifluoromethanesulfonate, and diphenyliodonium hexafluoroarsenate. In addition, the photoacid generator shown in the following formula can also be used:

[0125]

[0126] wherein each A is independently a substituent selected from the group consisting of an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkylcarbonyl group having 1 to 20 carbon atoms, an arylcarbonyl group having 6 to 20 carbon atoms, a hydroxyl group, and an amino group;

[0127] Each p is independently an integer from 0 to 5; and

[0128] B -is a fluorinated alkylsulfonate group, a fluorinated arylsulfonate group, a fluorinated alkylborate group, an alkylsulfonate group or an arylsulfonate group.

[0129] It is also possible to use a photoacid generator in which the cations and anions in the above formula are exchanged with each other or combined with the various other cations and anions mentioned above. For example, any sulfonium ion represented by the above formula can be combined with tetrakis(perfluorophenyl)borate ions, and any iodonium ion represented by the above formula can be combined with tetrakis(perfluorophenyl)borate ions. These can also be used as photoacid generators.

[0130] In the present invention, since the reaction is initiated immediately after radiation irradiation and the reheating step after radiation irradiation and before the development step can be omitted, a photoradical generator is more preferred in terms of process shortening and cost.

[0131] The photoradical generator can improve the resolution by strengthening the pattern shape or increasing the contrast of the development. The photoradical generator used in the present invention is a photoradical generator that emits free radicals when irradiated with radiation. Here, examples of radiation include visible light, ultraviolet light, infrared light, X-rays, electron beams, α rays and γ rays.

[0132] Based on the total mass of the alkali-soluble polymer, the addition amount of the light radical generator is preferably 0.001 to 50% by mass, more preferably 0.01 to 30% by mass, but its optimal addition amount depends on the type and amount of the active substance generated by the decomposition of the light radical generator, the required photosensitivity, and the required dissolution contrast between the exposed area and the unexposed area. If the addition amount is less than 0.001% by mass, the dissolution contrast between the exposed area and the unexposed part is too low, and sometimes the addition effect cannot be exerted. On the other hand, when the addition amount of the light radical generator exceeds 50% by mass, cracks may be produced in the formed coating film, and the coloring caused by the decomposition of the light radical generator becomes obvious, so the colorless transparency of the coating film may sometimes be reduced. In addition, when the addition amount becomes large, the thermal decomposition of the light radical generator may cause the electrical insulation of the cured product to decrease and gas to be released, which may sometimes cause problems in subsequent processes. In addition, the resistance of the coating film to the photoresist stripper with monoethanolamine as the main component may sometimes be reduced.

[0133] Examples of photo-radical generators include azo, peroxide, acylphosphine oxide, alkylphenone, oxime ester, and titanocene initiators. Among them, alkylphenone, acylphosphine oxide, and oxime ester initiators are preferred, and preferably include 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propane-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methylpropionyl)-benzyl]phenyl}-2-methylpropane-1-one, 2-methyl-1-(4-methylthiophenyl)-2-morpholinylpropane-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinyl) ... phenyl)-1-butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)-phenyl]-1-butanone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, 1,2-octanedione, 1-[4-(phenylthio)-2-(O-benzoyl oxime)], ethyl ketone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-1-(O-acetyl oxime), bis(2,4-cyclopentadienyl)bis[2,6-difluoro-3-(1H-pyrrol-1-yl)phenyl]titanium(IV), etc.

[0134] -Other additives

[0135] The composition of the present invention may contain other additives as appropriate. Such additives may include developer dissolution accelerators, scum removers, adhesion enhancers, polymerization inhibitors, defoamers, surfactants, photosensitizers, crosslinkers, and curing agents.

[0136] Therefore, according to the present invention, preferably, the composition further comprises at least one additive selected from one or more members of the group consisting of: a developer dissolution accelerator, a scum remover, an adhesion enhancer, a polymerization inhibitor, a defoaming agent, a surfactant, a photosensitizer, a crosslinking agent and / or a curing agent.

[0137] The developer dissolution promoter or scum remover has the function of adjusting the solubility of the formed coating in the developer to prevent scum from remaining on the substrate after development. As such an additive, crown ethers can be used. The simplest crown ether has the general formula (-CH2-CH2-O-) nIndicated. In the present invention, crown ethers in which n is 4 to 7 are preferred. When x is the total number of atoms constituting the ring and y is the number of oxygen atoms contained in the ring, the crown ether is sometimes referred to as x-crown-y-ether. In the present invention, it is preferred to select crown ethers in which x=12, 15, 18 or 21, y=x / 3 and their benzo condensates and cyclohexyl condensates. Specific examples of more preferred crown ethers include 21-crown-7-ether, 18-crown-6-ether, 15-crown-5-ether, 12-crown-4-ether, dibenzo-21-crown-7-ether, dibenzo-18-crown-6-ether, dibenzo-15-crown-5-ether, dibenzo-12-crown-4-ether, dicyclohexyl-21-crown-7-ether, dicyclohexyl-18-crown-6-ether, dicyclohexyl-15-crown-5-ether, and dicyclohexyl-12-crown-4-ether. In the present invention, the most preferred ether is selected from 18-crown-6-ether and 15-crown-5-ether, and its content is preferably 0.05 to 15% by mass, more preferably 0.1 to 10% by mass, based on the total mass of the alkali-soluble polymer.

[0138] The adhesion enhancer has the effect of preventing the pattern from peeling off due to the stress applied after baking when the cured film is formed using the composition according to the present invention. As the adhesion enhancer, imidazoles, silane coupling agents, etc. are preferred. Among the imidazoles, 2-hydroxybenzimidazole, 2-hydroxyethylbenzimidazole, benzimidazole, 2-hydroxyimidazole, imidazole, 2-mercaptoimidazole and 2-aminoimidazole are preferred, and 2-hydroxybenzimidazole, benzimidazole, 2-hydroxyimidazole and imidazole are particularly preferred.

[0139] As the silane coupling agent, known silane coupling agents can be appropriately used, and examples thereof include epoxy silane coupling agents, amino silane coupling agents, mercapto silane coupling agents, etc. Specifically, 3-glycidoxypropyl trimethoxy silane, 3-glycidoxypropyl triethoxy silane, N-2-(aminoethyl)-3-aminopropyl trimethoxy silane, N-2-(aminoethyl)-3-aminopropyl triethoxy silane, 3-aminopropyl trimethoxy silane, 3-aminopropyl triethoxy silane, 3-urea propyl triethoxy silane, 3-chloropropyl triethoxy silane, 3-mercaptopropyl trimethoxy silane, 3-isocyanate propyl triethoxy silane, etc. are preferred. These can be used alone or in combination of two or more, and the amount thereof added is preferably 0.05 to 15% by mass of the total mass of the alkali-soluble polymer.

[0140] In addition, as the silane coupling agent, a silane compound and a siloxane compound having an acid group can be used. Examples of the acid group include a carboxyl group, an acid anhydride group, a phenolic hydroxyl group, etc. When it contains a monobasic acid group such as a carboxyl group or a phenolic hydroxyl group, it is preferred that a single silicon-containing compound has multiple acid groups.

[0141] Exemplary embodiments of such silane coupling agents include compounds represented by formula (C):

[0142] Xn Si(OR C3 ) 4-n (C)

[0143] or a polymer obtained by using it as a repeating unit. In this case, different X or R C3 multiple repeating units.

[0144] In the formula, R C3 Including hydrocarbon groups, such as methyl, ethyl, n-propyl, isopropyl, n-butyl and other alkyl groups; in the general formula (C), multiple R C3 , and each R C3 Can be the same or different.

[0145] X includes groups having acid groups such as phosphonium, borate, carboxyl, phenol, peroxide, nitro, cyano, sulfonyl, and alcohol, and groups in which these acid groups are protected by acetyl, aryl, pentyl, benzyl, methoxymethyl, methylsulfonyl, tolyl, trimethoxysilyl, triethoxysilyl, triisopropylsilyl, or trityl groups, and includes acid anhydride groups.

[0146] Among them, preferably having a methyl group as R C3 A compound having a carboxylic anhydride group as X, such as an anhydride group-containing silicone. More specifically, a compound represented by the following formula (X-12-967C (trade name, Shin-Etsu Chemical Co., Ltd.)) or a polymer containing a structure corresponding thereto at the end or side chain of a silicon-containing polymer such as silicone is preferred.

[0147]

[0148] In addition, compounds having an acid group such as thiol, phosphonium, borate, carboxyl, phenol, peroxide, nitro, cyano, and sulfonic acid provided at the end of dimethyl silicone are also preferred. Such compounds include compounds represented by the following formula (X-22-2290AS and X-22-1821 (in each case, trade names, Shin-Etsu Chemical Co., Ltd.)).

[0149]

[0150] When the silane coupling agent has an organosilicon structure, if the molecular weight is too large, the compatibility with the polysiloxane contained in the composition becomes poor, and there may be adverse effects such as no improvement in solubility in the developer, residual reactive groups in the film, and failure to maintain chemical resistance that can withstand subsequent processes. For this reason, the mass average molecular weight of the silane coupling agent is preferably 5,000 or less, and more preferably 4,000 or less. The content of the silane coupling agent is preferably 0.01 to 15% by mass of the total mass of the alkali-soluble polymer.

[0151] As polymerization inhibitors, in addition to nitrone, nitroxide free radical, hydroquinone, catechol, phenothiazine, phenoxazine, hindered amines and their derivatives, ultraviolet absorbers can also be added. Among them, methyl hydroquinone, catechol, 4-tert-butylcatechol, 3-methoxycatechol, phenothiazine, chlorpromazine, phenoxazine, hindered amines TINUVIN 144, 292 and 5100 (BASF), and ultraviolet absorbers TINUVIN 326, 328, 384-2, 400 and 477 (BASF) are preferred. These can be used alone or in combination of two or more, and their content is preferably 0.01 to 20% by mass of the total mass of the alkali-soluble polymer.

[0152] As defoaming agents, alcohols (C 1-18 ); higher fatty acids such as oleic acid and stearic acid; higher fatty acid esters such as glycerol monolaurate; polyethers such as polyethylene glycol (PEG) (Mn: 200 to 10,000) and polypropylene glycol (PPG) (Mn: 200 to 10,000); organic silicon compounds such as dimethyl silicone oil, alkyl-modified silicone oil and fluorosilicone oil; and organic siloxane surfactants described later. These substances can be used alone or in combination, and their content is preferably 0.1 to 3% by mass of the total mass of the alkali-soluble polymer.

[0153] - Photosensitizer

[0154] In the partition wall composition according to the present invention, a photosensitizer may be added as appropriate. The photosensitizer preferably used in the composition according to the present invention includes coumarin, ketocoumarin and their derivatives, thiopyrylium salts, acetophenone, etc. Specifically, it includes p-bis(o-methylphenylvinyl)benzene, 7-dimethylamino-4-methylquinolone-2,7-amino-4-methylcoumarin, 4,6-dimethyl-7-ethylaminocoumarin, 2-(p-dimethylaminophenylvinyl)-pyridylmethyl iodide, 7-diethylaminocoumarin, 7-diethylamino-4-methylcoumarin, 2,3,5,6-1H,4H-tetrahydro-8-methylquinolizine-<9,9a,1-gh>coumarin, 7-diethylamino-4-trifluoromethylcoumarin, 7-dimethylamino-4-trifluoromethylcoumarin, 7-amino-4-trifluoromethylcoumarin, 2,3,5,6-1H,4 H-tetrahydroquinolizino-<9,9a,1-gh>coumarin, 7-ethylamino-6-methyl-4-trifluoromethylcoumarin, 7-ethylamino-4-trifluoromethylcoumarin, 2,3,5,6-1H,4H-tetrahydro-9-carbonylethoxyquinolizino-<9,9a,1-gh>coumarin, 3-(2′-N-methylbenzimidazolyl)-7-N,N-diethylaminocoumarin, N-methyl-4-trifluoromethylpiperidino-<3,2-g>coumarin, 2-(p-dimethylaminophenylvinyl)-benzothiazolylethyl iodide, 3-(2′-benzimidazolyl)-7-N,N-diethylaminocoumarin, 3-(2′-benzothiazolyl)-7-N,N-diethylaminocoumarin, and sensitizing dyes such as pyrylium salts and thiopyrylium salts represented by the following chemical formulas. By adding a sensitizing dye, patterning can be performed using an inexpensive light source such as a high-pressure mercury lamp (360 to 430 nm). The content is preferably 0.05 to 15% by mass, more preferably 0.1 to 10% by mass, based on the total mass of the alkali-soluble polymer.

[0155]

[0156] X <![CDATA[R 21 ]]> <![CDATA[R 22 ]]> <![CDATA[R 23 ]]> Y S <![CDATA[OC4H9]]> H H <![CDATA[BF4]]> S <![CDATA[OC4H9]]> <![CDATA[OCH3]]> <![CDATA[OCH3]]> <![CDATA[BF4]]> S H <![CDATA[OCH3]]> <![CDATA[OCH3]]> <![CDATA[BF4]]> S <![CDATA[N(CH3)2]]> H H <![CDATA[ClO2 <!-- 12 -->]]> O <![CDATA[OC4H9]]> H H <![CDATA[SbF6]]>

[0157] In addition, as a photosensitizer, a compound containing an anthracene skeleton can also be used. Specifically, it includes a compound represented by the following formula:

[0158]

[0159] In the formula, R 31 each independently represents a substituent selected from the group consisting of an alkyl group, an aralkyl group, an allyl group, a hydroxyalkyl group, an alkoxyalkyl group, a glycidyl group and a haloalkyl group,

[0160] R 32each independently represents a substituent selected from the group consisting of a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a nitro group, a sulfonic acid group, a hydroxyl group, an amino group and a carbonylalkoxy group, and

[0161] k is independently selected from 0 and an integer from 1 to 4.

[0162] When such a photosensitizer having an anthracene skeleton is used, the content thereof is preferably 0.01 to 5% by mass based on the total mass of the alkali-soluble polymer.

[0163] In another aspect, the present invention also relates to a method for manufacturing a solidified layer, which comprises at least the following steps;

[0164] (xi) providing the composition of the present invention onto a layer or substrate to form a coated layer; and

[0165] (Xii) The coated layer is baked to obtain a cured layer.

[0166] Preferably, the method further comprises one or more of the following steps after step (Xi) and before step (Xii):

[0167] (Xiii) pre-baking (heat treatment) the coated layer to dry the coated layer and reduce the residual amount of solvent in the coated layer. Preferably, the pre-baking process is carried out at a temperature of generally 50 to 150° C., preferably 90 to 120° C., for 10 to 300 seconds, preferably 30 to 120 seconds in the case of a hot plate, and for 1 to 30 minutes in the case of a clean oven;

[0168] (Xiv) irradiating the coated layer with light (applying light irradiation), preferably using light having a peak maximum wavelength in the range of 360 to 430 nm, preferably using a patterned mask when performing the light irradiation;

[0169] (xv) applying a post-exposure bake process; and / or

[0170] (Xvi) A development step is applied to form a patterned cured layer.

[0171] -Method for manufacturing a solidified layer (preferably a partition wall manufacturing process)

[0172] Step (Xi): coating process

[0173] First, the above-mentioned composition is applied on a substrate. The formation of the coating film of the composition in the present invention can be carried out by any method known as the coating method of the photosensitive composition. Specifically, dip coating, roller coating, rod coating, brush coating, spray coating, scraper coating, flow coating, spin coating, slit coating, etc. can be freely selected. In addition, as the substrate for coating the composition, suitable substrates such as silicon substrates, glass substrates, resin films, etc. can be used. Various semiconductor devices can be formed on these substrates as required. When the substrate is a film, gravure coating can also be adopted. If necessary, a drying process can be additionally provided after the coating film. In addition, if necessary, the coating process can be repeated once or twice or more so that the film thickness of the formed coating reaches a desired degree.

[0174] Step (Xiii): Pre-baking process

[0175] After forming a coating film of the composition by applying the composition, in order to dry the coating film and reduce the residual amount of solvent in the coating film, the coating film is preferably pre-baked (heat treated). The pre-baking process can be carried out at a temperature of generally 50 to 150° C., preferably 80 to 120° C., in the case of a hot plate, for 10 to 300 seconds, preferably 30 to 120 seconds, and in the case of a clean oven, for 1 to 30 minutes.

[0176] Step (Xiv): Exposure process

[0177] After the coating film is formed, the coating film surface is then subjected to light irradiation. As the light source used for light irradiation, any light source commonly used in the pattern forming method can be used. As such a light source, it can include high-pressure mercury lamps, low-pressure mercury lamps, metal halides and xenon lamps, laser diodes, LEDs, etc. As irradiation light, ultraviolet rays such as g-line, h-line, and i-line are generally used. In addition to ultra-fine processing for semiconductors, etc., for pattern formation of several μm to tens of μm, 360 to 430nm light (high-pressure mercury lamp) is generally used. According to the present invention, by using the composition of the present invention, the energy and irradiation time of the irradiation light can be significantly reduced. For a coating composition with a layer thickness of 10 μm, the preferred range is 5 to 150mJ / cm 2 , more preferably 8 to 100 mJ / cm 2 , even more preferably 10 to 80 mJ / cm 2 , although this depends on the light source and the film thickness of the coating. To achieve adequate resolution, 5mJ / cm 2 Or greater irradiation light energy is suitable. And, in order to avoid overexposure, halation and / or damage to the substrate, and / or improve the manufacturing process time, 150mJ / cm 2 or lower is extremely ideal.

[0178] In order to irradiate light in a pattern shape, a conventional photomask can be used. Such a photomask can be freely selected from known photomasks. The environment during irradiation is not particularly limited, and can generally be set to an ambient atmosphere (in the air) or a nitrogen atmosphere. In addition, in the case of forming a film on the entire surface of the substrate, the entire surface of the substrate can be irradiated with light. In the present invention, the pattern film also includes the case of forming a film on the entire surface of the substrate.

[0179] Step (Xv): Post-exposure baking process

[0180] After exposure, in order to promote the reaction between the polymerization initiator and the polymer in the film, post-exposure baking can be performed as needed. However, according to the present invention, this is not mandatory and can be omitted. In particular, by using the composition of the present invention, this post-exposure baking process can be omitted. Unlike the heating process (6) described later, this heat treatment is not for completely curing the coating film, but for leaving only the desired pattern on the substrate after development and allowing other areas to be removed by development. Therefore, it is not necessary in the present invention.

[0181] When post-exposure baking is performed, a hot plate, an oven, a heating furnace, etc. can be used. The heating temperature should not be too high because it is not desirable that the acid, alkali or free radicals in the exposure area generated by light diffuse to the unexposed area. From such a viewpoint, the heating temperature range after exposure is preferably 50 to 150°C, more preferably 80 to 120°C. Heating in stages can be used as required to control the curing rate of the composition. In addition, the atmosphere during heating is not particularly limited and can be selected from inert gases such as nitrogen, vacuum, reduced pressure, oxygen, etc. to control the curing rate of the composition. In addition, the heating time is preferably higher than a certain level to maintain a higher uniformity of the temperature history of the wafer surface, and preferably not too long to suppress the diffusion of the acid, alkali or free radicals generated. From such a viewpoint, the heating time is preferably 20 seconds to 500 seconds, more preferably 40 seconds to 300 seconds.

[0182] Step (Xvi): Development process

[0183] After exposure, post-exposure heating is performed as needed to develop the coating film. As the developer used during development, any developer commonly used for developing photosensitive compositions can be used. Preferred examples of developer include alkaline developers, which are aqueous solutions of alkaline compounds such as tetraalkylammonium hydroxide, choline, alkali metal hydroxides, alkali metal metasilicates (hydrates), alkali metal phosphates (hydrates), sodium carbonate aqueous solutions, ammonia, alkylamines, alkanolamines and heterocyclic amines, and particularly preferred alkaline developers are tetramethylammonium hydroxide aqueous solutions, potassium hydroxide aqueous solutions, sodium hydroxide aqueous solutions, or sodium carbonate aqueous solutions. In the alkaline developer, as needed, a water-soluble organic solvent or surfactant such as methanol or ethanol may be further contained. In the present invention, a developer having a concentration lower than 2.38% by mass TMAH developer commonly used as a developer may be used for development. Examples of such developers include 0.05 to 1.5% by mass TMAH aqueous solutions, 0.1 to 2.5% by mass sodium carbonate aqueous solutions, and 0.01 to 1.5% by mass potassium hydroxide aqueous solutions. The developing time is usually 10 to 300 seconds, preferably 30 to 180 seconds, and more preferably 60 to 120 seconds. Such a short developing time can be achieved by using the composition of the present invention. The developing method can also be freely selected from conventional known methods. Specifically, methods such as immersion in a developer (immersion), suspension immersion, spraying, slit, cover coating, and spraying can be cited. After the pattern is obtained by developing with a developer, it is preferably rinsed with water.

[0184] Step (Xii): Heating process

[0185] After development, the obtained pattern film is cured by heating. As a heating device used in the heating process, the same device as the above-mentioned post-exposure heating can be used. The heating temperature in the heating process is not particularly limited as long as it can cure the coating film and can be freely determined.

[0186] The composition according to the present invention can be cured at a relatively low temperature. Specifically, it is preferably cured by heating at 180°C or less. In order to maintain a high residual film rate after curing, the curing temperature is more preferably 150°C or less, and particularly preferably 120°C or less.

[0187] On the other hand, in order to accelerate the curing reaction and obtain a fully cured film, the curing temperature is preferably above 50°C, more preferably above 80°C. According to the present invention, a low curing temperature of about 100°C is more preferred. In addition, the heating time is not particularly limited, and is generally 10 to 90 minutes, preferably 20 to 60 minutes. In addition, this heating time is the time from the temperature of the pattern film to the desired heating temperature. Generally, it takes about several minutes to several hours for the pattern film to reach the desired temperature from the temperature before heating.

[0188] In another aspect, the present invention also relates to a layer obtained or obtainable by the process of the present invention.

[0189] In another aspect, the present invention also relates to a layer comprising at least the following components, consisting essentially of the following components, or consisting of the following components:

[0190] i) a polymer (A) which is derived or derivable from an alkali-soluble polymer containing olefinic double bonds;

[0191] Preferably, the solid acid value of the basic polymer is in the range of 30 to 160 mgKOH / g, more preferably in the range of 50 to 150 mgKOH / g, even more preferably in the range of 60 to 80 mgKOH / g,

[0192] Preferably, the weight average molecular weight of the alkali-soluble polymer is from 1,000 to 100,000, more preferably from 1,200 to 30,000, even more preferably from 3000 to 8000.

[0193] Preferably, the alkali-soluble polymer is selected from (meth)acrylate polymers, more preferably methacrylate polymers, acrylate polymers or combinations thereof, even more preferably, the polymer material is an acrylate polymer; and

[0194] ii) Colorants.

[0195] Preferably, the layer is a patterned layer.

[0196] Preferably, the polymer (A) is derived or derivable from an alkali-soluble polymer and another material selected from a thiol-containing multifunctional compound, a fluorinated surfactant having at least one crosslinking group, or a combination thereof.

[0197] Preferably, the colorant is a first colorant as already defined above in the "Colorant" section. The layer may optionally comprise another colorant, such as a second colorant, a third colorant and / or a surfactant as already indicated above.

[0198] In a preferred embodiment of the present invention, the optical density (OD) value of the layer with a layer thickness of 10 μm at a light wavelength of 460 nm is in the range of 1.0 to 4.0, preferably in the range of 1.5 to 2.5, more preferably in the range of 1.8 to 2.2. The OD value of the layer with a layer thickness of 10 μm at a light wavelength of 540 nm is in the range of 1.0 to 4.0, preferably in the range of 1.5 to 2.5, more preferably in the range of 1.8 to 2.2. The OD value of the layer with a layer thickness of 10 μm at a light wavelength of 630 nm is in the range of 1.0 to 3.0, preferably in the range of 1.5 to 2.5, more preferably in the range of 1.8 to 2.2.

[0199] In a preferred embodiment of the present invention, the average reflectance value of the layer with a layer thickness of 10 μm in the light wavelength range of 450 to 650 nm is in the range of 20 to 70%, preferably in the range of 30 to 60%, and more preferably in the range of 40 to 55%.

[0200] In another aspect, the present invention also relates to a light conversion device, which comprises at least the layer of the present invention. Preferably, the light conversion device further comprises a substrate. Preferably, the light conversion device is a color filter, a pixelated color conversion device.

[0201] In another aspect, the present invention also relates to an optical device, comprising at least the layer of the present invention or the light conversion device of the present invention. Preferably, the optical device is a display device, more preferably, the display device is selected from the group consisting of OLED, LCD, LED and μLED.

[0202] In another aspect, the present invention also relates to use of the composition of the present invention or the layer of the present invention in a method for producing a photoconversion device.

[0203] In another aspect, the present invention also relates to use of the light conversion device of the present invention in a method for manufacturing an optical device.

[0204] In another aspect, the present invention also relates to a method for manufacturing an optical device, comprising at least:

[0205] The light conversion device of the present invention is provided in an optical device.

[0206] Preferred Implementation

[0207] 1. A composition, preferably a photocurable composition, preferably the composition does not contain any polysiloxane, the composition comprising at least the following components, consisting essentially of the following components, or consisting of the following components:

[0208] i) an alkali-soluble polymer containing olefinic double bonds; and

[0209] Preferably, the weight average molecular weight of the alkali-soluble polymer is from 1,000 to 100,000, more preferably from 1,200 to 30,000, even more preferably from 3000 to 8000.

[0210] Preferably, the alkali-soluble polymer is selected from (meth)acrylate polymers, more preferably methacrylate polymers, acrylate polymers or combinations thereof, even more preferably, the polymer material is an acrylate polymer; and

[0211] ii) Colorants.

[0212] 2. The composition according to embodiment 1, wherein the solid acid value of the basic polymer is in the range of 30 to 160 mgKOH / g, more preferably in the range of 50 to 150 mgKOH / g, even more preferably in the range of 60 to 80 mgKOH / g.

[0213] 3. The composition according to embodiment 1 or 2, further comprising a thiol-containing multifunctional compound. Preferably, the thiol-containing multifunctional compound comprises a pentaerythritol structure.

[0214] More preferably, the thiol-containing multifunctional compound is represented by the following chemical formula (I x )express:

[0215]

[0216] Among them, R 1a , R 1b , R 1c and R 1d are each independently selected from a hydrogen atom, an alkyl chain having 1 to 10 carbon atoms, a cyclic group having 3 to 10 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, an aryl group having 3 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, wherein at least one H atom is replaced by an SH group, wherein one or more non-adjacent CH2 groups may be replaced by an oxygen atom, C=O, C=S, C=Se, C=NH, SiH2, SO, SO2, OS or CONH, and wherein one or more H atoms may be replaced by D, F, Cl, Br, I, CN or NO2, wherein R 1a , R 1b , R 1c and R 1d At least one of them is not a hydrogen atom, preferably R 1a , R 1b , R 1c and R 1d At least two of them are not hydrogen atoms, and more preferably at least R 1a , R 1b , R 1c Not a hydrogen atom.

[0217] Preferably, the total amount of the thiol-containing multifunctional compound is 10 to 200 wt %, preferably 30 to 150 wt %, more preferably 50 to 100 wt %, based on the total amount of the alkali-soluble polymer.

[0218] 4. The composition according to any one of the preceding embodiments, further comprising a compound containing at least two (meth)acryloyloxy groups.

[0219] Preferably, the at least two (meth)acryloyloxy groups are two or more acryloyloxy groups, methacryloyloxy groups or a combination thereof. Preferably, from the perspective of compatibility with the resin, the total amount of the compound containing the at least two (meth)acryloyloxy groups is 5 wt % to 1000 wt %, more preferably 10 wt % to 500 wt %, even more preferably 15 wt % to 300 wt % based on the total amount of the alkali-soluble polymer. Preferably, the compound is a monomer having a molecular weight of 2000 or less, more preferably 2000 to 50, even more preferably 1000 to 100. Preferably, it is a polyacrylate monomer having at least three (meth)acryloyloxy groups, more preferably, it is a polyacrylate monomer selected from one or more members of the group consisting of a polyacrylate monomer having three (meth)acryloyloxy groups, a polyacrylate monomer having four (meth)acryloyloxy groups, a polyacrylate monomer having five (meth)acryloyloxy groups, a polyacrylate monomer having six (meth)acryloyloxy groups, even more preferably, it is a polyacrylate monomer having five (meth)acryloyloxy groups, a polyacrylate monomer having six (meth)acryloyloxy groups, or a mixture thereof,

[0220] Preferably, the polyacrylate monomer having three (meth)acryloyloxy groups is selected from one or more members of the group consisting of trimethylolpropane triacrylate, trimethylolpropane ethoxy triacrylate, trimethylolpropane propoxy triacrylate, glycerol propoxy triacrylate, pentaerythritol triacrylate;

[0221] Preferably, the polyacrylate monomer having four (meth)acryloyloxy groups is selected from one or more members of the group consisting of: pentaerythritol tetraacrylate, ditrimethylolpropane tetraacrylate, pentaerythritol ethoxy tetraacrylate;

[0222] Preferably, the polyacrylate monomer having five (meth)acryloyloxy groups is dipentaerythritol hexaacrylate, and preferably the polyacrylate monomer having six (meth)acryloyloxy groups is dipentaerythritol pentaacrylate.

[0223] The most preferred compound is dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate or a mixture thereof.

[0224] 5. The composition according to any one of the preceding embodiments, further comprising a surfactant.

[0225] Preferably, the surfactant is a halogen-containing surfactant, more preferably, the surfactant is a halogen-containing surfactant, preferably, the surfactant has at least one cross-linking group, preferably, the halogen is selected from fluorine, chlorine, bromine and iodine, more preferably, the halogen is fluorine, more preferably, the surfactant is a halogen-containing surfactant having at least one cross-linking group, even more preferably, the surfactant is a fluorine-containing surfactant having at least one cross-linking group, further preferably, the surfactant is a fluorine-containing surfactant having at least one cross-linking group containing a perfluoroalkyl or perfluoroalkylene group;

[0226] Preferably, the total amount of surfactant is 0.0001 to 3 wt %, more preferably 0.001 to 1 wt %, even more preferably 0.01 to 0.6 wt %, further preferably 0.1 to 0.3 wt %, based on the total solid content of the composition.

[0227] 6. The composition according to any one of the preceding embodiments, further comprising a solvent, preferably, the solvent is selected from one or more members of the group consisting of: ethylene glycol monoalkyl ether, preferably selected from ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether and ethylene glycol monobutyl ether; diethylene glycol dialkyl ether, preferably selected from diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetate, preferably selected from methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monoalkyl ether, preferably selected from propylene glycol monomethyl ether and propylene glycol monoethyl ether; propylene glycol alkyl ether acetate, preferably selected from PGMEA, propylene glycol monoethyl ether acetate and propylene glycol monopropyl ether acetate ; aromatic hydrocarbons, preferably selected from benzene, toluene and xylene; ketones, preferably selected from methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone; alcohols, preferably selected from ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerol; esters, preferably selected from ethyl lactate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate; and cyclic esters, preferably γ-butyrolactone, more preferably the solvent is propylene glycol alkyl ether acetate or a combination of esters and cyclic esters such as γ-butyrolactone, preferably the total amount of the solvent accounts for 1% to 99% by weight of the total amount of the composition, preferably 5% to 90% by weight, more preferably 10% to 80% by weight, and further preferably 20% to 70% by weight.

[0228] 7. According to the composition of any one of the preceding embodiments, the colorant is a first colorant selected from organic colorants and / or inorganic colorants, more preferably a black colorant selected from organic black pigments and / or inorganic black pigments, or a white colorant selected from organic white pigments and / or inorganic white pigments,

[0229] Preferably, the light transmittance ratio of the black colorant represented by [light transmittance at a wavelength of 365 nm] / [average light transmittance in a wavelength range of 450 nm to 650 nm] is 3.5 or more, more preferably, the ratio is 5.0 or more, further preferably, the ratio is 10 or more, preferably, the light transmittance ratio of the black colorant represented by [light transmittance at a wavelength of 365 nm] / [average light transmittance in a wavelength range of 450 nm to 650 nm] is 100 or less, more preferably, the ratio is 30 or less, even more preferably, the ratio is in the range of 3.5 to 100, further more preferably, the ratio is in the range of 5.0 to 30, particularly preferably, the ratio is in the range of 10 to 30, provided that the transmittance is obtained by the following formula:

[0230] Transmittance = Transmittance of film 1 * 1 / (Transmittance of film 2) * 100

[0231] Preparation and transmittance measurement of film 1:

[0232] Membrane 1 was obtained by the following steps:

[0233] A composition in which a black colorant was dispersed in an amount of 35 wt % based on the total solid content (excluding solvent) of the composition was applied on a glass substrate to form a coating film having a thickness of 10 μm, and cured at 85° C. to obtain Film 1 .

[0234] Measurement of Film 1: The obtained film was measured using a spectrophotometric colorimeter (CM-5, Konica Minolta).

[0235] Preparation and transmittance measurement of film 2:

[0236] Film 2 was obtained by the following steps:

[0237] The composition in which the black colorant was not dispersed was applied on a glass substrate to obtain a film having a film thickness of 10 μm, and cured at 85° C. to obtain Film 2 .

[0238] Measurement of Film 2: The obtained film was measured using a spectrophotometric colorimeter (CM-5, Konica Minolta).

[0239] Preferably, the colorant is an inorganic black pigment, more preferably, the colorant is an inorganic black pigment selected from zirconium nitride and / or titanium dioxide, which may be coated with a polymer and / or an inorganic layer, and / or

[0240] Preferably, the colorant is an organic black pigment, preferably a mixture of two or more organic color pigments, more preferably a mixture of red, green and blue organic color pigments, which are configured to exhibit black after mixing, and further more preferably, the organic black pigment is a mixture selected from the group consisting of azo, cyanine, phthalocyanine, quinacridone, coumarin, benzimidazolone, isoindolinone, dioxazine, indanthrene and perylene organic pigments.

[0241] 8. The composition according to any one of the preceding embodiments, further comprising another colorant different from the colorant of embodiment 1.

[0242] Preferably, the other colorant is a second colorant selected from organic colorants and / or inorganic colorants, more preferably a black colorant selected from organic black pigments and / or inorganic black pigments, or a white colorant selected from organic white pigments and / or inorganic white pigments, even more preferably a white colorant selected from organic white pigments and / or inorganic white pigments, further preferably an inorganic white colorant.

[0243] 9. The composition according to any one of the preceding embodiments, further comprising a third colorant different from the colorant of embodiment 1 and the colorant of embodiment 7.

[0244] Preferably, the third colorant is an inorganic black pigment, more preferably, the colorant is an inorganic black pigment selected from zirconium nitride and / or titanium oxide, which may be coated with a polymer and / or an inorganic layer.

[0245] 10. The composition according to any one of the preceding embodiments, wherein the amount of the colorant (first colorant) is 0.1 to 50 wt %, preferably 1 to 30 wt %, more preferably 1.5 to 20 wt %, even more preferably 2.0 to 15 wt %, based on the total weight of the alkali-soluble polymer of the composition.

[0246] 11. The composition according to any one of the preceding embodiments, wherein the amount of the other colorant (second colorant) is 1 wt % to 400 wt %, preferably 5 wt % to 300 wt %, more preferably 10 wt % to 200 wt %, based on the total weight of the alkali-soluble polymer of the composition.

[0247] 12. The composition according to any one of the preceding embodiments, the ratio of the colorant (first colorant) to the other colorant (second colorant) is in the range of 0.0001 to 50.

[0248] 13. The composition according to any one of the preceding embodiments, further comprising a polymerization initiator. Preferably, the polymerization initiator is a photoradical initiator.

[0249] 14. The composition according to any one of the preceding embodiments, further comprising at least one additive selected from one or more members of the group consisting of: a developer dissolution accelerator, a scum remover, an adhesion enhancer, a polymerization inhibitor, a defoaming agent, a surfactant, a photosensitizer, a crosslinking agent, and a curing agent.

[0250] Preferably, the amount of the another colorant (third colorant) is in the range of 500 Å to 200 Å based on the total weight of the alkali-soluble polymer of the composition.

[0251] 15. A method for manufacturing a solidified layer, comprising at least the following steps:

[0252] (Xi) providing the composition of any one of embodiments 1 to 14 onto a layer or substrate to form a coated layer; and

[0253] (Xii) The coated layer is baked to obtain a cured layer.

[0254] Preferably, the method further comprises one or more of the following steps after step (Xi) and before step (Xii):

[0255] (Xiii) Pre-baking (heat treatment) the coated layer to dry the coated layer and reduce the residual amount of the solvent in the coated layer.

[0256] Preferably, the pre-baking process is carried out at a temperature of generally 50 to 150° C., preferably 90 to 120° C., for 10 to 300 seconds, preferably 30 to 120 seconds, on a hot plate, and for 1 to 30 minutes in a clean oven;

[0257] (Xiv) irradiating the coated layer with light (applying light irradiation), preferably using light having a peak maximum wavelength in the range of 360 to 430 nm, preferably using a patterned mask when performing the light irradiation;

[0258] (xv) applying a post-exposure bake process; and / or

[0259] (Xvi) A development step is applied to form a patterned cured layer.

[0260] Preferably, the post-baking process is carried out at a temperature of 50 to 150° C., more preferably 80 to 120° C., and lasts for 1 to 180 minutes, preferably 10 to 90 minutes, more preferably 20 to 60 minutes in a clean oven;

[0261] 16. A layer obtained or obtainable by the method of embodiment 15.

[0262] 17. A layer comprising at least the following components:

[0263] i) a polymer (A) which is derived or derivable from an alkali-soluble polymer containing olefinic double bonds;

[0264] Preferably, the solid acid value of the basic polymer is in the range of 30 to 160 mgKOH / g, more preferably in the range of 50 to 150 mgKOH / g, even more preferably in the range of 60 to 80 mgKOH / g,

[0265] Preferably, the weight average molecular weight of the alkali-soluble polymer is from 1,000 to 100,000, more preferably from 1,200 to 30,000, even more preferably from 3000 to 8000.

[0266] Preferably, the alkali-soluble polymer is selected from (meth)acrylate polymers, more preferably methacrylate polymers, acrylate polymers or combinations thereof, even more preferably, the polymer material is an acrylate polymer; and

[0267] ii) a colorant, preferably, the layer is a patterned layer.

[0268] Preferably, the polymer (A) is derived or derivable from an alkali-soluble polymer and another material selected from a thiol-containing multifunctional compound, a fluorinated surfactant having at least one crosslinking group, or a combination thereof.

[0269] Preferably, the colorant is as defined in embodiment 7. Preferably, the layer may further comprise another colorant as defined in any one of embodiments 8 to 12.

[0270] 18. The layer according to embodiment 16 or 17, wherein the optical density (OD) value of the layer with a layer thickness of 10 μm at a light wavelength of 460 nm is in the range of 1.0 to 4.0, preferably in the range of 1.5 to 2.5, more preferably in the range of 1.8 to 2.2. The OD value of the layer with a layer thickness of 10 μm at a light wavelength of 540 nm is in the range of 1.0 to 4.0, preferably in the range of 1.5 to 2.5, more preferably in the range of 1.8 to 2.2.

[0271] And / or, the OD value of the layer having a layer thickness of 10 μm at a light wavelength of 630 nm is in the range of 1.0 to 3.0, preferably in the range of 1.5 to 2.5, and more preferably in the range of 1.8 to 2.2.

[0272] 19. A layer according to any one of embodiments 16 to 18, wherein the layer with a layer thickness of 10 μm has an average reflectance value in the light wavelength range of 450 to 650 nm in the range of 20 to 70%, preferably in the range of 30 to 60%, and more preferably in the range of 40 to 55%.

[0273] 20. A light conversion device comprising at least the layer according to any one of embodiments 16 to 19. Preferably, the light conversion device further comprises a substrate.

[0274] 21. An optical device comprising at least the layer according to any one of embodiments 16 to 19 or the light conversion device according to embodiment 20.

[0275] 22. Use of the composition of any one of embodiments 1 to 14 or the layer of any one of embodiments 16 to 19 in a method for producing a photoconverting device.

[0276] 23. Use of the light conversion device described in embodiment 19 in a method for manufacturing an optical device.

[0277] 24. A method of manufacturing an optical device, comprising at least:

[0278] The light conversion device described in Embodiment 20 is provided in an optical device.

[0279] Technical Effects of the Invention

[0280] The present invention provides one or more of the following effects:

[0281] It can be developed with a low concentration of alkaline developer, preferably within a shorter development time and / or taking into account the reactivity and storage stability of the composition, achieving high sensitivity of the composition, reducing exposure energy and exposure time, improving the structure of the patterned cured film (partition wall structure), especially improving the bottom structure of the patterned cured film, providing improved curing of the bottom of the coated composition, achieving improved reflection and / or high optical density (OD) of the cured film, especially achieving improved reflection and / or high OD of a cured film (gray partition wall) with white and black pigments.

[0282] The following working examples will describe the present invention and explain its preparation method in detail. However, the present invention is not necessarily limited to the working examples.

[0283] Embodiments of the invention

[0284] Invention Example 1 : Preparation of partition wall composition

[0285] The partition wall composition 1 was prepared using the following materials.

[0286] Table 1:

[0287]

[0288] Acrylic polymer A: an acrylic random polymer made of a carbonic acid monomer and a monomer containing at least one aromatic ring group (Shin-Nakamura Chemical Co., Ltd.).

[0289] Acrylic polymer B: polymer of 2-methyl-2-acrylic acid with 2-hydroxyethyl 2-methyl-2-acrylate, 2-isocyanatoethyl 2-acrylate and methyl 2-methyl-2-acrylate (Natoco).

[0290] The PGMEA solvent was added such that after the addition of the solvent, the composition contained a total solids content of 35 wt % and 65 wt % solvent based on the total weight of the composition.

[0291] Invention Examples 2 to 20 : Preparation of partition wall composition

[0292] Partition wall compositions 2 to 11 were prepared in the same manner as described in Inventive Example 1, except that the materials mentioned in Table 2A and Table 2B were used instead of the materials used in Inventive Example 1. As in Inventive Example 1, a PGMEA solvent (not mentioned in Table 2) was added, so that after the addition of the solvent, the composition contained 35 wt % of total solid content and 65 wt % of solvent based on the total weight of the composition.

[0293] Table 2A:

[0294]

[0295] Table 2B:

[0296]

[0297] Comparative Examples 1-2 : Preparation of partition wall composition

[0298] Comparative partition wall compositions 1 to 2 were prepared in the same manner as described in Inventive Example 1, except that the materials mentioned in Table 3 were used instead of the materials used in Inventive Example 1. As in Inventive Example 1, a PGMEA solvent (not mentioned in Table 3) was added, such that after the addition of the solvent, the composition contained 35 wt % of total solid content and 65 wt % of solvent based on the total weight of the composition.

[0299] Table 3:

[0300]

[0301] Invention Example 21 : Production of cured film (cured composition)

[0302] Film samples 1 to 20 were made using the compositions of Inventive Examples 1 to 20 in order to perform OD and reflectance measurements of the samples.

[0303] First, the partition wall compositions obtained from Invention Examples 1 to 20 were coated on glass substrates using a spin coater (MS-A100, MIKASA). The coated glass substrates 1 to 20 were then pre-baked on a hot plate (HHP-411V, AS ONE) at 90°C for 120 seconds to obtain an average layer thickness of 10 μm for the pre-baked compositions coated on the substrates. The ghi-line exposure machine for photolithography (NES2W-ghi06, Nikon) was then used at 30 mJ / cm 2 The entire surface of the sample was exposed without using any pattern mask, and then the sample was subjected to a post-exposure baking process at 120°C for 90 seconds using a hot plate (HHP-411V, AS ONE).

[0304] Then, the post-exposure baked samples 1 to 11 were developed using 0.03 wt % KOHaq as a developer for 180 seconds.

[0305] Finally, a post-exposure baking process was performed on the samples using a hot plate (HHP-411V, AS ONE) at 120° C. for 30 min to promote curing.

[0306] The baked samples were then cooled to room temperature, and film samples 1 to 20 were finally obtained.

[0307] Comparative Example 3 : Production of cured film (cured composition)

[0308] Comparative cured film samples 1 and 2 were prepared in the same manner as described in Inventive Example 21, except that the compositions from Comparative Examples 1 to 2 were used, and the average layer thickness of the prebaked compositions of the obtained comparative cured film samples 1 and 2 was 17 μm (Sample 1) and 9 μm (Sample 2). Comparative samples 1 and 2 were thus obtained.

[0309] Invention Example 22 : Optical density (OD) measurement

[0310] The transmission spectra of the film samples 1 to 20 obtained in Inventive Example 21 were measured using a spectrophotometer (CM-5, Konica Minolta), and the OD values ​​of each sample at 460 nm, 540 nm, and 630 nm were calculated.

[0311] Invention Example 23 : Measurement of sample reflectance

[0312] The reflectance spectrum of each film sample obtained in Inventive Example 21 was measured using a spectrophotometer (CM-5, Konica Minolta), and the average reflectance of each sample in the range of 460 to 630 nm was calculated.

[0313] Table 4 shows the measurement results of Invention Example 13 and Invention Example 14.

[0314] Table 4:

[0315]

[0316]

[0317] The reflectances of the comparative cured film samples 1 and 2 at 550 nm were 46.5 and 33.3, respectively, and the OD values ​​(average values ​​within the range of 400 to 650 nm) were 1.7 and 1.9, respectively.

[0318] Invention Example 24 : Manufacturing of patterned films (partition walls)

[0319] Cured film samples 3', 6', 11', 12', 13', 14', 16' to 20' were manufactured by using the compositions of Inventive Examples 3, 6, 11, 12, 13, 14, 16 to 20.

[0320] First, the partition wall compositions obtained from Inventive Examples 3, 6, 11, 12, 13, 14, 16 to 20 were coated on glass substrates using a spin coater (MS-A100, MIKASA), respectively. The coated glass substrates 1 to 20 were then pre-baked on a hot plate (HHP-411V, ASONE) at 90° C. for 120 seconds to obtain an average layer thickness of 10 μm for the pre-baked compositions coated on the substrates.

[0321] Then, a ghi-line exposure machine for photolithography (NES2W-ghi06, Nikon) was used at the exposure values ​​(mJ / cm 2 ) The samples were exposed, for example, for samples 3', 6', 11', 13', 14', 16' to 20', a pattern mask 1 with a line width of 15.0 μm and a pitch of 150.0 μm was used.

[0322] For the sample 12 ′, a pattern mask 2 having a line width of 7.5 μm and a pitch of 157.5 μm was used instead of the pattern mask having a line width of 15.0 μm and a pitch of 150.0 μm.

[0323] Then, the obtained sample was developed with 0.03 wt % KOHaq as a developer for 100 seconds and rinsed with ultrapure water.

[0324] Finally, the samples were subjected to a post-exposure baking process at 120° C. for 30 min using a hot plate (HHP-411V, AS ONE).

[0325] The baked samples were then cooled to room temperature, and finally patterned samples 3', 6', 11', 12', 13', 14', 16' to 20' were obtained.

[0326] Invention Example 25 : Evaluation of pattern structure

[0327] The patterned structures of Patterned Samples 3', 6', 11', 12', 13', 14', 16' to 20' obtained from Inventive Example 24 were measured by an optical microscope (MX61A, OLYMPUS) and a SEM (JSM-7100, JEOL).

[0328] That is, the development residues in the unexposed areas of the samples and the surface roughness of the patterned structures of the samples were measured by an optical microscope (MX61A, OLYMPUS) and a SEM (JSM-7100, JEOL).

[0329] And, the maximum pattern line width and the minimum pattern line width of the obtained patterned samples 3', 6', 11', 12', 13', 14', 16' to 20' were measured by using SEM.

[0330] If development residues were observed in the unexposed area, it was marked as "Y" in the following Table 5; if development residues were not observed in the unexposed area, it was marked as "N" in the following Table 5.

[0331] "OK" (using mask 1) for the obtained patterned samples 3', 6', 11', 13', 14', 16' to 20' in Table 5 indicates that the maximum and minimum line widths of the samples are in the range of 28 to 32 μm, and the difference between the maximum and minimum line widths of the samples is less than 1 μm.

[0332] "OK" (using mask 2) for the obtained patterned sample 12' in Table 5 means that the maximum line width and the minimum line width of the sample are within the range of 15 to 18 μm, and the difference between the maximum line width and the minimum line width of the sample is less than 1 μm.

[0333] If the sample does not meet the above conditions, it is marked as "NG" in Table 5.

[0334] Regarding the surface roughness of the patterned structure of the sample, "A" means that the surface roughness of the upper face or the side face of the patterned structure of the sample is smooth and the structure is fine.

[0335] "B" means that the surface roughness of the upper side or the side of the patterned structure of the sample is somewhat rough, but the patterned structure is preserved.

[0336] "C" indicates that the surface roughness of the upper surface or the side surface of the patterned structure of the sample is rougher, and the damage degree of the patterned structure is more serious than that of "B".

[0337] Table 5 shows the results of Inventive Example 25.

[0338] Table 5:

[0339]

Claims

1. A composition, preferably a photocurable composition, preferably the composition does not contain any polysiloxane, the composition comprising at least: i) an alkali-soluble polymer containing olefinic double bonds; and ii) Colorants. 2 . The composition according to claim 1 , wherein the solid acid value of the basic polymer is in the range of 30 to 160 mgKOH / g.

3. The composition according to claim 1 or 2, further comprising a thiol-containing multifunctional compound.

4. The composition according to any one of the preceding claims, further comprising a compound containing at least two (meth)acryloyloxy groups.

5. A composition according to any one of the preceding claims, further comprising a surfactant.

6. The composition according to any one of the preceding claims, wherein the colorant is a first colorant selected from organic colorants and / or inorganic colorants, more preferably a black colorant selected from organic black pigments and / or inorganic black pigments, or a white colorant selected from organic white pigments and / or inorganic white pigments, even more preferably it is a black colorant.

7. The composition according to any one of the preceding claims, further comprising another colorant different from the colorant of claim 1.

8. The composition of any one of the preceding claims, further comprising a third colorant different from the colorant of claim 1 and the colorant of claim 7.

9. The composition according to any one of the preceding claims, wherein the amount of the colorant (first colorant) is in the range of 0.1 to 50 wt%, based on the total weight of the alkali-soluble polymer of the composition.

10. The composition according to any one of the preceding claims, wherein the amount of the further colorant (second colorant) is in the range of 1 wt% to 400 wt%, based on the total weight of the alkali-soluble polymer of the composition.

11. The composition according to any one of the preceding claims, wherein the ratio of the colorant (first colorant) to the other colorant (second colorant) is in the range of 0.0001 to 50.

12. A method for manufacturing a solidified layer, comprising at least the following steps; (xi) providing the composition of any one of claims 1 to 11 onto a layer or substrate to form a coated layer; and (Xii) The coated layer is baked to obtain a cured layer.

13. A layer comprising at least: i) a polymer (A) which is derived or derivable from an alkali-soluble polymer containing olefinic double bonds; and ii) Colorants.

14. The layer according to claim 13, wherein The optical density (OD) value of the layer with a layer thickness of 10 μm at a light wavelength of 460 nm is in the range of 1.0 to 4.0, the OD value of the layer with a layer thickness of 10 μm at a light wavelength of 540 nm is in the range of 1.0 to 4.0, and / or the OD value of the layer with a layer thickness of 10 μm at a light wavelength of 630 nm is in the range of 1.0 to 3.

0.

15. A layer according to any one of claims 13 to 14, wherein The average reflection value of the layer with a layer thickness of 10 μm in the light wavelength range of 450 to 650 nm is in the range of 20 to 70%, preferably in the range of 30 to 60%, more preferably in the range of 40 to 55%.

16. A light conversion device comprising at least a layer according to any one of claims 13 to 15.

17. An optical device comprising at least a layer according to any one of claims 13 to 15 or a light conversion device according to claim 16.

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