Wafer processing and cleaning device

Abstract

The invention discloses a wafer processing and cleaning device which comprises a bottom frame, four corners of the bottom frame are provided with upright columns extending upwards, one end, away from the bottom frame, of each upright column is provided with an upper frame body, the bottom frame, the upright columns and the upper frame body form a mounting frame, and a mounting plate is arranged in the mounting frame; a moving mechanism is arranged on the mounting plate, a dust removal mechanism is arranged below the moving mechanism, an air pressure assembly is arranged on the moving mechanism, the dust removal mechanism is connected with the air pressure assembly through a guide pipe, and the dust removal mechanism, the moving mechanism and the air pressure assembly are arranged in the mounting frame; the dust removal mechanism is connected with the moving mechanism through a second hanging sliding seat and comprises a dust removal head box body, a bottom plate is arranged at the bottom of the dust removal head box body, an opening is formed in the top of the dust removal head box body, and a box body sealing cover is arranged at the opening in the top end of the dust removal head box body; and a positive pressure box extending upwards from the bottom plate is arranged in the dust removal head box body. The two draught fans are adopted for providing positive pressure or negative pressure air sources, and intelligent cleaning is achieved.

Description

Technical Field

[0001] The invention relates to the technical field of semiconductor production, and in particular to a cleaning device for wafer processing. Background Art

[0002] A wafer is a silicon chip used in the manufacture of silicon semiconductor integrated circuits. Wafers are used to produce integrated circuit chips. During the semiconductor production process, wafers are placed in wafer boxes, which are transported to carriers at different loading ports through AMHS (automatic material handling system). After a period of time, dust will remain on the surface of the carrier, affecting the yield of the wafer product.

[0003] In order to maintain the cleanliness of the carrier, the carrier of the semiconductor processing equipment needs to be cleaned regularly. The existing cleaning methods mostly use manual cleaning and brush cleaning. Manual cleaning needs to be performed when the equipment is repaired and maintained, which is time-consuming and labor-intensive, inefficient, and not conducive to the overall working environment. There is no way to control the cleanliness of the cleaning; brush cleaning is contact-type, and there is a risk of scratching the carrier and generating static electricity. Summary of the invention

[0004] In order to solve the problems existing in the prior art, the purpose of the present invention is to provide a cleaning device for wafer processing, which adopts non-contact suspended positive and negative airway cleaning. At the same time, the cleaning device realizes gas and electricity isolation and independent operation, thereby improving the stability and yield rate of product processing.

[0005] To achieve the above object, the present invention adopts the following technical solutions:

[0006] A wafer processing cleaning device comprises a bottom frame, wherein four corners of the bottom frame are provided with upright columns extending upward, an upper frame body is provided at one end of the upright column away from the bottom frame, the bottom frame, the upright column and the upper frame body form a mounting frame, and a mounting plate is provided in the mounting frame; a moving mechanism is installed on the mounting plate, a dust removal mechanism is provided below the moving mechanism, a pneumatic assembly is provided above the moving mechanism, the dust removal mechanism is connected to the pneumatic assembly via a conduit, and the dust removal mechanism, the moving mechanism and the pneumatic assembly are arranged in the mounting frame;

[0007] The dust removal mechanism is connected to the moving mechanism through the second hanging slide, and the dust removal mechanism includes a dust removal head box body, the bottom of the dust removal head box body is provided with a bottom plate, the top of the dust removal head box body is provided with an opening, and a box body sealing cover is provided at the opening at the top of the dust removal head box body; a positive pressure box extending upward from the bottom plate is provided in the dust removal head box body, and the top of the positive pressure box is provided with a separation distance from the top of the dust removal head box body;

[0008] A separation distance is provided between the outer wall of the positive pressure box and the inner wall of the dust removal head box, and a negative pressure cavity is provided on the outer side of the positive pressure box, and the negative pressure cavity is arranged between the inner wall of the dust removal head box and the outer wall of the positive pressure box;

[0009] The moving mechanism includes a first mounting slide rail and a first rack seat. The first rack seat and the first mounting slide rail are fixedly arranged below the mounting plate. The first mounting slide rail and the first rack seat are arranged on a side of the mounting plate away from the column. The first rack seat and the first mounting slide rail are arranged in parallel with the mounting plate.

[0010] A slidable first hanging slide is hung on the first mounting slide rail, a first motor is fixed on the first hanging slide, and the first motor is connected with the first rack seat in a gearing transmission manner.

[0011] Further, in some embodiments, a positive pressure box is provided with a positive pressure sealing cover at one end away from the bottom plate, and an air inlet tube extending upward and penetrating the box body sealing cover is provided on the positive pressure sealing cover, and an end of the air inlet tube away from the positive pressure box extends above the box body sealing cover, and a conduit is connected to the upper end of the air inlet tube, and the air inlet tube is connected to the positive pressure box;

[0012] The sealing cover of the box body is provided with an air exhaust port, which is connected to the negative pressure chamber; the positive pressure box and the negative pressure chamber are respectively arranged in the dust removal head box body, and the positive pressure box and the negative pressure chamber are isolated from each other and do not communicate with each other;

[0013] The bottom surface of the positive pressure box is provided with a first dust blowing slit which runs through the bottom plate horizontally, and the ends near both ends of the first dust blowing slit are provided with a second dust blowing slit which matches symmetrically, and the second dust blowing slit is provided with a side blowing distance from the top end of the first dust blowing slit, and the second dust blowing slit and the first dust blowing slit are vertically arranged to interpenetrate each other;

[0014] The ratio of positive pressure box height: dust collector head box height is 2 / 3~3 / 4:1.

[0015] Further, in some embodiments, a gas seat is provided below the first hanging slide, the gas seat is fixedly connected to the first hanging slide, the gas seat is vertically arranged with the first mounting slide, and one end of the gas seat extends outside the mounting plate; a bearing wheel is provided at one end of the gas seat away from the mounting plate, the bearing wheel is arranged on a supporting beam, and the supporting beam is arranged between two adjacent columns;

[0016] A second mounting slide rail and a second rack seat are fixedly provided on one side of the air component seat away from the first hanging slide seat, and the parallel second mounting slide rail, the second rack seat and the first mounting slide rail are arranged vertically;

[0017] A slidable second hanging slide is hung on the second mounting slide rail, a second motor is arranged on the second hanging slide, and the second motor is gear-engaged and transmission-connected with the second rack seat;

[0018] A pneumatic assembly is provided on one side of the pneumatic seat away from the mounting plate, and the pneumatic assembly is arranged on the outer side of the mounting plate;

[0019] The air pressure component includes a negative pressure fan and a positive pressure fan. A negative pressure high-efficiency filter bin is arranged on the negative pressure fan. The air suction port of the negative pressure high-efficiency filter bin extends laterally and is arranged outside the negative pressure fan.

[0020] The air suction port of the negative pressure high efficiency filter bin is connected to the air exhaust port of the dust removal mechanism through a duct, and the positive pressure fan is connected to the air inlet tube of the dust removal mechanism through another duct.

[0021] Further, in some embodiments, a muffler box is provided on one side of the negative pressure fan, and the air outlet of the negative pressure fan is connected to the muffler box through a conduit;

[0022] A square honeycomb tube is provided in the muffler box, a plurality of through holes are provided on the square tube plate surface of the frame of the square honeycomb tube, and oblique honeycomb baffles intersecting each other on the left and right are provided in the square honeycomb tube;

[0023] The oblique honeycomb baffles extend upward from the inner wall of the square honeycomb tube, the oblique honeycomb baffles on both sides are arranged in an up-and-down staggered manner, the oblique honeycomb baffles on both sides cross each other, the top parts of the oblique honeycomb baffles on both sides overlap each other in the vertical direction, and the oblique honeycomb baffles crossed on both sides form an S-shaped air duct in the square honeycomb tube;

[0024] The negative pressure fan is provided with a lateral air outlet, and the lateral air outlet is connected to the muffler box through a duct.

[0025] Further, in some embodiments, the bottom surface of the negative pressure chamber is provided with a first suction slit and a second suction slit that penetrate the bottom plate transversely, and the first suction slit, the second suction slit and the first dust blowing slit are arranged in parallel; the first suction slit is arranged close to the first dust blowing slit, and the second suction slit is arranged away from the first dust blowing slit, and a separation distance is provided between the first suction slit and the second suction slit;

[0026] Two matching variable-section rods are provided on the bottom surface of the positive-pressure chamber of the positive-pressure box. The variable-section rods are arranged parallel to the first dust-blowing slit, and the two variable-section rods are arranged on both sides of the first dust-blowing slit respectively;

[0027] The variable-section rod is provided with an inwardly protruding compressed air flow bulge, and an air inlet spacing D1 is provided between the tops of the two corresponding variable-section rods, and a bulge spacing D2 is provided between the compressed air flow bulges on the opposite sides of the middle of the two variable-section rods, and the air inlet spacing D1>the bulge spacing D2; an air outlet spacing D3 is provided between the bottoms of the two corresponding variable-section rods, and a dust blowing spacing D4 is provided for the first dust blowing gap opened on the bottom surface of the positive pressure chamber, and the dust blowing spacing D4 is also the width of the first dust blowing gap; the air inlet spacing D1=the air outlet spacing D3, and the air outlet spacing D3>the dust blowing spacing D4.

[0028] Further, in some embodiments, the compressed air flow convex hull is a convex strip; or the compressed air flow convex hull is a long strip with an arc-shaped cross section; or the compressed air flow convex hull is a long strip with a short chord-shaped cross section;

[0029] The ratio of air inlet spacing D1: convex hull spacing D2 is 5 to 10:1;

[0030] The air inlet spacing D1 = air outlet spacing D3; the ratio of dust blowing spacing D4: convex hull spacing D2 is 1:1~1.5;

[0031] The bottom surfaces of the short sides of both sides of the negative pressure chamber are provided with third suction slits which penetrate the bottom plate longitudinally. The third suction slits are arranged between the outer walls of the short sides of both sides of the positive pressure box and the inner wall of the dust removal head box. The third suction slits are arranged in parallel with the second dust blowing slits.

[0032] The second dust blowing slit is arranged close to the inner wall of the short sides of both sides of the positive pressure box;

[0033] The ratio of the first dust blowing slit width: the first suction slit width: the second suction slit width is 1:4~5:4~5;

[0034] The ratio of the width of the second dust blowing slit to the width of the third suction slit is 1:4-5;

[0035] The ratio of the air volume of the first dust blowing slit to the air volume of the first suction slit is 1:1.5~3, and the air volume of the second suction slit is equal to the air volume of the first suction slit;

[0036] The ratio of the air volume of the second dust blowing slit to the air volume of the third suction slit is 1:1.5~3.

[0037] Further, in some embodiments, the mounting plate is arranged in the middle of the mounting frame, one side of the mounting plate is connected to two adjacent columns, and the other side of the mounting plate is connected to the upper frame through a vertical plate; a vertical frame is arranged between one end of the mounting plate close to the column and the bottom frame, and a supporting beam is arranged between two columns away from the mounting plate;

[0038] A pneumatic assembly is arranged on the movable mechanism, the dust removal mechanism is connected to the pneumatic assembly through a conduit, and the dust removal mechanism, the movable mechanism and the pneumatic assembly are arranged in an installation frame; the box sealing cover is connected to the movable mechanism through a second hanging slide.

[0039] Further, in some embodiments, the mounting plate is arranged in the middle of the mounting frame, one end of the mounting plate is fixedly arranged in the middle of two adjacent columns, and the other end of the mounting plate away from the column is connected to the upper frame through a vertical plate; a vertical frame is arranged between the end of the mounting plate close to the column and the bottom frame, and a supporting beam is arranged between the two columns away from the mounting plate;

[0040] The gear on the output shaft of the first motor is connected to the first rack seat in a gear-driven manner; the gear on the output shaft of the second motor is connected to the second rack seat in a gear-driven manner;

[0041] A dust removal mechanism is suspended on one end of the second hanging slide away from the second mounting slide rail.

[0042] This application uses a non-contact dust removal head for cleaning and an automated cleaning device. The cleaning device of this application corresponds to the size of the chip box (chip wafer box) on the carrier to clean the carrier. The equipment of this application is placed on the chip carrier for cleaning. There are generally hundreds or thousands of wafer processing carriers (points) in the working environment. The working environment is equipped with an overhead crane system, and the overhead crane is loaded with a mobile fixture. When a station is cleaned, the overhead crane system transports the cleaning equipment of this application to the next idle station to be cleaned (carrier position); you only need to cooperate with the station route map to clean the idle stations one by one.

[0043] This application adopts a non-contact suspension + gas and electricity isolation design, which closes the dust removal workspace through fluctuating airflow to blow dust → wind curtain barrier (negative pressure suction); a high-efficiency filter is set on the suction fan (negative pressure fan) to (efficiently) filter the dust, and the two fans provide positive or negative pressure air sources without an external air source; in addition, batteries are used for power supply without an external power supply. The fan and motor are both 24 volts, and the entire device is isolated from external gas and electricity. The two fans are set on the mounting track (transverse guide rail) and are movable. The fan and the dust removal head are connected through an air duct. The fan moves with the dust removal head. When the dust removal head (dust removal component) moves, the fan moves with it. The distance between the fan and the dust removal head will not become very large, which is conducive to avoiding touching nearby plates and shafts and realizing intelligent cleaning.

[0044] The dust removal head (blowing and suction head) of the present application is cleaned by blowing through the middle dust blowing slit and suctioned through the surrounding suction slits; the dust removal head is suspended on the carrier without contact, the middle dust blowing slit blows and the surrounding suction slits suction, so the dust will not be exposed, and the negative pressure suction (suction slits) around will not leak air, which can prevent dust from floating out.

[0045] There are two suction slits (narrow suction channels) on each side of the dust removal head, and the width of the suction slit is greater than the width of the dust blowing slit. The wind blown down from the dust blowing slit in the middle of the dust removal head (working gun) will spread to both sides, and two suction slit air curtains are set on each side to suck away the dust; dust blowing slits and suction slits are added to the narrow sides at both ends of the dust removal head, and the suction slits around form a suction air curtain to prevent dust from spreading from the dust blowing gun, improve cleaning efficiency, and enhance the degree of automation of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1 is an application schematic diagram of an embodiment of the present invention;

[0047] Figure 2 It is a structural schematic diagram of an embodiment of the present invention;

[0048] Figure 3 It is a three-dimensional schematic diagram of an embodiment of the present invention;

[0049] Figure 4 A bottom view schematically showing an embodiment of the present invention;

[0050] Figure 5 It is a schematic diagram of the structure of the pneumatic component part of an embodiment of the present invention;

[0051] Figure 6 It is a structural schematic diagram of the gas component seat part of an embodiment of the present invention;

[0052] Figure 7 It is a structural schematic diagram of the negative pressure fan part of an embodiment of the present invention;

[0053] Figure 8 It is a structural schematic diagram of the moving mechanism part of an embodiment of the present invention;

[0054] Fig. 9 A schematic diagram of wind direction according to an embodiment of the present invention;

[0055] Fig.10 It is a schematic diagram of the assembly of the dust removal mechanism of an embodiment of the present invention;

[0056] Fig.11 It is a cross-sectional schematic diagram of the dust removal mechanism part of an embodiment of the present invention;

[0057] Fig.12 It is a schematic structural diagram of the dust removal mechanism part of an embodiment of the present invention;

[0058] Fig.13 for Fig.11 A schematic diagram of the structure of an embodiment of the part A;

[0059] Fig.14 for Fig.11 Part A is a schematic structural diagram of another embodiment. DETAILED DESCRIPTION

[0060] In order to further understand the features, technical means, specific objectives and functions of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0061] Please refer to the attached drawings. The present application includes a bottom frame 11. The four corners of the bottom frame 11 are provided with upright columns 12 extending upward. The end of the upright column 12 away from the bottom frame 11 is provided with an upper frame 13. The bottom frame 11, the upright column 12 and the upper frame 13 form a mounting frame. The mounting frame is provided with a mounting plate 14. The mounting plate 14 is arranged in the middle of the mounting frame. One end of the mounting plate 14 is fixedly arranged in the middle of two adjacent upright columns 12. The other end of the mounting plate 14 away from the upright column 12 is connected to the upper frame 13 through an upright plate. An upright frame 16 is provided between the end of the mounting plate 14 close to the upright column 12 and the bottom frame 11. A supporting crossbeam 15 is provided between the two upright columns 12 away from the mounting plate 14. The bottom frame 11 is placed on the carrier 81.

[0062] A moving mechanism 21 is installed on the mounting plate 14, a dust removal mechanism 41 is provided below the moving mechanism 21, a pneumatic assembly 61 is provided above the moving mechanism 21, the dust removal mechanism 41 is connected to the pneumatic assembly 61 via a conduit 59, and the dust removal mechanism 41, the moving mechanism 21 and the pneumatic assembly 61 are arranged in a mounting frame.

[0063] The dust removal mechanism 41 includes a dust removal head box 42, which is also a pressure-dividing bin; a bottom plate 49 is provided at the bottom of the dust removal head box 42, and the dust removal head box 42 and the bottom plate 49 are integrally formed; a box sealing cover 48 is provided at the top of the dust removal head box 42.

[0064] Further, in one embodiment, the top of the dust removal head box 42 is provided with an opening, and a box sealing cover 48 is provided at the opening at the top of the dust removal head box 42, that is, the box sealing cover 48 is a sealing cover plate of the dust removal head box 42. A positive pressure box 44 extending upward from the bottom plate 49 is provided in the dust removal head box 42, that is, a frame-shaped positive pressure box 44 is provided in the dust removal head box 42; the top of the positive pressure box 44 is provided with a separation distance from the top of the dust removal head box 42, that is, a distance is provided between the top of the positive pressure box 44 away from the bottom plate 49 and the box sealing cover 48; further, the ratio of the height of the positive pressure box 44: the height of the dust removal head box 42 is 2 / 3 to 3 / 4:1.

[0065] Furthermore, in one of the embodiments, a positive pressure sealing cover 46 (positive pressure chamber cover) is provided at one end of the positive pressure box 44 away from the bottom plate 49, and an air inlet pipe 47 extending upward through the box body sealing cover 48 is provided on the positive pressure sealing cover 46, and one end of the air inlet pipe 47 away from the positive pressure box 44 extends above the box body sealing cover 48, and the upper end of the air inlet pipe 47 is connected to the duct 59, and the air inlet pipe 47 is through-connected with the positive pressure box 44.

[0066] There is a separation distance between the outer wall of the positive pressure box 44 and the inner wall of the dust removal head box 42, and the cavity between the inner wall of the dust removal head box 42 and the outer wall of the positive pressure box 44 forms a negative pressure chamber 43, that is, a negative pressure chamber 43 is provided on the outer side of the positive pressure box 44, and the annular negative pressure chamber 43 is arranged in the dust removal head box 42; an air exhaust port 57 is provided on the box sealing cover 48, and the air exhaust port 57 is connected to the negative pressure chamber 43. The positive pressure box 44 and the negative pressure chamber 43 are respectively arranged in the dust removal head box 42, and the positive pressure box 44 and the negative pressure chamber 43 are isolated from each other and do not penetrate each other.

[0067] The box sealing cover 48 is connected to the moving mechanism 21 via the second hanging slide 34 .

[0068] Further, in one embodiment, the bottom surface of the positive pressure box 44 is provided with a first dust blowing slit 54 that runs through the bottom plate 49 horizontally, and a second dust blowing slit 56 that matches and is symmetrical is provided near the ends of both ends of the first dust blowing slit 54, and the second dust blowing slit 56 is provided with a side blowing spacing (with a spacing distance) from the top of the first dust blowing slit 54, and the second dust blowing slit 56 (side dust blowing slit) and the first dust blowing slit 54 (middle dust blowing slit) are vertically arranged to interpenetrate each other; the first dust blowing slit 54 and the second dust blowing slit 56 are arranged to penetrate on the bottom plate 49 of the positive pressure box 44. That is, the first dust blowing slit 54 and the second dust blowing slit 56 are opened on the bottom plate 49, and the second dust blowing slit 56 is arranged close to the inner wall of the short sides on both sides of the positive pressure box 44. The second dust-blowing slit 56 cannot be too close to the edge, and a spacing distance for blowing and sucking operation space is left between the second dust-blowing slit 56 and the third suction slit 55, so that the second dust-blowing slit 56 can blow to the side and outside, and the third suction slit 55 can fully suck away, avoiding air leakage and preventing dust from leaking out.

[0069] Furthermore, in one embodiment, two matching variable-section rods 45 are provided on the bottom surface 51 of the positive pressure chamber of the positive pressure box 44 . The variable-section rods 45 are arranged parallel to the first dust-blowing gap 54 , and the two variable-section rods 45 are respectively arranged on both sides of the first dust-blowing gap 54 .

[0070] The variable-section rod 45 is provided with a compressed air flow convex hull 19 protruding inward (toward each other, face to face), an air inlet spacing D1 is provided between the tops of the two corresponding variable-section rods 45, and a hull spacing D2 is provided between the compressed air flow convex hulls 19 on the opposite sides of the middle of the two variable-section rods 45, and the air inlet spacing D1>hull spacing D2; an air outlet spacing D3 is provided between the bottoms of the two corresponding variable-section rods 45, and a dust blowing spacing D4 is provided for the first dust blowing gap 54 opened on the bottom surface 51 of the positive pressure chamber, and the dust blowing spacing D4 is also the width of the first dust blowing gap 54; the air inlet spacing D1=air outlet spacing D3, and the air outlet spacing D3>dust blowing spacing D4.

[0071] The compressed airflow convex hull 19 is a convex strip type; or the compressed airflow convex hull 19 is a long strip with an arc-shaped cross section; or the compressed airflow convex hull 19 is a long strip with a short chord-shaped cross section.

[0072] Variable-section rod 45: The compressed air passes through the variable-section air flow channel, the wide and narrow section variable flow channel, and through repeated compression and diffusion, generates a fluctuating airflow, and generates a high-frequency and high-speed pulse airflow at the outlet position (the first dust blowing gap 54), so that the ultrafine particles are separated from the substrate and then sucked away and collected by the surrounding negative pressure airflow.

[0073] The ratio of air inlet spacing D1: convex hull spacing D2 is 5 to 10:1;

[0074] Air inlet distance D1 = air outlet distance D3, D1 equals D3;

[0075] The ratio of dust blowing distance D4: convex hull distance D2 is 1:1~1.5.

[0076] The wind gap size is D1=D3>D2≧D4, and the airflow passes through D1→D2→D3→D4 to change the air duct width→narrow→wide→narrow, and obtains a high-frequency and high-speed pulse airflow, which impacts the dust blowing and sweeping at the outlet of the first dust blowing gap 54.

[0077] The bottom surface of the negative pressure chamber 43 is provided with a first suction slit 52 and a second suction slit 53 that penetrate the bottom plate 49 transversely, and the first suction slit 52, the second suction slit 53 and the first dust blowing slit 54 are arranged in parallel; the first suction slit 52 (inner suction slit) is arranged close to the first dust blowing slit 54, and the second suction slit 53 (outer suction slit) is arranged away from the first dust blowing slit 54, and a separation distance is provided between the first suction slit 52 and the second suction slit 53. Further, the first suction slit 52 and the second suction slit 53 are arranged transversely through the bottom plate 49 of the negative pressure chamber 43, that is, the first suction slit 52 and the second suction slit 53 are arranged transversely and parallel through the bottom plate 49, and a separation distance is provided between the first dust blowing slit 54 and the first suction slit 52.

[0078] A third suction slit 55 which penetrates the bottom plate 49 longitudinally is provided on the bottom surface of the short sides on both sides of the negative pressure chamber 43. The third suction slit 55 is arranged between the outer wall of the short sides on both sides of the positive pressure box 44 and the inner wall of the dust removal head box 42. The third suction slit 55 is arranged parallel to the second dust blowing slit 56; further, the third suction slit 55 (side suction slit) extends downward through the bottom plate 49, and the third suction slit 55 is connected with the negative pressure chamber 43.

[0079] Further, in one of the embodiments, the ratio of the width of the first dust blowing slit 54: the width of the first suction slit 52: the width of the second suction slit 53 is 1:4-5:4-5;

[0080] The ratio of the width of the second dust blowing slit 56 to the width of the third suction slit 55 is 1:4-5;

[0081] The first dust blowing slit 54 and the second dust blowing slit 56 have the same width, and the first suction slit 52 , the second suction slit 53 and the third suction slit 55 have the same width.

[0082] Further, in one of the embodiments, the ratio of the air volume of the first dust blowing slit 54 to the air volume of the first suction slit 52 is 1:1.5-3, and the air volume of the second suction slit 53 is equal to the air volume of the first suction slit 31;

[0083] The ratio of the air volume of the second dust blowing slit 56 to the air volume of the third suction slit 55 is 1:1.5-3.

[0084] Further, in one of the embodiments, a battery 58 is provided on the top of the mounting plate 14, and the battery 58 provides power to all power components. The moving mechanism 21 includes a first mounting rail 28 and a first rack seat 27. The first rack seat 27 and the first mounting rail 28 are fixedly arranged under the mounting plate 14. The first mounting rail 28 and the first rack seat 27 are arranged on the side of the mounting plate 14 away from the column 12. The first rack seat 27 and the first mounting rail 28 are arranged parallel to the mounting plate 14. A slidable first hanging slide 29 is hung on the first mounting rail 28, and a first motor 23 is fixed on the first hanging slide 29. The first motor 23 is connected to the first rack seat 27 in a gearing transmission connection; specifically, the gear on the output shaft of the first motor 23 is connected to the first rack seat 27 in a gearing transmission connection.

[0085] The first motor 23 drives the first hanging slide 29 to move back and forth on the first mounting slide rail 28 . The first motor 23 drives the first hanging slide 29 to move on the first rack seat 27 through the engagement of the gears on the output shaft.

[0086] Further, in one embodiment, a gas seat 22 is provided below the first hanging slide 29, the gas seat 22 is fixedly connected to the first hanging slide 29, the gas seat 22 is vertically arranged with the first mounting rail 28, and one end of the gas seat 22 extends outside the mounting plate 14; a bearing wheel 25 is provided at one end of the gas seat 22 away from the mounting plate 14, and the bearing wheel 25 is arranged on the supporting beam 15, and the supporting beam 15 is arranged between two adjacent columns 12. A second mounting rail 33 and a second rack seat 26 parallel to each other are fixed on one side of the gas seat 22 away from the first hanging slide 29, and the parallel second mounting rail 33, the second rack seat 26 and the first mounting rail 28 are vertically arranged.

[0087] Furthermore, in one of the embodiments, a slidable second hanging slide 34 is hung on the second mounting rail 33, a second motor 24 is provided on the second hanging slide 34, and the second motor 24 is meshingly connected to the second rack seat 26; specifically, the gear on the output shaft of the second motor 24 is meshingly connected to the second rack seat 26.

[0088] Further, in one embodiment, a dust removal mechanism 41 is suspended at one end of the second hanging slide 34 away from the second mounting slide rail 33. The second motor 24 drives the second hanging slide 34 to move back and forth on the second mounting slide rail 33, and the second motor 24 drives the second hanging slide 34 to move on the second mounting slide rail 33 by engaging the gear on the output shaft. The first motor 23 and the second motor 24 drive the dust removal mechanism 41 to move forward, backward, left, right, vertically and horizontally.

[0089] A pneumatic assembly 61 is disposed on one side of the pneumatic seat 22 away from the mounting plate 14 . The pneumatic assembly 61 is disposed on the outer side of the mounting plate 14 .

[0090] Furthermore, in one embodiment, the air pressure component 61 includes a negative pressure fan 62 and a positive pressure fan 63 , and a negative pressure high-efficiency filter bin 66 is provided on the negative pressure fan 62 , and the air suction port of the negative pressure high-efficiency filter bin 66 extends laterally and is arranged on the outside of the negative pressure fan 62 .

[0091] Furthermore, in one of the embodiments, the air intake port of the negative pressure high efficiency filter bin 66 is conductively connected to the air outlet 57 of the dust removal mechanism 41 through a duct 59, and the positive pressure fan 63 is conductively connected to the air inlet 47 of the dust removal mechanism 41 through another duct 59.

[0092] The working pressure of the positive pressure fan 63 is 5 to 12 KPa, and the working pressure of the negative pressure fan 62 is -6 to -1.5 KPa; the air volume of the positive pressure fan 63: the air volume ratio of the negative pressure fan 62 is 1:1.5 to 3. The positive pressure fan 63 and the negative pressure fan 62 are connected to the air inlet 47 and the air outlet 57 of the dust removal mechanism 41 through the duct 59, so that the dust can be better closed during dust removal, and the dust can be blocked in the clean space inside the periphery of the dust removal head (dust removal mechanism 41), forming an air curtain to completely close the entire dust removal working space.

[0093] A silencer box 65 is provided on one side of the negative pressure fan 62; specifically, a lateral air outlet 68 is provided on the negative pressure fan 62, and the lateral air outlet 68 is connected to the silencer box 65 through a duct 59; a square honeycomb tube 69 is provided in the silencer box 65, and a plurality of through holes are provided on the square tube plate surface of the frame of the square honeycomb tube 69, and an oblique honeycomb baffle 71 that crosses each other on the left and right is provided in the square honeycomb tube 69.

[0094] The oblique honeycomb hole baffles 71 extend upward from the inner wall of the square honeycomb hole tube 69, and the oblique honeycomb hole baffles 71 on both sides are arranged alternately up and down, and cross each other. The top parts of the oblique honeycomb hole baffles 71 on both sides overlap each other in the vertical direction (longitudinal direction) up and down, forming an S-shaped air duct in the square honeycomb hole tube 69 to reduce the impact effect of wind waves.

[0095] The above-mentioned embodiments only express several implementation methods of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the patent of the present invention. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A wafer processing cleaning device, comprising: A bottom frame (11), wherein four corners of the bottom frame (11) are provided with upright posts (12) extending upward, an upper frame body (13) is provided at one end of the upright post (12) away from the bottom frame (11), the bottom frame (11), the upright post (12) and the upper frame body (13) form a mounting frame, and a mounting plate (14) is provided in the mounting frame; The invention is characterized in that a moving mechanism (21) is installed on the mounting plate (14), a dust removal mechanism (41) is provided below the moving mechanism (21), a pneumatic assembly (61) is provided above the moving mechanism (21), the dust removal mechanism (41) is connected to the pneumatic assembly (61) via a conduit (59), and the dust removal mechanism (41), the moving mechanism (21) and the pneumatic assembly (61) are arranged in a mounting frame; The dust removal mechanism (41) is connected to the moving mechanism (21) via a second hanging slide (34), and the dust removal mechanism (41) comprises a dust removal head box (42), the bottom of the dust removal head box (42) is provided with a bottom plate (49), the top of the dust removal head box (42) is provided with an opening, and the opening at the top of the dust removal head box (42) is provided with a box sealing cover (48); a positive pressure box (44) extending upward from the bottom plate (49) is provided in the dust removal head box (42), and a separation distance is provided between the top of the positive pressure box (44) and the top of the dust removal head box (42); A separation distance is provided between the outer wall of the positive pressure box (44) and the inner wall of the dust removal head box body (42); a negative pressure chamber (43) is provided on the outer side of the positive pressure box (44); and the negative pressure chamber (43) is arranged between the inner wall of the dust removal head box body (42) and the outer wall of the positive pressure box (44); The moving mechanism (21) comprises a first mounting slide rail (28) and a first rack seat (27); the first rack seat (27) and the first mounting slide rail (28) are fixedly arranged below the mounting plate (14); the first mounting slide rail (28) and the first rack seat (27) are arranged on a side of the mounting plate (14) away from the column (12); the first rack seat (27) and the first mounting slide rail (28) are arranged in parallel with the mounting plate (14); A slidable first hanging slide seat (29) is hung on the first hanging slide rail (28), a first motor (23) is fixed on the first hanging slide seat (29), and the first motor (23) is connected to the first rack seat (27) in a gearing transmission manner.

2. A wafer processing cleaning device according to claim 1, characterized in that: The positive pressure box (44) is provided with a positive pressure sealing cover (46) at one end away from the bottom plate (49), and an air inlet tube (47) extending upward and penetrating the box body sealing cover (48) is provided on the positive pressure sealing cover (46). The end of the air inlet tube (47) away from the positive pressure box (44) extends above the box body sealing cover (48), and the upper end of the air inlet tube (47) is connected to the conduit (59), and the air inlet tube (47) is connected to the positive pressure box (44). The box sealing cover (48) is provided with an air exhaust port (57), and the air exhaust port (57) is connected to the negative pressure chamber (43); the positive pressure box (44) and the negative pressure chamber (43) are respectively arranged in the dust removal head box (42), and the positive pressure box (44) and the negative pressure chamber (43) are isolated from each other and do not communicate with each other; The bottom surface of the positive pressure box (44) is provided with a first dust blowing slit (54) which runs through the bottom plate (49) in a transverse direction, and the ends near both ends of the first dust blowing slit (54) are provided with matching symmetrical second dust blowing slits (56), the second dust blowing slit (56) is provided with a side blowing distance from the top end of the first dust blowing slit (54), and the second dust blowing slit (56) and the first dust blowing slit (54) are vertically arranged to interpenetrate each other; The ratio of the height of the positive pressure box (44) to the height of the dust removal head box (42) is 2 / 3 to 3 / 4:

1.

3. A wafer processing cleaning device according to claim 1, characterized in that: A gas seat (22) is provided below the first hanging slide (29), the gas seat (22) is fixedly connected to the first hanging slide (29), the gas seat (22) is vertically arranged with the first mounting slide rail (28), and one end of the gas seat (22) extends outside the mounting plate (14); a bearing wheel (25) is provided at one end of the gas seat (22) away from the mounting plate (14), and the bearing wheel (25) is arranged on a supporting crossbeam (15), and the supporting crossbeam (15) is arranged between two adjacent columns (12); A second mounting slide rail (33) and a second rack seat (26) are fixedly provided on a side of the air component seat (22) away from the first hanging slide seat (29) and are parallel to each other. The parallel second mounting slide rail (33), the second rack seat (26) and the first mounting slide rail (28) are vertically arranged. A slidable second hanging slide seat (34) is hung on the second hanging slide rail (33), a second motor (24) is arranged on the second hanging slide seat (34), and the second motor (24) is connected to the second rack seat (26) by gearing transmission; A pneumatic component (61) is provided on one side of the pneumatic seat (22) away from the mounting plate (14), and the pneumatic component (61) is arranged on the outer side of the mounting plate (14); The air pressure assembly (61) comprises a negative pressure fan (62) and a positive pressure fan (63); a negative pressure high-efficiency filter chamber (66) is arranged on the negative pressure fan (62); and an air suction port of the negative pressure high-efficiency filter chamber (66) extends laterally and is arranged outside the negative pressure fan (62); The air intake port of the negative pressure high efficiency filter bin (66) is connected to the air exhaust port (57) of the dust removal mechanism (41) through a conduit (59), and the positive pressure fan (63) is connected to the air inlet tube (47) of the dust removal mechanism (41) through another conduit (59).

4. A wafer processing cleaning device according to claim 3, characterized in that: A muffler box (65) is provided on one side of the negative pressure fan (62), and the air outlet of the negative pressure fan (62) is connected to the muffler box (65) via a conduit (59); A square honeycomb tube (69) is provided in the muffler box (65), a plurality of through holes are provided on the frame square tube plate surface of the square honeycomb tube (69), and oblique honeycomb baffles (71) intersecting each other on the left and right are provided in the square honeycomb tube (69); The oblique honeycomb baffles (71) extend upwardly and obliquely from the inner wall of the square honeycomb tube (69); the oblique honeycomb baffles (71) on both sides are arranged in an alternating manner, the oblique honeycomb baffles (71) on both sides cross each other, the top parts of the oblique honeycomb baffles (71) on both sides overlap each other in the vertical direction, and the oblique honeycomb baffles (71) crossing on both sides form an S-shaped air duct in the square honeycomb tube (69); The negative pressure fan (62) is provided with a lateral air outlet (68), and the lateral air outlet (68) is connected to the muffler box (65) via a conduit (59).

5. The wafer processing cleaning device according to claim 1, characterized in that: The bottom surface of the negative pressure chamber (43) is provided with a first suction slit (52) and a second suction slit (53) which penetrate the bottom plate (49) transversely. The first suction slit (52), the second suction slit (53) and the first dust blowing slit (54) are arranged in parallel. The first suction slit (52) is arranged close to the first dust blowing slit (54), and the second suction slit (53) is arranged away from the first dust blowing slit (54). A separation distance is provided between the first suction slit (52) and the second suction slit (53). Two matching variable-section rods (45) are provided on the bottom surface (51) of the positive-pressure chamber of the positive-pressure box (44); the variable-section rods (45) are arranged in parallel with the first dust-blowing slit (54); and the two variable-section rods (45) are respectively arranged on both sides of the first dust-blowing slit (54); The variable-section rod (45) is provided with an inwardly protruding compressed air convex hull (19); an air inlet spacing D1 is provided between the tops of the two corresponding variable-section rods (45); a hull spacing D2 is provided between the compressed air convex hulls (19) on the two opposite sides of the middle of the two variable-section rods (45); and the air inlet spacing D1>the hull spacing D2; an air outlet spacing D3 is provided between the bottoms of the two corresponding variable-section rods (45); a dust blowing spacing D4 is provided for the first dust blowing slot (54) opened on the bottom surface (51) of the positive pressure chamber; and the dust blowing spacing D4 is also the width of the first dust blowing slot (54); the air inlet spacing D1=the air outlet spacing D3, and the air outlet spacing D3>the dust blowing spacing D4.

6. The wafer processing cleaning device according to claim 5, characterized in that: The compressed airflow convex hull (19) is a convex strip; or the compressed airflow convex hull (19) is a long strip with an arc-shaped cross section; or the compressed airflow convex hull (19) is a long strip with a short chord-shaped cross section; The ratio of air inlet spacing D1: convex hull spacing D2 is 5 to 10:1; The air inlet spacing D1 = air outlet spacing D3; the ratio of dust blowing spacing D4: convex hull spacing D2 is 1:1~1.5; A third suction slit (55) is provided on the bottom surface of the short sides of both sides of the negative pressure chamber (43) and runs through the bottom plate (49) in the longitudinal direction. The third suction slit (55) is arranged between the outer wall of the short sides of both sides of the positive pressure box (44) and the inner wall of the dust removal head box body (42). The third suction slit (55) is arranged in parallel with the second dust blowing slit (56). The second dust blowing slits (56) are arranged close to the inner walls of the short sides of the positive pressure box (44); The ratio of the width of the first dust blowing slit (54): the width of the first suction slit (52): the width of the second suction slit (53) is 1:4-5:4-5; The ratio of the width of the second dust blowing slit (56) to the width of the third suction slit (55) is 1:4-5; The ratio of the air volume of the first dust blowing slit (54) to the air volume of the first suction slit (52) is 1:1.5-3, and the air volume of the second suction slit (53) is equal to the air volume of the first suction slit (31); The ratio of the air volume of the second dust blowing slit (56) to the air volume of the third suction slit (55) is 1:1.5-3.

7. The wafer processing cleaning device according to claim 1, characterized in that: The mounting plate (14) is arranged in the middle of the mounting frame, one side of the mounting plate (14) is connected to two adjacent columns (12), and the other side of the mounting plate (14) is connected to the upper frame (13) through a vertical plate; a vertical frame (16) is arranged between one end of the mounting plate (14) close to the column (12) and the bottom frame (11), and a supporting crossbeam (15) is arranged between the two columns (12) far from the mounting plate (14); A pneumatic assembly (61) is provided on the movable mechanism (21); the dust removal mechanism (41) is connected to the pneumatic assembly (61) via a conduit (59); the dust removal mechanism (41), the movable mechanism (21) and the pneumatic assembly (61) are arranged in an installation frame; and the box sealing cover (48) is connected to the movable mechanism (21) via a second hanging slide seat (34).

8. The wafer processing cleaning device according to claim 1, characterized in that: The mounting plate (14) is arranged in the middle of the mounting frame, one end of the mounting plate (14) is fixedly arranged in the middle of two adjacent columns (12), and the other end of the mounting plate (14) away from the column (12) is connected to the upper frame (13) through a vertical plate; a vertical frame (16) is arranged between the end of the mounting plate (14) close to the column (12) and the bottom frame (11), and a supporting crossbeam (15) is arranged between the two columns (12) away from the mounting plate (14); The gear on the output shaft of the first motor (23) is connected to the first rack seat (27) by toothed transmission; the gear on the output shaft of the second motor (24) is connected to the second rack seat (26) by toothed transmission; A dust removal mechanism (41) is suspended on one end of the second suspension slide seat (34) away from the second mounting slide rail (33).

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